JPH0243377A - Coating and surface treatment for fine particle - Google Patents

Coating and surface treatment for fine particle

Info

Publication number
JPH0243377A
JPH0243377A JP19351888A JP19351888A JPH0243377A JP H0243377 A JPH0243377 A JP H0243377A JP 19351888 A JP19351888 A JP 19351888A JP 19351888 A JP19351888 A JP 19351888A JP H0243377 A JPH0243377 A JP H0243377A
Authority
JP
Japan
Prior art keywords
particles
reaction
raw materials
gaseous raw
uniform
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19351888A
Other languages
Japanese (ja)
Inventor
Seiji Morooka
諸岡 成治
Hiroyuki Ishikawa
博之 石川
Kenichi Otsuka
大塚 研一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP19351888A priority Critical patent/JPH0243377A/en
Publication of JPH0243377A publication Critical patent/JPH0243377A/en
Pending legal-status Critical Current

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  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

PURPOSE:To form a uniform layer on fine particle surface or to apply a uniform surface treatment thereon by supplying gaseous raw materials under a reduced pressure into a reaction treatment chamber contg. the fine particles and keeping the fine particles fluidized, thereby depositing the reaction product of the gaseous raw materials on the fine particle surface. CONSTITUTION:The superfine particles having <=0.1mu grain size are put into the reaction treatment chamber 6 made of a heat and corrosion resistant material and while the particles are heated by a heating furnace 5, the gaseous raw materials are blown from a gas supplying system 2 into the chamber from the bottom. The supply rate of the gaseous raw materials is adjusted by a flow meter 4 to keep the superfine particles in the reaction chamber 6 fluidized and to form a stable fluidized bed 1. The thin layer of the oxide, carbide or nitride formed by the reaction of the gaseous raw materials is formed on the superfine particles to a uniform thickness by which the coating layer without having unequal thicknesses among the superfine particles is formed. The surface of the superfine particles is otherwise subjected to the uniform treatment such as oxidation or reduction.

Description

【発明の詳細な説明】 (産業上の利用分野) この発明は、−11に微粒子につき、粒子径が小さいこ
との故に、特異な性質を示す粉体材料に、さらに別な機
能を与えて応用範囲を広げるための、被覆・表面処理に
関するものである。
Detailed Description of the Invention (Field of Industrial Application) This invention is applied to powder materials that exhibit unique properties due to their small particle size, by giving them additional functions. This relates to coatings and surface treatments to expand the range.

(従来の技術) 特開昭52−19185号公報には、微粒子の表面に化
学蒸着させて均一な薄膜層を形成させる目的のもとに、
CVD装置の反応管内において微粒子をフィルターに捕
捉させ、フィルターに対する微細粒子の捕捉状態を変化
させながら薄膜層の形成を行うことが開示されている。
(Prior Art) Japanese Patent Application Laid-Open No. 19185/1985 discloses that the purpose of chemical vapor deposition on the surface of fine particles to form a uniform thin film layer is as follows.
It is disclosed that fine particles are captured by a filter in a reaction tube of a CVD apparatus, and a thin film layer is formed while changing the state of capture of the fine particles by the filter.

しかしながら微細粒子の捕捉状態を変化させるために、
反応管を反転させるという工程は装置的に複雑な工夫が
必要であって、さらフィルターと共に加熱することから
、フィルターへの析出も避は難く、析出させる物質の有
効利用という点で問題がある上、また反転操作等により
フィルター上に析出した物質が混入する。
However, in order to change the trapping state of fine particles,
The process of inverting the reaction tube requires complicated equipment, and since it is heated together with the filter, precipitation on the filter is unavoidable, which poses a problem in terms of the effective use of the precipitated substance. Also, substances precipitated on the filter due to inversion etc. are mixed in.

また一方、Metallurgical Transa
ction+ 13B625P (1982)にてH,
Yorucu らは、Nbの種粒子に塩化物蒸気の水素
還元によるNb3Sn被膜を形成させるために、常圧の
流動層を用いた結果を報告している。しかしこの場合、
種粒子とは形状の異なる粒子が生成して、均一な被膜が
常圧流動層では得られないことがわかる。
On the other hand, Metallurgical Transa
H in ction+ 13B625P (1982),
reported the results of using a normal pressure fluidized bed to form a Nb3Sn film on Nb seed particles by hydrogen reduction of chloride vapor. But in this case,
It can be seen that particles with a different shape from the seed particles are generated and a uniform coating cannot be obtained in the normal pressure fluidized bed.

