JPH0217606A - Glazed resistance paste and hybrid integrated circuit device - Google Patents

Glazed resistance paste and hybrid integrated circuit device

Info

Publication number
JPH0217606A
JPH0217606A JP63168240A JP16824088A JPH0217606A JP H0217606 A JPH0217606 A JP H0217606A JP 63168240 A JP63168240 A JP 63168240A JP 16824088 A JP16824088 A JP 16824088A JP H0217606 A JPH0217606 A JP H0217606A
Authority
JP
Japan
Prior art keywords
silicide
resistor
resistance
paste
resistance paste
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63168240A
Other languages
Japanese (ja)
Inventor
Takeshi Izeki
健 井関
Osamu Makino
治 牧野
Mitsuo Ioka
満雄 井岡
Hirotoshi Watanabe
寛敏 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP63168240A priority Critical patent/JPH0217606A/en
Publication of JPH0217606A publication Critical patent/JPH0217606A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To obtain a paste which can be fired within a non-oxidation environment achieving combination with a Cu wiring conductor by using vehicle containing Al powder, glass powder containing B2O3, and an organic binder. CONSTITUTION:Vehicle containing Al powder, glass powder firing B2O3, and an organic binder is used. The glass powder containing the B2O3 consists of B2O3 and a metal oxide which is difficult to be metallized when it is fired within a non-oxiding environment and the flexibility point ranges from 500 to 800 deg.C. The metal oxide contains one of Ta, Nb, V, W, Mo, Zr and Ti. A resistance paste is produced by this glazed resistance material and a vehicle where a resin binder is dissolved in a solvent, it is printed on a ceramic substrate, and it is fired at 850 to 950 deg.C within a non-oxidizing environment to obtain a resistor with practical characteristics.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、非酸化性雰囲気中での焼成で厚膜抵抗体を形
成するだめのグレーズ抵抗ペーストに関するものである
。このグレーズ抵抗ペーストラ使用すれば、Cu配線導
体等の卑金属配線導体と厚膜抵抗体とを同一のセラミッ
ク基板上に形成することができる。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a glazed resistor paste for forming thick film resistors by firing in a non-oxidizing atmosphere. By using this glaze resistor pasteler, base metal wiring conductors such as Cu wiring conductors and thick film resistors can be formed on the same ceramic substrate.

従来の技術 従来、厚膜ハイブリッド10分野では、配線導体にムg
、ムgPtl 、ムgPt等のムg系の貴金属導体ペー
ストを、抵抗体にRuO2系抵抗ペーストをそれぞれ用
い、空気中焼成方法により回路を形成していた。(例え
ば、「厚膜IC技術」日本マイクロエレクトロニクス協
会綿、工業調査会刊行、第1、発明の名称 グレーズ抵抗ペーストおよび混成集積回路装置2、特許
請求の範囲 (1)  Al粉末、B2O3を含有するガラス粉末、
及び有機バインダーを含むビークルからなり、前記 3
、B2O5を含有するガラス粉末は、B2O5と非酸化
性雰囲気で焼成される際に金属化されにくい金属酸化物
とから構成され、軟化点がSOO〜800°Cの範囲の
ものであり、前記金属酸化物は、Ta。
Conventional technology Conventionally, in the field of thick film hybrid 10, wiring conductors are
Mug-based noble metal conductor pastes such as , MugPtl, and MugPt were used for the resistors, and RuO2-based resistance pastes were used for the resistors, respectively, and circuits were formed by an in-air firing method. (For example, "Thick Film IC Technology" Japan Microelectronics Association, Published by Kogyo Kenkyukai, No. 1, Title of Invention Glazed Resistance Paste and Hybrid Integrated Circuit Device 2, Claims (1) Contains Al powder, B2O3 glass powder,
and a vehicle containing an organic binder, and 3.
The glass powder containing B2O5 is composed of B2O5 and a metal oxide that is difficult to metallize when fired in a non-oxidizing atmosphere, and has a softening point in the range of SOO to 800°C, and has a softening point of SOO to 800°C. The oxide is Ta.

