JPH0224005A - Diamond coated tool and manufacture thereof - Google Patents

Diamond coated tool and manufacture thereof

Info

Publication number
JPH0224005A
JPH0224005A JP16948888A JP16948888A JPH0224005A JP H0224005 A JPH0224005 A JP H0224005A JP 16948888 A JP16948888 A JP 16948888A JP 16948888 A JP16948888 A JP 16948888A JP H0224005 A JPH0224005 A JP H0224005A
Authority
JP
Japan
Prior art keywords
diamond
silicon nitride
substrate
coated tool
hours
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16948888A
Other languages
Japanese (ja)
Inventor
Kimiji Yamamoto
君二 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TYK Corp
Original Assignee
TYK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TYK Corp filed Critical TYK Corp
Priority to JP16948888A priority Critical patent/JPH0224005A/en
Publication of JPH0224005A publication Critical patent/JPH0224005A/en
Pending legal-status Critical Current

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  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:To manufacture a diamond coated tool at low cost by forming a diamond film by using a silicon nitride substrate having the needle crystal structure that the surface becomes a silicon carbide by the vapor phase developing method utilizing a low temp. plasma. CONSTITUTION:A low temp. plasma is generated by a microwave on the substrate 5 of a silicon nitride 4 having a needle crystal structure whose surface becomes a silicon carbide 3, for instance, an ethanol is used for a raw material gas and the composite time is taken for ten hours in total of three hours with 4SCCM of the flow, 36SCCM hydrogen gas flow, 200W microwave output and 30Torr gas pressure, and 7 hours with 300W microwave output and 40Torr gas pressure. In this case the detection of Si is not found nor of the needle structure of the silicon nitride, and a diamond coating is found. For instance no crack was generated even in case of 3000m cutting with an aluminum alloy being machined at 60m/min cutting speed and 0.5mm depth of cut max.

Description

【発明の詳細な説明】 (産業上の利用分野) この発明は、特定の基板を用いて低温プラズマを利用し
た気相成長法により製造されるアルミニウム切削並びに
研削などに用いられるダイヤモンド被覆工具およびその
製造方法に関する。
Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a diamond-coated tool used for cutting and grinding aluminum manufactured by a vapor phase growth method using low-temperature plasma using a specific substrate, and the like. Regarding the manufacturing method.

(従来の技術) 従来、アルミニウム切削並びに研削などに用いられる工
具としてダイヤモンド被覆工具が最も適していることは
一般によく知られている。そのダイヤモンド被覆工具の
多くは人工的に高温高圧下で合成されたダイヤモンドの
粒を樹脂またはメタルのバインダーで固められたもので
ある。ところが高温高圧下の合成がたいへん高価側ごつ
くという理由と、ダイヤモンド粒の固め方がたいへんに
内層であるという理由から、近年低価格で簡単にダイヤ
モンドの合成ができる気相成長法に注目が集められてい
る。
(Prior Art) It is generally well known that diamond-coated tools are the most suitable tools for cutting and grinding aluminum. Many of these diamond-coated tools are made of diamond grains that are artificially synthesized under high temperature and pressure and are hardened with a resin or metal binder. However, because synthesis under high temperature and high pressure is very expensive, and because diamond grains are hardened very much in the inner layer, attention has recently been focused on the vapor phase growth method, which can easily synthesize diamonds at low cost. It is being

この気相成長法には、高温プラズマを利用する方法と低
温プラズマを利用する方法がある。そして高温プラズマ
を利用する方法は、メタンと水素とアルゴンの混合ガス
を高周波あるいは直流電源を用いて1万度に加熱し、7
00度付近の温度をもった基板上へダイヤモンドを析出
させる方法であり、また低温プラズマを利用する方法は
、メタンあるいは有機溶剤と水素の混合ガスをタングス
テンフィラメントあるいはマイクロ波を用いて900度
付近に加熱励起し、基板上へ、ダイヤモンドを析出させ
る方法である。
This vapor phase growth method includes a method using high temperature plasma and a method using low temperature plasma. The method of using high-temperature plasma is to heat a mixed gas of methane, hydrogen, and argon to 10,000 degrees using high frequency or DC power.
This is a method in which diamond is deposited on a substrate with a temperature of around 900 degrees, and a method using low-temperature plasma involves heating a mixed gas of methane or organic solvent and hydrogen to around 900 degrees using a tungsten filament or microwave. This method uses heating and excitation to precipitate diamond onto a substrate.

なおダイヤモンド被覆工具として用いられる基板は従来
、炭化タングステン、タンタル、アルミナ、窒化珪素が
該当していた。
Note that the substrates used as diamond-coated tools have conventionally been made of tungsten carbide, tantalum, alumina, and silicon nitride.

