JPH0226538B2 - - Google Patents
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- Publication number
- JPH0226538B2 JPH0226538B2 JP60041214A JP4121485A JPH0226538B2 JP H0226538 B2 JPH0226538 B2 JP H0226538B2 JP 60041214 A JP60041214 A JP 60041214A JP 4121485 A JP4121485 A JP 4121485A JP H0226538 B2 JPH0226538 B2 JP H0226538B2
- Authority
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- Japan
- Prior art keywords
- tubular passage
- raw material
- fine particles
- plasma
- passage
- Prior art date
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- Expired - Lifetime
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-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/121—Coherent waves, e.g. laser beams
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Optics & Photonics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Description
【発明の詳細な説明】
<産業上の利用分野>
本発明はレーザ光を集束させることにより発生
する誘電破壊プラズマで常温では反応しない原料
を熱励起反応させて微粒子を製造する装置に関す
る。DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to an apparatus for producing fine particles by causing a thermal excitation reaction of raw materials that do not react at room temperature using dielectric breakdown plasma generated by focusing laser light.
<従来の技術>
近年、セラミツク技術等の分野で微粒子(100
Åオーダー程度の微細な粒子)の利用価値が高く
なり、このような微粒子の製造技術に対する要求
が高まつている。<Conventional technology> In recent years, fine particles (100
The utility value of microparticles (on the order of Å) is increasing, and the demand for manufacturing technology for such microparticles is increasing.
従来、このような微粒子を製造する技術として
は下記のようなものが知られている。 Conventionally, the following techniques are known as techniques for producing such fine particles.
(i) レーザ光の吸収による励起を利用した方法
CO2−Transversely Excited Atomospheric
レーザ(以下、単にCO2−TEAレーザと記す)
の波長バンド(約10μm)に強い吸収帯を有す
る気体状分子を原料として用い、非集束状態の
CO2−TEAレーザ光を原料に照射し、分子を
吸収励起により反応させて微粒子を生成する。(i) Method using excitation by absorption of laser light
CO 2 −Transversely Excited Atmospheric
Laser (hereinafter simply referred to as CO 2 −TEA laser)
Using gaseous molecules as raw materials that have a strong absorption band in the wavelength band (approximately 10 μm),
The raw material is irradiated with CO 2 -TEA laser light, molecules are reacted by absorption excitation, and fine particles are generated.
(ii) DCアークプラズマを利用した方法
104K以上の高温となるDCアークプラズマの
フレーム中に気体状に原料を導いて熱励起反応
させた後、急冷して微粒子を生成する。(ii) Method using DC arc plasma Raw materials are introduced in gaseous form into the flame of DC arc plasma, which has a high temperature of 10 4 K or higher, undergoes a thermally excited reaction, and is then rapidly cooled to generate fine particles.
(iii) 低圧ガス中の蒸発を利用した方法
低圧ガス中でルツボ内の金属を加熱して蒸発
させ、蒸発した金属分子を低圧ガスの分子と衝
突させることによりエネルギーを放出させて冷
却し、金属分子ガスを生成し、これを凝縮して
微粒子を生成する。(iii) Method using evaporation in low-pressure gas The metal in the crucible is heated and evaporated in low-pressure gas, and the evaporated metal molecules collide with the molecules of the low-pressure gas to release energy and cool the metal. Generates molecular gas, which is condensed to produce fine particles.
<発明が解決しようとする問題点>
前記(i)の方法にあつては、吸収励起による反応
であるため、SiH4等のように吸収帯がCO2−
TEAレーザの波長バンドで強いか、或いは吸収
帯が幅広いかという性質をもつた分子しか原料と
して用いることができず、その原料の種類に制限
があつた。尚、可視〜紫外の強力なレーザを使い
分けるようにすれば、用いることができる原料の
種類の範囲を広げることができるが、CO2−
TEAレーザに較べて電力効率の面で極めて不利
となる。<Problems to be Solved by the Invention> In the method (i) above, since the reaction is based on absorption excitation, the absorption band is CO 2 - as in SiH 4 etc.
Only molecules that are strong in the TEA laser wavelength band or have a broad absorption band can be used as raw materials, and there are restrictions on the types of raw materials. By using different powerful lasers in the visible to ultraviolet range, the range of raw materials that can be used can be expanded, but CO 2 −
It is extremely disadvantageous in terms of power efficiency compared to TEA lasers.
また、前記(ii)の方法にあつては、DCアークプ
ラズマを発生させるために大電力を要すると共
に、このプラズマを安定化させるには困難があつ
た。更に、プラズマ内に原料を導くに際して電磁
気的な作用がこれを阻害してしまうという場合も
あつた。 Further, in the method (ii), a large amount of electric power is required to generate DC arc plasma, and it is difficult to stabilize this plasma. Furthermore, there have been cases where electromagnetic effects interfere with introducing the raw material into the plasma.
また、前記(ii)および(iii)の方法にあつては、熱慣
性が大きいため目的の温度ゾーンを短時間且つ限
られた範囲に作り出すことができず、制御性が悪
かつた。 Furthermore, in the methods (ii) and (iii), the thermal inertia is large, so the desired temperature zone cannot be created in a short time and within a limited range, resulting in poor controllability.
