JPH02285652A - Semiconductor bonding device - Google Patents
Semiconductor bonding deviceInfo
- Publication number
- JPH02285652A JPH02285652A JP1108444A JP10844489A JPH02285652A JP H02285652 A JPH02285652 A JP H02285652A JP 1108444 A JP1108444 A JP 1108444A JP 10844489 A JP10844489 A JP 10844489A JP H02285652 A JPH02285652 A JP H02285652A
- Authority
- JP
- Japan
- Prior art keywords
- bonding
- semiconductor chip
- fabric
- tape
- specimen stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/701—Tape-automated bond [TAB] connectors
Landscapes
- Wire Bonding (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、半導体デツプの電極パッドと回路基板のリー
ドとを一括して接合するポンデイグ装置のうち、とくに
電極パッドとリードとの接合面に振動を加えるようにし
たボンディング装置に関する。Detailed Description of the Invention (Field of Industrial Application) The present invention is particularly applicable to bonding surfaces of electrode pads and leads in a bonding device for collectively bonding electrode pads of a semiconductor depth and leads of a circuit board. This invention relates to a bonding device that applies vibration.
(従来の技術)
半導体チップと回路基板のリードとを一括してボンディ
ングする従来の方法を第2図に示す。図において31は
試料台で、その上に電極パッド36を持つ半導体チップ
32を置き、先端に金バンプ37を持ち、回路基板(ポ
リイミドテープ)33a上に形成した銅箔リード33b
と半導体チップ32上の上記電極パッド36とを位置合
わせした後、加熱したボンディングツール34を抑圧す
る。(Prior Art) FIG. 2 shows a conventional method for collectively bonding a semiconductor chip and leads of a circuit board. In the figure, 31 is a sample stage, on which a semiconductor chip 32 with an electrode pad 36 is placed, a copper foil lead 33b having a gold bump 37 at the tip, and formed on a circuit board (polyimide tape) 33a.
After aligning the electrode pads 36 on the semiconductor chip 32 with the electrode pads 36 on the semiconductor chip 32, the heated bonding tool 34 is pressed down.
また、上記半導体チップ32や」1記回路基板33aを
熱ショックから守り、接合強度のバラツキを減らず必要
があるときは、試料台31をヒーター35によって予備
加熱することもある。Further, the sample stage 31 may be preheated by the heater 35 when necessary to protect the semiconductor chip 32 and the circuit board 33a from thermal shock and reduce variations in bonding strength.
」二記在来法は、ボンディング加圧力と加熱温度が高(
なり、半導体チップに熱ショックを与え、ボンディング
ツールの寿命を短くするなどの欠点を持つ。” The conventional method described above requires high bonding pressure and heating temperature (
This has disadvantages such as thermal shock to the semiconductor chip and shortening the life of the bonding tool.
このため、公開特許公報(昭61−255031)にお
いて、試料台を半導体チップ面に平行に振動させる装置
が開示されているが、公開特許公@I(昭612446
35 (PI3))によれば、ボンディングツール先端
と半導体チップの電極パッドの間に挾まれたリードの先
端がフリーで、試料台の振動に伴い不規則に動(ため、
電極バンドとリードとの接合部に均一に振動を加えられ
ないので良好なボンディングができない。For this reason, a device for vibrating a sample stage parallel to the semiconductor chip surface is disclosed in the published patent publication (Sho 61-255031);
35 (PI3)), the tip of the lead sandwiched between the tip of the bonding tool and the electrode pad of the semiconductor chip was free and moved irregularly due to the vibration of the sample stage.
Since vibration cannot be uniformly applied to the joint between the electrode band and the lead, good bonding cannot be achieved.
上記欠点を解消するため、上記公開特許公報(昭63−
244635)において、ボンディングツールの先端に
リードの形状と対応した溝を設け、上記溝に上記リード
を挾むことにより、半導体チップ面に平行な振動成分に
よるリードの位置ずれを防止する装置が示されている。In order to eliminate the above-mentioned drawbacks, the above-mentioned published patent publication (1986-
No. 244,635) discloses a device that prevents misalignment of the leads due to vibration components parallel to the semiconductor chip surface by providing a groove corresponding to the shape of the lead at the tip of a bonding tool and sandwiching the lead in the groove. ing.
しかし、この方法にはボンディングツールが高価になる
ほか、付着した金属粉が溝に詰まり安定したボンディン
グを妨げる欠点がある。However, this method has the disadvantage that the bonding tool is expensive and that the attached metal powder clogs the grooves, impeding stable bonding.
