JPH02213403A - Manufacture of sintered member - Google Patents
Manufacture of sintered memberInfo
- Publication number
- JPH02213403A JPH02213403A JP1032664A JP3266489A JPH02213403A JP H02213403 A JPH02213403 A JP H02213403A JP 1032664 A JP1032664 A JP 1032664A JP 3266489 A JP3266489 A JP 3266489A JP H02213403 A JPH02213403 A JP H02213403A
- Authority
- JP
- Japan
- Prior art keywords
- sintered
- sintered body
- tungsten
- heating
- pores
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Powder Metallurgy (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の目的〕
(産業上の利用分野)
本発明は高融点金属及びセラミックス等の耐熱性焼結部
材の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a method for manufacturing heat-resistant sintered members such as high-melting point metals and ceramics.
(従来の技術)
W、No及びこれらの合金やZrO□、 i、O,等の
セラミックスのように融点が非常に高い材料を用いて部
材を作るには、一般に焼結法が用いられる。(Prior Art) A sintering method is generally used to make a member using a material with a very high melting point, such as W, No, alloys thereof, and ceramics such as ZrO□, i, O, etc.
しかし、これらの高融点材料は概して焼結性が悪く、焼
結には高い温度と長い時間が必要であるばかりでなく理
論密度に近い相対密度の焼結部材を得ることは困難であ
った。However, these high melting point materials generally have poor sinterability, requiring high temperature and long time for sintering, and it has been difficult to obtain a sintered member with a relative density close to the theoretical density.
近年、低い焼結温度で高い相対密度を得る方法として、
これらの高融点材料粉末中に融点の低いNi、 Cu等
の粉末を添加する方法が試みられている。In recent years, as a method to obtain high relative density at low sintering temperatures,
Attempts have been made to add powders of Ni, Cu, etc. with low melting points to these high melting point material powders.
実際、この方法によれば容易に高い相対密度を有する焼
結部材を得ることは可能であるが、使用可能温度が著し
く低下し材料本来の特性を発揮することができない。In fact, according to this method, it is possible to easily obtain a sintered member having a high relative density, but the usable temperature is significantly lowered and the original properties of the material cannot be exhibited.
また、サーメットのような材料については焼結後に高温
等方加圧(HIP : t(ot l5ostati
c Press−ing)処理を行うことにより高密度
化を図っている。In addition, for materials such as cermet, high temperature isostatic pressing (HIP: t) is applied after sintering.
c.Press-ing) processing to achieve high density.
HIP処理とはヒータを内臓した圧力容器の中に被処理
物を入れ、この容器の中に高圧のガスを導入し被処理物
を加熱・加圧することにより、被処理物内に残留してい
る気孔を押し潰し高密度化を図るものであるため、予め
HIP処理前の仮焼結段階である程度密度を上げておく
必要がある。すなわち、仮焼結体の密度が低いと焼結体
中の気孔が外界と通じている開気孔となり、HIP処理
時の加圧源であるガスがこの気孔内に侵入し、焼結体中
の気孔内圧力と圧力容器内のガス圧力が等しくなり焼結
体中の気孔を押し潰すことができないからである。した
がって、仮焼結体中の気孔は全て外界と通じていない閉
気孔にする必要があるが、上記のような高融点金属やセ
ラミックスは焼結性が悪いため、仮焼結段階で全ての気
孔を閉気孔にすることは不可能である。 従来、このよ
うな難焼結材料をHIP処理により緻密化するためには
内部を真空にしたキャン(容器)の中に被処理物を密閉
、封入する“キャニング″という作業が必要であった。HIP processing is a process in which the object to be processed is placed in a pressure vessel with a built-in heater, and high-pressure gas is introduced into the container to heat and pressurize the object. Since the pores are crushed to increase the density, it is necessary to increase the density to some extent in advance in the preliminary sintering stage before the HIP treatment. In other words, when the density of the pre-sintered body is low, the pores in the sintered body become open pores that communicate with the outside world, and the gas that is the pressure source during HIP processing enters into these pores, causing the inside of the sintered body to become open. This is because the pressure inside the pores becomes equal to the gas pressure within the pressure vessel, making it impossible to crush the pores in the sintered body. Therefore, all the pores in the pre-sintered body need to be closed pores that do not communicate with the outside world, but since the high melting point metals and ceramics mentioned above have poor sintering properties, all the pores must be closed during the pre-sintering stage. It is impossible to make the pores closed. Conventionally, in order to densify such difficult-to-sinter materials by HIP processing, it has been necessary to perform an operation called "canning" in which the object to be processed is hermetically sealed and enclosed in a can (container) whose interior is evacuated.
