JPH0226612A - Method for capturing trace of ion in gas, method for purifying gas, and filter equipment for gas purification - Google Patents
Method for capturing trace of ion in gas, method for purifying gas, and filter equipment for gas purificationInfo
- Publication number
- JPH0226612A JPH0226612A JP63178423A JP17842388A JPH0226612A JP H0226612 A JPH0226612 A JP H0226612A JP 63178423 A JP63178423 A JP 63178423A JP 17842388 A JP17842388 A JP 17842388A JP H0226612 A JPH0226612 A JP H0226612A
- Authority
- JP
- Japan
- Prior art keywords
- exchange resin
- ion
- air
- gas
- ions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 20
- 238000000746 purification Methods 0.000 title claims description 8
- 150000002500 ions Chemical class 0.000 claims abstract description 84
- 239000003456 ion exchange resin Substances 0.000 claims abstract description 41
- 229920003303 ion-exchange polymer Polymers 0.000 claims abstract description 41
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 claims abstract description 40
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 40
- 238000001179 sorption measurement Methods 0.000 claims abstract description 23
- 239000003957 anion exchange resin Substances 0.000 claims abstract description 14
- 239000003729 cation exchange resin Substances 0.000 claims abstract description 11
- 239000000126 substance Substances 0.000 claims abstract description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 21
- 150000001450 anions Chemical class 0.000 abstract description 9
- 150000001768 cations Chemical class 0.000 abstract description 5
- -1 NOx- Chemical class 0.000 abstract description 4
- 229910052799 carbon Inorganic materials 0.000 abstract 2
- 238000010030 laminating Methods 0.000 abstract 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 14
- 239000011347 resin Substances 0.000 description 14
- 229920005989 resin Polymers 0.000 description 14
- 239000004065 semiconductor Substances 0.000 description 10
- 239000007789 gas Substances 0.000 description 9
- 150000001412 amines Chemical class 0.000 description 8
- 238000011109 contamination Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000000443 aerosol Substances 0.000 description 6
- 239000012535 impurity Substances 0.000 description 6
- 229910021529 ammonia Inorganic materials 0.000 description 5
- 150000003863 ammonium salts Chemical class 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 235000012431 wafers Nutrition 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 238000005342 ion exchange Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 235000002639 sodium chloride Nutrition 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 3
- 239000003344 environmental pollutant Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000004255 ion exchange chromatography Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000013618 particulate matter Substances 0.000 description 3
- 231100000719 pollutant Toxicity 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000000057 synthetic resin Substances 0.000 description 3
- 229920003002 synthetic resin Polymers 0.000 description 3
- 238000003915 air pollution Methods 0.000 description 2
- 239000002216 antistatic agent Substances 0.000 description 2
- 229940023913 cation exchange resins Drugs 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000002803 fossil fuel Substances 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000004887 air purification Methods 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 238000005349 anion exchange Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000011045 prefiltration Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical class S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 description 1
- 229910052815 sulfur oxide Inorganic materials 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
- Separation Of Gases By Adsorption (AREA)
- Filtering Materials (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、ガス体、特に空気中の微量イオンを有効に捕
捉除去できるようにしたガス体中の微量イオンの捕捉方
法及びガス体浄化方法及びガス体浄化フィルター装置に
関する。Detailed Description of the Invention (Industrial Field of Application) The present invention provides a method for trapping trace ions in a gas body, and a method for purifying a gas body, which are capable of effectively trapping and removing trace ions in a gas body, particularly air. and a gas body purification filter device.
（従来の技術）
半導体集積回路装置の製造のための基板である半導体ウ
ェーへの表面の清浄化は、特に最近のようにデザインル
ームの縮小、集積度の向上とともに一段とその高度化が
強く要求される。半導体つ工−ハは、その製造工程でそ
の表面が洗浄された後、清浄な空気或いは特殊な場合に
は、特に窒素などの不活性高純度雰囲気中に保存される
が、工程間の移動に際してはどうしても室内の空気に接
触する機会が多い、また半導体集積回路装置の製造工程
では、一般の作業空間と区別して、特別に清浄雰囲気が
用意されているが、例えばクリーンベンチ等がこの目的
のために開発実用化されている。(Prior Art) Surface cleaning of semiconductor wafers, which are substrates for manufacturing semiconductor integrated circuit devices, has become increasingly sophisticated, especially as design rooms have become smaller and the degree of integration has increased. Ru. After the surface of semiconductor chips has been cleaned during the manufacturing process, they are stored in clean air or, in special cases, in an inert, high-purity atmosphere, especially nitrogen. There are many opportunities for contact with indoor air, and in the manufacturing process of semiconductor integrated circuit devices, a specially clean atmosphere is prepared to distinguish it from the general work space. For example, a clean bench is used for this purpose. It has been developed and put into practical use.
かかる、クリーンベンチ内の空気は、米国連邦規格クラ
ス１００を数段も越える超清浄であったり、無人・無塵
化の技術が発達し、かかる技術は、勿論半導体ウェーハ
の清浄工程でも活用がなされている。The air inside the clean bench is extremely clean, exceeding several levels of U.S. Federal Standard Class 100, and unmanned and dust-free technology has been developed, and such technology is of course being utilized in the semiconductor wafer cleaning process. ing.
しかし、これまでの作業雰囲気としての空気の清浄化は
、専ら微粒子汚染の除去又は超高性能フィルターで、粒
子特性によって捕獲されるもので、空気中のイオンには
注目されていない。However, until now, the purification of air as a working atmosphere has focused solely on the removal of particulate contamination or ultra-high performance filters, which are captured based on particle characteristics, and have not paid attention to ions in the air.
空気汚染の浮遊粒子状物質（エアロゾル）は、その発生
源としては、海塩粒子や土砂の巻き上げなどからできる
風塵、森林火災による煙、火山灰のような自然発生のも
のが多いが、しかし現在地域大気汚染を起こしている浮
遊粒子状物質は、燃料や廃棄物の燃焼、生産過程からの
漏洩、及び自動車排気中の粒子状物質に由来するものが
多い。Suspended particulate matter (aerosols) that cause air pollution are often generated from naturally occurring sources such as wind dust from sea salt particles and mud thrown up, smoke from forest fires, and volcanic ash. Suspended particulate matter that causes air pollution is often derived from fuel and waste combustion, leakage from manufacturing processes, and particulate matter in vehicle exhaust.
