JPH02199056A - Bi-sr-ca-cu multiple oxide superconductor - Google Patents
Bi-sr-ca-cu multiple oxide superconductorInfo
- Publication number
- JPH02199056A JPH02199056A JP1258551A JP25855189A JPH02199056A JP H02199056 A JPH02199056 A JP H02199056A JP 1258551 A JP1258551 A JP 1258551A JP 25855189 A JP25855189 A JP 25855189A JP H02199056 A JPH02199056 A JP H02199056A
- Authority
- JP
- Japan
- Prior art keywords
- film
- composite oxide
- thin film
- substrate
- superconducting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002887 superconductor Substances 0.000 title claims description 24
- 239000000203 mixture Substances 0.000 claims abstract description 16
- 239000002131 composite material Substances 0.000 claims description 32
- 239000000758 substrate Substances 0.000 abstract description 23
- 239000000843 powder Substances 0.000 abstract description 15
- 239000000463 material Substances 0.000 abstract description 12
- 229910014454 Ca-Cu Inorganic materials 0.000 abstract description 9
- 238000004544 sputter deposition Methods 0.000 abstract description 9
- 238000005245 sintering Methods 0.000 abstract description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 6
- 239000001301 oxygen Substances 0.000 abstract description 6
- 229910052760 oxygen Inorganic materials 0.000 abstract description 6
- 239000002994 raw material Substances 0.000 abstract description 6
- 229910052797 bismuth Inorganic materials 0.000 abstract description 4
- 239000007789 gas Substances 0.000 abstract description 4
- 150000004649 carbonic acid derivatives Chemical class 0.000 abstract description 3
- 238000001552 radio frequency sputter deposition Methods 0.000 abstract description 3
- 239000010409 thin film Substances 0.000 description 32
- 238000000034 method Methods 0.000 description 17
- 239000010408 film Substances 0.000 description 13
- 239000013078 crystal Substances 0.000 description 10
- 239000000523 sample Substances 0.000 description 10
- 239000000470 constituent Substances 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 5
- 238000005240 physical vapour deposition Methods 0.000 description 5
- 238000000137 annealing Methods 0.000 description 4
- 239000011812 mixed powder Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 230000005668 Josephson effect Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910002370 SrTiO3 Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910021521 yttrium barium copper oxide Inorganic materials 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 229910002244 LaAlO3 Inorganic materials 0.000 description 1
- 229910002367 SrTiO Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 235000010216 calcium carbonate Nutrition 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E40/00—Technologies for an efficient electrical power generation, transmission or distribution
- Y02E40/60—Superconducting electric elements or equipment; Power systems integrating superconducting elements or equipment
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
- Compositions Of Oxide Ceramics (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は複合酸化物超電導体に関するものであり、特に
、高い超電導臨界電流密度CJc)を有するBi −3
r −Ca−Cu系の複合酸化物超電導体に関するもの
である。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to composite oxide superconductors, particularly Bi-3 having a high superconducting critical current density CJc).
The present invention relates to an r-Ca-Cu-based composite oxide superconductor.
従来技術
超電導材料の超電導臨界温度Tcは長期間に亘ってNb
3Geの23Kを越えることができなかったが、198
6年に(La、 Sr) 2 COsで表される酸化物
ノ焼結体が30にの高いTcをもつ超電導材料となるこ
とがベドノーツ、ミュラーによって発見されてから非低
温超電導を実現する可能性が大きく高まっている。その
後、YBCOと称されるY1Ba2Cus07−xで表
される複合酸化物が90に級の超電導体であることがチ
ュー達によって発表され、続いて100に以上のTcを
示すBi −3r −Ca−Cu系複合酸化物超電導体
が発見されている。The superconducting critical temperature Tc of the conventional superconducting material is Nb over a long period of time.
Although it was not possible to exceed 23K of 3Ge, 198
In 1960, Bednotes and Müller discovered that sintered oxides represented by (La, Sr) 2 COs were superconducting materials with a Tc as high as 30, and the possibility of realizing non-low temperature superconductivity began to emerge. is increasing significantly. After that, Chu et al. announced that the composite oxide represented by Y1Ba2Cus07-x, called YBCO, is a 90-grade superconductor, and subsequently, Bi-3r-Ca-Cu which has a Tc of 100 or higher A complex oxide superconductor has been discovered.
