JPH02180601A - Falling liquid film type evaporator - Google Patents
Falling liquid film type evaporatorInfo
- Publication number
- JPH02180601A JPH02180601A JP29951588A JP29951588A JPH02180601A JP H02180601 A JPH02180601 A JP H02180601A JP 29951588 A JP29951588 A JP 29951588A JP 29951588 A JP29951588 A JP 29951588A JP H02180601 A JPH02180601 A JP H02180601A
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- evaporator
- tube
- treated
- evaporation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 124
- 238000001704 evaporation Methods 0.000 claims abstract description 59
- 230000008020 evaporation Effects 0.000 claims description 54
- 238000009826 distribution Methods 0.000 claims description 20
- 230000002093 peripheral effect Effects 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 abstract description 6
- 238000009827 uniform distribution Methods 0.000 abstract description 2
- 238000010276 construction Methods 0.000 abstract 2
- 239000010408 film Substances 0.000 description 39
- 239000003507 refrigerant Substances 0.000 description 26
- 230000000694 effects Effects 0.000 description 5
- 239000011552 falling film Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 description 4
- 238000005192 partition Methods 0.000 description 3
- 230000001105 regulatory effect Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 239000007921 spray Substances 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
Abstract
Description
【発明の詳細な説明】
「産業上の利用分野」
大発明は蒸発管周面に沿って膜状に被処理液を瀉しなが
ら、該液の少なくとも一部を蒸発させ、該茄発潜熱を利
用した熱交換器や液濃縮器等として適用される流下液膜
式蒸発装置に関する。Detailed Description of the Invention "Industrial Application Field" The great invention is to evaporate at least a part of the liquid while filtering the liquid to be treated in a film form along the circumferential surface of the evaporation tube, and to remove the latent heat of boiling. This invention relates to a falling film evaporator used as a heat exchanger, liquid concentrator, etc.
「従来の技術」
従来より液膜式蒸発装置、特に流下液膜式蒸発装置は比
較的処理能力も大きく又構造も簡単で制御も容易な為に
広く使用されて邦り、特に該装置をヒートポンプシステ
ムを構成する熱交換器として用いた場合、薄膜化による
熱抵抗の減少や界面撹乱による熱および物質移動の促進
により、熱交換温度差を小さくできる為に、ヒートポン
プの成績係数を向上させることができ好ましい。``Prior Art'' Liquid film evaporators, especially falling film evaporators, have been widely used because they have relatively large processing capacity, simple structure, and easy control. When used as a heat exchanger that constitutes a system, the heat exchange temperature difference can be reduced by reducing thermal resistance by thinning the film and promoting heat and mass transfer by interfacial disturbance, which can improve the coefficient of performance of the heat pump. It's good to be able to do it.
しかしながら前記装置は蒸発管周面における熱交換によ
り八発し切れずに装置下部に滞留した冷媒を蒸発管上端
側に再度導く為の液循環ポンプが必要となるため、末法
発分の冷媒が多くなればなる程その液循環ポンプ動力が
大になり、却って前記システム全体の効率が低下する場
合がある。However, this device requires a liquid circulation pump to re-introduce the refrigerant that remains at the bottom of the device due to heat exchange on the circumferential surface of the evaporator tube to the upper end of the evaporator tube. The more the liquid circulation pump power increases, the more the efficiency of the system as a whole may decrease.
「発明が解決しようとする課題」
この為−船釣には前記蒸発管への液供給流量を少なくし
て蒸発管流下後の液滞留を極力低減させるように構成し
ているが、このような構成を取ると各蒸発管への液の均
一な分配と安定しだ液膜の形成が阻害され、この結果蒸
発管周面の一部に乾き面が発生したり又伝熱性能の低下
を招いたりする場合がある。``Problem to be Solved by the Invention'' For this reason, in boat fishing, the flow rate of liquid supplied to the evaporator tube is reduced to reduce as much as possible the accumulation of liquid after flowing down the evaporator tube. If this configuration is adopted, the uniform distribution of liquid to each evaporator tube and the formation of a stable liquid film will be hindered, resulting in the formation of a dry surface on a part of the circumferential surface of the evaporator tube and a decrease in heat transfer performance. There may be cases where
例えば垂直蒸発管の外表面に液膜を形成させる場合の液
分配の方法としては、茂発管の周囲にスリット空間を設
けたスリット式分配体、又ノズルにより蒸発管周面に液
噴射を行うノズル式分配体などがあるが、スリット式分
配体は、低流量供給を可能にするには蒸発管との間の隙
間をかなり小さくする必要があるので、スリットの加工
精度及び蒸発管との間の組立精度のバラツキにより安定
した往つ周方向に均一な液膜形成が困難であり。For example, when forming a liquid film on the outer surface of a vertical evaporation tube, liquid distribution methods include using a slit-type distributor with a slit space around the evaporation tube, or using a nozzle to spray liquid onto the periphery of the evaporation tube. There are nozzle-type distributors, but slit-type distributors require a fairly small gap between them and the evaporation tube to enable low flow rate supply, so the machining accuracy of the slit and the gap between the evaporation tube and the slit must be kept very small. Due to variations in assembly accuracy, it is difficult to form a stable and uniform liquid film in the circumferential direction.
