JPH0243321A - Heat treatment and heat treating furnace for grain oriented silicon steel strip - Google Patents

Heat treatment and heat treating furnace for grain oriented silicon steel strip

Info

Publication number
JPH0243321A
JPH0243321A JP19260488A JP19260488A JPH0243321A JP H0243321 A JPH0243321 A JP H0243321A JP 19260488 A JP19260488 A JP 19260488A JP 19260488 A JP19260488 A JP 19260488A JP H0243321 A JPH0243321 A JP H0243321A
Authority
JP
Japan
Prior art keywords
steel strip
silicon steel
temperature
heat
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19260488A
Other languages
Japanese (ja)
Inventor
Susumu Yoshioka
進 吉岡
Masaaki Ueno
上野 雅朗
Hiroshi Gondo
宏 権藤
Kijiro Arikawa
有川 喜次郎
Kazuo Miura
一夫 三浦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Power Ltd
Original Assignee
Babcock Hitachi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Babcock Hitachi KK filed Critical Babcock Hitachi KK
Priority to JP19260488A priority Critical patent/JPH0243321A/en
Publication of JPH0243321A publication Critical patent/JPH0243321A/en
Pending legal-status Critical Current

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  • Heat Treatment Of Sheet Steel (AREA)

Abstract

PURPOSE:To make mass production of the grain oriented silicon steel strip having excellent magnetic characteristics at a low cost by directly energizing the silicon steel strip after cold rolling to heat up the silicon steel strip at a high rate and to hold the same at a high temp. with the strip itself as a heating element. CONSTITUTION:The grain oriented silicon steel strip contg., by weight %, 0.02-0.09% C, 2.5-6.5% Si, 0.005-0.05% S, 0.01-0.20% Mn, etc., and having 0.3-0.4mm thickness is cold rolled. The steel strip is thereafter heated up to 1000-1250 deg.C at >=3 deg.C/sec rate and is held at said temp. for 3-8 hours to improve the magnetic characteristics of this steel strip. The cold rolled silicon steel strip 2 is placed on a heat resistant base 11 and electric power is supplied to the steel strip 1 through energizing terminals 5, 6. The steel strip 1 itself as a heating element is heated up at the high rate and is held at the high temp. The grain oriented silicon steel strip having the excellent magnetic characteristics is mass-produced at the low cost in this way.

Description

【発明の詳細な説明】 「産業上の利用分野] 本発明は、方向性珪素鋼帯の熱処理方法及び熱処理炉に
係わり、特に磁束密度が高く、鉄損の低い方向性珪素鋼
帯を得るのに好適な熱処理方法及びそれを実現するに好
適な熱処理炉に関する。
Detailed Description of the Invention "Industrial Application Field" The present invention relates to a heat treatment method and a heat treatment furnace for a grain-oriented silicon steel strip, and particularly to a grain-oriented silicon steel strip with high magnetic flux density and low iron loss. The present invention relates to a heat treatment method suitable for and a heat treatment furnace suitable for realizing the method.

[従来の技術] C: 0.02〜0.09重量%、Si:2.5〜6.
5重足%、S : 0.005−0.05重量%、M 
n : O,O]〜0.20重量%及び若干の微量成分
を含有する厚さ0.3〜0 、4 +nnの方向性珪素
鋼帯を冷間圧延したあと、真空あるいはH2,A r 
、 N2の雰囲気下で常温から3℃/秒以上の昇温速度
で1000〜1250℃まで昇温し、その温度に3〜8
時間保持することによって上記方向性珪素鋼帯の磁気特
性を改善する方法(特願昭62−3270号)が提案さ
れている。
[Prior Art] C: 0.02 to 0.09% by weight, Si: 2.5 to 6.
5 weight%, S: 0.005-0.05% by weight, M
After cold rolling a grain-oriented silicon steel strip with a thickness of 0.3 to 0,4 + nn containing 0.20% by weight and some trace components, it is rolled in a vacuum or in H2, Ar.
, Raise the temperature from room temperature to 1000 to 1250 °C at a heating rate of 3 °C/sec or more in an N2 atmosphere, and keep at that temperature for 3 to 8 seconds.
A method has been proposed (Japanese Patent Application No. 62-3270) of improving the magnetic properties of the grain-oriented silicon steel strip by holding it for a period of time.