ガス状汚染物質としては、化石燃料である石炭や石油中
に含まれる硫黄が燃焼によってＳ ＯｚやＳ Ｏ３とな
って大気中に放出されたり、同じ化石燃料の高温燃焼、
例えば発電所、ボイラーその他加熱炉、自動車の排気ガ
スが発生源となるＮｏＸなどがある。Gaseous pollutants include sulfur contained in fossil fuels such as coal and petroleum, which is released into the atmosphere as SOz and SO3 through combustion, and high-temperature combustion of the same fossil fuels.
For example, NoX is generated from power plants, boilers and other heating furnaces, and exhaust gas from automobiles.
これら硫黄酸化物や、窒素酸化物は、空気中の水分によ
りイオン化してＳｏ、Ｚ−，５ｏ４ｚ−、又はＮＯ□−
１ＮＯ１−となる、ガス状汚染物質としてはこの他にＣ
Ｏやアンモニア、アミン類や各種低級を機化合物がある
。These sulfur oxides and nitrogen oxides are ionized by moisture in the air and become So, Z-, 5o4z-, or NO□-
In addition to this, C is a gaseous pollutant that becomes 1NO1-.
There are organic compounds containing O, ammonia, amines, and various lower compounds.
この他の空気中の浮遊不純物としては、バクテリヤ、イ
オン物質として、Ｃ１−等の陰イオン及びＮａ”、Ｋ”
等の陽イオン等が考えられる。Other airborne impurities include bacteria, ionic substances such as anions such as C1-, and Na'', K''
Possible cations such as
以上の空気中の不純物は、例えば微量であっても除去さ
れずに、半導体ウェーへの製造工程の、特に最終洗浄工
程でその作業雰囲気に含まれている場合、半導体ウェー
ハの洗浄直後の表面が著しく高清浄のため付着して、こ
れを汚染する。汚染源の種類によっては、その汚染の状
態が種々に変化し、これに伴いその後半導体集積回路製
造工程の不良原因に変化をもたせる。If the above impurities in the air are not removed, even in trace amounts, and are included in the working atmosphere during the semiconductor wafer manufacturing process, especially during the final cleaning process, the surface of the semiconductor wafer immediately after cleaning may be affected. Because it is extremely clean, it adheres and contaminates it. Depending on the type of contamination source, the state of contamination changes in various ways, and the cause of defects in the semiconductor integrated circuit manufacturing process changes accordingly.
従って、かかる不純物は極限迄除去されるべきであり、
最近の種々の経験や半導体集積回路製造工程からの要求
から考察すると、これまで注目していなかったイオン性
の不純物の除去が、特にその微量レベル゛においてすら
問題になることがわかった。勿論かかるイオン性の不純
物を含む雰囲気は半導体集積回路装置の後工程において
も、メタル容器又は樹脂で気密封止する以前においては
好ましくない。Therefore, such impurities should be removed to the utmost,
Considering various recent experiences and requirements from the semiconductor integrated circuit manufacturing process, it has been found that the removal of ionic impurities, which has not received attention so far, becomes a problem even at a trace level. Of course, an atmosphere containing such ionic impurities is not preferable even in the post-processing of the semiconductor integrated circuit device, before it is hermetically sealed with a metal container or resin.
一方、空気中の不純物を除くために活性炭系のフィルタ
ーが従来から知られている。このフィルターの効果は有
機物に対しては顕著であるが、イオンについてはあまり
効果的ではない、さらに、空気の浄化処理方法としては
、活性炭フィルターの他に、スクラバ一方式による方法
が一般的であるが、設備が大掛かりとなり又維持管理が
大変で小設備には向かない。On the other hand, activated carbon filters have been known for removing impurities from the air. Although this filter is very effective against organic substances, it is not very effective against ions.Furthermore, in addition to activated carbon filters, the most common method of air purification is to use a scrubber. However, the equipment is large-scale and maintenance is difficult, so it is not suitable for small equipment.
（発明が解決しようとする課題）
本発明は、比較的軽量で設備上の制約がなく、システム
的に安価にでき、かつガス体中の微量イオンを効果的に
捕捉除去することを可能とした微量イオンの捕捉方法を
提供するとともにガス体の浄化方法及びフィルター装置
を提供することを目的とするものである。(Problems to be Solved by the Invention) The present invention is relatively lightweight, has no restrictions on equipment, is systemically inexpensive, and is capable of effectively trapping and removing trace ions in a gas body. It is an object of the present invention to provide a method for capturing trace ions, as well as a method for purifying a gas body and a filter device.
（課題を解決するための手段）
上記目的を達成するために、本発明においては、イオン
交換体からなるイオン吸着層を設け、該イオン吸着層に
空気を通過せしめ、該空気中に含まれる微量イオンを捕
捉するようにしたものである。(Means for Solving the Problems) In order to achieve the above object, in the present invention, an ion adsorption layer made of an ion exchanger is provided, air is allowed to pass through the ion adsorption layer, and trace amounts contained in the air are It is designed to capture ions.
本発明によって捕（足されるイオンは、空気中の水分に
溶解する電解質として存在し、エアロゾルとして、空気
中に浮遊搬送される。かかるエアロゾルは、サブミクロ
ンから大きいものは１０μｍにも達するが、本発明にお
いては、イオン交換樹脂の表面に衝突したり、或いは拡
散により到達する。次いで、樹脂表面の吸着水分と相互
溶解し、イオンは樹脂表面の活性基によって交換固定さ
れる。以後は、イオン交換樹脂は離脱することはない。The ions captured by the present invention exist as electrolytes dissolved in water in the air, and are carried suspended in the air as aerosols.Such aerosols range from submicrons to as large as 10 μm; In the present invention, the ions reach the surface of the ion exchange resin by collision or diffusion.Then, they mutually dissolve with the water adsorbed on the resin surface, and the ions are exchanged and fixed by the active groups on the resin surface. The exchange resin will not come off.
