JPH02183441A - Optical disk - Google Patents
Optical diskInfo
- Publication number
- JPH02183441A JPH02183441A JP1001249A JP124989A JPH02183441A JP H02183441 A JPH02183441 A JP H02183441A JP 1001249 A JP1001249 A JP 1001249A JP 124989 A JP124989 A JP 124989A JP H02183441 A JPH02183441 A JP H02183441A
- Authority
- JP
- Japan
- Prior art keywords
- film
- oxide
- reflective film
- reflecting films
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 31
- 239000000758 substrate Substances 0.000 claims abstract description 24
- 230000001681 protective effect Effects 0.000 claims abstract description 8
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000000395 magnesium oxide Substances 0.000 claims abstract description 7
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims abstract description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 6
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 238000005260 corrosion Methods 0.000 abstract description 13
- 230000007797 corrosion Effects 0.000 abstract description 13
- 238000000034 method Methods 0.000 abstract description 6
- 238000007740 vapor deposition Methods 0.000 abstract description 6
- 238000005530 etching Methods 0.000 abstract description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 2
- 239000001301 oxygen Substances 0.000 abstract description 2
- 229910052760 oxygen Inorganic materials 0.000 abstract description 2
- 229910052814 silicon oxide Inorganic materials 0.000 abstract description 2
- 238000004544 sputter deposition Methods 0.000 abstract description 2
- 230000002950 deficient Effects 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 238000010030 laminating Methods 0.000 abstract 1
- 229910052749 magnesium Inorganic materials 0.000 abstract 1
- 239000011777 magnesium Substances 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 239000010936 titanium Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 64
- 238000001746 injection moulding Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229920005668 polycarbonate resin Polymers 0.000 description 4
- 239000004431 polycarbonate resin Substances 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野1
本発明は、CD−ROM等に用いられる光ディスクに関
するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application 1] The present invention relates to an optical disc used in a CD-ROM or the like.
[従来の技術]
近年、コンパクトディスクにコンピュータ用のデジタル
情報を記録した光ディスク、いわゆるCD−ROMが普
及してきてあり、文献情報の検索等に盛んに利用されて
きているが、このCD−ROMは基本的にはコンパクト
ディスクと同じ構造を有している。[Prior Art] In recent years, optical discs in which digital information for computers is recorded on compact discs, so-called CD-ROMs, have become popular, and are being actively used for searching for literature information. Basically, it has the same structure as a compact disc.
第2図は従来の光ディスクを半径方向に切断した断面図
である。第2図に示すように、ポリカーボネート等の熱
可塑性樹脂からなる透明基板1の表面には、符号化され
た記録情報に対応する凹凸パターンが形成され、この凹
凸パターンの形成された透明基板1の表面には、蒸着法
等によりAβ等の反射率の高い金属からなる反eA膜2
および保護膜4が順次積層された構造となっている。FIG. 2 is a radial cross-sectional view of a conventional optical disc. As shown in FIG. 2, a concavo-convex pattern corresponding to encoded recorded information is formed on the surface of a transparent substrate 1 made of thermoplastic resin such as polycarbonate. On the surface, an anti-eA film 2 made of a metal with high reflectivity such as Aβ is formed by vapor deposition or the like.
and a protective film 4 are sequentially laminated.
ここで、前述した凹凸パターンを有する透明基板1の形
成は通常射出成形法を用いて行われる。Here, the formation of the transparent substrate 1 having the above-mentioned uneven pattern is usually performed using an injection molding method.
この射出成形法は、例えば、真利藤雄、林謙二共著rC
Dプレーヤ入門」第25頁(コロナ社、1983年)に
開示されているように、マスタリングプロセスを経て形
成されたマザースタンパに、軟化させたポリカーボネー
ト樹脂を射出し、前記ポリカーボネート樹脂が硬化した
後、マザースタンパから剥離し、マザースタンパの凹凸
パターンを射出したポリカーボネート樹脂上に転写して
、凹凸パターンを有する基板を形成する方法である。This injection molding method is, for example, co-authored by Fujio Mari and Kenji Hayashi.
As disclosed in "Introduction to D Player", page 25 (Corona Publishing, 1983), softened polycarbonate resin is injected into a mother stamper formed through a mastering process, and after the polycarbonate resin is hardened, In this method, the mother stamper is peeled off and the uneven pattern of the mother stamper is transferred onto the injected polycarbonate resin to form a substrate having an uneven pattern.
