JPH0226844A - Method for forming optical element - Google Patents
Method for forming optical elementInfo
- Publication number
- JPH0226844A JPH0226844A JP17408288A JP17408288A JPH0226844A JP H0226844 A JPH0226844 A JP H0226844A JP 17408288 A JP17408288 A JP 17408288A JP 17408288 A JP17408288 A JP 17408288A JP H0226844 A JPH0226844 A JP H0226844A
- Authority
- JP
- Japan
- Prior art keywords
- optical element
- mold
- molding
- thermal expansion
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
- C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/03—Press-mould materials defined by material properties or parameters, e.g. relative CTE of mould parts
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/10—Die base materials
- C03B2215/12—Ceramics or cermets, e.g. cemented WC, Al2O3 or TiC
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/22—Non-oxide ceramics
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/40—Product characteristics
- C03B2215/46—Lenses, e.g. bi-convex
- C03B2215/48—Convex-concave
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
(産業上の利用分野)
この発明は、例えばレンズ、プリズム及びその他の光学
素子の成形方法に関するものであり、特に、光学素子形
成用材料と成形型との離型性を向上させる技術に関する
。Detailed Description of the Invention (Field of Industrial Application) This invention relates to a method for molding, for example, lenses, prisms, and other optical elements, and particularly relates to mold releasability between an optical element forming material and a mold. Regarding technology to improve
(従来の技術)
従来、レンズ等の光学素子を製造するに当り、ガラスま
たはその他の光学素子形成用材料(以下、単に光学材料
と称する場合も有る。)を研磨して成形することが成さ
れてきた。しかしながら近年では、種々の材料から成る
成形型に光学素子の設計に応じた有効成形面を形成し、
光学素子を実貢的に同一の形状で成形する技術が広く用
いられでいる。(Prior Art) Conventionally, in manufacturing optical elements such as lenses, glass or other optical element forming materials (hereinafter sometimes simply referred to as optical materials) have been polished and molded. It's here. However, in recent years, effective molding surfaces have been formed on molds made of various materials in accordance with the design of optical elements.
Techniques for molding optical elements into virtually the same shape are widely used.
以下、図面を譬照して、従来の光学素子成形技術につき
説明する。尚、以下の説明においでは、光学素子の作製
に用いられる成形型の一構成例につき説明する。Hereinafter, conventional optical element molding techniques will be explained with reference to the drawings. In the following description, an example of the configuration of a mold used for manufacturing an optical element will be described.
第2図は、成形型の構成の一例として、有効成形面が凹
面で構成されている成形型を概略的断面により示す説明
図である。FIG. 2 is an explanatory diagram showing a schematic cross-section of a mold whose effective molding surface is a concave surface, as an example of the configuration of the mold.
この図からも理解できるように成形型10は母材12と
薄膜14とによって構成され、通常、例えば精密旋盤等
の工作機械を用いて母材12に有効成形面aを研磨形成
した後、この有効成形面aの表面に薄膜を被着して作製
するのが一般的である。As can be understood from this figure, the mold 10 is composed of a base material 12 and a thin film 14, and usually, after polishing and forming an effective molding surface a on the base material 12 using a machine tool such as a precision lathe, this It is generally produced by depositing a thin film on the surface of the effective molding surface a.
この薄膜14の被着は、スパッタリング法、イオンブレ
ーティング法、化学的気相成長(CVD)法またはその
他、薄膜材料に応じた任意好適な技術によって、数(μ
m)程度の均一な膜厚で行ない、薄膜14の表面形状と
、上述した母材12の有効成形面aの形状とが実質的に
同一となるように行なう、従って、以下の説明において
は、薄膜14の表面形状を有効成形面すと称し、当該面
b8以って成形型10の有効成形面と称する。The thin film 14 is deposited by sputtering, ion blasting, chemical vapor deposition (CVD), or any other suitable technique depending on the thin film material.
The process is performed to a uniform film thickness of about m), and the process is performed so that the surface shape of the thin film 14 and the shape of the effective molding surface a of the base material 12 described above are substantially the same. Therefore, in the following description, The surface shape of the thin film 14 is referred to as an effective molding surface, and the surface b8 is referred to as an effective molding surface of the mold 10.
このような成形型10によって光学素子を成形するに当
っては、まず、当該型と光学材料とを、少なくとも当該
材料が軟化するまで加熱する。When molding an optical element using such a mold 10, first, the mold and the optical material are heated at least until the material softens.
然る後、この軟化した光学材料を前述した有効成形面す
に対して押圧し、当該面すに応じた形状に光学材料を成
形せしめる。ここで、1つの光学素子を成形するに当っ
ては2つ以上の成形型を用いるのが一般的である。従っ
て、この押圧成形に際しては、軟化した光学材料に互い
の有効成形面を、各々、接触させた状態で押圧する。Thereafter, this softened optical material is pressed against the aforementioned effective molding surface to mold the optical material into a shape corresponding to the surface. Here, when molding one optical element, it is common to use two or more molds. Therefore, during this press molding, the effective molding surfaces are pressed against the softened optical material in a state in which they are in contact with each other.
続いて、有効成形面に応じた所定の形状に成形され、か
つ軟化状態に有る光学材料を硬化させるため、成形型及
び光学材料を放冷または冷却して光学素子が得られる。Subsequently, in order to harden the optical material which is molded into a predetermined shape according to the effective molding surface and is in a softened state, the mold and the optical material are allowed to cool or are cooled to obtain an optical element.