ここに流動層を用いることは従来、対象粉末を反応管内
に静置させて被覆処理する場合においてガスと接触しに
くい粉体表面が被覆されないという問題点を克服する方
向で試みられたが、その際、その被膜の均一性に問題が
生じたことを示すものである。
The use of a fluidized bed has been attempted in the past in order to overcome the problem that the powder surface, which is difficult to come into contact with gas, is not coated when the target powder is left stationary in a reaction tube and coated. This indicates that there was a problem with the uniformity of the film.

(発明が解決しようとする課題) 以上のように、熱化学反応を利用した従来の方法におい
ては、個々の粒子表面全体にわたって均一で、しかも粒
子間にもむらのない、不純物の混入しない表面処理を、
容易に効率よく行えないという問題があった。
(Problems to be Solved by the Invention) As described above, in the conventional method using a thermochemical reaction, surface treatment that is uniform over the entire surface of each particle, with no unevenness between particles, and without contamination with impurities. of,
There was a problem that it could not be done easily and efficiently.

(課題を解決するための手段) この発明は上記のような問題点を解決するため、以下の
ような手段によったものである。
(Means for Solving the Problems) In order to solve the above-mentioned problems, the present invention employs the following means.

すなわち微粒子の層にガスを送り込み、同時に真空ポン
プで層内のガスを排気することにより減圧状態で流動層
を形成させる。
That is, a fluidized bed is formed in a reduced pressure state by feeding gas into a layer of fine particles and simultaneously exhausting the gas in the layer using a vacuum pump.

この時に、流動層をある温度に保ち流動化ガスに反応性
ガスを用いることにより流動層内で化学反応させ、生成
物を微粒子表面上に堆積させるか、又は表面で反応させ
て改質を行うのである。
At this time, by keeping the fluidized bed at a certain temperature and using a reactive gas as the fluidizing gas, a chemical reaction is caused within the fluidized bed, and the product is deposited on the surface of the fine particles, or the product is reacted on the surface to modify it. It is.

つまりこの発明は微粒子を減圧下において流動化させな
がら、熱化学反応処理を行うことを特徴とする微粒子の
被覆表面処理方法である。
That is, the present invention is a method for coating and surface treating fine particles, which is characterized by performing a thermochemical reaction treatment while fluidizing the fine particles under reduced pressure.

ここに減圧状態での析出や表面反応を起こさせることに
より各々の粒子表面における不均一性が生じることを回
避させ、さらに粒子を流動化させることにより、流動層
の均一性を利用して、粒子間の不均一性をなくすことが
できることに着目したものである。
By causing precipitation and surface reactions under reduced pressure, non-uniformity on the surface of each particle can be avoided, and by fluidizing the particles, the uniformity of the fluidized bed can be used to improve the particle size. This study focuses on the fact that it is possible to eliminate non-uniformity between the two.

常圧での気相熱化学反応では反応速度が速いため、均一
核生成を起こして粉体を生成したり粒子表面上で不均一
な析出があったりする。しかし、減圧での気相熱化学反
応では、反応する気体の平均自由行程が大きくなり、反
応速度も抑えられることから、均一な析出が粒子表面で
起こるわけである。
Because the reaction rate is fast in gas-phase thermochemical reactions at normal pressure, uniform nucleation occurs to produce powder or non-uniform precipitation occurs on particle surfaces. However, in a gas phase thermochemical reaction under reduced pressure, the mean free path of the reacting gas becomes large and the reaction rate is suppressed, so that uniform precipitation occurs on the particle surface.

また、通常、粉体流動層は、常圧で操作されるが、減圧
状態においても十分流動化すること、さらに超微粒子で
あってもよく流動化することをこの発明は応用している
のである。
Furthermore, powder fluidized beds are normally operated at normal pressure, but this invention applies the fact that they are sufficiently fluidized even under reduced pressure, and that even ultrafine particles can be fluidized well. .

