JPH02223479A - Optical recording medium - Google Patents

Optical recording medium

Info

Publication number
JPH02223479A
JPH02223479A JP1043184A JP4318489A JPH02223479A JP H02223479 A JPH02223479 A JP H02223479A JP 1043184 A JP1043184 A JP 1043184A JP 4318489 A JP4318489 A JP 4318489A JP H02223479 A JPH02223479 A JP H02223479A
Authority
JP
Japan
Prior art keywords
film
oxide film
alloy
recording
optical recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1043184A
Other languages
Japanese (ja)
Inventor
Tetsuo Mizumura
哲夫 水村
Naoyuki Kikuchi
菊池 直幸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Maxell Ltd
Original Assignee
Hitachi Maxell Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Maxell Ltd filed Critical Hitachi Maxell Ltd
Priority to JP1043184A priority Critical patent/JPH02223479A/en
Publication of JPH02223479A publication Critical patent/JPH02223479A/en
Pending legal-status Critical Current

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  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)

Abstract

PURPOSE:To form stable pits to enhance a recording sensitivity by a method wherein an optical recording medium is formed by providing a recording film made of an alloy film mainly composed of Te and an oxide film mainly composed of Te with a specific thickness successively on a substrate. CONSTITUTION:On a substrate 1 made of polycarbonate or the like, a Teflon film 2 is provided. On the film 2, an alloy film 3 mainly composed of Te is formed as a recording film. Furthermore, the surface of the alloy film 3 is forcibly oxidized to form an oxide film 4 thereon. As the alloy film 3, for example, a Te-Se-Pb alloy is used. The oxide film 4 is formed by oxidizing Te in the alloy film 3 to TeO2. The film thickness of the oxide film 4 is 10 - 25Angstrom . The obtained optical recording medium maintains mechanical and chemical stabilities and allows a writing laser power to effectively act to form pits ; thus, a recording sensitivity and a writing speed can be enhanced.

Description

【発明の詳細な説明】 [産業上の利用分野コ 本発明は、Teを主成分とした金属薄膜層を記録膜とす
る光記録媒体に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to an optical recording medium whose recording film is a metal thin film layer containing Te as a main component.

[従来の技術] 従来、レーザビームを照射して礼状のピットを形成する
ことにより、情報が記録されるようにした光記録媒体に
おいては、Teが低融点であることから、その記録膜と
してTeを主成分とする金属薄膜層がよく用いられてい
る。この金属薄膜層では、レーザビームを照射して融点
以上に加熱とすると、その部分が溶融し、表面張力によ
って周囲の溶融されない部分に引かれて孔、すなわちピ
ッ1−が形成される。
[Prior Art] Conventionally, in optical recording media in which information is recorded by irradiating laser beams to form thank-you pits, Te is used as the recording film because Te has a low melting point. A metal thin film layer mainly composed of is often used. When this metal thin film layer is heated to a temperature above its melting point by irradiation with a laser beam, that portion melts and is drawn to surrounding unmelted portions by surface tension, forming holes, that is, pits 1-.

かかる材料の記録膜を用いた光記録媒体として、記録膜
の表面を強制的に酸化し、Teを主成分とした金属薄膜
層の表面に50人の膜厚の酸化Te膜を設けたものが知
られている(特開昭6120932号公報)。かかる技
術によると、酸化Te膜は機械的に堅固であり、また、
Teが大気中でも容易に酸化されるのに対し、Te膜の
表面が強制的に酸化されたTe被膜で覆われると、この
被膜が化学的に安定であって内部のTe膜の酸化、さら
には薬品などの浸食などが阻止され、機械的、化学的に
安定した光記録媒体が得られる。
An optical recording medium using a recording film made of such a material is one in which the surface of the recording film is forcibly oxidized and a Te oxide film with a thickness of 50 nm is provided on the surface of a metal thin film layer mainly composed of Te. It is known (Japanese Unexamined Patent Publication No. 6120932). According to this technology, the Te oxide film is mechanically strong and
While Te is easily oxidized even in the air, when the surface of a Te film is covered with a forcibly oxidized Te film, this film is chemically stable and can cause oxidation of the internal Te film and even Erosion by chemicals and the like is prevented, and a mechanically and chemically stable optical recording medium can be obtained.

