JPH024239U - - Google Patents

Info

Publication number
JPH024239U
JPH024239U JP8268988U JP8268988U JPH024239U JP H024239 U JPH024239 U JP H024239U JP 8268988 U JP8268988 U JP 8268988U JP 8268988 U JP8268988 U JP 8268988U JP H024239 U JPH024239 U JP H024239U
Authority
JP
Japan
Prior art keywords
etching
end point
data
dry etching
detection device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8268988U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8268988U priority Critical patent/JPH024239U/ja
Publication of JPH024239U publication Critical patent/JPH024239U/ja
Pending legal-status Critical Current

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  • Drying Of Semiconductors (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の実施例1を示すブロツク図、
第2図は実施例2のブロツク図、第3図は従来の
終点検出装置を示すブロツク図である。 1……エツチング室、2……終点検出部、3…
…ドライエツチング装置、4b……終点信号演算
部、5……ペンレコーダ、6……検出信号A/D
コンバータ、7……データバンク、8……データ
入力装置。
FIG. 1 is a block diagram showing Embodiment 1 of the present invention;
FIG. 2 is a block diagram of a second embodiment, and FIG. 3 is a block diagram showing a conventional end point detection device. 1... Etching chamber, 2... End point detection section, 3...
...Dry etching device, 4b...End point signal calculation section, 5...Pen recorder, 6...Detection signal A/D
converter, 7...data bank, 8...data input device.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] ドライエツチング装置における終点検出装置に
おいて、サンプルエツチングデータを記憶する手
段と、該記憶手段から必要なサンプルエツチング
データを読み出し、そのデータに基づいてドライ
エツチングのシユミレーシヨンを行い、実際のエ
ツチング時での最適エツチング終了点を演算する
手段とを有することを特徴とするドライエツチン
グ装置の終点検出装置。
An end point detection device in a dry etching apparatus includes means for storing sample etching data, reading necessary sample etching data from the storage means, performing dry etching simulation based on the data, and performing optimum etching during actual etching. An end point detection device for a dry etching apparatus, comprising means for calculating an end point.
JP8268988U 1988-06-22 1988-06-22 Pending JPH024239U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8268988U JPH024239U (en) 1988-06-22 1988-06-22

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8268988U JPH024239U (en) 1988-06-22 1988-06-22

Publications (1)

Publication Number Publication Date
JPH024239U true JPH024239U (en) 1990-01-11

Family

ID=31307432

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8268988U Pending JPH024239U (en) 1988-06-22 1988-06-22

Country Status (1)

Country Link
JP (1) JPH024239U (en)

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