また、上記公開特許公報(昭63−244635)装置
は半導体チップを試料台上に直接乗せるもので、半導体
チップ下面と試料台上面が完全に密着することが困難で
あった。この原因は脆いシリコンと硬い金属の組み合わ
せにあり、接触面でミクロな塑性流動を生しにくいため
と考えられる。このため、振動印加時に半導体チップが
ずれて位置精度を悪化させやすい欠点を持っていた。Further, in the device disclosed in the above-mentioned Japanese Patent Publication No. 63-244635, the semiconductor chip is placed directly on the sample stage, and it is difficult for the lower surface of the semiconductor chip and the upper surface of the sample stage to be in complete contact with each other. This is thought to be due to the combination of brittle silicon and hard metal, which makes it difficult for microscopic plastic flow to occur at the contact surface. For this reason, there is a drawback that the semiconductor chip is likely to shift when vibration is applied, resulting in poor positional accuracy.
(問題点を解決するための手段)
本発明の骨子は、軸方向に超音波振動する試料台上のテ
ープ状織物を介して半導体チップの厚み方向に振動を印
加するものである。(Means for Solving the Problems) The gist of the present invention is to apply vibration in the thickness direction of a semiconductor chip via a tape-like fabric on a sample stage that vibrates ultrasonically in the axial direction.
すなわち、本発明は半導体チップの電極パッドと回路基
板のリードとを一括して接合するボンディング装置にお
いて、半導体チップの厚み方向に超音波振動する試料台
と、上記試料台に密着するテープ状織物とを設けるもの
である。That is, the present invention provides a bonding device for collectively bonding the electrode pads of a semiconductor chip and the leads of a circuit board, which includes a sample stage that vibrates ultrasonically in the thickness direction of the semiconductor chip, a tape-like fabric that is in close contact with the sample stage, and a sample stage that vibrates ultrasonically in the thickness direction of the semiconductor chip. It is intended to provide
(作用)
半導体チップ下面と試料台上面が、それぞの第1図には
、ボンディングツール15を超音波振動子からなる振動
機構17によってチップ13の面に平行に振動させる状
況が明示されているが、品種変更あるいはツール端面再
研磨に際し、上記ボンディングツール15の上記振動機
構17からの脱着が面倒である。(Function) The lower surface of the semiconductor chip and the upper surface of the sample stage are clearly shown in FIG. 1 in which the bonding tool 15 is vibrated parallel to the surface of the chip 13 by the vibration mechanism 17 consisting of an ultrasonic vibrator. However, when changing the product type or repolishing the end face of the tool, it is troublesome to attach and detach the bonding tool 15 from the vibration mechanism 17.
前記2つの公開特許公報とも特許請求の範囲において振
動の方向を特定していないが、明細書の記載内容からみ
るといずれも半導体チップの面に平行な振動を印加する
ものである。すなわち、前記時開(昭61−25503
1 )の第1図においては、上板34と下板35の間に
板ばね36が示されており、また時開(昭63−244
635)の第1図には、振動機構17の振動方向が矢印
で明示されている。上記2つの方法がいずれもリードと
バンブ、あるいはバンプと電極バンド間の接触面に平行
な振動を用いている理由は、公知の超音波ワイヤボンデ
ィングの慣行を踏襲したものであろう。Although the two patent publications mentioned above do not specify the direction of vibration in the claims, both apply vibrations parallel to the surface of the semiconductor chip, judging from the contents of the specifications. That is, the above-mentioned Jikai (Sho 61-25503
1), a leaf spring 36 is shown between the upper plate 34 and the lower plate 35, and a leaf spring 36 is shown between the upper plate 34 and the lower plate 35.
635), the direction of vibration of the vibration mechanism 17 is clearly indicated by an arrow. The reason that both of the above two methods use vibration parallel to the contact surface between the lead and the bump or the bump and the electrode band is probably because they follow the known practice of ultrasonic wire bonding.
つぎに前記2例にとどまらず、公知の従来れ完全に平ら
でないために生ずる半導体チ・7プと試料台の間の微小
な隙間が、ボンディングツールの加圧力により生ずるテ
ープ状織物の繊維束の相互の接近によって、上記テープ
状織物によって埋められる。ここで加圧下に相互に接触
した繊維束が接触点を通して振動を伝え、半導体チップ
の全面が−様に厚み方向に振動する。Next, in addition to the above two examples, the micro gap between the semiconductor chip 7 and the sample stage, which is caused by the known conventional method that is not completely flat, is caused by the fiber bundle of the tape-like fabric caused by the pressing force of the bonding tool. Due to their mutual proximity, they are filled by the tape-like fabric. Here, the fiber bundles that come into contact with each other under pressure transmit vibrations through the contact points, causing the entire surface of the semiconductor chip to vibrate in the thickness direction.
