JPH0219456A - Dry production of organic thin film and device therefor - Google Patents

Abstract

PURPOSE:To form an org. thin film having an excellent orientational property by providing a shutter in the flight path of org. compd. particles, imparting ultrasonic vibration to a substrate, or irradiating the substrate by specified light at the time of dry-forming an org. thin film on the substrate surface by vacuum deposition. CONSTITUTION:An org. compd. 110 is charged into a crucible 121 provided with a heater 120 in a vacuum vessel 100, heated by the heater 120, vaporized, orderly oriented without decomposing the org. compd., and deposited on a substrate 130. The shutters 153 and 154 to be rotated by a motor 151 are provided in the flight path of the org. compd. particles, and only the particles having an optional velocity distribution are passed through the shutters and sent to the substrate 130. An ultrasonic vibrator is incorporated into the substrate 130, and ultrasonic vibration is impressed from the external terminal 166 to impart migration energy to the molecules of the org. compd. reaching the substrate 130. Alternatively, the surface of the substrate 130 is irradiated by the light 177 having optional wavelength and spectrum in the presence of an electric field caused by an electrode 172 to excite the org. compd. molecules reaching the substrate 130. An org. material thin film having an orderly oriented or clear layer structure can be formed in this way.

Description

DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a dry organic thin film manufacturing method for manufacturing an organic thin film by a vacuum evaporation method and an apparatus used therein.

<Prior Art> Vacuum evaporation and plasma polymerization are common methods for producing organic thin films in a dry manner.

In the plasma polymerization method, a polymerized organic thin film is deposited on a substrate, but the chemical composition of this film is different from that of the original organic compound because the evaporated organic compound is decomposed by the action of plasma.

Therefore, r4y1 can be used on the substrate without decomposing the organic compound.
．． A vacuum evaporation method is used to form the .

The purpose of forming organic thin films by vacuum evaporation is to form highly oriented organic thin films, and intensive studies are being carried out. Even in demand equipment,
In recent years, molecular beam epitaxial equipment for inorganic materials has been repurposed to produce organic thin films under a high degree of vacuum.

<Problems to be solved by the invention> However, despite the vigorous research mentioned above,
Thin film formation using conventional vacuum evaporation methods is performed by reusing inorganic vacuum evaporation equipment (including molecular beam epitaxial equipment) as is, and the following problems arise in producing organic thin films with good orientation: All countermeasures have not been taken.

■ Many organic compounds, especially organic compounds with electronic and optical functions, have aromatic groups or unsaturated groups in their molecules, but these compounds tend to form an association state, so it is difficult to deposit them as they are. The organic molecules in the associated and non-associated states are mixed and evaporated, reaching the substrate as is. It is generally believed that the velocity energy distribution of molecules or atoms evaporated at a certain temperature follows the Boltzmann distribution.

For this reason, particles of molecules with different energy distributions reach the substrate due to the different molecular weights such as associated and non-associated states, and the energy distribution when reaching the substrate is different, so the molecular particles on the substrate are The aligned orientation is perturbed.

■ Vacuum deposition of inorganic compounds that arranges atoms on a substrate, as seen in molecular beam epitaxial method, is generally achieved by increasing the substrate temperature and giving the atoms and molecules that reach the substrate an appropriate amount of migration energy. results have been obtained. However, organic compounds have a high vapor pressure and a low decomposition temperature, so raising the substrate temperature unnecessarily will result in molecules that have reached the substrate re-evaporating and not adhering to the substrate, or will decompose on the substrate. On the other hand, when the substrate temperature is lowered, there is not enough energy for migration, so the alignment of molecules on the substrate is incomplete.
Or, the state is such that the alignment is not aligned at all.

■ In the vapor deposition of inorganic compounds, molecules and atoms that reach a substrate move on the substrate with appropriate migration energy, and when they reach a bonding site, they form a chemical bond and the atoms and molecules become aligned and oriented. However, in the vapor deposition of organic molecules, the bonds between the organic molecules deposited on the substrate are not as strong as chemical bonds, but rather with van der Waalska bonds, which have a much weaker bonding force. If the direction of the organic molecules deposited on the substrate is not aligned and maintained by an external force, the aligned orientation will be disturbed by the velocity energy of the molecules that subsequently reach the substrate.

