JPH0243866Y2 - - Google Patents

Info

Publication number
JPH0243866Y2
JPH0243866Y2 JP6765284U JP6765284U JPH0243866Y2 JP H0243866 Y2 JPH0243866 Y2 JP H0243866Y2 JP 6765284 U JP6765284 U JP 6765284U JP 6765284 U JP6765284 U JP 6765284U JP H0243866 Y2 JPH0243866 Y2 JP H0243866Y2
Authority
JP
Japan
Prior art keywords
magnetic
magnetic poles
electron
magnetic field
electron beams
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6765284U
Other languages
Japanese (ja)
Other versions
JPS60181366U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6765284U priority Critical patent/JPS60181366U/en
Publication of JPS60181366U publication Critical patent/JPS60181366U/en
Application granted granted Critical
Publication of JPH0243866Y2 publication Critical patent/JPH0243866Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)

Description

【考案の詳細な説明】 本考案は2種以上の材料を同時に蒸発させるよ
うな材料加熱装置の改良に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in a material heating device that evaporates two or more materials at the same time.

高融点金属などの蒸着には加熱源として電子ビ
ームが良く使用されているが、最近このような電
子ビーム蒸着装置を用いて、例えば磁気関連の部
品の蒸着で2種以上の材料を同時に且つなるべく
接近した位置から蒸発させたいと云う要望が高ま
つている。現在市販されている電子ビーム蒸着装
置では、複数個の電子銃を有するものは殆んどな
く、そこで無理に複数個の電子銃を使用して複数
材料の同時加熱可能な装置を構成すると、第1図
a,bに示すようなものになる。第1図aは主要
部の平面図、bはそのX−X断面図であり、1は
坩堝を示す。該坩堝には2つの材料2a,2bが
充填されており、該2つの材料を異なつた電子ビ
ームで加熱・蒸発させる構成である。3a,3b
は第1の偏向器の磁極で、対向して前記坩堝1の
上方に配置されている。該両磁極は強磁性体で形
成され、他端部はヨークにより互いに接合され励
磁コイルにより所定の励磁を受けている。4a,
4bは第2の偏向器の磁極であり、第1の偏向器
と同様に前記坩堝1の上方に対向して配置され且
つ他端部は接合されて単一の磁気回路を形成して
いる。両偏向器の各磁極間には紙面と平行に且つ
上下方向に磁束が発生し、電子ビームの偏向に寄
与する。5a,5bは電子ビーム発生用電子銃の
フイラメントであり、該フイラメントから発生し
た電子線は図示しない加速・集束電極により加速
されてビームEB1及びEB2として取出され、前
記偏向器の各磁界内に導入される。該電子ビーム
は該偏向磁界により図示のように湾曲・偏向を受
けて進行し、前記坩堝1内の材料2a,2bに
夫々投射される。
Electron beams are often used as a heating source for vapor deposition of high-melting point metals, etc., but recently such electron beam evaporation equipment has been used to deposit two or more materials simultaneously and as much as possible, for example for the vapor deposition of magnetic-related parts. There is an increasing desire to evaporate from a close position. There are almost no electron beam evaporation devices currently available on the market that have multiple electron guns, so if you forcefully use multiple electron guns to construct a device that can heat multiple materials simultaneously, The results will be as shown in Figures 1a and b. Fig. 1a is a plan view of the main part, b is a cross-sectional view taken along line X-X, and numeral 1 indicates a crucible. The crucible is filled with two materials 2a and 2b, and the two materials are heated and evaporated using different electron beams. 3a, 3b
are the magnetic poles of the first deflector, which are arranged above the crucible 1 to face each other. Both magnetic poles are made of a ferromagnetic material, the other ends of which are joined to each other by a yoke, and are subjected to a predetermined excitation by an excitation coil. 4a,
4b is a magnetic pole of the second deflector, which, like the first deflector, is disposed facing above the crucible 1, and its other end is joined to form a single magnetic circuit. A magnetic flux is generated between the magnetic poles of both deflectors in the vertical direction and parallel to the plane of the paper, and contributes to the deflection of the electron beam. 5a and 5b are filaments of an electron gun for generating electron beams, and the electron beams generated from the filaments are accelerated by acceleration/focusing electrodes (not shown) and taken out as beams EB1 and EB2, which are introduced into the respective magnetic fields of the deflector. be done. The electron beam is curved and deflected by the deflection magnetic field as shown in the figure, and travels, and is projected onto the materials 2a and 2b in the crucible 1, respectively.