第1図にこの発明の方法を適用する装置の一例を示す。FIG. 1 shows an example of an apparatus to which the method of the present invention is applied.

流動層1にガス供給系2よりガスを送り込み、同時に真
空ポンプ3で排気を行う。
Gas is fed into the fluidized bed 1 from a gas supply system 2, and at the same time it is evacuated using a vacuum pump 3.

ある減圧状態で微粒子が流動化するガス流量にフローメ
ーター4で設定し、流動状態を保持する。
The flow meter 4 is set at a gas flow rate at which the particles become fluidized in a certain reduced pressure state, and the fluidized state is maintained.

流動化ガスには反応性ガスを使用し、加熱炉5により、
耐食性、耐熱性を備えた材質による反応処理槽6内にて
流動層1を、層内で十分熱化学反応が進行し得る温度に
設定する。
A reactive gas is used as the fluidizing gas, and the heating furnace 5
The fluidized bed 1 is set in a reaction treatment tank 6 made of a material having corrosion resistance and heat resistance to a temperature at which a thermochemical reaction can sufficiently proceed within the bed.

とくに常温では液体の反応性ガスを使用する場合には、
キャリアガスを保温又は加熱した気化器7に通し、保温
された配管8を経て流動層1に導く。
Especially when using reactive gases that are liquid at room temperature,
The carrier gas is passed through a vaporizer 7 that is kept warm or heated, and is led to the fluidized bed 1 via a pipe 8 that is kept warm.

表面被覆の場合には、流動層内での熱化学反応による反
応生成物が微粒子表面に析出する。
In the case of surface coating, reaction products from a thermochemical reaction within the fluidized bed are deposited on the surface of the fine particles.

また表面改質の場合も微粒子表面で熱化学反応を起こす
が、微粒子が流動状態であるので、全粒子に均一な改質
が施される。
Also, in the case of surface modification, a thermochemical reaction occurs on the surface of the fine particles, but since the fine particles are in a fluid state, uniform modification is applied to all particles.

流動層内から飛び出した粒子を捕獲するために、フィル
ター9を流動層1の下流側に取り付ける。
A filter 9 is attached to the downstream side of the fluidized bed 1 in order to capture particles flying out from within the fluidized bed.

なお図中10はトラップで真空ポンプ3の保護のため設
ける。
Note that 10 in the figure is a trap provided to protect the vacuum pump 3.

この発明の方法に用いられる粉末は、どんな種類の微粒
子(数十ミクロン以下)でも良<、0.1ミクロン以下
の超微粒子でも良い。また、反応性ガスとしては、粒子
表面を還元するには、水素、−酸化炭素、酸化するには
酸素や水蒸気、炭化するにはメタンガス、窒化するには
窒素やアンモニアガスを用いる。又被覆処理をするには
これらのガスの他に、四塩化チタン、四塩化ケイ素など
の金属塩化物や有機金属化合物などを用い、それらと反
応性ガスとの反応による表面析出を利用する。
The powder used in the method of this invention may be any type of fine particles (several tens of microns or less) or ultrafine particles of 0.1 microns or less. Further, as the reactive gas, hydrogen or carbon oxide is used to reduce the particle surface, oxygen or water vapor is used for oxidation, methane gas is used for carbonization, and nitrogen or ammonia gas is used for nitridation. In addition to these gases, metal chlorides such as titanium tetrachloride and silicon tetrachloride, organometallic compounds, etc. are used for the coating treatment, and the surface precipitation resulting from the reaction between them and the reactive gas is utilized.

(作 用) この発明の方法が適用される装置には可動部がな(、操
作が容易であり、しかも、CVD反応は、粒子の表面で
のみ起こるので、析出物質が粉末として混入することが
ないという利点を有する。
(Function) The apparatus to which the method of the present invention is applied has no moving parts (and is easy to operate, and since the CVD reaction occurs only on the surface of the particles, there is no possibility that precipitated substances will be mixed in as powder). It has the advantage of not being

以下、実施例にもとづいて具体的に説明する。Hereinafter, a detailed description will be given based on examples.

