JPH0225702A - Scanning type tunnel microscope and scanning type tunnel spectroscope - Google Patents
Scanning type tunnel microscope and scanning type tunnel spectroscopeInfo
- Publication number
- JPH0225702A JPH0225702A JP17656588A JP17656588A JPH0225702A JP H0225702 A JPH0225702 A JP H0225702A JP 17656588 A JP17656588 A JP 17656588A JP 17656588 A JP17656588 A JP 17656588A JP H0225702 A JPH0225702 A JP H0225702A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- piezo element
- probe
- displaced
- auxiliary
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Analysing Materials By The Use Of Radiation (AREA)
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、原子オーダの分解能で少なくとも表面が導
電性を有する試料の表面形状あるいは表面電子状態を計
測する走査型トンネルマイクロスコープ並びに走査型ト
ンネルスペクトロスコープに関する。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a scanning tunneling microscope and a scanning tunneling microscope that measure the surface shape or surface electronic state of a sample whose surface is conductive at least with atomic resolution. Regarding spectroscopes.
一般に、導電性試料と金属の細い探針の間に電圧を加え
て1m程度の距離まで近づけると、第5図に示すように
、探針6aと導電性試料1aとの間に電子雲Aが生じて
トンネル電流が流れる。このトンネル電流は、両者間の
距離の変化に対し非常に敏感で、たとえば、距離が0.
1mm変化すると、トンネル電流は1桁変化するという
ように指数関数的に変化する。Generally, when a voltage is applied between a conductive sample and a thin metal probe and the probe is brought close to a distance of about 1 m, an electron cloud A is created between the probe 6a and the conductive sample 1a, as shown in FIG. This causes a tunnel current to flow. This tunneling current is very sensitive to changes in the distance between them; for example, when the distance is 0.
When the distance changes by 1 mm, the tunnel current changes exponentially by one order of magnitude.
そこで、第6図に示すように、このトンネル電流を一定
に保ちつつピエゾ素子5aを用いて探針6aを導電性試
料1aの表面に沿って矢印B方向に走査すると、ピエゾ
素子伸縮のために加えた電圧が表面形状に対応するため
、これを取り出して画像化すれば、導電性試料の表面構
造を原子スケールで観察、測定することができる。Therefore, as shown in FIG. 6, when the probe 6a is scanned along the surface of the conductive sample 1a in the direction of arrow B using the piezo element 5a while keeping this tunnel current constant, the piezo element expands and contracts. Since the applied voltage corresponds to the surface shape, if this voltage is extracted and imaged, the surface structure of the conductive sample can be observed and measured on an atomic scale.
また、探針6aと導電性試料13間に加える電圧は、ト
ンネル現象にかかわる電子のエネルギーに依存するので
、これを利用すれば導電性試料1aの表面電子状態を原
子オーダで観察することができる。Furthermore, since the voltage applied between the probe 6a and the conductive sample 13 depends on the energy of the electrons involved in the tunneling phenomenon, the surface electronic state of the conductive sample 1a can be observed on the atomic order by using this voltage. .
この原理を応用したものが近年開発された走査型トンネ
ルマイクロスコープ並びに走査型トンネルスペクトロス
コープで、これらは、ピエゾ素子支持体に、左右のX軸
方向に変位するピエゾ素子と、前後のY軸方向に変位す
るピエゾ素子と、上下のX軸方向に変位するピエゾ素子
とを固定して、これらの3次元方向に変位するピエゾ素
子で探針を3次元方向に微動可能に取りつけ、適宜制御
用電子回路を介して各ピエゾ素子で、探針と試料の表面
間に電圧を加えて生じるトンネル電流を一定にしながら
探針の先端を少なくとも表面が導電性の試料の表面に沿
って走査させ、走査中上下の2軸方向に変位するピエゾ
素子に加わる電圧を検出して、探針と試料間の距離を測
定し試料の表面形状を計測したり、あるいは走査中適宜
箇所で探針と試料の表面間に種々の異なる電圧を加えて
生じるトンネル電流の変化を検出して、試料の表面電子
状態を計測したりしている。 (G、B1nn1g+
H,Rohrer etal;IBM J、Re5ea
rch and Deuclopment 30(19
86)No、4& No、5 、梶村、水谷、小野;S
TM開発の展望 精密工学会公、 12(1987)P
1811 )〔発明が解決しようとする課題〕
ところが、このような従来の走査型トンネルマイクロス
コープおよび走査型トンネルスペクトロスコープでは、
外部からの機械的振動や、熱による探針と試料間の相対
位置の変位等により影響を受けやすく、これらの影響を
充分に取り除くことができる高価な設備を備えた測定環
境を調えなければ、試料の表面形状や表面電子状態を正
確に計測することができない。Scanning tunnel microscopes and scanning tunnel spectroscopes that have been developed in recent years are applications of this principle. A piezo element that is displaced in the vertical direction and a piezo element that is displaced in the up and down The tip of the probe is scanned along at least the surface of the sample whose surface is conductive while keeping the tunnel current generated by applying a voltage between the probe and the surface of the sample constant through each piezo element through a circuit. By detecting the voltage applied to a piezo element that is displaced in two axes (up and down), it is possible to measure the distance between the probe and the sample, measure the surface shape of the sample, or measure the distance between the probe and the surface of the sample at appropriate points during scanning. The surface electronic state of the sample is measured by detecting changes in tunneling current that occur when various different voltages are applied to the sample. (G, B1nn1g+
H, Rohrer etal; IBM J, Re5ea
rch and deuclopment 30(19
86) No. 4 & No. 5, Kajimura, Mizutani, Ono; S
Prospects for TM development Publication of Japan Society for Precision Engineering, 12 (1987) P.