(発明が解決しようとする問題点) しかし従来のダイヤモンド被覆工具は、その製造方法に
次のような欠点があった。
(Problems to be Solved by the Invention) However, the conventional diamond-coated tool has the following drawbacks in its manufacturing method.

■ ダイヤモンド被覆工具として用いられる基板の前処
理において、ダイヤモンド砥粒であらかじめ研磨しなけ
ればならなかった。
■ In the pretreatment of substrates used as diamond-coated tools, they had to be polished with diamond abrasive grains in advance.

前記高温プラズマを利用する方法のうちの高周波を用い
る方法並びに低温プラズマを利用する方法について、仮
りに基板の前処理においてダイヤモンド砥粒で研磨しな
いとすれば、基板上にはダイヤモンドが全く析出しない
か、析出したとしてもせいぜい1平方センチメートル当
り100000個程度の粒0数にしかならず、膜として
の析出は起こらない、従ってダイヤモンドで被覆されて
いないために工具としては利用できない。
Among the methods using high-temperature plasma, in the method using high frequency and the method using low-temperature plasma, if the substrate is not polished with diamond abrasive grains in the pretreatment, will diamond not be deposited on the substrate at all? Even if it were to be precipitated, the number of particles would be about 100,000 per square centimeter at most, and no precipitation would occur as a film, so it could not be used as a tool because it was not coated with diamond.

■ 合成装置が高価になる。■ Synthesizing equipment becomes expensive.

前記高温プラズマを利用する方法では、人工的に高温高
圧下で合成した方法に比べ簡便ではあるが、高価である
ことに変わりはない。
Although the method using high-temperature plasma is simpler than the method of artificially synthesizing at high temperature and high pressure, it is still expensive.

そこで上記の欠点■、■より低価格で合成するためには
、どうしても低温プラズマを利用する方法以外にはなく
、その場合には基板の前処理としてダイヤモンド砥粒で
研磨しなければならない。
Therefore, in order to synthesize at a lower cost than the above-mentioned drawbacks (1) and (2), the only way is to use low-temperature plasma, and in that case, the substrate must be polished with diamond abrasive grains as a pretreatment.

しかしこのダイヤモンド砥粒についても人工的に高温高
圧下で合成したものであり、高価なダイヤモンドの合成
方法によらなければ、ダイヤモンドは人工的に合成でき
ないという結論に達してしまう。
However, these diamond abrasive grains were also synthesized artificially under high temperature and high pressure, leading to the conclusion that diamond cannot be synthesized artificially without using expensive diamond synthesis methods.

この発明は、以上のような高価な合成方法を一切用いな
いで安価に提供できるダイヤモンド被覆工具およびその
製造方法を提供することを目的とする。
An object of the present invention is to provide a diamond-coated tool that can be provided at low cost without using any of the expensive synthesis methods described above, and a method for manufacturing the same.

(問題点を解決するための手段) この発明は、上記問題点を解決するためになされたもの
で次のように構成されている。
(Means for Solving the Problems) The present invention has been made to solve the above problems and is configured as follows.

この発明のダイヤモンド被覆工具は1表面が炭化珪素に
なっている針状結晶構造をもった窒化珪素基板のその炭
化珪素表面にダイヤモンド被覆膜を形成してなるダイヤ
モンド被覆工具である。
The diamond-coated tool of the present invention is a diamond-coated tool formed by forming a diamond coating film on the silicon carbide surface of a silicon nitride substrate having an acicular crystal structure in which one surface is made of silicon carbide.

この発明のダイヤモンド被覆工具を図面第1図について
説明すると、先ず5は、表面が炭化珪素3になっている
針状結晶構造をもった窒化珪素4の基板で、該基板5の
炭化珪素3表面にダイヤモンド被覆膜1を形成してなる
ダイヤモンド被覆工具である。
To explain the diamond-coated tool of the present invention with reference to FIG. This is a diamond-coated tool in which a diamond-coated film 1 is formed on a diamond-coated tool.

この発明のダイヤモンド被覆工具の製造方法は。A method for manufacturing a diamond-coated tool according to the present invention.

低温プラズマを利用した気相成長法により、基板に表面
が炭化珪素になっている針状結晶構造をもった窒化珪素
基板を用いてなるダイヤモンド被覆工具の製造方法であ
る。
This is a method of manufacturing a diamond-coated tool using a silicon nitride substrate with an acicular crystal structure whose surface is made of silicon carbide by a vapor phase growth method using low-temperature plasma.

次にこの発明のダイヤモンド被覆工具の性状をその製造
方法とともに次の実施例によって例示する。
Next, the properties of the diamond-coated tool of the present invention and its manufacturing method will be illustrated by the following examples.