これ以前にも、ビスマスを含む複合酸化物が超電導特性
を示すということは知られており、米国特許第3.93
2.315号にはBa−Pb−B1系の複合酸化物が超
電導特性を示すということが記載されている。また、特
公昭60−173.885号公報には、Ba−B1系の
複合酸化物が超電導特性を示すということが記載されて
いる。しかし、これらの超電導体の超電導遷移温度は約
10に程度であったため、冷媒として沸点が4.2にの
液体ヘリウムを用いなければならなかった。Prior to this, it was known that complex oxides containing bismuth exhibited superconducting properties, and U.S. Patent No. 3.93
No. 2.315 describes that a Ba-Pb-B1 complex oxide exhibits superconducting properties. Furthermore, Japanese Patent Publication No. 173.885/1985 describes that Ba-B1-based composite oxides exhibit superconducting properties. However, since the superconducting transition temperature of these superconductors was about 10°C, liquid helium with a boiling point of 4.2 had to be used as a coolant.
Bl系複合酸化物は臨界温度が高いという他に、化学的
に安定で、YBCO等のように超電導特性の経時劣化が
少ないという利点の他に、構成元素として稀少な希土類
を含まないので製造コストを下げられるという利点があ
る。In addition to having a high critical temperature, Bl-based composite oxides have the advantage of being chemically stable and exhibiting less deterioration of superconducting properties over time unlike YBCO, etc., as well as lower production costs as they do not contain rare earth elements as constituent elements. It has the advantage of lowering the
当初、これらの複合酸化物超電導体は、複合酸化物を構
成する構成元素の酸化物および/または炭酸塩の混合粉
末を焼結してバルクの焼結体として作られていたが、現
在では薄膜に成膜するのが実用的であると考えられてい
る。この薄膜はスパッタリング法に代表される物理蒸着
法により成膜することができ、この場合には、焼結によ
って得られた複合酸化物の焼結体をターゲットとして用
いてRFスパッタリング方法で薄膜に成膜するのが一般
的である。また、焼結または成膜によって得られた焼結
体および薄膜を酸素雰囲気中で熱処理して、焼結体また
は薄膜を構成する結晶中の酸素欠陥を調整するのが一般
的である。Initially, these composite oxide superconductors were made as bulk sintered bodies by sintering mixed powders of oxides and/or carbonates of the constituent elements that make up the composite oxide, but now they are made in the form of thin films. It is considered practical to form a film in This thin film can be formed by a physical vapor deposition method such as a sputtering method. In this case, the thin film can be formed by an RF sputtering method using a sintered body of a composite oxide obtained by sintering as a target. It is common to have a film. Further, it is common to heat-treat the sintered body and thin film obtained by sintering or film formation in an oxygen atmosphere to adjust oxygen defects in the crystals constituting the sintered body or thin film.
しかし、これまでに成膜法で得られたBi −3rCa
−Cu系超電導体薄膜は臨界電流密度Jcが小さいため
に、例えば薄膜素子の材料として使用することができな
かった。すなわち、従来の方法によって成膜されたBi
−5r−Ca−Cu系複合酸化物超電導体薄膜は、1
00K以上の高い臨界温度Tcを示すが、臨界電流密度
Jcはせいぜい10.000 A / cut程度であ
り実用性が低かった。However, until now Bi-3rCa obtained by film-forming method
-Cu-based superconductor thin films have a small critical current density Jc, and therefore cannot be used, for example, as a material for thin film devices. That is, the Bi film formed by the conventional method
-5r-Ca-Cu based composite oxide superconductor thin film is 1
Although it exhibits a high critical temperature Tc of 00K or higher, the critical current density Jc is at most about 10.000 A/cut, making it less practical.
