JPH02187604A - Light receiving position detection device - Google Patents
Light receiving position detection deviceInfo
- Publication number
- JPH02187604A JPH02187604A JP674589A JP674589A JPH02187604A JP H02187604 A JPH02187604 A JP H02187604A JP 674589 A JP674589 A JP 674589A JP 674589 A JP674589 A JP 674589A JP H02187604 A JPH02187604 A JP H02187604A
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- Japan
- Prior art keywords
- light
- optical system
- light receiving
- measured
- detected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Measurement Of Optical Distance (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
Description
【発明の詳細な説明】
「産業上の利用分野」
本発明は、被測定物からの反射光の受光位置を検出する
受光位置検出装置に係わり、特に、反射光を透過率自動
可変フィルタを介して受光素子で検出する二とにより、
精度の高い測定を行うことのできる受光位置検出装置に
関するものである、「従来の技術」
従来、光学的に被計測物体の空間的な位置座標を計測す
る装置としては、電子的な走査による固体撮像素子を利
用したものや、ミラー、レティクル等の機械的走査によ
る計測装置か存在していた。Detailed Description of the Invention "Field of Industrial Application" The present invention relates to a light receiving position detection device that detects the receiving position of reflected light from an object to be measured. By detecting it with a light receiving element,
"Conventional technology" that relates to a light receiving position detection device that can perform highly accurate measurements. There were measurement devices that used image sensors and mechanical scanning such as mirrors and reticles.
しかしながら、これらの走査方式は、検出速度が走査速
度により決定してしまうという問題点がありな7そこて
゛画像の走査を行わずに、照射された入射光の位置を検
出することのできる半導体装置検出器が開発された。そ
して被検面に対して光を照射させ、二の反射光を半導体
装置検出器で受光することにより、位置を検出すること
ができる受光位置検出装置が実現しな、二の受光位置検
出装置は、f?IILば第7図(a)に示す様な光テコ
方式や、第7図(b)に示す様な非点収差方式が存在し
ていた、第7図(a)に示す光テコ方式は、し−ザーダ
イオードやヘリウム−ネオンレーザ−LED等の発光素
子からレーザー光、赤外線光等を放射させ、このレーザ
ー光線等を適宜の反射部材で反射させ、被測定物の被検
面に対して斜めに照射させる9この被検面で反射された
反射光は、適宜の反射部材で反射され、コンデンサレン
ズ等で平行光束にされた後、半導体装置検出器(PSD
)等の受光素子に導かれる様になっている5この半導体
装置検出器(PSD)が反射光の位置を検出し、被検面
の位置を測定することができる。However, these scanning methods have the problem that the detection speed is determined by the scanning speed. A device was developed. Then, a light receiving position detecting device that can detect the position by irradiating light onto the surface to be inspected and receiving the second reflected light with a semiconductor device detector has been realized.The second light receiving position detecting device is , f? In IIL, there was an optical lever method as shown in FIG. 7(a) and an astigmatism method as shown in FIG. 7(b).The optical lever method shown in FIG. 7(a) is Laser light, infrared light, etc. are emitted from a light-emitting element such as a laser diode or a helium-neon laser/LED, and this laser beam is reflected by an appropriate reflective member and is emitted diagonally to the surface of the object to be measured. Irradiate 9 The reflected light reflected from this test surface is reflected by an appropriate reflecting member, and after being converted into a parallel light beam by a condenser lens etc., it is sent to a semiconductor device detector (PSD).
) etc. 5 This semiconductor device detector (PSD) detects the position of the reflected light and can measure the position of the surface to be inspected.
更に第7図(b)に示す非点収差方式は、発光素子から
放射されたレーザー光等を、透過反射面とコンデンサレ
ンズとを介して、被測定物の被検面に対して鉛直に照射
させる。この被検面で反射された反射光は、透過反射面
で反射され、4分割の受光素子を有する半導体装置検出
器に導かれる様に構成されている。Furthermore, the astigmatism method shown in Fig. 7(b) irradiates laser light etc. emitted from a light emitting element vertically onto the surface of the object to be measured via a transmissive reflective surface and a condenser lens. let The reflected light reflected by this test surface is reflected by a transmissive reflective surface, and is configured to be guided to a semiconductor device detector having a four-divided light-receiving element.
