JPH02287435A - liquid crystal display device - Google Patents
liquid crystal display deviceInfo
- Publication number
- JPH02287435A JPH02287435A JP10963589A JP10963589A JPH02287435A JP H02287435 A JPH02287435 A JP H02287435A JP 10963589 A JP10963589 A JP 10963589A JP 10963589 A JP10963589 A JP 10963589A JP H02287435 A JPH02287435 A JP H02287435A
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- display device
- crystal display
- film
- transparent substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 19
- 239000000758 substrate Substances 0.000 claims description 15
- 239000007769 metal material Substances 0.000 claims description 3
- 239000004020 conductor Substances 0.000 claims description 2
- 230000005693 optoelectronics Effects 0.000 claims description 2
- 239000010408 film Substances 0.000 description 18
- 239000010410 layer Substances 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 238000004544 sputter deposition Methods 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 229920005591 polysilicon Polymers 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 239000006258 conductive agent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- -1 Phosphorus ions Chemical class 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 235000014121 butter Nutrition 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】 [産業上の利用分野〕 本発明は液晶表示装置に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a liquid crystal display device.
[従来の技術] 従来の液晶表示装置を第2図を用いて説明する。[Conventional technology] A conventional liquid crystal display device will be explained using FIG. 2.
第2図は、従来の液晶表示装置の断面図である。FIG. 2 is a sectional view of a conventional liquid crystal display device.
従来の液晶表示装置は、下側の透明基板6上の電極8と
上側の透明基板1上の透明電極4を上下導通剤9を介し
て接続せしめていた。In a conventional liquid crystal display device, an electrode 8 on a lower transparent substrate 6 and a transparent electrode 4 on an upper transparent substrate 1 are connected via a vertical conductive agent 9.
[発明が解決しようとする課M]
しかし、前述の従来技術では、透明電極の抵抗値が高く
、特に大画面の表示装置の場合、電圧の遅延がおこり、
十分に画素電極に電圧をかけることができず、コントラ
スト比の低下や色再現性の低下をひきおこしていた。[Problem M to be solved by the invention] However, in the above-mentioned conventional technology, the resistance value of the transparent electrode is high, and especially in the case of a large screen display device, a voltage delay occurs.
It was not possible to apply sufficient voltage to the pixel electrodes, causing a drop in contrast ratio and color reproducibility.
そこで本発明は、このような課題を解決するもので、そ
の目的とするところは、透明基板上に金属の補助配線を
行い、金属間で上下導通をさせることにより、コントラ
ストムラ・応答ムラ・色ムラなどの表示上のムラをなく
し、均一で高画質の液晶表示装置を得るところにある。The present invention is intended to solve these problems.The purpose of the present invention is to provide auxiliary metal wiring on a transparent substrate and create vertical conduction between the metals, thereby reducing uneven contrast, uneven response, and color. The aim is to eliminate display irregularities such as unevenness and obtain a liquid crystal display device with uniform and high image quality.
[課題を解決するための手段]
本発明の液晶表示装置は、一対の基板上に液晶の電気光
学効果を制御するための手段を具備し、一対の基板を導
電材料にて導通せしめる液晶表示装置において、導通を
とる端子が金属材料であることを特徴とする。[Means for Solving the Problems] The liquid crystal display device of the present invention is a liquid crystal display device that includes means for controlling the electro-optical effect of liquid crystal on a pair of substrates, and the pair of substrates are electrically connected through a conductive material. The terminal is characterized in that the terminal that establishes conduction is made of a metal material.
[実施例] 本発明の実施例を以下図面に基づいて説明する。[Example] Embodiments of the present invention will be described below based on the drawings.
第1図は本発明の液晶表示装置の断面図である。FIG. 1 is a sectional view of a liquid crystal display device of the present invention.
まず、透明基板6上に液晶の電気光学効果を制御する手
段として、ポリシリコン薄膜トランジスターを下記の(
1)〜(9)の工程により形成する。First, as a means for controlling the electro-optic effect of liquid crystal on a transparent substrate 6, a polysilicon thin film transistor as shown below (
It is formed by steps 1) to (9).
(1)チャンネル部となるポリシリコン膜を減圧CVD
により形成し、バターニングする。(1) Low pressure CVD for polysilicon film that will become the channel part
Form and butter.
(2)熱酸化法によりゲート酸化膜を形成する。(2) Form a gate oxide film by thermal oxidation.
(3)走査線及びゲート電極となるポリシリコン膜を減
圧CVDで形成し、バターニングする。(3) A polysilicon film that will become the scanning line and gate electrode is formed by low pressure CVD and patterned.
(4)リンイオンを打ち込みソース、ドレイン領域を形
成する。(4) Phosphorus ions are implanted to form source and drain regions.
(5)層間絶縁膜として3102膜をCVD法により形
成する。(5) A 3102 film is formed as an interlayer insulating film by CVD.
(6)層間絶縁膜をバターニングしてコンタクトホール
を開口する。(6) Patterning the interlayer insulating film to open contact holes.
(7)画素電極7となるITO膜をスパッタ法で形成し
、バターニングする。(7) An ITO film that will become the pixel electrode 7 is formed by sputtering and patterned.
(8)データー線及び上下導通端子8となるA1膜をス
パッタ法で形成し、バターニングする。(8) An A1 film that will become the data line and the upper and lower conductive terminals 8 is formed by sputtering and patterned.
(9)保護膜として5in2膜をマスクスパッタ法によ
り実装端子の部分を除いて基板全面に形成する。(9) A 5in2 film is formed as a protective film over the entire surface of the substrate except for the mounting terminals by mask sputtering.