又ノズル式分配体の場合においては、蒸発管群の巻管の
液分配は低流量域でも比較的均等に行えるが、ノズル噴
流の影響で管周方向の液分配に偏りが生じる。それを避
けるためにノズル数を多くすると、その分ノズル径を小
さくしなければならないので、スリット式と同様にノズ
ル加工精度が問題となる。In the case of a nozzle-type distributor, liquid distribution in the winding tubes of the evaporator tube group can be achieved relatively evenly even in a low flow rate range, but liquid distribution in the circumferential direction of the tubes is uneven due to the influence of the nozzle jet. If the number of nozzles is increased in order to avoid this, the nozzle diameter must be made smaller accordingly, and as with the slit type, nozzle processing accuracy becomes a problem.
従って前記いずれの方式においても被処理液を低流量化
した場合安定した液膜を形成させることは困難であり、
特に前記蒸発装置の場合は、蒸発管を流下するに従って
液膜は薄くなるので、管の下部付近で液膜の破断が起こ
りやすく、この為通常の慕発装置では蒸発量に対する液
供給量の割合を大きくして液膜の破断が生じにくいよう
にしているが、このように構成すると前記過剰の冷媒が
蒸発装置下部に溜まり、これを循環する為の液循環ポン
プの動力が必然的に大きくなり、システム全体の効率を
低下させている。Therefore, in any of the above methods, it is difficult to form a stable liquid film when the flow rate of the liquid to be treated is reduced.
In particular, in the case of the above-mentioned evaporator, the liquid film becomes thinner as it flows down the evaporation tube, so the liquid film tends to break near the bottom of the tube.For this reason, in a normal evaporator, the ratio of the amount of liquid supplied to the amount of evaporation is is made large to make it difficult for the liquid film to break, but with this configuration, the excess refrigerant will accumulate at the bottom of the evaporator, and the power of the liquid circulation pump to circulate it will inevitably increase. , reducing the overall efficiency of the system.
この為前記蒸発管を一段構成とせずに蒸発管を複数個に
分割してその間に液供給JI41を設けた多段構造の装
置も開発されている(特開昭62−138201号)が
、蒸発管を分断する事は内部に熱源としての水等を流す
事が出来ない為に、いわゆる外周側に熱源としてのスチ
ーム等を接触させる内管式の流下液膜式蒸発装置として
の適用は可能であるが、本発明のように蒸発管外周面に
沿って膜状に被処理液を流す装置への適用は不可能であ
る。For this reason, a device with a multi-stage structure in which the evaporation tube is divided into a plurality of parts and a liquid supply JI41 is provided between them has also been developed (Japanese Patent Application Laid-Open No. 138201/1982), but the evaporation pipe Since it is not possible to flow water, etc. as a heat source into the evaporator by dividing the evaporator, it is possible to apply it as an inner tube type falling film evaporator in which steam, etc. as a heat source is brought into contact with the outer periphery. However, it is impossible to apply this method to an apparatus in which a liquid to be treated flows in a film along the outer peripheral surface of an evaporation tube as in the present invention.
本考案はかかる従来技術の欠点に鑑み、蒸発管に供給さ
れる被処理液の低流量化を図った場合においても、前記
蒸発管の全面に亙って安定しだ液膜を形成し得る流下液
膜式蒸発装置を提供する事を目的とする。In view of the drawbacks of the prior art, the present invention has been developed to provide a flow rate that can form a stable liquid film over the entire surface of the evaporation tube, even when the flow rate of the liquid to be treated to be supplied to the evaporation tube is reduced. The purpose is to provide a liquid film type evaporator.
本発明の他の目的は、蒸発管外周面に沿って膜状に被処
理液を流す装置においても容易に多段構造にする事が出
来、これにより蒸発管を流下途中における液膜の破断を
防止し得る流下液膜式蒸発装置を提供する事を目的とす
る。Another object of the present invention is that it is possible to easily create a multi-stage structure in a device that allows the liquid to be processed to flow in a film along the outer circumferential surface of the evaporation tube, thereby preventing the liquid film from breaking while flowing down the evaporation tube. The purpose of this invention is to provide a falling film type evaporator that can
「課題を解決する為の手段」
本発明は前記ノズル式とスリット式の分配体を効果的に
組み合わせて前記技術的課題を円滑に達成せんとするも
ので、その特徴とする所は第1図及び第2図に示すよう
に、
0複数の蒸発管10を備え、該蒸発管10が外周面に多
数の縦溝10aが形成された蒸発管lOである点の前記
へ発装ご1内に導入された被処理液11を前記各蒸発管
10へ分配する第1の分配体12と、該第lの分配体1
2により分配された被処理液11を蒸発管10周方向へ
分散させる第2の分配体13からなり、前記第2の分配
体13を第1の分配体12の下側に近接して配置させた
液分配機構を設けた点にある。"Means for Solving the Problems" The present invention aims to smoothly achieve the above technical problems by effectively combining the nozzle type and slit type distributors, and its features are shown in Figure 1. As shown in FIG. a first distributor 12 that distributes the introduced liquid to be treated 11 to each of the evaporation tubes 10; and a first distributor 1.
