JPH0227314B2 - - Google Patents
Info
- Publication number
- JPH0227314B2 JPH0227314B2 JP59173843A JP17384384A JPH0227314B2 JP H0227314 B2 JPH0227314 B2 JP H0227314B2 JP 59173843 A JP59173843 A JP 59173843A JP 17384384 A JP17384384 A JP 17384384A JP H0227314 B2 JPH0227314 B2 JP H0227314B2
- Authority
- JP
- Japan
- Prior art keywords
- plane
- emerald
- flux
- crystal
- single crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はエメラルド単結晶の製造方法に関す
る。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for producing an emerald single crystal.
エメラルドは縁柱石(ベリル、3BeO・
Al2O3・6SiO2)のAl2O3の一部をOr2O3で置換し
たものであり、古来より宝石として珍重されてい
る。
Emerald is a curbstone (beryl, 3BeO・
It is made by replacing some of the Al 2 O 3 of Al 2 O 3 6SiO 2 ) with Or 2 O 3 , and has been prized as a gemstone since ancient times.
エメラルドの合成は古くから行なわれている
が、その製造方法としては、主に水熱合成法と溶
剤法(以後フラツクス法と表わす)があげられ
る。前者は特公昭42―3484、特公昭46―25499等
に示されているが、育成速度が遅く、装置が大規
模で高価であるという点によつて工業的にはほと
んど利用されていない。一方、後者は比較的成長
速度が速く、装置も安価であることから、特公昭
46―25500、特公昭47―27639、特公昭48―23278、
特公昭52―39396、特公昭54―12120、特開昭58―
115093、特開昭58―115095、特開昭58―199798、
あるいは日本化学会誌等(参考文献参照)に示さ
れるように、多くの人々によつて研究あるいは工
業化されている。 Emeralds have been synthesized for a long time, and the main methods for producing them include hydrothermal synthesis and solvent methods (hereinafter referred to as flux methods). The former method is disclosed in Japanese Patent Publication No. 42-3484, Japanese Patent Publication No. 46-25499, etc., but it is hardly used industrially because the growth rate is slow and the equipment is large-scale and expensive. On the other hand, the latter has a relatively fast growth rate and inexpensive equipment, so
46-25500, Special Publication Showa 47-27639, Special Publication Showa 48-23278,
Special Publication No. 52-39396, Special Publication No. 54-12120, No. 12120 No. 58-
115093, Unexamined Japanese Patent Publication No. 58-115095, Unexamined Japanese Patent Publication No. 58-199798,
Or, as shown in the Journal of the Chemical Society of Japan (see references), it has been researched or industrialized by many people.
しかしながら、いずれの特許文献も、フラツク
ス組成、原料組成、徐冷温度プログラム等につい
ては言及してあるが、工業的に合理的な種結晶の
結晶方位及びその種結晶の前処理については記述
がみられない。
However, although all of these patent documents mention the flux composition, raw material composition, slow cooling temperature program, etc., there is no description of the industrially rational crystal orientation of the seed crystal and the pretreatment of the seed crystal. I can't.
本発明の目的は、従来のフラツクス法によるエ
メラルド単結晶の合成方法をさらに改良し、より
品質の良いエメラルド単結晶の製造方法を提供す
るところにある。 An object of the present invention is to further improve the conventional method for synthesizing emerald single crystals using the flux method, and to provide a method for producing emerald single crystals of better quality.
本発明のエメラルド単結晶の製造方法は、五酸
化バナジウム、モリブデン酸リチウム、三酸化モ
リブデン、モリブデン酸ナトリウム、酸化リチウ
ム等の中から選ばれた1種又は2種以上を溶剤と
して用い、この中にエメラルド成分となる酸化ベ
リリウム、酸化アルミニウム、二酸化ケイ素およ
び着色剤として酸化クロムを溶解して温度差法あ
るいは徐冷法でエメラルド単結晶を析出させるエ
メラルド単結晶の製造方法において、エメラルド
単結晶の(1010)面を、最も広い平行な面とし
た種結晶を予め弗酸でエツチングして用いたこと
を特徴とする。
The method for producing an emerald single crystal of the present invention uses one or more selected from vanadium pentoxide, lithium molybdate, molybdenum trioxide, sodium molybdate, lithium oxide, etc. as a solvent; In a method for producing an emerald single crystal, in which beryllium oxide, aluminum oxide, silicon dioxide as emerald components, and chromium oxide as a coloring agent are dissolved and an emerald single crystal is precipitated by a temperature difference method or a slow cooling method, the (1010) face of the emerald single crystal is It is characterized in that a seed crystal with the widest parallel planes is etched in advance with hydrofluoric acid.