実施例 1 基板に第1図における表面が炭化珪素3になっている針
状結晶構造を持った窒化珪素4の基板5と、第2図にお
ける針状結晶構造をもった窒化珪素4の基板5とを用い
て比較実験をした。なお基板の前処理であるダイヤモン
ド砥粒による研磨は双方とも行わなかった。
Example 1 A substrate 5 of silicon nitride 4 having an acicular crystal structure whose surface is silicon carbide 3 as shown in FIG. 1, and a substrate 5 of silicon nitride 4 having an acicular crystal structure as shown in FIG. We conducted a comparative experiment using Note that polishing with diamond abrasive grains, which is a pretreatment of the substrate, was not performed in either case.

低温プラズマの発生はマイクロ波によって行なった0合
成条件を、マイクロ波出力300 (W)。
Low-temperature plasma was generated using microwaves under zero synthesis conditions and a microwave output of 300 (W).

ガス圧力40 (Torr)、原料ガスにはエタノール
を用いエタノール流量を4(SccM)、水素ガス流量
を36(SccM)として5時間合成を行なった。
Synthesis was carried out for 5 hours at a gas pressure of 40 (Torr), using ethanol as a source gas, an ethanol flow rate of 4 (SccM), and a hydrogen gas flow rate of 36 (SccM).

合成後、顕**観察を行い単位面積当りのダイヤモンド
核の数を数えた。結果は下記の如くであった。なおここ
で第1図の基板5をサンプル1゜第2図の基板5をサン
プル2.第3図の基板5即ちダイヤモンドの合成を行う
前の第2図の基板5をサンプル3と定義する。
After synthesis, microscopic observation was performed to count the number of diamond nuclei per unit area. The results were as follows. Here, the substrate 5 in FIG. 1 is sample 1, and the substrate 5 in FIG. 2 is sample 2. The substrate 5 in FIG. 3, that is, the substrate 5 in FIG. 2 before diamond synthesis is defined as sample 3.

サンプルl上  6.0X10’(個/cd)サンプル
2上  5.0XIO’ (個/−)実施例 2 マイクロ波出力200(W)、ガス圧力30(Torr
)で3時間、マイクロ波出力300(W)、ガス圧力4
0(Torr)で7時間の合計10時間の合成時間とし
、他の条件を実施例1と同一にして合成を行った。
On sample L 6.0X10' (pcs/cd) On sample 2 5.0XIO' (pcs/-) Example 2 Microwave output 200 (W), gas pressure 30 (Torr
) for 3 hours, microwave output 300 (W), gas pressure 4
Synthesis was carried out under the same conditions as in Example 1 except that the synthesis time was 7 hours at 0 (Torr) for a total of 10 hours.

合成後、EPMAによりSiの検出を行なった。After the synthesis, Si was detected by EPMA.

サンプル1においてはSiの検出は見られなかった。サ
ンプル2においては、サンプル3と同程度のSiの検出
がみられた。
In sample 1, no Si was detected. In sample 2, Si was detected to the same extent as in sample 3.

同じく合成後のサンプルを顕微鏡で観察した。Similarly, the sample after synthesis was observed under a microscope.

サンプル1においては、窒化珪素の針状構造が見られず
、ダイヤモンド被覆膜1が見られた。サンプル2におい
ては、窒化珪素の針状構造の上にダイヤモンド粒2の点
在が見られた。
In sample 1, no acicular structure of silicon nitride was observed, and diamond coating film 1 was observed. In sample 2, diamond grains 2 were found scattered on the acicular structure of silicon nitride.

同じく合成後のサンプル1をX線回折並びにレーザーラ
マン分光分析により分析した結果1両方の分析において
天然ダイヤモンドのピークに一致した。
Similarly, sample 1 after synthesis was analyzed by X-ray diffraction and laser Raman spectroscopy, and both analyzes matched the peak of natural diamond.

実施例 3 実施例2において合成したサンプル1とサンプル3につ
いてアルミニウム合金を切削した。
Example 3 The aluminum alloys of Sample 1 and Sample 3 synthesized in Example 2 were cut.

スピードは60 m / akin切込みは0.5mま
で行なった。
The cutting speed was 60 m/akin and the depth of cut was 0.5 m.

その結果、サンプル3については1000mで欠けを生
じたのに対し、サンプル1は3000m切削でも欠けは
生じていなかった。
As a result, sample 3 suffered from chipping after 1000 m of cutting, while sample 1 did not show any chipping even after 3000 m of cutting.

(発明の効果) この発明によって次のような優れた効果を得ることがで
きる。
(Effects of the Invention) The following excellent effects can be obtained by this invention.

