JPH0239104A - Color filter and its production - Google Patents

Abstract

PURPOSE:To efficiently and economically produce the color filters which have high surface strength and smoothness and excellent accuracy by dyeing the high-polymer material of an inorg. active film layer provided in fine pores on a transparent substrate by a photolithography method to desired pattern shapes. CONSTITUTION:The transparent inorg. active film layer 2 having the many fine pores consisting of an inorg. metal oxide is formed on the transparent substrate 1. The high-polymer material 3 having the excellent dyeability is impregnated in the fine pores and a photoresist is coated over the entire surface on the inorg. active film layer 2 and is dried; thereafter, the photoresist is patterned by using the original plate for working to form resist images. The resist images are first subjected to dyeing of a 1st color by a direct due or oil soluble dye and thereafter, the resist images serving as the mask are stripped and removed. The color filters consisting of multiple colors such as red, green and blue are formed if the stages of patterning, dyeing and removing the photoresist are carried out a required number of times for the 2nd and subsequent colors. The color filters which have the excellent smoothness and high strength, are simplified in stages as well and are free from unequal dyeing and insufficient densities are obtd. in this way.

Description

[Detailed description of the invention] [Industrial application field]

The present invention relates to a color filter used in various display devices such as liquid crystal display devices, and a method for manufacturing the same.More specifically, the present invention relates to a color filter with high surface strength and smoothness, and excellent precision, and a method for manufacturing the color filter efficiently. and relates to an economical manufacturing method.