而して、該電子ビームの照射により材料2a,
2bは加熱され、更に昇温して蒸発し、該坩堝1
の上方に置かれた被蒸着材料(図示せず)に蒸着
する。
By irradiating the electron beam, the materials 2a,
2b is heated, further raised in temperature and evaporated, and the crucible 1
The material to be evaporated (not shown) is placed above the evaporator.

前述のように、複数種の材料を同時に蒸着する
場合には、各材料が接近して配置される必要があ
るが、第1図の装置では各偏向器は元来接近して
配置できるように考慮されていないので、図示の
如く両者を比較的接近して置いた場合、両偏向器
の相互磁界干渉が起り、各磁極間には所定強度の
磁界が得られなくなる。従つて、各偏向器による
電子ビームの偏向程度は所定値より小さくなり、
電子ビームの軌道は第1図bの点線で示すように
曲率半径の大きなものとなり、坩堝1の所定材料
位置に投射されなくなる。斯かる理由から両偏向
器はそれ程接近して配設できず、材料2aと2b
を近接して配置すると云う要望を充分に満足する
ことができない。又磁極の形状から電子ビームの
数は第1図の如く2個が限度であり、更に多くの
材料を同時に蒸発したいような場合には全く適用
できない。
As mentioned above, when depositing multiple types of materials at the same time, each material needs to be placed close to each other, but in the apparatus shown in Figure 1, each deflector can originally be placed close to each other. Since this is not taken into consideration, if both deflectors are placed relatively close together as shown in the figure, mutual magnetic field interference will occur between the two deflectors, making it impossible to obtain a magnetic field of a predetermined strength between each magnetic pole. Therefore, the degree of deflection of the electron beam by each deflector is smaller than the predetermined value,
The trajectory of the electron beam has a large radius of curvature, as shown by the dotted line in FIG. For this reason, both deflectors cannot be arranged so close together, and materials 2a and 2b
It is not possible to fully satisfy the demand of arranging the two in close proximity to each other. Furthermore, due to the shape of the magnetic pole, the number of electron beams is limited to two as shown in FIG. 1, and it cannot be applied at all to cases where it is desired to evaporate more materials at the same time.

本考案は上記従来の装置の欠点に鑑み、偏向器
を複数個極めて接近して配置でき、以て2種以上
の金属の同時蒸着が可能な加熱装置を得ることを
目的とするものである。
SUMMARY OF THE INVENTION In view of the above-mentioned drawbacks of the conventional apparatus, it is an object of the present invention to provide a heating apparatus in which a plurality of deflectors can be arranged very close to each other, thereby allowing simultaneous vapor deposition of two or more metals.

本考案の構成上の特徴は強磁性体からなる磁気
回路をを複数個用意し、各磁気回路の両端磁極間
隔に比し隣接する磁気回路の磁極その間隔が小さ
くなるように接近させて配置し、該隣接する磁極
を互いに異なつた極性を有するように励磁して両
磁極間に外部磁界を発生させ、該外部磁界の中に
電子ビームを導入する複数個の電子銃を有し、該
電子銃からの電子ビームを前記磁界により偏向し
て材料上に投射するように構成してなる複数の電
子ビームにより材料を加熱する装置にある。
The structural feature of the present invention is that a plurality of magnetic circuits made of ferromagnetic material are prepared and arranged close to each other so that the distance between the magnetic poles of adjacent magnetic circuits is smaller than the distance between the magnetic poles at both ends of each magnetic circuit. , a plurality of electron guns for exciting the adjacent magnetic poles to have different polarities to generate an external magnetic field between the two magnetic poles and introducing an electron beam into the external magnetic field, the electron gun The present invention provides an apparatus for heating a material with a plurality of electron beams configured to deflect the electron beams from the magnetic field and project the electron beams onto the material.