■ When trying to deposit organic compounds with different chemical structures on each other, it goes without saying that the state of alignment at the interface between the thin films of both substances has a great effect on electronic and optical functions. In vapor deposition, the evaporation temperature varies greatly depending on the individual molecular species. For this reason, the velocity energy of organic molecular particles that reach the substrate surface differs depending on the molecular type, and if they are deposited as is, they cannot be deposited on the substrate surface under the same conditions. There are great difficulties in control.

As described above, since the above considerations have not been taken in the past, there have been no methods or manufacturing apparatuses capable of manufacturing organic thin films capable of exhibiting electronic or optical functions.

In view of these circumstances, an object of the present invention is to provide a dry organic thin film manufacturing method and apparatus for manufacturing a thin film of an organic compound that is aligned and oriented.

Means for Solving the Problems> A method for producing a dry organic thin film according to a first invention which achieves the above object is to heat and evaporate at least one organic compound as a vapor deposition base material in a vacuum. In a dry organic thin film production method using a vacuum evaporation method in which organic compound molecular particles are deposited or layered on at least one substrate, organic compound molecules having an arbitrary speed are produced by a shutter mechanism provided on the flight path of the evaporated organic compound molecular particles. The method is characterized in that particles are selected and deposited or stacked on a substrate.

When the organic compound that is the base material for evaporation is heated, it evaporates with a velocity distribution that follows the Boltzmann distribution, but among the evaporated organic compound molecular particles, only those with a given velocity pass through the shutter mechanism and are deposited on the substrate. .

In addition, the dry organic thin film manufacturing method according to the second invention heats and evaporates at least one organic compound as a vapor deposition base material under vacuum, and deposits the evaporated organic compound molecular particles on at least one substrate. Alternatively, a method for manufacturing a dry organic thin film using a vacuum evaporation method in which stacked layers are deposited is characterized in that the organic compound molecules that have reached the substrate are migrated by subjecting the substrate to ultrasonic vibration.

In this method, even when the substrate temperature cannot be raised and the organic compound molecules that have reached the substrate cannot be given sufficient migratian energy to move and align on the substrate, ultrasonic vibration can be used to Be able to perform migration of organic compound molecules.

In other words, the alignment of organic compounds is not a chemical bond, but
Since the bonding force is weaker than that of van der Waalska, a sufficient migration effect can be obtained by ultrasonic energy applied from the outside to the substrate to be deposited.

A third invention provides, in addition to the method for producing a dry organic thin film according to the first or second invention, a method of forming an electric field on the surface of the substrate and irradiating the surface of the substrate with light having an arbitrary wavelength and spectrum. It is characterized by exciting the organic compound molecules that have reached the substrate.

In this method, when light is irradiated onto the organic compound molecules that have reached the surface of the substrate where an electric field has been formed during vapor deposition, the organic compound molecules are excited and have a larger dipole moment than their previous ground state. become. The organic compound molecules thus excited are promoted to align in a certain direction by the electric field on the surface of the substrate.

Furthermore, when the organic compound molecules move in the migration process on the substrate surface, alignment control in a certain direction is promoted. Note that this effect is particularly effective for molecules having an electron-donating substituent and an electron-accepting substituent that have a large dipole moment in a photoexcited state.

The following invention relates to a dry organic thin film manufacturing apparatus for carrying out the methods according to the first to third inventions, and a fourth invention is directed to heating at least one organic compound as a vapor deposition base material under vacuum. Dry organic thin film production by a vacuum evaporation method having at least one heating mechanism and a substrate support mechanism supporting at least one substrate on which organic compound molecular particles evaporated by the heating of the heating mechanism are deposited or stacked. The apparatus consists of a plurality of coaxially connected rotary shutters or a cylindrical rotating body having passages obliquely inclined with respect to the axis at equal intervals around the circumference, and the organic compound molecular particles are evaporated by the heating of the heating mechanism. It is characterized by comprising at least one shutter mechanism that allows only the organic compound molecular particle component having a desired flight speed to pass through.

Further, the dry organic thin film manufacturing apparatus according to the fifth invention includes at least one heating mechanism that heats at least one organic compound as a vapor deposition base material under vacuum, and an organic compound that is evaporated by the heating of the heating mechanism. In a dry organic R4 film manufacturing apparatus using a vacuum evaporation method, which has a substrate support mechanism that supports at least one substrate on which molecular particles are deposited or layered, ultrasonic waves vibrate the substrate supported by the substrate support mechanism. It is characterized by being equipped with an application mechanism.

