JPH02230683A - Manufacture of far infrared radiative material - Google Patents
Manufacture of far infrared radiative materialInfo
- Publication number
- JPH02230683A JPH02230683A JP5005589A JP5005589A JPH02230683A JP H02230683 A JPH02230683 A JP H02230683A JP 5005589 A JP5005589 A JP 5005589A JP 5005589 A JP5005589 A JP 5005589A JP H02230683 A JPH02230683 A JP H02230683A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- far
- aluminum
- infrared
- manufacture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Resistance Heating (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は遠赤外線放射する表面がセラミックスの材料で
あって、内部のヒータ一部からの急熱、急冷によっても
剥離することなく長期使用に耐え、しかも放射率が高い
遠赤外線放射材の製造方法に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention has a surface that emits far infrared rays, which is made of ceramic material, and can be used for a long period of time without peeling even due to rapid heating or cooling from a part of the internal heater. The present invention relates to a method for manufacturing a far-infrared radiation material that is durable and has a high emissivity.
近年、遠赤外線を放射するヒーターの需要が増大してい
る。In recent years, demand for heaters that emit far-infrared rays has been increasing.
これらのヒーターは、その表面に、遠赤外線放射率の高
いセラミックス材料例えばジルコニア(Z『02)、コ
ージエライト(2MgO・2All O 争5 S
1 0 2 ) 、アルミナ(Ag203)等が形成
されており、その中でも酸化アルミニウム(以下Ag2
03と称す)は好ましい材料として利用されている。These heaters have their surfaces coated with ceramic materials with high far-infrared emissivity, such as zirconia (Z'02) and cordierite (2MgO.2AllO5S).
1 0 2 ), alumina (Ag203), etc., among which aluminum oxide (hereinafter referred to as Ag2
03) is utilized as the preferred material.
一般に、所望の形状に加工された金属基村上にAg20
3等の遠赤外線放射率の高いセラミ・ソクスを塗布、吹
付又は溶射等によってコーティングしたものを、種々の
熱源によって加熱する方式のヒーターが普及している。Generally, Ag20 is placed on a metal substrate processed into a desired shape.
Heaters that are coated with Ceramic Sox, which has a high far-infrared emissivity such as No. 3, by coating, spraying, or thermal spraying, are heated using various heat sources.
これらヒーターにおいて、ヒーターと金属基材との間が
間隙なく被覆された熱効率の優れたヒーターが要望され
ている。Among these heaters, there is a demand for a heater with excellent thermal efficiency in which the space between the heater and the metal base material is coated without any gaps.
従来、前記要件を満たす遠赤外線ヒーターとして、金属
発熱体表面に被覆加工しやすい、Afi金属を被覆して
、さらにこのAj7金属表面上に遠赤外線放射率の高い
A ,0 2 0 sを被覆したものが使用されている
。Conventionally, as a far-infrared heater that meets the above requirements, the surface of a metal heating element is coated with Afi metal, which is easy to coat, and the Aj7 metal surface is further coated with A,020s, which has a high far-infrared emissivity. things are used.
従来、前記タイプの遠赤外線ヒーターを製造する方法と
して、AI金属上にA1203粉末を塗布又は吹付等に
よってコーティングする方法が用いられていたが、Ag
203とAj7金属との熱膨張率の差違が原因となり、
急熱、急冷の熱サイクルによって剥離し易いという問題
点があった。Conventionally, as a method for manufacturing the above-mentioned type of far-infrared heater, a method was used in which A1203 powder was coated on AI metal by coating or spraying.
The difference in thermal expansion coefficient between 203 and Aj7 metal is the cause,
There was a problem in that it was easy to peel off due to thermal cycles of rapid heating and cooling.
一方、この問題点を解決するために、酸化雰囲気中で高
温加熱する手段を用い、AN金属基祠を酸化させて、そ
の表面にA ,l! 2 0 3を形成させると、密着
性は向上I7、剥離は生じなくなる。しかしながら形成
されるAg203層の厚さが充分に得られないこと、し
かも伸線等の冷間加工されたままの滑らかな表面に形成
されたA I1 2 0 3層の被覆面は、比表面積が
小さいために、高い放射率が得られないという問題点が
あった。On the other hand, in order to solve this problem, the AN metal matrix is oxidized using a means of high temperature heating in an oxidizing atmosphere, so that A, l! When 203 is formed, the adhesion is improved I7 and no peeling occurs. However, the thickness of the formed Ag203 layer cannot be obtained sufficiently, and the specific surface area of the coated surface of the A1203 layer formed on a smooth surface that has been cold-worked such as wire drawing is small. There was a problem that high emissivity could not be obtained because of the small size.