1811) [Problems to be Solved by the Invention] However, in such conventional scanning tunnel microscopes and scanning tunnel spectroscopes,
It is easily affected by external mechanical vibrations and displacement of the relative position between the probe and sample due to heat, and unless a measurement environment equipped with expensive equipment that can sufficiently eliminate these effects is It is not possible to accurately measure the surface shape or surface electronic state of a sample.
この発明はかかる現状に鑑み種々検討を行った結果なさ
れたもので、ピエゾ素子支持体に、左右のX軸方向に変
位するピエゾ素子と、前後のY軸方向に変位するピエゾ
素子と、上下のX軸方向に変位するピエゾ素子とを固定
して、これらの3次元方向に変位するピエゾ素子で主探
針を3次元方向に微動可能に取りつけるとともに、主探
針を上下の2軸方向に変位するピエゾ素子と並列に、上
下のX軸方向に変位するピエゾ素子をピエゾ素子支持体
に固定して、このピエゾ素子で補助探針を上下のX軸方
向に微動可能に取りつけ、適宜制御用電子回路を介して
各ピエゾ素子で、主探針と試料の表面間に電圧を加えて
生じるトンネル電流を一定にしながら主探針の先端を少
なくとも表面が導電性の試料の表面に沿って走査させ、
走査中上下のX軸方向に変位するピエゾ素子に加わる電
圧を検出して、主探針と試料間の距離を測定し試料の表
面形状を計測したり、あるいは走査中適宜箇所で主探針
と試料の表面間に種々の異なる電圧を加えて生じるトン
ネル電流の変化を検出して、試料の表面電子状態を計測
する際、同時に補助探針を支持するピエゾ素子で補助探
針と試料間に電圧を加えて生じるトンネル電流を一定に
して、補助探針を支持するピエゾ素子に加わる電圧を検
出し、この試料と補助探針の相対的な位置の変動を測定
して、主探針と試料間の距離あるいはトンネル電流の変
化を補正することによって、試料の表面形状や表面電子
状態を、外部からの機械的振動や、熱による探針と試料
間の相対位置の変位等により影響されることなく、高情
度で計測できるようにしたものである。This invention was made as a result of various studies in view of the current situation, and includes piezo elements that are displaced in the left and right X-axis directions, piezo elements that are displaced in the front and rear Y-axis directions, and upper and lower piezo elements that are displaced in the Y-axis direction. A piezo element that can be displaced in the X-axis direction is fixed, and the piezo element that can be displaced in three dimensions can be used to attach the main probe so that it can move slightly in three dimensions, and the main probe can be displaced in two axial directions, up and down. A piezo element that can be displaced in the vertical X-axis direction is fixed to a piezo element support in parallel with the piezo element that is to be moved, and the auxiliary probe is attached to the piezo element so that it can be moved slightly in the vertical X-axis direction, and control electronics are attached as appropriate. Scanning the tip of the main probe along at least the surface of the sample whose surface is conductive while keeping the tunnel current generated by applying a voltage between the main probe and the surface of the sample constant through each piezo element through a circuit,
During scanning, the voltage applied to the piezo element that is displaced in the upper and lower X-axis directions can be detected to measure the distance between the main probe and the sample and the surface shape of the sample, or to measure the surface shape of the sample at appropriate points during scanning. When measuring the surface electronic state of a sample by detecting changes in tunneling current caused by applying various different voltages between the surfaces of the sample, a piezo element supporting the auxiliary tip simultaneously applies voltage between the auxiliary tip and the sample. The voltage applied to the piezo element that supports the auxiliary probe is detected by keeping the tunneling current generated by applying the auxiliary probe constant, and the relative positional change between the sample and the auxiliary probe is measured. By correcting changes in the distance or tunneling current, the surface shape and surface electronic state of the sample can be unaffected by external mechanical vibrations or displacement of the relative position between the probe and sample due to heat. , which can be measured at a high level of sensitivity.