Nb 、 V 、W 、Mo 、 Zr 、 Ti ノ
酸化物ノ内ノ少なくとも1種を含んでいることを特徴と
するグレーズ抵抗ペースト。
A glaze resistance paste comprising at least one oxide of Nb, V, W, Mo, Zr, and Ti.

(2)珪化アルミニウム、珪化クロム、珪化コバルト、
珪化ジルコニウム、珪化タングステン、珪化メンタル、
珪化チタン、珪化ニオブ、珪化ニッケル、珪化バナジウ
ム、珪化マンガン、珪化モリブデンの内の少なくとも1
種を添加した請求項1記載のグレーズ抵抗ペースト。
(2) Aluminum silicide, chromium silicide, cobalt silicide,
Zirconium silicide, tungsten silicide, mental silicide,
At least one of titanium silicide, niobium silicide, nickel silicide, vanadium silicide, manganese silicide, and molybdenum silicide
A glaze resistance paste according to claim 1, further comprising added seeds.

(3)  AJ205. gi02. MgO,5i5
N4. BN 、 AIM。
(3) AJ205. gi02. MgO,5i5
N4. B.N., A.I.M.

26頁〜第34頁) 発明が解決しようとする課題 最近、厚膜ハイブリッドIC分野では、高密度回路、高
速ディジタル回路への要望が高まっている。しかし、従
来のAg系配線導体では、マイグレーション、回路イン
ピーダンスの問題があり、この要望を十分に満たすこと
ができない。そこで、Cu配線導体を用いた厚膜ハイブ
リッドICが有望視されているが、Cu配線導体は空気
中で焼成すると酸化するため、Cu配線導体に用いる抵
抗体は非酸化性雰囲気中で焼成して形成しなければなら
ない。この条件を満たし、実用可能な特性を持つグレー
ズ抵抗ペーストは、まだ開発されて因ない。
(Pages 26 to 34) Problems to be Solved by the Invention Recently, in the field of thick-film hybrid ICs, there has been an increasing demand for high-density circuits and high-speed digital circuits. However, conventional Ag-based wiring conductors have problems with migration and circuit impedance, and cannot fully satisfy this demand. Therefore, thick-film hybrid ICs using Cu wiring conductors are seen as promising, but since Cu wiring conductors oxidize when fired in air, resistors used for Cu wiring conductors must be fired in a non-oxidizing atmosphere. must be formed. A glaze resistance paste that satisfies these conditions and has practical characteristics has not yet been developed.

従って、本発明の目的は、Cu配線導体と組合せること
ができる非酸化性雰囲気中で焼成可能なグレーズ抵抗ペ
ーストを提供することにある。
Therefore, it is an object of the present invention to provide a glaze resistance paste that can be fired in a non-oxidizing atmosphere and can be combined with Cu wiring conductors.

課題を解決するための手段 上記目的を達成するための本発明のグレーズ抵抗ペース
トは、ムg粉末、B2O5を含有するガラス粉末、及び
有機バインダーを含むビークルからなる。
Means for Solving the Problems To achieve the above object, the glaze resistance paste of the present invention consists of a vehicle containing mug powder, glass powder containing B2O5, and an organic binder.

作用 上記組成のグレーズ抵抗材料と樹脂バインダーを溶剤に
溶かしたビークルとで抵抗ペーストをつ〈υ、これをセ
ラミック基板上に印刷し、非酸化性雰囲気中で850〜
950’Cで焼成すれば、実用可能な特性を有する抵抗
体を得ることが出来る。
Function: A resistance paste is made of the glaze resistance material having the above composition and a vehicle in which a resin binder is dissolved in a solvent. This is printed on a ceramic substrate and heated to 850~850°C in a non-oxidizing atmosphere.
By firing at 950'C, a resistor having practically usable characteristics can be obtained.

従って、Cu等の卑金属導体を形成しているセラミック
基板上に厚膜抵抗体を形成することが出来る。
Therefore, a thick film resistor can be formed on a ceramic substrate on which a base metal conductor such as Cu is formed.