Further, the dry organic thin film manufacturing apparatus according to the sixth invention is the dry organic thin film manufacturing apparatus according to the fourth invention, in which ultrasonic waves are applied to ultrasonically vibrate the substrate supported by the substrate support mechanism. It is characterized by having a mechanism.

Furthermore, the dry organic thin film manufacturing apparatus according to the seventh invention,
4 above. In the dry organic thin film manufacturing apparatus according to the fifth or sixth invention, the substrate support mechanism has at least one pair of electric fields that form an electric field on the surface of the substrate, and an arbitrary It is characterized by comprising a light irradiation mechanism that irradiates light having a wavelength and spectrum.

Practical example Hereinafter, the present invention will be explained in more detail with reference to Examples.

FIG. 1 schematically shows a dry organic thin film manufacturing apparatus according to a first embodiment. As shown in the figure, the vacuum chamber 10G
is connected to a vacuum evacuation device (not shown) through an exhaust port 101 so as to be maintained under vacuum conditions. The vacuum chamber IOQ is provided with a heating mechanism 120 that heats and evaporates the vapor deposition base material 110, and a substrate support mechanism 140 that supports the substrate 130 on which organic compound molecules, which are the vaporized base material, are deposited. A shutter mechanism 150 is provided on the flight path of the evaporated organic compound molecular particles to selectively allow only particles with an arbitrary velocity distribution to pass through. In the figure, the heating mechanism 120 is the vapor deposition base material 110.
A shaping plate 12 having a crucible 121 in which the particles are placed, and a desired opening 122 for covering the opening of the crucible 121 and shaping the shape of the organic compound molecular particle beam evaporated from the crucible 121.
3 is illustrated, and a heater that heats the crucible 121 and the crucible 12 are shown.
Thermocouples and the like for monitoring the temperature of No. 1 were omitted. This heating mechanism 120 is connected to a temperature control device (not shown) including a power regulator, a controller, etc. outside the vacuum chamber 100, so that the temperature of the crucible 121 can be adjusted to a desired temperature.

In this embodiment, the shutter mechanism 150 includes a motor 151 and two rotating shutters 153 and 154 coupled to a rotating shaft 152 of the motor 151. Rotating shutter 15
A slit (not shown) is formed in each of the shutters 3 and 154, and the deviation between the slits and the rotating shutter 1
By changing the spacing and rotational speed of the openings 53 and 154, an opening/closing operation that allows only organic compound molecular particles at a desired speed to pass is realized. In addition, the motor 151
The drive is controlled by a control device (not shown) installed outside the vacuum chamber 100.

The organic compound molecular particle beam heated in the crucible 121 and evaporated with a velocity distribution according to the Boltzmann distribution at the heating temperature first passes through the rotating first rotating shutter 15.
Reach 3. Such a particle beam is removed by the first rotating shutter 15.
By opening and closing 3, the flying particles pass through only when it is in the open state, and the flying particles are shaped into a pulse shape. Next, the pulsed flying particles reach the rotating second rotating shutter 154 installed at a certain distance, but the flying particles that have passed through the first rotating shutter 153 have a velocity distribution. The second shutter 1 is reached sequentially from the fastest one.
Only flying particles that arrive when 54 is in the open state pass through,
Deposited onto substrate 130. That is, the second shutter 15
4 is set to open only when flying particles with a desired velocity distribution arrive, it is possible to deposit only organic compound molecules having a desired velocity energy on the substrate 130.

The apparatus of the first embodiment is a specific example of the apparatus for carrying out the first invention, and by using this apparatus, organic compound molecular particles having an arbitrary velocity component can be deposited, It would be possible to deposit organic compound molecular particles with uniform velocity energy on a substrate. Furthermore, for example, organic compound molecules that evaporate at low temperatures can be vapor-deposited as particles having a high velocity, which has been difficult in the past, or conversely, organic compound molecules that evaporate at high temperatures can be vapor-deposited by extracting only the slow-velocity component. Furthermore, since the associated and non-associated molecules have different molecular weights and different evaporation rate components, it is possible to distinguish between these and deposit them on the substrate.

The heating mechanism used in the present invention can be, for example, a metal boat used in normal vacuum evaporation or a Kumedsen cell used in molecular beam epitaxy, and is particularly limited as long as it can heat and evaporate organic compounds in vacuum. Not done.