(実施例) 実施例−1) 二酸化チタン(TiO□)の超微粒子(平均粒径0.0
34μm)を第1図で示した流動層(面積約3c+n2
)内に入れ、Ar/TiCl4/ NL/L (比率、
t:i:i:i)からなる混合ガス(流量毎分0.04
pV、;大気圧換算値)を40Torrで流動層1内に
導入し、流動化させた。40Torrにおける流動化ガ
ス速度は4 cm/s’ (実測値)であった。
(Example) Example-1) Ultrafine particles of titanium dioxide (TiO□) (average particle size 0.0
34 μm) as shown in Fig. 1 (area approximately 3c+n2
), Ar/TiCl4/ NL/L (ratio,
t:i:i:i) (flow rate 0.04 per minute
pV (atmospheric pressure equivalent value) was introduced into the fluidized bed 1 at 40 Torr and fluidized. The fluidizing gas velocity at 40 Torr was 4 cm/s' (actual value).

一方電気炉によって流動層1を1100°Cに保つこと
により、次式 %式% であられされる反応を起こさせ、TiO□粒子表面にT
iNを析出させた。得られた粒子の窒素含有量は8.0
%で、サンプルの如何によらず一定値を示した。
On the other hand, by keeping the fluidized bed 1 at 1100°C using an electric furnace, a reaction expressed by the following formula % is caused, and T is applied to the surface of the TiO□ particles.
iN was precipitated. The nitrogen content of the obtained particles was 8.0
%, which showed a constant value regardless of the sample.

また、ESCAによる表面分析の結果、種粒子であるT
iO□の0(酸素)はほとんど検知されなかった。
In addition, as a result of surface analysis by ESCA, the seed particle T
0 (oxygen) of iO□ was hardly detected.

また、EMT観察によりTiO□粒子の1〜1.3倍の
球状粒子が確認された。
Further, EMT observation confirmed that spherical particles were 1 to 1.3 times larger than TiO□ particles.

実施例−2) 一酸化ケイ素(SiO□)の超微粒子(平均粒径0.0
5μm)を実施例−1)と同じ装置により、Ar/5i
C14/CH4(1:1:1)混合ガス(流量毎分0.
2 pV、>を10Torrにて1300°CでSiC
コーティングした。得られた粒子のC含有量は7.1%
でサンプルによらず一定であった。
Example-2) Ultrafine particles of silicon monoxide (SiO□) (average particle size 0.0
5 μm) using the same equipment as in Example-1),
C14/CH4 (1:1:1) mixed gas (flow rate 0.
2 pV, > SiC at 1300°C at 10 Torr
Coated. The C content of the obtained particles was 7.1%
It was constant regardless of the sample.

また、ESCAによる表面分析の結果、種粒子であるS
iO□の0(酸素)はほとんど検知されなかった。
In addition, as a result of surface analysis by ESCA, the seed particles S
0 (oxygen) of iO□ was hardly detected.

また、EMT観察によりSiO□粒子の1〜1.3倍の
球状粒子が確認された。
Further, EMT observation confirmed that spherical particles were 1 to 1.3 times larger than SiO□ particles.

実施例−3) Ti微粉(平均粒径2μm)を窒化処理した。ガスは窒
化ガスを用い、Arガスと1:1に混合し20Torr
で、流動化し、800°Cで反応を起こさせた。得られ
た粉末のN含有量は3.0%でサンプルによらず一定で
あった。
Example 3) Ti fine powder (average particle size 2 μm) was nitrided. The gas used was nitriding gas, mixed 1:1 with Ar gas and heated to 20 Torr.
The mixture was fluidized and reacted at 800°C. The N content of the obtained powder was 3.0%, which was constant regardless of the sample.

比較例−1) 実施例−1)と同じ条件でTiO□超微粒子表面にTi
Nを析出させた。ただし、反応器は流動層のかわりに石
英管を横置きにし、周囲を電気炉で加熱したものを行い
、その中に石英ボートを置きTiO2粉を充填した。1
時間の処理後、ホード取り出し粉末を分析した。粉末の
N含有量は、表面付近で12%、ポート底部では4%で
あった。このような方法では被覆層の厚みが処理位置に
より異なることを示す。
Comparative Example-1) Ti was added to the surface of TiO□ ultrafine particles under the same conditions as Example-1).
N was precipitated. However, instead of a fluidized bed, a quartz tube was placed horizontally in the reactor, the surroundings of which were heated in an electric furnace, and a quartz boat was placed in the reactor and filled with TiO2 powder. 1
After processing for an hour, the hoard was removed and the powder was analyzed. The N content of the powder was 12% near the surface and 4% at the bottom of the port. This method shows that the thickness of the coating layer varies depending on the processing position.