以下、この発明の走査型トンネルマイクロスコープを示
す図面を参照しながら説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS A scanning tunneling microscope according to the present invention will be described below with reference to the drawings.
第1図は、この発明の走査型トンネルマイクロスコープ
の一実施例を示す構成図であって、1は導電性試料、2
はピエゾ素子支持体である。ピエゾ素子支持体2は、下
部にピエゾ素子固定壁2a、2b、2cを3次元方向に
形成し、これらピエゾ素子固定壁に左右のX軸方向に変
位するピエゾ素子3と、前後のY軸方向に変位するピエ
ゾ素子4と、上下のX軸方向に変位するピエゾ素子5を
固定し、これらのピエゾ素子3,4.5で主探針6を3
次元方向に微動可能に支持している。FIG. 1 is a configuration diagram showing an embodiment of a scanning tunneling microscope according to the present invention, in which 1 is a conductive sample, 2 is a conductive sample, and 2 is a conductive sample.
is a piezo element support. The piezo element support 2 has piezo element fixing walls 2a, 2b, and 2c formed in a three-dimensional direction at the bottom thereof, and piezo elements 3 that are displaced in the left and right X-axis directions on these piezo element fixing walls and in the front and rear Y-axis directions. A piezo element 4 that is displaced in the vertical direction and a piezo element 5 that is displaced in the upper and lower X-axis directions are fixed.
It is supported so that it can move slightly in the dimensional direction.
7は上下のX軸方向に変位するピエゾ素子で、ピエゾ素
子支持体2のピエゾ素子固定壁2Cにピエゾ素子5と並
列に固定され、下端に補助探計8を固定して上下のX軸
方向に微動可能に支持している。Reference numeral 7 denotes a piezo element that is displaced in the vertical X-axis direction, and is fixed in parallel with the piezo element 5 on the piezo element fixing wall 2C of the piezo element support 2, with an auxiliary probe 8 fixed to the lower end and displaced in the vertical X-axis direction. It is supported so that it can be moved slightly.
このようにしてピエゾ素子支持体2のピエゾ素子固定壁
2aおよび2bに固定されたピエゾ素子3および4は、
それぞれ配線9および10を介して高圧増幅器11およ
び12に接続され、さらに配線13および14を介して
X−Yラストスキャナ15に接続されている。またX−
Yラストスキャナ15は配線16および17を介してス
トレージオシロスコープ18に接続されている。The piezo elements 3 and 4 fixed to the piezo element fixing walls 2a and 2b of the piezo element support 2 in this way are
They are connected to high voltage amplifiers 11 and 12 via wires 9 and 10, respectively, and further connected to an X-Y last scanner 15 via wires 13 and 14. Also X-
Y last scanner 15 is connected to storage oscilloscope 18 via wires 16 and 17.
また、ピエゾ素子支持体2のピエゾ素子固定壁2cに固
定されたピエゾ素子5および7は、それぞれ配線19お
よび20を介して高圧増幅器21および22に接続され
、さらに配線23および24を介して差動回路25に接
続され、差動回路25からさらに配線26を介してスト
レージオシロスコープ18に接続されている。Furthermore, the piezo elements 5 and 7 fixed to the piezo element fixing wall 2c of the piezo element support 2 are connected to high voltage amplifiers 21 and 22 via wiring lines 19 and 20, respectively, and further connected to high voltage amplifiers 21 and 22 via wiring lines 23 and 24. The differential circuit 25 is further connected to the storage oscilloscope 18 via a wiring 26.