上述の成形型10を構成する母材12の材料としては、
耐熱性、機械的強度、加工性等を満足する材料が用いら
れ、例えば特開昭52−45613号公報及び特開昭6
0−195026号公報に開示されるカーバイド系の化
合物、ステンレス、ニッケルを主成分とする種々の耐熱
合金、種々のセラミ・νクス、サーメット等が知られて
いる。The material of the base material 12 constituting the above-mentioned mold 10 is as follows:
Materials that satisfy heat resistance, mechanical strength, workability, etc. are used, such as those disclosed in JP-A-52-45613 and JP-A-6.
Carbide-based compounds disclosed in Japanese Patent No. 0-195026, stainless steel, various heat-resistant alloys containing nickel as a main component, various ceramics, voxels, cermets, and the like are known.
また、上述した薄膜14の材料につき例示すれば、窒化
チタン(TiN) 、アルミナ(AQ203)、窒化珪
素(Sin)を始めとする種々のセラミックスや、金(
Au)、白金(Pt)、白金族金属(例えばロジウム(
Rh))を始めとする貴金属が知られている。Examples of the materials for the thin film 14 mentioned above include various ceramics including titanium nitride (TiN), alumina (AQ203), and silicon nitride (Sin), and gold (
Au), platinum (Pt), platinum group metals (e.g. rhodium (
Noble metals including Rh)) are known.
このような技術において、成形型10を構成する薄膜1
4は、有効成形面すの耐酸化性及び耐反応性を確保する
ことによって、有効成形面すの耐久性や光学素子に対す
る加工性を高める目的で配設される。In such a technique, the thin film 1 constituting the mold 10
4 is provided for the purpose of increasing the durability of the effective molding surface and the workability of optical elements by ensuring the oxidation resistance and reaction resistance of the effective molding surface.
さらに、当該薄膜14の他の機能としては、軟化した光
学材料の、有効成形面すに対するぬれ性を向上させるた
めに設けられる。このように、成形型と光学材料とのぬ
れ性を向上させることにより、上述した加工性を高める
のみならず、光学素子と成形型との離型性を向上させる
ことが可能である。Furthermore, another function of the thin film 14 is to improve the wettability of the softened optical material to the effective molding surface. In this way, by improving the wettability between the mold and the optical material, it is possible not only to improve the processability described above but also to improve the releasability between the optical element and the mold.
(発明が解決しようとする課題)
上述した説明からも理解できるように、成形型を用いた
従来の成形方法は、光学素子形成用材料の軟化を目的と
した温度に加熱し、押圧成形した後の光学素子を取り出
すため、例えば室温程度に温度を下げて実施される。従
って、押圧成形時と取り出し時との温度差によって、光
学素子と成形型とは、各々の熱膨張係数に応じた寸法収
縮を生じる。(Problems to be Solved by the Invention) As can be understood from the above explanation, the conventional molding method using a mold is to heat the material for forming an optical element to a temperature intended to soften it, press-form it, and then press-form it. In order to take out the optical element, the temperature is lowered to, for example, room temperature. Therefore, due to the temperature difference between the time of press molding and the time of removal, the optical element and the mold undergo dimensional shrinkage according to their respective coefficients of thermal expansion.
これがため、有効成形面の形状と、上述した各々の熱膨
張係数の差によっては、光学素子が成形型を締め付けた
り、或いは成形型が光学素子を締め付けて離型性が低下
するという問題点が有った。Therefore, depending on the shape of the effective molding surface and the difference in the thermal expansion coefficients mentioned above, there is a problem that the optical element may clamp the mold, or the mold may clamp the optical element, reducing mold release properties. There was.
このような離型性の低下に対して、成形型から光学素子
を機械的に取り外すことも成されでいる。しかしながら
、このような場合、光学素子に損傷を来たし、歩留りの
低下を招いたり、或いは、量産性の面からは成形サイク
ルに長時間を要し、成形効率を低下させるといった問題
を生じる。In order to deal with such deterioration in mold releasability, mechanical removal of the optical element from the mold has also been achieved. However, in such a case, there arise problems such as damage to the optical element, resulting in a decrease in yield, or, from the standpoint of mass production, a long time being required for the molding cycle, resulting in a decrease in molding efficiency.
この発明は、上述した従来の問題点に鑑み成ざれたもの
であり、光学素子と成形型との離型性を向上させること
により、歩留りの向上及び成形効率の向上を図り得る光
学素子の成形技術を提供することを目的とする。This invention was developed in view of the above-mentioned conventional problems, and it is possible to mold an optical element that can improve the yield and molding efficiency by improving the releasability between the optical element and the mold. The purpose is to provide technology.
(課題を解決するための手段)
この目的の達成を図るため、この出願の第一発明に係る
光学素子の成形方法によれば、凹面から成る有効成形面
が形成された成形型に、加熱によって軟化した光学素子
形成用材料を押圧して光学素子を成形するに当り、
上述した成形型を構成する母材の熱膨張係数をα1及び
前記光学素子形成用材料の熱膨張係数を02とし、これ
ら熱膨張係数がα、≦α2’Fr満たす条件で成形する
ことを特徴としでいる。(Means for Solving the Problem) In order to achieve this object, according to the method for molding an optical element according to the first invention of this application, a mold having an effective molding surface consisting of a concave surface is heated. When molding an optical element by pressing the softened material for forming an optical element, the coefficient of thermal expansion of the base material constituting the mold described above is α1, and the coefficient of thermal expansion of the material for forming an optical element is 02, and these It is characterized in that it is molded under conditions where the coefficient of thermal expansion satisfies α, ≦α2'Fr.