すなわち、このキャンにより被処理物内にガスが侵入す
るのを防ぎ、ガス圧力によりこのキャンを押し潰すこと
で、被処理物を、加熱・加圧成形するものである。That is, the can prevents gas from entering the workpiece, and the can is crushed by gas pressure, thereby molding the workpiece under heat and pressure.
キャンの構成を第5図を用いて説明する。被処理物11
は圧力媒体14やキャン12と反応しないようにバリヤ
ー層13で覆った後、キャンの中に入れ加熱(ベーキン
グ)しながら脱気パイプ15を通してキャン内の空気を
真空ポンプで抜き、その状態で脱気パイプを溶接等によ
り真空封入しHIP処理に供する。The configuration of the can will be explained using FIG. Object to be processed 11
is covered with a barrier layer 13 to prevent it from reacting with the pressure medium 14 and the can 12, and then placed inside the can and heated (baked) to remove the air inside the can through the degassing pipe 15 with a vacuum pump. The air pipe is vacuum sealed by welding or the like and subjected to HIP treatment.
(発明が解決しようとする課題)
上記方法において、キャンの材料としてはHIP処理温
度以上の融点を有し、かつ、HIP処理時の圧縮変形に
耐えられるような高温で十分な延性を持っている必要が
ある。このような要求を満たす材料として一般にはガラ
スや軟鋼が使われるが、軟鋼は融点が低く、上記高融点
材料のHIP処理に使用することは出来ない。また、ガ
ラスはHIP処理温度が高過ぎると粘性が低下し被処理
物の重さでガラスが切れキャンがリークする。逆に、温
度が低過ぎると軟化せずHIP処理時のガス圧で圧壊す
るので、その使用可能温度は非常に狭いという問題があ
る。(Problems to be Solved by the Invention) In the above method, the can material has a melting point higher than the HIP treatment temperature and has sufficient ductility at high temperatures to withstand compressive deformation during the HIP treatment. There is a need. Glass and mild steel are generally used as materials that meet these requirements, but mild steel has a low melting point and cannot be used in the HIP treatment of the above-mentioned high melting point materials. Furthermore, if the HIP treatment temperature of glass is too high, the viscosity of the glass will decrease and the weight of the object to be treated will cause the glass to break and cause leakage. On the other hand, if the temperature is too low, the material will not soften and will be crushed by the gas pressure during the HIP process, so there is a problem that the temperature at which it can be used is very narrow.
圧力媒体の材料、バリヤー層の材料に要求される特性と
しては、キャンの外側から作用する圧縮ガス圧力を被処
理物に伝達する必要が有るのでHIP処理時の高温・高
圧下でも焼結しないことが要求される。また、キャン、
圧力媒体、バリヤー層、被処理物がお互いに反応し低融
点の化合物を形成したり、キャンや被処理物を脆化させ
るような材料は不適格である。しかしながら、現在、1
500℃を超えるような温度でこのような要求を完全に
満たす材料はほとんど無いのが現状である。The properties required for the pressure medium material and the barrier layer material are that they must not sinter even under high temperature and high pressure during HIP processing, as it is necessary to transmit the compressed gas pressure that acts from the outside of the can to the workpiece. is required. Also, Can,
Materials that cause the pressure medium, barrier layer, and workpiece to react with each other to form compounds with low melting points, or that cause embrittlement of the can or workpiece are unsuitable. However, currently 1
At present, there are almost no materials that completely satisfy these requirements at temperatures exceeding 500°C.