[Prior Art] Conventional color filters and their manufacturing methods include the following. (a) A polymer film with excellent dyeability provided on a transparent substrate is patterned by photolithography, and the resulting pattern is dyed. (b) The same polymer film with excellent dyeability provided on a transparent substrate is partially dyed in different colors. (c) i! An inorganic active film layer provided on a bright substrate is partially dyed using photolithography. The photolithography method referred to here is a method in which a processing original plate having a desired image is used, and a resist image is formed on a workpiece using this original plate, a photoresist, and light. [Section 8] However, each of the above-mentioned color filters and their manufacturing methods had the following problems.In other words, the color filter in (a) is a polymer film with a patterned surface; There is unevenness corresponding to the thickness of the film, and due to the physical properties of the polymer, the strength is far inferior to that of an inorganic active film, which has excellent hardness.In addition, in (b), the dyed color filter is smooth. Although the dye has excellent properties, bleed and migration occur because the dye easily penetrates not only in the thickness direction of the polymer membrane but also in the lateral direction.Also, as in (a), due to the physical properties of the polymer, In addition, in (C), the photoresist impregnates into the micropores of the active film layer during the photolithography process, and it takes time and effort to remove unnecessary resist l-, and the method of removal is difficult. If the photoresist remains vague, it becomes an impurity, resulting in a color filter with decreased color purity, insufficient density, or uneven dyeing. Therefore, the purpose of this invention is to solve the above problems. [Problems] [Means for Solving the Problem] In order to achieve the above object, the present invention is configured as follows.That is, the color filter of the present invention has the following configuration.
An inorganic active film layer with micropores impregnated with a polymer material is provided on a transparent substrate, and the polymer material and inorganic active 11Q
It is characterized in that both Ji or only the polymer material is dyed into a desired pattern shape by photolithography. Moreover, the method for manufacturing the color filter is characterized by having the following steps. (a) Step of forming an inorganic active film layer on a transparent substrate. (b) A step of impregnating a polymer material with excellent dyeability into the micropores of the inorganic active membrane layer. (c) A step of dyeing both the polymer material and the inorganic active film layer or only the polymer material into a pattern using photolithography, and finally peeling off and removing the resist image produced by photolithography. Hereinafter, the present invention will be explained in detail with reference to the drawings. FIGS. 1 and 2 are schematic cross-sectional views showing an embodiment of the color filter of the present invention. In other words, a transparent substrate 1, an inorganic active film layer 2 formed thereon, a polymeric material 3 contained in a large number of micropores of this inorganic active film layer 2 and dyed in a pattern shape, and a polymer material 3 dyed in a pattern shape. A black mask 4 for blocking light between the colored patterns and an inorganic active film N.
An overcoat layer 5 over 2 is shown. Next, the 'lia method of the color filter of this invention is shown. First, the inorganic active film layer 2 is formed on the transparent substrate 1 (the third
(See figure (a)). The transparent substrate 1 may be one used in various display devices such as a liquid crystal display, and is made of a heat-resistant material on which an inorganic active film layer 2 can be formed. For example, a glass plate, a synthetic resin plate, a synthetic resin film, or the like is used, and glass plates such as soda lime glass, boron silicate glass, and barium borosilicate glass are suitable. Next, a transparent inorganic active film N2 having a large number of micropores made of a metal inorganic oxide such as activated alumina, activated silica, or a mixture of both is formed on the transparent substrate 1. As a method for forming the inorganic active film layer 2 on the transparent substrate 1, the following sol-gel method is suitable. That is, the general formula M(ORI)m(OR2)nXpYq・
...I (However, in formula 1, R1 and R2 represent at least one element selected from the group consisting of magnesium, calcium, zirconium, titanium, hafnium, germanium, yttrium, aluminum, gallium, tin, and silicon. represent a hydrogen atom, an alkyl group, or an acyl group, which may be the same or different. a+'n'p'q is an integer from 0 to 8, and
+q is equal to the valence of the gate. It is obtained by hydrolyzing an aqueous solution of the compound represented by ) and further peptizing the resulting sol, applying it to the transparent substrate 1, and firing it. Examples of the compound represented by the general formula (2) include tetraethyl silicate, aluminum triisopropoxide, titanium tetrabutoxide, zirconium tetrabutoxide, and partially hydrolyzed products thereof. Further, the aqueous liquid contains a necessary amount of water, a hydrolysis catalyst such as hydrochloric acid, sulfuric acid, nitric acid, acetic acid, and alcohol. Methods for applying this sol onto the transparent substrate 1 include a bar coating method, a roll coating method, a spinner coating method, a dipping method, and the like. After applying the above-mentioned sol onto the transparent substrate 1, it was dried for 30 minutes.
The inorganic active film layer 2 can be obtained by firing at a temperature of 0 to 600°C. The thickness of the inorganic active film N2 is 1
It is preferable to set the thickness to about 20 μm. It is also possible to use aluminum oxide obtained by anodic oxidation of an aluminum film provided on a transparent substrate using a sputtering method or a vapor deposition method. The inorganic active membrane N2 thus produced has a large number of micropores on its surface, and a polymeric material 3 having excellent dyeing properties is impregnated into these micropores (see FIG. 3(b)). As this polymeric material 3, a polymeric material 3 having excellent dyeability such as gelatin, glucasein, nylon, polyvinyl alcohol, polyvinylpyrrolidone, etc. is used. The polymer material 3 can be impregnated into the fine pores of the inorganic active film layer 2 by a printing method, a spray method, a dipping method, a hand-painting method, an inkjet method, a spinner method, a roll coating method, etc. It is provided in a film form on the membrane, and then the surface is washed, and the polymer material 3 is impregnated only into the micropores, and then dried. In this way, the polymer material 3 is contained in the micropores. The inorganic active film layer 2 is obtained and dyed into a pattern shape using a resist image provided by the photolithography method shown below (see Fig. 3(c)).First, the color filter is designed according to its purpose. A processed raw board with a desired image pattern is prepared.A photoresist is coated on the entire surface of the inorganic active film layer 2 containing the polymer material 3 by a dipping method, a spray method, a roll coating method, etc., and then dried. patterning the photoresist by exposing and developing a color filter pattern using the processing original plate;
Form a resist image. Next, the areas not masked by the resist image are first coated with acid dye, acid mordant dye, aluminum dye, direct dye, or oil-cooling dye using an appropriate method such as dipping, spraying, printing, or coating. After dyeing the first color, the resist image that served as a mask is peeled off and removed. After the second color, the photoresist is patterned in this way.
If you repeat the dyeing and photoresist removal process the necessary number of times,
It is a color filter consisting of multiple colors such as red, green, and blue. As a method for obtaining a patterned dyed area, in addition to the above, as shown below, the entire surface of the inorganic active film layer 2 impregnated with the polymeric material 3 is first dyed with a first color, see FIG. 4(c). ), form a resist image on the part where you want that color,
Decolorize the unnecessary areas with a decolorizing agent such as nitric acid, sulfuric acid, or sodium subzinc oxide (see Figure 4 (d)), dye the entire bleached area with two colors, and apply that color on the areas where it is needed. There is also a method in which each process of forming a resist image (see FIG. 4(e)) and decoloring is repeated a necessary number of times and then finally removing the resist image (see FIG. 4). On the inorganic active film layer 2 dyed in the pattern shape obtained by the above method, if necessary, a black mask 4 is added to increase the contrast as a color filter, such as in the gaps between the color patterns. (See Figure 3(d)). The formation method is electroless plating method or PVD.
A metal film is provided by a method (vapor deposition method, sputtering method, ion blating method, etc.) and then etched (see Figure 1), or a black part is provided by patterning and dyeing using a photolithography method. There is also a method of using it as a black mask 4 (see FIG. 2). Note that this blank mask 4 may be provided in a portion where a color pattern is not required before impregnating the inorganic active film layer 2 with the polymer material 3, or alternatively, the blank mask 4 may be provided in a portion where a color pattern is not required before the inorganic active film layer 2 is impregnated with the polymer material 3.
After impregnating the polymeric material 3 into the fine Y, and before dyeing the color pattern, the color pattern may be provided in areas where the color pattern is not required. Further, in order to prevent the dye from scattering, dissipating, fading due to humidity, etc., an overcoat layer 5 may be provided on the inorganic active film layer 2 dyed with a color pattern, if necessary. Materials for the overcoat layer 5 include acrylic resin,
Hard and highly transparent resins such as melamine resins, epoxy resins, silicone resins, unsaturated polyester resins, isocyanate resins, polyimides, polysiloxanes, or ultraviolet curable resins can be used. Alternatively, it may be coated with an inorganic material such as lithium silicate or sodium silicate.