また、この出願の第二発明に係る光学素子の成形方法に
よれば、凸面から成る有効成形面が形成された成形型に
、加熱によって軟化した光学素子形成用材料を押圧して
光学素子を成形するに当り、
上述した成形型を構成する母材の熱膨張係数をα1及び
前記光学素子形成用材料の熱膨張係数を02とし、これ
ら熱膨張係数がα1≧α2を満たす条件で成形する
ことを特徴としている。Further, according to the method for molding an optical element according to the second invention of this application, an optical element forming material softened by heating is pressed onto a mold having an effective molding surface consisting of a convex surface to mold an optical element. In doing so, it is assumed that the thermal expansion coefficient of the base material constituting the mold described above is α1 and the thermal expansion coefficient of the optical element forming material is 02, and that the molding is performed under the condition that these thermal expansion coefficients satisfy α1≧α2. It is a feature.
ざらに、この出願に係る第一発明の方法または第二発明
の方法を実施するに当っては、前述した母材の表面に、
前述の有効成形面を構成するためのセラミックスまたは
貴金属から成る薄膜を被着形成した成形型を用いるのが
好適である。In general, when carrying out the method of the first invention or the method of the second invention according to this application, on the surface of the above-mentioned base material,
It is preferable to use a mold on which a thin film of ceramics or noble metal is deposited to constitute the effective molding surface described above.
(作用)
この出願の第一発明に係る光学素子の成形方法によれば
、凹面から成る有効成形面が形成された成形型で、凸面
形状を有する光学素子を成形する場合には、母材の熱膨
張係数α、と光学材料の熱膨張係数α2との間に、α、
≦α2の関係を満足する構成となっている。これがため
、前述した押圧成形時と取り出し時との温度差を八Tと
すれば、母材の寸法収縮し1及び光学材料の寸法収縮し
2は、α1ΔTまたはα2Δ丁で表わされる。(Function) According to the method for molding an optical element according to the first invention of this application, when molding an optical element having a convex shape with a mold having an effective molding surface consisting of a concave surface, Between the coefficient of thermal expansion α and the coefficient of thermal expansion α2 of the optical material, α,
The configuration satisfies the relationship ≦α2. Therefore, if the temperature difference between the above-mentioned press molding and take-out is 8T, the dimensional shrinkage 1 of the base material and the dimensional shrinkage 2 of the optical material are expressed by α1ΔT or α2ΔT.
従って、これら寸法収縮り、及びL2の関係はり、≦し
。どなる。Therefore, the relationship between these dimensional shrinkages and L2 is ≦. bawl.
このような寸法収縮の関係において、凸面形状を有する
光学素子の場合には、有効成形面の曲率中心側に相当す
る母材の寸法収縮L1よりも、光学素子の寸法収縮し2
のほうが大きいか、または、これら2つの値が等しくな
るため、光学素子と成形型との間で締め付けを生じるこ
とが無い。In such a dimensional shrinkage relationship, in the case of an optical element having a convex shape, the dimensional shrinkage L1 of the optical element is greater than the dimensional shrinkage L1 of the base material corresponding to the center of curvature of the effective molding surface.
is larger or these two values are equal, so that no clamping occurs between the optical element and the mold.
また、この出願の第二発明に係る光学素子の成形方法に
よれば、凸面から成る有効成形面が形成された成形型で
、凹面形状を有する光学素子を成形する場合には、母材
の熱膨張係数α1と光学材料の熱膨張係数α2との間に
、α、≧α2の関係を満足する構成となっている。これ
がため、前述の温度差を6丁として母材の寸法収縮し、
及び薄膜の寸法収縮し2の関係はり、≧L2となる。Further, according to the method for molding an optical element according to the second invention of this application, when molding an optical element having a concave shape using a mold in which an effective molding surface consisting of a convex surface is formed, heat of the base material is The structure is such that the relationship α,≧α2 is satisfied between the coefficient of expansion α1 and the coefficient of thermal expansion α2 of the optical material. For this reason, the dimension of the base material shrinks when the temperature difference mentioned above is set at 6.
and the dimensional shrinkage of the thin film, the relationship of 2 becomes ≧L2.
このような寸法収縮の関係からも理解できるように、凹
面形状を有する光学素子の場合には、有効成形面の曲率
中心側に相当する母材の寸法収縮L1よりも、光学素子
の寸法収縮し2のほうが小さいか、または、これら2つ
の値が等しくなるため、光学素子と成形型との間で締め
付ゆを生じることが無い。As can be understood from this relationship of dimensional shrinkage, in the case of an optical element having a concave shape, the dimensional shrinkage of the optical element is greater than the dimensional shrinkage L1 of the base material corresponding to the center of curvature of the effective molding surface. Since 2 is smaller or these two values are equal, no tightening strain occurs between the optical element and the mold.
(実施例)
以下、図面を参照して、この発明の実施例につき説明す
る。尚、以下の説明においては、材料、形状、配M関係
、数値的条件及びその他、この発明の好ましい特定の条
件を例示して説明するが、この発明は、これら特定の条
件にのみ限定されるものではないことを理解されたい。(Embodiments) Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following description, preferred specific conditions of the present invention such as materials, shapes, M distribution relationships, numerical conditions, and others will be illustrated and explained, but the present invention is limited only to these specific conditions. I want you to understand that this is not a thing.