「発明が解決しようとする課題」
しかしながら、上記従来の受光位置検出装置は、被検面
が均一な反射率を有するか、或は、被検面か一定のパタ
ーンを持つことが粂件とされており。``Problems to be Solved by the Invention'' However, the conventional light-receiving position detection device described above requires that the surface to be detected have a uniform reflectance or a certain pattern. I'm here.
反射率の異なる境界面等では、精度よく測定することが
できないという問題点があった9例えば、種々の材料か
らfllflilMされている半導体ウェハが被検物で
ある場合には、高精度の測定が期待できないといつ深刻
な問題があった 即ち、半導体ウェハは、内部導線には
主にアルミニュムが使用されており、外部との接続線に
は金が用いられている。There was a problem that accurate measurements could not be made at interfaces with different reflectances.9 For example, when the test object is a semiconductor wafer made of various materials, it is difficult to measure with high precision. There was a serious problem when expectations were not met.In other words, in semiconductor wafers, aluminum is mainly used for internal conductive wires, and gold is used for external connection wires.
そして、ウェハ上の半導体も複数種類の材料から形成さ
れているので、ウェハ上の反射率は部分的に異なってお
り、特に、境界面では精度のよい測定ができないという
問題点があった、
「課題を解決するための手段」
本発明は上記課題に鑑み案出されたもので、光の透過又
は反射率が部分的に異なる被測定物を測定するための測
定装置であって、被測定物に向けて光を照射する投光光
学部と、前記被測定物からの光を受光面上に導くための
受光光学系と、この受光光学系により導かれた光の受光
位置に応じて被測定物の位置を示す信号を出力するため
の受光素子とからなる受光位置検出装置において、前記
受光光学系には、被測定物からの光の強弱に応じて該当
の変化を減少させる様に補正するための補正手段が備え
られており、前記受光素子の出力信号により、受光位置
が検出されることを特徴としている9
「作用」
以上の様に構成された本実施例は、投光光学部が被測定
物に向けて光を照射し、受光光学系が被測定物からの光
を受光面に導き、受光素子が受光光学系により導かれた
光の受光位置に応じて、被検査面の位置を示す信号を出
力する7この際、受光光学系に備えられて補正手段が、
被測定物からの光の強弱に応じて、光の変化を減少させ
る様に補正する。この結果、被測定物の光の透過又は反
射率の部分的相違に影響を受けることなく、受光位置を
検出することができる。Furthermore, since the semiconductors on the wafer are also made of multiple types of materials, the reflectance on the wafer differs locally, and there was a problem in that it was not possible to measure with high precision, especially at the interface. Means for Solving the Problems The present invention has been devised in view of the above-mentioned problems, and is a measuring device for measuring objects to be measured that have partially different light transmission or reflectance. a light emitting optical section that emits light toward the object to be measured; a light receiving optical system that guides the light from the object to be measured onto the light receiving surface; In a light-receiving position detection device comprising a light-receiving element for outputting a signal indicating the position of an object, the light-receiving optical system is corrected to reduce corresponding changes depending on the intensity of light from the object to be measured. The present embodiment configured as described above is characterized in that the light receiving position is detected by the output signal of the light receiving element. Light is irradiated toward the object to be measured, the light receiving optical system guides the light from the object to the light receiving surface, and the light receiving element determines the position of the surface to be measured according to the receiving position of the light guided by the light receiving optical system. 7 At this time, a correction means provided in the light receiving optical system,
Corrects to reduce changes in light depending on the intensity of light from the object to be measured. As a result, the light receiving position can be detected without being affected by local differences in light transmission or reflectance of the object to be measured.
