JPH02214181A - Semiconductor laser device - Google Patents

Semiconductor laser device

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Publication number
JPH02214181A
JPH02214181A JP3436689A JP3436689A JPH02214181A JP H02214181 A JPH02214181 A JP H02214181A JP 3436689 A JP3436689 A JP 3436689A JP 3436689 A JP3436689 A JP 3436689A JP H02214181 A JPH02214181 A JP H02214181A
Authority
JP
Japan
Prior art keywords
optical waveguide
laser device
semiconductor laser
mode
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3436689A
Other languages
Japanese (ja)
Inventor
Yoshito Ikuwa
生和 義人
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP3436689A priority Critical patent/JPH02214181A/en
Publication of JPH02214181A publication Critical patent/JPH02214181A/en
Pending legal-status Critical Current

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  • Semiconductor Lasers (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔産業上の利用分野] この発明は半導体レーザ装置に係り特に高出力でかつ基
本モード発振を得る構造に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a semiconductor laser device, and particularly relates to a structure that provides high output and fundamental mode oscillation.

〔従来の技術1 第7図は半導体レーザ装置を示す図で、第7図(a)は
構造を示す斜視図、第7図(b)は従来の半導体レーザ
装置の光導波路(活性層)を示す図、第7図(c)は屈
折率分布図である。図において、1はN形Ga As基
板、2は第1のクラッド層であるN形社n、48 Ga
 n、sa As、3は活性層であるAIo、12 Q
100811 As、4は第2のクラッド層であるP形
紅口、41SQ80.115Ajl、5はリッジ領域、
6は埋め込み層である8形GaAs7はコンタクト層で
あるP形Ga As、8はMilli9はP電極、10
は屈折率f11を有する光導波路、11は光導波路(1
0)を囲む屈折率υz(<nx)を有する低屈折率域、
12は共振器端面、Wは光導波路(10)の横幅である
。
[Prior art 1] Fig. 7 shows a semiconductor laser device, Fig. 7(a) is a perspective view showing the structure, and Fig. 7(b) shows an optical waveguide (active layer) of a conventional semiconductor laser device. The figure shown in FIG. 7(c) is a refractive index distribution diagram. In the figure, 1 is an N-type GaAs substrate, 2 is the first cladding layer, 48 Ga
n, sa As, 3 is the active layer AIo, 12 Q
100811 As, 4 is the P-shaped lip which is the second cladding layer, 41SQ80.115Ajl, 5 is the ridge area,
6 is a buried layer of 8-type GaAs; 7 is a contact layer of P-type GaAs; 8 is a Milli9 is a P-electrode; 10
is an optical waveguide having a refractive index f11, and 11 is an optical waveguide (1
0), a low refractive index region having a refractive index υz (<nx) surrounding
12 is the resonator end face, and W is the width of the optical waveguide (10).

次に動作について説明する。P[極(9)、N[極(8
)より注入された正孔と電子は埋め込み層(6)が電流
狭搾効果を有するので、効率良く光導波路(10)に集
中され、再結合し、利得を持ち電流を増やすことKより
、利得が損失より大きくなった時に、レーザ発振が得ら
れる。
Next, the operation will be explained. P [pole (9), N [pole (8)
), the holes and electrons injected from the buried layer (6) have a current narrowing effect, so they are efficiently concentrated in the optical waveguide (10) and recombined to have a gain and increase the current. Laser oscillation is obtained when the loss is greater than the loss.

ところでこの得られるレーザ光の出力は電流を増すと大
きくなるが、光密度が端面(12)の光学的損傷(CO
D)レベA/IC達する値で制限される。
Incidentally, the output of the obtained laser beam increases as the current increases, but the optical density increases due to optical damage (CO) on the end face (12).
D) Level A/IC is limited by the value reached.