実施例 (実施例1) 次に、本発明の実施例に係るグレーズ抵抗ペーストにつ
いて述べる。B2O3を含有するガラスとしては、ガラ
ス人(組成が820540.O重量パーセント、B&0
30.O重量パーセント、 5i028.0重量パーセ
ント、TIL2058.0重量パーセント、he2os
 e、 O重!ハ−セ7 )、Cao4.。
Example (Example 1) Next, a glaze resistance paste according to an example of the present invention will be described. Glasses containing B2O3 include Glassman (composition 820540.O weight percent, B&0
30. O weight percent, 5i028.0 weight percent, TIL2058.0 weight percent, he2os
e, O heavy! Haase7), Cao4. .

重量パーセント、MgO2,O重量パーセント、5r0
2.O重量パーセントからなり、軟化点が約e o O
’Cのもの)を用いた。
Weight percent, MgO2,O weight percent, 5r0
2. O weight percent with a softening point of approximately e o O
'C' was used.

ガラス人、ムeを第1表に示す割合で配合したものをビ
ークル(アクリル系樹脂をターピネオールに溶かしたも
の)と混練し、抵抗ペーストとした。この抵抗ペースト
を、Cu厚膜導体を電極とした96チアルミナ基板上に
250メツシユのスクリーンを用いて印刷し、120℃
の温度で乾燥させてから、窒素ガスパージし、最高温度
900°Cに加熱したトンネル炉を通して焼成し、抵抗
体を形成した。この抵抗体の26°Cにおける面積抵抗
値と、26°Cと126°Cの温度間で測定した抵抗温
度係数を第1表に示す。負荷寿命特性(160mW/g
2の負荷電力を、周囲温度70°Cで、1.6時間印加
、0.6時間除去を繰り返し1000時間経過した時の
抵抗値変化率で評価)、耐湿特性(周囲温度86°C1
相対湿度86%中で1000時間経過した時の抵抗値変
化率で評価)、熱衝撃特性(周囲温度−65°C中で3
0分間放置、周囲温度126°C中で30分間放置を繰
シ返し、1000時間経過した時の抵抗値変化率で評価
)は、いずれも抵抗値変化率が±1%以内であった。
A mixture of Garasujin and Mue in the proportions shown in Table 1 was kneaded with a vehicle (acrylic resin dissolved in terpineol) to form a resistance paste. This resistance paste was printed using a 250-mesh screen on a 96-thium oxide substrate with a Cu thick film conductor as an electrode, and heated at 120°C.
After drying at a temperature of 900° C., the resistor was fired through a tunnel furnace heated to a maximum temperature of 900° C. under a nitrogen gas purge to form a resistor. Table 1 shows the sheet resistance value of this resistor at 26°C and the temperature coefficient of resistance measured between 26°C and 126°C. Load life characteristics (160mW/g
2 load power is applied for 1.6 hours and removed for 0.6 hours at an ambient temperature of 70°C, evaluated by the resistance change rate after 1000 hours), moisture resistance characteristics (ambient temperature of 86°C)
Evaluated by the rate of change in resistance after 1000 hours in a relative humidity of 86%), thermal shock characteristics (3 at an ambient temperature of -65°C)
(Evaluated by the rate of change in resistance value after 1000 hours after being left for 0 minutes and then left for 30 minutes at an ambient temperature of 126° C.) The rate of change in resistance value was within ±1% in all cases.

(以下余白) (実施例2) 次に、B2O5を含有するガラスとして、実施例1で示
したガラス人とは組成が異なるガラスB(B20535
.O重量パーセント、B&035.OHパーセント、5
iOa、o重量パーセント、A/205 e、o重量パ
ー−4=/)、Ta2052.0重量パーセント、Nb
2O52,0重量パーセフ ) 、 V2O52,0重
量パーセント、wo22.0重量パーセント、MOO2
2,O重量パーセント、ZrO22,O重量パーセント
、TiO22,0重量パーセント、MgO2,0重量パ
ーセントからなり、軟化点が約660℃のもの)を用い
た。
(Left below) (Example 2) Next, as a glass containing B2O5, glass B (B20535), which has a different composition from the glass glass shown in Example 1
.. O weight percent, B&035. OH percent, 5
iOa, o weight percent, A/205 e, o weight par-4=/), Ta2052.0 weight percent, Nb
2O52.0 weight percent), V2O52.0 weight percent, wo22.0 weight percent, MOO2
2,0 weight percent, ZrO2,2,0 weight percent, TiO2,2,0 weight percent, and MgO2,0 weight percent, and had a softening point of about 660°C).

