JPH0220110U - - Google Patents

Info

Publication number
JPH0220110U
JPH0220110U JP9865288U JP9865288U JPH0220110U JP H0220110 U JPH0220110 U JP H0220110U JP 9865288 U JP9865288 U JP 9865288U JP 9865288 U JP9865288 U JP 9865288U JP H0220110 U JPH0220110 U JP H0220110U
Authority
JP
Japan
Prior art keywords
stage
wafer chuck
moves
wafer
measuring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9865288U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9865288U priority Critical patent/JPH0220110U/ja
Publication of JPH0220110U publication Critical patent/JPH0220110U/ja
Pending legal-status Critical Current

Links

Landscapes

  • A Measuring Device Byusing Mechanical Method (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の実施例1を示す構成図、第2
図は本考案の実施例2を示す構成図である。 1……ウエハチヤツク、2……X−Yステージ
、3a……ナイフ、3b……レジスト滴下装置、
4……X−Y−Zステージ、5……入力装置、6
……制御装置、7……ウエハ。
Figure 1 is a configuration diagram showing the first embodiment of the present invention;
The figure is a configuration diagram showing a second embodiment of the present invention. 1... Wafer chuck, 2... X-Y stage, 3a... Knife, 3b... Resist dropping device,
4...X-Y-Z stage, 5...Input device, 6
...Control device, 7...Wafer.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] ウエハ上の膜の一部を下地まで剥して形成され
た段差を測ることにより、膜厚を求める段差測定
装置において、ウエハチヤツクと、ウエハチヤツ
クを水平方向に移動せしめるX−Yステージと、
ウエハチヤツクの上方に位置し、段差部を形成す
るマーカと、マーカを垂直、水平方向に移動せし
めるX−Y−Zステージと、段差形成位置並びに
制御命令を入力する入力装置と、入力指示に従い
、X−YステージとX−Y−Zステージの駆動系
を制御する制御装置とを有することを特徴とする
段差形成装置。
A step measuring device that measures the film thickness by peeling off a part of the film on the wafer to the underlying layer and measuring the step formed thereon includes a wafer chuck, an X-Y stage that moves the wafer chuck in the horizontal direction,
A marker located above the wafer chuck that forms a step, an X-Y-Z stage that moves the marker vertically and horizontally, an input device that inputs the step formation position and control commands, - A step forming apparatus characterized by having a control device for controlling a drive system of a Y stage and an XYZ stage.
JP9865288U 1988-07-26 1988-07-26 Pending JPH0220110U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9865288U JPH0220110U (en) 1988-07-26 1988-07-26

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9865288U JPH0220110U (en) 1988-07-26 1988-07-26

Publications (1)

Publication Number Publication Date
JPH0220110U true JPH0220110U (en) 1990-02-09

Family

ID=31325116

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9865288U Pending JPH0220110U (en) 1988-07-26 1988-07-26

Country Status (1)

Country Link
JP (1) JPH0220110U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013015323A (en) * 2011-06-30 2013-01-24 Ulvac Japan Ltd Film thickness measuring apparatus and film thickness measuring method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013015323A (en) * 2011-06-30 2013-01-24 Ulvac Japan Ltd Film thickness measuring apparatus and film thickness measuring method

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