本発明者等は、この系の超電導薄膜の特性、特に超電導
臨界電流密度を改善すべく、種々検討した結果、薄膜に
Biを化学量論組成よりも過剰に加えることにより、臨
界電流密度の改善に有効であることを見出し、本発明を
完成した。The present inventors conducted various studies in order to improve the characteristics of the superconducting thin film of this system, especially the superconducting critical current density, and found that by adding Bi in excess of the stoichiometric composition to the thin film, the critical current density could be improved. The present invention was completed based on the discovery that the method is effective for the following purposes.
発明が解決しようとする課題
本発明の目的は上記従来技術の問題点を解決して、高い
臨界電流密度Jcを有するビスマス含有複合酸化物、特
に、Bi −3r −Ca−Cu系複合酸化物超電導体
を提供することにある。Problems to be Solved by the Invention An object of the present invention is to solve the problems of the prior art described above, and to provide a bismuth-containing composite oxide having a high critical current density Jc, particularly a Bi-3r-Ca-Cu composite oxide superconductor. It's about offering your body.
課題を解決するための手段
本発明の提供する超電導体は下記の式:%式%
dは過剰なりiの量で0<d≦1.2を満たし、好まし
くはQ、l<d≦1.2であり、mは6≦m≦10を満
たし、好ましくは7≦m≦9であり、
nは4≦n≦8を満たし、好ましくは5≦n≦7であり
、
p=5+m+nであり、
XはQ<x<lを満たす数を表し、
yは一2≦y≦+2を満たす数を表す)で表される組成
を有するBi −3r −Ca−Cu系複合酸化物によ
って主として構成されることを特徴としている。Means for Solving the Problems The superconductor provided by the present invention satisfies the following formula: % formula % where d is excess and the amount of i satisfies 0<d≦1.2, preferably Q, l<d≦1. 2, m satisfies 6≦m≦10, preferably 7≦m≦9, n satisfies 4≦n≦8, preferably 5≦n≦7, p=5+m+n, Mainly composed of a Bi-3r-Ca-Cu-based composite oxide having a composition represented by X represents a number satisfying Q<x<l, and y represents a number satisfying -2≦y≦+2. It is characterized by
本発明による上記複合酸化物超電導体の特徴は従来化学
量論的に最適値と考えられていた下記の式:
%式%
(ここで、Xs mz n5T)およびyは上記定義の
ものと同じものを表す)
で表わされるBi −3r −Ca−Cu系複合酸化物
超電導材料に比べて、B1の量を過剰(すなわち、d=
Qではなく、Q<d≦1.2)にした点にある。The characteristics of the composite oxide superconductor according to the present invention are the following formula, which was conventionally considered to be the optimal value in terms of stoichiometry: % formula % (where Xs mz n5T) and y are the same as those defined above. Compared to the Bi-3r-Ca-Cu-based composite oxide superconducting material represented by
The point lies in the fact that Q<d≦1.2), rather than Q.
本発明による複合酸化物超電導体の好ましい具体例とし
ては下記の複合酸化物系を挙げることができる:
B14−asr<Ca<Cus O2o+y(ここで、
dは0くd≦1.2を満たす数を表し、yは一2≦y≦
+2を満たす数を表す)この複合酸化物は化学組成が互
いに同じ2つの層が一定格子定数だけずれた状態で上下
に積層されているので、本発明の超電導体は、上記の式
の代わりに下記の式:
B12+d/2Sr2Ca2Cu30+o、y/2(こ
こで、dとyは上記と同じ定義を有する)で表すことも
できる。Preferred specific examples of the composite oxide superconductor according to the present invention include the following composite oxide system: B14-asr<Ca<Cus O2o+y (here,
d represents a number that satisfies 0 and d≦1.2, and y represents a number that satisfies -2≦y≦
(represents a number satisfying +2) This composite oxide is made up of two layers with the same chemical composition stacked one above the other with a certain lattice constant shift, so the superconductor of the present invention can be used instead of the above formula. It can also be represented by the following formula: B12+d/2Sr2Ca2Cu30+o,y/2, where d and y have the same definitions as above.
