JPH02230203A - Polarizer - Google Patents
PolarizerInfo
- Publication number
- JPH02230203A JPH02230203A JP5002489A JP5002489A JPH02230203A JP H02230203 A JPH02230203 A JP H02230203A JP 5002489 A JP5002489 A JP 5002489A JP 5002489 A JP5002489 A JP 5002489A JP H02230203 A JPH02230203 A JP H02230203A
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- Prior art keywords
- substrate
- refractive index
- axis
- grating
- grooves
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- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、常光線と異常光線との分離を行う偏光子に関
し、特に構成が簡易であり、かつ、製作の容易な薄板状
の偏光子に関するものである.[従来の技術]
偏光子は、特定の方向に偏光した光を選択的に透過せし
める素子であり、様々な光学機器において数多く使用さ
れている。従来の偏光子としては、ニコルプリズムある
いはグラン・トムソンプリズムのように方解石プリズム
を組み合わせた高品質のものから、複屈折板をガラス板
ないしは透明プラスチック板で挟んだ簡単な構造のもの
まで、各種用いられている.
〔発明が解決しようとする課題〕
光計測、あるいは光通信機器等のように、高い品質を必
要とする場合には、前者のグラン・トムソンプリズムが
多用されているが、高い加工精度が必要である上に、量
産性に乏しく、さらに、方解石の供給に限度があるので
、きわめて高価であるという問題があった。また、2個
のプリズムを組み合わせた構造であるので、素子寸法が
大きくなるという問題もあった。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a polarizer that separates ordinary rays and extraordinary rays, and in particular to a thin plate-shaped polarizer that has a simple configuration and is easy to manufacture. It is related to. [Prior Art] A polarizer is an element that selectively transmits light polarized in a specific direction, and is widely used in various optical devices. A variety of conventional polarizers are used, ranging from high-quality ones that combine calcite prisms such as Nicol prisms or Glan-Thompson prisms to simple structures that have a birefringent plate sandwiched between glass plates or transparent plastic plates. It is being done. [Problem to be solved by the invention] The former Glan-Thompson prism is often used in cases where high quality is required, such as in optical measurement or optical communication equipment, but it requires high processing precision. Moreover, it is difficult to mass produce, and furthermore, it is extremely expensive due to the limited supply of calcite. Furthermore, since the structure is a combination of two prisms, there is also the problem that the element size becomes large.
これに対し最近では、リチウムナイオベート板(LiN
bOs)にプロトン交換処理を施し、異常光に対する屈
折率に空間的な変調を施す方法が提案されている.しか
し、この方法は、従来のグラン・トムソンプリズム等の
プリズム形の偏光子に比べて、量産化の可能性があるが
、プロトン交換という一種の熱拡散的な処理に伴う再現
性の限界、あるいは常光に対する補償膜を要する等の原
因により、微細なパターンを形成するのが困難であるの
で細径光ビームに対して用いる偏光子としては十分な特
性ではなく、また量産性の点でも必ずしも十分でなかっ
た.
本発明は、上述の問題点に鑑み、細径光ビームに対して
も十分な特性を有し7、かつ製作が比較的容易で量産性
に優れ.また、廉価に供給可能な高品質の偏光子を提供
することを目的とする。In contrast, recently, lithium niobate plates (LiN
A method has been proposed in which the refractive index for extraordinary light is spatially modulated by performing proton exchange processing on the (bOs). However, although this method has the potential for mass production compared to conventional prism-shaped polarizers such as Glan-Thompson prisms, there are limitations in reproducibility associated with a type of thermal diffusion process called proton exchange, and Because it is difficult to form fine patterns due to the need for a compensation film for ordinary light, it does not have sufficient characteristics as a polarizer for use with small diameter light beams, and it is not necessarily sufficient in terms of mass production. There wasn't. In view of the above-mentioned problems, the present invention has sufficient characteristics even for small diameter light beams7, is relatively easy to manufacture, and has excellent mass productivity. Another object of the present invention is to provide a high-quality polarizer that can be supplied at a low cost.