さらに半導体チップ上の電極パッドの高さの不同により
、上記電極パッドとリードの間に生ずる片当りが、上記
テープ状織物の繊維束の相互接近により改善される。し
たがって、半導体チップ上の電極パッドとボンディング
ツールによって、上記電極バンドに押しつけられたリー
ドのすべての接触点に超音波振動の作用下に−様な塑性
流動が起り、軟化したパッドとリードの−様な相互拡散
を助ける。Furthermore, uneven contact between the electrode pads and the leads due to the uneven height of the electrode pads on the semiconductor chip is improved by bringing the fiber bundles of the tape-like fabric closer to each other. Therefore, under the action of ultrasonic vibration, plastic flow occurs at all contact points of the lead pressed against the electrode band by the electrode pad on the semiconductor chip and the bonding tool, and the softened pad and lead form a mutual diffusion.
本発明においては、超音波振動の方向がチップの厚み方
向つまり、加圧力の方向と一致しているため振動伝達が
確実であり、異なる方向を持つ各リードに対し、公知の
チップ面に平行な振動を加える場合と仕較しζ、リー1
′ごとの振動効果のバラツキが少ない。また、マイクロ
メータオーダーの微小振幅と高い繰り返し数を持つ超音
波振動によって、接合時に生ずる大きくても約50マイ
クロメータを越えないバンプの変形プロセスに対し、有
効な振動エネルギーを供給できる。超音波音場下にある
接合部は変形しやすいので、結果的にボンディング圧力
と加熱温度をそれぞれ低くできる。In the present invention, since the direction of ultrasonic vibration is the same as the thickness direction of the chip, that is, the direction of the pressing force, vibration transmission is reliable, and each lead having a different direction is parallel to the known chip surface. Compared to the case of adding vibration, ζ, Li 1
There is little variation in the vibration effect for each ′. In addition, ultrasonic vibrations having a small amplitude on the order of micrometers and a high repetition rate can supply effective vibration energy to the deformation process of the bumps, which occurs during bonding and does not exceed about 50 micrometers at most. Since the bonded part under the ultrasonic sound field is easily deformed, the bonding pressure and heating temperature can be lowered as a result.
さらに、テープ状織物によって半導体デツプの全面がし
っかりと試料台に受は止めしれるので、振動による横ず
べりが起きにくい。Furthermore, since the entire surface of the semiconductor dip is securely fixed to the sample stage by the tape-like fabric, sideways sliding due to vibration is less likely to occur.
また、リードに加わる振動が横ずれを生しにくい成分だ
()なので、たとえリード先端が部分的にフリーであっ
てもリードの横ずれを生しにくい。In addition, the vibration applied to the reed is a component that is less likely to cause lateral shear (), so even if the reed tip is partially free, the reed is less likely to cause lateral shear.
(実施例)
第1図は、本発明の−・実施を示す装置の概るいは、ガ
ラスファイバなどからなる織物を用いる。試料台10へ
の取りつけは、機械的手段による展張で十分で、加圧下
に振動を伝える関係上伸いて接着する必要がない。した
がって、交換も簡単である。(Example) FIG. 1 shows a schematic diagram of an apparatus for implementing the present invention, using a fabric made of glass fiber or the like. For attachment to the sample stage 10, stretching by mechanical means is sufficient, and there is no need for stretching and gluing since vibrations are transmitted under pressure. Therefore, replacement is also easy.
つぎに、エフa、17bは一対の圧電素子で、背面ブロ
ック1と試料台10との間に中心ボルト2により一定の
緊付力で保持されている。Next, F-a and 17b are a pair of piezoelectric elements, which are held between the back block 1 and the sample stage 10 by a center bolt 2 with a constant tightening force.
この部分は公知のボルト締めランジュバン型振動子を構
成する。一対の圧電素子17a、17bは超音波型l+
!3につながれる。This part constitutes a known bolted Langevin type vibrator. A pair of piezoelectric elements 17a and 17b are ultrasonic type l+
! Connected to 3.