本発明による上記複合酸化物超電導体は、バルクの材料
として作ることもできるが、基板上に薄膜として成膜す
るのが好ましい。本発明の複合酸化物薄膜を形成する基
板はMgO1SrTiO+、LaAlO3、LaGa0
0等の単結晶にするのが好ましい。特にMf!、O単結
晶の(100)面または(110)面を成膜面とするの
が好ましい。Although the composite oxide superconductor according to the present invention can be made as a bulk material, it is preferably formed as a thin film on a substrate. The substrate on which the composite oxide thin film of the present invention is formed is MgO1SrTiO+, LaAlO3, LaGa0
It is preferable to use a single crystal of 0 grade. Especially Mf! , the (100) or (110) plane of the O single crystal is preferably used as the film-forming surface.
本発明材料の製造方法
本発明に係る複合酸化物超電導体は公知の方法によって
製造することができる。Method for manufacturing the material of the present invention The composite oxide superconductor according to the present invention can be manufactured by a known method.
バルクの超電導体とする場合には、本発明で定義の構成
元素の組成となるように調整した原料粉末混合物、例え
ば本発明の超電導体の構成元素の酸化物および/または
炭酸塩の混合物を焼結すればよい。When producing a bulk superconductor, a raw material powder mixture adjusted to have the composition of the constituent elements defined in the present invention, such as a mixture of oxides and/or carbonates of the constituent elements of the superconductor of the present invention, is sintered. All you have to do is tie it.
基板上に薄膜状に成膜する場合には、公知の物理蒸着法
(PVD)法または化学的蒸着(CV D)法を用いる
。物理蒸着法としてRFマグネトロンスパッタリング法
、真空蒸着法、イオンブレーティング法を用いることが
できる。この場合に用いる蒸発源またはターゲットは構
成金属元素そのもの、その合金及び/またはその酸化物
、フッ化物または炭酸塩等の粉末原料、この粉末原料を
粉末焼結法によって焼結した焼結体、この焼結体を粉砕
して得られる焼結粉末にするのが好ましい。この蒸発源
またはターゲットは複数に分けることもできる。分子線
エピタキシー(MBE)法を用いる場合には構成金属元
素またはその酸化物等をにセルまたは電子銃を用いて蒸
発させる。この場合には、必要に応じて酸素を蒸着雰囲
気中に別途供給する。When forming a thin film on a substrate, a known physical vapor deposition (PVD) method or chemical vapor deposition (CVD) method is used. As the physical vapor deposition method, an RF magnetron sputtering method, a vacuum evaporation method, and an ion blating method can be used. The evaporation source or target used in this case is a powder raw material such as the constituent metal element itself, its alloy and/or its oxide, fluoride or carbonate, a sintered body obtained by sintering this powder raw material by a powder sintering method, or a sintered body of this powder raw material. It is preferable to grind the sintered body into a sintered powder. This evaporation source or target can also be divided into multiple parts. When using the molecular beam epitaxy (MBE) method, the constituent metal elements or their oxides are evaporated using a cell or an electron gun. In this case, oxygen is separately supplied into the deposition atmosphere as required.
いずれの場合でも、最終的に得られる複合酸化物のバル
クまたは薄膜の構成元素の組成比が本発明の定義の組成
比となるように原料の混合粉末の組成比を調整しなけれ
ばならない。特に、物理蒸着法を用いる場合には、蒸発
源またはターゲットの金属元素の原子比は、各元素の蒸
着速度またはスパッタレートと、基板に対する結合力の
差に応じて調節する。本発明の特徴であるBiを過剰に
加えるためには、蒸発源またはターゲット中でのBiの
比率を従来考えられていた最適値よりも大きくすればよ
い。In any case, the composition ratio of the raw material mixed powder must be adjusted so that the composition ratio of the constituent elements of the bulk or thin film of the composite oxide finally obtained is the composition ratio defined in the present invention. In particular, when using a physical vapor deposition method, the atomic ratio of metal elements in the evaporation source or target is adjusted depending on the evaporation rate or sputtering rate of each element and the difference in bonding force to the substrate. In order to add excessive Bi, which is a feature of the present invention, the ratio of Bi in the evaporation source or target may be made larger than the optimal value conventionally considered.