さらに、上記のような技術的問題に加えこのようなキャ
ンニング作業には様々な設備を必要とするだけでなく、
非常に多大の時間とコストが要求される。また、キャン
ニングすることにより被処理物の体積はキャニング前の
5〜20倍にもなり。Furthermore, in addition to the technical problems mentioned above, this kind of canning work not only requires various equipment, but also
This requires an extremely large amount of time and cost. Moreover, by canning, the volume of the object to be processed becomes 5 to 20 times that before canning.
使用するHIP処理装置もかなり大形のものが必要とな
る。従って、従来のキャニングHIP処理方法は部品試
作の場合のように軽量、小形部材を少量、かつ、生産コ
ストを考えないで作る場合は十分適用可能であるが、重
量が数100Kgもあるような被処理物を大量に生産す
ることはコスト的に不可能であった。また、上記のよう
な高融点金属やセラミックスのHIP処理温度は通常1
500℃以上であるため、バリヤー層や圧力媒体と被処
理物との反応による被処理物表面での反応生成物層の形
成は避けることが出来ず、この被処理物表面に形成され
た反応酸物層のために被処理物の特性が劣化したり被処
理物とバリヤー層が融着し離型ができなくなることも有
る。The HIP processing equipment used also needs to be quite large. Therefore, the conventional Canning HIP processing method is fully applicable when making lightweight, small parts in small quantities and without considering production costs, such as in the case of parts prototyping. It has been impossible to mass-produce treated products due to cost considerations. In addition, the HIP treatment temperature for high melting point metals and ceramics as mentioned above is usually 1
Since the temperature is 500°C or higher, the formation of a reaction product layer on the surface of the workpiece due to the reaction between the barrier layer or pressure medium and the workpiece cannot be avoided, and the reaction acid formed on the surface of the workpiece cannot be avoided. The properties of the object to be processed may deteriorate due to the material layer, or the object to be processed and the barrier layer may become fused, making it impossible to release the mold.
本発明は上記問題点を解決するためになされたもので、
大形かつ大量の高融点金属またはセラミックスのように
焼結性の悪い部材を低コストで高密度化が図れ、かつ、
高品質の焼結部材が得られる製造方法を提供することを
目的とする。The present invention has been made to solve the above problems,
It is possible to increase the density of large and large quantities of materials with poor sinterability, such as high-melting point metals or ceramics, at low cost, and
It is an object of the present invention to provide a manufacturing method that allows high-quality sintered members to be obtained.
(8題を解決するための手段)
本発明は高融点金属粉末またはセラミックス粉末を焼結
して製作した仮焼結部材の表面部を加熱し緻密化するこ
とにより表面部近傍の気孔を無くし、この表面層に上記
キャンの役割を持たせて焼結部材内に残留している気孔
を全て外界と通じていない閉気孔にして後HIP処理す
ることを特徴とする。(Means for Solving Problem 8) The present invention eliminates pores near the surface by heating and densifying the surface of a temporarily sintered member manufactured by sintering high-melting point metal powder or ceramic powder, It is characterized in that this surface layer is given the role of the can, and all the pores remaining in the sintered member are converted into closed pores that do not communicate with the outside world, followed by HIP treatment.
(作 用)
焼結終了直後の仮焼結部材1内には第2図(b)に示す
ように多数の気孔10が残留しているが、この段階での
相対密度は低く、残留している気孔の大部分は外界と通
じている開気孔である。したがって、仮焼結部材1内の
気孔を無くし高密度化を図るため、このままの状態でH
IP処理を施しても仮焼結部材1中の気孔にHIP処理
時の圧力媒体であるガス9が進入し、仮焼結体中の気孔
内圧力と圧力容器内のガス圧力が等しくなり仮焼結体中
の気孔IOを押し潰すことができない。(Function) Immediately after sintering, a large number of pores 10 remain in the pre-sintered member 1 as shown in FIG. 2(b), but the relative density at this stage is low and the remaining pores are Most of the stomata in the body are open pores that communicate with the outside world. Therefore, in order to eliminate pores in the pre-sintered member 1 and increase its density, H
Even if the IP treatment is performed, gas 9, which is the pressure medium during the HIP treatment, enters the pores in the pre-sintered member 1, and the pressure inside the pores in the pre-sintered body becomes equal to the gas pressure in the pressure vessel, causing the pre-sintering to take place. The pores IO in the aggregate cannot be crushed.