The second distributor 13 is configured to disperse the liquid to be treated 11 distributed by 2 in the circumferential direction of the evaporation tube 10, and the second distributor 13 is disposed close to the lower side of the first distributor 12. The main point is that a liquid distribution mechanism is provided.
尚、好ましくは前記第1の分配体12は、ノズル121
により第2の分配体13上に液噴射を行うノズル式管板
12として、又前記第2の分配体13は蒸発管10の周
囲にスリット空間131を設けたスリット式管板として
構成されるが、必ずしもこれのみに限定されるものでは
ない。Preferably, the first distributor 12 includes a nozzle 121
The second distributor 13 is configured as a nozzle-type tube plate 12 that sprays liquid onto the second distributor 13, and the second distributor 13 is configured as a slit-type tube plate with a slit space 131 provided around the evaporation tube 10. , but is not necessarily limited to this.
「作用」
A、前記したように本発明においては、前記ノズル式と
スリット式の夫々の長所を専用的に利用して、先ず前記
ノズル式管板12により被処理液11を流量規制しなが
ら前記各蒸発管10へ分配した後、該分配された被処理
液11をスリット式管板13により蒸発管10周方向へ
分散させるよう構成した為に、前記被処理液11を低流
量化した場合においても均一な液分配と液膜形成を可能
にしている。"Function" A. As described above, in the present invention, the advantages of the nozzle type and the slit type are utilized exclusively, and the flow rate of the liquid to be treated 11 is regulated by the nozzle type tube plate 12 while the After being distributed to each evaporation tube 10, the distributed liquid to be treated 11 is dispersed in the circumferential direction of the evaporation tube 10 by the slit type tube plate 13, so that when the flow rate of the liquid to be treated 11 is reduced, It also enables uniform liquid distribution and liquid film formation.
言い換えれば本発明は二段階分配構造を採用した為に低
流量化した場合においても、前記効果が円滑に達成し得
るとともに、特に本発明においてはノズル式管板12を
上流側に配置した為に、前記両分起体12.13の長所
を効果的に引き出す事が可能となる。In other words, since the present invention employs a two-stage distribution structure, the above effects can be smoothly achieved even when the flow rate is reduced. , it becomes possible to effectively bring out the advantages of the bipartite bodies 12 and 13.
即ち、ノズル式管板12よりのノズル噴流は従来技術の
ように被処理液11を蒸発管10に付着させるために用
いるのではなく、受は皿として機能する第2の分配体1
3に噴射し所定量供給する事を目的とするものである為
に、ノズル数を多くする必要がなく、蒸発管l〇−本に
つき一層のノズル121で十分であるためにノズル径を
大きくでき、この結果加工がしやすくなり目詰まりの心
配もなくなる。That is, the nozzle jet from the nozzle-type tube plate 12 is not used to attach the liquid to be treated 11 to the evaporation tube 10 as in the prior art, but the receiver is used as a second distributor 1 that functions as a plate.
Since the purpose is to inject and supply a predetermined amount to 3 evaporation tubes, there is no need to increase the number of nozzles, and one nozzle 121 per 10 evaporation tubes is sufficient, so the nozzle diameter can be increased. As a result, processing becomes easier and there is no need to worry about clogging.
又前記ノズル121は受は皿として機能するスリット式
管板13に噴射すればよい為に、傾斜角度を設定する必
要がなく該ノズル121を管板13に垂直に形成する事
が可能となり、この結果ノズル加工精度が緩やかになる
。In addition, since the nozzle 121 only needs to inject onto the slit type tube plate 13 which functions as a tray, there is no need to set an inclination angle and the nozzle 121 can be formed perpendicular to the tube plate 13. As a result, the nozzle processing accuracy becomes loose.
又、受は皿の役目をしているスリット式管板13には過
剰の被処理液11が供給される事がない為に、蒸発管1
0とスリット!31との間の隙間精度を厳しく設定しな
くとも、安定した且つ周方向に均一な液膜形成が容易で
あり、これにより前記効果が円滑に達成し得る。In addition, since excess liquid 11 to be treated is not supplied to the slit type tube plate 13 which serves as a tray, the evaporation tube 1
0 and slit! 31, it is easy to form a stable and uniform liquid film in the circumferential direction, and thereby the above effect can be smoothly achieved.
この場合において本発明の好ましい実施例においては、
前記スリ7) 131周囲を囲繞する如く、管板13の
上面側に環状1g133を設けた為に、ノズル+21
より噴出された被処理液Uを管周方向に円滑に拡げる事
が出来、前記効果が一層向上する。In this case, in a preferred embodiment of the invention:
Said pickpocket 7) Since the annular 1g133 is provided on the upper surface side of the tube plate 13 so as to surround 131, the nozzle +21
The ejected liquid to be treated U can be smoothly spread in the circumferential direction of the pipe, and the above effect is further improved.