このようにして本発明によれば、イオン物質を含む空気
をイオン交換体からなるイオン吸着層を通過せしめれば
、イオン物質が除去され、空気の清浄が可能となる。In this manner, according to the present invention, by passing air containing ionic substances through an ion adsorption layer made of an ion exchanger, the ionic substances are removed and the air can be purified.
イオン交換体からなるイオン吸着層と、活性炭層とを設
け、該イオン吸着層及び活性炭層に空気を通過せしめ、
該空気中に含まれるイオン及び有機物等を捕捉除去する
ことによって空気の浄化を行うこともできる。An ion adsorption layer made of an ion exchanger and an activated carbon layer are provided, and air is allowed to pass through the ion adsorption layer and the activated carbon layer,
Air can also be purified by capturing and removing ions, organic substances, etc. contained in the air.
イオン交換体からなるイオン吸着層と、活性炭層とを設
けてカートリッジ状とした空気浄化フィルター装置とす
ることもできる。It is also possible to provide an air purifying filter device in the form of a cartridge by providing an ion adsorption layer made of an ion exchanger and an activated carbon layer.
イオン交換樹脂としては、陰イオン交換樹脂及び陽イオ
ン交換樹脂をそれぞれ単独に用いてもよいし、両者を併
用してもよいし、また両者を混合して用いることもでき
る。As the ion exchange resin, an anion exchange resin and a cation exchange resin may be used alone, in combination, or in combination.
また、最近メモリーのキャパシターの酸化膜が薄くなる
に従い、その耐圧特性（信頼性）にＣｕ、Ｎｉ、Ｎａな
どの金属（イオン）が悪影響を及ぼす点が指摘されてい
る。これらの金属又はイオンは、金属単体、酸化物や塩
の形を一般にとると考えられ、その除去の為には、ＨＥ
ＰＡフィルター（高性能フィルター）で可能と考えられ
てきた。しかし、ＨＥＰＡフィルターから吹き出される
空気を捕集し、その中に含まれるイオンを調べると、Ｚ
ｎ”、Ｆｅ”、Ｎｉ”、Ｎａ” 、アンモニア及びＳｏ
Ｘ、Ｎｏ、、Ｃｆｆ−等のアニオンが認められる。これ
らの汚染物の発生原因を全て特定することは難しい。し
かし、例えばアニオンについては、外気のレベルとＨＥ
ＰＡフィルター吹き出し部のレベルが連動して変化する
ことから、外気の汚れが持ち込まれていると考えられる
。また、Ｎａ塩については、空気の相対湿度があがると
、−旦捕捉されていた塩がＨＥＰＡフィルターを抜は出
るともいわれており、イオン性の汚れについてＨＥＰＡ
フィルターは、必ずしも充分とはいえない。この抜は出
たイオンは、その環境下に放置されているウェーハを経
時的に汚染する。汚染は、電気的中性条件をみたす形で
進むと考えられることから、種々のイオンの汚染が進む
と考えられる。例えば、Ｃ２°イオンについて見ると、
ＨＥＰＡフィルターの吹き出し空気下に６時間放置する
と約７ｘｌＯ”分子／ｃｆｆｌ、２４時間放置で約１ｘ
ｌＯ１３分子／ ｃｔＡの増加が認められた場合がある
。これに対応して、アンモニアやＮａ”の増加も認めら
れる′。Furthermore, as the oxide film of memory capacitors has recently become thinner, it has been pointed out that metals (ions) such as Cu, Ni, and Na have an adverse effect on the withstand voltage characteristics (reliability). These metals or ions are generally considered to be in the form of simple metals, oxides, or salts, and in order to remove them, HE
It has been thought that this is possible with a PA filter (high performance filter). However, when the air blown out from a HEPA filter is collected and the ions contained therein are examined, Z
n”, Fe”, Ni”, Na”, ammonia and So
Anions such as X, No, and Cff- are recognized. It is difficult to identify all the causes of these pollutants. However, for example, for anions, the outside air level and HE
Since the level at the PA filter outlet changes in conjunction, it is thought that dirt from the outside air is being brought in. Regarding Na salts, it is said that when the relative humidity of the air increases, the previously captured salts will escape from the HEPA filter, and HEPA
Filters are not always sufficient. These extracted ions contaminate wafers left in that environment over time. Since contamination is thought to proceed in a manner that satisfies the electrically neutral condition, contamination of various ions is thought to proceed. For example, looking at the C2° ion,
If left under the blown air of a HEPA filter for 6 hours, it will be about 7xlO” molecules/cffl, and if left for 24 hours, it will be about 1x
In some cases, an increase in lO13 molecules/ctA was observed. Correspondingly, an increase in ammonia and Na'' is also observed.
従って、ＨＥＰＡフィルターによる微粒子除去機構の他
にイオン性汚染物質をクリーンルームシステムから除去
する機能を持つシステムを追加する必要があり、本発明
の意義はここに存在するものである。Therefore, in addition to the particulate removal mechanism using the HEPA filter, it is necessary to add a system having a function of removing ionic contaminants from the clean room system, and this is where the significance of the present invention lies.
本発明者がイオン交換樹脂による吸着フィルターの知見
に基づき本発明に到達したのは次の経緯による。即ち、
市販のカートリッジを調査しても、希望する２効果がな
かったり、或いはあっても二次汚染の可能性や、現有設
備面での負荷（重量等）などが懸念された。しかし、ア
ニオンの存在形態を考えると、エアロゾルの可能性が高
く、この中に含まれる水分を有効に使えば、装置上の開
発の幅が広がると推定された。一方、イオン交換樹脂の
ように、内部に極性基をもつ合成樹脂は親水性が高く、
樹脂表面のイオン交換能は必ずしも水雰囲気下でなくと
も有効に働くと考えられた。以上の観点から、イオン交
換樹脂の効果を調べたところ、その有効性が確認された
ものである。The present inventor arrived at the present invention based on knowledge of adsorption filters using ion exchange resins due to the following circumstances. That is,
Even when commercially available cartridges were investigated, they either did not have the two desired effects, or even if they did, there were concerns about the possibility of secondary contamination and the burden (weight, etc.) on existing equipment. However, considering the form in which anions exist, there is a high possibility that they are aerosols, and it was assumed that if the water contained therein could be used effectively, the range of device development would be expanded. On the other hand, synthetic resins with internal polar groups, such as ion exchange resins, are highly hydrophilic.