従って、高出力を得るKは一般に光密度を下げるために
光導波路(10)の幅Wを拡げるという方法が採用され
ていたう 〔発明が解決しようとする課題1 従来の半導体レーザ装置は第7図(b)に示すように一
定の幅Wを有する光導波路を持つので、高出力を得るた
めに、前述した様にWを拡げた場合、Wがr311!l
I2できまる所定の値を越えると、高次モードが励起さ
れるという問題点があった。
Therefore, in order to obtain high output power, a method is generally adopted in which the width W of the optical waveguide (10) is increased in order to lower the optical density. As shown in Figure (b), since the optical waveguide has a constant width W, if W is expanded as described above in order to obtain high output, W will be r311! l
There is a problem in that when a predetermined value determined by I2 is exceeded, higher-order modes are excited.

この発明は上記のような問題点を解消するためになされ
たもので、高出力でかつ基本モード発振できる半導体レ
ーザ装置を得ることを目的とする。
The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to obtain a semiconductor laser device that has high output and is capable of fundamental mode oscillation.

〔課題を解決するための手段1 この発明に係る半導体レーザ装置は高次モードを放射す
る角度を有する折れ曲がり型の光導波領域を備えたもの
である。
[Means for Solving the Problems 1] A semiconductor laser device according to the present invention includes a bent optical waveguide region having an angle for emitting higher-order modes.

[作用1 この発明における半導体レーザ装置は高次モードを放射
する角度を有する折れ曲がり型の光導波領域を備えた構
造により広いストライプ領域から基本モード発振するレ
ーザ光を得ることができる。
[Operation 1] The semiconductor laser device according to the present invention has a structure including a bent optical waveguide region having an angle for emitting a higher-order mode, so that laser light oscillating in a fundamental mode can be obtained from a wide stripe region.

(’17!施例I 以下、この発明の一実施例を図について説明する。(’17! Example I An embodiment of the present invention will be described below with reference to the drawings.

第1図はこの発明の一実施例である半導体レーザ装置の
光導波路を示す図で、図において、21a21bはスト
ライブ幅がW、屈折率が岨の平行な光導波路領域であり
、高次モードが許容されている。23はテーバの角度が
θp、テーバの長さがり。
FIG. 1 is a diagram showing an optical waveguide of a semiconductor laser device according to an embodiment of the present invention. In the figure, 21a and 21b are parallel optical waveguide regions with a stripe width of W and a refractive index of 0. is allowed. 23 is the angle of Taber θp and the length of Taber.

段差がd、屈折率が!11の折れ曲り光導波路領域であ
る。24は屈折率がr2の低屈折率領域である。
The step is d and the refractive index is! This is the number 11 bent optical waveguide region. 24 is a low refractive index region with a refractive index of r2.

第2図はスラブ導波路における導波モードと放射モード
の概念を示す図である。ここで臨界角θCは次(1)式
で表わされる。
FIG. 2 is a diagram showing the concept of waveguide mode and radiation mode in a slab waveguide. Here, the critical angle θC is expressed by the following equation (1).

θc=sfロー”(nz/ns)         −
・(1)この角度θCより小さい角度で入射する光線は
放射モードに、大きい角度で入射する光線のうち光導波
路領域21a、 21bと低屈折率領域24間の境界条
件を考慮したマックスウェルの方程式を満たすものが導
波モードとなる。これらのうち入射角の大きいものから
0次モード(基本モード)、1次モード、2次モードと
なる。
θc=sf low” (nz/ns) −
・(1) Maxwell's equation takes into account the boundary conditions between the optical waveguide regions 21a, 21b and the low refractive index region 24 among the light rays that enter at an angle smaller than this angle θC, while the light rays that enter at a larger angle enter the radiation mode. A mode that satisfies the following is a waveguide mode. Among these modes, the mode is classified into the zero-order mode (fundamental mode), the first-order mode, and the second-order mode from the one with the largest angle of incidence.