また、Teを主成分とする記録膜は金属(合金)である
ため、その熱伝導率が高く、この記録膜に直かにレーザ
ビームを照射すると、これによって生ずる熱は記録膜中
を速やかに四散し、熱を有効に利用することができず、
ピット形成には高いレーザパワーが必要となる。しかし
、上記従来技術では、酸化Te被膜が照射されたレーザ
ビームによる熱を蓄積する作用をなし、この蓄積熱によ
って記録膜にピットが形成されることになり、感度が向
上することになる。
In addition, since the recording film containing Te as a main component is a metal (alloy), its thermal conductivity is high, and when the recording film is directly irradiated with a laser beam, the heat generated by this will quickly travel through the recording film. The heat is scattered, and the heat cannot be used effectively.
High laser power is required to form pits. However, in the prior art described above, the Te oxide film acts to accumulate heat from the irradiated laser beam, and this accumulated heat causes pits to be formed in the recording film, resulting in improved sensitivity.

[発明が解決しようとする課題] ところで、近年では益々光記録媒体での情報の記録速度
を高めることが望まれており、このためには、記録感度
をより高めて書込み速度がより高まるようにする必要が
ある。
[Problems to be Solved by the Invention] In recent years, it has become increasingly desirable to increase the recording speed of information on optical recording media, and for this purpose, it is necessary to further increase the recording sensitivity and increase the writing speed. There is a need to.

しかしながら、上記の光記録媒体では、記録感度にも限
界があって、要求に沿う記録時間の短縮化を実現しよう
とすると、レーザパワーを高める方法をとらざるを得な
いが、レーザパワーを高めると、安定したピット形成が
できなくなるという問題があった。
However, with the above optical recording media, there is a limit to the recording sensitivity, and in order to shorten the recording time to meet the requirements, it is necessary to increase the laser power. However, there was a problem in that stable pit formation could not be achieved.

本発明の目的は、かかる問題点を解消し、安定したピッ
ト形成を保ちながら、記録感度を大幅に高めることがで
きるようにした光記録媒体を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide an optical recording medium that solves these problems and can significantly increase recording sensitivity while maintaining stable pit formation.

[課題を解決するための手段] Teを主成分とする合金膜上のTeO2を主体とする酸
化被膜は、熱伝導性が悪いため、レーザビームの照射に
よって生ずる熱を、周囲に発散させず、蓄積しておく作
用をする。
[Means for solving the problem] The oxide film mainly composed of TeO2 on the alloy film mainly composed of Te has poor thermal conductivity, so it does not dissipate the heat generated by laser beam irradiation to the surroundings. It acts to accumulate.

しかしながら、この酸化被膜が薄すぎる場合には、この
酸化被膜の熱蓄積量が小さく、供給された熱はほとんど
周囲に速やかに四散する。つまり、記録膜はTeを主成
分とする合金膜と同様に熱伝導性が高く、有効に熱を利
用することができない。
However, if this oxide film is too thin, the amount of heat stored in the oxide film is small, and most of the supplied heat is quickly dispersed to the surroundings. In other words, the recording film has high thermal conductivity similar to an alloy film containing Te as a main component, and cannot utilize heat effectively.