また、以下の実施例では、光学素子形成用材料の一例と
して種々の光学ガラスを用い、異なる2つの成形型(以
下、上型または下型と称する。)を用いて光学素子を成
形する場合につき説明する。In addition, in the following examples, various optical glasses are used as examples of materials for forming optical elements, and two different molds (hereinafter referred to as upper molds and lower molds) are used to mold optical elements. explain.
既に説明したように、この発明に係る方法では、母材と
光学素子形成用材料との熱膨張係数の差を利用して、成
形型と光学素子との離型性を向上させるものである。従
って、説明の理解を容易とするため、成形方法の実施例
に先立つで、母材を構成する材料の熱膨張係数α、と、
光学素子を構成する材料の熱膨張係数α2とにつき、−
例を示す。As already explained, in the method according to the present invention, the difference in thermal expansion coefficient between the base material and the optical element forming material is utilized to improve the releasability between the mold and the optical element. Therefore, in order to facilitate understanding of the explanation, prior to the example of the molding method, the thermal expansion coefficient α of the material constituting the base material,
For the thermal expansion coefficient α2 of the material constituting the optical element, −
Give an example.
表 1
(i)母材材料
始めに、母材を構成する材料につき、従来知られでいる
ものを例示して、材料名と熱膨張係数(ii)光学素子
形成用材料
次に、次頁の表2に、光学素子形成用材料の一例として
、主な光学ガラスの熱膨張係数α2と、各材料の転移点
(軟化に必要な温度)とを示す。Table 1 (i) Base material materials First, we will list conventionally known examples of materials constituting the base material, and list the material names and coefficients of thermal expansion. (ii) Materials for forming optical elements. Table 2 shows the thermal expansion coefficient α2 of main optical glasses and the transition point (temperature necessary for softening) of each material as an example of materials for forming optical elements.
表2
この第1実施例では、光学素子形成用材料としで、光学
ガラスF2(小原光学硝子製)を用い、凹面形状と凸面
形状とを有する光学素子を成形した場合につき説明する
。Table 2 In this first example, a case will be described in which an optical element having a concave shape and a convex shape is molded using optical glass F2 (manufactured by Ohara Optical Glass Co., Ltd.) as the material for forming the optical element.
第1図(A)〜(C)は、第1実施例を説明するため、
各成形工程における構成成分を概略的断面により示す説
明図である。FIGS. 1(A) to (C) are for explaining the first embodiment.
FIG. 3 is an explanatory diagram showing a schematic cross section of the constituent components in each molding step.
まず、この第1実施例では、第1図(A)からも理解で
きるように、凸面から成る有効成形面す、が形成された
成形型を上型10aとしで、ざらに凹面から成る有効成
形面b2が形成された成形型を下型10bとして、各々
、作製した。First, in this first embodiment, as can be understood from FIG. 1(A), the upper mold 10a is a mold in which an effective molding surface consisting of a convex surface is formed, and an effective molding surface consisting of a roughly concave surface is used as the upper mold 10a. Each mold was produced using the mold in which the surface b2 was formed as the lower mold 10b.
上型10aの作製に当っては、光学材料に用いる光学ガ
ラスF2の熱膨張係数α2が99X In−7(deq
−’X表19照)であることから、この出願の第二発明
に係る方法を適用し、α1≧02の条件を満たす材料の
一例として、熱膨張係数α、が120 x 1O−7(
dec+−’)である5US4207a母材12aに用
いた。In producing the upper mold 10a, the thermal expansion coefficient α2 of the optical glass F2 used as the optical material is 99X In-7 (deq
-'
dec+-') was used for the 5US4207a base material 12a.
詳述すれば、まず、超精密旋盤で凸面から成る有効成形
面(前述した第2図の有効成形面aに相当)を形成した
後、ダイヤモンド研磨剤で研磨することにより、表面粗
ざR、、laxが0.01(un)となるように仕上げ
て母材12a @得る。Specifically, first, an effective molding surface consisting of a convex surface (corresponding to the effective molding surface a in FIG. 2 described above) is formed using an ultra-precision lathe, and then polished with a diamond abrasive to improve the surface roughness R, , lax is 0.01 (un) to obtain the base material 12a.
続いて、スパッタリング技術を利用し、上述した母材1
2aの有効成形面に、白金(Pt)から成る膜厚2(μ
m)の薄膜14aを被着形成して上型10aを作製した
。Next, using sputtering technology, the above-mentioned base material 1
A film of platinum (Pt) with a thickness of 2 (μ
The thin film 14a of m) was deposited to produce an upper mold 10a.
また、下型+obの作製に当っては、上述したように、
熱膨張係数α2が99x 1O−7(deq−’)であ
ることから、この出願の第一発明に係る方法を適用し、
α、≦α2の条件を満たす材料の一例として、熱膨張係
数α、が47X 10−’(de9−’)であるタング
ステンカーバイドを母材12bに用いた。In addition, when producing the lower mold + ob, as mentioned above,
Since the thermal expansion coefficient α2 is 99x 1O-7 (deq-'), the method according to the first invention of this application is applied,
As an example of a material satisfying the condition α,≦α2, tungsten carbide having a thermal expansion coefficient α of 47×10−′ (de9−′) was used for the base material 12b.