本発明は上述の如き従来の事情に鑑みなされた
もので、レンズで集束されたレーザ光により誘電
破壊プラズマを発生させ、このプラズマにより原
料を熱励起反応させるという新規な手法により微
粒子を製造する装置を提供することを目的とす
る。 The present invention was made in view of the conventional circumstances as described above, and is an apparatus for producing fine particles using a novel method in which a dielectric breakdown plasma is generated by a laser beam focused by a lens, and a raw material is caused to undergo a thermal excitation reaction by this plasma. The purpose is to provide
<問題点を解決するための手段>
本発明に係る微粒子製造装置の構成は管状通路
に気体状の原料を導くと共にレーザ源からレーザ
光を該管状通路の軸線に沿わせて照射し、更に該
レーザ光をレンズにより前記管状通路内で集束さ
せて焦点近傍に誘電破壊プラズマを発生させ、該
誘電破壊プラズマによる熱励起反応で前記原料を
微粒子に生成する微粒子製造装置において、前記
管状通路として多孔質部材を用い、該多孔質部材
を透過して通路内に不活性ガスを送り込むか、あ
るいは前記管状通路の上流側にエアチヤンバ部を
形成し、該エアチヤンバ部から不活性ガスを通路
壁面に沿わせて流し、または前記管状通路を鉛直
方向に延設し、該管状通路の上部にオイルチヤン
バ部を形成し、該オイルチヤンバ部からシリコン
オイルを通路内壁面に沿わせて流下させることを
特徴とするものである。<Means for Solving the Problems> The structure of the particle manufacturing apparatus according to the present invention is to introduce a gaseous raw material into a tubular passage, irradiate a laser beam from a laser source along the axis of the tubular passage, and In the particle manufacturing apparatus, the laser beam is focused in the tubular passage by a lens to generate dielectric breakdown plasma near the focal point, and the raw material is generated into fine particles by a thermally excited reaction caused by the dielectric breakdown plasma, wherein the tubular passage is made of a porous material. A member is used to send an inert gas into the passage through the porous member, or an air chamber is formed on the upstream side of the tubular passage, and the inert gas is directed from the air chamber along the passage wall surface. The sink or the tubular passage is vertically extended, an oil chamber is formed in the upper part of the tubular passage, and silicone oil is caused to flow down from the oil chamber along the inner wall surface of the passage. .
<作用>
レーザ光で誘起された誘電破壊プラズマはレン
ズの焦点近傍の限られた範囲で発生する。このた
め、このプラズマ内に導かれる気体状の原料はプ
ラズマ内で極めて高温まで急熱されて微粒子が生
成され、その後、プラズマ外へ移送されるか或い
はプラズマが消滅するかにより微粒子は極めて大
きな温度差をもつて急冷されて安定し、その粒径
が一定したものとなる。また、気体状原料の流速
及び濃度或いはプラズマの発生領域の調整による
温度制御で微粒子の粒径を容易に制御することが
できる。<Operation> Dielectric breakdown plasma induced by laser light is generated in a limited range near the focal point of the lens. For this reason, the gaseous raw material introduced into the plasma is rapidly heated to an extremely high temperature within the plasma to generate fine particles, and then the fine particles are transferred to the outside of the plasma or the plasma is extinguished, causing the fine particles to rise to an extremely high temperature. It is rapidly cooled and stabilized, and its particle size becomes constant. Further, the particle size of the fine particles can be easily controlled by temperature control by adjusting the flow rate and concentration of the gaseous raw material or the plasma generation area.
ここで、上記誘電破壊プラズマは、レーザ光の
照射方向が管状通路の軸線に沿つているので、そ
の軸線に沿つた円柱状の範囲で生じることにな
る。管状通路として多孔質部材が用いられるとき
に、この多孔質部材を通過して不活性ガスを通路
内へ送り込むと、不活性ガス層が通路内壁面上に
形成され、上記プラズマと通路内壁面とが隔離さ
れた状態となる。このため、微粒子の沈着や管状
通路の損傷が有効になり防止される。 Here, since the irradiation direction of the laser beam is along the axis of the tubular passage, the dielectric breakdown plasma is generated in a cylindrical area along the axis. When a porous member is used as a tubular passage, when an inert gas is fed into the passage through the porous member, an inert gas layer is formed on the inner wall of the passage, and the plasma and the inner wall of the passage are combined. becomes isolated. Therefore, particulate deposition and damage to the tubular passages are effectively prevented.
管状通路として多孔質部材とする代りにエアチ
ヤンバ部あるいはオイルチヤンバ部を設けて、不
活性ガスやシリコンオイルを流しても、同様の結
果となる。 Even if an air chamber or an oil chamber is provided instead of using a porous member as the tubular passage and an inert gas or silicone oil is flowed therein, the same result will be obtained.
<実施例>
以下、本発明の実施例を図面を参照して説明す
る。<Examples> Examples of the present invention will be described below with reference to the drawings.
まず、本発明の微粒子製造装置をその概略構造
を表す第1図を参照して説明する。微粒子製造装
置は原料容器1と生成物容器2とを円筒状の管状
通路3で連通した容器を有している。原料容器1
内には気体状の原料(以下原料ガスと言う)Aと
Bとが導かれ、これら原料ガスAと原料ガスBと
は原料容器1内でフアン4により混合されるよう
になつている。尚、これら原料ガスAと原料ガス
Bとは常温では混合しても反応しない組合せであ
る。原料容器1に較べて生成物容器2は低圧に設
定されており、原料ガスAと原料ガスBとの混合
ガスは或る一定の流速で管状通路3内を通つて原
料容器1側から生成物容器2側へ流れるようにな
つている。原料容器1には管状通路3の一端側開
口に対向した窓5が設けられ、レーザ発振器6か
らのCO2−TEAレーザ光がレンズ7により集束
されて窓5から容器内へ入射され、管状通路3内
で焦点を結ぶようになつている。尚、これら窓5
及びレンズ7はCO2−TEAレーザの波長で透明
となるKCl、NaCl、Ge等により成つているが、
CO2 -TEAレーザ等使用されるレーザ光が透過す
るものであればその材質に特に限定はない。 First, the apparatus for producing fine particles of the present invention will be explained with reference to FIG. 1, which schematically shows the structure thereof. The fine particle manufacturing apparatus has a container in which a raw material container 1 and a product container 2 are communicated with each other through a cylindrical tubular passage 3. Raw material container 1
Gaseous raw materials (hereinafter referred to as raw material gas) A and B are introduced into the container 1, and these raw material gas A and raw material gas B are mixed by a fan 4 within the raw material container 1. Note that these raw material gas A and raw material gas B are a combination that does not react even if mixed at room temperature. The pressure in the product container 2 is set to be lower than that in the raw material container 1, and the mixed gas of raw material gas A and raw material gas B passes through the tubular passage 3 at a certain flow rate to form the product from the raw material container 1 side. It is designed to flow towards the container 2 side. The raw material container 1 is provided with a window 5 facing the opening on one end side of the tubular passage 3, and the CO 2 -TEA laser beam from the laser oscillator 6 is focused by a lens 7 and enters the container through the window 5. I'm starting to focus on 3. Furthermore, these windows 5
The lens 7 is made of KCl, NaCl, Ge, etc., which are transparent at the wavelength of the CO 2 -TEA laser.