[課題を解決するための手段]
かかる目的を達成するために、本発明は、結晶切断方位
がC軸に垂直であるように切り出したリチウムテトラボ
レート単結晶板により構成した基板と、基板の表面上に
C軸に直交する方向、またはC軸に平行な方向に沿った
複数の溝を一定間隔をおいて平行に配置した溝部分を有
するグレーティングを具え、グレーティングの溝に、溝
の方向がC軸に直交する方向のときは基板の常光線の屈
折率n。に等しい屈折率を有する透明物質を埋め込み、
溝の方向がC軸に平行な方向のときは基板の異常光線の
屈折率n.に等しい屈折率を有する透明物質を埋め込ん
で構成したことを特徴とする,
また、本発明はその一態様として、グレーティングの溝
部分は溝の深さが互いに相異なる複数の部分から成るこ
とを特徴とする。[Means for Solving the Problems] In order to achieve the above object, the present invention provides a substrate made of a lithium tetraborate single crystal plate cut so that the crystal cutting direction is perpendicular to the C axis, and a surface of the substrate. The grating has a groove portion on which a plurality of grooves are arranged in parallel at regular intervals in a direction perpendicular to the C-axis or parallel to the C-axis, and the grooves of the grating have grooves whose direction is C In the direction perpendicular to the axis, the refractive index n of the ordinary ray of the substrate. embedding a transparent material with a refractive index equal to
When the direction of the groove is parallel to the C-axis, the refractive index of the extraordinary ray of the substrate n. Further, in one aspect of the present invention, the groove portion of the grating is composed of a plurality of portions having groove depths different from each other. shall be.
さらに、本発明は他の態様として、基板の表面に反射防
止膜を兼ねた保設膜を形成したことを特徴とする。Furthermore, the present invention is characterized in that, as another aspect, a retention film that also serves as an antireflection film is formed on the surface of the substrate.
さらにまた、本発明の好ましい態様として、グレーティ
ングの溝の深さをdとするときに、基板に入射する入射
光線の波長をλ、△n = I no−nalおよび0
次ベッセル関数をJoとして、Jo=(2π△nd/λ
)=0の条件式が成立するように溝の深さdを定めたこ
とを特徴とする。Furthermore, as a preferred embodiment of the present invention, when the depth of the grating groove is d, the wavelength of the incident light beam incident on the substrate is λ, Δn = I no-nal and 0
Let Jo be the next Bessel function, Jo=(2π△nd/λ
The groove depth d is determined so that the conditional expression )=0 is satisfied.
[作 用]
本発明の偏光子は、リチウムテトラボレート単結晶板(
基板)に平行溝加工を施してグレーティングを形成し、
このグレーティングの溝部分に、リチウムテトラボレー
トの常光線あるいは異常光線の屈折率に一致する屈折率
を有する透明物質を埋め込んだものである。リチウムテ
トラボレート・における常光線の屈折率noと異常光線
の屈折率nウとの差八〇は、可視光付近で0.05以上
の大きな値を示すので、効率よく常光と異常光の分離を
行うことができる。また、上記の平行溝加工は、例えば
トライエッヂング法、あるいはウエットエッチング法の
いずれによっても容易に行うことができ、この溝部分に
透明物質を埋め込むことも、半導体等で用いられる平坦
化膜形成技術を用いれば比較的容易にできる。このため
、本発明によれば、量産性に優れた高品質の偏光子を容
易に提供できる。[Function] The polarizer of the present invention has a lithium tetraborate single crystal plate (
The grating is formed by machining parallel grooves on the substrate (substrate),
A transparent material having a refractive index matching the refractive index of the ordinary ray or extraordinary ray of lithium tetraborate is embedded in the grooves of this grating. The difference between the refractive index no of the ordinary ray and the refractive index n of the extraordinary ray in lithium tetraborate shows a large value of 0.05 or more in the vicinity of visible light, so it is possible to efficiently separate the ordinary and extraordinary rays. It can be carried out. In addition, the above-mentioned parallel groove processing can be easily performed by, for example, either the tri-edging method or the wet etching method, and it is also possible to fill the groove portion with a transparent material using a flattening film forming technique used in semiconductors, etc. This can be done relatively easily using . Therefore, according to the present invention, a high-quality polarizer with excellent mass productivity can be easily provided.