FIG. 2 schematically shows a dry organic thin film manufacturing apparatus according to a second embodiment. Note that the same members as those in the first embodiment are given the same reference numerals, and redundant explanations will be omitted.

As shown in FIG. 2, the vacuum chamber 100 is provided with two sets of heating mechanisms 120 that heat and evaporate the evaporation base materials 110A and 110B, respectively, and a substrate support mechanism 240 that supports the substrates 130A and 130B. , heating mechanism 12
0 and the substrate support mechanism 240 is a shutter mechanism 150.
is installed. And the substrate support mechanism 24 of this embodiment
0 is the substrate 130A.

It consists of a substrate support stand 241 to which 130B is fixed, and a motor 242 that rotatably supports this substrate support stand 241.

Note that the driving of the motor 242 is controlled by a control device (not shown) installed outside the vacuum chamber 100, similarly to the motor 151.

The device of the second embodiment is also a specific example for carrying out the first invention. According to this device, the vapor deposition base material 110A
, 110B, only those having a desired velocity pass through the rotating shutters 153, 154. In this way, the flight paths of the two types of flying organic compound molecular particles that arrive independently include the substrates 130A,
By rotating the substrate support stand 241 so that B alternately moves, two types of organic compounds can be laminated on each of the substrates 130A and 130B. At this time, by modulating the rotation speed of the motor 151 that rotationally drives the rotary shutters 153, 154, each vapor deposition base material 110A, 110B
It is also possible for the evaporated molecules from to pass through with different velocity components.

When a plurality of organic compounds are stacked and deposited using the apparatus of the second embodiment, the degree of evaporation differs between each compound, and therefore the velocity energy of each compound reaching the substrate is uneven, making it difficult to control. Traditional problems can be solved. That is, the heating mechanism 12 is an independent evaporation source.
It is possible to deposit the evaporated molecules from 0 onto the substrates 130A and 130B by aligning the velocity energy of each organic compound molecule particle with a single shutter mechanism 150, or by selecting the optimum velocity energy for each particle. Further, the associated and non-associated states of each compound are separated and distinguished from each other on the substrate 130A.

Similar to the first embodiment, it is also possible to deposit on 130B.

FIG. 3 schematically shows a dry organic conductive film manufacturing apparatus according to a third embodiment. Note that the same members as those in the above-described embodiment are given the same reference numerals, and redundant explanations will be omitted.

As shown in FIG. 3, in this embodiment, a vapor deposition base material 110A,
The flight paths of the evaporated molecules from ll0B are each independently t
Co-shutter mechanism 150A.

The difference from the second embodiment is that the heating mechanism 150B is provided, and the two sets of heating mechanisms 120 and substrate support mechanisms 240 are the same as in the second embodiment. Further, the configurations of the shutter mechanisms 150A and 150B are also similar to the shutter mechanism 150 of the second embodiment, so a description thereof will be omitted.

In the apparatus of the second embodiment, the vapor base material 110
Since independent shutter mechanisms 150A and 150B are provided corresponding to the motors 150A and 110B, the respective shutter mechanisms 150A do not need to be provided with a mechanism that specifically modulates the rotation of the motor 151 as in the second embodiment.

By independently controlling the rotation of the motor 151 of 150B, the optimum velocity energy is selected for each of the g-adhering base materials 110A and 110B, and the substrates 130A and 130B are
It becomes possible to deposit

FIGS. 4 and 5 schematically show a dry organic thin M manufacturing apparatus according to a fourth embodiment. Incidentally, the same members as in the above-mentioned embodiment are denoted by the same reference numerals, and explanations thereof will be omitted.

As shown in FIG. 4, a heating machine H4220 that heats and evaporates the evaporation base material 110 and a substrate support mechanism 140 that supports the substrate 130 on which evaporated molecules are deposited are arranged in the vacuum chamber 100. There is. As the heating mechanism 220, only the crucible 221 containing the vapor deposition base material 110 is shown;
The heater that heats the crucible 21 and the thermocouple that monitors the temperature of the crucible 221 are not shown.

Furthermore, the substrate support mechanism 140 that supports the substrate 130 has an ultrasonic application mechanism incorporated therein, as shown in FIG.