又、管板13の下面側にも環状溝!34を設ける事によ
り、スリット131より蒸発管10に付着した被処理液
11の偏在を防ぎ管周方向に広げる役目を果すとともに
、その蒸発管10の一部に液が付着しない状態を防止し
、安定した且つ周方向に均一な液膜形成を一層容易化す
る。Also, there is an annular groove on the bottom side of the tube plate 13! By providing the slit 34, the liquid to be treated 11 attached to the evaporation tube 10 from the slit 131 is prevented from being unevenly distributed and spread in the circumferential direction of the tube, and the liquid is prevented from being attached to a part of the evaporation tube 10. To further facilitate the formation of a stable and circumferentially uniform liquid film.
B、さて上記の方法により、前記スリット式管板13直
下の蒸発管10付近に液膜を形成させることば可能だが
、該液膜は蒸発を伴うため管を流下するに従い液膜が薄
くなり、特に低流量時において液膜の破断が起こりやす
くなる為に前記スリット式管板13直下で形成された液
膜が管全長にわたって維持されるような構造の蒸発管1
0を用いる必要がある。B. By the above method, it is possible to form a liquid film near the evaporation tube 10 directly below the slit type tube plate 13, but since the liquid film accompanies evaporation, the liquid film becomes thinner as it flows down the tube, and especially The evaporator tube 1 has a structure in which the liquid film formed directly below the slit type tube plate 13 is maintained over the entire length of the tube, since the liquid film is likely to break at low flow rates.
It is necessary to use 0.
そこで本発明においては、外周面に多数の縦溝10aが
形成された蒸発管1G(以下フルート管という)を用い
た為に、前記構成要件■によりスリット式管板13直下
でうまく液分配を行いつつ前記全ての縦溝10aに液を
流すことにより、管全長に亙ってかなり低流量域までそ
の状態を保つ事が出来る。Therefore, in the present invention, since the evaporation tube 1G (hereinafter referred to as a flute tube) in which a large number of vertical grooves 10a are formed on the outer circumferential surface is used, the liquid can be successfully distributed directly under the slit-type tube plate 13 according to the above-mentioned component (2). By allowing the liquid to flow through all of the vertical grooves 10a, it is possible to maintain this state over the entire length of the pipe up to a considerably low flow rate region.
かかる場合の液膜は管周方向に均一とはならず、縦溝1
0aの部分で厚く山の部分で薄くなるが、乾き面は生じ
にくい、構成る1つの縦溝10aで例え乾き面が生じて
もまわりの縦溝10aに影響しないので、乾き面が広が
ったり何本かの筋状流れになったりすることもない。In such a case, the liquid film will not be uniform in the circumferential direction of the tube, and the vertical groove 1
It is thick at the 0a part and becomes thinner at the mountain part, but a dry surface is unlikely to occur.Even if a dry surface occurs in one vertical groove 10a, it will not affect the surrounding vertical grooves 10a, so the dry surface will not spread or cause any problems. It doesn't become like a streaky flow.
C9尚、前記蒸発管lOをベア管で形成した場合には、
構造上管10の途中に前記のような管板12°。C9 Furthermore, when the evaporation tube IO is formed of a bare tube,
Structurally, there is a tube plate 12° as described above in the middle of the tube 10.
13’ 、14を設けると液膜が乱れ、好ましくはない
が、前記フルート管を用いて低流量域で使用する場合は
、前記のような管板12’ 、13°、14を取付けた
場合においても液膜の乱れが生じる事がない。Providing the tube plates 12', 13° and 14 as described above disturbs the liquid film, which is not preferable, but when using the flute tube in a low flow range, when the tube plates 12', 13° and 14 as described above are installed, Also, no disturbance of the liquid film occurs.
又前記管板12’、13′、14は中間支持板としても
機能する為に、蒸発管lOのゆれ、たわみを防ぐ事が出
来るとともに、前記一又は複数の管板12’、13°。In addition, since the tube plates 12', 13', and 14 also function as intermediate support plates, they can prevent the evaporator tube lO from wobbling and deflecting, and the one or more tube plates 12', 13 degrees.
14からなる中間分配体を多段状に配置し、該中間分配
体12°、13°、14それぞれに被処理液11が供給
可能に構成する事により前記蒸発を伴って薄くなった液
膜を逐次補給する事が出来、安定且つ均一に形成された
液膜が管全長にわたって維持し、管10下端部付近の液
膜の破断をも防ぐ事が出来る。By arranging intermediate distribution bodies consisting of 14 in a multi-stage manner and configuring the liquid to be treated 11 to be supplied to each of the intermediate distribution bodies 12°, 13°, and 14, the liquid film thinned by the evaporation can be sequentially removed. A stable and uniformly formed liquid film can be maintained over the entire length of the pipe, and breakage of the liquid film near the lower end of the pipe 10 can also be prevented.