第3図は折れ曲り光導波路領域に前記の導波モードが達
した時の概念図である。テーバの角度θpを適当に調整
することによって基本モードのみ伝搬させ、高次モード
を放射させることが可能である。
FIG. 3 is a conceptual diagram when the waveguide mode reaches the bent optical waveguide region. By appropriately adjusting the Taber angle θp, it is possible to propagate only the fundamental mode and radiate higher-order modes.

第4図は折れ曲シ光導波路領域で2回反射し九導波モー
ドの概念図である。折れ曲り光導波路領域で2回反射す
ることにより、導波モードは折れ曲り領域に入る前の入
射角に戻る。
FIG. 4 is a conceptual diagram of nine waveguide modes that are reflected twice in the bent optical waveguide region. By reflecting twice in the bent optical waveguide region, the guided mode returns to the incident angle before entering the bent region.

この第2図〜第4図の概念を半導体レーザ装置に適用し
た実施例が第1図に示す光411f路を有する半導体レ
ーザ装置である。
An example in which the concept of FIGS. 2 to 4 is applied to a semiconductor laser device is a semiconductor laser device having a light path 411f shown in FIG. 1.

以下動作について説明する。基本モードの入射角をα0
(=90−θO)、1次モードの入射角をαl(=90
″−θI)とする。折れ曲り領域で1回以上反射する必
要があるため L < W / (tanθp+tanαl)    
      −2を満足する必要があろう一方、折れ曲
り領域で反射される基本モードは2回反射されるために
は。
The operation will be explained below. The angle of incidence of the fundamental mode is α0
(=90-θO), and the incident angle of the first mode is αl (=90
''-θI).Since it is necessary to reflect at least once in the bending area, L < W / (tanθp+tanαl).
-2, while the fundamental mode reflected at the bend region is reflected twice.

段差dは d  =  W  cot(2θp十αG)     
          ・(3)を満足する必要がある。
The step d is d = W cot (2θp + αG)
- (3) must be satisfied.

なお、光導波路のずれを8とすれば a = L tanθp            ・(
4)で与えられる。
In addition, if the deviation of the optical waveguide is 8, a = L tanθp ・(
4) is given by

例えば−例として、W = 6μm 、 f]l =3
.460 、 n2=3.445とした時、θc=84
.663°、αo=0.985°101=1.967°
(Iα2=2.939’ンとなる、従ってテーパ角θp
は 3.370° くθp<4.352°        
             ・・・(5)に選べば良い
。θp=3.5°に選ぶと、L=62.8  μm d=42.8  μm a=3.8  μの となる。
For example - as an example, W = 6 μm, f]l = 3
.. 460, when n2=3.445, θc=84
.. 663°, αo=0.985°101=1.967°
(Iα2=2.939', therefore, the taper angle θp
is 3.370° and θp<4.352°
...You should choose (5). If θp=3.5°, L=62.8 μm, d=42.8 μm, and a=3.8 μ.

以上のように上記実施例では適切な角度θpを有する折
れ曲り領域を光導波路に設けたので、基本モードで発振
する半導体レーザ装置を得ることができる。
As described above, in the above embodiment, since the optical waveguide is provided with a bent region having an appropriate angle θp, a semiconductor laser device that oscillates in the fundamental mode can be obtained.