[発明が解決しようとする課題1
しかしながら、上述した従来の光ディスクにおいては、
以下に述べるような問題点があった。即ら、基板表面に
形成する凹凸パターンは通常、幅0.47#II前後、
長さ0.9〜3.3tmの極めて微細な凹凸パターンで
あり、このため凹凸パターンを割出成形法を用いてマザ
ースタンパからポリカーボネート樹脂製の透明基板1に
転写する際に、凹凸パターンの欠け、突起、パリ等が発
生することがあり、光ディスクの製造工程上大きな問題
となっていた。特に、CD−ROMの場合には、従来の
コンパクトディスクに較べて格段の信頼性か求められて
いることから、前述の問題点をいかに解決するかが、大
きな課題となっているのが現状である。[Problem to be solved by the invention 1 However, in the above-mentioned conventional optical disc,
There were problems as described below. That is, the uneven pattern formed on the substrate surface usually has a width of about 0.47#II,
It is an extremely fine uneven pattern with a length of 0.9 to 3.3 tm, and therefore, when transferring the uneven pattern from the mother stamper to the transparent substrate 1 made of polycarbonate resin using the index molding method, the uneven pattern may be chipped. , protrusions, cracks, etc. may occur, which has been a major problem in the manufacturing process of optical discs. In particular, CD-ROMs are required to be far more reliable than conventional compact discs, so the current challenge is how to solve the above-mentioned problems. be.
また、既に述べたように、従来の光ディスクでは、反射
膜2は凹凸パターンを有する透明基板1の上の全面に形
成される。ところで、本発明者らの検討によれば、凹凸
パターン上に成膜された反射膜2と透明基板1との密着
不良(反射膜2の透明基板1からの浮き上がり)の殆ど
が、凹凸パターンの凹部と凸部の境界で発生することが
明らかとなった。更に、従来構造のCD−ROMを長時
間放置した時の反射膜2の腐食発生箇所を評価した結果
、やはり凹凸パターンの凹部と凸部の境界を中心として
、反射llA2の腐食が多く発生することが明らかとな
った。Furthermore, as already mentioned, in the conventional optical disc, the reflective film 2 is formed on the entire surface of the transparent substrate 1 having a concavo-convex pattern. By the way, according to the studies of the present inventors, most of the poor adhesion between the reflective film 2 formed on the uneven pattern and the transparent substrate 1 (lifting of the reflective film 2 from the transparent substrate 1) is caused by the uneven pattern. It has become clear that this phenomenon occurs at the boundary between concavities and convexities. Furthermore, as a result of evaluating the locations where corrosion occurred on the reflective film 2 when a conventionally structured CD-ROM was left for a long time, it was found that much corrosion of the reflective layer 2A2 occurred mainly at the boundaries between the concave and convex portions of the concavo-convex pattern. became clear.
このような、反射膜2の密着不良あるいは腐食は、当然
のことながら光ディスクの信頼性を著しく損なうもので
あり、前述の射出成形時の突起、パリ等の問題と同様、
大きな問題となっている。Such poor adhesion or corrosion of the reflective film 2 naturally seriously impairs the reliability of the optical disc, and is similar to the aforementioned problems such as protrusions and cracks during injection molding.
This has become a big problem.
この反射膜の密着不良・腐食の問題の改善も、より高い
信頼性を求められるCD−ROMにとっては、極めて重
要な問題と言える。このような反射膜の密着不良や腐食
の発生原因は、未だ不明な点も多いが、密着不良の一因
は凹部と凸部の境界での応力集中により反則膜が大きな
力を受けるためと考えられる。また、反射膜の腐食につ
いては、凹部と凸部の境界で反射膜の膜質が劣化するこ
と、密着不良の場合と同様に、応力集中により、いわゆ
る応力腐食が起こり、腐食か促進されることが原因と考
えられる。。Improving the problem of poor adhesion and corrosion of the reflective film is also an extremely important problem for CD-ROMs, which require higher reliability. The causes of poor adhesion and corrosion of the reflective film are still largely unknown, but one reason for the poor adhesion is thought to be that the reflective film is subjected to a large force due to stress concentration at the boundary between the concave and convex portions. It will be done. Regarding corrosion of the reflective film, the film quality of the reflective film deteriorates at the boundary between concave and convex parts, and as in the case of poor adhesion, so-called stress corrosion occurs due to stress concentration, which accelerates corrosion. This is thought to be the cause. .