D、さて、流下液膜式蒸発装置1は被処理液11が供給
される起動初期においては蒸発管10の周面ば未だ乾い
ているので、−時的に液供給流量を増やして液膜が形成
されやすい状態にする必要がある。D. Now, in the falling liquid film type evaporator 1, the peripheral surface of the evaporation tube 10 is still dry at the initial stage of startup when the liquid to be treated 11 is supplied. It is necessary to create a state where it is easy to form.
そこで本発明の好ましい実施例においては、前記処理液
ポンプ6から蒸発装置1に通じる液管60を分岐させて
、前記ノズル式管板12上とともに前記スリット式管板
13上にも被処理液11を供給可能に構成し、これによ
り起動時においてはノズル式管板12とともにスリット
式管板13上にも被処理液11を送入することによって
簡単に流量を増やすことが出来、前記欠点の解消を図る
事が出来る。Therefore, in a preferred embodiment of the present invention, the liquid pipe 60 leading from the processing liquid pump 6 to the evaporator 1 is branched, and the liquid to be processed is placed on the nozzle type tube plate 12 as well as on the slit type tube plate 13. With this structure, the flow rate can be easily increased by feeding the liquid 11 to be treated onto the slit type tube plate 13 as well as the nozzle type tube plate 12 at the time of startup, thereby eliminating the above-mentioned drawbacks. It is possible to aim for
「実施例」
以下、図面を参照して本発明の好適な実施例を例示的に
詳しく説明する。ただしこの実施例に記載されている構
成部品の寸法、材質、形状、その相対配置などは特に特
定的な記載がない限りは、この発明の範囲をそれのみに
限定する趣旨ではなく、単なる説明例に過ぎない。"Embodiments" Hereinafter, preferred embodiments of the present invention will be described in detail by way of example with reference to the drawings. However, unless otherwise specified, the dimensions, materials, shapes, and relative arrangements of the components described in this example are not intended to limit the scope of this invention, but are merely illustrative examples. It's nothing more than that.
第4図は本発明の実施例に係る流下液膜式蒸発装M1が
組込まれたヒートポンプシステムを示し、公知のように
冷媒の循環経路中に、モータ2に連結されたスクリュー
圧縮機3、凝縮器4、液分離器兼冷媒タンク5.蒸発装
置1が配設され、圧縮機3で圧縮された冷媒11は、凝
縮器4により凝縮液化された後、冷媒タンク5に一旦貯
溜させた後、冷媒液循環ポンプ6により蒸発装置1内に
導入され、該蒸発装置1内で垂直に立設させた蒸発管l
O外周面に沿って膜状に冷媒液が流されながら、その内
部を貫流する水により加熱されて蒸発し、該気化した冷
媒は液分離器兼冷媒タンク5を介して再度前記圧縮y1
3の吸入側に戻入され、方前記蒸発装置1内で未蒸発の
冷媒液及び液分離器5aにより分離された冷媒液は再度
冷媒タンク5に貯溜され、かかるサイクルを繰り返し行
うように構成されている。FIG. 4 shows a heat pump system incorporating a falling film type evaporator M1 according to an embodiment of the present invention, in which a screw compressor 3 connected to a motor 2, a condensing vessel 4, liquid separator and refrigerant tank 5. An evaporator 1 is installed, and a refrigerant 11 compressed by a compressor 3 is condensed and liquefied by a condenser 4, and then stored in a refrigerant tank 5, and then pumped into the evaporator 1 by a refrigerant liquid circulation pump 6. An evaporation tube l introduced and vertically installed in the evaporator 1
While the refrigerant liquid flows in a film shape along the outer peripheral surface, it is heated and evaporated by the water flowing through the inside thereof, and the vaporized refrigerant is passed through the liquid separator and refrigerant tank 5 again to the compression y1.
The unevaporated refrigerant liquid in the evaporator 1 and the refrigerant liquid separated by the liquid separator 5a are stored in the refrigerant tank 5 again, and this cycle is repeated. There is.
次に前記蒸発装置1の内部構成について詳細に説明する
。Next, the internal structure of the evaporator 1 will be explained in detail.
蒸発装置1は上下両端側に水溝出口21と導入口22を
開口した縦形の大径円筒容器20からなり、その内部空
間の上下鏡板部分を仕切板23.24にて仕切り水滞留
室25.28を形成するとともに、該仕切板23.24
に挟まれる中央空間19に、ノズル式管板12とスリッ
ト式管板13からなる一対の管板12−13゜12’−
+3°群を所定間隔存して上下に多段状に配置して、複
数の区画に分割する。The evaporator 1 consists of a vertical large-diameter cylindrical container 20 with a water groove outlet 21 and an inlet 22 opened at both upper and lower ends, and the upper and lower head plate portions of the internal space are partitioned by partition plates 23, 24 to form a water retention chamber 25. 28 and the partition plates 23 and 24
In the central space 19 sandwiched between the
+3° groups are arranged vertically in multiple stages at predetermined intervals to divide into a plurality of sections.