As shown in the figure, an ultrasonic transducer 16 is provided in the substrate 130.
1 is incorporated, and the substrate 130 is supported by a substrate holder 162 incorporated in the substrate support mechanism 140. A lead wire 163 from the ultrasonic transducer 161 is connected to a terminal 164 in the substrate holder 162, and further connected to an ultrasonic introduction terminal 166 via a contact 165 between the substrate holder 162 and the substrate support mechanism 140. There is. This ultrasonic wave introduction terminal 166 is connected to an ultrasonic element driving device 168 outside the vacuum chamber 100 via a cable 167.

With such an ultrasonic wave application mechanism, ultrasonic waves can be applied to the substrate 130, thereby imparting sufficient migration energy to the organic compound molecules that have reached the substrate 130.

In addition to applying ultrasonic waves directly to the substrate as described above, it may also be applied to the sample stage on which the substrate is fixed to vibrate the substrate indirectly, but according to the results obtained by the inventors, ultrasonic waves can be applied directly to the substrate. More favorable results were obtained with the The method and frequency of applying ultrasonic waves are not particularly limited as they vary depending on the material and size of the substrate used and the material to be deposited, but methods used for normal ultrasonic application, commercially available ultrasonic transducers, and drives*
a could be used without any special improvement. That is, examples of ultrasonic vibrators include crystals with piezoelectric effect, lithium sulfate, polyvinylidene fluoride, etc., lithium niobate for electrical work, ferrite with magnetostrictive effect such as solid solution of barium titanate and lead zirconate (PZT), etc. Examples include those using Ultrasonic frequencies are typically in the tens of
You can choose between several hundred degrees as appropriate.

The ultrasonic wave application mechanism shown in the fourth embodiment is
It is possible to incorporate it into the device of the third embodiment (described as device examples 1 to 3) (described as device examples 5 to 7). In this case, in the devices of the second and third embodiments, the support stand 241 of the substrate support mechanism 240 rotates, so it is necessary to use a rotating contact corresponding to the ultrasonic wave introduction terminal 166 shown in FIG. .

Furthermore, each of the devices described above (device examples 1 to 7) can be equipped with a mechanism that simultaneously irradiates light and applies an electric field to the substrate surface, thereby controlling the arrangement in a certain direction on the substrate surface. promoted. At this time, the wavelength of the light irradiated onto the substrate is selected from the wavelengths that are absorbed by molecules to be deposited, and may be monochromatic light or light with a wide spectrum. Examples of light sources include various lasers, mercury lamps, and xenon lamps. The degree of the electric field applied to the substrate surface varies depending on the material to be deposited, but it is usually preferable to apply an electric field of several kV to several tens of kV with electrodes spaced several mm apart.

FIG. 6 shows an example of a device that can be incorporated into each of the devices described above and simultaneously irradiates light and applies an electric field to the surface of a substrate. As shown in the figure, the substrate support mechanism 14
0 has a built-in substrate holder 171 that supports the substrate 130, and a pair of electric field forming electrodes 1 is mounted on the surface of the substrate 130.
72 are arranged. A lead 5173 from this electric field forming electrode 172 is connected to a terminal 174 inside the substrate holder 171, and further between the substrate holder 171 and the substrate support mechanism 14.
It is connected to a high voltage introduction terminal 176 via a contact 175 with 0. Furthermore, this high voltage introduction terminal 176 is connected via a cable to a high voltage application device (not shown) placed outside the vacuum chamber. Further, the configuration is such that light irradiation is performed from the back side of the substrate 130 via the light irradiation window 177.

Such a mechanism can be incorporated into the above-mentioned container bag 'a (device examples 1 to 7) (device examples 8 to 14); however, for example, in device examples 2 and 3 shown in FIGS. When the substrate support mechanism includes a rotating part, the high voltage introduction terminal 17
Reference numeral 6 is a rotating contact, and in the case of a plurality of heating mechanisms, light can be irradiated independently.

Furthermore, the shutter mechanism 150 in each of the above-mentioned devices.
150A and 150B can be replaced, for example, with a cylindrical rotating body having passages obliquely inclined with respect to the axis at equal intervals around the circumference, as shown in FIG. That is, this rotating body 250 has fins 253 obliquely inclined with respect to the axis disposed at equal intervals on the surface of a cylindrical body 252 having a rotation axis 251, and organic compound molecules are arranged between each fin 253. The amount passed is $254. In such a rotating body 250, by changing the rotation speed, the inclination of the fins 253, and the spacing between the fins 253, it can be set so that only organic compound molecules having an arbitrary velocity component are passed through.