しかし、第2図(a)に示すように仮焼結体1の表面を
その材料が十分緻密化する温度または溶融する温度まで
加熱することによ゛り焼結体表面層4内の気孔を無くし
、その結果、仮焼結体内に残留している気孔8を外界と
通じていない閉気孔にすることができる。この状態でH
IP処理を施すとこの焼結体表面層4がキャンの効果を
有するため、圧力容器内のガス9は緻密な焼結体表面層
4がバリヤーとなり、仮焼結体内の気孔8内に進入する
ことができない、よって、圧力容器内のガス圧力により
仮焼結部材1は加圧・加熱成形され焼結体内の気孔8は
押し潰され高密度の焼結部材を得ることができる。However, as shown in FIG. 2(a), the pores in the surface layer 4 of the sintered body can be eliminated by heating the surface of the temporary sintered body 1 to a temperature at which the material is sufficiently densified or melted. As a result, the pores 8 remaining in the pre-sintered body can be made into closed pores that do not communicate with the outside world. H in this state
When the IP treatment is performed, this sintered body surface layer 4 has a can effect, so that the gas 9 in the pressure vessel enters into the pores 8 in the temporary sintered body, with the dense sintered body surface layer 4 serving as a barrier. Therefore, the pre-sintered member 1 is pressurized and heated by the gas pressure in the pressure vessel, and the pores 8 in the sintered body are crushed, making it possible to obtain a high-density sintered member.
また1本方法によれば単に高価なキャニング作業が不要
になるだけでなく、キャニングに不可欠なバリヤー層ま
たは圧力媒体を使わないため、仮焼結体とこれらの材料
との間の反応を心配する必要がな(焼結体の品質劣化が
生じない。In addition, this method not only eliminates the need for expensive canning operations, but also eliminates the need for barrier layers or pressure media, which are essential for canning, so there are concerns about reactions between the pre-sintered body and these materials. No need (no deterioration in the quality of the sintered body).
(実施例)
以下、本発明に係わる焼結部材の一実施例を第1図を参
照して説明する。(Example) Hereinafter, an example of a sintered member according to the present invention will be described with reference to FIG.
まず、第1図(a)にしめずような水素炉で焼結したタ
ングステン仮焼結材1を用いた。この段階におけるタン
グステン仮焼結材1の相対密度は使用したタングステン
粉末の粒度や焼結温度等により変わるが、大形タングス
テン部材においてはおよそ85〜90%である。このタ
ングステン仮焼結材1を真空チャンバー2のなかに入れ
高真空にした後、電子ビーム3をタングステン仮焼結材
1の表面に当て溶融させることにより緻密な焼結体表面
層4を形成させる(同図(b) ) 、このような方法
でタングステン仮焼結材の全表面に緻密な焼結体表面層
4を形成した後(同図(C))、HIP処理装置5の中
にセットし、ヒータ6により加熱すると共に等方ガス圧
カフにより加熱・加圧成形する。First, as shown in FIG. 1(a), a tungsten pre-sintered material 1 sintered in a hydrogen furnace such as Shimezu was used. The relative density of the tungsten pre-sintered material 1 at this stage varies depending on the particle size of the tungsten powder used, the sintering temperature, etc., but is approximately 85 to 90% for large tungsten members. After placing the tungsten pre-sintered material 1 in a vacuum chamber 2 and creating a high vacuum, an electron beam 3 is applied to the surface of the tungsten pre-sintered material 1 to melt it, thereby forming a dense sintered body surface layer 4. ((b) in the same figure) After forming a dense sintered body surface layer 4 on the entire surface of the pre-sintered tungsten material ((c) in the same figure), it is set in the HIP processing device 5. Then, it is heated by a heater 6 and is heated and pressurized by an isotropic gas pressure cuff.