There is no particular limitation on the material as long as the laser light used, such as the CO 2 - TEA laser, passes through it.
レーザ発振器6からのCO2−TEAレーザ光は
約0.5〜約1J/pulseクラス、パルス持続時間約
1μs、ピーク出力約1MWのものであり、レンズ7
により集束されてその焦点近傍で超強電磁場によ
る電離作用を起し、管状通路3内でレーザ誘起誘
電破壊プラズマ(Laser Induced Dielectric
Breakdown Plasma、以下LIDBプラズマと記
す)を発生する。例えば、0.6〜0.8J/pulseの
CO2−TEAレーザ光で長さ約2cm、直径約1mm
のLIDBプラズマPが発生し、LIDBプラズマP
の体積(約0.02cm3≒2×10-6mol)と気体(2原
子分子として)の比熱(7Cal/mol・K≒
30Cal/mol・K)とからLIDBプラズマPは約
104Kという極めて高温となつている。この高温
状態はmsオーダーで緩和すると考えられ、衝撃
波が観測されることから急速に膨張する高温気体
の細い円柱が管状通路3内に残り、すぐ後に、膨
張と輻射により約10ms以内に急速に冷却する。
すなわち、レーザ発振器6のパルスに応じた所定
の時刻且つレンズ7の焦点に応じた所定の場所に
1μs程度の短時間で104K(1010K/s)にもなる急
熱状態と105〜107K/Sで降下するという急冷状
態とを得ることができる。このような状態は高周
波放電に較べてはるかに高い周波数(CO2−
TEAレーザの波長を10μmとして(3×108m/
s)÷(10×10-6m)=3×1013Hz)での高周波プ
ラズマが、100pps程度で繰返され得ることを示
している。尚、本発明は連続発振レーザを用いる
こともでき、連続発振レーザの場合は上記パルス
発振レーザと異なり急冷はLIDBプラズマPの発
生領域外へ移動されることによりなされる。 The CO 2 -TEA laser beam from the laser oscillator 6 is approximately 0.5 to approximately 1 J/pulse class, and the pulse duration is approximately
1μs, peak output approximately 1MW, and lens 7
The ultra-strong electromagnetic field causes an ionization effect near its focal point, creating a laser-induced dielectric breakdown plasma within the tubular passage 3.
Breakdown Plasma (hereinafter referred to as LIDB plasma) is generated. For example, 0.6~0.8J/pulse
Approximately 2 cm in length and 1 mm in diameter with CO 2 -TEA laser beam
LIDB plasma P is generated, LIDB plasma P
volume (approximately 0.02 cm 3 ≒ 2 × 10 -6 mol) and the specific heat of the gas (as a diatomic molecule) (7 Cal/mol・K ≒
30Cal/mol・K) and LIDB plasma P is approx.
It has an extremely high temperature of 10 4 K. This high-temperature state is thought to relax on the order of milliseconds, and as a shock wave is observed, a thin cylinder of rapidly expanding high-temperature gas remains inside the tubular passageway 3, and immediately afterward, it rapidly cools down within about 10 milliseconds due to expansion and radiation. do.
That is, at a predetermined time according to the pulse of the laser oscillator 6 and at a predetermined place according to the focus of the lens 7.
A rapid heating state of as much as 10 4 K (10 10 K/s) and a rapid cooling state of dropping at 10 5 to 10 7 K/S can be obtained in a short time of about 1 μs. This state has a much higher frequency (CO 2 −
Assuming the TEA laser wavelength is 10 μm (3×10 8 m/
s)÷(10×10 −6 m)=3×10 13 Hz) can be repeated at about 100 pps. Note that the present invention can also use a continuous wave laser, and in the case of a continuous wave laser, unlike the above pulsed laser, the rapid cooling is performed by moving it outside the generation area of the LIDB plasma P.
上記構成の微粒子製造装置によれば、原料容器
1内で混合された原料ガスAと原料ガスBとが管
状通路3内を通つて生成物容器2側へ流れるが、
この混合ガスは管状通路3内でLIDBプラズマP
による急熱で熱励起反応して微粒子が生成され、
パルスレーザによるLIDBプラズマが消滅するこ
とによる急冷で生成された微粒子は更なる反応を
することなくその形状を留めて生成物容器2へ移
送される。具体的には原料として通常混合しても
1000℃以上でしか反応しないSnCl4ガスとO2ガス
とを用いた場合には、Cl2ガスと微粒子として
SnO2が得られ、他のハロゲン化物、例えば
SbCl5、AlCl3、FeCl3、TiCl4等についても同様
である。また、常温で気体であるような窒化物、
ホウ化物、炭化物等を原料として用いることもで
きる。更にまた、原料として例えばFeCl2の蒸
発、凝縮を不活性ガス中で行つてエアロゾルを作
り、他の原料のH2ガスと常温で混合してLIDBプ
ラズマPで反応させ、微粒子FeとHClガスとを
得ることもできる。 According to the fine particle manufacturing apparatus having the above configuration, the raw material gas A and the raw material gas B mixed in the raw material container 1 flow through the tubular passage 3 to the product container 2 side.