本発明の好ましい実施例では、本発明による複合酸化物
超電導体がスパッタリングによって薄膜として成膜され
る。この場合のスパッタリング時の圧力はI Xl0−
’〜I X 10− ’Torrであることが好ましく
、スパッタリングガスは02の分子百分率が10〜60
%であるArと02の混合ガスを使用することが好まし
い。In a preferred embodiment of the invention, the composite oxide superconductor according to the invention is deposited as a thin film by sputtering. The pressure during sputtering in this case is I Xl0-
'~I
It is preferable to use a mixed gas of Ar and 02%.
上記薄膜が成膜される基板温度は複合酸化物薄膜を形成
する基板はMgO,Zn0z 、SrTiO3、LiN
b0. 、LiTa0. 、LaAl0. 、LaGa
0.等の単結晶にするのが好ましい。この他にLiA1
0a、LxCaO,、KTaO3、CaF、 、BeF
、 、C3Z。The substrate temperature on which the above thin film is formed is as follows: The substrate on which the composite oxide thin film is formed is MgO, Zn0z, SrTiO3, LiN.
b0. , LiTa0. , LaAl0. , LaGa
0. It is preferable to make it into a single crystal such as. In addition to this, LiA1
0a, LxCaO, , KTaO3, CaF, , BeF
, ,C3Z.
YSZ、さらにはシリコン基板を用いることもできる。YSZ or even a silicon substrate can also be used.
シリコン単結晶基板を用いる場合には、複合酸化物と基
板との間にMgO1ZnO,等のバッファー層を設ける
のか好ましい。本発明の超電導体は電気抵抗が異方性を
示し、結晶のa軸とb軸とで規定される面に平行な方向
の臨界電流密度は高いが、C軸方向へ流れる電流は小さ
い。従って、薄膜に所望の配向性を持たせるのが好まし
い。例えばMgOまたはSrTiO3単結晶基板の(0
01)面上に薄膜を成膜した薄膜のa軸は基板面に直角
またはほぼ直角に配向するので、基板面に沿った臨界電
流密度Jcが大きくなる。特殊な場合には、MgOまた
は5rTIOz単結晶基板の(110)面上に成膜する
ことによって、深さ方向の臨界電流密度Jcを大きくす
ることもできる。上記のMgOやSrT i O。When using a silicon single crystal substrate, it is preferable to provide a buffer layer such as MgO1ZnO between the composite oxide and the substrate. The superconductor of the present invention exhibits anisotropy in electrical resistance, and the critical current density in the direction parallel to the plane defined by the a-axis and b-axis of the crystal is high, but the current flowing in the C-axis direction is small. Therefore, it is preferable to give the thin film a desired orientation. For example, MgO or SrTiO3 single crystal substrate (0
Since the a-axis of the thin film formed on the substrate surface is oriented perpendicularly or substantially perpendicularly to the substrate surface, the critical current density Jc along the substrate surface becomes large. In special cases, the critical current density Jc in the depth direction can be increased by forming a film on the (110) plane of an MgO or 5rTIOz single crystal substrate. The above MgO and SrTiO.
等の単結晶基板は本発明の複合酸化物に近い熱膨張係数
を持つため、基板を加熱・冷却した際に複合酸化物に与
える熱応力が小さくなるので好ましい。A single crystal substrate such as the above is preferable because it has a coefficient of thermal expansion close to that of the composite oxide of the present invention, so that the thermal stress imparted to the composite oxide when the substrate is heated and cooled is reduced.
スパッタリング時には、基板を670〜750℃、好ま
しくは670〜720℃、更に好ましくは680〜71
0℃の範囲の温度に加熱するのが好ましい。また、ター
ゲットに印加する高周波電力は0.064〜1.27W
/cnfの範囲内にするのが好ましく、成膜速度は0.
05〜1人/分の範囲内にするのが好ましい。During sputtering, the substrate is heated to 670 to 750°C, preferably 670 to 720°C, more preferably 680 to 71°C.
