JPH0241784A - Laser beam marking device - Google Patents

Laser beam marking device

Info

Publication number
JPH0241784A
JPH0241784A JP63189636A JP18963688A JPH0241784A JP H0241784 A JPH0241784 A JP H0241784A JP 63189636 A JP63189636 A JP 63189636A JP 18963688 A JP18963688 A JP 18963688A JP H0241784 A JPH0241784 A JP H0241784A
Authority
JP
Japan
Prior art keywords
film
mask pattern
pattern
laser beam
writing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63189636A
Other languages
Japanese (ja)
Inventor
Koichi Hiratsuka
平塚 宏一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP63189636A priority Critical patent/JPH0241784A/en
Publication of JPH0241784A publication Critical patent/JPH0241784A/en
Pending legal-status Critical Current

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  • Laser Beam Processing (AREA)

Abstract

PURPOSE:To obtain a marking device which does not take time to control printing and a mask by providing a pattern writing means to write a mask pattern in a transmission film with a reflection film, the other laser beam oscillator and a beam shaping part. CONSTITUTION:A laser beam oscillator 11 is a laser beam oscillator to produce the mask pattern and a laser beam emitted from the laser beam oscillator 11 is expanded by a beam expander 12. A focus is formed and scanned on the transmission film 18 with the reflection film by a galvanic type scanner 13 and a condensing lens 14 and the reflection film is removed to a desired mask pattern shape. This formed mask pattern is fed into film protective glass 19 by a film feed mechanism 20. A laser beam emitted from a laser beam oscillator 17 is shaped by the beam shaping part 16 and projected on the mask pattern fed into the film protective glass 19 via a reflection mirror 15 and the image of the transmitted pattern is formed on the machining surface 22 by an image formation lens 21.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、半導体/、oツケージ上に印字するマーキン
グ装置に関し、特にレーザ発振器を使用しだレーザマー
キング装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a marking device for printing on semiconductor/O-tsuka cages, and more particularly to a laser marking device using a laser oscillator.

〔従来の技術〕[Conventional technology]

従来、この種のレーザマーキング装置は、第3図に示す
ように、レーザ発振器31と1発振ビームを整形するビ
ーム整形部32と、このビーム整形によって整形された
ビームをガラスマスク33に照射し1反射鏡34を介し
て結像レンズ35により、加工面36にパターンを結像
させるものであった。
Conventionally, this type of laser marking apparatus, as shown in FIG. 3, includes a laser oscillator 31, a beam shaping section 32 that shapes one oscillation beam, and a glass mask 33 that irradiates the beam shaped by this beam shaping. The pattern was imaged on the processing surface 36 by an imaging lens 35 via a reflecting mirror 34.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上述した従来のレーザマーキング装置は、所望スルツク
ターンをマーキングするためにガラスマスク33を交換
したシ1作成したシするのに手間がかかり、又、ガラス
マスクの管理にもかなりの時間を要するという欠点を有
していた。
The above-mentioned conventional laser marking device has the disadvantage that it takes a lot of time to create a screen 1 in which the glass mask 33 is replaced in order to mark a desired pattern, and it also takes a considerable amount of time to manage the glass mask. had.

したがって本発明は、印字をするのに手間が掛らず且つ
マスクの管理に時間の掛らぬマーキング装置を提供しよ
うとするものである。
Therefore, it is an object of the present invention to provide a marking device that does not take much time to print and does not take much time to manage the mask.

〔課題を解決するための手段〕[Means to solve the problem]

本発明によれば2表面が反射膜で覆われ下地がレーザ光
を透過する反射膜付き透過フィルムをフィルム保護ガラ
スで支えて長さ方向に移動させるフィルム送り手段と、
レーザ発振器、ビームエックスパンダ、ガルバノ型スキ
ャナ、及び集光レンズを有し、前記反射膜付き透過フィ
ルムにマスクパターンを書き込むパターン書込み手段と
、もう1つのレーザ発振器及びビーム整形器を有し、前
記フィルム保護ガラスの所定の位置に前記書き込i ;
h だマスクパターンを覆うに足るビームを投射するレ
ーザビーム形成手段と、前記書き込まれたマスクパター
ンが前記所定の位置にある時に前記ビームの該マスクパ
ターン部分を透過した・ぐターンを加工面に結像する結
像手段とを備えたレーザマーキング装置が得られる。
According to the present invention, a film feeding means for supporting a transparent film with a reflective film, the surface of which is covered with a reflective film and whose base is transparent to laser light, supported by a film protective glass and moved in the length direction;
It has a laser oscillator, a beam expander, a galvano type scanner, and a condensing lens, and has a pattern writing means for writing a mask pattern on the transmission film with a reflective film, and another laser oscillator and a beam shaper, and the film The writing i at a predetermined position on the protective glass;
(h) a laser beam forming means for projecting a beam sufficient to cover the mask pattern; and a laser beam forming means for projecting a beam sufficient to cover the mask pattern; A laser marking device is obtained, comprising an imaging means for imaging.