(Test Examples 1 to 3) (Comparative Example 1) Using phthalocyanine as the vapor deposition base material, the device of device example 1 (
The vapor deposition was performed using the device of Test Example 1), the device of Device Example 4 (Test Example 2), and the device of Device Example 5 (Test Example 3). Deposition rate is 5 nm per second
It was deposited on the substrate to a thickness of one layer.

As a shutter mechanism, two rotary shutters made of beryllium copper alloy disks with a diameter of 19 cm were installed at an interval of 1 cm. The slit made in the disk had an opening of 211IIll at a portion 9cm from the center, and was made to have a length of 1 am in the radial direction to be similar to this. What is the rotation speed? 000
rpm.

Further, the shaping plate of the heating mechanism had an opening of 1 cm square. The ultrasonic waves were applied by using lithium niobate as an ultrasonic vibrator, which was attached to the side surface of the substrate, and vibrated at 8 degrees. Note that quartz glass was used for the substrate.

The degree of alignment of each of the 11 vaporized films was compared. In addition,
The degree of alignment was evaluated by the extinction ratio of a scratched optical microscope.

For comparison, the test was conducted using the device of Device Example 4 without applying ultrasonic waves (Comparative Example 1).

These results are summarized in Table 1. It can be seen that when the device of the present invention is used, a high extinction ratio is obtained, and the degree of alignment is good.

Table 1 Examination Example 2 82:1 Examination
Test Example 3 134: 1 (Test Examples 4 to 6) (Comparative Example 2) Using 2-methylnitroaniline as the vapor deposition base material, the device of Device Example 8 (Test Example 4) and the device of Device Example 11 (Test Example 5)
, the vapor deposition was carried out using the apparatus of Apparatus Example 12 (Test Example 6). The deposition rate was 5 times per second, and a thickness of one layer was deposited on the substrate.

The shutter mechanism and the application of ultrasonic waves were as described in Test Example 1 above.
- Same as 3.

The electric field was applied by attaching a pair of electrodes to the substrate surface at a 5-space interval, and a voltage of 10 kV was applied. A xenon lamp was used for light irradiation. Note that the substrate used was Nesacoat quartz glass that had been subjected to a rubbing treatment.

The degree of alignment of each deposited film was similarly examined.

For comparison, vapor deposition was performed using the device of Device Example 11 without applying ultrasonic waves or an electric field (Comparative Example 2).

These results are summarized in Table 2. It can be seen that when the device of the present invention is used, a high extinction ratio is obtained, and the degree of alignment is good.

Table 2 Extinction ratio test Example 4 32:1 test
Test Example 5 57:1 Test Example 6
98:1 Comparison Example 2 Test Examples 7 to 1 without alignment
4) (Comparative Example 3) In order to make a laminated film of a 2[1-W functional compound of copper phthalocyanine and anthracene on a Si base material, the device W of device example 2 (Example 7) and the device of device example 3 (implementation) were used. Example 8), the device of device example 6 (example 9), the device of device example 7 (*example 10), the device of device example 9 (example 11), the device of device example 10 (example 12), Device Example 13 (Example 13), Device Example 14
The vapor deposition was performed using the apparatus (Example 14).

The deposition rate was 2 cm/sec, and the SOO thickness was deposited on the substrate at intervals of 50 rua.

The shutter mechanism, application of ultrasonic waves, application of electric field, and light irradiation were the same as in Test Examples 4 to 6.

Furthermore, quartz glass was used for the substrate.

The composition of each of the thus obtained laminated films in the depth direction was analyzed by Auger electron spectroscopy.

For comparison, vapor deposition was performed using the apparatus of Apparatus Example 2 without the shutter mechanism (Comparative Example 3).

The results in Table 3 are based on measuring the presence of copper atoms in the depth direction and determining the degree of mixing of two types of organic compounds at the interface, that is, whether the two types of organic compounds are stacked as intended. The evaluation was based on the thickness of the layer containing only copper phthalocyanine. In the comparative example, copper atoms were deposited in all layers in the film direction, although the periodicity of the existence of copper atoms could not be seen, whereas by using the apparatus of the present invention, an organic thin film with a layered structure was obtained. 3 Table Test Example 7 42 Test Example 8 39 Test Example 9 33 Test Example 10 35 Test Example 11 40 Test Example 12 45 Test Example 13 36 Test Example 14 38 Comparative Example 30 <Effects of the Invention> As explained above, the present invention According to the authors, it is possible to obtain an R film having an aligned or clear layer structure in dry 4% formation of an organic compound.