It was thought that the ion exchange ability of the resin surface works effectively even if it is not necessarily in a water atmosphere. From the above viewpoints, the effectiveness of ion exchange resins was confirmed.
（作用）
本発明において使用されるイオン交換体として、ＮＯｘ
−、Ｓ ＯＸ ”−、Ｃｌ−等の陰イオンを捕捉する
目的では陰イオン交換樹脂を使用するし、Ｎａ”、に’
等の陽イオンを捕捉する目的では陽イオン交換樹脂を用
いる。(Function) As the ion exchanger used in the present invention, NOx
Anion exchange resins are used to capture anions such as -, SOX ``-, Cl-, and Na'', Cl-, etc.
Cation exchange resins are used to capture cations such as cations.
各種イオンの捕捉は、イオンの存在形態がエアロゾルと
なっている場合があり、乾燥状態のイオン交換体でも捕
捉できるものである。イオン交換体の表面がイオンの捕
捉を効率よく行う為に湿った状態又は水膜状態にあれば
、後述する実施例において述べるごとく、より好ましい
ものである。When capturing various ions, the ions may exist in the form of an aerosol, and can be captured even with an ion exchanger in a dry state. It is more preferable that the surface of the ion exchanger be in a moist state or a water film state in order to efficiently trap ions, as described in the examples below.
イオン交換体の水分含有率はイオン交換樹脂の重量の３
５〜１００重量％程度が好ましい。水分含有率が３５重
量％未満ではイオン交換樹脂は乾燥状態でありイオンの
捕捉率が低下するし、水分含有率が１００重量％を超え
ると空気の流通が妨げられイオンの捕捉率が低下する。The water content of the ion exchanger is 3 times the weight of the ion exchange resin.
It is preferably about 5 to 100% by weight. When the water content is less than 35% by weight, the ion exchange resin is in a dry state and the ion capture rate is reduced, and when the water content exceeds 100% by weight, air circulation is obstructed and the ion capture rate is reduced.
この理由は、イオン交換樹脂は一般に多孔質であり、こ
の表面にはミクロ及びマクロの細孔が無数にあるが、こ
れらの細孔は更゛に内部で細いトンネルとして網目状に
複雑に連絡が行われ、イオンのエアロゾルを含む空気は
イオン交換樹脂の粒子相互の大きな間隙を通過する間に
、上記の表面へ拡散し、イオン交換を完了する。従って
、水分含有量は、イオン交換反応のためのイオン交換樹
脂表面の電解質溶液雰囲気としである程度は必要である
が、多すぎると上記の細孔を完全に密閉するごとになる
ので、好ましくない。The reason for this is that ion exchange resins are generally porous and have countless micro and macro pores on their surface, but these pores are even more intricately connected inside as thin tunnels. The air containing the ion aerosol diffuses to the surface while passing through the large gaps between the particles of the ion exchange resin, completing the ion exchange. Therefore, although a certain amount of water content is necessary to create an electrolyte solution atmosphere on the surface of the ion exchange resin for the ion exchange reaction, too much water content is not preferable because the above-mentioned pores will be completely sealed.
また、イオンを効果的にかつ長期間にわたり捕捉してお
くためには、使用するイオン交換体の捕捉能が大きいこ
とが必要であることは勿論である使用するイオン交換体
から汚染物質が発生することが好ましくないのはいうま
でもないが、ＯＨ型のアンモニウム塩形のイオン交換樹
脂は、室温で分解してアミンを生成し、処理した空気に
このアミンが混入するため、このアミンを除去するた、
めの活性炭層を設けることが必要となる。しかし、この
種のイオン交換樹脂でも活性炭層を常に併設するような
構成とすれば使用可能である。In addition, in order to trap ions effectively and for a long period of time, it goes without saying that the ion exchanger used must have a high trapping capacity.Contaminants are generated from the ion exchanger used. Needless to say, this is undesirable, but ion exchange resins in the form of ammonium salts of the OH type decompose at room temperature to produce amines, and this amine is mixed into the treated air, so this amine must be removed. Ta,
It is necessary to provide a second activated carbon layer. However, this type of ion exchange resin can also be used if it is constructed so that an activated carbon layer is always provided.
一方、下記式（：）で示される非アンモニウム塩形のイ
オン交換樹脂は、化学的に安定であり、分解によるアミ
ンの発生は少なく後処理が容易であるという利点がある
。On the other hand, a non-ammonium salt type ion exchange resin represented by the following formula (:) has the advantage that it is chemically stable, generates less amine due to decomposition, and is easy to post-process.
式（ｉ）
上記した弐（ｉ）のイオン交換樹脂は市販されている（
商品名ダイヤイオンＷＡ２０．三菱化成工業■製）が、
水分含有率は約３９〜４５重量％である。この種の樹脂
の水分含有率を高めたり、水分含有率の変化を少なくす
る上で、弐（ｉ）の構造にエチレンオキサイドを付加さ
せた構造も有効である。Formula (i) The above ion exchange resin (i) is commercially available (
Product name: Diamond Aeon WA20. Made by Mitsubishi Chemical Corporation),
The moisture content is about 39-45% by weight. A structure in which ethylene oxide is added to the structure of 2(i) is also effective in increasing the moisture content of this type of resin and reducing changes in the moisture content.
また、イオン交換樹脂を帯電防止剤又は中性洗剤で表面
処理を行っておけば、吸湿性が増大して水分の維持に有
効である。二次汚染すなわちこれら帯電防止剤又は中性
洗剤が再びイオン交換樹脂表面より離脱飛散することを
避けるために、イオン交換樹脂と化学結合を行わせるな
どの工夫が好ましい。Furthermore, if the surface of the ion exchange resin is treated with an antistatic agent or a neutral detergent, its hygroscopicity will increase and it will be effective in maintaining moisture. In order to avoid secondary contamination, that is, the antistatic agent or neutral detergent coming off and scattering from the ion exchange resin surface again, it is preferable to make a chemical bond with the ion exchange resin.