ガラスB、ムlを第2表に示す割合で配合したものをビ
ークル(アクリル系樹脂をターピネオールに溶かしたも
の)と混練し、抵抗ペーストとした。この抵抗ペースト
を実施例1と同様にして、96チアルミナ基板上に抵抗
体を形成した。この抵抗体の26°Cにおける面積抵抗
値と、25°Cと126℃の温度間で測定した抵抗温度
係数を第2表に示す。負荷寿命特性、耐湿特性、熱衝撃
特性は実施例1と同様に測定し、抵抗値変化率はいずれ
も±1%以内であった。
A mixture of glass B and mulch in the proportions shown in Table 2 was kneaded with a vehicle (acrylic resin dissolved in terpineol) to form a resistance paste. Using this resistor paste in the same manner as in Example 1, a resistor was formed on a 96 thialumina substrate. Table 2 shows the sheet resistance value of this resistor at 26°C and the temperature coefficient of resistance measured between 25°C and 126°C. The load life characteristics, moisture resistance characteristics, and thermal shock characteristics were measured in the same manner as in Example 1, and the rate of change in resistance value was all within ±1%.

(以下余白) (実施例3) 実施例1で示したガラス人、ム11珪化チタンを第3表
に示す割合で配合したものをビークル(アクリル系樹脂
をターピネオールに溶かしたもの)と混練し、抵抗ペー
ストとした。この抵抗ペーストを実施例1と同様にして
、96チアルミナ基板上に抵抗体を形成した。この抵抗
体の26°Cにおける面積抵抗値と、25°Cと125
°Cの温度間で測定した抵抗温度係数を第3表に示す。
(The following is a blank space) (Example 3) A mixture of Glass Man 11 titanium silicide shown in Example 1 in the proportions shown in Table 3 was kneaded with a vehicle (acrylic resin dissolved in terpineol), It was made into a resistance paste. Using this resistor paste in the same manner as in Example 1, a resistor was formed on a 96 thialumina substrate. The sheet resistance value of this resistor at 26°C, 25°C and 125°C
The temperature coefficients of resistance measured between temperatures in °C are shown in Table 3.

負荷寿命特性、耐湿特性、熱衝撃特性は実施例1と同様
に測定し、抵抗値変化率はいずれも±1チ以内であった
The load life characteristics, moisture resistance characteristics, and thermal shock characteristics were measured in the same manner as in Example 1, and the rate of change in resistance value was all within ±1 inch.

(以下余白) (実施例4) 実施例2で示したガラスB、ムe1金属珪化物A (A
eSi2 、 CrSi2  、 CoSi2  、 
ZrSi2 、WSi2 。
(The following is a blank space) (Example 4) Glass B shown in Example 2, Mu e1 metal silicide A (A
eSi2, CrSi2, CoSi2,
ZrSi2, WSi2.

TaSi2  、 TiSi2 、 NbSi2 、 
NiSi2  、 VSi2MnSi2  、 MoS
i2を等量ずつ混合したもの)を第4表に示す割合で配
合したものをビークル(アクリル系樹脂をターピネオー
ルに溶かしたもの)と混練し、抵抗ペーストとした。こ
の抵抗ペーストを実施例1と同様にして、96チアルミ
ナ基板上に抵抗体を形成した。この抵抗体の26°Cに
おける面積抵抗値と、26°Cと126°Cの温度間で
測定した抵抗温度係数を第4表に示す。負荷寿命特性、
耐湿特性、熱衝撃特性は実施例1と同様に測定し、抵抗
値変化率はいずれも±1%以内であった。
TaSi2, TiSi2, NbSi2,
NiSi2, VSi2MnSi2, MoS
i2 in equal amounts) in the proportions shown in Table 4 was kneaded with a vehicle (acrylic resin dissolved in terpineol) to form a resistance paste. Using this resistor paste in the same manner as in Example 1, a resistor was formed on a 96 thialumina substrate. Table 4 shows the sheet resistance value of this resistor at 26°C and the temperature coefficient of resistance measured between 26°C and 126°C. load life characteristics,
The moisture resistance properties and thermal shock properties were measured in the same manner as in Example 1, and the rate of change in resistance value was within ±1%.