本発明は、前記課題を解決するためになされたもので、
その目的とする所は、従来使用されている表面がAg2
03よりなる遠赤外線放射体よりも、更に耐剥離性に優
れ、さらに遠赤外線の放射率が高い遠赤外線放射材の製
造方法に関する。The present invention has been made to solve the above problems,
The purpose of this is that the surface conventionally used is Ag2.
The present invention relates to a method for producing a far-infrared radiating material that has even better peeling resistance than the far-infrared radiating material made of No. 03 and has a higher far-infrared emissivity.
本発明者らは、耐剥離性を調べる種々の実験を行った結
果、Ag金属自身を出発原料として、その表面を酸化し
て得られるA ,17 2 0 sは、基HのAI金属
との密着性が優れているとの結果が得られたことから、
Aff金属表面の酸化について種々の方法を試みてみた
。The present inventors conducted various experiments to examine the peeling resistance, and found that A,1720s obtained by oxidizing the surface of Ag metal itself as a starting material is the same as that of the H-based AI metal. Since the results showed that the adhesion was excellent,
Various methods were tried for oxidizing the Aff metal surface.
その結果、適当な電解条件下で、i金属表面を陽極酸化
して作製されるA1203は、AI203層を所望の厚
さで形成でき、基材のA[金属との密着性に優れて剥離
し難いことを見い出した。As a result, A1203, which is produced by anodizing the i-metal surface under appropriate electrolytic conditions, can form an AI203 layer with the desired thickness, and has excellent adhesion to the base material A [metal and is easily peeled off. I found out something difficult.
さらに、この陽極酸化処理を、粗面化処理を施したAf
J金属表面に施して得られるA I! 2 0 s層は
、その表面の比表面積が増大し、遠赤外線の放射率も大
きくなることも見い出し、本発明に到達した。Furthermore, this anodic oxidation treatment is applied to Af
A I! obtained by applying it to the J metal surface. It was also discovered that the specific surface area of the 20s layer increases and the emissivity of far infrared rays also increases, leading to the present invention.
即ち、本発明は芯部が金属発熱体で形成され、中間部が
アルミニウム金属で形成され、外面被覆部が酸化アルミ
ニウムで形成された遠赤外線放射材の製造方法において
、
(1,) 中間部アルミニウム金属の表面を粗面化す
る工程と、
(2) 該粗面化されたアルミニウム金属表面に、希酸
水溶液中で電流密度5OA/drrr以下の電解による
陽極酸化処理工程とを
施して外面被覆部に酸化アルミニウムを形成することを
特徴とする遠赤外線放射材の製造方法である。That is, the present invention provides a method for manufacturing a far-infrared radiating material in which the core portion is formed of a metal heating element, the intermediate portion is formed of aluminum metal, and the outer surface coating portion is formed of aluminum oxide, including: (1) Intermediate portion aluminum (2) The roughened aluminum metal surface is subjected to an anodizing treatment process by electrolysis at a current density of 5OA/drrr or less in a dilute acid aqueous solution to form an outer surface coating part. This is a method for producing a far-infrared radiating material, characterized in that aluminum oxide is formed on the material.
芯部が金属発熱体で形成され、中間部がアルミニウム金
属で形成され、外面被覆部が酸化アルミニウムで形成さ
れた放射オイを製造するには、先ず金属発熱体とアルミ
ニウム金属との密着を強固に保つ必要がある。このため
には金属発熱体を溶融アルミニウム中に浸漬して溶融ア
ルミメッキする手段も考えられるが、最も容易にはA,
9バイブ中に金属発熱体のロッドを充填した後、伸線加
工する手段が好ましい。これによって金属発熱体と金属
基材との間の間隙をなくすことができる。In order to manufacture a radiant oil in which the core is made of a metal heating element, the middle part is made of aluminum metal, and the outer covering part is made of aluminum oxide, first, the adhesion between the metal heating element and the aluminum metal is strengthened. need to be kept. For this purpose, it is possible to immerse the metal heating element in molten aluminum and plate it with molten aluminum, but the easiest method is A.