(同図(d))。この際、タングステン仮焼結材表面に
形成させる緻密層4の厚さを厚くし過ぎると層内に割れ
が発生するので、できるだけ簿いほうが望ましい0本実
施例では電子ビームの出力を調整し、この緻密層の厚さ
が500〜700.になるようにした。また、仮焼結材
表面に緻密な表面層を形成する雰囲気としてはタングス
テン、モリブデンのような金属や5iCt 5IGN4
のようなセラミックスは酸化を防ぐため真空中もしくは
不活性ガス中で行う必要があり、 ZrO,やAl1,
0.のような酸化物セラミックスは真空中で加熱すると
#素の解離を生じるので大気中で行うことが好まして、
一方、そ°の方法としては加熱する雰囲気により左右さ
れるが真空中もしくは不活性ガス中で加熱する場合には
高周波加熱、通電加熱、電子ビーム加熱が適しており、
大気中で加熱する場合にはレーザー加熱。((d) in the same figure). At this time, if the thickness of the dense layer 4 formed on the surface of the tungsten pre-sintered material is made too thick, cracks will occur within the layer, so it is desirable to keep it as thin as possible. In this embodiment, the output of the electron beam is adjusted, The thickness of this dense layer is 500 to 700. I made it so that In addition, the atmosphere for forming a dense surface layer on the surface of the pre-sintered material may include metals such as tungsten and molybdenum, and 5iCt 5IGN4.
Ceramics such as ZrO, Al1,
0. When heating oxide ceramics in a vacuum, # elements dissociate, so it is preferable to conduct the heating in the atmosphere.
On the other hand, the method depends on the heating atmosphere, but when heating in vacuum or inert gas, high frequency heating, electrical heating, and electron beam heating are suitable.
Laser heating is used when heating in the atmosphere.
バーナー加熱、電気炉加熱が適している。Burner heating and electric furnace heating are suitable.
第2図Ca)に示すように、この方法によりタングステ
ン仮焼結材1の表面を加熱することにより形成させた緻
密な焼結体表面層4はHIP処理の際、高圧ガス9の仮
焼結材内部の気孔8への侵入に対しバリヤーとなるので
、キャニングしてHIP処理を行ったのと同じ効果が得
られる。したがって、タングステン仮焼結材1はHIP
処理により加熱・加圧成形され、高密度のタングステン
焼結材を製造することができる。さらに1本方法は従来
のキャニングHIP処理と異なりバリヤー層や圧力媒体
を必要としないので、バリヤー層や圧力媒体とタングス
テン焼結材との反応を心配する必要もなく、得られるタ
ングステン焼結材は品質的にも優れている。As shown in Fig. 2 Ca), a dense sintered body surface layer 4 formed by heating the surface of the tungsten pre-sintered material 1 by this method is formed by pre-sintering of the high-pressure gas 9 during HIP treatment. Since it acts as a barrier against intrusion into the pores 8 inside the material, the same effect as canning and HIP treatment can be obtained. Therefore, the tungsten pre-sintered material 1 is
It is heated and press-formed through processing, and can produce a high-density sintered tungsten material. Furthermore, unlike the conventional Canning HIP process, this method does not require a barrier layer or pressure medium, so there is no need to worry about the reaction between the barrier layer or pressure medium and the tungsten sintered material, and the resulting tungsten sintered material The quality is also excellent.