下型+obの作製は、上型10aの場合と同様にして行
ない、まず、超精密旋盤で凹面から成る有効成形面を形
成した後、表面粗さRmaxが0.01(um)となる
ように研磨して母材12bを得る。The lower mold +ob was manufactured in the same manner as the upper mold 10a. First, an effective molding surface consisting of a concave surface was formed using an ultra-precision lathe, and then the surface roughness Rmax was adjusted to 0.01 (um). The base material 12b is obtained by polishing.
然る後、スパッタリング技術により、上述した母材12
bの有効成形面に、窒化チタン(TiN)から成る膜厚
1 (urn)の薄膜+4bを被着形成して下型10b
を得た。After that, the above-mentioned base material 12 is formed by sputtering technology.
A thin film +4b made of titanium nitride (TiN) with a thickness of 1 (urn) is deposited on the effective molding surface of the lower mold 10b.
I got it.
次に、上述した上型10a及び下型10b!用いて、実
際に光学素子を成形する工程につき詳細に説明する。Next, the above-mentioned upper mold 10a and lower mold 10b! The process of actually molding an optical element using the method will be described in detail.
始めに、上述した第1図(A)を参照しで、押圧成形1
こ用いた装置の構成につき簡単に説明すれば、16a及
び+6bは押圧成形装置の加熱炉中に設けられた油圧シ
リンダを示し、上側の油圧シリンダ16aに上型10a
、及び下側の油圧シリンダ16bに下型10bが各々装
着される。18は上型10aまたは下型10bの温度を
測定するための熱電対を示し、当該熱電対18が上述の
油圧シリンダ16a及び+6bの夫々に配設される。ま
た、20は加熱炉内に設けられるヒーター、22は成形
部、24は成形部に連通するガス送入口を示す。First, with reference to FIG. 1(A) mentioned above, press molding 1
To briefly explain the configuration of the device used, 16a and +6b indicate hydraulic cylinders installed in the heating furnace of the press molding device, and the upper hydraulic cylinder 16a is connected to the upper die 10a.
, and a lower mold 10b is attached to the lower hydraulic cylinder 16b, respectively. Reference numeral 18 indicates a thermocouple for measuring the temperature of the upper mold 10a or the lower mold 10b, and the thermocouple 18 is arranged in each of the above-mentioned hydraulic cylinders 16a and +6b. Further, 20 is a heater provided in the heating furnace, 22 is a molding section, and 24 is a gas inlet communicating with the molding section.
始めに、前述した光学素子形成用材料(光学ガラスF2
)を用意し、球形【こ研磨加工する。黙る後、下型10
bの有効成形面b2を構成する凹部の上側に、球形に研
磨加工された光学材料26を載置し、成形部22を外気
と隔絶する。続いて、上型10a及び下型tabの温度
を熱電対18によって測定しながら、当該間成形型の温
度が約500℃となるまで、ヒーター20(こより加熱
を行なう、この際、上型10a及び下型10bの劣化を
軽減するため、ガス送入口24を介して、成形部22に
窯素ガスを導入し、非酸化雰囲気として加熱を行なった
。First, the above-mentioned optical element forming material (optical glass F2
) and polish it into a spherical shape. After silence, lower mold 10
An optical material 26 polished into a spherical shape is placed above the concave portion constituting the effective molding surface b2 of b, and the molded portion 22 is isolated from the outside air. Next, while measuring the temperatures of the upper mold 10a and the lower mold tab with the thermocouple 18, heating is performed using the heater 20 (heating is performed by the heater 20) until the temperature of the mold reaches approximately 500°C. In order to reduce deterioration of the lower mold 10b, silicon gas was introduced into the molding section 22 through the gas inlet 24 and heated to create a non-oxidizing atmosphere.
続いて、第1図(B)からも理解できるように、加熱に
より上型10a及び下型+obの温度が、上述した所定
の値に達した後、約70(に9/cm’)の圧力で筒成
形型同士を油圧シリンダ16a及び+61)(こより圧
接させ、前述の光学材料26を押圧成形する。Subsequently, as can be understood from FIG. 1(B), after the temperature of the upper mold 10a and the lower mold +ob reached the above-mentioned predetermined value by heating, a pressure of about 70 (9/cm') was applied. The cylindrical molds are brought into pressure contact with each other by the hydraulic cylinders 16a and +61), and the optical material 26 described above is press-molded.
次に、ヒーター20を停止して押圧成形後の光学材料2
6と、上型10a及び下型10t)とを放冷する。Next, the heater 20 is stopped and the optical material 2 after press molding is heated.
6, the upper mold 10a, and the lower mold 10t) are left to cool.
その後、熱電対18により、上型10a及び下型10b
の温度が、用いた光学材料の転移点よりも低いこと(約
430℃以下)を確認した時点で、当該押圧成形装置か
ら成形品を取りだすことにより第1図(C)に示すよう
な光学素子28を得る。After that, the upper mold 10a and the lower mold 10b are connected by the thermocouple 18.
When it is confirmed that the temperature of Get 28.
上述した工程を繰り返すことにより、2つの成形型と光
学素子との間の締め付けが回避され、高精度の光学素子
を歩留り良く、高い再現性を以って製造することができ
た。By repeating the above steps, tightening between the two molds and the optical element was avoided, and a highly accurate optical element could be manufactured with good yield and high reproducibility.