次に、透明基板1上にCr膜をスパッタ法で形成し、バ
ターニングして遮光層2を形成し、R・G−Bカラーフ
ィルター層3を印刷法にて形成する。そして、該カラー
フィルター層上に共通電極4としてITO膜を基板全面
にスパッタ法で形成し、ITO膜上にスパッタ法、蒸着
法などでCr膜を形成した後、バターニングして金属補
助配線5をマトリックス状に形成する。Next, a Cr film is formed on the transparent substrate 1 by sputtering, patterned to form a light shielding layer 2, and R/G-B color filter layer 3 is formed by a printing method. Then, an ITO film is formed on the entire surface of the substrate as a common electrode 4 on the color filter layer by sputtering, and a Cr film is formed on the ITO film by sputtering, vapor deposition, etc., and then buttered to form metal auxiliary wiring 5. are formed into a matrix.
ここで、ITO膜上の金属材料は、Crに限るものでは
なく、低抵抗の膜であればなんでもよく例えばA1、T
i、Mo、Niなどがある。また、2層以上の膜にして
もよく、例えばCr+Alなどがある。Here, the metal material on the ITO film is not limited to Cr, but any film with low resistance may be used, for example, A1, T
There are i, Mo, Ni, etc. Further, the film may have two or more layers, such as Cr+Al.
さらに、本実施例では、遮光層と金属補助配線を別に形
成したが、金属補助配線を遮光層に用いてもよい。Further, in this embodiment, the light-shielding layer and the metal auxiliary wiring are formed separately, but the metal auxiliary wiring may be used as the light-shielding layer.
次に、上記一対の基板それぞれに配向膜としてポリイミ
ドをロールコート法にて表示エリアのみに塗布し、焼成
した後、ラビング処理し、上下導通剤9及びスペーサー
を混入したシール剤10を介して接着せしめ、最後に、
液晶11を封入した後、紫外線硬化型樹脂を封入口に塗
布して封止し、液晶表示装置を得た。Next, polyimide is applied as an alignment film to each of the pair of substrates only on the display area using a roll coating method, baked, rubbed, and bonded together using a sealing agent 10 mixed with an upper and lower conductive agent 9 and a spacer. Finally, finally,
After the liquid crystal 11 was sealed, an ultraviolet curable resin was applied to the sealing opening to seal it, thereby obtaining a liquid crystal display device.
[発明の効果]
本発明は、以上説明したように、透明基板上に金属の補
助配線を行い、金属間で上下導通をさせたことにより、
共通電極の低抵抗化と接触抵抗を下げることができた。[Effects of the Invention] As explained above, the present invention provides metal auxiliary wiring on a transparent substrate and vertical conduction between metals, thereby achieving
We were able to lower the resistance of the common electrode and the contact resistance.
その結果コントラストムラ・応答ムラ・色ムラなどの表
示上のムラがなくなり、均一で高コントラスト比と良好
な色再現性を有する液晶表示装置を得ることができた。As a result, display unevenness such as contrast unevenness, response unevenness, and color unevenness was eliminated, and a liquid crystal display device having a uniform high contrast ratio and good color reproducibility could be obtained.
第1図は、本発明の液晶表示装置の断面図、第2図は、
従来の液晶表示装置の断面図である。
透明基板
遮光層
カラフィルタ−層
共通電極
金属補助配線
透明基板
画素電極
上下導通端子
上下導通剤
シール剤
液晶
以上FIG. 1 is a sectional view of the liquid crystal display device of the present invention, and FIG.
1 is a cross-sectional view of a conventional liquid crystal display device. Transparent substrate Light-shielding layer Color filter layer Common electrode Metal auxiliary wiring Transparent substrate Pixel electrode Vertical conduction terminal Vertical conduction agent Sealing agent Liquid crystal or higher
Claims (1)
段を具備し、一対の基板を導電材料にて導通せしめる液
晶表示装置において、導通をとる端子が金属材料である
ことを特徴とする液晶表示装置。A liquid crystal display device comprising a means for controlling the electro-optical effect of a liquid crystal on a pair of substrates, and in which the pair of substrates are electrically connected by a conductive material, wherein the terminal for establishing electrical conduction is made of a metal material. Display device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10963589A JPH02287435A (en) | 1989-04-28 | 1989-04-28 | liquid crystal display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10963589A JPH02287435A (en) | 1989-04-28 | 1989-04-28 | liquid crystal display device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02287435A true JPH02287435A (en) | 1990-11-27 |
Family
ID=14515279
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10963589A Pending JPH02287435A (en) | 1989-04-28 | 1989-04-28 | liquid crystal display device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02287435A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6099993A (en) * | 1997-07-14 | 2000-08-08 | Lg Electronics Inc. | Color filter panel of a liquid crystal display and method of manufacturing the same |
| KR100474029B1 (en) * | 2001-04-20 | 2005-03-08 | 가부시끼가이샤 도시바 | Display device and method of manufacturing the same |
| KR100778836B1 (en) * | 2000-12-30 | 2007-11-22 | 엘지.필립스 엘시디 주식회사 | LCD and its manufacturing method |
-
1989
- 1989-04-28 JP JP10963589A patent/JPH02287435A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6099993A (en) * | 1997-07-14 | 2000-08-08 | Lg Electronics Inc. | Color filter panel of a liquid crystal display and method of manufacturing the same |
| KR100778836B1 (en) * | 2000-12-30 | 2007-11-22 | 엘지.필립스 엘시디 주식회사 | LCD and its manufacturing method |
| KR100474029B1 (en) * | 2001-04-20 | 2005-03-08 | 가부시끼가이샤 도시바 | Display device and method of manufacturing the same |
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