JPH02190495A - Stripe plating device - Google Patents

Stripe plating device

Info

Publication number
JPH02190495A
JPH02190495A JP739789A JP739789A JPH02190495A JP H02190495 A JPH02190495 A JP H02190495A JP 739789 A JP739789 A JP 739789A JP 739789 A JP739789 A JP 739789A JP H02190495 A JPH02190495 A JP H02190495A
Authority
JP
Japan
Prior art keywords
plating
plating solution
tank
nozzle
plated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP739789A
Other languages
Japanese (ja)
Other versions
JPH0670278B2 (en
Inventor
Shigeo Hagitani
萩谷 重男
Satoshi Sasaki
敏 佐々木
Hiromichi Yoshida
博通 吉田
Takashi Suzumura
隆志 鈴村
Koichi Kayane
茅根 浩一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Cable Ltd
Original Assignee
Hitachi Cable Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Cable Ltd filed Critical Hitachi Cable Ltd
Priority to JP739789A priority Critical patent/JPH0670278B2/en
Publication of JPH02190495A publication Critical patent/JPH02190495A/en
Publication of JPH0670278B2 publication Critical patent/JPH0670278B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、めっき液噴射方式によるストライプめっき条
の製造装置の改良に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to an improvement in an apparatus for manufacturing striped plating strips using a plating solution injection method.

[従来の技術] IC用のリードフレームなど電子部品材料には高い信頼
性が要求され、その接合面や電気的接点などには金など
の高価な貴金属等のめっきを施したり、IC搭載やワイ
ヤボンディングを容易にするための半田めっきをしなり
しておくのが通常である。
[Conventional technology] Electronic component materials such as lead frames for ICs are required to have high reliability, and their bonding surfaces and electrical contacts are plated with expensive precious metals such as gold. It is common practice to bend the solder plating to facilitate bonding.

ストライプめっきは、そのような貴金属あるいは半田等
を必要最小限の範囲にめっきし、材料の節減と併せて原
価の低減を図るべく開発されたものである。
Stripe plating was developed to plate such precious metals, solder, etc. to the minimum necessary range, and to save materials and reduce costs.

上記従来のストライプめっきは、被めっき条の被めっき
面だけを残して他の表面をすべてレジスト剤やマスキン
グテープなどで遮断し、これをめっき液中に浸漬して、
被めっき面に電解液を撹拌噴射してめっきするのが一般
的であった。
The above-mentioned conventional stripe plating involves leaving only the surface to be plated of the strip to be plated, blocking all other surfaces with resist agent or masking tape, and immersing this in a plating solution.
Generally, plating was carried out by stirring and spraying an electrolytic solution onto the surface to be plated.

しかし、このような従来方法においては被めっき面以外
をマスキングテープによりマスクするため、めっき面の
広さに比べて多くのマスキングテープが必要となり、割
高になることは避けられない上、めっき液の持出しが多
く、また、被めっき面以外をすべてマスキングしたもの
をめっき槽内やガイドロールを通過させると、通過の除
波めっき条のスリット端部のパリなどによって破れを生
することがあり、そのため破れ部分からめつき液が浸透
して置換めっきを起し、外観不良の原因となることがあ
った。
However, in this conventional method, since areas other than the surface to be plated are masked with masking tape, a large amount of masking tape is required compared to the size of the plating surface, which is unavoidably expensive. If a large amount of material is carried out, and if all surfaces other than the surface to be plated are masked are passed through the plating tank or guide rolls, breakage may occur due to cracks at the edges of the slits of the wave-rejecting plating strips. Plating solution penetrated through the torn area and caused displacement plating, which could lead to poor appearance.

そこで発明者らは先に第3図に示すようなめつき装置を
提案した。
Therefore, the inventors previously proposed a plating device as shown in FIG.

すなわち、被めつき条20を広巾面を垂直に維持して押
えロール2により押えつつ長手方向に走行させ、被め′
っき面21を残してマスキングテープ22により別途マ
スキング工程で部分マスキングしておき、めっき液槽4
内に貯溜されているめっき液30をポンプ5により図中
矢印のように強制循環せしめ、−時的に補助槽6゛に貯
溜したのち、加圧されためつき液をノズル3から前記被
めっき面21に噴射する。ノズル3の外周には前記被め
っき条のマスキングテープ22の巾よりは狭く、またマ
スキングテープ22の内側面を幾分内方に突出させるよ
うな巾よりなる開口面を形成する外套1が設けられてお
り、この外套1とノズル3との間には回収ロア′が形成
されていて、めっき液槽4の上部において吸引ポンプ8
により排気し、めっき液槽4内が負圧にされることによ
り前記被めっき面21に噴射されためつき液は前記回収
ロア゛によって吸引され、当該余剰のめっき液30はめ
つき液槽4に吸引回収される。補助槽6゛は、前記めっ
き液の噴射のための加圧の安定化と陽極材10の設置の
ために設けられたものであり、加圧されためっき液30
が補助槽6゛内に一時的に加圧状態で貯溜され、ノズル
3を介して噴射されるものである。
That is, the plating strip 20 is held in a longitudinal direction while keeping its wide side vertical and being pressed by the presser roll 2, and the plating strip 20 is
Leaving the plating surface 21 partially masked using masking tape 22 in a separate masking process, and then removing the plating solution tank 4.
The plating solution 30 stored in the plating solution 30 is forcibly circulated by the pump 5 as shown by the arrow in the figure, and after being temporarily stored in the auxiliary tank 6, the pressurized plating solution is applied from the nozzle 3 to the surface to be plated. Inject on 21. The outer periphery of the nozzle 3 is provided with a mantle 1 that forms an opening surface having a width that is narrower than the width of the masking tape 22 of the strip to be plated and that causes the inner surface of the masking tape 22 to protrude somewhat inward. A recovery lower ′ is formed between the mantle 1 and the nozzle 3 , and a suction pump 8 is connected to the top of the plating solution tank 4 .
The plating solution 30 is evacuated and the inside of the plating solution tank 4 is made negative pressure, so that the plating solution sprayed onto the surface to be plated 21 is sucked by the recovery lower, and the excess plating solution 30 is sucked into the plating solution tank 4. It will be collected. The auxiliary tank 6' is provided for stabilizing the pressure for spraying the plating solution and for installing the anode material 10, and contains the pressurized plating solution 30.
is temporarily stored under pressure in the auxiliary tank 6' and is injected through the nozzle 3.

11は、めっき液W44内を分割し、上記めっき液の吸
引回収効率を向上させるための分?I’Alである。
11 is a portion for dividing the inside of the plating solution W44 to improve the efficiency of suction and recovery of the plating solution. I'Al.

[発明が解決しようとする課題] 上記既提案の装置によりすぐれたストライプめっきを行
なうことができ、すでに実用化されて好評を得ているが
、上記装置においては、溶解性電極を用いようとする場
合、電極の補充および取替えが容易ではないという問題
がある。すなわち、補助槽がめつき液槽内に内蔵された
形となっており、電極を補充あるいは取替えようとする
と、そのための作業時間が非常に長くなるのである。
[Problems to be Solved by the Invention] The previously proposed apparatus described above can perform excellent stripe plating, and has already been put into practical use and has been well received. However, in the above apparatus, a soluble electrode is used. In this case, there is a problem in that it is not easy to replenish and replace electrodes. That is, the auxiliary tank is built into the plating liquid tank, and when it is attempted to replenish or replace the electrodes, it takes a very long time.

本発明の目的は、上記した従来技術の問題点を解消し、
電極の補充および取替えを大「]1に簡略化し容易迅速
化できる新規なストライプめっき装置を提供しようとす
るものである。
The purpose of the present invention is to solve the problems of the prior art described above,
The present invention aims to provide a novel stripe plating device that can greatly simplify and speed up the replenishment and replacement of electrodes.

[課題を解決するための手段コ 本発明は、ノズルより噴射するめっき液を一時的に貯溜
する補助槽をめっき液槽より独立して開閉可能に設置し
たものである。
[Means for Solving the Problems] In the present invention, an auxiliary tank for temporarily storing the plating solution sprayed from the nozzle is installed so as to be openable and closable independently of the plating solution tank.

〔作用] 補助槽が独立して開閉可能に構成されていれば、その中
の電極の補充あるいは取替えを既提案の装置に比較して
はるかに容易迅速に実施することができる。
[Operation] If the auxiliary tank is configured to be able to be opened and closed independently, the electrodes therein can be replenished or replaced much more easily and quickly than in previously proposed devices.

[実施例] 以下に、本発明について実施例図面を参照し説明する。[Example] The present invention will be described below with reference to the drawings.