第m例
次に、第2実施例として、光学素子形成用材料に光学ガ
ラスF4(小屋光学硝子製)を用い、凹面形状と凸面形
状とを有する光学素子を成形した場合につき説明する。Mth Example Next, as a second example, a case will be described in which optical glass F4 (manufactured by Koya Optical Glass Co., Ltd.) is used as the optical element forming material and an optical element having a concave shape and a convex shape is molded.
尚、この実施例では、第1図(A)〜(C)を参照して
説明した第1実施例と同様に、凸面から成る有効成形面
b1が形成された成形型を上型10aとして、ざらに凹
面から成る有効成形面b2が形成された成形型を下型+
obとして、各々、作製して用いた場合につき説明する
。In this embodiment, similarly to the first embodiment described with reference to FIGS. 1(A) to (C), the upper mold 10a is a mold in which an effective molding surface b1 consisting of a convex surface is formed. The mold on which the effective molding surface b2 consisting of a roughly concave surface is formed is the lower mold +
The case where each is prepared and used as an ob will be explained.
まず、上型10aの作製に当っては、光学材料に用いる
光学ガラスF4の熱膨張係数α2が95×10”’(d
e9−’X表1参照)であることがら、コノ出願の第二
発明に係る方法を適用し、α1≧02の条件を満たす材
料の一例として、熱膨張係数α1が140 x 10−
’(de9−’)であるニッケルを母材12aに用い、
第1実施例と同様の条件で作製した。続いて、スパッタ
リング技術を利用し、上述した母材125の有効成形面
に、白金−金(Pt−Au)合金から成る膜厚2 (u
n)の薄膜14aを被着形成して上型10aを得た。First, in manufacturing the upper mold 10a, the thermal expansion coefficient α2 of the optical glass F4 used as the optical material is 95×10'' (d
e9-'
'(de9-') nickel is used for the base material 12a,
It was produced under the same conditions as in the first example. Next, using sputtering technology, a film of platinum-gold (Pt-Au) alloy with a thickness of 2 (u
The thin film 14a of n) was deposited to obtain an upper mold 10a.
また、下型10bの作製に当っては、この出願に係る出
願人が特願昭62−306937号公報で提案している
ように、母材をガラスで構成し、当該母材の有効成形面
に薄膜を被着して成形型を構成した。In addition, in manufacturing the lower mold 10b, as proposed by the applicant of this application in Japanese Patent Application No. 62-306937, the base material is made of glass, and the effective molding surface of the base material is A mold was constructed by depositing a thin film on the material.
詳細に説明すれば、上述したように、光学材料の熱膨張
係数α2が95x 10−’(deq−’)であること
から、この出願の第一発明に係る方法を適用し、α、≦
α2の条件を満たす材料の一例としで、熱膨張係数α1
が68×10−’(deq−’)である光学ガラスLa
S F 014 (小屋光学硝子製、転移点約695(
”C))を母材+2t)に用いた。To explain in detail, as mentioned above, since the thermal expansion coefficient α2 of the optical material is 95x 10-'(deq-'), the method according to the first invention of this application is applied, and α, ≦
As an example of a material that satisfies the condition of α2, the thermal expansion coefficient α1
Optical glass La whose is 68×10-'(deq-')
S F 014 (manufactured by Koya Optical Glass, transition point approximately 695 (
"C)) was used for the base material +2t).
下型10bの作製は、まず、凹面から成る有効成形面を
形成した債、上述の上型10aと同様の条件により、p
t−Au合金から成る膜厚2 (um)の薄膜+4bを
被着形成して下型tabを得た。The lower mold 10b is manufactured by first using a bond having an effective molding surface consisting of a concave surface and molding it under the same conditions as the above-mentioned upper mold 10a.
A lower mold tab was obtained by depositing a thin film +4b made of t-Au alloy and having a thickness of 2 (um).
このようにして作製した上型10a及び下型1(H)を
用い、第1実施例と同様に光学素子を成形したところ、
前述と同様に、高精度の光学素子を歩留り良く、高い再
現性を以って製造することができた。Using the upper mold 10a and lower mold 1 (H) thus produced, an optical element was molded in the same manner as in the first example.
As described above, a highly accurate optical element could be manufactured with good yield and high reproducibility.
比Jえ例
次に、この発明の方法を適用して行なった上述の実施例
との比較を行なうため、平面形状と凸面形状とを有する
光学素子を成形するに当って、平面形状の成形と凸面形
状の成形とを従来の成形技術によって行なった(図示省
略)。Comparison Example Next, in order to make a comparison with the above-mentioned example in which the method of the present invention was applied, we will explain how to form an optical element having a planar shape and a convex shape. Molding into a convex shape was performed using a conventional molding technique (not shown).
成形型の構成につき詳細に説明すれば、光学素子形成用
材料に光学ガラス5FSOIを用い、まず、上型10a
についでは、当該材料SFS○]の熱膨張係数α2が+
oox+o−フ(dec+−’X表1誉照)、及び熱膨
張係数α1が4 x 1O−7(deq−’)である石
英を母材12aに用い、第2実施例と同様の条件で作製
した。続いて、スパッタリング技術を利用し、上述した
母材12aの有効成形面に、ニッケルークロム(Ni−
Cr)合金から成る膜厚0.2(um)の薄膜と前述し
たPt−Au合金がら成る膜厚1.8(um)の薄膜と
を順次被着して薄膜14aとし、上型10aを得た。To explain the configuration of the mold in detail, first, using optical glass 5FSOI as the optical element forming material, the upper mold 10a is
, the thermal expansion coefficient α2 of the material SFS○] is +
oox+o-F (dec+-' did. Next, using sputtering technology, nickel-chromium (Ni-
A thin film with a thickness of 0.2 (um) made of a Cr) alloy and a thin film with a thickness of 1.8 (um) made of the above-mentioned Pt-Au alloy were sequentially deposited to form a thin film 14a, and an upper mold 10a was obtained. Ta.