フラツクス法でエメラルド単結晶を合成する場
合、発生する面としては主にc面と呼ばれる
(0001)面、a面と呼ばれる(1120)面、m面
と呼ばれる(1010)面が認められる。五酸化バ
ナジウム、モリブデン酸リチウム、三酸化モリブ
デン、モリブデン酸ナトリウム、酸化リチウム等
の中から選ばれた1種又は2種以上をフラツクス
として用いた場合、一般的にc面の成長速度が最
も速いため、この面を最も広い平行な面とした種
結晶を用いることが多い。 When an emerald single crystal is synthesized by the flux method, the main planes that are generated are the (0001) plane called the c-plane, the (1120) plane called the a-plane, and the (1010) plane called the m-plane. When one or more types selected from vanadium pentoxide, lithium molybdate, molybdenum trioxide, sodium molybdate, lithium oxide, etc. are used as a flux, the growth rate of the c-plane is generally the fastest. , a seed crystal with this plane as the widest parallel plane is often used.
しかし、本発明者らは、種々の実験を重ねるう
ちに、m面を最も広い平行な面とした種結晶を予
め弗酸でエツチングして用いることが、品質も含
めて収率が最も高いことを見出した。 However, through repeated experiments, the present inventors found that using a seed crystal with the m-plane as the widest parallel plane and etching it with hydrofluoric acid in advance resulted in the highest yield, including quality. I found out.
すなわち、c面を種結晶として用いた場合、同
一条件(フラツクス組成、温度等)では成長速度
はa面、m面より速いが、いわゆるフラツクスイ
ンクルージヨンが入りやすく品質が低くなりやす
い。従つて、品質の良い結晶を育成するには成長
速度を小さくしなければならない。最終的な収率
は、成長速度×品質歩留、で表わされるが、成長
速度を小さくすれば収率も小さくなり、合理的な
製造方法とは言えない。一方、m面を種結晶とし
て、c面と同じ成長速度になるように条件設定を
して結晶品質を確認したところ、m面に成長した
結晶層にはc面に見られたフラツクスインクルー
ジヨンが著しく少なく、収率が向上することが判
つた。 That is, when the c-plane is used as a seed crystal, the growth rate is faster than that of the a-plane and m-plane under the same conditions (flux composition, temperature, etc.), but so-called flux inclusions tend to occur and the quality tends to deteriorate. Therefore, in order to grow crystals of good quality, the growth rate must be reduced. The final yield is expressed as growth rate x quality yield, but if the growth rate is decreased, the yield also decreases, and this cannot be said to be a rational manufacturing method. On the other hand, when we checked the crystal quality by using the m-plane as a seed crystal and setting conditions so that the growth rate was the same as that of the c-plane, we found that the crystal layer grown on the m-plane contained flux inclusions seen on the c-plane. It was found that the yield was improved.
天然エメラルド又はベリルあるいは合成エメラ
ルドを切断して、m面が最も広い平行な種結晶を
得る場合、面は結晶方位から10゜以内のずれに抑
えることが望ましい。これは、m面がエメラルド
の自然生成面であるため、種結晶の面がm面より
大きくずれていると、m面を最表面にしようと結
晶が成長するために、種結晶近傍で異常成長が生
じ、フラツクスインクルージヨン等の欠陥が発生
しやすくなるからである。すなわち、種結晶の形
状は、最も広い平行な面をm面にした場合、1辺
をa方向、他辺をc方向にした矩形板状が望まし
い。 When cutting natural emerald, beryl, or synthetic emerald to obtain a parallel seed crystal with the widest m-plane, it is desirable that the planes deviate within 10° from the crystal orientation. This is because the m-plane is the naturally occurring plane of emerald, so if the plane of the seed crystal deviates significantly from the m-plane, the crystal will grow to make the m-plane the outermost surface, resulting in abnormal growth near the seed crystal. This is because defects such as flux inclusions are more likely to occur. That is, the shape of the seed crystal is preferably a rectangular plate with one side in the a direction and the other side in the c direction, when the widest parallel plane is the m-plane.