第5図はこの発明の他の実施例を示す光導波路の図で、
図において、23a、 23bは第11第2の折れ曲り
領域に対応するもので、少なくともいずれか一方の折れ
曲り領域で高次モードは放射される条件に設定する。ま
た、θpi、θp2とも基本モードが放射されない角度
に設定する 第6図は奇数次モードが励起されにくい構造を有する半
導体レーザ装置の構造を示す斜視図で、図中、 15は
リッジ領域(5)の中央に設けられたP形不純物拡散領
域、16はN形GaAa層である。この半導体レーザ装
置ではP形不純物拡散領域(15)を経て正孔が注入さ
れるので、光導波路の中央が利得が高くなり、奇数次モ
ードは励起され蝿くなる。
FIG. 5 is a diagram of an optical waveguide showing another embodiment of the present invention.
In the figure, 23a and 23b correspond to the eleventh and second bending regions, and conditions are set such that the higher-order mode is radiated in at least one of the bending regions. Furthermore, both θpi and θp2 are set at angles at which the fundamental mode is not emitted. FIG. 6 is a perspective view showing the structure of a semiconductor laser device having a structure in which odd-order modes are not easily excited. In the figure, 15 is a ridge region (5). The P-type impurity diffusion region 16 provided in the center is an N-type GaAa layer. In this semiconductor laser device, holes are injected through the P-type impurity diffusion region (15), so the gain becomes high at the center of the optical waveguide, and the odd-order mode is excited and becomes a fly.

従って、このよりなレーザ構造を選ぶ場合には高次モー
ドは2次から考えて良く、α2=2.939°であるか
ら、2.398°〈θp < 4.352°となる。
Therefore, when choosing this more rigid laser structure, the higher-order mode can be considered from the second order, and since α2=2.939°, 2.398°<θp<4.352°.

従ってθp = 3.0°に選ぶことで、L = 57
.8μmd=38.1μ口a = 3.0μ印に設定で
きる。
Therefore, by choosing θp = 3.0°, L = 57
.. It can be set to 8μmd = 38.1μ a = 3.0μ mark.

なお、上記実施例ではレーザ構造としてリッジ構造を選
んだ場合を示したが、この構造に限定されるものでない
。
In addition, although the case where the ridge structure was chosen as a laser structure was shown in the said Example, it is not limited to this structure.

〔発明の効果1 以上のようにこの発明によれば、基本モード以外の高次
モードを放射するテーバ角度を有する折れ白妙型の光導
波路構造としたので、高出力でかつ基本モードで発振す
る半導体レーザ装置が得られるという効果がある。
[Effect of the invention 1 As described above, according to the present invention, the optical waveguide structure has a folded-white shape having a Taber angle that radiates higher-order modes other than the fundamental mode, so it is possible to create a semiconductor that has high output and oscillates in the fundamental mode. This has the effect of providing a laser device.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の実施例による半導体レーザ装置の光
導波路を示す図、第2図はスラブ光導波路における導波
モードと放射モードの概念を示す図、第3図は折れ曲り
(光導波路)領域中の導波モードの振幅を示す図、第4
図は折れ曲り(光導波路)領域中で2回反射した導波モ
ードの概念図、第5図はこの発明の他の実施例による半
導体レーザ装置の光導波路を示す図、第6図は奇数次モ
ードが励起し難い半導体レーザ装置の構造を示す斜視図
、第7図(a)は従来のリッジ構造を有する半導体レー
ザ装置の構造を示す斜視図、第7図(b)は第7図(8
)の光導波路を示す図、第7図(c)は第7図伽)の光
導波路の屈折率分布図である。 図中、15はP形不縄物拡散領域、21a、 21b、
 22はWの幅を有する平行光導波路領域、23.23
a 。 23bは折れ曲り光導波路領域、24は低屈折率領域、
θpは折れ曲り領域のテーバの角度、Lは折れ曲り領域
のテーバの長さ、dは折れ曲り領域の左右の段差を示す
。 なお、図中、同一符号は同一、又は相当部分を示す。 第1図
FIG. 1 is a diagram showing an optical waveguide of a semiconductor laser device according to an embodiment of the present invention, FIG. 2 is a diagram showing the concept of waveguide mode and radiation mode in a slab optical waveguide, and FIG. 3 is a diagram showing a bent (optical waveguide) Diagram showing the amplitude of guided modes in the region, 4th
The figure is a conceptual diagram of a waveguide mode reflected twice in a bent (optical waveguide) region, FIG. 5 is a diagram showing an optical waveguide of a semiconductor laser device according to another embodiment of the present invention, and FIG. 6 is an odd-numbered waveguide FIG. 7(a) is a perspective view showing the structure of a semiconductor laser device in which a mode is difficult to excite. FIG. 7(b) is a perspective view showing the structure of a semiconductor laser device having a conventional ridge structure.
FIG. 7(c) is a refractive index distribution diagram of the optical waveguide of FIG. 7(a). In the figure, 15 is a P-type irregularity diffusion region, 21a, 21b,
22 is a parallel optical waveguide region having a width of W, 23.23
a. 23b is a bent optical waveguide region, 24 is a low refractive index region,
θp is the angle of the taber in the bending area, L is the length of the taber in the bending area, and d is the difference in level between the left and right sides of the bending area. In addition, in the figures, the same reference numerals indicate the same or equivalent parts. Figure 1

