JPH022912A - Thin film moisture sensitive element - Google Patents
Thin film moisture sensitive elementInfo
- Publication number
- JPH022912A JPH022912A JP14976888A JP14976888A JPH022912A JP H022912 A JPH022912 A JP H022912A JP 14976888 A JP14976888 A JP 14976888A JP 14976888 A JP14976888 A JP 14976888A JP H022912 A JPH022912 A JP H022912A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- moisture
- sensitive element
- polyimide
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
- Paints Or Removers (AREA)
Abstract
Description
【発明の詳細な説明】
・ の1 ゝ一
本発明は、薄膜感湿素子に関する。更に詳しくは、温度
、薬品等への耐性がすぐれ、高感度で高速応答性を有す
る薄膜感湿素子に関する。DETAILED DESCRIPTION OF THE INVENTION (1) The present invention relates to a thin film moisture sensitive element. More specifically, the present invention relates to a thin film moisture-sensitive element having excellent resistance to temperature, chemicals, etc., high sensitivity, and high-speed response.
丈来夙技血
空気中の相対湿度の制御は、精密工業、食品工業、繊維
工業、ビル管理上等で大変重要であり、それを検知する
感湿素子としては、従来次のような材料を用いたものが
知られている。Controlling the relative humidity in the air is very important in the precision industry, food industry, textile industry, building management, etc., and the moisture sensing elements that detect it have traditionally been made of the following materials. The one used is known.
(1) Se, Ge, Si等の金属あるいは半導体
(21 Sn, Fe, Ti等の金属の酸化物(31
A1203等の多孔質金属酸化物f41 L i C
I等の電解質塩
(5)有機または無機材料からなる高分子厚膜しかしな
がら、これらの各種材料を用いた感湿素子は、いずれも
保守が大変であったり、あるいは信頼性や応答性に問題
がある等、満足される状態にはない。(1) Metals such as Se, Ge, Si, etc. or semiconductors (21) Metal oxides (31) such as Sn, Fe, Ti, etc.
Porous metal oxide f41 L i C such as A1203
Electrolyte salts such as I (5) Polymer thick films made of organic or inorganic materials However, moisture-sensitive elements using these various materials are difficult to maintain, or have problems with reliability and responsiveness. However, we are not in a satisfactory state.
例えば、上記(2)の金属酸化物を用いる場合には、そ
れの成形にプレスや焼結が行われるが、均質なプレスが
問題であったりあるいは焼結時の割れなどの問題がみら
れる。また、工程上では問題なく成形されても、耐久性
、換言すれば信頼性にも問題がある。For example, when using the metal oxide of (2) above, pressing and sintering are performed to shape it, but there are problems with homogeneous pressing or cracking during sintering. Further, even if the molding is performed without any problem in the process, there is also a problem in durability, in other words, in reliability.
また、上記(5)の高分子厚膜を用いた場合には、材料
面では廉価であるものの、溶剤等の薬品による劣化や信
頼性の低下等の問題点がみられる。更に、吸湿部分の体
積が大きいため、高速化及び高感度化にも限界があり、
キャパシタを構成して、容量または電気伝導度を測定す
る場合に、その値が小さいことにより、検出系の安定度
が重要な課題となっている。ここで、高分子厚膜とは、
スピンコード等の方法により得られる厚みが数千Å以上
の高分子膜のことである。Further, when the thick polymer film of (5) above is used, although it is inexpensive in terms of material, there are problems such as deterioration due to chemicals such as solvents and a decrease in reliability. Furthermore, because the volume of the moisture-absorbing part is large, there are limits to increasing speed and sensitivity.
When measuring capacitance or electrical conductivity by configuring a capacitor, the stability of the detection system is an important issue because the value is small. Here, what is a polymer thick film?
A polymer film with a thickness of several thousand angstroms or more obtained by methods such as spin coding.
しよ゛と る 占
ラングミュア・ブロジェット法を利用して得られたポリ
イミド系薄膜は、その規則的な構造のため水分の脱着速
度が速く、また、微量の水分の存在により誘電率、ある
いは電気伝導度が大きく変化する。更には、薄膜である
ため、素子を構成した場合の容量および電気伝導度が比
較的大きく、検出系の低コスト化にもつながる。Polyimide thin films obtained using the Langmuir-Blodgett method have a regular structure that allows them to desorb water quickly, and the presence of a small amount of water reduces the dielectric constant or electrical property. Conductivity changes significantly. Furthermore, since it is a thin film, the capacitance and electrical conductivity of the device are relatively large, which leads to a reduction in the cost of the detection system.