[実旅例]
以下、図面を参照して本発明の実施例を詳細に説明する
。[Actual Travel Example] Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
Δユ』ロ111
第1図は、本発明の第1の実施例の偏光子の構成を示し
、本図(^)はその素子の外観を示し、零図(B)はそ
の縦断面を示す。ここで、1はリチウムテトラボレート
(化学式: Li2B407−以下14BOと略記する
)単結晶を用いた基板、2はLBO単結晶基板1の表面
上に形成した一定間隔の複数の平行溝からなるグレーテ
ィング、3はグレーティング2の溝部分に埋め込んだ透
明誘電体膜、4および5は基板1の両面に設けた反射防
止膜を1kねた保護膜、6は素子への入射光、7、8お
よび8′は偏光した出射光である。Figure 1 shows the configuration of a polarizer according to the first embodiment of the present invention, this figure (^) shows the external appearance of the element, and the zero figure (B) shows its longitudinal section. . Here, 1 is a substrate using a single crystal of lithium tetraborate (chemical formula: Li2B407-hereinafter abbreviated as 14BO), 2 is a grating consisting of a plurality of parallel grooves at regular intervals formed on the surface of the LBO single crystal substrate 1, 3 is a transparent dielectric film embedded in the grooves of grating 2; 4 and 5 are protective films with anti-reflection films provided on both sides of substrate 1; 6 is incident light to the element; 7, 8, and 8' is the polarized output light.
上記のLBO基板1は、その面法線(結晶切断方位)を
結晶a@方向に選ぶ.また、グレーティング2の溝はL
BO基板1の表面上に結晶C軸に直交する結晶b軸に平
行になるよう形成し、結晶C軸方向に沿って溝部分の凹
凸が繰り返すように設ける。この溝部分、即ち凹部の幅
と凸部の幅は等しいものとし、その幅の寸法をWとする
と、グレーティング周期pは2胃に等しい。上記凹部に
は、透明誘電体膜3をスパッタリング等の製造方法で形
成して、いわゆる埋め込み構造とする.次に、本実施例
の動作を以下に説明する。The above LBO substrate 1 has its surface normal (crystal cutting direction) set in the crystal a@ direction. Also, the groove of grating 2 is L
The grooves are formed on the surface of the BO substrate 1 so as to be parallel to the crystal b-axis which is perpendicular to the crystal C-axis, and the groove portions are provided so that the irregularities are repeated along the crystal C-axis direction. Assuming that the width of this groove portion, that is, the recessed portion and the width of the convex portion are equal, and the dimension of the width is W, the grating period p is equal to two stomachs. A transparent dielectric film 3 is formed in the recess by a manufacturing method such as sputtering to form a so-called buried structure. Next, the operation of this embodiment will be explained below.