さらに、イオン交換樹脂は再生して再使用されることは
勿論であるが、弱塩基性陰イオン交換樹脂はＮＨａＯＨ
で再生される。よく純水で洗った後のイオン交換樹脂の
乾燥は、イオンを含まない熱空気（又は窒素等）で行う
。Furthermore, although ion exchange resins can of course be regenerated and reused, weakly basic anion exchange resins are
is played. After thoroughly washing with pure water, the ion exchange resin is dried using hot air (or nitrogen, etc.) that does not contain ions.
以上の説明は、アニオンの捕捉についてのものであるが
、本発明によればカチオンの捕捉も行うことができる。Although the above description concerns the capture of anions, the present invention can also capture cations.
すなわち１、空気中に含まれるイオンとしてのＮａ’
（ＮａＣｆ等）などのアルカリ金属類や他のイオン類
及びアンモニアやアミン類は陽イオン交換樹脂で効率よ
く捕捉除去される。In other words, 1. Na' as ions contained in the air
Alkali metals such as (NaCf etc.), other ions, ammonia and amines are efficiently captured and removed by the cation exchange resin.
陽イオン交換樹脂としては、一般に市販されている強酸
形、弱酸形及び一部のキレート形樹脂がある。これらの
樹脂についても親水化処理を行うことは、イオンの捕捉
効率を上げる上で好ましい。Cation exchange resins include generally commercially available strong acid type, weak acid type, and some chelate type resins. It is preferable to subject these resins to hydrophilic treatment in order to increase the ion trapping efficiency.
陽イオン交換樹脂と陰イオン交換樹脂とは、別々のカー
トリッジとし、それらを積み重ねたり、或いは樹脂をブ
レンドしてカートリッジとし、それを使用してもいずれ
も捕捉効果が認められる。Even if the cation exchange resin and the anion exchange resin are used as separate cartridges and stacked on top of each other, or the resins are blended to form a cartridge, the trapping effect can be observed in either case.
本発明による微量イオンの捕捉効果は、アンモニアガス
の精製についても有効であり、強酸形樹脂のアンモニウ
ム塩タイプの樹脂とメタルイオンとは、
Ｒ３Ｏ３ＮＨ４＋Ｍ” →Ｒ３Ｏｓ Ｍ＋ＮＨ４と交換
反応を起こし、またアニオン交換形樹脂と共存乃至カー
トリッジとして積層しておくと、アニオンも捕捉され、
最終的にアンモニアガスが精製される。従って、本発明
によれば、空気の他にアンモニアガス等のガス体も浄化
の対象となるものである。The effect of trapping trace ions according to the present invention is also effective in purifying ammonia gas, and the ammonium salt type resin of the strong acid type resin and metal ions cause an exchange reaction with R3O3NH4+M'' → R3Os M+NH4, and anion exchange When coexisting with resin or stacked as a cartridge, anions are also captured.
Finally, ammonia gas is purified. Therefore, according to the present invention, in addition to air, gases such as ammonia gas can also be purified.
（実施例） 以下に本発明の実施例を挙げて説明する。(Example) Examples of the present invention will be described below.
実施例１〜２及び比較例１
第１表に示すごとき３種の含水率（約５％、４５％及び
９゛３％）を有する弱塩基性イオン交換樹脂（商品名ダ
イヤイオンＷＡ−２０、三菱化成工業■製）を調製した
。含水率の数値は、イオン交換樹脂をオーブン中で１０
０°Ｃで３０分間加熱したときのｆＩｉｌを、加熱処理
した後の樹脂重量で割って算出した。第１図に示すごと
き多数のセルＣ（Ｉｃｍｘｌｃｍ）を有するＳＵＳ又は
ＰＶＣ製の枠体Ｗ （６５ｃｍｘ ６５ｃｍｘ ３ｃｍ
（高さ）〕の下面に約１３０メツシユのステンレス製
又は合成樹脂製の網Ｍｌを接合して上記した各弱塩基製
イオン交換樹脂を充填し、ついで該枠体Ｗの上面に約１
３０メツシユのステンレス製又は合成樹脂製の網Ｍ２を
接合してイオン交換体のカートリッジＹを作成した。こ
のカートリッジＹをブロワ−の吸い込み口側に設置し、
これに空気を６．６ｃｍ／ｓｅｃの流速（平均値）で通
過させた。このときの空気とイオン交換樹脂との接触時
間は４．５秒であったこれらのイオン交換樹脂によって
処理された空気中の各種のイオンの残存量をイオンクロ
マトグラフィー法によって分析測定した値を第１表に示
した。Examples 1 to 2 and Comparative Example 1 Weakly basic ion exchange resins (trade name: Diaion WA-20, (manufactured by Mitsubishi Chemical Industries, Ltd.) was prepared. The moisture content value is determined by heating the ion exchange resin in an oven at 10%.
It was calculated by dividing fIil when heated at 0°C for 30 minutes by the weight of the resin after heat treatment. A frame W made of SUS or PVC (65cm x 65cm x 3cm) has a large number of cells C (Icmxlcm) as shown in Figure 1.
(Height)] Approximately 130 meshes of stainless steel or synthetic resin mesh Ml are joined to the lower surface of the frame W, and the above-mentioned weak base ion exchange resins are filled, and then approximately 1.
An ion exchanger cartridge Y was prepared by joining 30 meshes of stainless steel or synthetic resin mesh M2. Install this cartridge Y on the suction port side of the blower,
Air was passed through this at a flow rate (average value) of 6.6 cm/sec. The contact time between the air and the ion exchange resin at this time was 4.5 seconds.The remaining amounts of various ions in the air treated with these ion exchange resins were analyzed and measured using ion chromatography. It is shown in Table 1.
第１表の結果から、同一のイオン交換樹脂であってもイ
オン交換樹脂の含水率が上がるとイオンの捕捉率が増加
することが分かった。From the results in Table 1, it was found that even if the ion exchange resin is the same, the ion capture rate increases as the water content of the ion exchange resin increases.