第2図は本考案の一実施例を示すもので、6,
7,8,及び9は夫々強磁性体から形成された磁
気回路(ヨーク)でその両端には磁極6aと6
b、7aと7b、8aと8b及び9aと9bが形
成されている。各磁気回路の磁極(例えば6a)
は相互に隣接する磁気回路の磁極(例えば7b)
と近接して配置され、該隣接する磁極間隔は各磁
気回路における両磁極(6aと6b)の間隔に比
して小さくなるように配置されている。10,1
1,12及び13は各磁気回路に巻回した励磁コ
イルであり、図示しない直流電源から所定の電流
が供給され、隣接する磁極(6aと7b、7aと
8b……)が逆極性になるように励磁される。こ
れにより該コイルより発生した磁束は点線の矢印
で示すように、ヨーク6→磁極6a→7b→ヨー
ク7→磁極7a→8b→ヨーク8→磁極8a→9
b→ヨーク9→磁極9a→6b→ヨーク6の経路
を通り循環する。この磁束の循環経路において、
各磁極6aと7b、7aと8b、8aと9b及び
9aと6bの間の空隙部には外部磁界が発生し該
磁界が電子線の偏向に寄与する。5a,5b,5
c及び5dは電子銃のフイラメントであり、該フ
イラメントからの電子ビームは前記隣接する磁気
回路の磁極間に形成された外部磁界により大きく
偏向され、第1図bと同様な軌跡を有して坩堝1
の各材料2a,2b,2c及び2dの上に投射さ
れる。
Figure 2 shows an embodiment of the present invention.
7, 8, and 9 are magnetic circuits (yokes) made of ferromagnetic material, and magnetic poles 6a and 6 are provided at both ends of the magnetic circuits (yoke).
b, 7a and 7b, 8a and 8b, and 9a and 9b are formed. Magnetic pole of each magnetic circuit (e.g. 6a)
are magnetic poles of mutually adjacent magnetic circuits (e.g. 7b)
The magnetic poles are arranged in close proximity to each other, and the spacing between adjacent magnetic poles is smaller than the spacing between the two magnetic poles (6a and 6b) in each magnetic circuit. 10,1
1, 12, and 13 are excitation coils wound around each magnetic circuit, and a predetermined current is supplied from a DC power source (not shown) so that adjacent magnetic poles (6a and 7b, 7a and 8b, etc.) have opposite polarities. is excited. As a result, the magnetic flux generated from the coil is as shown by the dotted arrow: yoke 6 → magnetic pole 6a → 7b → yoke 7 → magnetic pole 7a → 8b → yoke 8 → magnetic pole 8a → 9
It circulates through the path b→yoke 9→magnetic pole 9a→6b→yoke 6. In this magnetic flux circulation path,
An external magnetic field is generated in the gaps between the magnetic poles 6a and 7b, 7a and 8b, 8a and 9b, and 9a and 6b, and this magnetic field contributes to the deflection of the electron beam. 5a, 5b, 5
c and 5d are filaments of an electron gun, and the electron beams from the filaments are largely deflected by the external magnetic field formed between the magnetic poles of the adjacent magnetic circuits, and have a trajectory similar to that shown in FIG. 1
are projected onto each of the materials 2a, 2b, 2c and 2d.

このような構成では各磁気回路の両端部磁極が
他の隣接する磁気回路の磁極と近接してその部分
に偏向用の磁界を形成し、各磁気回路の両端部磁
極間には偏向磁界を発生しないようにしているの
で、磁束の漏洩が殆んどなく、効率的に電子ビー
ムの偏向を行なうことができ、又、各偏向磁界を
相互に著しく接近して設けることが可能であるの
で、複数の材料を接近して加熱蒸発させることが
可能となる。更に、上記の様に各磁界が接近でき
るので、従来は2個しか電子銃(電子ビーム)が
使用できなかつたが、本考案では第2図のように
4個も使用でき、さらに個数を増加することも可
能である。勿論、従来と同様に2個でも、3個の
場合でも同様に利用できる。更に又、本考案では
電子銃の個数を増加できることに関連して、電子
銃のいずれかのフイラメントが断線した場合でも
他の電子銃が充分に作動するので、作業を停止す
る必要はなく作業能率を向上することが可能であ
る。又、電子銃を多くできるので第1図や第2図
と異なり、単一の材料を加熱するような場合には
該材料の加熱面を広くでき、効率的な加熱や蒸発
ができる。
In such a configuration, the magnetic poles at both ends of each magnetic circuit are close to the magnetic poles of other adjacent magnetic circuits to form a deflection magnetic field there, and a deflection magnetic field is generated between the magnetic poles at both ends of each magnetic circuit. Therefore, there is almost no leakage of magnetic flux, and the electron beam can be efficiently deflected. Also, since each deflection magnetic field can be placed extremely close to each other, multiple It becomes possible to heat and evaporate materials in close proximity. Furthermore, as each magnetic field can approach each other as described above, conventionally only two electron guns (electron beams) could be used, but with this invention, as many as four can be used as shown in Figure 2, further increasing the number. It is also possible to do so. Of course, it can be used in the same way as in the case of two or three as in the conventional case. Furthermore, in connection with the ability to increase the number of electron guns in the present invention, even if the filament of one of the electron guns breaks, the other electron guns are fully operational, so there is no need to stop work, improving work efficiency. It is possible to improve Further, since the number of electron guns can be increased, unlike in FIGS. 1 and 2, when heating a single material, the heating surface of the material can be widened, and efficient heating and evaporation can be achieved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来考えられた複数電子ビームを使用
する加熱装置の概略を示す図、第2図は本考案の
一実施例を示す平面図である。 1:坩堝、2a〜2d:加熱材料、5a〜5
d:電子銃フイラメント、6,7,8,9:磁気
回路、6a,6b:磁極、7a,7b:磁極、8
a,8b:磁極、9a,9b:磁極、10,1
1,12,13:励磁コイル。
FIG. 1 is a diagram schematically showing a conventional heating device using multiple electron beams, and FIG. 2 is a plan view showing an embodiment of the present invention. 1: Crucible, 2a-2d: Heating material, 5a-5
d: Electron gun filament, 6, 7, 8, 9: Magnetic circuit, 6a, 6b: Magnetic pole, 7a, 7b: Magnetic pole, 8
a, 8b: magnetic pole, 9a, 9b: magnetic pole, 10,1
1, 12, 13: Excitation coil.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 強磁性体からなる磁気回路を複数個用意し、各
磁気回路の両端磁極間隔に比し隣接する磁気回路
の磁極との間隔が小さくなるように接近させて配
置し、該隣接する磁極を互いに異なつた極性を有
するように励磁して両磁極間に外部磁界を発生さ
せ、該外部磁界の中に電子ビームを導入する複数
個の電子銃を有し、該電子銃からの電子ビームを
前記磁界により偏向して材料上に投射するように
構成してなる複数の電子ビームにより材料を加熱
する装置。
A plurality of magnetic circuits made of ferromagnetic material are prepared, and they are arranged close to each other so that the distance between the magnetic poles of the adjacent magnetic circuit is smaller than the distance between the magnetic poles at both ends of each magnetic circuit, and the adjacent magnetic poles are arranged so that the magnetic poles of the adjacent magnetic circuits are different from each other. It has a plurality of electron guns that are excited to have the same polarity to generate an external magnetic field between both magnetic poles and introduce electron beams into the external magnetic field, and the electron beams from the electron guns are guided by the magnetic field. A device for heating a material with a plurality of electron beams configured to be deflected and projected onto the material.
JP6765284U 1984-05-09 1984-05-09 A device that heats materials with multiple electron beams Granted JPS60181366U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6765284U JPS60181366U (en) 1984-05-09 1984-05-09 A device that heats materials with multiple electron beams