基板1のリチウムテトラボレートは、C軸を光学軸に持
つ1軸異方性の結晶であり、異常光線、即ち、C軸方向
に振動する光の屈折率(異常光線屈折率)をn,、常光
線、即ちC軸に垂直な方向に振動する光の屈折率(常光
線屈折率)を00とする。また、グレーティング2の溝
部分に埋め込んだ透明誘電体3の屈折率をndとし記し
、誘電体材料を適当に選んで、ndが上記の常光線屈折
率n。に等しいものとする。The lithium tetraborate of the substrate 1 is a uniaxially anisotropic crystal with the C-axis as the optical axis, and the refractive index of extraordinary rays, that is, the light vibrating in the C-axis direction (extraordinary ray refractive index), is n. The refractive index (ordinary ray refractive index) of the ordinary ray, that is, the light vibrating in the direction perpendicular to the C-axis, is set to 00. Further, the refractive index of the transparent dielectric 3 embedded in the groove portion of the grating 2 is denoted as nd, and when the dielectric material is appropriately selected, nd is the ordinary ray refractive index n mentioned above. shall be equal to
上記のような条件下において,第1図に示した構造の素
子は、常光線、即ちb軸方向に偏光した入射光に対して
は、単なる平板状の透明板として作用するのみである。Under the above conditions, the element having the structure shown in FIG. 1 acts merely as a flat transparent plate for ordinary light, that is, incident light polarized in the b-axis direction.
一方、異常光線、即ちC@方向に偏光した入射光に対し
ては、グレーティング2の凸部分の屈折率と溝加工部分
の屈折率とがC軸方向に周期的に変化しており、そのた
めグレーティング2がいわゆる位相格子として作用する
ので、異常光線はC軸方向に回折を受ける。On the other hand, for the extraordinary ray, that is, the incident light polarized in the C@ direction, the refractive index of the convex part of the grating 2 and the refractive index of the grooved part change periodically in the C-axis direction. 2 acts as a so-called phase grating, the extraordinary rays undergo diffraction in the C-axis direction.
このため、常光線の入射に対しては、第1図中で矢印7
で示したように入射光6と同一方向に出射光7が得られ
る.一方、異常光線は、第1図中で矢印8.8′に示す
ようにC軸方向に回折されるから常光線7と分離するこ
とができる。Therefore, for the incidence of ordinary rays, arrow 7 in Figure 1
As shown in , the output light 7 is obtained in the same direction as the input light 6. On the other hand, the extraordinary ray can be separated from the ordinary ray 7 because it is diffracted in the C-axis direction as shown by arrow 8.8' in FIG.
さらに好ましい態様として、グレーティング2の溝の深
さを入射光6の波長λに対応して後述の条件で設定する
ことにより、実施例の{i光子を用いて常光線と異常光
線とを完全に分離することができる。次にその完全分離
のための条件について説明する。As a further preferred embodiment, by setting the depth of the grooves of the grating 2 according to the wavelength λ of the incident light 6 under the conditions described below, the ordinary ray and the extraordinary ray can be completely separated using the {i photons of the embodiment. Can be separated. Next, conditions for complete separation will be explained.
位相格子による光回折、即ちラマン・ナス回折の条件下
では、入射光は一般に±m次(mは整数)の回折光゜に
分離し、回折角θ,1は、 tanθ。Under the conditions of optical diffraction by a phase grating, that is, Raman Nass diffraction, incident light is generally separated into ±m-order (m is an integer) diffracted light beams, and the diffraction angle θ,1 is tanθ.
=λ/mp=λ/2+awで与えられる。また、非回折
光(m=o)の強度1G’ は、Io’ = Io、
Io (2kd)で与えられる。ここで、I0は入射光
の強度、dは溝の深さであり、JoはO次ベッセル関数
である。またkは次式(1)で与えられる.
k:π△n/λ (1)ただし
△n = l n.−n.I
(2)である。=λ/mp=λ/2+aw. Moreover, the intensity 1G' of the undiffracted light (m=o) is Io' = Io,
It is given by Io (2kd). Here, I0 is the intensity of the incident light, d is the depth of the groove, and Jo is the O-order Bessel function. Also, k is given by the following equation (1). k: π△n/λ (1) where △n = l n. -n. I
(2).
Jo(2kd) =Oのとき非回折光の強度!。′は零
になる。即ち、
等の値をとるとき0次のヘツセル関数,1oは÷どなる
ので、このときの出射光の常光線と異常光線は完全に分
離でき、最良の偏光子特性が得られる。Jo(2kd) When =O, the intensity of undiffracted light! . ' becomes zero. That is, when taking a value such as , the zero-order Hetzsell function, 1o, becomes ÷. Therefore, the ordinary ray and extraordinary ray of the emitted light at this time can be completely separated, and the best polarizer characteristics can be obtained.