【Example】

First, an activated alumina film layer with a thickness of 5 to 10 μm is formed on a transparent glass substrate with a thickness of 1.1 mm by a sol-gel method. Next, 10χ-gelatin water, a polymeric material with excellent dyeing properties? 8? 1 glass substrate with activated alumina film layer in e
After being immersed for 0 minutes, it was washed with water and dried for 30 minutes in an atmosphere of 80°C to impregnate gelatin into the micropores in the activated alumina membrane layer. Next, photoresist OMR-85 (manufactured by Tokyo Ohka Co., Ltd.)
is provided on the entire surface of the activated alumina H layer, a blue patterned original plate for processing is superimposed thereon, and exposed from above to form a resist image of a negative blue pattern. Then, it was immersed in a blue dye 5anodal Blue G (manufactured by Sandoz) bath at a bath temperature of 60°C for about 10 minutes to dye the part of the activated alumina film layer impregnated with the polymeric material that was not covered with the resist image. , washed with water and dried. Next, the photoresist was removed using trichloride. Subsequently, a photoresist OMR-85 was provided on the entire surface of the alumina film layer, a green pattern processing original plate was prepared in the same way as when the blue pattern was provided, the photoresist was patterned, and a green dye Aluminiurn Gr was applied.
een L, IAN (manufactured by Sandoz) bath temperature 40℃
The sample was immersed in water for about 10 minutes to dye the portion of the alumina film layer containing the polymer material that was not covered with the resist image, washed with water, and then dried. The photoresist was then stripped with Triclean. Subsequently, a negative pattern resist image of a red pattern was formed using the same photolithography method as described above, and red dye A was applied.
lusinius Rad GIJN (manufactured by Sandoz)
The photoresist was immersed in a bath at a bath temperature of 40°C for about 10 minutes to dye the part of the alumina membrane layer impregnated with the polymer material that was not covered with the resist image, washed with water, dried, and then the photoresist was peeled off with trichlene. did. next[? After patterning the resist using a photomask designed to leave the resist in the required areas of , G, and B, it was placed in a black dye TacB1aek-SLH (manufactured by Okuno Pharmaceutical Co., Ltd.) at a bath temperature of about 40°C. After immersing for 30 minutes and dyeing the parts not covered with the resist image black, washing with water and drying, the resist image was peeled off with trichlene and thermosetting melamine resin was applied to a thickness of 0.5 to 1.5 mm. 0μ
A color filter was completed by coating with M to form an overcoat layer. Example 2 A 1.1 mm thick transparent glass substrate (on top of the layer, an alumina film layer with an I'W of 5 to 10 μm was formed by a sol-gel method. - A glass substrate having an alumina film layer was immersed in an aqueous gelatin solution for 10 minutes, then washed with water and dried in an atmosphere of 80°C for 30 minutes to impregnate gelatin into the micropores in the alumina film layer. A glass substrate having an alumina film layer impregnated with a polymeric material is immersed in a blue dye 5anodal Blue G (manufactured by Sandoz Co.) bath for about 10 minutes at a bath temperature of about 60'C.
The entire surface of the alumina membrane layer was dyed blue, washed with water, and then dried. Next, photoresist OMR-85 (manufactured by Tokyo Ohka Co., Ltd.)
is provided on the entire surface of the alumina film layer, a processing original plate with a pattern of 1'7 colors is superimposed thereon, and exposed from above to form a resist image of a positive blue pattern. Next, it was immersed in 30% nitric acid for 30 seconds at room temperature to decolorize the blue dye in the portions of the alumina film layer that were not covered with the resist image. Next, add lun+inium Green to the green dye.
IJN (manufactured by Sandoz) bath at a bath temperature of about 40°C for about 10
After soaking for a minute, the decolored part of the alumina membrane layer was dyed green, washed with water, and dried. Next, a resist image was formed on the area other than the area to be dyed red, and immersed in 30% nitric acid for 30 seconds at room temperature to decolorize the green dye on the area of the alumina film layer that was not covered with the resist image. Next, red dye Aluminum Red GWN
(manufactured by Sandoz Co., Ltd.) for about 10 minutes at a bath temperature of about 40°C, the bleached portion of the alumina membrane layer was dyed red, washed with water, and then dried. Next, after peeling off the remaining photoresist with trichlene, thermosetting melamine resin was applied to a thickness of 0°5 to 1.0 μm.
A color filter was completed by coating with M to form an overcoat layer.