「実施例」
本発明の実施例を図面に基いて説明する1本実施例では
光テコ方式の受光位置検出装置1を例に説明すイ、こと
にする。第1図は受光位置検出装置1の構成を示す図で
あり、受光位置検出装置1は、赤外LED2と、反射部
材3と、コンデンサレンズ4と、透過率自動可変フィル
タ5と、半導体装置検出器(PSD)6と、前置増幅器
7と、演算器8と、演算器9と、演算器100とからな
っている5赤外L E I) 2は発光素子に該当する
ものであり、赤外線を放射することができる一第1の反
射部材31と第2の反射部材32は、赤外LED2から
の赤外線を被検物200の被検面に導くものである9赤
外LED2と第1の反射部材31と第2の反射部材32
とが、投光光学系に該当している9この投光光学系によ
り、赤外光線を被検物200の被検面に対して斜めに照
射することができる。コンデンサレンズ4は、被検物2
00から力反射光を平行光束にさせるものである。透過
率自動可変フィルタ5は、入射光の光強度に応じて光透
過度を自動的に変化させ、透過光強度の変化の幅を減少
させるものである。この透過率自動可変フィルタ5は、
透過率自動可変ガラスから構成されており、第3図に示
す棟な透過率特性を有している2即ち入射光強度が高ま
るに従い、透過率が減少する様になっており、透過光の
強弱差を減少させる二とができる7この透過率自動可変
カラスとしては、例えば近紫外線や短波長可視光線の刺
激で光電子を放出する元素がドープされると共に、強い
還元条件で作られた高純度のけい酸塩ガラス等から構成
されている9なお、この透過率自動可変フィルタ5は、
補正手段に該当するものである。なお、この補正手段は
透過率自動可変フィルタ5に限ることなく、TN液晶セ
ル等の液晶素子を採用し、この液晶セルの透過率を制御
させる手段等、同様の働きをする材料が利用できる7第
3の反射部材33、第4の反射部材34は被検物200
の反射光を反射させ、半導体装置検出器6に導くもので
ある。ここで、第3の反射部材33とコンデンサレンズ
4と第4の反射部材34とが受光光学系を構成している
9半導体装置検出器(PSD)6は、受光素子に該当す
るものであり。Embodiment In this embodiment, an embodiment of the present invention will be explained based on the drawings, taking an optical lever type light receiving position detection device 1 as an example. FIG. 1 is a diagram showing the configuration of a light receiving position detecting device 1. The light receiving position detecting device 1 includes an infrared LED 2, a reflecting member 3, a condenser lens 4, an automatically variable transmittance filter 5, and a semiconductor device detecting device. 2 corresponds to a light emitting element, and is composed of an infrared light emitting device (PSD) 6, a preamplifier 7, an arithmetic unit 8, an arithmetic unit 9, and an arithmetic unit 100. The first reflecting member 31 and the second reflecting member 32 are capable of emitting infrared rays from the infrared LED 2 to the test surface of the test object 200. Reflection member 31 and second reflection member 32
This corresponds to a light projection optical system.9 This light projection optical system allows infrared rays to be irradiated obliquely onto the surface to be inspected of the object 200 to be inspected. The condenser lens 4 is
00 to make the force reflected light into a parallel light beam. The automatically variable transmittance filter 5 automatically changes the light transmittance according to the light intensity of incident light, and reduces the width of change in the transmitted light intensity. This transmittance automatic variable filter 5 is
It is composed of automatically variable transmittance glass, and has the characteristic transmittance characteristics shown in Figure 3.2 In other words, as the intensity of incident light increases, the transmittance decreases, and the intensity of transmitted light changes. 7 This automatically variable transmittance glass is doped with an element that emits photoelectrons when stimulated by near ultraviolet rays or short wavelength visible light, and is made of high-purity glass made under strong reducing conditions. 9 This automatically variable transmittance filter 5 is made of silicate glass or the like.
This corresponds to correction means. Note that this correction means is not limited to the automatically variable transmittance filter 5, but can also employ a liquid crystal element such as a TN liquid crystal cell, and use a material that performs a similar function, such as a means for controlling the transmittance of this liquid crystal cell. The third reflecting member 33 and the fourth reflecting member 34 are connected to the test object 200.
The reflected light is reflected and guided to the semiconductor device detector 6. Here, the 9 semiconductor device detector (PSD) 6, in which the third reflecting member 33, the condenser lens 4, and the fourth reflecting member 34 constitute a light receiving optical system, corresponds to a light receiving element.
二の半導体装置検出器表面における光スギ・・Iトの輝
度重心を出力するものである7
−こで、半導体装置検出器(Psi’))6の構造を第
4図に基いて説明する、半導体装置検出器6は、高抵抗
半導体表面の片面、或は両面に均一な抵抗@61が形成
されており、この抵抗層61の両端に信号取り出し用の
一対の電極62.63が設けん・れている7表面層はP
N接合を形成しており、光電効果により光電流を生成す
る様に構成されている、
PSDの電極A62と電%863との距離をし、抵抗を
R1−とし、電極A62から光の入射位置をまでの距離
をX、その部分の抵抗をR\とする。The structure of the semiconductor device detector (Psi') 6 will be explained based on FIG. 4. The semiconductor device detector 6 has a uniform resistance @61 formed on one or both sides of a high-resistance semiconductor surface, and a pair of electrodes 62 and 63 for signal extraction are provided at both ends of this resistance layer 61. The 7th surface layer is P
The distance between the electrode A62 and the electric current of the PSD, which form an N junction and generate a photocurrent by the photoelectric effect, is the distance between the electrode A62 and the electric current 863, the resistance is R1-, and the incident position of light from the electrode A62 is Let the distance to the point be X, and the resistance of that part be R\.