しかし、エメラルド結晶は比較的脆いため、種
結晶として切断する場合に欠けを生じやすく、完
全な矩形板にすることは困難である。従つて、実
用的な手段として、種結晶を投入後、a面、m
面、c面などの自然面が出るまで成長速度を遅く
することによつて、種結晶近傍のフラツクスイン
クルージヨン等の欠陥を防止することができる。 However, since emerald crystals are relatively brittle, they tend to chip when cut as seed crystals, making it difficult to form perfect rectangular plates. Therefore, as a practical means, after introducing the seed crystal, the a-plane, m
Defects such as flux inclusions near the seed crystal can be prevented by slowing down the growth rate until natural planes such as planes and c-planes appear.
この成長速度を遅くする方法としては、 原料の溶解速度を遅くする。 As a way to slow down this growth rate, Slow down the rate of dissolution of raw materials.
温度差を小さくする。 Reduce temperature difference.
徐冷速度を遅くする。 Slow down the slow cooling rate.
などがあり、これによつて或る程度の目的を達す
ることはできるが、また種結晶の表面に依存する
部分もかなりある。Although this can achieve some objectives, it also depends to a large extent on the surface of the seed crystal.
したがつて切断した種結晶は、成長層との界面
をなくすために滑らかな方が良い結果を生むの
で、両面ラツピング、ポリシング加工をした方が
望ましい。特に表面の加工変質層を除き、早期に
自然面を出させることもあつて、5%以下のフツ
酸水溶液で予めエツチングすることは手軽に工業
的に利用でき有利である。 Therefore, since a cut seed crystal should be smooth to eliminate the interface with the growth layer, better results will be produced, so it is preferable to wrap and polish both sides. In particular, pre-etching with a 5% or less hydrofluoric acid aqueous solution is advantageous because it can be easily used industrially, especially in order to remove the process-affected layer on the surface and bring out the natural surface at an early stage.
また、種結晶をフラツクス中へ投入する場合に
は、予熱を十分行ない、投入時の熱衝撃を最小限
に抑える必要がある。また、結晶成長後のエメラ
ルドを取出す場合も、フラツクスから取出し後徐
冷して室温にもどさねばならない。これらの作業
は、熱衝撃によるエメラルドの割れ発生を防止す
るために必要不可欠な手段である。 Furthermore, when seed crystals are introduced into flux, it is necessary to sufficiently preheat them and to minimize thermal shock at the time of injection. Furthermore, when removing the emerald after crystal growth, it must be slowly cooled to room temperature after being removed from the flux. These operations are essential means to prevent cracking of emeralds due to thermal shock.
以下に、本発明について実施例に基づき詳細に
説明する。 The present invention will be described in detail below based on examples.
実施例 1
内径100mmφ、高さ200mmの大きさの白金るつぼ
に100gの天然ベリルと焼結した2gのCr2O3を
入れ、底から50mmの所に3mmφの穴をあけた開孔
率5%のバツフル板を置く。この中に、あらかじ
め別の炉でBeO、Al2O3、SiO2およびCr2O3を100
℃で3.2KgのV2O5と0.16KgのLi2Oの混合融液に飽
和溶解させたのちに冷却したフラツクスを粉砕し
て入れ、白金のふたをする。ただし、Cr2O3は
Al2O3の量の3%とした。これを、内径130mmφ
のたて型管状炉に入れて加熱し、バツフルの下を
1005℃に保ち、フラツクス表面から4〜5cmの付
近を995℃に保ち、約1週間保持する。種結晶と
して予めフツ酸水溶液でエツチングしたところの
a方向30mm、c方向20mm、m方向1mmのエメラル
ド6枚を白金線で支持固定する。この種結晶の中
心がフラツクス液面下約50mmになるように、ま
た、m面がフラツクス液面に垂直になるように種
結晶をフラツクス中に入れる。Example 1 100 g of natural beryl and 2 g of sintered Cr 2 O 3 were placed in a platinum crucible with an inner diameter of 100 mmφ and a height of 200 mm, and a hole of 3 mmφ was drilled at a distance of 50 mm from the bottom, with an open area ratio of 5%. Place a full board. Into this, 100% of BeO, Al 2 O 3 , SiO 2 and Cr 2 O 3 were added in advance in a separate furnace.