This mixed gas is transferred to the LIDB plasma P in the tubular passage 3.
Fine particles are generated due to thermal excitation reaction due to rapid heating caused by
The fine particles generated by rapid cooling due to the extinction of the LIDB plasma by the pulse laser are transferred to the product container 2 while retaining their shape without undergoing any further reaction. Specifically, even if it is usually mixed as a raw material,
When using SnCl 4 gas and O 2 gas, which only react at temperatures above 1000°C, Cl 2 gas and fine particles
SnO 2 is obtained and other halides, e.g.
The same applies to SbCl 5 , AlCl 3 , FeCl 3 , TiCl 4 and the like. In addition, nitrides that are gaseous at room temperature,
Borides, carbides, etc. can also be used as raw materials. Furthermore, a raw material such as FeCl 2 can be evaporated and condensed in an inert gas to create an aerosol, mixed with other raw material H 2 gas at room temperature, and reacted with LIDB plasma P to form particulate Fe and HCl gas. You can also get
このように原料をエアロゾルとガスとの組合せ
とする以外にもエアロゾル同士等、本発明によれ
ば極めて広範囲な種類の原料から微粒子を製造す
ることができる。また、原料容器1内に供給する
原料ガスは勿論2種類以上であつても良く、また
これら原料ガスは予め混合して原料容器1に供給
するようにしても良い。 According to the present invention, fine particles can be produced from an extremely wide variety of raw materials, such as a combination of aerosol and gas as well as a combination of aerosols and the like. Furthermore, it is of course possible to supply two or more kinds of raw material gases into the raw material container 1, or these raw material gases may be mixed in advance and supplied to the raw material container 1.
ここで、CO2−TEAレーザのパルスが50ppsの
場合、直径2mmの管状通路3内において長さ2cm
にわたつて発生するLIDBプラズマPの領域を
1/50sで通過する原料ガスの流速は1m/sで
あることから、処理量は3cm2/sとなり1気圧で
1モルの原料ガスをLIDBプラズマで処理するの
に約2時間を要することが判る。このことは製造
量10g/hrのオーダーを意味し、現在知られてい
る他の製法に較べて比較的能率の良いものであ
る。例えば、SnCl4ガス+O2ガス→SnO2微粒子
+2Cl2ガスの場合、原料ガス合計2モルから
150.7gのSnO2微粒子が生成され、、例えば容器
内を200torrに減圧し、原料ガスをArガスで50%
に薄めても5g/hrのオーダーで微粒子を生成す
ることができる。 Here, when the CO 2 -TEA laser pulse is 50 pps, the length is 2 cm in the tubular passage 3 with a diameter of 2 mm.
Since the flow rate of the raw material gas that passes through the area of the LIDB plasma P in 1/50 s is 1 m/s, the throughput is 3 cm 2 /s, and 1 mole of the raw material gas is passed through the LIDB plasma at 1 atmosphere. It turns out that it takes about 2 hours to process. This means a production rate of the order of 10 g/hr, which is relatively efficient compared to other currently known production methods. For example, in the case of SnCl 4 gas + O 2 gas → SnO 2 fine particles + 2Cl 2 gas, from a total of 2 moles of raw material gas
150.7g of SnO 2 fine particles are generated, for example, the pressure inside the container is reduced to 200torr, and the raw material gas is 50% Ar gas.
Even if diluted to 5g/hr, fine particles can be produced on the order of 5g/hr.
また、LIDBプラズマで生成された微粒子を急
冷する過程での凝縮がエアロゾルの合一凝集理論
で記述できると仮定すれば、微粒子の平均体積
∝(滞留時間)6/5(容積濃度)6/5(絶対温度)3/5と
なるため、微粒子の平均径p∝(原料ガスの分
圧/原料ガスの流速)0.4と考えられる(但し、絶
対温度はレーザ光で決まり反応系には余り依存し
ないと仮定)。従つて、より小径の微粒子を得る
には、原料ガス分圧を低く(原料ガス濃度を薄
く)するか原料ガスの流速を速くすれば良い。し
かしながら、パルスレーザでLIDBプラズマを誘
起させる場合には、管状通路3内を流れる原料ガ
スの全てをLIDBプラズマで反応させるために
は、自ら原料ガスの流速には制限が加わる。この
ためパルスレーザを用いる場合には生成微粒子の
粒径制御は原料ガス分圧の制御により行うのが容
易であるが、この点連続発振レーザを用いれば粒
径制御がより容易に行えると言える。尚、実際に
は生成微粒子の粒径は原料ガスの流速より原料ガ
ス分圧の方へ依存性がかなり大きいため、原料ガ
ス分圧の制御によりパルスレーザでも約20Å〜約
2000Åの範囲で十分に粒径制御が行えることが実
験により確認された。 Furthermore, assuming that the condensation during the process of rapidly cooling fine particles generated by LIDB plasma can be described by the aerosol coalescence aggregation theory, the average volume of fine particles ∝ (residence time) 6/5 (volume concentration) 6/5 (absolute temperature) is 3/5 , so the average particle diameter p∝ (partial pressure of raw material gas/flow rate of raw material gas) is considered to be 0.4 (however, the absolute temperature is determined by the laser beam and there is no excess in the reaction system . (assumed not dependent). Therefore, in order to obtain fine particles with a smaller diameter, the partial pressure of the source gas may be lowered (the concentration of the source gas may be lowered) or the flow rate of the source gas may be increased. However, when LIDB plasma is induced by a pulsed laser, in order to cause all of the raw material gas flowing in the tubular passage 3 to react with the LIDB plasma, a restriction is imposed on the flow rate of the raw material gas. For this reason, when using a pulsed laser, it is easy to control the particle size of the generated fine particles by controlling the partial pressure of the raw material gas, but in this point it can be said that particle size control can be performed more easily if a continuous wave laser is used. In reality, the particle size of the generated fine particles is much more dependent on the raw material gas partial pressure than on the raw material gas flow rate, so by controlling the raw material gas partial pressure, even with a pulsed laser, the particle size can be reduced from about 20 Å to approx.