本発明は、以上述べたような従来の問題点を解決するた
めになされたもので、反射膜における密着不9や腐食発
生がなく、高い信頼性を有すると共に、パターン化され
た反射膜以外の領域での不要な反射を抑制し、S/N比
の高い光ディスクを提供することを目的とする。The present invention has been made in order to solve the conventional problems as described above, and has high reliability without adhesion failure 9 or corrosion in the reflective film, and is suitable for use with other than patterned reflective films. It is an object of the present invention to provide an optical disc with a high S/N ratio by suppressing unnecessary reflection in the area.
[課題を解決するための手段]
本発明は、透明円板状基板上に、所定のデジタル情報に
対応した金属膜パターンよりなる反射膜と、酸化マグネ
シウムまたは酸化チタニウムのうち少なくとも一種から
なる酸化物膜と、保護膜とが順次積層されてなることを
特徴とする光ディスクである。[Means for Solving the Problems] The present invention provides a reflective film made of a metal film pattern corresponding to predetermined digital information, and an oxide made of at least one of magnesium oxide or titanium oxide, on a transparent disc-shaped substrate. The optical disc is characterized in that a film and a protective film are sequentially laminated.
本発明において、所定のデジタル情報に対応した金属膜
パターンは、円板状の透明基板の上に金属膜からなる反
射膜を成膜した後、この反射膜を選択的にエツチングす
ることによって形成することができる。In the present invention, a metal film pattern corresponding to predetermined digital information is formed by forming a reflective film made of a metal film on a disc-shaped transparent substrate and then selectively etching this reflective film. be able to.
[作用1
本発明では、平坦な表面を有する円板状の透明基板の上
に、所定のデジタル情報に対応した金属膜パターンが形
成されている。このため従来の光ディスクで問題となっ
ていた凹凸パターンの凹部と凸部の境界における反射膜
の密着不良や腐食の問題が生じることがない。[Operation 1] In the present invention, a metal film pattern corresponding to predetermined digital information is formed on a disk-shaped transparent substrate having a flat surface. Therefore, the problems of poor adhesion and corrosion of the reflective film at the boundaries between the concave and convex portions of the concavo-convex pattern, which have been problems with conventional optical discs, do not occur.
また、本発明者らの検討によれば酸化マグネシウムない
しは酸化ヂタニウム薄膜(膜厚はいずれも0.5〜1.
0tIIri)は、光デイスク装置の再生に用いられる
レーザ光の通常の波長領域、例えば波長780nmのレ
ーザ光に対する反射率が10〜20%と極めて小ざなも
のであった。従って、これらの酸化物の双方もしくはい
ずれか一方からなる酸化物膜を、前述したパターン化さ
れた反射膜を含む透明基板表面上に設けることによって
、前記反射膜の存在しない領域での不必要な反射を抑制
することが可能となり、高いS/Nを有する光ディスク
が実現される。Also, according to the studies of the present inventors, magnesium oxide or ditanium oxide thin films (all film thicknesses are 0.5 to 1.5 mm thick).
0tIIri) had an extremely small reflectance of 10 to 20% for laser light in the normal wavelength range of laser light used for reproduction in optical disk devices, for example, laser light with a wavelength of 780 nm. Therefore, by providing an oxide film made of either or both of these oxides on the surface of the transparent substrate containing the patterned reflective film described above, unnecessary unnecessary noise can be removed in areas where the reflective film does not exist. It becomes possible to suppress reflections, and an optical disc with a high S/N ratio is realized.
[実施例] 以下、図面を参照して本発明の詳細な説明する。[Example] Hereinafter, the present invention will be described in detail with reference to the drawings.
第1図は本発明の一実施例の光ディスクを半径方向に切
断した断面図である。第1図に示す光ディスクの製造方
法は、まず強化ガラスからなる透明基板1の上にAIl
膜を0.15tJ!nの厚さに成膜する。Af!膜の成
膜には電子ビーム蒸着法を用い、その蒸着条件は到達真
空度3 x 10−7 Torr 、エミッション電流
85 mA、蒸着時の基板温度70°Cとした。次いで
、デジタル情報に対応したパターンを有するフォトレジ
スト膜を前記の八で膜上に形成し、前記フォトレジスト
膜をマスクとして前記へで膜をイオンエツチングにより
除去して、反射膜3を形成する。その後、フォトレジス
ト膜を右前溶媒あるいは酸素アッシングにより除去する
。FIG. 1 is a radial cross-sectional view of an optical disk according to an embodiment of the present invention. The method for manufacturing the optical disc shown in FIG.