〔実施例〕〔Example〕

第1図は2本発明の一実施例の構成図である。 FIG. 1 is a block diagram of an embodiment of the present invention.

レーザ発振器11はマスクパターンを作成するためのレ
ーザ発振器であり、このレーザ発振器から出射されたビ
ームは、ビームエキスパンダ12ニよシ拡ケられ、ガル
バノ型スキャナ13及び焦光レンズ14により反射膜付
き透過フィルム18上に焦点を結んで走査され、所望す
るマスク・やターンの形状に反射膜が除去される。この
反射膜付き透過フィルム18上に形成されたマスクパタ
ーンは、フィルム送り機構20によりフィルム保護ガラ
ス19の間に送シ込まれる。
The laser oscillator 11 is a laser oscillator for creating a mask pattern, and the beam emitted from this laser oscillator is expanded by a beam expander 12 and then coated with a reflective film by a galvano scanner 13 and a focusing lens 14. The light is focused on the transparent film 18 and scanned, and the reflective film is removed in the shape of a desired mask or turn. The mask pattern formed on the reflective film-attached transmission film 18 is fed between the film protection glasses 19 by the film feeding mechanism 20.

レーザ発振器17から出射されたレーザ光はフィルム保
護がラス19に送り込まれたマスクパターンに、ビーム
整形部16で整形したビームを反射鏡15を介して照射
する。透過したパターンは結像レンズ21により加工面
22に結像させる。
The laser beam emitted from the laser oscillator 17 is shaped by the beam shaping section 16 and irradiated onto the mask pattern fed into the film protection lath 19 via the reflecting mirror 15 . The transmitted pattern is imaged on the processing surface 22 by the imaging lens 21.

第2図は本発明の第2の実施例の構成図である。FIG. 2 is a block diagram of a second embodiment of the present invention.

この図の構成要素で第1図と同じものには同じ参照数字
を付しである。レーザ発振器11はマスクパターンを作
成するためのレーザ発振器であシ。
Components in this figure that are the same as in FIG. 1 are given the same reference numerals. The laser oscillator 11 is a laser oscillator for creating a mask pattern.

このレーザ発振から出射されたビームはビームエキスパ
ンダ22で拡げられガルバノ型スキャナ13及び焦光レ
ンズ14.グイクロイックミラー25を介して反射膜付
きフィルム18上に集光走査されマスクパターンを形成
する。形成されたマスクパターンは実施例1同様フィル
ム送シ機構20でフィルム保護ガラス19の間に送り込
まれる。
The beam emitted from this laser oscillation is expanded by a beam expander 22 and sent to a galvano type scanner 13 and a focusing lens 14. The light is condensed and scanned onto the reflective film-coated film 18 via the guichroic mirror 25 to form a mask pattern. The formed mask pattern is fed between the film protective glasses 19 by the film feeding mechanism 20 as in the first embodiment.

レーザ発振機17は、レーザ発振器11と異なる波長を
有し、ビーム整形部16でビームが整形され、グイクロ
イックミラー25を介してマスクパターンに照射され、
結像レンズ21によシ、加工面22に結像される。この
実施例2では異なる波長のレーザを使用するので、マス
クパターン書き込み部と結像部の光路を1本化すること
ができ。
The laser oscillator 17 has a different wavelength from the laser oscillator 11, and the beam is shaped by the beam shaping section 16 and irradiated onto the mask pattern via the gicroic mirror 25.
An image is formed on the processing surface 22 by the imaging lens 21. In this second embodiment, since lasers with different wavelengths are used, the optical paths of the mask pattern writing section and the imaging section can be made into one.