It was confirmed through experiments that the particle size could be sufficiently controlled within the range of 2000 Å.
上記のように、LIDBプラズマの径程度に管状
通路3を小径にしておくと下記の如き利点があ
る。 As mentioned above, if the diameter of the tubular passage 3 is made as small as the diameter of the LIDB plasma, there are the following advantages.
(a) LIDBプラズマ内を原料ガス全てが通過する
ため、微粒子の生成効率が高い。(a) Since all the raw material gas passes through the LIDB plasma, the generation efficiency of fine particles is high.
(b) 管状通路内のガス流が一方向であるため、生
成物容器2から原料容器1への逆流が防止さ
れ、微粒子の再成長が防止される。(b) Since the gas flow in the tubular passage is unidirectional, backflow from the product container 2 to the raw material container 1 is prevented and regrowth of particulates is prevented.
(c) 原料容器1と生成物容器2とが実質的に切離
されるため、例えば原料室を凝縮点以上にし、
生成物容器2内に液体窒素を入れて両者間に温
度条件に差を設けたり、或いは原料容器1を高
圧、生成物容器2を低圧として両者間に圧力条
件の差を設けたり、或いは生成物容器2内のみ
に生成された微粒子表面に吸着してこの表面を
改質する気体物質を入れておく等の条件設定を
容易に行うことができる。(c) Since the raw material container 1 and the product container 2 are substantially separated, for example, the raw material chamber is heated above the condensation point,
By putting liquid nitrogen into the product container 2 to create a difference in temperature conditions between the two, or by setting the raw material container 1 at high pressure and the product container 2 at low pressure to create a difference in pressure conditions between the two, It is possible to easily set conditions such as adding a gaseous substance that adsorbs to the surface of the fine particles generated only in the container 2 and modifies the surface.
ここで上記のように管状通路3を小径のものと
する場合には上記した利点がある反面、生成され
た微粒子が比較的低温の管状通路3の壁面に熱沈
着したり、LIDBプラズマの半径方向への急速膨
張により管状通路3が破損してしまつたり或いは
管壁を構成する物質の分解・蒸発によるプラズマ
への害作用が生ずることが考えられるが、管状通
路3の壁面を加熱して生成物容器2内への急速膨
張冷却で微粒子の熱沈着を低減させることは可能
である。一方、微粒子の熱沈着及び管状通路3の
破損をより効果的に防止するためには、管状通路
3の壁面近傍部分がプラズマ化されないため若干
微粒子生成効率が落ちるが、管状通路3の径を或
る程度太くすれば良い。 Here, when the tubular passage 3 is made small in diameter as described above, while there is the above-mentioned advantage, the generated fine particles may be thermally deposited on the wall surface of the relatively low-temperature tubular passage 3, and the radial direction of the LIDB plasma may It is conceivable that the tubular passage 3 may be damaged due to the rapid expansion of It is possible to reduce thermal deposition of particulates by rapid expansion cooling into the material container 2. On the other hand, in order to more effectively prevent thermal deposition of particles and damage to the tubular passage 3, the diameter of the tubular passage 3 may be reduced, although the part near the wall surface of the tubular passage 3 will not be turned into plasma, resulting in a slight drop in particle generation efficiency. Just make it as thick as possible.
第2図〜第4図に示すものは微粒子生成効率を
落すことなく管状通路3が小径であることによる
利点を維持し、尚且つ微粒子の熱沈着及び管状通
路3の破損を有効に防止するための実施例であ
る。 The structure shown in FIGS. 2 to 4 maintains the advantage of the small diameter of the tubular passage 3 without reducing the particle generation efficiency, and effectively prevents thermal deposition of particles and damage to the tubular passage 3. This is an example.
第2図に示すものは、管状通路3を原料容器側
部分3aと生成物容器側部分3bとに分割し、こ
れら両部分3a,3bをグラスフイルター等の多
孔質部材3dを有した円筒状のジヨイント部材3
cで連結し、少なくともLIDBプラズマPの発生
領域を囲む管状通路3の部分をLIDBプラズマの
径より大径としたものである。尚、図中8はシー
ル用のOリングである。そして、図外の供給源か
らジヨイント部材3c内へ供給されたAr等の不
活性ガスが多孔質部材3dを通して管状通路3内
のLIDBプラズマP周囲へ満遍なく供給されるよ
うになつている。これにより、管状通路3内の壁
面近傍部には不活性ガスによる層が形成されて壁
面際のプラズマ化されない部分が不活性ガスによ
り置換えられるため、微粒子に係る管状通路3の
径は実質的に小さくなつている。このため、微粒
子の熱沈着や管状通路3の破損を生ずることな
く、前記利点を維持しつつ微粒子の製造を行うこ
とができる。 In the system shown in FIG. 2, the tubular passage 3 is divided into a raw material container side portion 3a and a product container side portion 3b, and both of these portions 3a and 3b are connected to a cylindrical passage having a porous member 3d such as a glass filter. Joint member 3
c, and at least a portion of the tubular passage 3 surrounding the generation area of the LIDB plasma P is made larger in diameter than the diameter of the LIDB plasma. Note that 8 in the figure is an O-ring for sealing. Inert gas such as Ar is supplied from a supply source (not shown) into the joint member 3c and is evenly supplied around the LIDB plasma P in the tubular passage 3 through the porous member 3d. As a result, a layer of inert gas is formed near the wall inside the tubular passage 3, and the part near the wall that is not turned into plasma is replaced by the inert gas, so that the diameter of the tubular passage 3 related to fine particles is substantially reduced. It's getting smaller. Therefore, fine particles can be produced while maintaining the above advantages without thermal deposition of the fine particles or damage to the tubular passageway 3.