(以下余白) (実施例5) 実施例1で示したガラス人、ムl 、 Si3N4を第
6表に示す割合で配合したものをビークル(アクリル系
樹脂をターピネオールに溶かしたもの)と混練し、抵抗
ペーストとした。この抵抗ペーストを実施例1と同様に
して、96q6アルミナ基板上に抵抗体を形成した。こ
の抵抗体の26°Cにおける面積抵抗値と、25℃と1
26°Cの温度間で測定した抵抗温度係数を第6表に示
す。負荷寿命特性、耐湿特性、熱衝撃特性は実施例1と
同様に測定し、抵抗値変化率はいずれも±1チ以内であ
った。
(The following is a blank space) (Example 5) A mixture of Garasujin, Mul, and Si3N4 shown in Example 1 in the proportions shown in Table 6 was kneaded with a vehicle (acrylic resin dissolved in terpineol). It was made into a resistance paste. Using this resistor paste in the same manner as in Example 1, a resistor was formed on a 96q6 alumina substrate. The sheet resistance value of this resistor at 26°C and 25°C and 1
The temperature coefficient of resistance measured between temperatures of 26°C is shown in Table 6. The load life characteristics, moisture resistance characteristics, and thermal shock characteristics were measured in the same manner as in Example 1, and the rate of change in resistance value was all within ±1 inch.

(以下余白) (実施例6) 実施例2で示したガラスB1ムl、無機フィラーA (
Al2O3、5i02  、 MgO、5i5N4  
、 BN 。
(The following is a blank space) (Example 6) 1 ml of glass B shown in Example 2, inorganic filler A (
Al2O3, 5i02, MgO, 5i5N4
, B.N.

ムlN  、 SiCを等量ずつ混合したもの)を第6
表に示す割合で配合したものをビークル(アクリル系樹
脂をターピネオールに溶かしたもの)と混練し、抵抗ペ
ーストとした。この抵抗ペーストを実施例1と同様にし
て、ea%アルミナ基板上に抵抗体を形成した。この抵
抗体の26°Cにおける面積抵抗値と、26°Cと12
5°Cの温度間で測定した抵抗温度係数を第6表に示す
。負荷寿命特性、耐湿特性、熱衝撃特性は実施例1と同
様に測定し、抵抗値変化率はいずれも±1%以内であっ
た。
A mixture of equal amounts of MulN and SiC) was mixed into the sixth
The mixture in the proportions shown in the table was kneaded with a vehicle (acrylic resin dissolved in terpineol) to form a resistance paste. Using this resistor paste in the same manner as in Example 1, a resistor was formed on an ea% alumina substrate. The sheet resistance value of this resistor at 26°C and 26°C and 12°C
The temperature coefficient of resistance measured between temperatures of 5°C is shown in Table 6. The load life characteristics, moisture resistance characteristics, and thermal shock characteristics were measured in the same manner as in Example 1, and the rate of change in resistance value was all within ±1%.

(以下余白) 上記実施例が示すように、本発明に係わるグレーズ抵抗
ペーストによ)、優れた特性を有する厚膜抵抗体を得る
ことができる。これは、本発明に係わるグレーズ抵抗ペ
ーストが860〜950’Cで焼成される際に、ム11
ガラス中のB20.と遷移金属酸化物が相互作用を起こ
し、金属硼化物、金属珪化物、金属酸化物、ムhosが
ガラスネットワ゛−り中に生成されるため、安定かつ微
細な導電経路網と耐候性の高いガラスネットワークを形
成することに起因している。
(Left below) As shown in the above examples, thick film resistors with excellent characteristics can be obtained by using the glazed resistor paste according to the present invention. This is because when the glaze resistance paste according to the present invention is fired at 860 to 950'C,
B20 in glass. As a result of the interaction between the metal borides, metal silicides, metal oxides, and metal oxides, metal borides, metal silicides, metal oxides, and HOS are generated in the glass network, creating a stable and fine conductive path network and a highly weather-resistant glass network. This is due to the formation of