」二記試料台10、圧電素子17a、17b1背面ブロ
ック1、および中心ボルト2は、半波長の縦振動系を形
成し、4は固定ベース5にこれを取りつけるため、上記
縦振動系のノードに設けたフランジである。The sample stage 10, the piezoelectric elements 17a and 17b1, the back block 1, and the center bolt 2 form a half-wavelength longitudinal vibration system, and in order to attach it to the fixed base 5, 4 is connected to the node of the longitudinal vibration system. This is a flange provided.
つぎに上記装置を用いたボンディング工程を説明する。Next, a bonding process using the above device will be explained.
まず、テープ状織物11の上に半導体チップ13を乗せ
必要に応じ予備加熱しておく。ただ略構成図である。図
中10はハツチングで示す固定台5に取りつけられた試
料台であり、これに密着したテープ状織物11を介して
、」二面に電極パッド12を形成した半導体チップ13
が乗る。First, the semiconductor chip 13 is placed on the tape-shaped fabric 11 and preheated if necessary. It is just a schematic configuration diagram. In the figure, reference numeral 10 denotes a sample stand attached to a fixed stand 5 indicated by hatching, and a semiconductor chip 13 with electrode pads 12 formed on two sides is inserted through a tape-like fabric 11 that is in close contact with the sample stand.
rides.
試料台10の上方には、半導体チップ13上にボンディ
ングツール14が対置される。このボンディングツール
14はプランジャ等の進退機構16により上下方向に進
退移動するツールボルダ−15に取りつけられる。また
、ホンディングツール14にはヒータ18が設けられ、
ツール先端部19を加熱する。A bonding tool 14 is placed above the sample stage 10 and placed on the semiconductor chip 13 . This bonding tool 14 is attached to a tool boulder 15 that moves forward and backward in the vertical direction by a forward and backward movement mechanism 16 such as a plunger. Further, the honding tool 14 is provided with a heater 18,
The tool tip 19 is heated.
また、ボンディングツール14と半導体チップ13との
間に、テープキャリア21に支持さねたり一ド22が配
置され、このリード22の先端の下面に金バンプ23が
取りつけられている。Further, a lead 22 supported by a tape carrier 21 is arranged between the bonding tool 14 and the semiconductor chip 13, and a gold bump 23 is attached to the lower surface of the tip of the lead 22.
上記テープ状織物11は使用温度帯の繰り返し使用に耐
える耐熱性を持つほか、繊維自体の弾性限が高いものを
選択する。たとえばカーボンファイバ、ポリイミド系フ
ァイバ、あし、通常は予備加熱しないことが多い。また
、ボンディングツール14の先端19をヒータ18によ
り加熱しておく。The tape-shaped fabric 11 is selected not only to have heat resistance that can withstand repeated use within the operating temperature range, but also to have a high elastic limit of the fibers themselves. For example, carbon fibers, polyimide fibers, and fibers are usually not preheated. Further, the tip 19 of the bonding tool 14 is heated by the heater 18.
つぎにテープキャリア21上のリード22を半導体チッ
プ13」二のバンプ12に対し位置合わせし、進退機構
16によりボンディングツール14を下ろし、定められ
た加圧力によってリード22ヲバンブ12に押しつける
。Next, the leads 22 on the tape carrier 21 are aligned with the bumps 12 of the semiconductor chip 13'', and the bonding tool 14 is lowered by the advancing/retracting mechanism 16, and the leads 22 are pressed against the bumps 12 with a predetermined pressing force.
この状態で試料台10を軸方向に超音波振動さぜること
により、バンプ23とパッド12を接合する。超音波の
周波数は、振動源を小型にするため30kllz〜60
kllzを用いることが望ましく、その振幅は、ミクロ
ンオーダで十分である。したがって、織物状テープによ
る振動の均一負荷効果とあいまち、従来あった半導体チ
ップへの機械的悪影響はほとんどない。In this state, the sample stage 10 is ultrasonically vibrated in the axial direction to bond the bumps 23 and pads 12 together. The frequency of ultrasonic waves is 30 kllz to 60 kllz to make the vibration source small.
It is desirable to use kllz, and its amplitude is sufficient on the order of microns. Therefore, due to the uniform vibration load effect of the woven tape, there is almost no mechanical adverse effect on the semiconductor chip that existed in the past.