第3図に示すものは、管状通路3の原料容器側
部分3aをLIDBプラズマPと同程度の小径と
し、生成物容器側部分3bを大径として、これら
両部分3a,3cをOリング8を介して連結した
ものである。そして、図外の供給源から生成物容
器側部分3bの先端に設けられたチヤンバ部3e
に供給されたAr等の不活性ガスが生成物容器側
部分3bの内壁面に沿つて層流状態で流れ、プラ
ズマ化されない壁面近傍部分を不活性ガスで置換
えてLIDBプラズマPの発生領域を実質的に小径
としている。 In the one shown in FIG. 3, the raw material container side portion 3a of the tubular passage 3 has a small diameter comparable to that of the LIDB plasma P, the product container side portion 3b has a large diameter, and both portions 3a and 3c are connected with an O-ring 8. They are connected via A chamber portion 3e provided at the tip of the product container side portion 3b is supplied from a supply source (not shown).
The inert gas such as Ar supplied to the product container side portion 3b flows in a laminar flow state along the inner wall surface of the product container side portion 3b, replacing the portion near the wall surface that is not converted into plasma with the inert gas, and substantially converting the generation area of LIDB plasma P. The diameter is relatively small.
第4図に示すものは、原料容器1を上方、生成
物容器2を下方に位置させて、これら容器1,2
を鉛直方向に延設され且つ第3図に示したと同様
な構造の管状通路3で連結したものであり、図外
の供給源からチヤンバ部3eに供給されたシリコ
ンオイルをLIDBプラズマPの発生領域を囲む生
成物容器側部分3bの内壁面に沿つて満遍なく流
下させるようにし、プラズマ化されない壁面近傍
部分をシリコンオイルで置換えてLIDBプラズマ
Pの発生領域を実質的に小径としている。尚、管
状通路3を多少長目にしておけば、壁面への微粒
子の熱沈着を利用して、この微粒子をシリコンオ
イル中に捕集することができる。 In the case shown in FIG. 4, the raw material container 1 is located above and the product container 2 is located below.
are connected by a tubular passage 3 extending vertically and having a structure similar to that shown in FIG. The LIDB plasma P is caused to flow down evenly along the inner wall surface of the product container side portion 3b surrounding the plasma, and the portion near the wall surface that is not converted into plasma is replaced with silicone oil, thereby making the generation area of LIDB plasma P substantially small in diameter. If the tubular passage 3 is made somewhat long, the fine particles can be collected in the silicone oil by utilizing thermal deposition of the fine particles on the wall surface.
第1図に示した装置は原料容器1内で原料ガス
を混合するようにしているため、原料容器1に或
る程度の容量をもたせているが、予め数種類の原
料ガスを混合して供給する場合には、第5図に示
すように原料容器1を極めて小容量のものとした
り、或いは原料容器を省略してしまつたりするこ
ともできる。ここで、第5図に示した構成のもの
に限られないが、原料ガス中の粒子や生成された
微粒子が窓5に沈着してレーザの透過率を低下さ
せてしまうのを防止するため、第6図に示すよう
に原料容器1の内側から窓5に向けて円環状に噴
射口9を設け、この噴射口9からAr等の不活性
ガスを窓5に吹付けて粒子の沈着を防止すること
もできる。尚、生成された微粒子の窓5への沈着
防止だけを図る必要がある場合には、レンズ7に
長焦点のものを用い、LIDBプラズマPの発生領
域を窓5から十分に離隔させるようにしても目的
は達成できる。 The device shown in Fig. 1 mixes the raw material gases in the raw material container 1, so the raw material container 1 has a certain capacity, but several types of raw material gases are mixed in advance and supplied. In some cases, the raw material container 1 may have an extremely small capacity as shown in FIG. 5, or the raw material container may be omitted. Although not limited to the configuration shown in FIG. 5, in order to prevent particles in the source gas and generated fine particles from depositing on the window 5 and reducing the laser transmittance, As shown in FIG. 6, an injection port 9 is provided in an annular shape from the inside of the raw material container 1 toward the window 5, and an inert gas such as Ar is sprayed from the injection port 9 onto the window 5 to prevent particle deposition. You can also. In addition, if it is necessary to only prevent the generated fine particles from depositing on the window 5, use a lens 7 with a long focus so that the generation area of the LIDB plasma P is sufficiently separated from the window 5. The purpose can also be achieved.
また、供給しようとする原料の沸点が高い場合
には、この原料を一度蒸発、凝縮させて含塵気流
を生成し、これを原料ガスとして供給することも
できる。例えば第7図に示すように、高沸点の原
料Aをヒータ10により原料容器1内で加熱し、
蒸発、凝縮させて微粒子の固体又は液体とし、こ
れを原料容器1内に供給されるAr、N2等のキヤ
リアガスに乗せて管状通路3内へ導き、この原料
ガスAをLIDBプラズマPの発生領域より前で管
状通路3内に供給される別の原料ガスBと混合さ
せてLIDBプラズマPにより反応させるようにす
ることができる。尚、この場合、原料ガスAと原
料ガスBとを混合させるための中間容器をLIDB
プラズマPの発生領域より前に設けても良い。ま
た、原料Aの加熱はヒータ10以外に、加熱用の
CO2レーザを照射して加熱する等、他の手段を用
いても良い。 Furthermore, when the raw material to be supplied has a high boiling point, the raw material can be once evaporated and condensed to generate a dust-containing air stream, and this can be supplied as the raw material gas. For example, as shown in FIG. 7, a high boiling point raw material A is heated in a raw material container 1 by a heater 10,
The material gas A is evaporated and condensed into fine particles of solid or liquid, carried on a carrier gas such as Ar or N 2 supplied into the raw material container 1, and guided into the tubular passage 3. It can be mixed with another raw material gas B supplied into the tubular passage 3 earlier and reacted with the LIDB plasma P. In this case, the intermediate container for mixing raw material gas A and raw material gas B is LIDB.