そして更に該分割した区画内を貫通する如く、複数本の
蒸発管lOを中央空間19内に貫設させその両端を前記
水滞留室25.28に開口させる。Furthermore, a plurality of evaporation tubes 10 are installed in the central space 19 so as to penetrate through the divided compartments, and both ends thereof are opened to the water retention chambers 25 and 28.
一方液循環ボンプ6よりの吐出管60は、その先端側を
4木に分岐し、これらの分岐管61〜64を夫々開閉弁
65を介してノズル式管板12上とスリット式管板13
上に開口させる。又スリット式管板13下方空間と冷媒
タンク5の液分離器5a直下位置間には冷媒ガス戻り管
51が、又下側仕切板近傍の中央空間19下端側ど冷媒
タンク5底部間には冷媒液戻り管52が夫々接続されて
いる。On the other hand, the discharge pipe 60 from the liquid circulation pump 6 has its tip branched into four branches, and these branch pipes 61 to 64 are connected to the nozzle-type tube plate 12 and the slit-type tube plate 13 via on-off valves 65, respectively.
Open at the top. A refrigerant gas return pipe 51 is provided between the space below the slit tube plate 13 and a position directly below the liquid separator 5a of the refrigerant tank 5, and a refrigerant gas return pipe 51 is provided between the lower end of the central space 19 near the lower partition plate and the bottom of the refrigerant tank 5. A liquid return pipe 52 is connected to each.
次に第2図及び第3図に基づいて、前記蒸発管lO及び
管板12’、13′、14の構造について詳細に説明す
る。Next, the structure of the evaporator tube 10 and tube plates 12', 13', and 14 will be explained in detail based on FIGS. 2 and 3.
蒸発管10は熱伝導性のよい金属管の軸方向に沿って、
内外周面に均等に多数の縦溝10aが形成されたフルー
ト管で形成されている。The evaporation tube 10 is a metal tube with good thermal conductivity along the axial direction.
It is formed of a flute tube with a large number of vertical grooves 10a evenly formed on the inner and outer circumferential surfaces.
ノズル式管板12は前記蒸発管10の外周囲にきっちり
嵌合可能に構成しつつ、該蒸発管10近傍に垂直に貫通
孔を穿孔して形成したノズル121を利用してノズル式
管板12上に滞留した冷媒をその下方に位置するスリッ
ト式管板13の円形凹部132上に噴射可能に構成して
いる。スリット式管板13は前記蒸発管10外径より僅
かに大なる貫通穴を開口し、蒸発管10周面との間に微
゛小空隙幅のリング状スリット空隙131を形成すると
ともに、該スリット空隙131の外周囲に円形凹部13
2を凹設し、前記ノズル121よりの噴射冷媒を貯溜可
能に形成している。そして該円形凹部132の上下両面
側には断面半円状の環状tR133、134を形成し前
記した作用を営ませる。The nozzle type tube plate 12 is configured to fit tightly around the outer periphery of the evaporation tube 10, and the nozzle type tube plate 12 is constructed using a nozzle 121 formed by perpendicularly perforating a through hole in the vicinity of the evaporation tube 10. The refrigerant accumulated above can be injected onto the circular recess 132 of the slit tube plate 13 located below. The slit-type tube plate 13 has a through hole slightly larger than the outer diameter of the evaporation tube 10, and forms a ring-shaped slit gap 131 with a very small gap width between it and the circumferential surface of the evaporation tube 10. A circular recess 13 is formed around the outer periphery of the void 131.
2 is recessed so that the refrigerant injected from the nozzle 121 can be stored therein. Ring-shaped rings tR133 and 134 having semicircular cross sections are formed on both upper and lower sides of the circular recess 132 to perform the above-described function.
そしてかかる一対の管板12’ 、 13’ を、第1
図に示すように所定間隔存してその下方の中央位置に配
してもよく、又第2図に示すようにスリット空隙+31
のみを有する中間管板14を前記一対の管板12’、1
3°代りに配してもよい。Then, the pair of tube sheets 12' and 13' are
As shown in the figure, it may be arranged at a central position below the predetermined interval, or as shown in Fig. 2, the slit space +31
The intermediate tube sheet 14 having only the pair of tube sheets 12', 1
It may be placed instead of 3 degrees.
次にかかる実施例に基づく動作は既に前記発明の作用の
項で詳説した為に簡単に説明すると、先ず水を蒸発管1
0内に流しながら液循環ポンプ6を駆動させて前記ノズ
ル式管板12上とスリット式管板13上夫々に冷媒11
を供給して一時的に液供給流量を増やし、未だ乾いてい
る蒸発管10周面に均一に液膜を形成する。Next, since the operation based on this embodiment has already been explained in detail in the section of the operation of the invention, it will be briefly explained.
The liquid circulation pump 6 is driven while flowing the refrigerant 11 into the nozzle type tube plate 12 and the slit type tube plate 13 respectively.
is supplied to temporarily increase the liquid supply flow rate to form a uniform liquid film on the still dry peripheral surface of the evaporation tube 10.