本発明者等は、こうしたラングミュア・ブロジェット法
を利用して得られたポリイミド系薄膜に注目し、保守、
信頼性、応答性等に問題のみられる従来の!3湿素子の
かわりに、感度および応答性のいずれの点においてもす
ぐれ、また、耐熱性、耐薬品性にすぐれたポリイミド系
薄膜を含む、薄膜感湿素子を提供することを目的とする
。The present inventors have focused on polyimide thin films obtained using the Langmuir-Blodgett method, and have
Conventional methods have problems with reliability, responsiveness, etc. An object of the present invention is to provide a thin-film moisture-sensitive element containing a polyimide-based thin film that is excellent in both sensitivity and responsiveness, and has excellent heat resistance and chemical resistance, instead of the 3-humidity element.
占 ° るための
本発明は、我々が特願昭61−275533に提案した
、両性ポリイミド系前駆体をラングミュア・ブロジェッ
ト法により、種々基板上に累偵し、それに続くイミド化
反応によって作られたポリイミド系薄膜を利用して、薄
膜感湿素子を作製することによってなされたものである
。ポリイミド系薄膜の厚さは、薄膜全体にわたる水分の
脱着が容易に起こるように、1000Å以下、好ましく
は500Å以下、更に好ましくは300Å以下の厚さが
良い。The present invention, which we proposed in Japanese Patent Application No. 61-275533, is based on the method of depositing an amphoteric polyimide precursor on various substrates using the Langmuir-Blodgett method, followed by an imidization reaction. This was achieved by fabricating a thin-film moisture-sensitive element using a polyimide-based thin film. The thickness of the polyimide thin film is preferably 1000 Å or less, preferably 500 Å or less, and more preferably 300 Å or less so that moisture can be easily desorbed over the entire thin film.
金属/感湿膜/金属(以下MIMという)構造の薄膜感
湿素子の模式図を、第1〜2図に示す。Schematic diagrams of a thin film moisture sensitive element having a metal/moisture sensitive membrane/metal (hereinafter referred to as MIM) structure are shown in FIGS. 1 and 2.
絶縁基板(Is)あるいは半導体基板(’SS)を用い
、その上に金属、感湿膜、金属の順に形成される。用い
る金属および半導体は、酸化被膜を形成するものでも良
い。また、上部電極となる金属は、水分の出入りを容易
とするため、多孔質で、なお且つ金属的な電気伝導度を
有する程度の厚みでなくてはならない。An insulating substrate (Is) or a semiconductor substrate ('SS) is used, and a metal, a moisture sensitive film, and a metal are formed in this order. The metal and semiconductor used may be those that form an oxide film. Further, the metal serving as the upper electrode must be porous and thick enough to have metal-like electrical conductivity in order to facilitate the entry and exit of moisture.
金属/感湿膜/半導体(以下Misという)構造の薄膜
感湿素子の模式図を、第3〜4図に示す。Schematic diagrams of a thin film moisture sensitive element having a metal/moisture sensitive film/semiconductor (hereinafter referred to as Mis) structure are shown in FIGS. 3 and 4.
半導体基板(S S)あるいは電極(M)を持つ絶縁基
板(Is)上に形成された半導体膜(S)を用い、その
上に、感湿膜、金属の順に形成される。A semiconductor film (S) formed on a semiconductor substrate (SS) or an insulating substrate (Is) having an electrode (M) is used, and a moisture sensitive film and a metal are formed thereon in this order.
用いる金属および半導体は、酸化被膜を形成するもので
も良い。また、上部電極となる金属は、水分の出入りを
容易とするため、多孔質で、なお且つ金属的な電気伝導
度を有する程度の厚みでなくてはならない。The metal and semiconductor used may be those that form an oxide film. Further, the metal serving as the upper electrode must be porous and thick enough to have metal-like electrical conductivity in order to facilitate the entry and exit of moisture.
さらに、上部電極は開口部を有し、その開口部より水分
等の出入りが可能な構造をもち、例えば櫛形や渦巻状の
電極を用いることができる。Further, the upper electrode has an opening, and has a structure that allows water to enter and exit through the opening, and for example, a comb-shaped or spiral-shaped electrode can be used.
これらのMIM、及びMIS型の素子は、ラングミュア
・ブロジェット法で得られたポリイミド系薄膜が、数人
の厚さでも良好な電気絶縁性を持ち、一般に使用される
薬品におかされないことより、耐薬品性に優れたキャパ
シター、つまり薄膜感湿素子となる。また、ポリイミド
系樹脂が高耐熱性であることより、通常感湿素子を使用
する温度では、全く劣化しないキャパシター、つまり薄
膜感湿素子となる。These MIM and MIS type elements are made of polyimide thin films obtained by the Langmuir-Blodgett method, which have good electrical insulation properties even at a thickness of several people, and are not affected by commonly used chemicals. It becomes a capacitor with excellent chemical resistance, that is, a thin film moisture-sensitive element. Furthermore, since the polyimide resin has high heat resistance, it becomes a capacitor, that is, a thin film moisture sensitive element, which does not deteriorate at all at the temperatures at which humidity sensitive elements are normally used.
発肌■作■二立米
本発明に係る薄膜感湿素子は、ラングミュア・ブロジェ
ット法を利用して得られたポリイミド系薄膜が、湿度に
、対して迅速に感応するという性質を有効に利用し、更
に、同薄股が耐熱性、耐薬品性に優れているという性質
を利用したものである。The thin film moisture-sensitive element according to the present invention effectively utilizes the property that a polyimide thin film obtained using the Langmuir-Blodgett method quickly responds to humidity. Furthermore, the thin crotch has excellent heat resistance and chemical resistance.
この発明により、温度、薬品等への耐性がすぐれ、高感
度で高速応答性の感湿薄膜素子の提供が可能となった。This invention has made it possible to provide a moisture-sensitive thin film element with excellent resistance to temperature, chemicals, etc., high sensitivity, and high-speed response.
また、素子を構成した場合の容量および電気伝導度が比
較的大きく、検出系の低コスト化も達成できる。Furthermore, the capacitance and electrical conductivity of the device are relatively large, and the cost of the detection system can be reduced.
夫犯仮 次に実施例によって、本発明を説明する。Husband provisional Next, the present invention will be explained by examples.
実施例1
ガラス基板上に、アルミニウムを蒸着して電極を形成し
た基板の上に、下図に示す両性ポリイミド前駆体(P
f P)をラングミュア・ブロジェット法により41層
累積した。その後、400°CでPIP
1時間熱処理を施しイミド化を完結させた。得られたポ
リイミド薄膜は、200人である。形成されたポリイミ
ド薄膜の上に、電極幅lOOμm、電極間隔500μm
の櫛形の金を200人の厚さに抵抗加熱法で蒸着して、
MIM型の薄膜感湿素子を作製した。Example 1 An amphoteric polyimide precursor (P
fP) was accumulated in 41 layers by the Langmuir-Blodgett method. Thereafter, PIP heat treatment was performed at 400°C for 1 hour to complete imidization. The obtained polyimide thin film has a thickness of 200. On the formed polyimide thin film, electrode width lOOμm, electrode spacing 500μm
The comb-shaped gold is deposited to a thickness of 200 mm using the resistance heating method.
An MIM type thin film moisture sensitive element was manufactured.
この程度の厚さの金は、多孔質で、なお且つ金属的な電
気伝導度を有し、水分の出入りが容易である。Gold of this thickness is porous and has metallic electrical conductivity, allowing moisture to easily enter and exit.
このようにして構成された薄膜感湿素子を、湿度試験瓶
に取りつけ、YHP4192Aインピーダンスアナライ
ザーに接続した後、周波数を一定(IKHz)に保ちな
がら、11〜92%の相対湿度に対応するキャパシタン
スの変化を20℃の温度で測定した。得られた結果を、
第5図のグラフに示す。この結果から、キャパシタンス
により相対湿度を高感度で測定することができる感湿素
子としての有効性が確かめられた。もちろん、電気伝導
度によっても、対応湿度を測定することができる。After attaching the thin film moisture sensitive element thus constructed to a humidity test bottle and connecting it to a YHP4192A impedance analyzer, the change in capacitance corresponding to relative humidity from 11 to 92% was measured while keeping the frequency constant (IKHz). was measured at a temperature of 20°C. The obtained results,
This is shown in the graph of FIG. This result confirmed its effectiveness as a humidity sensing element that can measure relative humidity with high sensitivity using capacitance. Of course, the corresponding humidity can also be determined by electrical conductivity.
更に、このMIM型の薄膜感湿素子は、種々の相対湿度
に対して20℃から80℃の範囲で、キャパシタンス、
電気伝導度の温度分散が殆どなく、温度補正をせずに用
いることが可能なことも確かめられた。Furthermore, this MIM type thin film moisture sensitive element has a capacitance,
It was also confirmed that there is almost no temperature dispersion in electrical conductivity, and that it can be used without temperature correction.
相対湿度の変化に対する、キャパシタンス、電気伝導度
の変化は、10秒以内に完結し、この薄膜感湿素子が高
速応答性を有することも確かめられた。Changes in capacitance and electrical conductivity in response to changes in relative humidity were completed within 10 seconds, confirming that this thin film moisture-sensitive element had high-speed response.
比較例1
上部電極の厚さを500人とすることだけを変えて、実
施例1と同様のMIM型の薄膜感湿素子を作製した。こ
の程度の厚さの金は、かなり緻密である。相対湿度の変
化に対する、キャパシタンス、電気伝導度の変化は、1
分程度で完結し、上部電極が緻密な場合、素子の応答性
が低下することがわかった。Comparative Example 1 A MIM type thin film moisture sensitive element similar to that of Example 1 was produced, except that the thickness of the upper electrode was 500 mm. Gold of this thickness is quite dense. Changes in capacitance and electrical conductivity with respect to changes in relative humidity are 1
It was found that the response of the device decreased when the upper electrode was dense.
比較例2
ポリイミド薄膜の厚さを2000人とすることだけを変
えて、実施例1と同様のMIM型の薄膜感湿素子を作製
した。相対湿度の変化に対する、キャパシタンス、電気
伝導度の変化は、1分程度で完結し、感湿膜が厚い場合
、素子の応答性が低下することがわかった。Comparative Example 2 A MIM type thin film moisture sensitive element similar to that of Example 1 was produced, except that the thickness of the polyimide thin film was 2000 mm. It was found that changes in capacitance and electrical conductivity with respect to changes in relative humidity were completed in about 1 minute, and that when the moisture-sensitive film was thick, the response of the element decreased.
実施例2
金でオーミック接触を取り、裏面電極を形成したシリコ
ン基板に、実施例1と同様の方法でポリイミド薄膜を形
成した。形成されたポリイミド薄膜の上に、電極幅10
0μm、電極間隔500μmの櫛形の金を200人の厚
さに抵抗加熱法で蒸着して、MIS型の薄膜感湿素子を
作製した。Example 2 A polyimide thin film was formed in the same manner as in Example 1 on a silicon substrate on which ohmic contact was made with gold and a back electrode was formed. On the formed polyimide thin film, an electrode width of 10
A MIS type thin film moisture sensitive element was fabricated by depositing comb-shaped gold with a thickness of 0 μm and an electrode spacing of 500 μm to a thickness of 200 μm using a resistance heating method.
このようにして構成された薄膜感湿素子も、実施例1の
MIM型の薄膜感湿素子と同様の性質を有し、薄膜感湿
素子としての有効性が確かめられた。The thin film moisture sensitive element constructed in this manner also had the same properties as the MIM type thin film moisture sensitive element of Example 1, and its effectiveness as a thin film moisture sensitive element was confirmed.
尚、本実施例において、感湿膜の形成法としてラングミ
ュア・ブロジェット法を用いたが、−船釣に知られてい
る回転円筒法や水平付着法を用いても良い。また、両性
ポリイミド前駆体としては、PIPに限定するものでは
なく、熱環化反応によリイミド環を生じる、特願昭61
−275533に提案した両親媒性ポリマーであれば、
いかなる物質でも良い。In this example, the Langmuir-Blodgett method was used as a method for forming the moisture-sensitive film, but a rotating cylinder method or a horizontal deposition method known for boat fishing may also be used. In addition, the amphoteric polyimide precursor is not limited to PIP, but can be used to produce a polyimide ring through a thermal cyclization reaction.
-275533 proposed amphiphilic polymer,
It can be any substance.
第1図〜第2図は、MIM型の薄膜感湿素子の模式図で
あり、第3図〜第4図は、MIS型の薄膜感湿素子の模
式図である。第5図は、実施例1に記載したMIM型の
薄膜感湿素子の、相対湿度に対するキャパシタンスの変
化を示すグラフである。
(符号の説明)
M・・・・・1罹
■・・・・感湿膜
S・・・・半導体
Is・・・絶縁性基板
SS・・・半導体基板
第5図
aオ彩兄度
第
図
第2図1 to 2 are schematic diagrams of an MIM type thin film moisture sensitive element, and FIGS. 3 to 4 are schematic diagrams of an MIS type thin film moisture sensitive element. FIG. 5 is a graph showing changes in capacitance with respect to relative humidity of the MIM type thin film moisture sensitive element described in Example 1. (Explanation of symbols) M...1 Moisture sensitive film S...Semiconductor Is...Insulating substrate SS...Semiconductor substrate Figure 5 Figure 2
Claims (4)
薄膜感湿素子。(1) A thin film moisture sensitive element containing a polyimide thin film having a thickness of 1000 Å or less.
ェット法により基板上に累積し、それに続くイミド化反
応により作製されたポリイミド系薄膜を含む特許請求の
範囲第1項記載の薄膜感湿素子。(2) The thin film moisture-sensitive element according to claim 1, comprising a polyimide thin film produced by accumulating an amphoteric polyimide precursor on a substrate by the Langmuir-Blodgett method and subsequent imidization reaction.
有する程度の厚みの上部電極を備えた、金属/感湿膜/
金属構造の素子からなり、前記ポリイミド系薄膜を感湿
膜として含む特許請求の範囲第1項または第2項記載の
薄膜感湿素子。(3) A metal/moisture-sensitive membrane/with an upper electrode that is porous and has an opening and is thick enough to have metallic electrical conductivity.
3. The thin-film moisture-sensitive element according to claim 1, which is made of a metal-structured element and includes the polyimide-based thin film as a moisture-sensitive film.
伝導度を有する程度の厚みの上部電極を備えた金属/感
湿膜/半導体構造の素子からなり、前記ポリイミド系薄
膜を感湿膜として含む特許請求の範囲第1項または第2
項記載の薄膜感湿素子。(4) Consisting of an element having a metal/moisture-sensitive film/semiconductor structure, which has an upper electrode that is porous and has an opening and is thick enough to have metallic electrical conductivity, and the polyimide thin film is made of a moisture-sensitive material. Claim 1 or 2 including as a film
Thin-film moisture-sensitive element described in .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14976888A JPH022912A (en) | 1988-06-17 | 1988-06-17 | Thin film moisture sensitive element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14976888A JPH022912A (en) | 1988-06-17 | 1988-06-17 | Thin film moisture sensitive element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH022912A true JPH022912A (en) | 1990-01-08 |
Family
ID=15482312
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14976888A Pending JPH022912A (en) | 1988-06-17 | 1988-06-17 | Thin film moisture sensitive element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH022912A (en) |
-
1988
- 1988-06-17 JP JP14976888A patent/JPH022912A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Chen et al. | Humidity sensors: a review of materials and mechanisms | |
| JP3744539B2 (en) | Gas detection method and apparatus | |
| JPH0675052B2 (en) | Capacitance type humidity sensor | |
| EP0395349B2 (en) | Moisture sensitive element | |
| Neri et al. | Humidity sensing properties of Li–iron oxide based thin films | |
| JP2002328109A (en) | Hydrogen gas detection element and method for manufacturing the same | |
| JP2005031090A (en) | Humidity sensor and its manufacturing method | |
| Braik et al. | Development of a capacitive chemical sensor based on Co (II)-phthalocyanine acrylate-polymer/HfO 2/SiO 2/Si for detection of perchlorate | |
| JPH04361149A (en) | Humidity sensor | |
| Sberveglieri et al. | Capacitive humidity sensor with controlled performances, based on porous Al2O3 thin film growm on SiO2-Si substrate | |
| JPH06281610A (en) | Humidity sensor, alcohol sensor or ketone sensor | |
| JP2007139447A (en) | Thin film moisture permeability measuring apparatus and moisture permeability measuring method | |
| JP3047137B2 (en) | Manufacturing method of humidity sensor | |
| US9976975B2 (en) | Method of making thin film humidity sensors | |
| JPH03223648A (en) | thin film moisture sensing element | |
| Park et al. | Fabrication of porous polymeric film for humidity sensing | |
| JP2002328108A (en) | Hydrogen gas detection element and method for manufacturing the same | |
| JPS6358249A (en) | Humidity detecting element | |
| JPH03202798A (en) | Thin film moisture sensitive element | |
| JPH0862168A (en) | Nitrogen oxide detector | |
| JP2002090329A (en) | Humidity sensor and its manufacturing method | |
| JP3047138B2 (en) | Manufacturing method of humidity sensor | |
| JPH03122591A (en) | Thin film moisture-sensitive element | |
| JPS63313047A (en) | Gas sensor and its production | |
| JPH06213853A (en) | Manufacture of gas detecting element |