It may be provided before the plasma P generation area. In addition, for heating the raw material A, in addition to the heater 10, a heating
Other means such as heating by irradiating with CO 2 laser may also be used.
また、生成された微粒子の捕集手段としては生
成物容器2を設けるものに限らず、サイクロン等
の集塵装置を設けたり、或いは流下する液膜やシ
ヤワーにより微粒子を冷却捕集するようにしても
良く、更には、生成された微粒子の表面改質を目
的とする吸着質ガス供給装置を付設するようにし
ても良い。 Furthermore, the means for collecting the generated fine particles is not limited to the one provided with the product container 2, but may also include a dust collecting device such as a cyclone, or cooling and collection of fine particles using a falling liquid film or shower. Furthermore, an adsorbent gas supply device for the purpose of surface modification of the generated fine particles may be attached.
また、実施例ではレンズ7により集束されたレ
ーザを窓5を通して容器内に入射させているが、
窓5を省略してレンズ7を原料容器1に設け、こ
のレンズ7に窓を兼用させることもできる。 Furthermore, in the embodiment, the laser beam focused by the lens 7 is made to enter the container through the window 5.
It is also possible to omit the window 5 and provide a lens 7 in the raw material container 1, so that the lens 7 also serves as a window.
また、LIDBプラズマ発生用に用いるレーザは
CO2レーザに限らず、種々条件が満されれば他の
レーザを用いることも可能である。 In addition, the laser used for LIDB plasma generation is
Not only the CO 2 laser but also other lasers can be used if various conditions are met.
また上記した実施例は2種類以上の原料ガスか
ら微粒子を生成するものを示したが、本発明は、
例えばNi(CO)4→Ni+4COのように遷移金属カ
ーボニルの熱分解により金属微粒子を生成するこ
とにも応用できる。すなわち、Ni、Fe、Mo、W
等のようにCOと反応させてカーボニルを作るメ
タルや鉱石を、一度カーボニルにさせてそれから
金属微粒子に精錬するという精錬の新しい手法と
して用いることができる。尚、上記Ni(CO)4の
反応は極めて毒性が高いため、その実施には第8
図に示すような装置を用いると良い。すなわち、
メタル又は鉱石を入れた原料容器1からのNi
(CO)4を管状通路3内でLIDBプラズマにより熱
分解し、生成されたNi微粒子を生成物容器2に
捕集すると共に、同時に生成されたCOガスを管
路11を通して原料容器1に循環させてNi
(CO)4の生成に用いるようにし、毒性のあるガス
が外部に洩れないようにする。 Further, although the above-mentioned embodiments have shown that fine particles are generated from two or more types of raw material gases, the present invention
For example, it can be applied to generate metal fine particles by thermal decomposition of transition metal carbonyl, such as Ni(CO) 4 → Ni+4CO. That is, Ni, Fe, Mo, W
It can be used as a new method of refining, in which metals and ores that react with CO to form carbonyl are first converted into carbonyl and then refined into fine metal particles. In addition, since the reaction of Ni(CO) 4 mentioned above is extremely toxic, it is necessary to carry out the 8th reaction.
It is best to use a device like the one shown in the figure. That is,
Ni from raw material container 1 containing metal or ore
(CO) 4 is thermally decomposed by LIDB plasma in the tubular passage 3, and the generated Ni particles are collected in the product container 2, and at the same time, the generated CO gas is circulated to the raw material container 1 through the pipe 11. TeNi
(CO) 4 should be used to generate it, and the toxic gas should not leak outside.
また、本発明により生成される微粒子の粒度分
布は幾可標準偏差1.4程度のほぼ対数正規分布
(自己保存型分布)をなすものと考えられると共
に微粒子の平均粒径が容易に制御できることか
ら、本発明は標準エアロゾル発生器としても応用
することができる。 Furthermore, the particle size distribution of the fine particles produced by the present invention is considered to be approximately lognormal distribution (self-preserving distribution) with a standard deviation of about 1.4, and the average particle size of the fine particles can be easily controlled. The invention can also be applied as a standard aerosol generator.
また更に、管状通路3を透明としておけば、
CVD反応を解析するための発光分光分析器とし
ても応用することができる。 Furthermore, if the tubular passage 3 is made transparent,
It can also be applied as an emission spectrometer to analyze CVD reactions.
<発明の効果>
本発明によれば、極めて簡単且つ扱い易い装置
を用いて広範囲の種類の原料から極めて安定した
粒径の微粒子を製造することができ、その粒径も
容易に制御することができる。<Effects of the Invention> According to the present invention, fine particles with an extremely stable particle size can be produced from a wide range of raw materials using an extremely simple and easy-to-handle device, and the particle size can also be easily controlled. can.
しかも、微粒子生成効率を落すことなく管状通
路を小径に維持したまま、微粒子の熱沈着及び管
状通路の損傷を有効に防止できるものである。 Furthermore, thermal deposition of particles and damage to the tubular passage can be effectively prevented while maintaining the diameter of the tubular passage to be small without reducing particle generation efficiency.