光の入射位置で発生した光生成電荷は、光の入射エネル
ギに比例する光電流(Io)として抵抗層61に到達す
る、そして光電流は、それぞれの電極62.63までの
抵抗値に逆比例する様に分割される。したがって、電f
iA 62&び電[!B63から収り出せる電流IA
IP、は次の様に計算される5LRX
■A −I[l 2X
となり、抵抗層61は均一で、長さと抵抗値は比例する
と仮定すれば、
A
Io ・
・ ・ ・ (3)
u
Io ・
・ (4)
と表すことができる。そして位置信号をPとし、■いと
18の和と差を計算し、これらを除すれは、となり、受
光位置を計算する二とができる、本実施例では、これら
の原理の検出器を2個装備した2次元PSDを採用して
いるが、1次元PSDを採用し、−次元の位置を計測す
ることもできる。The photogenerated charge generated at the light incident position reaches the resistive layer 61 as a photocurrent (Io) that is proportional to the incident light energy, and the photocurrent is inversely proportional to the resistance value up to each electrode 62, 63. It is divided as follows. Therefore, electric f
iA 62 & Biden [! Current IA that can be collected from B63
IP is calculated as follows: 5LRX ■A −I[l 2X If we assume that the resistance layer 61 is uniform and the length and resistance are proportional, then A Io ・ ・ ・ ・ (3) u Io ・・(4) It can be expressed as: Then, let the position signal be P, calculate the sum and difference of 1 and 18, and divide these to become 2. The light receiving position can be calculated. In this example, two detectors based on these principles are used. Although the equipped two-dimensional PSD is used, a one-dimensional PSD can also be used to measure the -dimensional position.
前置増幅器7は、PSD6の出力信号を増幅するための
ものである9第1の前置増幅器71と第2の前置増幅器
72とが、Y軸方向の位置を検出する出力信号を増幅し
、第3の増幅器73と第4の増幅器74とか、X軸方向
の位置を検出する出力信号を増幅する様に構成されてい
る5第1の加算用演算器81は、Y軸方向検出用の出力
信号であるYll、Y2の加算を行うものである9更に
、第1の減算用演算器91は、Y軸方向検出用の出力信
号であるYl、¥2の減算を行うものである。The preamplifier 7 is for amplifying the output signal of the PSD 6.9 The first preamplifier 71 and the second preamplifier 72 amplify the output signal for detecting the position in the Y-axis direction. , the third amplifier 73 and the fourth amplifier 74 are configured to amplify the output signal for detecting the position in the X-axis direction. Further, the first subtraction arithmetic unit 91 is used to add the output signals Yll and Y2.Furthermore, the first subtraction arithmetic unit 91 is used to subtract the output signals Yl and ¥2 for Y-axis direction detection.
第1の除算用演算器101は、第1の減算用演算器91
の出力信号を、第1の加算用演算器81の出力信号で除
算するものである。この第1の除算用演算器101の出
力は、上記(5)式を演算した結果と等価であり、Y軸
方向の位置信号を得ることができる。同様に、第2の加
算用演算器82と第2の減算用演算器92と第2の除算
用演算器102とを接続すれば、X軸方向の位置信号を
得ることができる。The first division arithmetic unit 101 is the first subtraction arithmetic unit 91
is divided by the output signal of the first addition arithmetic unit 81. The output of the first division calculator 101 is equivalent to the result of calculating the above equation (5), and a position signal in the Y-axis direction can be obtained. Similarly, by connecting the second addition arithmetic unit 82, the second subtraction arithmetic unit 92, and the second division arithmetic unit 102, a position signal in the X-axis direction can be obtained.