After saturated melting in a mixed melt of 3.2Kg of V 2 O 5 and 0.16Kg of Li 2 O at ℃, the cooled flux is pulverized and put into the melt, and then covered with a platinum lid. However , Cr2O3
The amount of Al 2 O 3 was 3%. This has an inner diameter of 130mmφ
Place it in a vertical tube furnace and heat it, then heat the bottom of the
The temperature is maintained at 1005°C, and the temperature around 4 to 5 cm from the surface of the flux is maintained at 995°C for about one week. As seed crystals, six emerald sheets, which had been etched in advance with a hydrofluoric acid aqueous solution and had dimensions of 30 mm in the a direction, 20 mm in the c direction, and 1 mm in the m direction, were supported and fixed with a platinum wire. Place the seed crystal into the flux so that the center of the seed crystal is approximately 50 mm below the flux liquid level and the m-plane is perpendicular to the flux liquid level.
この時、種結晶は炉の上方から徐々に予熱しな
がら入れる。90日間育成した後、種結晶のm面に
片側で約2.7mmの厚さのエメラルド単結晶が成長
した。このように成長させたエメラルド原石に
は、インクルージヨンなどの欠陥は非常に少な
い。このm面を種結晶の成長面としたものは、宝
石用にカツトしたところ収率が約30%であつた。 At this time, the seed crystal is introduced into the furnace from above while being gradually preheated. After 90 days of growth, an emerald single crystal with a thickness of approximately 2.7 mm was grown on one side of the m-plane of the seed crystal. Rough emeralds grown in this way have very few defects such as inclusions. When this m-plane was used as the seed crystal growth surface and the crystal was cut for use in jewelry, the yield was about 30%.
実施例 2
あらかじめAl2O3、BeO、SiO2およびCr2O3を
1050℃で実施例1と同じ組成のフラツクスへ飽和
溶解させたのちに冷却、粉砕したフラツクスを内
径100mmφ、高さ200mmの大きさの白金るつぼへ入
れ、白金のふたをして1050℃で1週間加熱する。
ただし、Cr2O3はAl2O3の溶解量の2%とした。
このフラツクスの中へ実施例1と同じ種結晶を同
様な操作で入れ、24時間保持したのち、1050℃か
ら800℃まで5℃/日の速度で徐冷を行なつた。Example 2 Al 2 O 3 , BeO, SiO 2 and Cr 2 O 3 were added in advance.
After saturated dissolving in a flux having the same composition as in Example 1 at 1050°C, the flux was cooled and ground, and the flux was placed in a platinum crucible with an inner diameter of 100 mmφ and a height of 200 mm, covered with a platinum lid, and heated at 1050°C for one week. Heat.
However, Cr 2 O 3 was set at 2% of the amount of dissolved Al 2 O 3 .
The same seed crystal as in Example 1 was put into this flux in the same manner as in Example 1, and after holding for 24 hours, it was gradually cooled from 1050°C to 800°C at a rate of 5°C/day.
50日間徐冷育成した後、結晶を取出したとこ
ろ、種結晶のm面に片側で約1.5mmの厚さのエメ
ラルド単結晶が成長した。このように成長させた
エメラルド原石にはインクルージヨンなどの欠陥
は非常に少なく、インクルージヨンを避けて、宝
石用にカツトしたところ、最高級品質のものが収
率25%で得られた。 When the crystal was taken out after 50 days of slow cooling growth, an emerald single crystal with a thickness of approximately 1.5 mm had grown on one side on the m-plane of the seed crystal. The emerald rough grown in this way has very few defects such as inclusions, and when cut into gemstones while avoiding inclusions, the highest quality was obtained at a yield of 25%.