0.15tJ of membrane! A film is formed to a thickness of n. Af! The electron beam evaporation method was used to form the film, and the evaporation conditions were an ultimate vacuum of 3 x 10-7 Torr, an emission current of 85 mA, and a substrate temperature of 70°C during the evaporation. Next, a photoresist film having a pattern corresponding to the digital information is formed on the film in step 8 above, and the reflective film 3 is removed by ion etching using the photoresist film as a mask. Thereafter, the photoresist film is removed by solvent or oxygen ashing.
次いで、酸素ガス中の反応性蒸着法によりliまたはM
CIを蒸着して酸化チタニウムまたは酸化マグネシウム
のいずれかよりなる酸化物膜5を前記反則膜3を含む透
明基板1表面全面にわたつて成膜する。酸化物の成膜条
件は到達真空度3x10−7 Torr 、蒸着時に導
入した酸素ガス圧力はl x 10−5 Torrであ
り、使用したるつぼは白金製ポートで、通電電流は2A
である。また、蒸着時の基板温度は70’Cとし、酸化
物膜5の膜厚は0.5〜1.0庫とした。Li or M is then deposited by reactive vapor deposition in oxygen gas.
An oxide film 5 made of either titanium oxide or magnesium oxide is formed over the entire surface of the transparent substrate 1 including the fouling film 3 by evaporating CI. The conditions for forming the oxide film were an ultimate vacuum of 3 x 10-7 Torr, an oxygen gas pressure of 1 x 10-5 Torr during vapor deposition, a platinum port in the crucible, and a current of 2 A.
It is. Further, the substrate temperature during vapor deposition was 70'C, and the film thickness of the oxide film 5 was 0.5 to 1.0 degrees centigrade.
その俊、酸化珪素膜からなる保護膜6を酸化物膜5上に
成膜する。保護膜6の成膜にはスパッタリング法を用い
、その成膜条件はArガス圧力5X10−3 Torr
、投入電力400Wで、成膜した膜厚は2卯である。At that time, a protective film 6 made of a silicon oxide film is formed on the oxide film 5. A sputtering method is used to form the protective film 6, and the film forming conditions are Ar gas pressure of 5 x 10-3 Torr.
, the thickness of the film formed was 2 μm with an input power of 400 W.
以上のようにして得られた光ディスクでは、微細な凹凸
パターンを射出成形法で透明基板1の上に形成する必要
が無いため、従来技術におけるような削出成形時の凹凸
パターンの欠け、突起、パリ等の発生という問題点は解
決し、光デイスク製造工程での歩留まりが大幅に向上し
た。また、平坦な基板面上にパターン化した反射膜を形
成覆る構造であるため、従来の光ディスクで問題となっ
ていた凹凸パターンの凹部と凸部の境界での反則膜の密
着不良や腐食の発生も見られなかった。In the optical disc obtained as described above, there is no need to form a fine concavo-convex pattern on the transparent substrate 1 by injection molding, so that chips, protrusions, etc. The problem of the occurrence of dust particles has been solved, and the yield rate in the optical disk manufacturing process has been significantly improved. In addition, since the patterned reflective film is formed and covered over a flat substrate surface, poor adhesion and corrosion of the reflective film at the boundaries between the concave and convex parts of the concave-convex pattern, which were problems with conventional optical discs, occur. I couldn't see either.
更に、本実施例による光ディスクのS/Nを測定したと
ころ、従来構造の光ディスクのS/Nに比較して約1.
6倍の高いS/Nを示し、酸化チタニウムあるいは酸化
マグネシウムよりなる酸化物膜5を形成しなかった以外
は本実施例と同一の構造を持つ光ディスクに比較しても
約1.3倍の高いS/Nを示した。Furthermore, when the S/N of the optical disc according to this embodiment was measured, it was found that the S/N of the optical disc of the conventional structure was about 1.
The S/N ratio is 6 times higher, and is about 1.3 times higher than that of an optical disk having the same structure as this example except that the oxide film 5 made of titanium oxide or magnesium oxide was not formed. S/N is shown.
このように、本発明による光ディスクは、従来の光ディ
スクに比較して高い信頼性を有し、コンピュータ用のデ
ジタル情報を記録するCD−ROMとして優れた特性を
具備することが確認された。As described above, it was confirmed that the optical disc according to the present invention has higher reliability than conventional optical discs and has excellent characteristics as a CD-ROM for recording digital information for a computer.