Preferably, heating is carried out to a temperature in the range of 0°C. In addition, the high frequency power applied to the target is 0.064 to 1.27W.
/cnf, and the film forming rate is 0.
It is preferable to set the speed within the range of 0.05 to 1 person/minute.
さらに、成膜後に870〜910℃の温度範囲内でアニ
ール処理するのが好ましい。Furthermore, it is preferable to perform an annealing treatment within a temperature range of 870 to 910° C. after film formation.
特に、成膜時の基板温度が上記範囲を外れると、急激に
臨界電流密度が低下する。また、成膜後に所定の条件で
アニール処理すなわち後熱処理することは極めて有効で
あることがわかっている。このアニール処理は、酸素含
有雰囲気または酸素気流中で行うことが好ましい。なお
、このアニール処理温度は極めて重要な制御因子であり
、処理温度は870〜910℃の温度範囲、より好まし
くは880〜905℃の温度範囲に所定の時間(例えば
、10分〜5時間)保つことが必要である。この範囲外
の条件で処理した場合は、条件によっては寧ろ薄膜の特
性が低下する場合もある。In particular, when the substrate temperature during film formation is out of the above range, the critical current density sharply decreases. Furthermore, it has been found that it is extremely effective to perform annealing treatment, ie, post-heat treatment, under predetermined conditions after film formation. This annealing treatment is preferably performed in an oxygen-containing atmosphere or an oxygen stream. Note that this annealing treatment temperature is an extremely important control factor, and the treatment temperature is maintained in a temperature range of 870 to 910°C, more preferably in a temperature range of 880 to 905°C for a predetermined period of time (for example, 10 minutes to 5 hours). It is necessary. If the treatment is performed under conditions outside this range, the properties of the thin film may deteriorate depending on the conditions.
以下に具体的な実施例を挙げて本発明をより具体的に詳
述するが、以下の実施例は本発明を例示したものに過ぎ
ず、本発明の技術的範囲を何ら限定するものではない。The present invention will be described in more detail with reference to specific examples below, but the following examples are merely illustrative of the present invention and do not limit the technical scope of the present invention in any way. .
実施例
RFマグネトロンスパッタリング法によす、B1−3r
−Ca−Cu系複合酸化物超電導体薄膜を作製した。Example: Based on RF magnetron sputtering method, B1-3r
A -Ca-Cu based composite oxide superconductor thin film was produced.
このRFマグネトロンスパッタリング法で使うターゲッ
トを作るために、市販の81203粉末と、市販の5r
COa粉末と、市販のCaCO3粉末と、市販のCuO
粉末とを混合して、混合粉末の原子比Bi :Sr :
Ca 二Cuが下記の比:(1) 1.4 :
1.0 = 1.0:1.5(2) 1.5 : 1
.0 : 1.0 : 1.5(3) 1.6 : 1
.0 : 1.0 : 1.5(4)1.7: 1.
0: 1.口=1.5(5) 1.8 : 1.0
: 1.0 : 1.5となるようにした5種類の粉末
混合物を用意した。To make the target used in this RF magnetron sputtering method, we used commercially available 81203 powder and commercially available 5r powder.
COa powder, commercially available CaCO3 powder, and commercially available CuO
The atomic ratio of the mixed powder is Bi:Sr:
Ca diCu has the following ratio: (1) 1.4:
1.0 = 1.0:1.5(2) 1.5:1
.. 0: 1.0: 1.5 (3) 1.6: 1
.. 0: 1.0: 1.5 (4) 1.7: 1.
0: 1. Mouth = 1.5 (5) 1.8: 1.0
Five types of powder mixtures having a ratio of 1.0 to 1.5 were prepared.
各混合粉末を800℃で8時間焼結して得たBi −3
rCa−Cu−0複合酸化物焼結体を粉砕して得られた
焼結粉末を、粉末ターゲットとして用いた。Bi-3 obtained by sintering each mixed powder at 800°C for 8 hours
A sintered powder obtained by pulverizing the rCa-Cu-0 composite oxide sintered body was used as a powder target.