さらに、主探針6および補助探針8は、それぞれ配線2
7および28を介して電流電圧変換器29および30に
接続され、さらに配線31および32を介して対数変換
器33および34に接続されている。対数変換器33お
よび34は、配線35および36を介して比較器37お
よび3日に接続され、さらに配線39および40を介し
て積分器41および42に接続されている。そして積分
器41および42は配線43および44を介して、高圧
増幅器21および22と差動回路25を接続した配線2
3および24に接続されている。また比較器37および
3日には配線45および46を介して基準電圧発生器4
7が接続されている。Further, the main probe 6 and the auxiliary probe 8 each have a wiring 2
It is connected to current-voltage converters 29 and 30 via lines 7 and 28, and further connected to logarithmic converters 33 and 34 via lines 31 and 32. Logarithmic converters 33 and 34 are connected to comparators 37 and 3 via wires 35 and 36, and are further connected to integrators 41 and 42 via wires 39 and 40. The integrators 41 and 42 are connected to the wiring 2 which connects the high voltage amplifiers 21 and 22 and the differential circuit 25 via wiring 43 and 44.
3 and 24. Also, the reference voltage generator 4 is connected to the comparator 37 and the 3rd via wiring 45 and 46.
7 is connected.
制御用電子回路はこのようにして構成され、主探針6お
よび補助探針8と導電性試料1間に電圧をかけるとトン
ネル電流が生じるが、このトンネル電流と、主探針6お
よび補助探針8と導電性試料1間の距離Zとは対数関係
にあるため、電流電圧変換器29および30でトンネル
電流が検出されると、直ちに対数変換器33および34
で距離Zに比例した電圧が得られるようにしである。The control electronic circuit is configured in this way, and when a voltage is applied between the main probe 6 and the auxiliary probe 8 and the conductive sample 1, a tunnel current is generated. Since the distance Z between the needle 8 and the conductive sample 1 has a logarithmic relationship, when a tunnel current is detected by the current-voltage converters 29 and 30, the logarithmic converters 33 and 34 immediately
This is so that a voltage proportional to the distance Z can be obtained.
また、基準電圧発生器47は、主探針6および補助探針
8を導電性試料1の上方に一定距離ZOだけ離しておく
ための一定距離ZOに相当する基準電圧を設定するもの
で、比較器37および38は、この一定距離ZOと、主
探針6および補助探針8と導電性試料1間の距離Zとの
偏差e (Z。Further, the reference voltage generator 47 sets a reference voltage corresponding to a certain distance ZO for keeping the main probe 6 and the auxiliary probe 8 above the conductive sample 1 by a certain distance ZO. The devices 37 and 38 calculate the deviation e (Z.
−2>が出力されるようにしである。そして積分器41
および42と、配線43.23および4424で接続さ
れた高圧増幅器21および22は、この偏差eに相当す
る距離だけピエゾ素子5および7を作動して、偏差eが
0になるまで主探針6および補助探針8を駆動するよう
にしてあり、導電性試料1の表面の変位にかかわらず主
探針6および補助探針8は常に導電性試料1の表面に対
して一定距離Zoをおいて追従するようにしである。-2> is output. and integrator 41
and 42, and the high voltage amplifiers 21 and 22 connected by wires 43, 23 and 4424 actuate the piezo elements 5 and 7 by a distance corresponding to this deviation e, until the deviation e becomes 0. The main probe 6 and the auxiliary probe 8 are always kept at a constant distance Zo from the surface of the conductive sample 1 regardless of the displacement of the surface of the conductive sample 1. It is meant to follow.
しかして、このようにして構成された走査型トンネルマ
イクロスコープで、導電性試料1の表面形状を測定する
場合、X−Yラスタスキャナ15の作動により、高圧増
幅器11および12を介してピエゾ素子3および4を駆
動し、左右のX軸方向および前後のY軸方向に、テレビ
のブラウン管の電子線走査運動と同様にして走査すると
、導電性試料1の表面から常に一定距離ZOを保つよう
制御された主探針6が、導電性試料1の表面の凹凸に追
従して上下のZ軸方向に変動する。このときのピエゾ素
子5および7の伸縮量が駆動電圧に比例し、積分器41
および42の出力変化が導電性試料1表面の上下Z軸方
向変位に対応する電圧となるため、これを取り出すと導
電性試料1の表面形状に関する電圧測定値が得られる。Therefore, when measuring the surface shape of the conductive sample 1 with the scanning tunneling microscope configured in this way, the piezo element 3 is and 4 to scan in the left and right X-axis directions and the front and rear Y-axis directions in the same manner as the electron beam scanning motion of a television cathode ray tube, it is controlled to always maintain a constant distance ZO from the surface of the conductive sample 1. The main probe 6 moves vertically in the Z-axis direction following the irregularities on the surface of the conductive sample 1. The amount of expansion and contraction of the piezo elements 5 and 7 at this time is proportional to the drive voltage, and the integrator 41
Since the output change of 42 and 42 becomes a voltage corresponding to the vertical displacement of the surface of the conductive sample 1 in the Z-axis direction, when this is taken out, a voltage measurement value related to the surface shape of the conductive sample 1 can be obtained.