■ 安価にダイヤモンド被覆工具が製造できる。■ Diamond-coated tools can be manufactured at low cost.

低温プラズマを利用するため、人工的な高圧法や高温プ
ラズマを利用する方法に比べ電気、建物。
Because it uses low-temperature plasma, it is more suitable for electricity and buildings than artificial high-pressure methods or methods that use high-temperature plasma.

資材においてコストが10分の1以下で済むことによる
This is because the cost of materials is less than one-tenth.

また量産化する場合にも研磨で使用するダイヤモンド砥
粒を使わずに済むことにもよる。
Also, in mass production, it is possible to avoid using diamond abrasive grains used in polishing.

■ 簡便な製造方法になる。■ It becomes a simple manufacturing method.

前処理において、ダイヤモンド砥粒で研磨しないため、
研磨工程並びに研磨後のダイヤモンドを除去するクリー
ニング工程を行なわずに済むことによる。特に量産に入
った時にはこの違いは余計顕著に現われる。
Because it is not polished with diamond abrasive grains during pre-treatment,
This is because there is no need to perform a polishing process and a cleaning process to remove diamonds after polishing. This difference becomes even more noticeable especially when mass production begins.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明のダイヤモンド被覆工具の縦断面図、
第2図は従来のダイヤモンド被覆工具の縦断面図、第3
図はダイヤモンドの合成を行う前の第2図の基板を示す
縦断面図である。 1・・・ダイヤモンド被覆膜、2・・・ダイヤモンド粒
。 3・・・炭化珪素、4・・・針状結晶構造をもった窒化
珪素、5・・・基板、 第1図
FIG. 1 is a longitudinal cross-sectional view of a diamond-coated tool of the present invention.
Figure 2 is a longitudinal cross-sectional view of a conventional diamond-coated tool;
The figure is a longitudinal sectional view showing the substrate of FIG. 2 before diamond synthesis. 1... Diamond coating film, 2... Diamond grains. 3...Silicon carbide, 4...Silicon nitride with acicular crystal structure, 5...Substrate, Fig. 1

Claims (1)

【特許請求の範囲】 1、表面が炭化珪素になっている針状結晶構造をもった
窒化珪素基板のその炭化珪素表面にダイヤモンド被覆膜
を形成してなるダイヤモンド被覆工具。 2、低温プラズマを利用した気相成長法により、基板に
表面が炭化珪素になっている針状結晶構造をもった窒化
珪素基板を用いてなるダイヤモンド被覆工具の製造方法
[Scope of Claims] 1. A diamond-coated tool formed by forming a diamond coating film on the silicon carbide surface of a silicon nitride substrate having an acicular crystal structure whose surface is silicon carbide. 2. A method for manufacturing a diamond-coated tool using a silicon nitride substrate with an acicular crystal structure whose surface is made of silicon carbide by a vapor phase growth method using low-temperature plasma.
JP16948888A 1988-07-07 1988-07-07 Diamond coated tool and manufacture thereof Pending JPH0224005A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16948888A JPH0224005A (en) 1988-07-07 1988-07-07 Diamond coated tool and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16948888A JPH0224005A (en) 1988-07-07 1988-07-07 Diamond coated tool and manufacture thereof

Publications (1)

Publication Number Publication Date
JPH0224005A true JPH0224005A (en) 1990-01-26

Family

ID=15887459

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16948888A Pending JPH0224005A (en) 1988-07-07 1988-07-07 Diamond coated tool and manufacture thereof

Country Status (1)

Country Link
JP (1) JPH0224005A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992005904A1 (en) * 1990-10-05 1992-04-16 Sumitomo Electric Industries, Ltd. Hard material clad with diamond, throwaway chip, and method of making said material and chip
US5318836A (en) * 1989-06-15 1994-06-07 Ngk Spark Plug Company Limited Diamond-coated body
US5708405A (en) * 1994-10-04 1998-01-13 Kabushiki Kaisha Toshiba Superconducting coil and manufacturing method thereof
CN107649594A (en) * 2017-09-19 2018-02-02 湖州科创机械有限公司 A kind of clutch plate perforating die die process

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5318836A (en) * 1989-06-15 1994-06-07 Ngk Spark Plug Company Limited Diamond-coated body
WO1992005904A1 (en) * 1990-10-05 1992-04-16 Sumitomo Electric Industries, Ltd. Hard material clad with diamond, throwaway chip, and method of making said material and chip
US5708405A (en) * 1994-10-04 1998-01-13 Kabushiki Kaisha Toshiba Superconducting coil and manufacturing method thereof
CN107649594A (en) * 2017-09-19 2018-02-02 湖州科创机械有限公司 A kind of clutch plate perforating die die process

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