このために、ピッ1〜形成には高いレーザパワーが必要
となる。また、酸化被膜が厚すぎると、この酸化被膜に
非常に大きな量の熱が蓄積さ九、これによって合金膜に
不当な大きさのピットが形成されてしまう。これを防止
するためには、レーザパワーを低下させればよいが、合
金膜に至る熱量が少なくなり、記録感度が低下する。こ
のために、良好なピット形成と記録感度の向上とを同時
に満足させるレーザパワーの設定は非常に難かしく、レ
ーザパワーの変動に対する配慮も必要となり、実際には
、これら同時に満足させることができな%N0 一 上記目的を達成するために、本発明は、以上の点を勘案
し、酸化被膜の膜厚を最適に設定するものであり、10
〜25人とするものである。
For this reason, high laser power is required to form the pins 1 to 1. Also, if the oxide film is too thick, a very large amount of heat will accumulate in the oxide film, which will cause unreasonably sized pits to form in the alloy film. In order to prevent this, the laser power may be lowered, but the amount of heat reaching the alloy film decreases, resulting in a decrease in recording sensitivity. For this reason, it is very difficult to set a laser power that satisfies good pit formation and improved recording sensitivity at the same time, and consideration must also be given to fluctuations in laser power, and in reality, it is not possible to satisfy both at the same time. %N0 - In order to achieve the above object, the present invention takes the above points into consideration and optimally sets the film thickness of the oxide film.
~25 people.

[実施例] 以下、本発明の実施例を図面によって説明する。[Example] Embodiments of the present invention will be described below with reference to the drawings.

第1図は本発明による光記録媒体の一実施例を示す断面
図であって、lは基板、2はテフロン膜、3は合金膜、
4は酸化被膜である。
FIG. 1 is a sectional view showing an embodiment of an optical recording medium according to the present invention, in which l is a substrate, 2 is a Teflon film, 3 is an alloy film,
4 is an oxide film.

同図において、ポリカーボネートの基板1上にはテフロ
ン膜2が設けられ、この上に記録膜としてのTeを主成
分とする合金膜3が設けられている。そして、この合金
膜3の表面には、これを強制酸化したことによる酸化被
膜4が設けられている。
In the figure, a Teflon film 2 is provided on a polycarbonate substrate 1, and an alloy film 3 containing Te as a main component is provided thereon as a recording film. Then, on the surface of this alloy film 3, an oxide film 4 is provided by forcibly oxidizing the alloy film 3.

合金膜3としては、たとえばTe−8e−Pb合金が用
いら九、酸化被膜4はこの合金膜3のTeを酸化させて
TeO2としている。酸化被膜4の膜厚は10〜25人
とする。
For example, a Te-8e-Pb alloy is used as the alloy film 3, and the oxide film 4 is made by oxidizing Te in the alloy film 3 to TeO2. The thickness of the oxide film 4 is 10 to 25.

次に、この実施例を具体的に説明し、比較例と性能を比
較した測定例を示す。
Next, this example will be explained in detail, and a measurement example will be shown in which the performance was compared with that of a comparative example.

実施例1: 5.25インチφのポリカーボネー1一基板に、RFマ
グネトロン方式のスパッタ装置により、テフロンをスパ
ッタリングして500Aの膜厚のテフロン膜を形成し、
次いで、その上に、TeTe−8e(10%)−Pb 
(5wt%)の合金をスパッタリングして300人の膜
厚の合金膜を形成した。このように作成したディスクを
大気中雰囲気下90℃で1時間熱処理し、合金膜の表面
に酸化被膜を成長させた。しかる後、このようにした得
られた2枚のディスクを、記録面を内側として貼り合わ
せた。
Example 1: A Teflon film with a thickness of 500 A was formed by sputtering Teflon on a 5.25 inch φ polycarbonate 1 substrate using an RF magnetron sputtering device.
Then, on top of that, TeTe-8e (10%)-Pb
(5wt%) of the alloy was sputtered to form an alloy film with a thickness of 300 mm. The thus prepared disk was heat treated at 90° C. in air for 1 hour to grow an oxide film on the surface of the alloy film. Thereafter, the two disks thus obtained were bonded together with the recording surface facing inside.