この際、外部からの機械的振動や熱などによって、導電
性試料1の表面と主探針6および補助探針8との間に相
対位置の変動δが生じる場合は、主探針6に関しての積
分器41の出力は変動δが加算されて検出されるが、補
助探針8はX−Yラスタスキャナ15による走査が行わ
れないため、補助探針8に関しての積分器42の出力は
変動δのみとなる。At this time, if a relative positional variation δ occurs between the surface of the conductive sample 1 and the main probe 6 and the auxiliary probe 8 due to external mechanical vibrations or heat, The output of the integrator 41 is detected by adding the variation δ, but since the auxiliary probe 8 is not scanned by the X-Y raster scanner 15, the output of the integrator 42 with respect to the auxiliary probe 8 is detected by adding the variation δ. Only.
従って、作動回路25で積分器41の出力から積分器4
2の出力を引くと、変動δが打ち消されて、外部からの
機械的振動や熱などによる、導電性試料1の表面と主探
針6間の相対位置の変位が無いに等しい出力を得ること
ができ、この出力信号とX−Yラスタスキャナ15によ
る走査信号とをストレージオシロスコープ1日に入力す
ると、表面形状に関する鳥撤図等を描かせることができ
る。Therefore, in the operating circuit 25, the output of the integrator 41 is converted to the integrator 4.
When the output of 2 is subtracted, the fluctuation δ is canceled out, and an output is obtained that is equivalent to no displacement of the relative position between the surface of the conductive sample 1 and the main probe 6 due to external mechanical vibrations, heat, etc. If this output signal and the scanning signal from the X-Y raster scanner 15 are input to the storage oscilloscope on the same day, it is possible to draw a bird's-eye view of the surface shape.
以上、この発明の走査型トンネルマイクロスコープの場
合について説明したが、走査型トンネルスペクトロスコ
ープの場合は、第1図の構成図において、制御用電子回
路を変更し、各ピエゾ素子3および4で主探針6の先端
を導電性試料1の表面に沿って走査させ、走査中適宜箇
所で主探針6と導電性試料1の表蘭間に種々の異なる電
圧を加えて生じるトンネル電流の変化を検出し、同時に
補助探針8で出力の変動δを検出すればよく、このよう
な走査型トンネルスペクトロスコープを使用すれば、前
記の走査型トンネルマイクロスコープの場合と同様にし
て、外部からの機械的振動や、熱による導電性試料1の
表面と主探針6間の相対位1の変位が無いに等しい出力
を得ることができ、導電性試料10表面電子状態を高精
度で計測することができる。The above has explained the case of the scanning tunneling microscope of the present invention, but in the case of the scanning tunneling spectroscope, the control electronic circuit is changed from the configuration diagram of FIG. 1, and each piezo element 3 and 4 is The tip of the probe 6 is scanned along the surface of the conductive sample 1, and various different voltages are applied between the main probe 6 and the surface of the conductive sample 1 at appropriate points during the scan to measure changes in the tunnel current. It is sufficient to simultaneously detect the output fluctuation δ using the auxiliary probe 8. If such a scanning tunnel spectroscope is used, it is possible to detect external mechanical It is possible to obtain an output equivalent to the absence of physical vibrations and displacement of the relative position 1 between the surface of the conductive sample 1 and the main probe 6 due to heat, and it is possible to measure the electronic state of the surface of the conductive sample 10 with high precision. can.
なお、導電性試料は少なくとも表面が導電性であればよ
く、非導電性試料であっても、たとえば、白金などの導
電性物質を表面にコーティングすれば、その表面形状や
表面電子状態を、導電性材料からなる導電性試料と同様
に測定することができる。Note that a conductive sample only needs to have at least a conductive surface, and even a non-conductive sample can be coated with a conductive substance such as platinum to change its surface shape and surface electronic state to be conductive. It can be measured in the same way as a conductive sample made of a conductive material.