このような上型10aにおいて、実質的に有効成形面を
構成するPt−Au合金膜と母材との間に挟設されたN
i−Cr合金膜は、石英から成る母材とPt−Au合金
膜との間の2着力を高める目的で設けた。In such an upper mold 10a, N is sandwiched between the base material and the Pt-Au alloy film that substantially constitutes the effective molding surface.
The i-Cr alloy film was provided for the purpose of increasing the bonding force between the base material made of quartz and the Pt-Au alloy film.
また、下型tabの作製に当っては、上述したように、
光学材料の熱膨張係数02が+00 Xl0−7(de
+;+−’)であることから、α、が120 X 10
−’(deq−’)である5US420!母材+2bと
しで、スパッタリング技術によりTiNから成る膜厚]
(um)の薄膜+4bを被着形成して下型10bとした
。In addition, when producing the lower mold tab, as mentioned above,
The thermal expansion coefficient 02 of the optical material is +00 Xl0-7 (de
+;+-'), so α is 120 x 10
-'(deq-') is 5US420! Base material + 2b, film thickness made of TiN by sputtering technology]
A thin film +4b of (um) was deposited to form a lower mold 10b.
このようにして作製した上型10a及び下型10bを用
い、第1及び第2実施例と同様に光学素子を成形したと
ころ、平面形状の成形は、前述した締め付けを生ずるこ
となく行なうことができた。When an optical element was molded in the same manner as in the first and second embodiments using the upper mold 10a and lower mold 10b thus produced, it was possible to mold a planar shape without causing the aforementioned tightening. Ta.
しかしながら、凹面形状の成形では成形型と光学素子と
の間の締め付けを生じ、光学素子の損傷による歩留り低
下や、時間的な成形効率の低下を来たした。また、この
ような下型を繰り返し成形に用いた場合、数千回の成形
サイクルで離型不能に成る場合も認められた。However, when molding a concave shape, clamping occurs between the mold and the optical element, resulting in a decrease in yield due to damage to the optical element and a decrease in molding efficiency over time. In addition, when such a lower mold was repeatedly used for molding, it was observed that the mold could not be released after several thousand molding cycles.
以上、この出願に係る発明の実施例につき説明したが、
この出願に係る光学素子の成形方法は上述の実施例にの
み限定されるものではなく、材料、形状、装百構成、数
値的条件、配M関係またはその他の条件は、この発明の
目的の範囲内で任意好適な設計の変更及び変形を行ない
得ること明らかである。The embodiments of the invention related to this application have been described above, but
The method for molding an optical element according to this application is not limited only to the above-mentioned embodiments, and the materials, shapes, mounting configurations, numerical conditions, M arrangement relationships, and other conditions are within the scope of the present invention. It will be obvious that any suitable design changes and modifications may be made therein.
(発明の効果)
上述した説明からも明らかなように、この出願の第一発
明に係る光学素子の成形方法によれば、凹面から成る有
効成形面が形成された成形型で、凸面形状を有する光学
素子を成形する場合には、母材の熱膨張係数α、と光学
材料の熱膨張係数α2との間に、α1≦02の関係を満
足する構成となっている。(Effects of the Invention) As is clear from the above description, according to the method for molding an optical element according to the first invention of this application, a mold having an effective molding surface consisting of a concave surface and a convex surface shape can be used. When molding an optical element, the structure is such that the relationship α1≦02 is satisfied between the thermal expansion coefficient α of the base material and the thermal expansion coefficient α2 of the optical material.
これがため、凸面形状を有する光学素子の場合には、有
効成形面の曲率中心側に相当する母材の寸法収縮L1よ
りも、光学素子の寸法収縮L2の(ようが大きいか、ま
たは、これら2つの値が等しくなるため、光学素子と成
形型との間で締め付けを生じることが無い。Therefore, in the case of an optical element having a convex shape, the dimensional shrinkage L2 of the optical element is larger than the dimensional shrinkage L1 of the base material corresponding to the center of curvature of the effective molding surface, or Since the two values are equal, no clamping occurs between the optical element and the mold.
また、この出願の第二発明に係る光学素子の成形方法に
よれば、凸面から成る有効成形面が形成された成形型で
、凹面形状を有する光学素子を成形する場合には、母材
の熱膨張係数α、と光学材料の熱膨張係数α2との間に
、α盲≧α2の関係を満足する構成となっている。Further, according to the method for molding an optical element according to the second invention of this application, when molding an optical element having a concave shape using a mold in which an effective molding surface consisting of a convex surface is formed, heat of the base material is The structure is such that the relationship α blindness≧α2 is satisfied between the expansion coefficient α and the thermal expansion coefficient α2 of the optical material.
これがため、凹面形状を有する光学素子の場合には、有
効成形面の曲率中心側に相当する母材の寸法収縮し、よ
りも、光学素子の寸法収縮し2のほうが小ざいか、また
は、これら2つの値が等しくなるため、光学素子と成形
型との間で締め付けを生じることが無い。Therefore, in the case of an optical element having a concave shape, the dimensional shrinkage of the optical element (2) is smaller than that of the base material corresponding to the center of curvature of the effective molding surface, or Since the two values are equal, no clamping occurs between the optical element and the mold.