実施例 3
フラツクスの成分
Li2O 5%
MoO3 70%
V2O5 25%
成長部の温度 850℃
バツフル下の温度 860℃
とし、実施例1と同様な方法で種結晶を投入した
のち、90日間育成したところ、種結晶のm面に片
側で約1.9mmの厚さのエメラルド単結晶が成長し
た。このように成長させたエメラルド原石はイン
クルージヨンなどの欠陥は非常に少なく、また、
色調は実施例1に比べてやや明るい緑色であつ
た。カツト収率は約28%であつた。Example 3 Components of flux Li 2 O 5% MoO 3 70% V 2 O 5 25% Temperature at growth zone 850°C Temperature under buffer 860°C After seed crystals were introduced in the same manner as in Example 1, After growing for 90 days, an emerald single crystal with a thickness of approximately 1.9 mm grew on one side on the m-plane of the seed crystal. Emerald rough grown in this way has very few defects such as inclusions, and
The color tone was a slightly brighter green than that of Example 1. The cut yield was about 28%.
実施例 4
実施例3のフラツクスを用い、実施例2と同じ
方法で950℃から650℃まで5℃/日の速度で徐冷
を行なつた。Example 4 Using the flux of Example 3, slow cooling was carried out from 950°C to 650°C at a rate of 5°C/day in the same manner as in Example 2.
60日間徐冷育成した後、結晶を取出したとこ
ろ、種結晶のm面に片側で約1.8mmの厚さのエメ
ラルド単結晶が成長した。このように成長させた
エメラルド原石には、インクルージヨンなどの欠
陥は非常に少なく、インクルージヨンを避けて宝
石用にカツトしたところ、最高級品質のものが収
率20%で得られた。 When the crystal was taken out after 60 days of slow cooling growth, an emerald single crystal with a thickness of approximately 1.8 mm had grown on one side on the m-plane of the seed crystal. The emerald rough grown in this way has very few defects such as inclusions, and when cut into gemstones while avoiding inclusions, the highest quality was obtained at a yield of 20%.
以上述べたように本発明によれば、(1010)
を最も広い平行な面とし、予め弗酸でエツチング
した種結晶を用いることによつて、割れやすいこ
ともなく、さらにインクルージヨンなどの欠陥が
著しく少なく、歩留が高いベリル単結晶を得るこ
とができる。
As described above, according to the present invention, (1010)
By using a seed crystal that has been etched with hydrofluoric acid in advance and with the widest parallel plane, it is possible to obtain a beryl single crystal that is not prone to cracking, has significantly fewer defects such as inclusions, and has a high yield. can.
また、インクルージヨンの方向が〈0001〉方向
に多いので、いわゆるm面をテーブルにカツトし
た場合インクルージヨンが厚み方向にあるため、
インクルージヨンが見えにくく、カツト後のグレ
ードを高くすることができる。すなわち、m面が
広いほど歩留および品質が高くなる。 Also, since the direction of inclusions is mostly in the <0001> direction, when cutting the so-called m-plane into a table, the inclusions are in the thickness direction, so
Inclusions are difficult to see and the grade after cutting can be increased. That is, the wider the m-plane, the higher the yield and quality.
以上のように、本発明はエメラルド単結晶を合
成するにあたつて実用上極めて有用な発明であ
る。 As described above, the present invention is extremely useful in practice for synthesizing emerald single crystals.