第1図は本発明の一実施例に係る微粒子製造装
置を表す概略構成図、第2図〜第4図はそれぞれ
管状通路の種々の態様を表す構成図、第5図は微
粒子製造装置の他の態様を表す概略構成図、第6
図は窓への粒子沈着防止構造を表す構成図、第7
図は高沸点原料を用いた微粒子製造装置を表す概
略構成図、第8図はNi(CO)4の熱分解反応に応
用した微粒子製造装置を表す概略構成図である。
図面中、1は原料容器、2は生成物容器、3は
管状通路、6はレーザ発振器、7はレンズ、Pは
LIDBプラズマである。
FIG. 1 is a schematic configuration diagram showing a particulate production device according to an embodiment of the present invention, FIGS. 2 to 4 are construction diagrams each showing various aspects of the tubular passage, and FIG. Schematic configuration diagram showing the aspect of 6th
The figure is a block diagram showing the structure for preventing particle deposition on windows.
The figure is a schematic block diagram showing a fine particle manufacturing apparatus using high boiling point raw materials, and FIG. 8 is a schematic block diagram showing a fine particle manufacturing apparatus applied to the thermal decomposition reaction of Ni(CO) 4 . In the drawing, 1 is a raw material container, 2 is a product container, 3 is a tubular passage, 6 is a laser oscillator, 7 is a lens, and P is
LIDB plasma.
Claims (1)
源からレーザ光を該管状通路の軸線に沿わせて照
射し、更に該レーザ光をレンズにより前記管状通
路内で集束させて焦点近傍に誘電破壊プラズマを
発生させ、該誘電破壊プラズマによる熱励起反応
で前記原料を微粒子に生成する微粒子製造装置に
おいて、前記管状通路として多孔質部材を用い、
該多孔質部材を透過して通路内に不活性ガスを送
り込むことを特徴とする微粒子製造装置。 2 管状通路に気体状の原料を導くと共にレーザ
源からレーザ光を該管状通路の軸線に沿わせて照
射し、更に該レーザ光をレンズにより前記管状通
路内で集束させて焦点近傍に誘電破壊プラズマを
発生させ、該誘電破壊プラズマによる熱励起反応
で前記原料を微粒子に生成する微粒子製造装置に
おいて、前記管状通路の上流側にエアチヤンバ部
を形成し、該エアチヤンバ部から不活性ガスを通
路内壁面に沿わせて流したことを特徴とする微粒
子製造装置。 3 管状通路に気体状の原料を導くと共にレーザ
源からレーザ光を該管状通路の軸線に沿わせて照
射し、更に該レーザ光をレンズにより前記管状通
路内で集束させて焦点近傍に誘電破壊プラズマを
発生させ、該誘電破壊プラズマによる熱励起反応
で前記原料を微粒子に生成する微粒子製造装置に
おいて、前記管状通路を鉛直方向に延設し、該管
状通路の上部にオイルチヤンバ部を形成し、該オ
イルチヤンバ部からシリコンオイルを通路内壁面
に沿わせて流下させることを特徴とする微粒子製
造装置。[Claims] 1. Guide a gaseous raw material into a tubular passage, irradiate laser light from a laser source along the axis of the tubular passage, and further focus the laser light within the tubular passage with a lens. In a particle manufacturing apparatus that generates dielectric breakdown plasma near a focal point and generates the raw material into fine particles through a thermally excited reaction caused by the dielectric breakdown plasma, using a porous member as the tubular passage,
A particle manufacturing device characterized in that an inert gas is sent into the passageway through the porous member. 2. Guide a gaseous raw material into a tubular passage, irradiate a laser beam from a laser source along the axis of the tubular passage, and further focus the laser beam within the tubular passage with a lens to create dielectric breakdown plasma near the focal point. In the particle manufacturing apparatus, an air chamber is formed on the upstream side of the tubular passage, and an inert gas is supplied from the air chamber to the inner wall surface of the passage. A device for producing fine particles characterized by flowing the particles along the same line. 3 Guide a gaseous raw material into the tubular passage, irradiate laser light from a laser source along the axis of the tubular passage, and further focus the laser light within the tubular passage with a lens to create dielectric breakdown plasma near the focal point. In the fine particle manufacturing apparatus, the raw material is generated into fine particles by a thermally excited reaction caused by the dielectric breakdown plasma, the tubular passage extends in the vertical direction, an oil chamber is formed in the upper part of the tubular passage, and the oil chamber A particulate production device characterized by causing silicone oil to flow down along the inner wall surface of a passage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60041214A JPS61200851A (en) | 1985-03-04 | 1985-03-04 | Method and apparatus for preparing fine particle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60041214A JPS61200851A (en) | 1985-03-04 | 1985-03-04 | Method and apparatus for preparing fine particle |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61200851A JPS61200851A (en) | 1986-09-05 |
| JPH0226538B2 true JPH0226538B2 (en) | 1990-06-11 |
Family
ID=12602150
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60041214A Granted JPS61200851A (en) | 1985-03-04 | 1985-03-04 | Method and apparatus for preparing fine particle |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61200851A (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0759721B2 (en) * | 1987-07-06 | 1995-06-28 | 出光興産株式会社 | Method for producing fine metal particles |
| JPH02194110A (en) * | 1989-01-23 | 1990-07-31 | Rikagaku Kenkyusho | Manufacture of molybdenum fine particles |
| JPH0782915B2 (en) * | 1991-01-28 | 1995-09-06 | 関西電力株式会社 | Plasma channel generator |
| US5955037A (en) | 1996-12-31 | 1999-09-21 | Atmi Ecosys Corporation | Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases |
| US6193936B1 (en) * | 1998-11-09 | 2001-02-27 | Nanogram Corporation | Reactant delivery apparatuses |
| KR102299019B1 (en) * | 2018-07-23 | 2021-09-08 | 주식회사 엘지화학 | Device for synthesis of nanoparticle and synthesizing method for nanoparticle using the same |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4558017A (en) * | 1984-05-14 | 1985-12-10 | Allied Corporation | Light induced production of ultrafine powders comprising metal silicide powder and silicon |
-
1985
- 1985-03-04 JP JP60041214A patent/JPS61200851A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61200851A (en) | 1986-09-05 |
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