（以下余白）
第１表
第１表において、＊１）ピークの分離ができず数値の表
示が不可能である。 ＊２） ｓ０３”−につぃては
、相対比で示してあり、未処理空気を１０とした、ＮＤ
は検出下限値以下を意味する。各陰イオンの濃度はμｇ
／Ｍ空気で示されている。(Margins below) Table 1 In Table 1, *1) Peaks cannot be separated and numerical values cannot be displayed. *2) s03”- is shown as a relative ratio, with untreated air set as 10, ND
means below the lower limit of detection. The concentration of each anion is μg
/M Indicated by air.
分析は、インビンジャーによる空気の採取とイオンクロ
マトグラフィー分析法によって行い、また未処理の空気
は取り入れ口側で同様にサンプリングと分析を行った。Analysis was performed by sampling air using an inbinger and using ion chromatography analysis, and untreated air was similarly sampled and analyzed at the intake port.
実施例３
陰イオン交換樹脂（商品名ダイヤイオンＷＡ−２０、三
菱化成工業■製）に強酸形陽イオン交換樹脂（Ｄｉａｉ
ｏｎ ＰＫ２２０のＨ形、三菱化成工業■製）を容量
比で２５％ブレンドして作成した厚さ３ｃｍのカートリ
ッジ（線速等の空気の処理条件は実施例１と同一）につ
いて、空気中に含まれるアンモニアの捕捉率をイオンク
ロマトグラフィー分析法で調べた。この結果、吸引側の
レベルを１００とすると、カートリッジの通過側で５．
２のレベルであり、捕捉率はこの条件で約９５％であっ
た。Example 3 A strong acid form cation exchange resin (Diai
On PK220 H type (manufactured by Mitsubishi Chemical Industries, Ltd.) was blended at a volume ratio of 25% for a 3 cm thick cartridge (air processing conditions such as linear velocity were the same as in Example 1). The capture rate of ammonia was investigated using ion chromatography analysis. As a result, if the level on the suction side is 100, the level on the cartridge passage side is 5.
2 level, and the capture rate was about 95% under these conditions.
次に、イオン交換樹脂を使ったフィルター装置の具体例
を図面に基づいて説明する。Next, a specific example of a filter device using an ion exchange resin will be explained based on the drawings.
イオン交換樹脂を充填するカートリッジＹの構造として
は、前述した第１図に示した如く、多数のセルＣを枠体
Ｗに形成してもよいし、また第２図に示すごとく、セル
を形成することなく単なる枠体Ｗの上下“に網Ｍｌ及び
綱Ｍ２を設置するように構成することもできる。As for the structure of the cartridge Y filled with ion exchange resin, a large number of cells C may be formed in the frame W as shown in FIG. It is also possible to simply install the net Ml and the rope M2 above and below the frame W without having to do so.
第３図において、２はカートリッジ状としたフィルター
装置で、イオン交換樹脂を充填したイオン交換体のカー
トリッジＹを複数個積層してなるイオン吸着層４と該イ
オン吸着層４に隣接して設けられた活性炭層６とから構
成されている。このフィルター装置２を空気の流入路に
単に挿着しておけば、空気中に含まれる微量のイオンが
イオン吸着層４によって捕捉除去され、かつ有機物等が
活性炭層６によって除去され、極めて清浄な空気を得る
ことができるものである。In FIG. 3, reference numeral 2 denotes a cartridge-shaped filter device, which is provided adjacent to an ion adsorption layer 4 formed by stacking a plurality of ion exchanger cartridges Y filled with ion exchange resin. The activated carbon layer 6 is made up of an activated carbon layer 6. If this filter device 2 is simply inserted into the air inflow path, trace amounts of ions contained in the air will be captured and removed by the ion adsorption layer 4, and organic matter etc. will be removed by the activated carbon layer 6, resulting in extremely clean air. It is something that allows you to get some air.
第３図のフィルター装置２のカートリッジＹに充填され
るイオン交換樹脂としては、特別の限定はない、前記し
た非アンモニウム塩形のイオン交換樹脂を用いるのが好
ましいが、アンモニウム塩形のイオン交換樹脂を用いて
も分解生成するアミンは活性炭層６や一所望によりカー
トリッジＹに組み込まれる陽イオン交換樹脂に吸着され
るので空気中に混入することはなく弊害はない。The ion exchange resin to be filled into the cartridge Y of the filter device 2 in FIG. 3 is not particularly limited, and it is preferable to use the above-mentioned non-ammonium salt type ion exchange resin, but ammonium salt type ion exchange resin Even if amines are used, the decomposed amines are adsorbed by the activated carbon layer 6 and, if desired, by the cation exchange resin incorporated into the cartridge Y, so that they do not enter the air and cause no harm.
第４図は第３図のフィルター装置、２の性能をさらに向
上させたフィルター装置８を示すものである。１０は空
気取り入れ通路１２に設けられた水供給装置で、該イオ
ン吸着層４の含水量を自在に調節する作用を果たす。該
水供給装置１０は設置状況、使用方法等を考慮して必要
に応じて設置され、図示したようにスチームを噴出する
ようにしてもよいし、また水を噴霧するようにしてもよ
く、その他水分を供給するためのいずれの公知の手段を
用いることもできる。イオン吸着層４及び活性炭層６は
本フィルター装置の主要部を構成するものであり、空気
取り入れ通路１２を通過してきた空気が取り入れ側誘導
ダク）１４によって誘導通過せしめられる。１６はイオ
ン吸着層４の上方に設置されたプレフィルタ−である、
該活性炭層６を通過した空気はυト出側誘導ダクト１８
にょうて排出口２０に誘導される。２２は８亥排出口２
゜に必要に応じて設けられるＨＥＰＡフィルターであり
、イオン吸着層４及び活性炭層６によって除去されない
成分をさらに除去する作用を行うものである。FIG. 4 shows a filter device 8 in which the performance of the filter device 2 shown in FIG. 3 is further improved. Reference numeral 10 denotes a water supply device provided in the air intake passage 12, which functions to freely adjust the water content of the ion adsorption layer 4. The water supply device 10 may be installed as necessary in consideration of the installation situation, usage method, etc., and may be configured to eject steam as shown in the figure, or may be configured to spray water, or may be configured to spray water as shown in the figure. Any known means for providing moisture can be used. The ion adsorption layer 4 and the activated carbon layer 6 constitute the main parts of this filter device, and the air passing through the air intake passage 12 is guided through the intake-side induction duct 14. 16 is a pre-filter installed above the ion adsorption layer 4;
The air that has passed through the activated carbon layer 6 is transferred to the outlet side induction duct 18.