このような方法によりタングステン焼結材表面に緻密な
表面層を形成させたものを、様々な温度でHIP処理し
た場合のタングステン(試験片A)の相対密度を従来の
キャニングしてHIP処理した場合(試験片B)及びキ
ャニングをしないでHIP処理した場合(試験片C)と
比較して第3図に示す。同図より本実施例で用いたタン
グステン焼結材の相対密度は約91%であったが1本発
明により製作し、HIP処理を施した後タングステン(
試験片A)の相対密度はHIP処理温度に依存するがお
よそ98.0〜99.8%であった。また、同じ相対密
度約91%のタングステン焼結材を従来のようにキャニ
ングしてHIP処理したタングステン(試験片B)の相
対密度はおよそ96.7〜99.2%であった。本発明
により製作したタングステン(試験片A)の方が従来の
キャニングしてHIP処理したもの(試験片B)に比べ
相対密度が高いのは、キャン内のバリヤー層や圧力媒体
がHIP処理過程で多量のガスを放出するため、キャン
内の真空度が低下するためである。一方、焼結したまま
のタングステンをZHIP処理したもの(試験片C)の
相対密度はほとんど変化しないことがわかる。A dense surface layer was formed on the surface of the sintered tungsten material using this method, and the relative density of tungsten (specimen A) was HIPed at various temperatures. (Test piece B) and a case of HIP treatment without canning (Test piece C) are shown in FIG. 3 in comparison. The figure shows that the relative density of the tungsten sintered material used in this example was about 91%.
The relative density of specimen A) was approximately 98.0-99.8%, depending on the HIP treatment temperature. Moreover, the relative density of tungsten (test piece B) obtained by canning and HIPing a tungsten sintered material having the same relative density of about 91% in the conventional manner was about 96.7 to 99.2%. The reason why the relative density of the tungsten produced according to the present invention (specimen A) is higher than that of the tungsten produced by conventional canning and HIP treatment (specimen B) is that the barrier layer and pressure medium inside the can are damaged during the HIP treatment process. This is because a large amount of gas is released, which lowers the degree of vacuum inside the can. On the other hand, it can be seen that the relative density of as-sintered tungsten subjected to ZHIP treatment (specimen C) hardly changes.
第4図は本発明により製作したタングステン(試験片A
)と従来のようにキャニングしたタングステン(試験片
B)の2000℃でHIP処理したものについて、その
表面部及び中央部の曲げ強度を示す。同図より、本発明
により製作したタングステン(試験片A)の曲げ強度は
中央部と表面部でほとんど差が認められないが、キャニ
ングしたタングステン(試験片B)の表面部の曲げ強度
は中央部の1/4〜175程度しかないことがわかる。Figure 4 shows tungsten (test piece A) manufactured according to the present invention.
) and conventionally canned tungsten (test piece B) subjected to HIP treatment at 2000° C. The bending strength of the surface and center portions is shown. From the same figure, there is almost no difference in the bending strength of the tungsten manufactured according to the present invention (test piece A) between the center and the surface, but the bending strength of the surface of the canned tungsten (test piece B) is the same at the center. It can be seen that it is only about 1/4 to 175 of that.
これはバリヤー層(本実施例では窒化ボロン)とタング
ステンが反応し、タングステン表面に脆いタングステン
窒化物及びタングステンホウ化物を形成したためである
。This is because the barrier layer (boron nitride in this example) and tungsten reacted to form brittle tungsten nitride and tungsten boride on the tungsten surface.
本発明によれば、高融点金属やセラミックスのような焼
結性の悪い材料でも低コストで高密度化が図れ、かつ1
品質適にも優れた耐熱焼結部材の製造方法を提供するこ
とができる。According to the present invention, even materials with poor sinterability such as high-melting point metals and ceramics can be densified at low cost.
A method for manufacturing a heat-resistant sintered member with excellent quality can be provided.