次に、第5図に示す被検物200を用いて計測する場合
を説明する。この被検物200は反射率の異なる材料か
ら構成されており、黒色部分が反射率の低い材料であり
、白色部分は反射率の高い材料から構成されている9赤
外LEDから放射された赤外光線は、第1.2の反射部
材31.32で反射され、被検物200の被検面に斜め
に照射される。この赤外光線は被検面で反射されるが、
■の場所での被検物200の反射率分布を第2図(a)
に示す9そして1反射光は第3の反射部材33で反射さ
れる。この■の位置での反射光分布を第2図(b)に示
す。この反射光強度は、被検物200の反射率分布と同
様な傾向を示し、反射率の高い部分の反射光は、光強度
も高くなっている9更に反射率の高低に差が大きければ
、光強度の差も大きくなっている7そして、コンデンサ
レンズ4で平行光束にされた反射光は、第4の反射部材
34で反射され、透過率自動可変フィルタ5に入射する
、この透過率自動可変フィルタ5は第3図に示す透過率
特性を有するので、この透過率自動可変フィルタ5を透
過しな■の位置での光強度は、第2図(C)に示す様に
光強度の強弱の差が少なくなっている9この透過率自動
可変フィルタを透過した反射光は、半導体装置検出器6
に入射する。この半導体装置検出器(PSD)6の出力
信号は、前置増幅器7で増幅され、アナログ演算器8.
9,100で上記(5)式が演算され、X、lびY軸の
受光位置に対応する位置信号が生成される2
以上の様に構成された本実施例は、受光光学系に透過率
自動可変フィルタ5を挿入しているので、反射光の光分
布が均一化し、この均一化された反射光を半導体装置検
出器6に投影する様に構成されているので、被検面の反
射率が一様でない場合にも精度よく測定を行うことがで
きるという効果がある。Next, a case of measurement using the test object 200 shown in FIG. 5 will be described. This test object 200 is made of materials with different reflectances, and the black part is a material with a low reflectance, and the white part is a material with a high reflectance. The external light rays are reflected by the first and second reflecting members 31 and 32, and are obliquely irradiated onto the test surface of the test object 200. This infrared ray is reflected by the surface to be inspected,
Figure 2 (a) shows the reflectance distribution of the test object 200 at location (3).
The reflected lights 9 and 1 shown in are reflected by the third reflecting member 33. FIG. 2(b) shows the reflected light distribution at the position marked (■). This reflected light intensity shows the same tendency as the reflectance distribution of the test object 200, and the reflected light in areas with high reflectance has a high light intensity.9 Furthermore, if the difference in the reflectance is large, The difference in light intensity is also large.7 Then, the reflected light that is made into a parallel beam by the condenser lens 4 is reflected by the fourth reflection member 34 and enters the automatically variable transmittance filter 5. Since the filter 5 has the transmittance characteristics shown in Fig. 3, the intensity of light at the position (2) that does not pass through the automatically variable transmittance filter 5 varies depending on the strength of the light intensity as shown in Fig. 2 (C). 9 The reflected light that has passed through this automatically variable transmittance filter is detected by the semiconductor device detector 6.
incident on . The output signal of this semiconductor device detector (PSD) 6 is amplified by a preamplifier 7, and an analog arithmetic unit 8.
In step 9,100, the above equation (5) is calculated, and position signals corresponding to the light receiving positions on the X, l and Y axes are generated. Since the automatic variable filter 5 is inserted, the light distribution of the reflected light is made uniform, and this uniform reflected light is projected onto the semiconductor device detector 6, so that the reflectance of the surface to be inspected is This has the advantage that even when the values are not uniform, measurements can be carried out with high accuracy.
特にステ・ソバ−のマスク等は、パターンが大きく影響
し、本実施例の応用には好適である。In particular, the pattern of Ste-Sober's mask and the like has a large influence, and is therefore suitable for application to this embodiment.
なお1以上の実施例は第6図(a)に示すテコ方式の受
光位置検出装置1であるが、第6図(b)に示す非点収
差方式の受光位置検出装91に応用することもできる、
「効果」
以上の様に構成された本発明は、投光光宇部が被測定物
に向けて光を照射し、受光光学系が被測定物からの光を
受光面に導き、受光素子が受光光学系により導かれた光
の受光位置に応じて、被検査面の位置を示す信号を出力
する様になっている。Note that at least one embodiment is a lever-type light receiving position detection device 1 shown in FIG. 6(a), but it may also be applied to an astigmatism-type light receiving position detection device 91 shown in FIG. 6(b). ``Effects'' In the present invention configured as described above, the projecting light unit emits light toward the object to be measured, the light receiving optical system guides the light from the object to the light receiving surface, and the light receiving element outputs a signal indicating the position of the surface to be inspected in accordance with the light receiving position of the light guided by the light receiving optical system.