Claims (1)

【特許請求の範囲】[Claims] 少なくとも2つの端面を有する半導体レーザ装置におい
て、少なくとも1ケ所に基本モード以外の高次モードを
放射する角度を有し、かつこの領域の入出力前後で基本
モードの端面への入射角が変化のない折れ曲り光導波路
領域を備えたことを特徴とする半導体レーザ装置。
In a semiconductor laser device having at least two end faces, at least one location has an angle that emits a higher-order mode other than the fundamental mode, and the incident angle of the fundamental mode to the end face does not change before and after input/output of this region. A semiconductor laser device characterized by having a bent optical waveguide region.
JP3436689A 1989-02-14 1989-02-14 Semiconductor laser device Pending JPH02214181A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3436689A JPH02214181A (en) 1989-02-14 1989-02-14 Semiconductor laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3436689A JPH02214181A (en) 1989-02-14 1989-02-14 Semiconductor laser device

Publications (1)

Publication Number Publication Date
JPH02214181A true JPH02214181A (en) 1990-08-27

Family

ID=12412170

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3436689A Pending JPH02214181A (en) 1989-02-14 1989-02-14 Semiconductor laser device

Country Status (1)

Country Link
JP (1) JPH02214181A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006001339A1 (en) * 2004-06-24 2006-01-05 Hamamatsu Photonics K.K. Semiconductor laser device and semiconductor laser element array
WO2006013935A1 (en) * 2004-08-05 2006-02-09 Hamamatsu Photonics K.K. Semiconductor laser device and semiconductor laser device array
WO2006030778A1 (en) * 2004-09-14 2006-03-23 Hamamatsu Photonics K.K. Semiconductor laser element and semiconductor laser element array
JP2006093614A (en) * 2004-09-27 2006-04-06 Hamamatsu Photonics Kk Semiconductor laser element and semiconductor laser element array

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006001339A1 (en) * 2004-06-24 2006-01-05 Hamamatsu Photonics K.K. Semiconductor laser device and semiconductor laser element array
US7577174B2 (en) 2004-06-24 2009-08-18 Hamamatsu Photonics K.K. Semiconductor laser device and semiconductor laser element array
WO2006013935A1 (en) * 2004-08-05 2006-02-09 Hamamatsu Photonics K.K. Semiconductor laser device and semiconductor laser device array
JP2006049650A (en) * 2004-08-05 2006-02-16 Hamamatsu Photonics Kk Semiconductor laser element and array thereof
US7885305B2 (en) 2004-08-05 2011-02-08 Hamamatsu Photonics K.K. Semiconductor laser device and semiconductor laser device array
WO2006030778A1 (en) * 2004-09-14 2006-03-23 Hamamatsu Photonics K.K. Semiconductor laser element and semiconductor laser element array
JP2006086228A (en) * 2004-09-14 2006-03-30 Hamamatsu Photonics Kk Array for semiconductor laser element
JP2006093614A (en) * 2004-09-27 2006-04-06 Hamamatsu Photonics Kk Semiconductor laser element and semiconductor laser element array

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