第1図(a)〜(d)は本発明に係わる焼結部材の製造
方法の一実施例を示す工程図、第2図(a)は本発明に
より得られるHIP処理前の焼結体表面の断面模式図、
第2図(b)は仮焼結直後の断面模式図、第3図は本発
明と従来例とのHIP処理後の相対密度の変化を示した
特性図、第4図は本発明と従来例とのHIP処理後の均
一性を示す曲げ試験結果を示す図、第5図は従来のHI
P処理で用いていたキャンの構成を示す断面模式図であ
る。
1・・・タングステン仮焼結体 2・・・式空チャンバ
ー3・・・電子ビーム
4・・・焼結体表面に形成された緻密層5・・・HIP
処理装置 6・・・ヒーター7・・・ガス圧力
8・・・閉気孔9・・・高圧ガス
10・・・開気孔(α)
<b)
第1図
〜9
第
図
第
図FIGS. 1(a) to (d) are process diagrams showing an example of the method for manufacturing a sintered member according to the present invention, and FIG. 2(a) is a surface of a sintered body obtained according to the present invention before HIP treatment. Schematic cross-sectional diagram of
Fig. 2(b) is a schematic cross-sectional view immediately after pre-sintering, Fig. 3 is a characteristic diagram showing the change in relative density after HIP treatment between the present invention and the conventional example, and Fig. 4 is the present invention and the conventional example. Figure 5 shows the bending test results showing the uniformity after HIP treatment with conventional HI
FIG. 3 is a schematic cross-sectional view showing the configuration of a can used in P processing. 1...Tungsten pre-sintered body 2...Empty chamber 3...Electron beam 4...Dense layer formed on the surface of the sintered body 5...HIP
Processing equipment 6...Heater 7...Gas pressure
8...Closed pore 9...High pressure gas
10...Open pores (α) <b) Figures 1 to 9
Claims (3)
作し、その後この仮焼結体の表面を加熱することによっ
てこの仮焼結体の表面に高密度層を形成し、その後、高
圧等方加熱により成型することを特徴とする焼結部材の
製造方法。(1) A pre-sintered body is produced using metal powder or ceramic powder, and then a high-density layer is formed on the surface of the pre-sintered body by heating the surface of the pre-sintered body, and then a high-pressure isostatic layer is formed on the surface of the pre-sintered body. A method for manufacturing a sintered member, characterized by molding by heating.
e及びこれらを主成分とする合金粉末から選択された少
なくとも1種からなるものであることを特徴とする請求
項1記載の焼結部材の製造方法。(2) The metal powders include W, Ta, Mo, Nb, and R.
2. The method for manufacturing a sintered member according to claim 1, wherein the sintered member is made of at least one selected from e and alloy powders containing these as main components.
ZrO_2,Y_2O_3,SiC,TaC,HfC,
Si_3N_4,ZrN,TiNから選択された少なく
とも1種からなるものであることを特徴とする請求項1
記載の焼結部材の製造方法。(3) As the ceramic powder, Al_2O_3,
ZrO_2, Y_2O_3, SiC, TaC, HfC,
Claim 1, characterized in that the material is made of at least one selected from Si_3N_4, ZrN, and TiN.
A method of manufacturing the described sintered member.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1032664A JPH02213403A (en) | 1989-02-14 | 1989-02-14 | Manufacture of sintered member |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1032664A JPH02213403A (en) | 1989-02-14 | 1989-02-14 | Manufacture of sintered member |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02213403A true JPH02213403A (en) | 1990-08-24 |
Family
ID=12365132
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1032664A Pending JPH02213403A (en) | 1989-02-14 | 1989-02-14 | Manufacture of sintered member |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02213403A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6902809B1 (en) | 2004-06-29 | 2005-06-07 | Honeywell International, Inc. | Rhenium tantalum metal alloy |
| JP2009502716A (en) * | 2005-07-25 | 2009-01-29 | サン−ゴバン セラミックス アンド プラスティクス,インコーポレイティド | Rare earth oxysulfide scintillator and method for producing the same |
| US8872119B2 (en) | 2008-12-30 | 2014-10-28 | Saint-Gobain Ceramics & Plastics, Inc. | Ceramic scintillator body and scintillation device |
| US8877093B2 (en) | 2008-12-30 | 2014-11-04 | Saint-Gobain Ceramics & Plastics, Inc. | Ceramic scintillator body and scintillation device |