なお、本発明は、上述した実施例に限定されるものでは
ない。例えば、振動付与手段はボルト締めランジュバン
型圧電振動子に限らず磁歪型のものでもよく、また半波
長長さのものに限らずその整数倍のものでもよい。さら
にバンプはリード側でなく電極パッド側に設けてもよい
。その信奉発明の要旨を逸脱しない範囲で、種々変形し
て実施することができる。Note that the present invention is not limited to the embodiments described above. For example, the vibration imparting means is not limited to a bolted Langevin type piezoelectric vibrator, but may be a magnetostrictive type, and is not limited to a half-wave length, but may be an integral multiple thereof. Furthermore, the bumps may be provided on the electrode pad side instead of on the lead side. Various modifications can be made without departing from the gist of the claimed invention.
(発明の効果)
以上詳述したように本発明の結果、半導体チップ上の電
極パッドと回路基板のリードとの接合部に均一に超音波
振動を加えることができる。このため、ボンディング加
圧力や加熱温度を十分低くすることができ、ボンディン
グの信頼性を向上させ、装置立上り時間を短くして品種
変更を易しくし、ボンディングツールの寿命を伸ばして
、多ビン高密度実装に耐えるボンディングを具現化する
ことができる。(Effects of the Invention) As described in detail above, as a result of the present invention, ultrasonic vibration can be uniformly applied to the joint between the electrode pad on the semiconductor chip and the lead of the circuit board. Therefore, bonding pressure and heating temperature can be kept sufficiently low, improving bonding reliability, shortening equipment start-up time, making it easier to change products, extending the life of bonding tools, and increasing the number of bins and high density. Bonding that can withstand mounting can be realized.
上にいうボンディングの信頼性向上の中味は、各リード
の接合強度の向上とバラツキの減少、リードとパッドの
位置ずれの減少、振動の局所集中による半導体チップへ
の機械的悪影響と熱ショックの軽減ないし解消である。The improvements in bonding reliability mentioned above include improving the bonding strength of each lead and reducing variations, reducing misalignment between leads and pads, and reducing mechanical damage and thermal shock caused by local concentration of vibrations on the semiconductor chip. Or it can be resolved.
第1図は本発明の一実施例にかかわるボンディング装置
を示す概略構成図、第2図は従来公知の振動を用いない
ボンディング装置の概略断面図である。
半導体チップ、、、、13、試料台、、、、10、電極
パッド、、、、12、テープ状織物、、、、11、回路
基板のリード、、、、22FIG. 1 is a schematic configuration diagram showing a bonding device according to an embodiment of the present invention, and FIG. 2 is a schematic sectional view of a conventionally known bonding device that does not use vibration. Semiconductor chip, 13, Sample stage, 10, Electrode pad, 12, Tape-shaped fabric, 11, Circuit board lead, 22
Claims (2)
を一括して接合するボンディング装置において、上記半
導体チップの厚み方向に超音波振動する試料台と、上記
試料台に密着するテープ状織物とを設けたことを特徴と
する半導体ボンディング装置。(1) In a bonding device for collectively bonding electrode pads of a semiconductor chip and leads of a circuit board, a sample stage that vibrates ultrasonically in the thickness direction of the semiconductor chip, and a tape-like fabric that closely adheres to the sample stage are used. A semiconductor bonding device characterized by:
ルト締めランジュバン型振動子を用いたことを特徴とす
る特許請求の範囲第1項に記載する半導体ボンディング
装置。(2) The semiconductor bonding apparatus according to claim 1, wherein a bolted Langevin type vibrator with a length equivalent to a half wavelength is used as a sample stage that vibrates ultrasonically.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1108444A JPH02285652A (en) | 1989-04-27 | 1989-04-27 | Semiconductor bonding device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1108444A JPH02285652A (en) | 1989-04-27 | 1989-04-27 | Semiconductor bonding device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02285652A true JPH02285652A (en) | 1990-11-22 |
Family
ID=14484935
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1108444A Pending JPH02285652A (en) | 1989-04-27 | 1989-04-27 | Semiconductor bonding device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02285652A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005142537A (en) * | 2003-10-15 | 2005-06-02 | Bondotekku:Kk | Vertical vibration welding method and apparatus |
| US10478915B2 (en) * | 2016-07-12 | 2019-11-19 | Ultex Corporation | Joining method |
-
1989
- 1989-04-27 JP JP1108444A patent/JPH02285652A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005142537A (en) * | 2003-10-15 | 2005-06-02 | Bondotekku:Kk | Vertical vibration welding method and apparatus |
| US10478915B2 (en) * | 2016-07-12 | 2019-11-19 | Ultex Corporation | Joining method |
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