実施例2: 上記実施例1と同様にディスクを作成したが、熱処理条
件を50%の酸素富化雰囲気で80℃。
Example 2: A disk was produced in the same manner as in Example 1 above, but the heat treatment conditions were 80° C. in a 50% oxygen enriched atmosphere.

1時間とした。It was set as 1 hour.

比較例は次のとおりである。Comparative examples are as follows.

比較例1: 上記実施例1と同様にディスクを作成したが、熱処理を
省いた。
Comparative Example 1: A disk was produced in the same manner as in Example 1 above, but the heat treatment was omitted.

比較例2: 」二記実施例1と同様に作成したディスクを、20″C
1大気中雰囲気に1ケ月間放置した。
Comparative Example 2: A disk prepared in the same manner as in Example 1 was heated to 20″C.
1. It was left in an atmosphere for one month.

比較例3: 上記実施例1と同様に作成したディスクを熱処理したが
、その熱処理条件としては、大気中雰囲気、]OO℃で
2時間とした。
Comparative Example 3: A disk prepared in the same manner as in Example 1 was heat treated, but the heat treatment conditions were air atmosphere at OO° C. for 2 hours.

以上のようにして得られた実施例1,2および比較例1
〜3における酸化被膜の膜厚をX線光電子分光(xps
)分析法によって求めた。この方法は、試料にX線を照
射し、これによって試料から放出される光電子信号の強
度から膜厚を測定するものであって、ここでは、合金膜
中の金属Teによる光電子信号の測定されるピーク高さ
と、酸化被膜中の酸化物Teにより光電子信号の測定さ
れるピーク高さとの比から酸化被膜の膜厚を求めた。こ
こで、この比をRとし、 R=金属Teのピーク高さ/酸化物Teのピーク高さと
すると、酸化被膜の膜厚aは次のように表わされる。
Examples 1 and 2 and Comparative Example 1 obtained as above
The film thickness of the oxide film in ~3 was measured by X-ray photoelectron spectroscopy (xps
) Determined by analytical method. In this method, the sample is irradiated with X-rays and the film thickness is measured from the intensity of the photoelectron signal emitted from the sample. Here, the photoelectron signal due to metal Te in the alloy film is measured. The thickness of the oxide film was determined from the ratio of the peak height to the peak height of the photoelectron signal measured by the oxide Te in the oxide film. Here, if this ratio is R, and R=peak height of metal Te/peak height of oxide Te, then the film thickness a of the oxide film is expressed as follows.

但し、λは光電子の平均自由行程である。However, λ is the mean free path of photoelectrons.

X線源としてはMgkα線源を用い、20mA。An Mgkα ray source was used as the X-ray source, and the output was 20 mA.

12kVで駆動した。これによって励起すると、金属T
eおよび酸化物Te中のTeの3 d R/2軌道の電
子が光電子として検出される。この電子の平均自由行程
λは13人である。
It was driven at 12kV. When excited by this, the metal T
e and electrons in the 3 d R/2 orbit of Te in the oxide Te are detected as photoelectrons. The mean free path λ of this electron is 13.

かかる方法による実施例1,2、比較例1〜3のピーク
高さの比および酸化被膜の膜厚さの測定の結果を次表に
示す。
The results of measuring the peak height ratio and the film thickness of the oxide film of Examples 1 and 2 and Comparative Examples 1 to 3 using this method are shown in the following table.

〈表〉 この表から明らかなように、実施例1,2では、酸化被
膜の膜厚は10〜25人の範囲内にあった。
<Table> As is clear from this table, in Examples 1 and 2, the thickness of the oxide film was within the range of 10 to 25 layers.

次に、以上の実施例1,2、比較例1〜3について、レ
ーザパワーを種々変えて書込みを行ない、これを読み取
って変調率(=非ピット部の反射率/ピット部の反射率
)の測定を行なった。この結果を第2図、第3図に示す
。但し、このときの書込み条件はディスクの回転数が1
80Orpmまf= ハ24−00 r p m、レー
ザ光絞り用レンズ開口数(NA)=0.53であって、
第2図は回転数が1800rpmであるときの、第3図
は2400rpmのときの変調率を示している。いずれ
においても、実施例1,2は、比較例1〜3に比べ、低
いレーザパワーで高い変調率が得られる。
Next, for Examples 1 and 2 and Comparative Examples 1 to 3, writing was performed with various laser powers, and this was read to determine the modulation rate (=reflectance of non-pit areas/reflectance of pit areas). Measurements were made. The results are shown in FIGS. 2 and 3. However, the writing condition at this time is that the number of revolutions of the disk is 1.
80Orpm f = 24-00 rpm, laser beam diaphragm lens numerical aperture (NA) = 0.53,
FIG. 2 shows the modulation rate when the rotation speed is 1800 rpm, and FIG. 3 shows the modulation rate when the rotation speed is 2400 rpm. In any case, in Examples 1 and 2, a higher modulation rate can be obtained with lower laser power than in Comparative Examples 1 to 3.

したがって、実施例1,2は比較例1〜3に比べて記録
感度が高く、低レーザパワーでもって書込み速度を速く
することができる。また、低レーザパワーで高変調率が
得られる書込みが可能となることにより、形成されるピ
ットを小径として良好な読取りが可能となり、トラック
ピッチを小さくして高記録密度化を達成できる。
Therefore, Examples 1 and 2 have higher recording sensitivity than Comparative Examples 1 to 3, and can increase the writing speed with low laser power. Furthermore, since it is possible to perform writing with a high modulation rate with low laser power, it is possible to make the formed pits small in diameter for good reading, and to achieve high recording density by reducing the track pitch.

一 第4図は第2図に示した測定結果から書込みレーザパワ
ーを6mW一定としたときの酸化膜の膜厚に対する変調
率の変化を示したものであり、横軸にXPS分析による
金属Teピーク高さと酸化物Teピーク高さとの比Rと
、酸化膜の膜厚aとをとり、第2図における各側の変調
率をプロン1〜して曲線で結んだものである。
Figure 4 shows the change in modulation rate with respect to the film thickness of the oxide film when the writing laser power was kept constant at 6 mW from the measurement results shown in Figure 2, and the horizontal axis shows the metal Te peak determined by XPS analysis. The ratio R of the height to the oxide Te peak height and the film thickness a of the oxide film are taken, and the modulation factors on each side in FIG. 2 are connected by a curved line.

同図から明らかなように、酸化膜の膜厚を薄くしすぎて
も、また、厚くしすぎても変調率は低下する。最低限度
必要な変調率を70%とし、第4図の場合、変調率をこ
の70%以上確保するためには、金属Teピーク高さと
酸化物Teピーク高さとの比Rを0.25〜1.3の範
囲に、したがって、酸化膜の膜厚aを20.9〜7.4
人の範囲に設定する必要がある。
As is clear from the figure, the modulation rate decreases if the oxide film is made too thin or too thick. The minimum required modulation rate is 70%, and in the case of Figure 4, in order to ensure a modulation rate of 70% or more, the ratio R between the metal Te peak height and the oxide Te peak height must be 0.25 to 1. Therefore, the film thickness a of the oxide film is set in the range of 20.9 to 7.4.
It needs to be set within the range of people.

ところで、熱処理による強制酸化によって10人よりも
薄い膜厚の酸化膜を形成すると、ディスクの機械的、化
学的安定性が得られず、傷などがつきやすいし、薬品な
どに冒されやすいなどの問題がある。また、第2図と第
3図とを比較して明らかなように、ディスクの回転数を
低めると、酸化膜の膜厚に関係なく、一定のレーザパワ
ーに対して変調率が高くなる。したがって、酸化膜が厚
くとも、ディスクの回転数を低くして高変調率を得るこ
とができ、これによってピット間隔を狭くできて記録密
度を高めることができる。しかしながら、このピット間
隔にも限界があり、このために、高変調率が可能な酸化
膜の膜厚を厚くするにも限界がある。そこで、本発明で
は、酸化膜の最大値を第4図から得られる上記の値(2
0,9人)よりも若干大きくし、25人とするのである
By the way, if an oxide film with a thickness thinner than 10% is formed by forced oxidation through heat treatment, the mechanical and chemical stability of the disc will not be achieved, and the disc will be easily scratched and susceptible to chemicals. There's a problem. Furthermore, as is clear from a comparison between FIG. 2 and FIG. 3, when the rotational speed of the disk is lowered, the modulation rate increases for a constant laser power, regardless of the thickness of the oxide film. Therefore, even if the oxide film is thick, a high modulation rate can be obtained by lowering the rotational speed of the disk, thereby making it possible to narrow the pit interval and increase the recording density. However, there is a limit to this pit spacing, and therefore there is a limit to increasing the thickness of the oxide film that can achieve a high modulation rate. Therefore, in the present invention, the maximum value of the oxide film is set to the above value (2
The number of participants will be 25, which is slightly larger than the number of participants (0.9 people).

[発明の効果] 以上説明したように、本発明によれば、機械的、化学的
安定性を保ちつつ、書込みレーザパワーをピット形成に
有効に作用されることができて記録感度を大幅に高め、
書込み速度を大幅に短縮できるという優れた効果が得ら
れる。
[Effects of the Invention] As explained above, according to the present invention, the writing laser power can be effectively applied to pit formation while maintaining mechanical and chemical stability, thereby greatly increasing the recording sensitivity. ,
An excellent effect can be obtained in that the writing speed can be significantly shortened.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明による光記録媒体の一実施例を示す断面
図、第2図および第3図は書込レーザパワーと変調率と
の関係を本発明による実施例と比例とで比較して示すグ
ラフ図、第4図は酸化膜の膜厚と変調率との関係の一測
定例を示すグラフ図である。 1・・・・・基板、3 ・・・・合金膜、4 ・・・酸
化膜。 (0ん)  ↓則しミ&
FIG. 1 is a cross-sectional view showing an embodiment of an optical recording medium according to the present invention, and FIGS. 2 and 3 show a comparison between the relationship between the writing laser power and the modulation rate in proportion to the embodiment according to the present invention. FIG. 4 is a graph showing an example of measurement of the relationship between the thickness of the oxide film and the modulation rate. 1...Substrate, 3...Alloy film, 4...Oxide film. (0n) ↓Norishimi&

Claims (1)

【特許請求の範囲】[Claims] Teを主成分とする合金膜を記録膜とし、該合金膜の表
面にTeを主成分とする酸化被膜を設けた光記録媒体に
おいて、該酸化被膜の膜厚を10〜25Åとしたことを
特徴とする光記録媒体。
An optical recording medium in which an alloy film containing Te as a main component is used as a recording film, and an oxide film containing Te as a main component is provided on the surface of the alloy film, characterized in that the thickness of the oxide film is 10 to 25 Å. optical recording medium.
JP1043184A 1989-02-27 1989-02-27 Optical recording medium Pending JPH02223479A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1043184A JPH02223479A (en) 1989-02-27 1989-02-27 Optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1043184A JPH02223479A (en) 1989-02-27 1989-02-27 Optical recording medium

Publications (1)

Publication Number Publication Date
JPH02223479A true JPH02223479A (en) 1990-09-05

Family

ID=12656821

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1043184A Pending JPH02223479A (en) 1989-02-27 1989-02-27 Optical recording medium

Country Status (1)

Country Link
JP (1) JPH02223479A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63151489A (en) * 1986-12-16 1988-06-24 Nec Corp Optical recording medium and its production

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63151489A (en) * 1986-12-16 1988-06-24 Nec Corp Optical recording medium and its production

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