参考文献
日本化学会誌 1972 P1648
同 1973 P 506
同 1973 P 941
同 1974 P1468
同 1975 P1730
同 1976 P 752
同 1976 P 748
同 1977 P 194
同 1979 P1489
K.NASSAU “Gems Made by Man P127
〜P158 Reference Journal of the Chemical Society of Japan 1972 P1648 1973 P 506 1973 P 941 1974 P1468 1975 P1730 1976 P 752 1976 P 748 1977 P 194 1979 P1489 K.NASSAU “Gems Made by Man P127
~P158
Claims (1)
三酸化モリブデン、モリブデン酸ナトリウム、酸
化リチウム等の中から選ばれた1種又は2種以上
を溶剤として用い、この中にエメラルド成分とな
る酸化ベリリウム、酸化アルミニウム、二酸化ケ
イ素および着色剤として酸化クロムを溶解して温
度差法あるいは徐冷法でエメラルド単結晶を析出
させるエメラルド単結晶の製造方法において、エ
メラルド単結晶の(1010)面を、最も広い平行
な面とした種結晶を予め弗酸でエツチングして用
いたことを特徴とするエメラルド単結晶の製造方
法。1 Vanadium pentoxide, lithium molybdate,
One or more selected from molybdenum trioxide, sodium molybdate, lithium oxide, etc. are used as a solvent, and in this solvent, beryllium oxide, aluminum oxide, silicon dioxide, which becomes an emerald component, and chromium oxide as a coloring agent are used. In a method for producing an emerald single crystal in which the emerald single crystal is precipitated by melting and using a temperature difference method or slow cooling method, a seed crystal with the (1010) plane of the emerald single crystal as the widest parallel plane is etched in advance with hydrofluoric acid. A method for producing an emerald single crystal characterized by using the method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17384384A JPS6153198A (en) | 1984-08-21 | 1984-08-21 | Production of emerald single crystal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17384384A JPS6153198A (en) | 1984-08-21 | 1984-08-21 | Production of emerald single crystal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6153198A JPS6153198A (en) | 1986-03-17 |
| JPH0227314B2 true JPH0227314B2 (en) | 1990-06-15 |
Family
ID=15968187
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17384384A Granted JPS6153198A (en) | 1984-08-21 | 1984-08-21 | Production of emerald single crystal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6153198A (en) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6071588A (en) * | 1983-09-29 | 1985-04-23 | Seiko Epson Corp | Synthetic emerald manufacturing method |
| JPS6077200A (en) * | 1983-09-30 | 1985-05-01 | Seiko Epson Corp | Synthesis method of beryl single crystal |
-
1984
- 1984-08-21 JP JP17384384A patent/JPS6153198A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6153198A (en) | 1986-03-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4944925A (en) | Apparatus for producing single crystals | |
| JPH0227314B2 (en) | ||
| JPH0664995A (en) | KTiOPO4 single crystal and method for producing the same | |
| JP2507910B2 (en) | Method for producing oxide single crystal | |
| KR20230063864A (en) | Method for manufacturing a monocrystalline sapphire seed as well as a sapphire single-crystal with a preferred crystallographic orientation and external part and functional components for watchmaking and jewellery | |
| JPS63274694A (en) | Production of titanium sapphire single crystal having high quality | |
| JP2739546B2 (en) | Method for producing lithium borate single crystal | |
| JPH0333096A (en) | Production of magnesium-added lithium niobate single crystal | |
| JPS6360194A (en) | Method for pulling up single crystal | |
| JP3037829B2 (en) | Single crystal growing method and single crystal | |
| JPS589800B2 (en) | Manufacturing method of oxide single crystal | |
| JP2647052B2 (en) | Method for producing rare earth vanadate single crystal | |
| JP2640615B2 (en) | Method for manufacturing piezoelectric crystal | |
| KR960005521B1 (en) | Lithium Tantalate Single Crystal Production Method | |
| JP2738641B2 (en) | Method for producing X-axis oriented lithium niobate single crystal | |
| JPS62235299A (en) | Production of beryl single crystal | |
| JPS58155719A (en) | Manufacturing method of single crystal | |
| JPH0782088A (en) | Method for growing single crystal | |
| JP2507997B2 (en) | Single crystal growth method | |
| JP3010881B2 (en) | Single crystal growth method | |
| JPS6081096A (en) | Synthesis method of artificial beryl single crystal | |
| JPS6042293A (en) | Manufacture of single crystal | |
| JPH09110575A (en) | Crucible for producing single crystal and production of single crystal | |
| JPH04295097A (en) | Production of cadmium manganese telluride single crystal | |
| JPH09124397A (en) | Production of ferrite single crystal |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |