JPH021908B2 - - Google Patents

Info

Publication number
JPH021908B2
JPH021908B2 JP8928882A JP8928882A JPH021908B2 JP H021908 B2 JPH021908 B2 JP H021908B2 JP 8928882 A JP8928882 A JP 8928882A JP 8928882 A JP8928882 A JP 8928882A JP H021908 B2 JPH021908 B2 JP H021908B2
Authority
JP
Japan
Prior art keywords
substrate
electron beam
vapor deposition
evaporation
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8928882A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58205541A (ja
Inventor
Masanari Shindo
Shigeru Sato
Shigeru Mano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP8928882A priority Critical patent/JPS58205541A/ja
Priority to EP83303014A priority patent/EP0095384A3/fr
Publication of JPS58205541A publication Critical patent/JPS58205541A/ja
Publication of JPH021908B2 publication Critical patent/JPH021908B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)
JP8928882A 1982-05-26 1982-05-26 蒸着装置 Granted JPS58205541A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP8928882A JPS58205541A (ja) 1982-05-26 1982-05-26 蒸着装置
EP83303014A EP0095384A3 (fr) 1982-05-26 1983-05-25 Dispositif pour le dépôt sous vide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8928882A JPS58205541A (ja) 1982-05-26 1982-05-26 蒸着装置

Publications (2)

Publication Number Publication Date
JPS58205541A JPS58205541A (ja) 1983-11-30
JPH021908B2 true JPH021908B2 (fr) 1990-01-16

Family

ID=13966506

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8928882A Granted JPS58205541A (ja) 1982-05-26 1982-05-26 蒸着装置

Country Status (1)

Country Link
JP (1) JPS58205541A (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60122796A (ja) * 1983-12-06 1985-07-01 Sumitomo Electric Ind Ltd ダイヤモンドの気相合成法
JPS60127298A (ja) * 1983-12-09 1985-07-06 Sumitomo Electric Ind Ltd ダイヤモンドの気相合成法

Also Published As

Publication number Publication date
JPS58205541A (ja) 1983-11-30

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