従来、上記のような高速昇温及び高温保持の方法として
、赤外線によるふく耐加熱法(例えば、真空理工株式会
社製赤外線ゴールドイメージ炉)、あるいは及び外部か
らの熱伝導による加熱方法(例えば、前山公夫ばか3名
、珪素鋼用回転焼鈍炉:川崎製鉄技報、15巻、4号、
p、296〜300 (1983))が採用されている
。たとえば、赤外線加熱炉ではその中心に上記方向性珪
素鋼帯を置き、鏡面体により赤外線を反射、該銅帯に集
中させて高速昇温及び高温保持しようとする方法である
Conventionally, methods for rapidly increasing and maintaining high temperatures as described above include the infrared heating method (e.g., infrared gold image furnace manufactured by Shinku Riko Co., Ltd.) or the heating method using external heat conduction (e.g., Maeyama's Three Kimio fools, Rotary annealing furnace for silicon steel: Kawasaki Steel Technical Report, Volume 15, No. 4,
p., 296-300 (1983)) has been adopted. For example, in an infrared heating furnace, the above-mentioned grain-oriented silicon steel strip is placed in the center, and the infrared rays are reflected by a mirror surface and concentrated on the copper strip, thereby raising the temperature at a high speed and maintaining the high temperature.

[発明が解決しようとしている課題] 昇温速度3℃/秒以上において、昇温速度を高くすれば
するほど被熱処理物である珪素鋼帯の磁気特性が改善さ
れるにも関わらず、上記の赤外線加熱法では被熱処理物
の大きさにもよるが、後述の発明者らの実施例では6℃
/秒の昇温速度がその限界であった。そのうえ被加熱物
の寸法が大きくなると熱線の集中が被熱処理物全体にわ
たらなくなり、昇温速度に不均一を生じ、結果として磁
気特性の改善が難しくなるという問題点がある。
[Problem to be solved by the invention] At a heating rate of 3°C/sec or higher, the higher the heating rate, the better the magnetic properties of the silicon steel strip to be heat treated. In the infrared heating method, it depends on the size of the object to be heat treated, but in the inventors' examples described below, the heating temperature was 6°C.
The temperature increase rate of 1/sec was the limit. Moreover, when the size of the object to be heated increases, the concentration of hot rays does not spread over the entire object to be heat-treated, resulting in non-uniform heating rate, and as a result, there is a problem that it becomes difficult to improve the magnetic properties.

熱伝導を主体とする加熱炉においても、被熱処理物が大
きくなると昇温速度に対して熱伝導速度が遅いことから
、さらに高速昇温及び均一・温度分布の確保が困難とな
り、同様に磁気特性を十分に改善出来ないという問題点
がある。
Even in heating furnaces that mainly use heat conduction, as the object to be heat treated becomes larger, the heat conduction rate is slower than the temperature increase rate, making it difficult to increase the temperature at a faster rate and ensure uniform temperature distribution. There is a problem that it cannot be improved sufficiently.

本発明の目的は上記の従来技術の欠点をなくし、被熱処
理物である方向性珪素鋼帯の寸法が大きくなっても、ま
た、その熱処理量が大きくなっても6℃/秒以上の昇温
速度が確保でき、しかも昇温速度に不均一性を生じさせ
ない熱処理方法及び熱処理炉を提供することである。
The purpose of the present invention is to eliminate the above-mentioned drawbacks of the prior art, and to achieve a temperature increase of 6°C/second or more even when the size of the grain-oriented silicon steel strip that is the object to be heat treated becomes large, and even when the amount of heat treatment becomes large. It is an object of the present invention to provide a heat treatment method and a heat treatment furnace which can ensure a high heating rate and do not cause non-uniformity in the heating rate.

すなわち、磁束密度が高く、鉄損の低い方向性珪素鋼帯
を得、かつスケールアップに耐え得る高速昇温及び高温
保持製実現する熱処理方法及び熱処理炉を提供すること
である。
That is, it is an object of the present invention to provide a heat treatment method and a heat treatment furnace that can obtain a grain-oriented silicon steel strip with high magnetic flux density and low iron loss, and achieve rapid temperature rise and high temperature maintenance that can withstand scale-up.