第1図は、本発明に係るめっき装置を用いてストライプ
めっきを行なっている様子を示す説明断面図であり、第
2図は第1図のA−A断面図であって、前記第3図と同
一符号は、実質的に同一構成を示すものである。
FIG. 1 is an explanatory cross-sectional view showing how stripe plating is performed using the plating apparatus according to the present invention, and FIG. 2 is a cross-sectional view taken along line AA in FIG. 1, and FIG. The same reference numerals indicate substantially the same configurations.

20は前記第3図同様に広巾面を垂直に維持して長平方
向に走行する被めっき条、22は被めっき面21を残し
て部分マスキングしているマスキングテープであり、別
途マスキング工程で部分マスキングされるものである。
Reference numeral 20 denotes a plated strip that runs in the longitudinal direction while keeping the wide surface vertical as in FIG. 3, and 22 is a masking tape that is partially masked leaving the plated surface 21, and is partially masked in a separate masking process. It is something that will be done.

めっき液槽4内に貯溜されているめっき液30をポンプ
5および配管5aにより図中矢印のように強制循環せし
め、−時的に補助槽6に貯溜したのち、加圧されなめっ
き液がノズル3から前記被めっき面21に噴射される。
The plating solution 30 stored in the plating solution tank 4 is forced to circulate as shown by the arrow in the figure using the pump 5 and piping 5a, and after being temporarily stored in the auxiliary tank 6, the unpressurized plating solution is passed through the nozzle. 3 onto the surface to be plated 21.

しかして、前記第3図に示したように従来例においては
、補助槽6″がめつき液槽4の内部に内蔵されていたが
、本発明においては、めっき液槽4とは独立して設置さ
れ、例えばパツキンにより密閉可能な開閉!!9をもっ
て独立して開閉可能に構成される。
As shown in FIG. 3, in the conventional example, the auxiliary tank 6'' was built inside the plating liquid tank 4, but in the present invention, it is installed independently from the plating liquid tank 4. For example, it is constructed so that it can be opened and closed independently with a sealable opening/closing!! 9 using a gasket.

このように独立して開閉できる構成となっていれば、単
に開閉蓋9を開くだけで電極となる陽極材10を簡単に
補充しあるいは取替えることができ、従来例におけるよ
うな複雑な作業は一切必要がなくなり、簡易つつ迅速な
作業を短時間に実施できることとなり、消耗電極を使用
してのめっきを行なうことが非常に容易となる。もっと
も、消耗電極以外の電極を用いてもなんら差支えはなく
、この場合にも取付けや取外し等の容易性といったメリ
ットを発揮できることは勿論である。
With this configuration that can be opened and closed independently, the anode material 10 serving as the electrode can be easily replenished or replaced by simply opening the opening/closing lid 9, eliminating the complicated work required in the conventional example. This eliminates the need for consumable electrodes, allows simple and quick work to be carried out in a short time, and makes it very easy to perform plating using consumable electrodes. However, there is no problem in using electrodes other than consumable electrodes, and it goes without saying that even in this case, advantages such as ease of attachment and detachment can be achieved.

ノズル3の外問には前記従来例同様被めっき条のマスキ
ングテープ22の巾よりは狭く、またマスキングチー1
22の内側面を幾分内方に突出させるような巾よりなる
開口面を形成する外套1が設けられるが、その下方には
噴射後のめっき液を回収する回収ロアがめつき液槽に連
通して形成されており、めっき液槽4の上部において吸
引ポンプ8により排気し、めっき液WI4内が負圧にさ
れることにより前記被めっき面21に噴射されためっき
冴は当該回収ロアによって吸引され、当該余剰のめっき
液30がめつき液槽4に吸引回収される。
The width of the outer surface of the nozzle 3 is narrower than the width of the masking tape 22 of the strip to be plated, and the width of the masking tape 1 is similar to the conventional example.
A mantle 1 is provided which forms an opening surface having a width such that the inner surface of the plating material 22 protrudes somewhat inward, and below the mantle 1, a collection lower for collecting the plating solution after being sprayed communicates with the plating solution tank. The plating solution WI4 is evacuated by a suction pump 8 at the upper part of the plating solution tank 4, and the inside of the plating solution WI4 is made negative pressure, so that the plating solution sprayed onto the surface to be plated 21 is sucked by the collection lower. The surplus plating solution 30 is sucked and collected into the plating solution tank 4.