この際、受光光学系に備えられて補正手段が、被測定物
からの光の強弱に応じて、光の変化を減少させる様に補
正するので、被測定物の光の透過又は反射率の部分的相
違に影響を受けることなく、受光位置を検出することが
できるという卓越した効果がある。At this time, the correction means provided in the light receiving optical system corrects the change in light according to the intensity of the light from the object to be measured, so that the part of the light transmission or reflectance of the object to be measured is corrected. This has the outstanding effect of being able to detect the light receiving position without being affected by optical differences.
図は本発明の実施例を示すもので、第1図は本実施例の
構成を説明する図であり、第2図(a)は反射率分布を
表した図、第2図(b)は反射光分布を表した図、第2
図(C)はフィルタ通過後の光の分布を表した図、第3
図は透過率自動可変フィルタの特性を示した図、第4図
は半導体装置検出器の構成を示した図、第5図は非検物
の被検面を示した図、第6図<a>は光テコ方式の構成
を説明する図、第6図(b)は非点収差方式の構成を説
明した図であり、第7図は従来技術を説明し。
た図である9
1・・・・受光位置検出装置
2・・・・赤外LED
3・・・・反射部材
4・・・・コンデンサレンズ
5 ・ ・
・透過率自動可変フィルタ
6 ・
・半導体装置検出器(PSD)
・被検物The figures show an embodiment of the present invention. Fig. 1 is a diagram explaining the configuration of this embodiment, Fig. 2(a) is a diagram showing the reflectance distribution, and Fig. 2(b) is a diagram showing the reflectance distribution. Diagram showing reflected light distribution, 2nd
Figure (C) is a diagram showing the distribution of light after passing through the filter.
The figure shows the characteristics of the transmittance automatic variable filter, Figure 4 shows the configuration of the semiconductor device detector, Figure 5 shows the surface of the non-tested object, and Figure 6 <a > is a diagram for explaining the configuration of the optical lever system, FIG. 6(b) is a diagram for explaining the configuration of the astigmatism system, and FIG. 7 is a diagram for explaining the prior art. 9 1... Light receiving position detection device 2... Infrared LED 3... Reflection member 4... Condenser lens 5 . . . Transmittance automatic variable filter 6 . . Semiconductor device Detector (PSD) ・Test object
Claims (1)
測定するための測定装置であって、被測定物に向けて光
を照射する投光光学部と、前記被測定物からの光を受光
面上に導くための受光光学系と、この受光光学系により
導かれた光の受光位置に応じて被測定物の位置を示す信
号を出力するための受光素子とからなる受光位置検出装
置において、前記受光光学系には、被測定物からの光の
強弱に応じて該光の変化を減少させる様に補正するため
の補正手段が備えられており、前記受光素子の出力信号
により受光位置が検出されることを特徴とする受光位置
検出装置。(1) A measuring device for measuring an object to be measured with partially different light transmission or reflectance, which includes a projection optical section that irradiates light toward the object to be measured, and a light emitting optical section that emits light toward the object to be measured; Light-receiving position detection consists of a light-receiving optical system for guiding light onto a light-receiving surface and a light-receiving element for outputting a signal indicating the position of the object according to the receiving position of the light guided by the light-receiving optical system. In the apparatus, the light-receiving optical system is equipped with a correction means for correcting to reduce changes in the light according to the strength of the light from the object to be measured, and the light-receiving optical system is equipped with a correction means for reducing changes in the light from the object to be measured, and the light-receiving optical system is A light receiving position detection device characterized in that a position is detected.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP674589A JPH02187604A (en) | 1989-01-13 | 1989-01-13 | Light receiving position detection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP674589A JPH02187604A (en) | 1989-01-13 | 1989-01-13 | Light receiving position detection device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02187604A true JPH02187604A (en) | 1990-07-23 |
Family
ID=11646740
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP674589A Pending JPH02187604A (en) | 1989-01-13 | 1989-01-13 | Light receiving position detection device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02187604A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH051904A (en) * | 1990-11-27 | 1993-01-08 | Nkk Corp | Optical profilometer |
| JPH0560532A (en) * | 1990-11-27 | 1993-03-09 | Nkk Corp | Optical profilometer |
-
1989
- 1989-01-13 JP JP674589A patent/JPH02187604A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH051904A (en) * | 1990-11-27 | 1993-01-08 | Nkk Corp | Optical profilometer |
| JPH0560532A (en) * | 1990-11-27 | 1993-03-09 | Nkk Corp | Optical profilometer |
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