| CN104889398A (en) * | 2015-05-15 | 2015-09-09 | 安泰科技股份有限公司 | Anti-abrasion anti-etching alloy rod production method through powder metallurgy process |
| US9175216B2 (en) | 2008-12-30 | 2015-11-03 | Saint-Gobain Ceramics & Plastics, Inc. | Ceramic scintillator body and scintillation device |
| US9183962B2 (en) | 2008-12-30 | 2015-11-10 | Saint-Gobain Ceramics & Plastics, Inc. | Ceramic scintillator body and scintillation device |
-
1989
- 1989-02-14 JP JP1032664A patent/JPH02213403A/en active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6902809B1 (en) | 2004-06-29 | 2005-06-07 | Honeywell International, Inc. | Rhenium tantalum metal alloy |
| JP2009502716A (en) * | 2005-07-25 | 2009-01-29 | サン−ゴバン セラミックス アンド プラスティクス,インコーポレイティド | Rare earth oxysulfide scintillator and method for producing the same |
| US8460578B2 (en) | 2005-07-25 | 2013-06-11 | Saint-Gobain Ceramics & Plastics, Inc. | Rare earth oxysulfide scintillator and methods for producing same |
| US8872119B2 (en) | 2008-12-30 | 2014-10-28 | Saint-Gobain Ceramics & Plastics, Inc. | Ceramic scintillator body and scintillation device |
| US8877093B2 (en) | 2008-12-30 | 2014-11-04 | Saint-Gobain Ceramics & Plastics, Inc. | Ceramic scintillator body and scintillation device |
| US9175216B2 (en) | 2008-12-30 | 2015-11-03 | Saint-Gobain Ceramics & Plastics, Inc. | Ceramic scintillator body and scintillation device |
| US9183962B2 (en) | 2008-12-30 | 2015-11-10 | Saint-Gobain Ceramics & Plastics, Inc. | Ceramic scintillator body and scintillation device |
| CN104889398A (en) * | 2015-05-15 | 2015-09-09 | 安泰科技股份有限公司 | Anti-abrasion anti-etching alloy rod production method through powder metallurgy process |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4112143A (en) | Method of manufacturing an object of silicon nitride | |
| JP3103359B2 (en) | Method of manufacturing tungsten-titanium sputtering target | |
| US4339271A (en) | Method of manufacturing a sintered powder body | |
| WO2012128708A1 (en) | Method of preparation of a metal/cemented carbide functionally graded material | |
| JPH0344404A (en) | Method for forming compressed material | |
| EP0219231B1 (en) | Method of sintering compacts | |
| JP2863675B2 (en) | Manufacturing method of particle reinforced composite material | |
| JPH02213403A (en) | Manufacture of sintered member | |
| JPH0499146A (en) | Powder sintered material and its manufacture | |
| US4980126A (en) | Process for HIP canning of composites | |
| GB2024256A (en) | Isostatically hot pressing powdered material | |
| KR102605561B1 (en) | Canning free hot isostatic pressure powder metallurgy method | |
| JP3600691B2 (en) | Hot isostatic pressing method with hot isostatic pressing capsule for ultra-high temperature | |
| JPH0417638A (en) | Functionally gradient material and its manufacture | |
| US20030223903A1 (en) | Reduced temperature and pressure powder metallurgy process for consolidating rhenium alloys | |
| JPH03136846A (en) | Preparation of heat-resistant and abrasion-resistant member | |
| US5976459A (en) | Method for compacting high alloy tool steel particles | |
| US7270782B2 (en) | Reduced temperature and pressure powder metallurgy process for consolidating rhenium alloys | |
| JPH10310841A (en) | Ceramic coating material, method for producing the same, and high-temperature member using the same | |
| JPH0860203A (en) | Method for manufacturing compacted sintered body of high melting point metal powder | |
| JP3115011B2 (en) | Method for producing titanium-based composite material | |
| Juhas | Process for HIP canning of composites | |
| JPS63210201A (en) | Powder sintering method | |
| JPH0829435B2 (en) | Method for manufacturing target for sputtering device by hot isostatic pressing | |
| EP1075886A2 (en) | Hot isostatic compacting of high alloy tool steel particles |