このように補助槽6をめっき液液槽4の内部に設置せず
別個に独立した構成とすれば、めっき液槽そのものを小
型化し全体をコンパクト化することも可能となるもので
ある。
If the auxiliary tank 6 is not installed inside the plating solution tank 4 but is constructed as a separate and independent structure, the plating solution tank itself can be downsized and the entire tank can be made compact.

[発明の効果] 以上の通り、本発明に係るめっき装置によれば、補助槽
をめっき液槽とは独立して開閉可能に設置したから、電
極の補充や取替えを開閉蓋を開くことでほとんどワンタ
ッチで行なうことができるものであり、めっき液の4度
保持に有効な消耗電極方式によるめっきを可能とし、め
っき液管理の容易性それに伴うめっき層の品質向上さら
には全体的経費節減に寄与し得る意義は大きい。
[Effects of the Invention] As described above, according to the plating apparatus according to the present invention, since the auxiliary tank is installed so that it can be opened and closed independently of the plating solution tank, replenishment and replacement of electrodes can be done almost easily by opening the lid. This can be done with a single touch, and enables plating using a consumable electrode method that is effective in maintaining the plating solution at 4 degrees Celsius. This facilitates plating solution management, improves the quality of the plating layer, and contributes to overall cost savings. The significance of what you get is great.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係る装置によりストライ−ブめっきし
ている様子を示す説明断面図、第2図は第1図のA−A
断面図、第3図は従来のめっき装置によりストライプめ
っきしている様子を示す説明断面図である。 1:外套、 3:ノズル、 4:めっき液槽、 5:供給ポンプ、 6:補助槽、 7:回収口、 8:吸引ポンプ、 9:開閉蓋、 10:陽極材、 20:被めっき条、 21:被めっき面、 22:マスキンクテープ、 30:めっき液。
Fig. 1 is an explanatory cross-sectional view showing how stripe plating is performed using the apparatus according to the present invention, and Fig. 2 is an A-A in Fig. 1.
3 is an explanatory cross-sectional view showing how stripe plating is performed using a conventional plating apparatus. 1: Mantle, 3: Nozzle, 4: Plating solution tank, 5: Supply pump, 6: Auxiliary tank, 7: Collection port, 8: Suction pump, 9: Opening/closing lid, 10: Anode material, 20: Plating strip, 21: Surface to be plated, 22: Masking tape, 30: Plating solution.

Claims (1)

【特許請求の範囲】[Claims] (1)めっき液槽内のめっき液をめっき面に向つて噴射
するノズルと該ノズルの周囲を区画してめっき開口面を
形成する外套と、めっき槽の内部を負圧とし噴射しため
っき液をめっき槽内に回収せしめるための吸引手段とを
有する装置において、ノズルより噴射するめっき液を一
時的に貯溜する補助槽を独立して設け、該補助槽をめっ
き液槽より独立して開閉可能に構成してなるストライプ
めっき装置。
(1) A nozzle that sprays the plating solution in the plating solution tank toward the plating surface, a jacket that partitions the periphery of the nozzle and forms a plating opening surface, and a negative pressure inside the plating tank that sprays the plating solution. In a device having a suction means for recovering the plating solution into the plating tank, an auxiliary tank for temporarily storing the plating solution sprayed from the nozzle is provided independently, and the auxiliary tank can be opened and closed independently from the plating solution tank. Stripe plating equipment consisting of:
JP739789A 1989-01-13 1989-01-13 Stripe plating equipment Expired - Fee Related JPH0670278B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP739789A JPH0670278B2 (en) 1989-01-13 1989-01-13 Stripe plating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP739789A JPH0670278B2 (en) 1989-01-13 1989-01-13 Stripe plating equipment

Publications (2)

Publication Number Publication Date
JPH02190495A true JPH02190495A (en) 1990-07-26
JPH0670278B2 JPH0670278B2 (en) 1994-09-07

Family

ID=11664767

Family Applications (1)

Application Number Title Priority Date Filing Date
JP739789A Expired - Fee Related JPH0670278B2 (en) 1989-01-13 1989-01-13 Stripe plating equipment

Country Status (1)

Country Link
JP (1) JPH0670278B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010119575A1 (en) * 2009-04-16 2010-10-21 株式会社エノモト Surface-mounted led lead frame and method for manufacturing same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010119575A1 (en) * 2009-04-16 2010-10-21 株式会社エノモト Surface-mounted led lead frame and method for manufacturing same

Also Published As

Publication number Publication date
JPH0670278B2 (en) 1994-09-07

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