また、基板1のLBOの屈折率は、波長0.6μm帯で
、
no= 1.608
n,= 1.552
△ロー0.056
である.
偏光子の具体的数値例を以下に示す.
w = 10/7ts
λ= 0.63μm
とすると、異常光の非回折光が消滅する条件として、上
式(3)に代入すると、
d=4.3μs,または9.9μm,あるいは15.5
μw等の値が得られる。これらの溝の深さdの値は、い
ずれも化学エッチングあるいはスバツタエッチング等に
より比較的容易に実現可能である。Further, the refractive index of the LBO of the substrate 1 is no=1.608 n,=1.552 Δlow0.056 in the wavelength band of 0.6 μm. Specific numerical examples of polarizers are shown below. When w = 10/7ts λ = 0.63μm, the condition for the annihilation of the undiffracted light of the extraordinary light is as follows by substituting it into the above equation (3): d = 4.3μs, or 9.9μm, or 15.5
Values such as μw can be obtained. Any of these groove depth d values can be achieved relatively easily by chemical etching, sputter etching, or the like.
一方、ラマン・ナス回折の条件トシテ
Q=yr ・λ−d /2−W2(4)?定義されるQ
の値が1に比べて十分小さいことが必要である。上記の
dの値に対しては、d=15.5μlの場合でもQ =
0.154であるから、ラマン・ナス回折の条件を満
たしている。On the other hand, the condition for Raman Nass diffraction is Q=yr・λ−d/2−W2(4)? Q defined
It is necessary that the value of is sufficiently smaller than 1. For the above value of d, even when d = 15.5 μl, Q =
Since it is 0.154, it satisfies the conditions for Raman Nass diffraction.
基板1のグレーティング2の凹部に埋め込む透明誘電体
膜3は、例えば石英(SiO■)と五酸化タンタル(T
aJs)を混合してスパッタ形成すれば得られる。この
混合比を適当に選べばnd−00とすることができる.
また、透明透電体膜3の埋め込み形成は、半導体等で用
いられる平坦化膜形成技術を用いて実現可能である。The transparent dielectric film 3 embedded in the recess of the grating 2 of the substrate 1 is made of, for example, quartz (SiO) and tantalum pentoxide (T).
aJs) and sputtering the mixture. If this mixing ratio is selected appropriately, nd-00 can be achieved.
Further, the buried formation of the transparent conductive film 3 can be realized using a flattening film forming technique used in semiconductors and the like.
保護膜4,5は基板1のLBOが極めてわずかながら水
溶性であるので、その耐湿性確保のために設けているが
、偏光子の動作を得るためには必ずしも必要ではない.
保護膜4.5の材料としては、透明材料で安定なもので
あれば特に制約はないが、基板1の常光線屈折率noと
異なる屈折率の材料を用いれば、適当な厚さに設定する
ことにより、反射防止膜を兼ねることもできる。The protective films 4 and 5 are provided to ensure moisture resistance since the LBO of the substrate 1 is water-soluble, although very slightly, but they are not necessarily necessary to obtain polarizer operation.
There are no particular restrictions on the material of the protective film 4.5 as long as it is transparent and stable, but if a material with a refractive index different from the ordinary ray refractive index no of the substrate 1 is used, the thickness can be set to an appropriate value. By doing so, it can also serve as an antireflection film.
以上の説明では、基板1のb軸に平行な溝を設ける場合
について述べたが、基板1のC軸に平行に周期溝を設け
、埋め込み透明誘電体膜3の屈折率n,を異常光の屈折
率n6に等しくしても、上述と同様の作用を行う偏光子
が得られることは明かである。また、リチウムテトラボ
レート結晶では、a軸とb@は光学的に同等であるから
、C軸に垂直な結晶切断方位の基板であればよく、従っ
て結晶切断方位がa軸に限らず、b軸でも、またa@と
b軸の間にある基板を用いてもよい。In the above explanation, the case where grooves are provided parallel to the b-axis of the substrate 1 has been described, but periodic grooves are provided parallel to the c-axis of the substrate 1, and the refractive index n, of the embedded transparent dielectric film 3 is adjusted to reflect the extraordinary light. It is clear that even if the refractive index is made equal to n6, a polarizer having the same effect as described above can be obtained. In addition, in a lithium tetraborate crystal, the a-axis and b@ are optically equivalent, so any substrate that has a crystal cutting direction perpendicular to the C-axis is sufficient. Therefore, the crystal cutting direction is not limited to the a-axis, but is However, a substrate between the a@ and b axes may also be used.
B.実施例2
第2図に本発明の第2の実施例の構成を示す.本実施例
では、グレーティング2を複数のグループに分割し、各
グループにおける溝の深さdを相互に異ならせてある。B. Embodiment 2 Figure 2 shows the configuration of a second embodiment of the present invention. In this embodiment, the grating 2 is divided into a plurality of groups, and the depth d of the grooves in each group is made different.
上式(3)から明らかなように、非回折光が消滅する溝
の深さdは波長依存性をもつので、溝の深さdが全て等
しい第1図の構成では、特定の波長付近でのみ良好な偏
光子として動作するのに対し、溝の深さdがグループ毎
に異なる本実施例。では、以下に述べるように広範囲の
波長領域において使用可能な偏光子が実現できる。As is clear from the above equation (3), the depth d of the groove at which the undiffracted light disappears is wavelength dependent. In this example, the depth d of the grooves differs from group to group. Now, as described below, a polarizer that can be used in a wide range of wavelengths can be realized.
第2図は一例として3波長領域に分割した場合の構成例
である。第2図のように基板lのC軸に沿って領域■、
II、IIIの3部分に分割し、各部分の溝の深さを互
いに異なった値に設定し、それぞれd,, d,、d,
とする。この結果、各領域において非回折光が消滅する
波長λ1、λ2、λ3は相互に異なってくる.いま、例
えばλ, =0.63μm、λ2=0.85μm ,λ
s =1.15μmの3波長帯において最通な溝の深さ
を求めると、0次ベッセル間数Joの1番目の零点、即
ち、上式(3)の右辺が2.405の値に対して、それ
ぞれ次の値が得られる.
dl =4.3 μm
d,=5.8 μm
d3 =7.9 μm
上述の構成により、波長λ1、λ2およびλ3の入射光
に対し、その入射位置をそれぞれ領域I,I1および■
に合わせることにより各波長域において常光線と異常光
線を完全に分陣する動作を行う偏光子が得られる.
グレーティング2の溝の深さを異ならせるグループ分割
は、第3図に示すように、基板1のb軸方向、即ちグレ
ーティグ2の溝に平行な方向に沿って行っても良く、こ
の場合も第2図と同様の多波長に適用可能な偏光子を実
現できる。また、第2図のようなC軸方向に沿ってグル
ープ分割する構成と第3図のようなb軸方向に沿ってグ
ループ分割する構成とを組み合わせて、b軸とC軸の両
方向に2次元的に領域を分割して配置する構成も可能で
ある。FIG. 2 shows an example of a configuration in which the wavelength region is divided into three wavelength regions. As shown in Fig. 2, along the C axis of the substrate l, the area ■,
Divide into three parts II and III, and set the depth of the groove in each part to a different value, d, d, d, respectively.
shall be. As a result, the wavelengths λ1, λ2, and λ3 at which the undiffracted light disappears in each region differ from each other. Now, for example, λ, = 0.63 μm, λ2 = 0.85 μm, λ
When determining the depth of the continuous groove in the three wavelength bands of s = 1.15 μm, the first zero of the zero-order Bessel spacing number Jo, that is, the right side of the above equation (3) has a value of 2.405. The following values are obtained. dl = 4.3 μm d, = 5.8 μm d3 = 7.9 μm With the above configuration, the incident positions of the incident lights of wavelengths λ1, λ2, and λ3 are set to areas I, I1, and ■, respectively.
A polarizer that completely separates the ordinary and extraordinary rays in each wavelength region can be obtained by adjusting the polarizer. As shown in FIG. 3, the group division to make the depths of the grooves of the grating 2 different may be performed along the b-axis direction of the substrate 1, that is, the direction parallel to the grooves of the grating 2. In this case as well, A polarizer applicable to multiple wavelengths similar to that shown in FIG. 2 can be realized. In addition, by combining the configuration in which groups are divided along the C-axis direction as shown in Figure 2 and the configuration in which groups are divided along the b-axis direction as shown in Figure 3, two-dimensional A configuration in which the area is divided and arranged is also possible.
このように構成した偏光子を実際に使用するには、例え
ば、スライド機構の付いたホルダにその偏光子を実装し
、入射光の波長に応じてホルダを動かすことにより、そ
の波長に最適な偏光子として動作させることができる。To actually use a polarizer configured in this way, for example, you can mount the polarizer in a holder with a sliding mechanism and move the holder according to the wavelength of the incident light to obtain the optimal polarization for that wavelength. It can be run as a child.
[発明の効果]
以上説明したように、本発明によれば、構成が簡単で製
作が容易、かつ大量生産に適しており、さらに所定の条
件式に基いてグレーティングの溝の深さを設定すること
により常光線と異常光線とを完全に分離することができ
、また、その深さをグループ毎に異ならせることにより
広い波長範囲にわたって動作可能な偏光子を提供するこ
とができるという顕著な効果が得られる。[Effects of the Invention] As explained above, according to the present invention, the structure is simple, easy to manufacture, and suitable for mass production, and furthermore, the depth of the grating grooves is set based on a predetermined conditional expression. This makes it possible to completely separate the ordinary rays from the extraordinary rays, and by making the depth different for each group, it is possible to provide a polarizer that can operate over a wide wavelength range, which is a remarkable effect. can get.
第1図(A)は本発明の第1の実施例の構成を示す斜視
図、
第1図(B)はその縦断面図、
第2図は本発明の第2の実施例の構成を示す縦断面図、
第3図は本発明の第2の実施例の変形例を示す斜視図で
ある.
1・・・リチウムテトラボレート単結晶基板、2・・・
基板に形成したグレーティング、3・・・透明誘電体膜
、
4.5・・・反射防止膜兼用保護膜、
6・・・入射光、
7・・・偏光出射光(常光線)、
8.8′・・・偏光出射光(異常光線)。
L.FIG. 1(A) is a perspective view showing the configuration of the first embodiment of the present invention, FIG. 1(B) is a vertical sectional view thereof, and FIG. 2 shows the configuration of the second embodiment of the present invention. FIG. 3 is a perspective view showing a modification of the second embodiment of the present invention. 1... Lithium tetraborate single crystal substrate, 2...
Grating formed on the substrate, 3... Transparent dielectric film, 4.5... Protective film that also serves as an antireflection film, 6... Incident light, 7... Polarized output light (ordinary light), 8.8 ′...Polarized outgoing light (abnormal ray). L.
Claims (1)
リチウムテトラボレート単結晶板により構成した基板と
、 該基板の表面上にc軸に直交する方向またはc軸に平行
な方向に沿った複数の溝を一定間隔をおいて平行に配置
した溝部分を有するグレーティングとを具え、 前記グレーティングの前記溝に、該溝の方向がc軸に直
交する方向のときは前記基板の常光線の屈折率n_oに
等しい屈折率を有する透明物質を埋め込み、前記溝の方
向がc軸に平行な方向のときは前記基板の異常光線の屈
折率n_eに等しい屈折率を有する透明物質を埋め込ん
で構成したことを特徴とする偏光子。 2)前記グレーティングの溝部分は、溝の深さが互いに
相異なる複数の部分から成ることを特徴とする請求項1
に記載の偏光子。 3)前記基板の表面に反射防止膜を兼ねた保護膜を形成
したことを特徴とする請求項1または2に記載の偏光子
。 4)前記グレーティングの溝の深さをdとするときに、
前記基板に入射する入射光線の波長をλ、△n=|n_
o−n_e|および0次ベッセル関数をJ_oとして、 Jo=(2π△nd/λ)=0 の条件式が成立するように前記溝の深さdを定めたこと
を特徴とする請求項1〜3のいずれかの項に記載の偏光
子。[Claims] 1) A substrate made of a lithium tetraborate single crystal plate cut so that the crystal cutting direction is perpendicular to the c-axis, and a substrate formed on the surface of the substrate in a direction perpendicular to the c-axis or along the c-axis. a grating having a groove portion in which a plurality of grooves along parallel directions are arranged in parallel at regular intervals, and when the direction of the grooves is perpendicular to the c-axis, A transparent material having a refractive index equal to the refractive index n_o of the ordinary ray of the substrate is embedded, and when the direction of the groove is parallel to the c-axis, a transparent material having a refractive index equal to the refractive index n_e of the extraordinary ray of the substrate. A polarizer characterized by being configured by embedding. 2) Claim 1, wherein the groove portion of the grating consists of a plurality of portions having different groove depths.
Polarizer described in . 3) The polarizer according to claim 1 or 2, wherein a protective film that also serves as an antireflection film is formed on the surface of the substrate. 4) When the depth of the groove of the grating is d,
The wavelength of the incident light beam incident on the substrate is λ, △n=|n_
o-n_e| and a zero-order Bessel function as J_o, the depth d of the groove is determined so that the conditional expression Jo=(2πΔnd/λ)=0 is established. 3. The polarizer according to any one of 3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5002489A JPH02230203A (en) | 1989-03-03 | 1989-03-03 | Polarizer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5002489A JPH02230203A (en) | 1989-03-03 | 1989-03-03 | Polarizer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02230203A true JPH02230203A (en) | 1990-09-12 |
Family
ID=12847431
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5002489A Pending JPH02230203A (en) | 1989-03-03 | 1989-03-03 | Polarizer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02230203A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005123277A3 (en) * | 2004-06-11 | 2006-04-27 | Nanoopto Corp | Optical films and methods of making the same |
| WO2005101112A3 (en) * | 2004-04-15 | 2007-02-08 | Nanoopto Corp | Optical films and methods of making the same |
| US7619816B2 (en) | 2004-12-15 | 2009-11-17 | Api Nanofabrication And Research Corp. | Structures for polarization and beam control |
| US8765360B2 (en) | 2004-04-15 | 2014-07-01 | Polarization Solutions, Llc | Optical films and methods of making the same |
-
1989
- 1989-03-03 JP JP5002489A patent/JPH02230203A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005101112A3 (en) * | 2004-04-15 | 2007-02-08 | Nanoopto Corp | Optical films and methods of making the same |
| US7670758B2 (en) | 2004-04-15 | 2010-03-02 | Api Nanofabrication And Research Corporation | Optical films and methods of making the same |
| US8765360B2 (en) | 2004-04-15 | 2014-07-01 | Polarization Solutions, Llc | Optical films and methods of making the same |
| US8808972B2 (en) | 2004-04-15 | 2014-08-19 | Polarization Solutions, Llc | Optical films and methods of making the same |
| WO2005123277A3 (en) * | 2004-06-11 | 2006-04-27 | Nanoopto Corp | Optical films and methods of making the same |
| US7619816B2 (en) | 2004-12-15 | 2009-11-17 | Api Nanofabrication And Research Corp. | Structures for polarization and beam control |
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