このように、この出願に係る発明によれば、成形型を構
成する母材材料の熱膨張係数α、と光学素子形成用材料
の熱膨張係数α2との間の条件を、有効成形面の形状に
応じて設定することにより、光学素子と成形型との離型
性を向上させ、光学素子を成形する際の歩留りの向上及
び成形効率の向上を図ることができ、延いでは、高精度
の光学素子を安価に提供することができる。As described above, according to the invention of this application, the condition between the thermal expansion coefficient α of the base material constituting the mold and the thermal expansion coefficient α2 of the optical element forming material is determined by adjusting the shape of the effective molding surface. By setting the settings according to Optical elements can be provided at low cost.
第1図(A)〜(C)は、この発明の詳細な説明するた
め、光学素子の成形工程毎に概略的断面により示す説明
図、
第2図は、従来技術及び実施例を説明するため、成形型
の構成の一例を概略的断面により示す説明図である。
10、 lOa、 l0b−・・・成形型、12.12
a、 12b−−−−母材14、14a、 14b・・
・・薄膜、16a、16b・・・・・油圧シリンダ18
・・・・熱電対、20・・・・ヒーター、22・・・・
成形部24・・・・ガス送入口
26・・・・光学(素子形成用)材料
28・・・・光学素子
a、b、b、、b2・・・・・有効成形面。
■し、12a
第1図(A)
手
続
補
正
書Figures 1 (A) to (C) are explanatory diagrams showing schematic cross-sections of each optical element molding process in order to explain the present invention in detail, and Figure 2 is to explain the prior art and embodiments. FIG. 2 is an explanatory diagram schematically showing, in cross section, an example of the configuration of a mold. 10, lOa, l0b-... mold, 12.12
a, 12b----base material 14, 14a, 14b...
...Thin film, 16a, 16b...Hydraulic cylinder 18
...Thermocouple, 20...Heater, 22...
Molding part 24...Gas inlet 26...Optical (for element formation) material 28...Optical elements a, b, b,, b2...Effective molding surface. ■12a Figure 1 (A) Procedural amendment
Claims (3)
加熱によって軟化した光学素子形成用材料を押圧して光
学素子を成形するに当り、 前記成形型を構成する母材の熱膨張係数をα_1及び前
記光学素子形成用材料の熱膨張係数をα_2とし、これ
ら熱膨張係数がα_1≦α_2を満たす条件で成形する ことを特徴とする光学素子の成形方法。(1) A mold with an effective molding surface consisting of a concave surface,
When molding an optical element by pressing the optical element forming material softened by heating, the thermal expansion coefficient of the base material constituting the mold is α_1, and the thermal expansion coefficient of the optical element forming material is α_2, A method for molding an optical element, characterized in that molding is performed under conditions in which the coefficient of thermal expansion satisfies α_1≦α_2.
加熱によって軟化した光学素子形成用材料を押圧して光
学素子を成形するに当り、 前記成形型を構成する母材の熱膨張係数をα_1及び前
記光学素子形成用材料の熱膨張係数をα_2とし、これ
ら熱膨張係数がα_1≧α_2を満たす条件で成形する ことを特徴とする光学素子の成形方法。(2) A mold with an effective molding surface consisting of a convex surface,
When molding an optical element by pressing the optical element forming material softened by heating, the thermal expansion coefficient of the base material constituting the mold is α_1, and the thermal expansion coefficient of the optical element forming material is α_2, A method for molding an optical element, characterized in that molding is performed under conditions in which the coefficient of thermal expansion satisfies α_1≧α_2.
成するためのセラミックスまたは貴金属から成る薄膜と
を具えることを特徴とする請求項1または請求項2に記
載の光学素子の成形方法。(3) The optical element according to claim 1 or 2, wherein the mold comprises the base material and a thin film made of ceramic or noble metal for forming the effective molding surface. Molding method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17408288A JPH0226844A (en) | 1988-07-13 | 1988-07-13 | Method for forming optical element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17408288A JPH0226844A (en) | 1988-07-13 | 1988-07-13 | Method for forming optical element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0226844A true JPH0226844A (en) | 1990-01-29 |
Family
ID=15972337
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17408288A Pending JPH0226844A (en) | 1988-07-13 | 1988-07-13 | Method for forming optical element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0226844A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04362031A (en) * | 1991-06-06 | 1992-12-15 | Canon Inc | Press mold structure for optical element |
| EP0850886A1 (en) * | 1996-12-26 | 1998-07-01 | Hoya Corporation | Manufacturing method for glass molded products |
| JP2009203084A (en) * | 2008-02-26 | 2009-09-10 | Fujifilm Corp | Lens molding apparatus |
-
1988
- 1988-07-13 JP JP17408288A patent/JPH0226844A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04362031A (en) * | 1991-06-06 | 1992-12-15 | Canon Inc | Press mold structure for optical element |
| EP0850886A1 (en) * | 1996-12-26 | 1998-07-01 | Hoya Corporation | Manufacturing method for glass molded products |
| US6105395A (en) * | 1996-12-26 | 2000-08-22 | Hoya Corporation | Manufacturing method for glass molded products |
| JP2009203084A (en) * | 2008-02-26 | 2009-09-10 | Fujifilm Corp | Lens molding apparatus |
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