9 It is preferable to fill the rod of the metal heating element in the vibrator and then wire-draw the rod. This eliminates the gap between the metal heating element and the metal base material.
中間部アルミニウム金属の表面を粗面化するには、表面
にショットブラストやサンドブラスト等をすることによ
って行うことができるが、表面を粗面化したロールによ
って圧延することによっても達成することができる。The surface of the intermediate aluminum metal can be roughened by subjecting the surface to shot blasting, sandblasting, etc., but it can also be achieved by rolling with a roll that has a roughened surface.
粗面化されたアルミニウムの金属表面の陽極酸化処理に
は、希硫酸、希クロム酸、蓚酸等の希酸水溶液を使用す
る。For anodizing the roughened metal surface of aluminum, a dilute acid aqueous solution such as dilute sulfuric acid, dilute chromic acid, or oxalic acid is used.
この陽極酸化処理において、電流密度50A/drrf
超とすると所望のAg203厚さが短時間に得られるも
のの、Al金属との密着性が劣化する。In this anodizing treatment, the current density is 50A/drrf
If it exceeds the desired thickness, the desired thickness of Ag203 can be obtained in a short time, but the adhesion with Al metal deteriorates.
以下に、実施例によって本発明を更に具体的に説明する
が、本発明はこの実施例によって限定されるものではな
い。EXAMPLES The present invention will be explained in more detail below with reference to Examples, but the present invention is not limited to these Examples.
(実施例1)
Agバイブ中にニクロム合金ロッドを充填した後、Al
の肉厚が0.5wua外径2.6m+*のワイヤまで伸
線加工した。このワイヤにショットブラストによって表
面の粗面化を施した後、1−0℃以下の25容量%硫酸
水溶液中で電流密度50A/drrfの条件下で陽極酸
化処理を行い、ワイヤ表面に80μm厚さのAfI20
3層を形成した。(Example 1) After filling the Ag vibe with nichrome alloy rods, the Al
The wire was drawn to a wire with a wall thickness of 0.5 wua and an outer diameter of 2.6 m+*. After roughening the surface of this wire by shot blasting, it was anodized in a 25 volume % sulfuric acid aqueous solution at 1-0°C or lower at a current density of 50 A/drrf, and the wire surface was coated with a thickness of 80 μm. AfI20
Three layers were formed.
この遠赤外線放射材のA R 2 0 aの剥離性及び
遠赤外線放射率の測定結果は、他の実施例、比較例と共
に第1表に示す。The measurement results of the AR20a releasability and far-infrared emissivity of this far-infrared emitting material are shown in Table 1 together with other examples and comparative examples.
(実施例2)
電流密度30A/dゴ、Ag203層の厚さを70μm
とした以外は、実施例]と同様とした。(Example 2) Current density was 30 A/d, thickness of Ag203 layer was 70 μm.
The procedure was the same as in Example] except that.
(比較例1)
AfIバイブ中にニクロム合金のロツドを充填した後、
AIlの肉厚が0.2mm,外径2、6止のワイヤまで
仲線加工した。1095%と木節粘土5%との配合粉末
に適当量の水を加え、適当粘度のスラリーにして、該線
材に吹き付けた後、乾燥してAg203粉末をコーティ
ングした。(Comparative Example 1) After filling the AfI vibe with nichrome alloy rods,
The wires of AIl with a wall thickness of 0.2 mm and outer diameters of 2 and 6 stops were processed. An appropriate amount of water was added to a mixed powder of 1095% Kibushi clay and 5% Kibushi clay to form a slurry of an appropriate viscosity, which was sprayed onto the wire rod, dried, and coated with Ag203 powder.
(比較例2)
AIバイブ中にニクロム合金ロッドを充填した後、AN
の肉厚が0.2順、外径2.6mmのワイヤまで伸線加
工した。得られたワイヤを620℃の大気中で1時間加
熱して、l金属表面を酸化してAi!203層を形成し
た。(Comparative Example 2) After filling the AI vibe with nichrome alloy rod, AN
The wire was drawn to a wire with a wall thickness of 0.2 mm and an outer diameter of 2.6 mm. The obtained wire was heated in the atmosphere at 620°C for 1 hour to oxidize the metal surface and achieve Ai! 203 layers were formed.
(比較例3)
ワイヤ表面のAΩの粗面化処理を施さなかった以外は、
実施例1と同様とした。(Comparative Example 3) Except that AΩ roughening treatment on the wire surface was not performed.
The procedure was the same as in Example 1.
(比較例4)
電流密度55A/d耐、A.17203層の厚さ90μ
mとした以外は、実施例1と同様とした。(Comparative Example 4) Current density 55A/d resistance, A. 17203 layer thickness 90μ
The procedure was the same as in Example 1 except that m was used.
前記、実施例又は比較例で作製した遠赤外線放射材につ
いて下記に示す熱ザイクルテストを行った。Thermal cycle test shown below was conducted on the far-infrared radiating materials produced in the Examples and Comparative Examples.
室温一加熱(25分)一放射材温度500℃(5分)一
冷却(30分)一室温
この結果、比較例1が1−0サイクル以内にAg203
の剥離を生じ、比較例4が45サイクルで剥離を生じた
が、他は全て50サイクル以上繰り返しても!lMしな
かった。Room temperature - heating (25 minutes) - radiation material temperature 500°C (5 minutes) - cooling (30 minutes) one room temperature As a result, Comparative Example 1
Comparative Example 4 caused peeling after 45 cycles, but all the others even after 50 cycles or more! I didn't do IM.
また、実施例〕2,2及び比較例2.3について、30
0℃における波長4〜20μmの遠赤外線放射率を測定
した。放射率は、同温度における黒体炉からの遠赤外線
出力に対する比で示す。In addition, for Example 2, 2 and Comparative Example 2.3, 30
Far-infrared emissivity at a wavelength of 4 to 20 μm at 0° C. was measured. Emissivity is expressed as a ratio to the far-infrared output from a blackbody furnace at the same temperature.
本発明の方法によれば、金属発熱体に密着被覆したAg
金属基材の表面を粗面化し、希酸溶液中で電流密度5
O A / d d以下の陽極電解酸化によって、A.
17203層を形成したので、A II 2 O s層
の耐剥離性が優れており、更に遠赤外線放射率が高い放
射材が得られる。According to the method of the present invention, Ag
The surface of the metal base material is roughened and the current density is 5 in a dilute acid solution.
By anodic electrolytic oxidation below O A/dd
By forming the 17203 layer, a radiant material with excellent peeling resistance of the A II 2 O s layer and high far-infrared emissivity can be obtained.
Claims (1)
属で形成され、外面被覆部が酸化アルミニウムで形成さ
れた遠赤外線放射材の製造方法において、 (1)中間部アルミニウム金属の表面を粗面化する工程
と、 (2)該粗面化されたアルミニウム金属表面に、希酸水
溶液中で電流密度50A/dm^2以下の電解による陽
極酸化処理工程とを 施して外面被覆部に酸化アルミニウムを形成することを
特徴とする遠赤外線放射材の製造方法。[Claims] A method for manufacturing a far-infrared radiating material in which the core portion is formed of a metal heating element, the intermediate portion is formed of aluminum metal, and the outer surface coating portion is formed of aluminum oxide, comprising: (1) intermediate portion aluminum; (2) The roughened aluminum metal surface is subjected to an anodizing process by electrolysis at a current density of 50 A/dm^2 or less in a dilute acid aqueous solution to obtain an outer surface. A method for producing a far-infrared radiating material, comprising forming aluminum oxide on a covering portion.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5005589A JPH02230683A (en) | 1989-03-03 | 1989-03-03 | Manufacture of far infrared radiative material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5005589A JPH02230683A (en) | 1989-03-03 | 1989-03-03 | Manufacture of far infrared radiative material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02230683A true JPH02230683A (en) | 1990-09-13 |
Family
ID=12848313
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5005589A Pending JPH02230683A (en) | 1989-03-03 | 1989-03-03 | Manufacture of far infrared radiative material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02230683A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05230692A (en) * | 1992-02-18 | 1993-09-07 | Fujikura Ltd | Far infrared radiator |
| JPH06116667A (en) * | 1991-05-31 | 1994-04-26 | Sky Alum Co Ltd | Far infrared radiator |
-
1989
- 1989-03-03 JP JP5005589A patent/JPH02230683A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06116667A (en) * | 1991-05-31 | 1994-04-26 | Sky Alum Co Ltd | Far infrared radiator |
| JPH05230692A (en) * | 1992-02-18 | 1993-09-07 | Fujikura Ltd | Far infrared radiator |
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