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6765284U JPS60181366U (en) 1984-05-09 1984-05-09 A device that heats materials with multiple electron beams

Publications (2)

Publication Number Publication Date
JPS60181366U JPS60181366U (en) 1985-12-02
JPH0243866Y2 true JPH0243866Y2 (en) 1990-11-21

Family

ID=30601670

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6765284U Granted JPS60181366U (en) 1984-05-09 1984-05-09 A device that heats materials with multiple electron beams

Country Status (1)

Country Link
JP (1) JPS60181366U (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01149955A (en) * 1987-12-07 1989-06-13 Anelva Corp Device for producing thin film

Also Published As

Publication number Publication date
JPS60181366U (en) 1985-12-02

Similar Documents

Publication Publication Date Title
US3710072A (en) Vapor source assembly
JPH0793121B2 (en) Ion irradiation apparatus using two-dimensional magnetic scanning and related apparatus
JP6460038B2 (en) Magnetic deflection system, ion implantation system, and method of scanning an ion beam
US3303320A (en) Vapor-coating apparatus
US3394217A (en) Method and apparatus for controlling plural electron beams
US2206125A (en) Magnetic deflecting system for braun tubes
US4064352A (en) Electron beam evaporator having beam spot control
KR960005808B1 (en) Electron gun for electron beam deposition
US3622679A (en) Heating system for electron beam furnace
JP2942301B2 (en) Fence device for electron gun magnetic field correction
JP3080401B2 (en) Magnetic structure for electron beam heating evaporation source
US3475542A (en) Apparatus for heating a target in an electron beam furnace
US3535428A (en) Apparatus for producing and directing an electron beam
JPS5840749A (en) Magnetic focussing type cathode-ray tube
JP3961158B2 (en) Electron beam evaporator
JP3085463B2 (en) Method and apparatus for controlling beam focusing of unipolar charged particles
JP2700687B2 (en) Wiggler equipment
JPH0762240B2 (en) Electron gun for electron beam evaporation
JP2524916Y2 (en) Electron impact magnetic field deflection type evaporation source device
US4835789A (en) Electron-beam heated evaporation source
US3592955A (en) Electron beam furnace
JP2993185B2 (en) Charged particle beam transport device
JPH0726359Y2 (en) Electron gun for electron beam evaporation
JPH03266344A (en) Electron gun
JPS60175355A (en) Electron beam evaporation device