次に、この発明の実施例について説明する。 Next, embodiments of the invention will be described.
実施例1
第1図に示す走査型トンネルマイクロスコープを使用し
、主探計6および補助探針8はタングステン線をエツチ
ング加工して先端半径を0.1μm以下の球面状になる
ように仕上げたものを使用して、試料としてアルミニウ
ム製反射ミラー】を載置した試料台にダミー振動を与え
ながら、走査幅1100nで、アルミニウム製反射ミラ
ー1の表面形状を計測した。第2図は、その計測結果を
ストレージオシロスコープ18に入力して描かせたアル
ミニウム製反射ミラー表面形状の鳥諏図である。Example 1 Using the scanning tunneling microscope shown in Fig. 1, the main probe 6 and the auxiliary probe 8 were finished by etching tungsten wire to have a spherical tip radius of 0.1 μm or less. The surface shape of the aluminum reflective mirror 1 was measured with a scanning width of 1100 nm while applying dummy vibration to the sample stage on which the aluminum reflective mirror 1 was placed as a sample. FIG. 2 is a bird's-eye view of the surface shape of the aluminum reflective mirror drawn by inputting the measurement results into the storage oscilloscope 18.
比較例1
実施例1において、補助探針8とその作動を省いた以外
は、実施例1と同様にしてアルミニウム製反射ミラー1
0表面形状を測定した。第3図は、その計測結果をスト
レージオシロスコープ18に人力して描かせたアルミニ
ウム製反射ミラー表面形状の鳥撤図である。Comparative Example 1 An aluminum reflective mirror 1 was prepared in the same manner as in Example 1, except that the auxiliary probe 8 and its operation were omitted.
0 surface profile was measured. FIG. 3 is a detailed diagram of the surface shape of the aluminum reflective mirror drawn manually using the storage oscilloscope 18 based on the measurement results.
比較例2
比較例1において、アルミニウム製反射ミラー1を載置
した試料台にダミー振動を与えることを止め、測定系全
体を高性能除振装置、防音壁及び温湿度コントロール設
備を備えた精密測定専用室内に設置した以外は、比較例
1と同様にしてアルミニウム製反射ミラー10表面形状
を測定した。Comparative Example 2 In Comparative Example 1, we stopped applying dummy vibration to the sample stage on which the aluminum reflective mirror 1 was mounted, and changed the entire measurement system to a precision measurement system equipped with a high-performance vibration isolator, a soundproof wall, and temperature and humidity control equipment. The surface shape of the aluminum reflective mirror 10 was measured in the same manner as in Comparative Example 1 except that it was installed in a dedicated room.
第4図は、その計測結果をストレージオシロスコープ1
8に入力して描かせたアルミニウム製反射ミラー表面形
状の鳥徴図である。Figure 4 shows the measurement results on the storage oscilloscope 1.
8 is a bird's-eye view of the surface shape of an aluminum reflective mirror drawn by inputting the information into the screen.
第2図ないし第4図に示す鳥鍬図から明らかなように、
従来の走査型トンネルマイクロスコープを使用した場合
(第3図)は、ダミー振動の影響でアルミニウム製反射
ミラーの表面状態を正確に測定することができないが、
この発明の走査型トンネルマイクロスコープを使用した
場合(第2図)は、ダミー振動がなくて精密測定専用室
内に設置して測定した場合(第4図)と同様にアルミニ
ウム製反射ミラーの表面状態が正確に測定されており、
このことからこの発明の走査型トンネルマイクロスコー
プによれば、′少なくとも表面が導電性の試料の表面状
態を、外部からの機械的振動や、熱による主探針と試料
間の相対位置の変位の影響を受けることなく、斉精度で
計測できることがわかる。また同様にして少なくとも表
面が導電性の試料の表面電子状態を、外部からの機械的
振動や、熱による主探針と試料間の相対位置の変位の影
響を受けることなく、高精度で計測できることがわかる
。As is clear from the bird hoe diagrams shown in Figures 2 to 4,
When using a conventional scanning tunneling microscope (Fig. 3), it is not possible to accurately measure the surface condition of an aluminum reflective mirror due to the influence of dummy vibration.