The liquid is guided to the water discharge port 20. 22 is 8 discharge port 2
This is a HEPA filter that is installed as needed in the ion adsorption layer 4 and the activated carbon layer 6, and has the function of further removing components that are not removed by the ion adsorption layer 4 and the activated carbon layer 6.
イオン交換樹脂（ダイヤイオンＷＡ−２０）のイオン交
換能は、２． ５ｍｅｑ／ｍｊ！ （即ち、０． １２
４ｇ／ｍｊりであり、１０ｕｇｌｒｄの濃度の空気１０
０ｒｒｆに対して８．０６ｘｌＯ弓ｍ２のイオン交換樹
脂があればよい、空気流量１００ ｒｒｆ／ｍｌｎで１
年間もたせるには、捕捉の安全率を２としても、必要な
イオン交換樹脂量ｒは、
ｆ−１００ｘ３６５ｘ２４ｘ６０ｘｌＯｘｔＯ−’十〇
、１２４ｘ２−８．４１１１’＝８．５１従って、イオ
ン交換樹脂は交換容量的には１０ｆあれば、１年間の運
転が可能であり、コスト的にもそれほど負担の増大する
ものではない。The ion exchange ability of the ion exchange resin (Diaion WA-20) is 2. 5meq/mj! (i.e. 0.12
4g/mj and a concentration of 10uglrd air 10
8.06xlO bow m2 of ion exchange resin is sufficient for 0rrf, 1 at air flow rate of 100 rrf/mln
In order to last for a year, even if the capture safety factor is 2, the required amount r of ion exchange resin is: With 10 f, it is possible to operate for one year, and the cost does not increase too much.
また、再生システムを組み込むことにより、樹脂の再利
用が可能となり、省資源、省コストの対応が可能となる
。Furthermore, by incorporating a recycling system, the resin can be reused, making it possible to save resources and save costs.
（発明の効果）
以上のように、本発明によれば、空気中に微量台まれる
各種のイオンを効果的、簡便かつ低コストで捕捉除去す
るこζができるという効果を奏するものである。(Effects of the Invention) As described above, according to the present invention, it is possible to effectively, simply, and at low cost capture and remove various ions that are present in small amounts in the air.
第１図は本発明のイオン交換樹脂を充填するカートリッ
ジの一例を示す分解斜視図、第２図は本発明のイオン交
換樹脂を充填するカートリッジの他の例を示す分解斜視
図、第３図は本発明のフィルター装置の一実施例を示す
説明図及び第４図は本発明のフィルター装置の他の実施
例を示す説明図である。
２．８−ガス体浄化フィルター装置、４・・・イオン吸
着層、６・・・活性炭層、２２・・−ＨＥＰＡフィルタ
ー、Ｙ・−・カートリッジ。
第１図FIG. 1 is an exploded perspective view showing an example of a cartridge filled with the ion exchange resin of the present invention, FIG. 2 is an exploded perspective view showing another example of the cartridge filled with the ion exchange resin of the present invention, and FIG. An explanatory diagram showing one embodiment of the filter device of the present invention, and FIG. 4 is an explanatory diagram showing another embodiment of the filter device of the present invention. 2.8-Gas body purification filter device, 4... Ion adsorption layer, 6... Activated carbon layer, 22...-HEPA filter, Y... Cartridge. Figure 1
Claims (12)
オン吸着層にガス体を接触及び／又は通過せしめ、該空
気中に含まれる微量イオンを捕捉するようにしたことを
特徴とするガス体中の微量イオンの捕捉方法。(1) A gas body characterized in that an ion adsorption layer made of an ion exchanger is provided, a gas body is brought into contact with and/or passed through the ion adsorption layer, and trace amounts of ions contained in the air are captured. How to capture trace ions inside.
有するイオン交換樹脂であることを特徴とする請求項（
１）記載のガス体中の微量イオンの捕捉方法。(2) Claim characterized in that the ion exchanger is an ion exchange resin containing 35 to 100% by weight of water (
1) The method for capturing trace ions in a gaseous body as described above.
イオン交換樹脂であることを特徴とする請求項（１）又
は（２）記載の方法。(3) The method according to claim (1) or (2), wherein the ion exchanger is an anion exchange resin and/or a cation exchange resin.
であることを特徴とする請求項（３）記載の方法。(4) The method according to claim (3), wherein the anion exchange resin is a weakly basic anion exchange resin.
とを設け、該イオン吸着層及び活性炭層に空気を通過せ
しめ、該ガス体中に含まれるイオン及び有機物等を同時
に捕捉除去するようにしたことを特徴とするガス体浄化
方法。(5) An ion adsorption layer made of an ion exchanger and an activated carbon layer are provided, and air is allowed to pass through the ion adsorption layer and the activated carbon layer to simultaneously capture and remove ions and organic substances contained in the gas body. A gas body purification method characterized by:
有するイオン交換樹脂であることを特徴とする請求項（
５）記載のガス体浄化方法。(6) Claim characterized in that the ion exchanger is an ion exchange resin containing 35 to 100% by weight of water.
5) The gas body purification method described above.
イオン交換樹脂であることを特徴とする請求項（５）又
は（６）記載の方法。(7) The method according to claim (5) or (6), wherein the ion exchanger is an anion exchange resin and/or a cation exchange resin.
であることを特徴とする請求項（７）記載の方法。(8) The method according to claim (7), wherein the anion exchange resin is a weakly basic anion exchange resin.
とを設けてなるガス体浄化フィルター装置。(9) A gas purification filter device comprising an ion adsorption layer made of an ion exchanger and an activated carbon layer.