光学系が簡略化できる利点がある。This has the advantage that the optical system can be simplified.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明は、レーザ発振器とビームエ
キスパンダガルバノ型スキャナ及び焦光レンズから構成
されるマスクパターン書き込み部によシ1反射膜付き透
過フィルム上にマスク・母ターンを形成しフィルム送り
機構でフィルム保護ガラスの間に送り込み、レーザ発振
器とビーム整形部及び反射鏡、結像レンズから構成され
る結像部によって加工面に79ターンを結像させること
によシ、所望のマスクパターンが短時間で作シ出すこと
ができ、また、フィルム送り機構により、マスクパター
ンの交換も簡単に行う効果がある。更に反射膜付き透過
フィルムに形成されたマスクパターンは巻き取ることが
できるので、マスクパターンがまとめ易くなシ、管理が
容易になるという効果がある。
As explained above, the present invention uses a mask pattern writing unit consisting of a laser oscillator, a beam expander galvanometer type scanner, and a focusing lens to form a mask/mother turn on a transparent film with a reflective film, and then transport the film. The desired mask pattern is created by feeding the film between the protective glass using a mechanism and imaging 79 turns on the processing surface by the imaging section consisting of a laser oscillator, beam shaping section, reflecting mirror, and imaging lens. Mask patterns can be produced in a short time, and the film feeding mechanism allows mask patterns to be easily exchanged. Furthermore, since the mask pattern formed on the reflective film-attached transmission film can be rolled up, the mask pattern is not easily grouped together and can be easily managed.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明のレーザマーキング装置の第1の実施例
の構成図、第2図は本発明の第2の実施例の構成図、第
3図は従来装置の構成図である。 記号の説明:11・・・レーザ発振器、12・・・ビー
ムエキスパンダ、13・・・ガルバノ型スキャナ。
FIG. 1 is a block diagram of a first embodiment of a laser marking device of the present invention, FIG. 2 is a block diagram of a second embodiment of the present invention, and FIG. 3 is a block diagram of a conventional device. Explanation of symbols: 11... Laser oscillator, 12... Beam expander, 13... Galvano type scanner.

Claims (1)

【特許請求の範囲】[Claims] (1)表面が反射膜で覆われ下地がレーザ光を透過する
反射膜付き透過フィルムをフィルム保護ガラスで支えて
長さ方向に移動させるフィルム送り手段と、 レーザ発振器、ビームエックスパンダ、ガルバノ型スキ
ャナ、及び集光レンズを有し、前記反射膜付き透過フィ
ルムにマスクパターンを書き込むパターン書込み手段と
、 もう1つのレーザ発振器及びビーム整形器を有し、前記
フィルム保護ガラスの所定の位置に前記書き込まれたマ
スクパターンを覆うに足るビームを投射するレーザビー
ム形成手段と、 前記書き込まれたマスクパターンが前記所定の位置にあ
る時に前記ビームの該マスクパターン部分を透過したパ
ターンを加工面に結像する結像手段とを備えたレーザマ
ーキング装置。
(1) A film feeding means that moves a transmissive film with a reflective film whose surface is covered with a reflective film and whose base is transparent to the laser beam in the length direction while supporting it with a film protective glass, a laser oscillator, a beam expander, and a galvano type scanner. , and a pattern writing means having a condensing lens and writing a mask pattern on the transmission film with a reflective film, and another laser oscillator and a beam shaper, the pattern writing means having a condensing lens and writing a mask pattern on the transmission film with a reflective film, and having a pattern writing means for writing a mask pattern on the transmission film with a reflective film, and having another laser oscillator and a beam shaper, the pattern writing means has a condenser lens, and has a pattern writing means for writing a mask pattern on the transmission film with a reflective film, and has another laser oscillator and a beam shaper, and has a pattern writing means for writing a mask pattern on the transmission film with a reflective film, and has a pattern writing means for writing a mask pattern on the transparent film with a reflective film, and has another laser oscillator and a beam shaper, a laser beam forming means for projecting a beam sufficient to cover the written mask pattern; and a laser beam forming means for projecting a beam sufficient to cover the written mask pattern, and a laser beam forming means for forming an image of the pattern transmitted through the mask pattern portion of the beam on the processing surface when the written mask pattern is at the predetermined position. A laser marking device comprising an image means.
JP63189636A 1988-07-30 1988-07-30 Laser beam marking device Pending JPH0241784A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63189636A JPH0241784A (en) 1988-07-30 1988-07-30 Laser beam marking device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63189636A JPH0241784A (en) 1988-07-30 1988-07-30 Laser beam marking device

Publications (1)

Publication Number Publication Date
JPH0241784A true JPH0241784A (en) 1990-02-09

Family

ID=16244614

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63189636A Pending JPH0241784A (en) 1988-07-30 1988-07-30 Laser beam marking device

Country Status (1)

Country Link
JP (1) JPH0241784A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005101487A1 (en) * 2004-04-19 2005-10-27 Eo Technics Co., Ltd. Laser processing apparatus
CN109048057A (en) * 2018-09-04 2018-12-21 沈阳飞机工业(集团)有限公司 One kind beating calibration method on glass components

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005101487A1 (en) * 2004-04-19 2005-10-27 Eo Technics Co., Ltd. Laser processing apparatus
US7688492B2 (en) 2004-04-19 2010-03-30 Eo Technics Co., Ltd. Laser processing apparatus
CN109048057A (en) * 2018-09-04 2018-12-21 沈阳飞机工业(集团)有限公司 One kind beating calibration method on glass components

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