When the scanning tunneling microscope of this invention is used (Figure 2), the surface condition of the aluminum reflecting mirror is the same as when it is installed in a precision measurement room without dummy vibration (Figure 4). has been accurately measured,
Therefore, according to the scanning tunneling microscope of the present invention, the surface condition of a sample whose surface is electrically conductive can be controlled by external mechanical vibrations or thermal displacement of the relative position between the main probe and the sample. It can be seen that measurements can be made with uniform precision without being affected. Similarly, the surface electronic state of at least a conductive sample can be measured with high precision without being affected by external mechanical vibrations or displacement of the relative position between the main probe and the sample due to heat. I understand.
第1図はこの発明の走査型トンネルマイクロスコープの
構成図、第2図は実施例1で得られた計測結果をストレ
ージオシロスコープに入力して描かせたアルミニウム製
反射ミラー表面形状の鳥諏図、第3図は比較例1で得ら
れた計測結果をストレージオシロスコープに入力して描
かせたアルミニウム製反射ミラー表面形状の鳥撤回、第
4図は比較例2で得られた計測結果をストレージオシロ
スコープに入力して描かせたアルミニウム製反射ミラー
表面形状の鳥撤図、第5図はトンネル電流の説明図、第
6図は走査型トンネルマイクロスコープの原理を示した
模式図である。
1・・・導電性試料(試料)、2・・・ピエゾ素子支持
体、3,4,5.7・・・ピエゾ素子、6・・・主探針
、8・・・補助探針
特許出願人 日立マクセル株式会社
第2図
走査1II1.I(nm)
第3図
走 圧 運 (nm)
第4図
走 h 幅 (口m)
第
図FIG. 1 is a configuration diagram of the scanning tunneling microscope of the present invention, and FIG. 2 is a cross-sectional diagram of the surface shape of an aluminum reflective mirror drawn by inputting the measurement results obtained in Example 1 into a storage oscilloscope. Figure 3 shows the shape of the surface of an aluminum reflective mirror drawn by inputting the measurement results obtained in Comparative Example 1 into a storage oscilloscope, and Figure 4 shows the measurement results obtained in Comparative Example 2 being input into a storage oscilloscope. A bird's-eye view of the surface shape of the aluminum reflective mirror drawn by input, FIG. 5 is an explanatory diagram of tunnel current, and FIG. 6 is a schematic diagram showing the principle of a scanning tunneling microscope. 1... Conductive sample (sample), 2... Piezo element support, 3, 4, 5.7... Piezo element, 6... Main probe, 8... Auxiliary probe patent application Person Hitachi Maxell Ltd. Figure 2 Scanning 1II1. I (nm) Fig. 3 Travel pressure (nm) Fig. 4 Travel h width (mouth m) Fig.
Claims (1)
エゾ素子と、前後のY軸方向に変位するピエゾ素子と、
上下のZ軸方向に変位するピエゾ素子とを固定して、こ
れらの3次元方向に変位するピエゾ素子で主探針を3次
元方向に微動可能に取りつけるとともに、主探針を上下
のZ軸方向に変位するピエゾ素子と並列に、上下のZ軸
方向に変位するピエゾ素子をピエゾ素子支持体に固定し
て、このピエゾ素子で補助探針を上下のZ軸方向に微動
可能に取りつけ、適宜制御用電子回路を介して3次元方
向に変位する各ピエゾ素子で、主探針と試料の表面間に
電圧を加えて生じるトンネル電流を一定にしながら主探
針の先端を少なくとも表面が導電性の試料の表面に沿っ
て走査させ、走査中上下のZ軸方向に変位するピエゾ素
子に加わる電圧を検出して、主探針と試料間の距離を測
定する際、同時に補助探針を支持するピエゾ素子で補助
探針と試料間に電圧を加えて生じるトンネル電流を一定
にして、補助探針を支持するピエゾ素子に加わる電圧を
検出し、この試料と補助探針の相対的な位置の変動を測
定して、主探針と試料間の距離を補正し、試料の表面形
状を計測するようにしたことを特徴とする走査型トンネ
ルマイクロスコープ 2、ピエゾ素子支持体に、左右のX軸方向に変位するピ
エゾ素子と、前後のY軸方向に変位するピエゾ素子と、
上下のZ軸方向に変位するピエゾ素子とを固定して、こ
れらの3次元方向に変位するピエゾ素子で主探針を3次
元方向に微動可能に取りつけるとともに、主探針を上下
のZ軸方向に変位するピエゾ素子と並列に、上下のZ軸
方向に変位するピエゾ素子をピエゾ素子支持体に固定し
て、このピエゾ素子で補助探針を上下のZ軸方向に微動
可能に取りつけ、適宜制御用電子回路を介して3次元方
向に変位する各ピエゾ素子で、主探針と試料の表面間に
電圧を加えて生じるトンネル電流を一定にしながら主探
針の先端を少なくとも表面が導電性の試料の表面に沿っ
て走査させ、走査中適宜箇所で主探針と試料の表面間に
種々の異なる電圧を加えて生じるトンネル電流の変化を
検出して、試料の表面電子状態を計測する際、同時に補
助探針を支持するピエゾ素子で補助探針と試料間に電圧
を加えて生じるトンネル電流を一定にして、補助探針を
支持するピエゾ素子に加わる電圧を検出し、この試料と
補助探針の相対的な位置の変動を測定して、トンネル電
流の変化を補正し、試料の表面電子状態を計測するよう
にしたことを特徴とする走査型トンネルスペクトロスコ
ープ[Claims] 1. A piezo element that is displaceable in the left and right X-axis directions, and a piezo element that is displaced in the front and rear Y-axis directions, on a piezo element support;