【Effect of the invention】

In the color filter of this invention, an inorganic active film layer impregnated with a polymeric material is provided on a transparent substrate, and both the polymeric material and the inorganic active film layer, or only the polymeric material, is pattern-dyed by photolithography. It is characterized by the fact that it has been In other words, the micropores of the inorganic active membrane layer are impregnated with a polymeric material with excellent dyeing properties in advance and then dyed. Since it is protected by an inorganic active film, it has excellent surface smoothness and can reproduce the same high strength as an inorganic active film layer. Further, since the dye is impregnated into each independent micropore in the inorganic active film layer, a pattern with excellent precision can be obtained without bleeding or migration of the dye after dyeing. In addition, if this color filter manufacturing method is used, the polymer material is impregnated into the micropores of the inorganic active film layer, so the photoresist used in photolithography can directly penetrate into the active film layer, unlike conventional methods. Because I have nothing to do,
Photoresist can be easily and completely removed from the inorganic active film layer. Therefore, the process is simplified, and a color filter without uneven dyeing or insufficient density can be obtained as a product.

[Brief explanation of the drawing]

1 and 2 are schematic cross-sectional views showing one embodiment of the color filter of the present invention, and FIGS. 3(a) to 3(d)
FIG. 2 is a cross-sectional view showing an example of the manufacturing process of a color filter obtained by the present invention. Figure 4 (a) to (r)
FIG. 2 is a cross-sectional view showing another example of the manufacturing process of a color filter obtained by the present invention. DESCRIPTION OF SYMBOLS 1...Transparent substrate, 2...Inorganic active film layer, 3...Polymer material, 4...Blank mask, 5...Otze coat layer. Patent applicant: Nissha Printing Co., Ltd.

Claims (1)

[Claims] 1. An inorganic active film layer (2) whose micropores are impregnated with a polymer material (3) is provided on a transparent substrate (1), and the polymer material (3) and the inorganic active film layer (2) are provided on a transparent substrate (1). A color filter characterized in that both of the film layers (2) or only the polymer material (3) are dyed into a desired pattern shape by photolithography. 2. A method for manufacturing a color filter, characterized by sequentially performing the following steps. (a) Step of forming an inorganic active film layer (2) on a transparent substrate (1). (b) A step of impregnating the micropores of the inorganic active membrane layer (2) with a polymeric material (3) having excellent dyeability. (c) Both the polymer material (3) and the inorganic active film layer (2) or only the polymer material (3) are dyed into a pattern shape using a photolithography method, and finally a resist produced by the photolithography method is used. The process of removing images. 3. The inorganic active film layer (2) has the general formula M(OR1)m(OR2)nXpYq...I (wherein I, M is magnesium, calcium, zirconium, titanium, hafnium, germanium, yttrium, Indicates at least one element selected from the group consisting of aluminum, gallium, tin, and silicon.R1
and R2 each represent a hydrogen atom, an alkyl group, or an acyl group, and they may be the same or different. X and Y each represent a hydrogen atom, a chlorine atom, or a hydroxyl group, and they may be the same or different. m・
n・p・q are integers from 0 to 8, and m+n+p+q is equal to the valence of M. ) The sol obtained by hydrolyzing an aqueous solution of the compound represented by ) and peptizing the compound is coated on the transparent substrate 1 and fired. Method of manufacturing color filters.