また、基板としてはLfgO単結晶基板を用い、成膜面
は(110)面とした。Further, an LfgO single crystal substrate was used as the substrate, and the film formation surface was the (110) plane.
上記のBi原子比が異なる5種類の粉末試料を用いて各
試料に共通な下記の成膜条件でRFスパッタリング装置
を用いて成膜した:
基板温度 :690℃
スパッタリングガス:Arと02との混合気体02/
(Ar+ 02) =0.2 (体積比)スパッタリ
ング圧カニ 2 Xl0−”Torr高周波電力
: 50W (0,64W/crd)各薄膜は膜厚が
2000人となるまで成膜した。得られた薄膜は900
℃で1時間1気圧の酸素ガス中でアニールした。A film was formed using an RF sputtering apparatus using the above five types of powder samples with different Bi atomic ratios under the following film forming conditions common to each sample: Substrate temperature: 690°C Sputtering gas: Mixture of Ar and 02 Gas 02/
(Ar+02) =0.2 (volume ratio) Sputtering pressure crab 2 Xl0-”Torr high frequency power
: 50W (0.64W/crd) Each thin film was formed to a film thickness of 2000. The obtained thin film was 900
C. for 1 hour in 1 atm of oxygen gas.
こうして得られた各試料(試料番号1〜5)が超電導体
であることは抵抗測定によって確認した。It was confirmed by resistance measurement that each sample thus obtained (sample numbers 1 to 5) was a superconductor.
すなわち、各試料をタラビオスタット中で8にの液体ヘ
リウムに浸漬し、温度を次第に上昇させながら常伝導体
となる温度(臨界温度Tc)を測定した。That is, each sample was immersed in liquid helium at a temperature of 8 in a Tarabiostat, and the temperature at which the sample became a normal conductor (critical temperature Tc) was measured while gradually increasing the temperature.
また、4点プローブ法によって77、3 Kにおける超
電導臨界電流密度を常法に従って測定した。また、得ら
れた各薄膜の構成元素の組成比はICPによって測定し
た。Further, the superconducting critical current density at 77.3 K was measured using a four-point probe method according to a conventional method. Moreover, the composition ratio of the constituent elements of each thin film obtained was measured by ICP.
これらのデータは第1表にまとめて示しである。These data are summarized in Table 1.
第1〜5図は各薄膜(試料番号1〜5)のX線回解チャ
ートである。第2〜4図は試料番号2〜4の薄膜がC軸
配向した2−2−2−3相のみからなる薄膜であること
を示しており、第1図と第4図は試料番号1と5の薄膜
は低温和である2−2−1−2相も含んでいることを示
している。1 to 5 are X-ray resolution charts of each thin film (sample numbers 1 to 5). Figures 2 to 4 show that the thin films of sample numbers 2 to 4 are thin films consisting only of 2-2-2-3 phases with C-axis orientation, and Figures 1 and 4 show that sample numbers 1 and It is shown that the thin film of No. 5 also contains a 2-2-1-2 phase which has a low temperature reduction.