The piezo elements that are displaced in the upper and lower Z-axis directions are fixed, and the main probe is attached so that it can be moved slightly in the three-dimensional direction using these piezo elements that are displaced in three-dimensional directions, and the main probe is moved in the upper and lower Z-axis directions. A piezo element that is displaced in the vertical Z-axis direction is fixed to the piezo element support in parallel with the piezo element that is displaced in Each piezo element is displaced in three dimensions via an electronic circuit, and while the tunnel current generated by applying voltage between the main probe and the surface of the sample is kept constant, the tip of the main probe is connected to a sample whose surface is conductive at least. When measuring the distance between the main probe and the sample by scanning along the surface of the piezo element and detecting the voltage applied to the piezo element which is displaced in the up and down Z-axis direction during scanning, the piezo element that supports the auxiliary probe at the same time By applying a voltage between the auxiliary tip and the sample, the tunneling current generated by the auxiliary tip is kept constant, the voltage applied to the piezo element that supports the auxiliary tip is detected, and changes in the relative position of the sample and the auxiliary tip are measured. A scanning tunneling microscope 2 is characterized in that the distance between the main probe and the sample is corrected to measure the surface shape of the sample. A piezo element that moves in the front and rear Y-axis direction,
The piezo elements that are displaced in the upper and lower Z-axis directions are fixed, and the main probe is attached so that it can be moved slightly in the three-dimensional direction using these piezo elements that are displaced in three-dimensional directions, and the main probe is moved in the upper and lower Z-axis directions. A piezo element that is displaced in the vertical Z-axis direction is fixed to the piezo element support in parallel with the piezo element that is displaced in Each piezo element is displaced in three dimensions via an electronic circuit, and while the tunnel current generated by applying voltage between the main probe and the surface of the sample is kept constant, the tip of the main probe is connected to a sample whose surface is conductive at least. When scanning along the surface of the sample and applying various different voltages between the main tip and the surface of the sample at appropriate points during the scan, changes in the tunneling current that occur are detected, and the surface electronic state of the sample is measured. The piezo element supporting the auxiliary probe applies a voltage between the auxiliary probe and the sample, keeping the tunnel current generated constant, detecting the voltage applied to the piezo element supporting the auxiliary probe, and detecting the relationship between the sample and the auxiliary probe. A scanning tunneling spectroscope characterized by measuring relative position fluctuations, correcting changes in tunneling current, and measuring the surface electronic state of a sample.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17656588A JPH0225702A (en) | 1988-07-14 | 1988-07-14 | Scanning type tunnel microscope and scanning type tunnel spectroscope |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17656588A JPH0225702A (en) | 1988-07-14 | 1988-07-14 | Scanning type tunnel microscope and scanning type tunnel spectroscope |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0225702A true JPH0225702A (en) | 1990-01-29 |
Family
ID=16015792
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17656588A Pending JPH0225702A (en) | 1988-07-14 | 1988-07-14 | Scanning type tunnel microscope and scanning type tunnel spectroscope |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0225702A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105547088A (en) * | 2015-12-31 | 2016-05-04 | 天津市嘉尔屹科技发展有限公司 | Coordinate measuring machine auxiliary measurement apparatus |
-
1988
- 1988-07-14 JP JP17656588A patent/JPH0225702A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105547088A (en) * | 2015-12-31 | 2016-05-04 | 天津市嘉尔屹科技发展有限公司 | Coordinate measuring machine auxiliary measurement apparatus |
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