[Brief explanation of the drawing]

1 to 7 relate to the present invention, FIGS. 1 to 4 are schematic diagrams of the dry organic thin film manufacturing apparatus of the first to fourth embodiments, and FIG. 5 is a schematic diagram showing the ultrasonic application mechanism. FIG. 6 is a schematic view showing an example of a device for applying an electric field and irradiating light, and FIG. 7 is a perspective view showing a rotating cylindrical body serving as a shutter mechanism. In the drawing, 100 is a vacuum chamber, 110, ll0A, ll0B are vapor deposition materials, 120.12
0A, 120B, 220 are heating mechanisms, 130.130A, 130B are substrates, 140.240 are substrate support mechanisms, 150.150A, 150B are shutter mechanisms, 153.154 are rotating shutters, 161 are ultrasonic transducers, 168 are An ultrasonic element driving device, 172 is an aA pole for forming an electric field, 177 is a light irradiation window, 250 is a rotating body, 252 is a cylindrical body, 253 is a fin, and 254 is a passage. Figure Patent Applicant: Nippon Telegraph and Telephone Corporation Representative/Manager

Claims (1)

[Claims] 1) A vacuum evaporation method in which at least one organic compound as a base material for evaporation is heated and evaporated in a vacuum, and the evaporated organic compound molecular particles are deposited or layered on at least one substrate. A dry method for manufacturing an organic thin film according to the present invention, characterized in that organic compound molecular particles having an arbitrary speed are selected and deposited or layered on a substrate using a shutter mechanism provided in the flight path of the evaporated organic compound molecular particles. Organic thin film manufacturing method. 2) A method for producing a dry organic thin film using a vacuum evaporation method, in which at least one organic compound as a vapor deposition base material is heated and evaporated in a vacuum, and the evaporated organic compound molecular particles are deposited or layered on at least one substrate. A method for producing a dry organic thin film, characterized in that the organic compound molecules that have reached the substrate are migrated by subjecting the substrate to ultrasonic vibration. 3) In the method for producing a dry organic thin film according to claim 1 or 2, by forming an electric field on the surface of the substrate and irradiating the surface of the substrate with light having an arbitrary wavelength and spectrum, the organic material that has reached the substrate is A dry organic thin film manufacturing method characterized by exciting compound molecules. 4) At least one heating mechanism that heats at least one organic compound as a vapor deposition base material under vacuum, and at least one substrate on which organic compound molecular particles evaporated by the heating of the heating mechanism are deposited or stacked. A cylindrical rotating body having a plurality of coaxially connected rotary shutters or passages obliquely inclined with respect to the axis at equal intervals around the periphery in a dry organic thin film manufacturing apparatus using a vacuum evaporation method having a supporting substrate support mechanism. A dry organic thin film manufacturing apparatus comprising at least one shutter mechanism that allows only the organic compound molecular particle components having a desired flight speed to pass among the organic compound molecular particles evaporated by the heating of the heating mechanism. . 5) At least one heating mechanism that heats at least one organic compound as a vapor deposition base material under vacuum, and at least one substrate on which organic compound molecular particles evaporated by the heating of the heating mechanism are deposited or stacked. A dry organic thin film manufacturing apparatus using a vacuum evaporation method having a substrate support mechanism for supporting the substrate, characterized in that the dry organic thin film manufacturing apparatus includes an ultrasonic application mechanism for ultrasonically vibrating the substrate supported by the substrate support mechanism. Device. 6) The dry organic thin film manufacturing apparatus according to claim 4, further comprising an ultrasonic application mechanism for ultrasonically vibrating the substrate supported by the substrate support mechanism. 7) The dry organic thin film manufacturing apparatus according to claim 4, 5 or 6, wherein the substrate support mechanism has at least one pair of electrodes that form an electric field on the surface of the substrate, and the substrate support mechanism has at least one pair of electrodes that form an electric field on the surface of the substrate on which the electric field is formed. 1. A dry organic thin film manufacturing apparatus characterized by comprising a light irradiation mechanism that irradiates light having an arbitrary wavelength and spectrum.