[課題を解決するための手段] 上記の目的を達成するために本発明は、被熱処理物であ
る冷間圧延したあとの珪素鋼帯に直接電気を通じ、珪素
鋼帯自身を発熱体とするジュール熱によって高速昇温及
び高温保持を行なうようにしたものである。
[Means for Solving the Problems] In order to achieve the above object, the present invention provides a joule system that directly conducts electricity to a cold-rolled silicon steel strip, which is a heat-treated object, and uses the silicon steel strip itself as a heating element. It uses heat to quickly raise the temperature and maintain the high temperature.

[作用] 本発明の典型的な例によれば、冷間圧延後における幅5
0mm、厚さ0.1nn、長さ5mの珪素鋼帯の電気抵
抗は0.55Ωであり、該珪素鋼帯に通電することによ
る発生熱量は、たとえば、電圧17Vにおいて毎秒0.
13k c a lであり、熱損失を無視すると約り℃
/秒の昇温速度で該珪素鋼帯を室温から1200℃まで
昇温することができる。実際には熱損失が存在するが、
供給電力の増加及び断熱手段によってそれを補うことが
可能であり、従来技術で達成が困難な6℃/秒以上の昇
温速度を十分に確保し得るものである。これは珪素鋼帯
の抵抗率が一般の鉄鋼板に比べて2倍以上高いが故に効
果的にジュール熱を発生でき、実用的加熱が可能である
ことを見いだしたことによるものであり、これが本発明
の発端である。例えば、常温における珪素鋼帯の低効率
は約50μΩ/mであるのに対し、一般の鉄鋼板の抵抗
率は約20μΩ/mである。
[Function] According to a typical example of the present invention, the width 5 after cold rolling
The electrical resistance of a silicon steel strip with a thickness of 0 mm, a thickness of 0.1 nn, and a length of 5 m is 0.55 Ω, and the amount of heat generated by passing electricity through the silicon steel strip is, for example, 0.5 Ω per second at a voltage of 17 V.
13 kcal, which is approximately ℃ if heat loss is ignored.
The temperature of the silicon steel strip can be raised from room temperature to 1200° C. at a heating rate of /second. Although there is actually heat loss,
It is possible to compensate for this by increasing the power supply and using heat insulation means, and it is possible to sufficiently secure a temperature increase rate of 6° C./second or more, which is difficult to achieve with the conventional technology. This is due to the discovery that the resistivity of silicon steel strip is more than twice as high as that of ordinary steel sheets, so it can effectively generate Joule heat, making practical heating possible. This is the beginning of the invention. For example, the low efficiency of a silicon steel strip at room temperature is about 50 μΩ/m, while the resistivity of a general steel plate is about 20 μΩ/m.

さらに本発明は、冷間圧延後の珪素鋼帯の電気抵抗が各
部分で極めて均一であり、したがって昇温速度、温度分
布も各部分によらず均一であるので、熱処理を受けた珪
素鋼帯は磁気特性においてむらのない、高性能のものを
得ることができる。
Furthermore, the present invention is advantageous in that the electrical resistance of the silicon steel strip after cold rolling is extremely uniform in each part, and therefore the heating rate and temperature distribution are also uniform regardless of each part. It is possible to obtain high performance with uniform magnetic properties.

[実施例] 次に図面に基ついて本発明をさらに詳細に説明する。[Example] Next, the present invention will be explained in more detail with reference to the drawings.

第1図は本発明の方法を実施するための直接通電方式熱
処理炉の縦断面図、第2図は第1図の■I平面断面図で
ある。
FIG. 1 is a longitudinal cross-sectional view of a direct current type heat treatment furnace for carrying out the method of the present invention, and FIG. 2 is a plan cross-sectional view of FIG. 1.

コイル状に巻かれた被熱処理物である冷間圧延後の珪素
鋼帯1は、帯状の断熱・電気絶縁体2をその隙間に巻き
込んだ状態で耐熱台11上に置かれ、その両端3,4は
それぞれ通電端子5,6に接続される。断熱・電気絶縁
体2は例えば帯状のアルミナファイバーなどが使用され
る。
A silicon steel strip 1 after cold rolling, which is a coiled material to be heat-treated, is placed on a heat-resistant table 11 with a strip-shaped heat-insulating/electrical insulator 2 wound into the gap, and both ends 3, 4 are connected to current-carrying terminals 5 and 6, respectively. The heat-insulating/electrical insulator 2 is made of, for example, a band-shaped alumina fiber.