比較例−2) 実施例−1)と同し装置を用い、同一温度、同一ガス組
成で、Ti0z超微粒子を流動化させた。ただし、圧カ
フ60 Torrで反応を起こさせ、表面被覆処理を行
った。処理後の粉末を透過電顕観察をしたところ使用し
た球状のTiO□とは全く異なる形状、晶癖を有する粒
子が数多く見られた。これは均−和から生成したTiN
粒子および、TiO□粒子表面に不均一に析出したTi
Nによるものと考えられ、常圧流動層においては均一な
被覆処理が困難であることがわかった。
Comparative Example 2) Ti0z ultrafine particles were fluidized using the same apparatus as in Example 1) at the same temperature and gas composition. However, the reaction was caused at a pressure cuff of 60 Torr and surface coating treatment was performed. When the powder after the treatment was observed with a transmission electron microscope, many particles with shapes and crystal habits completely different from those of the spherical TiO□ used were observed. This is TiN generated from homogenization.
Ti precipitated unevenly on the particle and TiO□ particle surface
This is thought to be due to N, and it was found that uniform coating treatment was difficult in a normal pressure fluidized bed.

(発明の効果) この発明の方法により、個々の微粒子表面全体にわたっ
て均質で、粒子間にむらがなく、不純物混入のない表面
処理(被覆、改質)が容易、効率よく行えるようになっ
た。
(Effects of the Invention) The method of the present invention makes it possible to easily and efficiently perform surface treatment (coating, modification) that is homogeneous over the entire surface of each fine particle, has no unevenness between particles, and is free from contamination with impurities.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明に従い減圧流動化状態で熱化学反応に
より微粒子の被覆・表面処理を行う要領を示す説明図で
ある。 1・・・流動層 3・・・真空ポンプ 5・・・加熱炉
FIG. 1 is an explanatory diagram showing the procedure for coating and surface treating fine particles by thermochemical reaction in a fluidized state under reduced pressure according to the present invention. 1...Fluidized bed 3...Vacuum pump 5...Heating furnace

Claims (1)

【特許請求の範囲】[Claims] 1、微粒子を減圧下において流動化させながら、熱化学
反応処理を行うことを特徴とする微粒子の被覆・表面処
理方法。
1. A method for coating and surface treatment of fine particles, which comprises performing a thermochemical reaction treatment while fluidizing the fine particles under reduced pressure.
JP19351888A 1988-08-04 1988-08-04 Coating and surface treatment for fine particle Pending JPH0243377A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19351888A JPH0243377A (en) 1988-08-04 1988-08-04 Coating and surface treatment for fine particle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19351888A JPH0243377A (en) 1988-08-04 1988-08-04 Coating and surface treatment for fine particle

Publications (1)

Publication Number Publication Date
JPH0243377A true JPH0243377A (en) 1990-02-13

Family

ID=16309400

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19351888A Pending JPH0243377A (en) 1988-08-04 1988-08-04 Coating and surface treatment for fine particle

Country Status (1)

Country Link
JP (1) JPH0243377A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0712941A1 (en) * 1994-11-18 1996-05-22 Agency Of Industrial Science And Technology Diamond sinter, high-pressure phase boron nitride sinter, and processes for producing those sinters
US5536485A (en) * 1993-08-12 1996-07-16 Agency Of Industrial Science & Technology Diamond sinter, high-pressure phase boron nitride sinter, and processes for producing those sinters

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5536485A (en) * 1993-08-12 1996-07-16 Agency Of Industrial Science & Technology Diamond sinter, high-pressure phase boron nitride sinter, and processes for producing those sinters
EP0712941A1 (en) * 1994-11-18 1996-05-22 Agency Of Industrial Science And Technology Diamond sinter, high-pressure phase boron nitride sinter, and processes for producing those sinters

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