含有するイオン交換樹脂であることを特徴とする請求項
（９）記載のガス体浄化フィルター装置。(10) The gas purification filter device according to claim (9), wherein the ion exchanger is an ion exchange resin containing 35 to 100% by weight of water.
陽イオン交換樹脂で、あることを特徴とする請求項（９
）又は（１０）記載の方法。(11) Claim (9) characterized in that the ion exchanger is an anion exchange resin and/or a cation exchange resin.
) or the method described in (10).
樹脂であることを特徴とする請求項（１１）記載の方法
。The method according to claim (11), wherein the anion exchange resin in (12) is a weakly basic anion exchange resin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63178423A JPH0226612A (en) | 1988-07-18 | 1988-07-18 | Method for capturing trace of ion in gas, method for purifying gas, and filter equipment for gas purification |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63178423A JPH0226612A (en) | 1988-07-18 | 1988-07-18 | Method for capturing trace of ion in gas, method for purifying gas, and filter equipment for gas purification |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0226612A true JPH0226612A (en) | 1990-01-29 |
Family
ID=16048242
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63178423A Pending JPH0226612A (en) | 1988-07-18 | 1988-07-18 | Method for capturing trace of ion in gas, method for purifying gas, and filter equipment for gas purification |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0226612A (en) |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05123533A (en) * | 1991-11-05 | 1993-05-21 | Matsushita Seiko Co Ltd | Nitrogen oxide removing filter, and device and system thereof |
| JPH06296824A (en) * | 1993-02-17 | 1994-10-25 | Matsushita Seiko Co Ltd | Nox removing agent, regeneration thereof and nox removing device |
| WO2001070391A1 (en) * | 2000-03-21 | 2001-09-27 | Mhb Filtration Gmbh + Co. Kg | Adsorbent filter material |
| EP1297882A1 (en) * | 2001-09-27 | 2003-04-02 | Ebara Corporation | Gas removal method and gas removal filter |
| JP2004008620A (en) * | 2002-06-10 | 2004-01-15 | Teijin Ltd | Humidifier |
| JP2006025661A (en) * | 2004-07-14 | 2006-02-02 | Canon Inc | Biochemical reaction cartridge |
| JP2009154142A (en) * | 2007-12-27 | 2009-07-16 | Nippon Air Filter Kk | Filter cartridge for chemical filter unit |
| US7621989B2 (en) | 2003-01-22 | 2009-11-24 | Camfil Ab | Filter structure, filter panel comprising the filter structure and method for manufacturing the filter structure |
| JP2013150979A (en) * | 2000-05-05 | 2013-08-08 | Entegris Inc | Filters that use both acidic polymers and physisorption media |
| WO2014030766A1 (en) * | 2012-08-24 | 2014-02-27 | Ebara Corporation | Method for treating exhaust gas containing inorganic halogenated gas |
| WO2017157721A1 (en) * | 2016-03-18 | 2017-09-21 | Mahle International Gmbh | Air filter comprising a multilayer filter material |
| JP2026002348A (en) * | 2024-06-21 | 2026-01-08 | 株式会社フクハラ | Outdoor air purifier |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS592533A (en) * | 1982-06-28 | 1984-01-09 | 株式会社明電舎 | Harmonic wave suppressing device |
| JPS62247820A (en) * | 1986-04-22 | 1987-10-28 | Toray Ind Inc | Method for filtering gas |
-
1988
- 1988-07-18 JP JP63178423A patent/JPH0226612A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS592533A (en) * | 1982-06-28 | 1984-01-09 | 株式会社明電舎 | Harmonic wave suppressing device |
| JPS62247820A (en) * | 1986-04-22 | 1987-10-28 | Toray Ind Inc | Method for filtering gas |
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05123533A (en) * | 1991-11-05 | 1993-05-21 | Matsushita Seiko Co Ltd | Nitrogen oxide removing filter, and device and system thereof |
| JPH06296824A (en) * | 1993-02-17 | 1994-10-25 | Matsushita Seiko Co Ltd | Nox removing agent, regeneration thereof and nox removing device |
| WO2001070391A1 (en) * | 2000-03-21 | 2001-09-27 | Mhb Filtration Gmbh + Co. Kg | Adsorbent filter material |
| JP2013150979A (en) * | 2000-05-05 | 2013-08-08 | Entegris Inc | Filters that use both acidic polymers and physisorption media |
| EP1297882A1 (en) * | 2001-09-27 | 2003-04-02 | Ebara Corporation | Gas removal method and gas removal filter |
| US6723151B2 (en) | 2001-09-27 | 2004-04-20 | Ebara Corporation | Gas removal method and gas removal filter |
| JP2004008620A (en) * | 2002-06-10 | 2004-01-15 | Teijin Ltd | Humidifier |
| US7621989B2 (en) | 2003-01-22 | 2009-11-24 | Camfil Ab | Filter structure, filter panel comprising the filter structure and method for manufacturing the filter structure |
| JP2006025661A (en) * | 2004-07-14 | 2006-02-02 | Canon Inc | Biochemical reaction cartridge |
| JP2009154142A (en) * | 2007-12-27 | 2009-07-16 | Nippon Air Filter Kk | Filter cartridge for chemical filter unit |
| WO2014030766A1 (en) * | 2012-08-24 | 2014-02-27 | Ebara Corporation | Method for treating exhaust gas containing inorganic halogenated gas |
| WO2017157721A1 (en) * | 2016-03-18 | 2017-09-21 | Mahle International Gmbh | Air filter comprising a multilayer filter material |
| CN108778456A (en) * | 2016-03-18 | 2018-11-09 | 马勒国际有限公司 | Include the air filter of multiple filtration material |
| US10695705B2 (en) | 2016-03-18 | 2020-06-30 | Mahle International Gmbh | Air filter comprising a multilayer filter material |
| CN108778456B (en) * | 2016-03-18 | 2021-11-09 | 马勒国际有限公司 | Air filter comprising a plurality of layers of filter material |
| JP2026002348A (en) * | 2024-06-21 | 2026-01-08 | 株式会社フクハラ | Outdoor air purifier |
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