それらは釣鐘形状の上蓋12、底板13によって形成さ
れた容器10の中に収納される。通電端子5,6及び熱
電対端子7は、絶縁物14.15及び16によってそれ
ぞれ底板13と電気的に絶縁される。M縁物14,15
及び16は気密材としての役目も果たす。容器10のフ
ランジ部17の気密は○リングパツキン18.18’ 
によって保たれる。19は上蓋12の吊り金具である。
They are housed in a container 10 formed by a bell-shaped top lid 12 and a bottom plate 13. The current carrying terminals 5 and 6 and the thermocouple terminal 7 are electrically insulated from the bottom plate 13 by insulators 14, 15 and 16, respectively. M border 14, 15
and 16 also serve as an airtight material. The airtightness of the flange portion 17 of the container 10 is ensured by the ring seal 18.18'
maintained by Reference numeral 19 denotes a hanging metal fitting for the upper lid 12.

導管及びバルブ21及び22.23及び24.25及び
26は、それぞれ真空排気、ガス供給、ガス排出のため
に設置される。
Conduits and valves 21 and 22, 23 and 24, 25 and 26 are installed for evacuation, gas supply and gas discharge, respectively.

以上の構成による直接通電方式の熱処理炉において、別
置きの電源制御部(図示省略)から通電端子5,6を通
して珪素鋼帯1に電力が供給される。珪素鋼帯1は通電
によりジュール熱を発生し、自ら温度上昇する。珪素鋼
帯1を囲んで巻かれた断熱・電気M縁体2により熱の放
散が防止されているので、供給電力量の変化によって昇
温速度は調節され、従来技術以上の速度で昇温すること
ができる。珪素鋼帯1の温度は熱電対端子7を通して挿
入された白金−白金ロジウム環の熱電対8によって測定
される。高速昇温後の温度保持もまた供給電力量の調節
によって行なわれる。
In the direct energization type heat treatment furnace configured as above, power is supplied to the silicon steel strip 1 through the energization terminals 5 and 6 from a separate power supply control section (not shown). The silicon steel strip 1 generates Joule heat when energized, and its temperature increases by itself. Since heat dissipation is prevented by the heat insulating/electric M frame 2 wrapped around the silicon steel strip 1, the temperature increase rate is adjusted according to changes in the amount of power supplied, and the temperature increases at a rate higher than that of the conventional technology. be able to. The temperature of the silicon steel strip 1 is measured by a platinum-platinum rhodium ring thermocouple 8 inserted through the thermocouple terminal 7. Temperature maintenance after rapid temperature rise is also achieved by adjusting the amount of power supplied.

容器10内を真空雰囲気に保つ場合には、導管及びバル
ブ21及び22を真空装置に接続してガスの排気を行な
う。また、H2,N2. A rガス雰囲気に保つ場合
には導管及びバルブ23及び24から供給し、導管及び
バルブ25及び26から排出する。
When maintaining the inside of the container 10 in a vacuum atmosphere, the conduit and valves 21 and 22 are connected to a vacuum device to exhaust gas. Also, H2, N2. When maintaining an Ar gas atmosphere, it is supplied through conduits and valves 23 and 24, and discharged through conduits and valves 25 and 26.

[具体例] 第1図に示したと同じ構造の本発明になる直接通電方式
の熱処理炉において、温度制御装置を備えた容量8kW
の電源を接続した。被熱処理物として厚さ0.35nw
nの市販の方向性珪素鋼帯を0 、1 nmに冷間圧延
した@ 50 ++wn 、長さ5mのものを、輻10
0 an、厚さ約3nnのアルミナファイバー帯に挟ん
でコイル状に巻き、その両端を通電端子5゜6に接続し
て容器10内に納めた。真空ポンプを導管21に接続し
て容器内の空気を排出し、真空度2X10  ’Tor
rに保持した。
[Specific Example] A direct current type heat treatment furnace according to the present invention having the same structure as shown in Fig. 1 has a capacity of 8 kW and is equipped with a temperature control device.
The power supply was connected. Thickness 0.35nw as heat treated object
A commercially available grain-oriented silicon steel strip with a diameter of 0.1 nm and a length of 5 m was cold-rolled to a thickness of 0.1 nm.
It was sandwiched between alumina fiber bands having a thickness of 0 an and about 3 nn and wound into a coil shape, both ends of which were connected to current-carrying terminals 5.6 and placed in a container 10. A vacuum pump is connected to the conduit 21 to exhaust the air inside the container, and the vacuum level is 2 x 10' Tor.
It was held at r.

上記の条件において、3.3kW及び6.1 k Wの
設定で電力を供給した時の昇温曲線を第3図のA及びB
にそれぞれ示した。第3図に示されるように、供給電力
3.3kW及び6.1kWにおいて、平均昇温速度とし
てそれぞれ8.1°C/秒、及び14°C/秒の平均昇
温速度を得た。この結果は従来技術で達成し得ない昇温
速度を得、しかも供給電力量によって昇温速度が制御し
得ることを示すものである。
Under the above conditions, the temperature rise curves when power is supplied at settings of 3.3 kW and 6.1 kW are shown in A and B in Figure 3.
are shown respectively. As shown in FIG. 3, when the supplied power was 3.3 kW and 6.1 kW, the average temperature increasing rates were 8.1°C/sec and 14°C/sec, respectively. This result shows that a temperature increase rate that cannot be achieved with the prior art can be obtained, and that the temperature increase rate can be controlled by the amount of power supplied.

[比較例コ 従来技術である電気容量12kWの赤外線加熱炉により
@5 mm、厚さ0.1mn、長さ100 nynの珪
素鋼帯を加熱、昇温した時の温度上昇曲線を第3図のC
に示した。得られた平均昇温速度は6.1℃/秒であり
、この値は上記の赤外線加熱炉による最高到達値であっ
た。
[Comparative Example] Figure 3 shows the temperature rise curve when a silicon steel strip of @5 mm, thickness 0.1 mm, and length 100 nyn was heated and heated by an infrared heating furnace with an electric capacity of 12 kW, which is a conventional technology. C
It was shown to. The average temperature increase rate obtained was 6.1° C./sec, which was the highest value achieved by the above-mentioned infrared heating furnace.

該比較例は、本発明がより少ない供給電力で、より大形
の珪素鋼帯を、従来の6°C/秒以」二の昇温速度で容
易に達成できる方法であることを示している。
The comparative example shows that the present invention is a method that can easily achieve larger silicon steel strips with less power supply and at a heating rate faster than the conventional 6°C/sec. .

次に本発明の他の実施例を第4図ないし第7図により説
明する。第1図、第2図と同一部分は同一符号で示す。
Next, another embodiment of the present invention will be described with reference to FIGS. 4 to 7. The same parts as in FIGS. 1 and 2 are designated by the same reference numerals.

第4図は本発明に好適な他の実施例の平面断面図である
。本実施例は隣合う珪素鋼帯1の電気絶縁を、要所に適
宜、セラミック製のスペーサーポール43を挿入して隙
間部を形成することにより行なうこと、断熱をコイル状
に設置した珪素鋼帯1を囲む外周部断熱壁41、及び通
電端子5を囲む内周部断熱壁42によって行なうことを
特徴とする。断熱壁41,4.2の材料はアルミナファ
イバーなどが使用される。これにより中央部領域の断熱
材の充填が不要となるので、熱容量が低減されて昇温の
ための電力量の低減、及び昇温速度の向上に効果を発揮
する。
FIG. 4 is a plan sectional view of another embodiment suitable for the present invention. In this embodiment, electrical insulation between adjacent silicon steel strips 1 is performed by appropriately inserting ceramic spacer poles 43 at key points to form gaps, and silicon steel strips installed in a coil shape are used for insulation. 1 and an inner peripheral heat insulating wall 42 surrounding the current-carrying terminal 5. Alumina fiber or the like is used as the material for the heat insulating walls 41, 4.2. This eliminates the need to fill the central region with a heat insulating material, thereby reducing the heat capacity, which is effective in reducing the amount of power required for temperature rise and improving the temperature rise rate.

第5図もまた本発明に好適な他の実施例の平面断面図で
あり、第4図と異なるのは珪素鋼帯1を囲む外周部断熱
壁、及び通電端子5を囲む内周部断熱壁として熱反射板
51.52を設けたことである。外周部の熱反射板51
の反射面は内部の珪素鋼帯1側に、熱反射板52の反射
面は外側向きにされる。これにより高温の珪素鋼帯1か
らの熱ふく射線は画然反射板により反射され、珪素鋼帯
1は再度加熱されてより高速封温される。さらに外周部
の熱反射板51によって熱損失がより効果的に低減され
る。
FIG. 5 is also a plan sectional view of another embodiment suitable for the present invention, and what is different from FIG. As a result, heat reflecting plates 51 and 52 are provided. Heat reflecting plate 51 on the outer periphery
The reflective surface of the heat reflecting plate 52 is directed toward the inner silicon steel strip 1, and the reflective surface of the heat reflecting plate 52 is directed outward. As a result, the heat radiation from the high-temperature silicon steel strip 1 is reflected by the clear reflection plate, and the silicon steel strip 1 is heated again and sealed at a higher speed. Furthermore, heat loss is reduced more effectively by the heat reflecting plate 51 on the outer periphery.

第6図もまた本発明に好適な他の実施例の平面断面図で
ある。第4図と異なるのは、珪素鋼帯1を端部ポール6
1に巻掛けて往復するようにして充填したことである。
FIG. 6 is also a plan sectional view of another embodiment suitable for the present invention. The difference from Fig. 4 is that the silicon steel strip 1 is connected to the end pole 6.
1 and reciprocated to fill it.

これにより通電端子5,6は断熱壁41の外側に設置す
ることが可能となり、高温に晒されることが少なくなり
劣化、消耗を防ぐことができる。
This allows the current-carrying terminals 5 and 6 to be installed outside the heat insulating wall 41, reducing exposure to high temperatures and preventing deterioration and wear.

第7図もまた他の実施例の平面断面図である。FIG. 7 is also a plan sectional view of another embodiment.

第2図と異なるのは珪素鋼帯1に対して複数対の通電端
子5,6が接続されていることである。
The difference from FIG. 2 is that a plurality of pairs of current-carrying terminals 5 and 6 are connected to the silicon steel strip 1.

[発明の効果コ 本発明方法及び装置によれは珪素銅帯の大形材を、従来
より少ない電力供給量で、しかも従来以上の速度で昇温
することができる。したがって磁気特性に優れた珪素鋼
帯を大量に、しかも低コストで生産することが出来ると
いう効果を発揮する。
[Effects of the Invention] According to the method and apparatus of the present invention, it is possible to heat up a large silicon-copper strip at a faster rate than in the past with a smaller amount of power supplied than in the past. Therefore, silicon steel strips with excellent magnetic properties can be produced in large quantities at low cost.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明方法を実施するための熱処理炉の縦断面
図、第2図は第1図の1−1平面断面図である。第3図
は本発明熱処理炉及び従来技術による珪素鋼帯の昇温曲
線図、第4図、第5図、第6図、第7図は本発明熱処理
炉の他の実施例における平面断面図である。 1 ・珪素鋼帯、2  断熱、絶縁材、5,6通電端子
、12・ 上蓋、13・・・底板、41.4.2・・・
・断熱壁、43 ・・・スペーサーポール、51,52
・ ・反射板。
FIG. 1 is a longitudinal sectional view of a heat treatment furnace for carrying out the method of the present invention, and FIG. 2 is a sectional view taken along line 1-1 in FIG. FIG. 3 is a temperature rise curve diagram of a silicon steel strip according to the heat treatment furnace of the present invention and the prior art, and FIGS. 4, 5, 6, and 7 are plan sectional views of other embodiments of the heat treatment furnace of the present invention. It is. 1. Silicon steel strip, 2. Heat insulation, insulating material, 5, 6 energizing terminal, 12. Upper cover, 13. Bottom plate, 41.4.2.
・Insulation wall, 43 ... Spacer pole, 51, 52
· ·a reflector.

Claims (4)