そして前記液膜形成後、スリット式管板13上よりの冷
媒11の供給を停止してノズル式管板12上からのみ冷
媒11を供給する事により、前記ノズル121 より冷
媒液11を流量規制しながら前記各蒸発管10周囲に囲
繞したスリット式管板13の円形凹部132に分配する
事が出来、その後該分配された冷媒液を蒸発管10周方
向へ分配させた後、スリット空隙131より蒸発管10
周面側に液膜を形成する事が出来る。尚前記冷媒液11
の流量規制はノズル121 口径とスリット式管板13
上の冷媒液高さHを変化又は選択する事により容易に制
御する事が出来る。After the liquid film is formed, the flow rate of the refrigerant liquid 11 from the nozzle 121 is regulated by stopping the supply of the refrigerant 11 from above the slit type tube plate 13 and supplying the refrigerant 11 only from above the nozzle type tube plate 12. However, the refrigerant liquid can be distributed to the circular concave portion 132 of the slit type tube plate 13 surrounding each evaporation tube 10, and after that, the distributed refrigerant liquid is distributed in the circumferential direction of the evaporation tube 10, and then evaporated from the slit gap 131. tube 10
A liquid film can be formed on the peripheral surface. Note that the refrigerant liquid 11
The flow rate is regulated by the nozzle 121 diameter and slit type tube plate 13
It can be easily controlled by changing or selecting the upper refrigerant liquid height H.
そして本実施例においては前記と同様な管板12’、+
3’、群又はスリット空隙131を有する中間管板14
により多段構造を取っており且つ該中間管板12°、1
3°、14それぞれに冷媒液を供給可能に構成した為に
、各段毎に未蒸発の冷媒の際滞留とともに、前記蒸発を
伴って薄くなった液膜を逐次補給する事が出来、安定且
つ均一に形成された液膜が管lO全全長わたって維持す
る事が出来る。In this embodiment, tube sheets 12', +
3', intermediate tube sheet 14 with group or slit cavities 131;
It has a multi-stage structure, and the intermediate tube plate 12°, 1
Since the refrigerant liquid is configured to be able to be supplied to each stage, it is possible to sequentially replenish the liquid film that has become thin due to the evaporation, as well as the unevaporated refrigerant remaining at each stage, making it possible to maintain a stable and A uniformly formed liquid film can be maintained over the entire length of the tube.
「効果」
以上記載した如く本発明によれば、二段階分配構造と縦
溝付きフルート管を組み合せることによって、低流量化
した場合においても均一な液分配と液膜形成を可能し、
これにより余分な冷媒液を供給することがないので液循
環ポンプの動力を低減させ、かつ伝熱性能を向上させる
ことが可能となる。"Effects" As described above, according to the present invention, by combining the two-stage distribution structure and the fluted flute tube, uniform liquid distribution and liquid film formation are possible even at low flow rates.
This eliminates the need to supply excess refrigerant liquid, making it possible to reduce the power of the liquid circulation pump and improve heat transfer performance.
又縦溝付の蒸発管を用いる事は蒸発表面積が拡がりその
分蒸発管の設置本数が減るので省スペースとなる。Furthermore, the use of vertically grooved evaporation tubes expands the evaporation surface area and reduces the number of evaporation tubes installed, resulting in space savings.
特に本発明は、縦溝付の蒸発管を用いて低流量域で使用
する事により蒸発管外周面に沿って膜状に冷媒液を流す
装置においても容易に多段構造にする事が出来、これに
より蒸発管を流下途中における液膜の破断を防止し得る
のみならず、蒸発管の揺動や撓み等をも防止出来る。In particular, by using a vertically grooved evaporator tube in a low flow rate range, the present invention can easily have a multi-stage structure even in a device that flows a refrigerant liquid in a film along the outer circumferential surface of the evaporator tube. This not only prevents the liquid film from breaking while flowing down the evaporation tube, but also prevents the evaporation tube from shaking or bending.
又部1の分配体と第2の分配体からなる液分配機構を用
いて多段構造にする事は、各分配機構段階で液をホール
ドし再分配する形なので、上部で偏った液分配が行われ
ても、次の段で均一化できる等の効果も派生する。Furthermore, using a multi-stage structure using a liquid distribution mechanism consisting of the first distribution body and the second distribution body means that the liquid is held and redistributed at each stage of the distribution mechanism, so that liquid distribution is unevenly distributed at the top. Even if the temperature is lowered, the next stage can achieve uniformity and other effects.
等の種々の著効を有す。It has various effects such as
第1図乃至第4図はいずれも本発明の実施例に係る蒸発
装置を示し、第1図は全体図、第2図は内部の要部詳細
図、第3図は、第2図の横断面図、第4図は前記蒸発器
を用いたヒートポンプシステムの全体概略図である。
特許出願人:株式会社前川製作所1 to 4 each show an evaporator according to an embodiment of the present invention, FIG. 1 is an overall view, FIG. 2 is a detailed view of the main internal parts, and FIG. 3 is a cross-sectional view of FIG. 2. The plan view and FIG. 4 are overall schematic diagrams of a heat pump system using the evaporator. Patent applicant: Maekawa Seisakusho Co., Ltd.