発明の効果 上述の説明から明らかのように、本発明に係わるグレー
ズ抵抗ペーストは、非酸化性雰囲気中の焼成によシ実用
可能な抵抗体を形成することが可能であるため、Cu等
の卑金属配線導体と共に回路を形成することが出来る。
Effects of the Invention As is clear from the above description, the glaze resistor paste according to the present invention can form a practically usable resistor by firing in a non-oxidizing atmosphere. A circuit can be formed together with wiring conductors.

従って、本発明はCu配線厚膜ハイブリッドICを実現
し、厚膜ハイブリッド10の高密度化、高速ディジタル
化に寄与する。
Therefore, the present invention realizes a Cu wiring thick film hybrid IC and contributes to higher density and higher speed digitalization of the thick film hybrid 10.

Claims (4)

【特許請求の範囲】[Claims] (1)Al粉末、B_2O_3を含有するガラス粉末、
及び有機バインダーを含むビークルからなり、前記B_
2O_3を含有するガラス粉末は、B_2O_3と非酸
化性雰囲気で焼成される際に金属化されにくい金属酸化
物とから構成され、軟化点が500〜800℃の範囲の
ものであり、前記金属酸化物は、Ta,Nb,V,W,
Mo,Zr,Tiの酸化物の内の少なくとも1種を含ん
でいることを特徴とするグレーズ抵抗ペースト。
(1) Al powder, glass powder containing B_2O_3,
and a vehicle containing an organic binder, and the above B_
The glass powder containing 2O_3 is composed of B_2O_3 and a metal oxide that is difficult to metallize when fired in a non-oxidizing atmosphere, and has a softening point in the range of 500 to 800°C, and the metal oxide are Ta, Nb, V, W,
A glaze resistance paste characterized by containing at least one of Mo, Zr, and Ti oxides.
(2)珪化アルミニウム,珪化クロム,珪化コバルト,
珪化ジルコニウム,珪化タングステン,珪化タンタル,
珪化チタン,珪化ニオブ,珪化ニッケル,珪化バナジウ
ム,珪化マンガン,珪化モリブデンの内の少なくとも1
種を添加した請求項1記載のグレーズ抵抗ペースト。
(2) Aluminum silicide, chromium silicide, cobalt silicide,
Zirconium silicide, tungsten silicide, tantalum silicide,
At least one of titanium silicide, niobium silicide, nickel silicide, vanadium silicide, manganese silicide, and molybdenum silicide
A glaze resistance paste according to claim 1, further comprising added seeds.
(3)Al_2O_3,SiO_2,MgO,Si_3
N_4,BN,AlN,SiCの内の少なくとも1種を
添加した請求項1記載のグレーズ抵抗ペースト。
(3) Al_2O_3, SiO_2, MgO, Si_3
The glaze resistance paste according to claim 1, wherein at least one of N_4, BN, AlN, and SiC is added.
(4)基板上に、請求項1記載のグレーズ抵抗ペースト
による抵抗体を形成して構成した混成集積回路装置。
(4) A hybrid integrated circuit device comprising a resistor made of the glazed resistor paste according to claim 1 formed on a substrate.
JP63168240A 1988-07-06 1988-07-06 Glazed resistance paste and hybrid integrated circuit device Pending JPH0217606A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63168240A JPH0217606A (en) 1988-07-06 1988-07-06 Glazed resistance paste and hybrid integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63168240A JPH0217606A (en) 1988-07-06 1988-07-06 Glazed resistance paste and hybrid integrated circuit device

Publications (1)

Publication Number Publication Date
JPH0217606A true JPH0217606A (en) 1990-01-22

Family

ID=15864361

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63168240A Pending JPH0217606A (en) 1988-07-06 1988-07-06 Glazed resistance paste and hybrid integrated circuit device

Country Status (1)

Country Link
JP (1) JPH0217606A (en)

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