【特許請求の範囲】[Claims] (1)C:0.02〜0.09重量%、Si:2.5〜
6.5重量%、S:0.005〜0.05重量%、Mn
:0.01〜0.20重量%等を含有する厚さ0.3〜
0.4mmの方向性珪素鋼帯を冷間圧延したあと、常温
から3℃/秒以上の昇温速度で1000〜1250℃ま
で昇温し、その温度に3〜8時間保持して上記方向性珪
素鋼帯の磁気特性を改善する方法において、昇温及び高
温保持手段として、被熱処理物である上記冷間圧延した
あとの珪素鋼帯に直接通電し、珪素鋼帯自身を発熱体と
して高速昇温及び高温保持することを特徴とする方向性
珪素鋼帯の熱処理方法。
(1) C: 0.02~0.09% by weight, Si: 2.5~
6.5% by weight, S: 0.005-0.05% by weight, Mn
: Thickness 0.3~ containing 0.01~0.20% by weight etc.
After cold-rolling a 0.4 mm grain-oriented silicon steel strip, the temperature is raised from room temperature to 1000 to 1250 °C at a heating rate of 3 °C/sec or more, and maintained at that temperature for 3 to 8 hours to achieve the above-mentioned directionality. In a method for improving the magnetic properties of a silicon steel strip, as a means for raising and maintaining a high temperature, electricity is applied directly to the cold-rolled silicon steel strip that is the object to be heat treated, and the silicon steel strip itself is used as a heating element to raise the temperature at high speed. A heat treatment method for a grain-oriented silicon steel strip characterized by maintaining a high temperature and a high temperature.
(2)C:0.02〜0.09重量%、Si:2.5〜
6.5重量%、S:0.005〜0.05重量%、Mn
:0.01〜0.20重量%等を含有する厚さ0.3〜
0.4mmの方向性珪素鋼帯を冷間圧延したあと、常温
から3℃/s以上の昇温速度で1000〜1250℃ま
で昇温し、その温度に3〜8時間保持して上記方向性珪
素鋼帯の磁気特性を改善するための熱処理炉において、
熱電対、さらに真空排気導管、ガス供給導管、ガス排出
導管を備えた真空容器に、コイル状に巻いた珪素鋼帯を
収納し、該コイル相互の隙間に、断熱、電気絶縁帯を巻
き込んで絶縁し、さらに珪素鋼帯に通電端子を接続して
なる直接通電方式の熱処理炉。
(2) C: 0.02~0.09% by weight, Si: 2.5~
6.5% by weight, S: 0.005-0.05% by weight, Mn
: Thickness 0.3~ containing 0.01~0.20% by weight etc.
After cold rolling a 0.4 mm grain-oriented silicon steel strip, the temperature is raised from room temperature to 1000 to 1250 °C at a heating rate of 3 °C/s or more, and maintained at that temperature for 3 to 8 hours to achieve the above directionality. In a heat treatment furnace for improving the magnetic properties of silicon steel strip,
A silicon steel strip wound into a coil is housed in a vacuum container equipped with a thermocouple, a vacuum exhaust conduit, a gas supply conduit, and a gas exhaust conduit, and a heat insulating and electrical insulating strip is wrapped in the gap between the coils for insulation. Furthermore, this is a direct current type heat treatment furnace, which is made by connecting a current-carrying terminal to a silicon steel strip.
(3)特許請求の範囲第(2)項において、コイル状に
巻いた珪素帯相互の隙間にセラミック製のスペーサーポ
ールを挿入してコイル相互の電気絶縁を行なうことを特
徴とする直接通電方式の熱処理炉。
(3) In claim (2), the direct energization method is characterized in that ceramic spacer poles are inserted into the gaps between the silicon bands wound into coils to electrically insulate the coils from each other. Heat treatment furnace.
(4)特許請求の範囲第(2)項において、コイル状に
巻いた珪素鋼帯を囲む外周部断熱壁、及び通電端子を囲
む内周部断熱壁として熱反射板を設けたことを特徴とす
る直接通電方式の熱処理炉。
(4) Claim (2) is characterized in that a heat reflecting plate is provided as the outer peripheral insulation wall surrounding the coiled silicon steel strip and the inner peripheral insulation wall surrounding the current-carrying terminal. Direct current type heat treatment furnace.
JP19260488A 1988-08-03 1988-08-03 Heat treatment and heat treating furnace for grain oriented silicon steel strip Pending JPH0243321A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19260488A JPH0243321A (en) 1988-08-03 1988-08-03 Heat treatment and heat treating furnace for grain oriented silicon steel strip

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19260488A JPH0243321A (en) 1988-08-03 1988-08-03 Heat treatment and heat treating furnace for grain oriented silicon steel strip

Publications (1)

Publication Number Publication Date
JPH0243321A true JPH0243321A (en) 1990-02-13

Family

ID=16294027

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19260488A Pending JPH0243321A (en) 1988-08-03 1988-08-03 Heat treatment and heat treating furnace for grain oriented silicon steel strip

Country Status (1)

Country Link
JP (1) JPH0243321A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4592411A4 (en) * 2022-09-22 2025-12-17 Nippon Steel Corp GRAIN-ORIENTED ELECTRO STEEL SHEET

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4592411A4 (en) * 2022-09-22 2025-12-17 Nippon Steel Corp GRAIN-ORIENTED ELECTRO STEEL SHEET

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