Claims (1)
て膜状に被処理液を流しながら、該被処理液の少なくと
も一部を蒸発可能に構成した流下液膜式蒸発装置におい
て、外周面に多数の縦溝が形成された複数の蒸発管と、
前記蒸発装置内に導入された被処理液を前記各蒸発管へ
分配する第1の分配体と、該第1の分配体により分配さ
れた被処理液を蒸発管周方向へ分散させる第2の分配体
とを有し、前記第2の分配体を第1の分配体の下側に近
接して配置させた事を特徴とする流下液膜式蒸発装置 2)請求項1)記載の流下液膜式蒸発装置において、被
処理液ポンプから蒸発装置に通じる液管を分岐させて、
前記第1の分配体上とともに前記第2の分配体上にも被
処理液が供給可能に構成した事を特徴とする流下液膜式
蒸発装置 3)請求項1)又は2)記載の流下液膜式蒸発装置にお
いて、前記蒸発装置内に立設する蒸発管に少なくとも前
記第2の分配体の下方に一又は複数の中間分配体を所定
間隔存して配置し、該中間分配体上の夫々に被処理液が
供給可能に構成した事を特徴とする流下液膜式蒸発装置 4)前記第1の分配体がノズルにより第2の分配体上に
液噴射を行うノズル式管板であり、前記第2の分配体が
蒸発管の周囲にスリット空間を設けたスリット式管板で
ある請求項1)、2)若しくは3)記載の流下液膜式蒸
発装置 5)請求項4)記載の流下液膜式蒸発装置において、前
記スリット式管板のスリット周囲を囲繞する如く、管板
の上下両面側に環状溝を設けた事を特徴とする流下液膜
式蒸発装置[Scope of Claims] 1) A flow-down system configured to allow at least a portion of the liquid to be evaporated while flowing the liquid to be treated in a film form along the outer peripheral surface of the evaporation tube vertically installed in the evaporation container. In a liquid film evaporator, a plurality of evaporation tubes each having a large number of vertical grooves formed on the outer circumferential surface;
a first distribution body that distributes the liquid to be treated introduced into the evaporator to each of the evaporation tubes; and a second distribution body that disperses the liquid to be treated distributed by the first distribution body in the circumferential direction of the evaporation tube. 2) A falling liquid film type evaporator according to claim 1), characterized in that the second distributor is disposed close to the lower side of the first distributor. In a film evaporator, the liquid pipe leading from the liquid pump to the evaporator is branched,
3) A falling liquid according to claim 1) or 2), characterized in that the liquid to be treated can be supplied onto the second distribution body as well as on the first distribution body. In the film-type evaporator, one or more intermediate distributors are disposed at a predetermined interval at least below the second distributor in the evaporator pipe installed vertically in the evaporator, and each intermediate distributor on the intermediate distributor 4) A falling liquid film type evaporator characterized in that the liquid to be treated can be supplied to the liquid to be treated. 5) The falling liquid film type evaporator according to claim 1), 2) or 3), wherein the second distributor is a slit type tube plate having a slit space around the evaporation tube.5) The falling liquid film type evaporator according to claim 4) A falling liquid film type evaporator characterized in that an annular groove is provided on both upper and lower sides of the tube plate so as to surround the slit of the slit type tube plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63299515A JP2764174B2 (en) | 1988-11-29 | 1988-11-29 | Falling liquid film evaporator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63299515A JP2764174B2 (en) | 1988-11-29 | 1988-11-29 | Falling liquid film evaporator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02180601A true JPH02180601A (en) | 1990-07-13 |
| JP2764174B2 JP2764174B2 (en) | 1998-06-11 |
Family
ID=17873588
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63299515A Expired - Fee Related JP2764174B2 (en) | 1988-11-29 | 1988-11-29 | Falling liquid film evaporator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2764174B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104784949A (en) * | 2015-04-02 | 2015-07-22 | 沈阳航空航天大学 | Special-shaped falling-film evaporation tube |
| CN106582051A (en) * | 2017-02-09 | 2017-04-26 | 江苏永益环保科技有限公司 | Evaporator and evaporating system applying same |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57500139A (en) * | 1980-01-24 | 1982-01-28 |
-
1988
- 1988-11-29 JP JP63299515A patent/JP2764174B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57500139A (en) * | 1980-01-24 | 1982-01-28 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104784949A (en) * | 2015-04-02 | 2015-07-22 | 沈阳航空航天大学 | Special-shaped falling-film evaporation tube |
| CN106582051A (en) * | 2017-02-09 | 2017-04-26 | 江苏永益环保科技有限公司 | Evaporator and evaporating system applying same |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2764174B2 (en) | 1998-06-11 |
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