第1表
(試料lと5は比較例である)
発明の効果
本発明によるBi −3r −Ca−Cu系複合酸化物
超電導体薄膜では、この系と同じ構成元素によって構成
される従来公知の複合酸化物が本来有していた高い臨界
温度(Tc)を維持したまま、超電導臨界電流密度(J
c)が大幅に向上する。従って、この薄膜を使用して
、液体窒素温度以上の高い温度で動作するジョセフソン
素子に代表される各種の超電導素子を作製することがで
きる。すなわち、超電導現象の代表的な応用分野である
エレクトロニクスの分野では、各種の超電導素子が提案
され、また開発されている。代表的なものとしては、超
電導材料どうしを弱く接合した場合に、印加電流によっ
て量子効果が巨視的に現れるジョセフソン効果を利用し
た素子が挙げられる。また、トンネル接合型ジョセフソ
ン素子は、超電導材料のエネルギーギャップが小さいこ
とから、極めて高速な低電力消費のスイッチング素子と
して期待されている。さらに、電磁波や磁場に対するジ
ョセフソン効果が正確な量子現象として現れることから
、ジョセフソン素子を磁場、マイクロ波、放射線等の超
高感度センサとして利用することが期待されている。超
高速電子計算機では単位面積当たりの消費電力が冷却能
力の限界に達してぎているため、超電導素子の開発が要
望されており、さらに、電子回路の集積度が高くなるに
つれて、電流ロスの無い超電導材料を配線材料として用
いることが要望されている。Table 1 (Samples 1 and 5 are comparative examples) Effects of the Invention The Bi-3r-Ca-Cu based composite oxide superconductor thin film according to the present invention is superior to conventionally known composites composed of the same constituent elements as this system. While maintaining the high critical temperature (Tc) originally possessed by oxides, the superconducting critical current density (J
c) is significantly improved. Therefore, this thin film can be used to fabricate various superconducting devices, typified by Josephson devices, which operate at temperatures higher than the liquid nitrogen temperature. That is, in the field of electronics, which is a typical application field of superconducting phenomena, various superconducting elements have been proposed and developed. A typical example is an element that utilizes the Josephson effect, in which a quantum effect appears macroscopically due to an applied current when superconducting materials are weakly bonded together. Further, tunnel junction type Josephson devices are expected to be extremely high-speed switching devices with low power consumption because the energy gap of the superconducting material is small. Furthermore, since the Josephson effect on electromagnetic waves and magnetic fields appears as a precise quantum phenomenon, it is expected that Josephson elements will be used as ultrasensitive sensors for magnetic fields, microwaves, radiation, etc. In ultra-high-speed electronic computers, the power consumption per unit area has reached the limit of cooling capacity, so there is a demand for the development of superconducting elements.Furthermore, as the degree of integration of electronic circuits increases, superconducting materials with no current loss are being developed. There is a demand for using it as a wiring material.
本発明によって得られる複合酸化物超電導薄膜はこれら
の用途の材料として用いることが可能である。The composite oxide superconducting thin film obtained by the present invention can be used as a material for these applications.
第1図〜第5図は、本発明の実施例で得られた試料番号
第1〜5の薄膜の各X線回折チャートである。1 to 5 are X-ray diffraction charts of thin films of sample numbers 1 to 5 obtained in Examples of the present invention.
Claims (1)
Cu_nO_p_+_y(ここで、 dは過剰なBiの量で0<d≦1.2を満たし、mは6
≦m≦10を満たし、 nは4≦n≦8を満たし、 p=6+m+nであり、 xは0<x<1を満たす数を表し、 yは−2≦y≦+2を満たす数を表す) で表される組成を有する複合酸化物によって主として構
成されることを特徴とする超電導体。(1) The following formula: Bi_4_+_d(Sr_1_-_k, Ca_k)_m
Cu_nO_p_+_y (where d is the amount of excess Bi, satisfying 0<d≦1.2, and m is 6
≦m≦10, n satisfies 4≦n≦8, p=6+m+n, x represents a number that satisfies 0<x<1, y represents a number that satisfies -2≦y≦+2) A superconductor mainly composed of a composite oxide having a composition represented by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1258551A JPH02199056A (en) | 1988-10-03 | 1989-10-03 | Bi-sr-ca-cu multiple oxide superconductor |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24942688 | 1988-10-03 | ||
| JP63-249426 | 1988-10-03 | ||
| JP1258551A JPH02199056A (en) | 1988-10-03 | 1989-10-03 | Bi-sr-ca-cu multiple oxide superconductor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02199056A true JPH02199056A (en) | 1990-08-07 |
Family
ID=26539282
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1258551A Pending JPH02199056A (en) | 1988-10-03 | 1989-10-03 | Bi-sr-ca-cu multiple oxide superconductor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02199056A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02129009A (en) * | 1988-11-04 | 1990-05-17 | Mitsubishi Metal Corp | Production of oxide superconductor |
-
1989
- 1989-10-03 JP JP1258551A patent/JPH02199056A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02129009A (en) * | 1988-11-04 | 1990-05-17 | Mitsubishi Metal Corp | Production of oxide superconductor |
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