また、それと同時に、従来構造の光ディスクあるいは酸
化物膜5を形成しなかった場合に比較して、高いS/N
を持つことが確認された。At the same time, it also has a higher S/N than an optical disk with a conventional structure or a case where the oxide film 5 is not formed.
It was confirmed that it has.
なあ、上記の実施例では反射膜3の材料としてAl膜を
用いたが、他の高反射率材料、例えばAU、Act、T
a、TiN、ZrN等を用いても良い。また、実施例中
では酸化物膜5として、酸化マグネシウムあるいは酸化
チタニウムを単独に形成した例のみを述べたが、これら
を混合したもの、あるいは積層したものを酸化物膜5と
して使用しても良い。Incidentally, in the above embodiment, an Al film was used as the material for the reflective film 3, but other high reflectance materials such as AU, Act, T
a, TiN, ZrN, etc. may also be used. Further, in the embodiments, only examples in which magnesium oxide or titanium oxide were formed alone as the oxide film 5 were described, but a mixture or a stack of these may be used as the oxide film 5. .
[発明の効果]
膜をエツチングによってパターン化することによりデジ
タル情報を記録するため、従来割出成形時に多く発生し
ていた凹凸パターンの欠け、突起、パリ等の問題は解決
し、光デイスク製造工程での歩留まりが大幅に向上する
。[Effects of the invention] Since digital information is recorded by patterning the film by etching, problems such as chipping of uneven patterns, protrusions, and cracks that often occurred during conventional index molding are solved, and the optical disk manufacturing process is improved. The yield is significantly improved.
また、基板上に予め形成された凹凸パターン上に反射膜
を成膜する必要が無いため、従来凹凸パターンの凹部と
凸部の境界で発生していた反射膜の密着不良や腐食を抑
制することが可能となり、高い信頼性を持つ光ディスク
が実現される。In addition, since there is no need to form a reflective film on the uneven pattern previously formed on the substrate, poor adhesion and corrosion of the reflective film that conventionally occur at the boundaries between the concave and convex parts of the uneven pattern can be suppressed. This makes it possible to realize a highly reliable optical disc.
更に、光デイスク装置の再生に用いられる波長領域のレ
ーザ光に対して反射率が極めて小さな酸化物膜を前記反
射膜を含む透明基板の表面上に成膜することにより、前
述したパターン化された反tJr1膜の存在しない領域
での不必要な反則を抑制することが可能となり、高いS
/Nを有する光ディスクが実現される。Furthermore, by forming an oxide film with an extremely low reflectance for laser light in the wavelength range used for reproduction of optical disk devices on the surface of the transparent substrate containing the reflective film, the patterned It becomes possible to suppress unnecessary fouling in areas where the anti-tJr1 film does not exist, resulting in high S
/N is realized.
第1図は本発明の一実施例による光ディスクの半径方向
の断面図、第2図は従来の光ディスクの半径方向の断面
図である。
1・・・透明基板
2.3・・・反射膜
4.6・・・保護膜
5・・・酸化物膜FIG. 1 is a radial sectional view of an optical disc according to an embodiment of the present invention, and FIG. 2 is a radial sectional view of a conventional optical disc. 1... Transparent substrate 2.3... Reflective film 4.6... Protective film 5... Oxide film
Claims (1)
した金属膜パターンよりなる反射膜と、酸化マグネシウ
ムまたは酸化チタニウムのうち少なくとも一種からなる
酸化物膜と、保護膜とが順次積層されてなることを特徴
とする光ディスク。(1) A reflective film made of a metal film pattern corresponding to predetermined digital information, an oxide film made of at least one of magnesium oxide or titanium oxide, and a protective film are sequentially laminated on a transparent disc-shaped substrate. An optical disc characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1001249A JPH02183441A (en) | 1989-01-09 | 1989-01-09 | Optical disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1001249A JPH02183441A (en) | 1989-01-09 | 1989-01-09 | Optical disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02183441A true JPH02183441A (en) | 1990-07-18 |
Family
ID=11496174
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1001249A Pending JPH02183441A (en) | 1989-01-09 | 1989-01-09 | Optical disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02183441A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08180457A (en) * | 1994-12-27 | 1996-07-12 | Nec Corp | Optical disk and its manufacture |
-
1989
- 1989-01-09 JP JP1001249A patent/JPH02183441A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08180457A (en) * | 1994-12-27 | 1996-07-12 | Nec Corp | Optical disk and its manufacture |
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