JPH0248621B2 - - Google Patents
Info
- Publication number
- JPH0248621B2 JPH0248621B2 JP60176818A JP17681885A JPH0248621B2 JP H0248621 B2 JPH0248621 B2 JP H0248621B2 JP 60176818 A JP60176818 A JP 60176818A JP 17681885 A JP17681885 A JP 17681885A JP H0248621 B2 JPH0248621 B2 JP H0248621B2
- Authority
- JP
- Japan
- Prior art keywords
- tank
- processing tank
- silicon steel
- steel plate
- high vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 21
- 229910000831 Steel Inorganic materials 0.000 claims description 21
- 238000012545 processing Methods 0.000 claims description 21
- 239000010959 steel Substances 0.000 claims description 21
- 229910000976 Electrical steel Inorganic materials 0.000 claims description 19
- 238000000137 annealing Methods 0.000 claims description 14
- 238000005498 polishing Methods 0.000 claims description 12
- 238000001704 evaporation Methods 0.000 claims description 11
- 238000007733 ion plating Methods 0.000 claims description 11
- 230000008020 evaporation Effects 0.000 claims description 10
- 229910052742 iron Inorganic materials 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 6
- 238000007796 conventional method Methods 0.000 claims description 3
- 230000001105 regulatory effect Effects 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000009501 film coating Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000005381 magnetic domain Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 150000001247 metal acetylides Chemical class 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000005554 pickling Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 238000009489 vacuum treatment Methods 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005524 ceramic coating Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000010960 cold rolled steel Substances 0.000 description 1
- 238000005097 cold rolling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000005098 hot rolling Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Soft Magnetic Materials (AREA)
Description
【発明の詳細な説明】
（産業上の利用分野）
一方向性けい素鋼板は、一般に熱間圧延と冷間
圧延を経た冷延薄板の２次再結晶粒を、（100）
〔001〕方位、（すなわちゴス方位）に高度に集積
させて所望の磁気的性質を具備させ、主に変圧器
その他の電気機器類の鉄心に使用され、ここに磁
束密度（B10値で代表される）が高くしかも鉄損
（W17/50値で代表される）の低いことが要求され
るが、これまでの研究努力により当今は、板厚
0.3mmでB10：1.90T以上、W17/50：1.05W／Kgま
た、板厚0.23mmではB10：1.89T以上、W17/50：
0.90W／Kg以下のような超低鉄損一方向性けい素
鋼板も製造され得るようになつた。Detailed Description of the Invention (Field of Industrial Application) Unidirectional silicon steel sheets generally have secondary recrystallized grains of cold-rolled thin sheets that have undergone hot rolling and cold rolling.
It is highly concentrated in the [001] direction (i.e., the Goss direction) to provide desired magnetic properties, and is mainly used in the iron cores of transformers and other electrical equipment, where the magnetic flux density (represented by the B 10 value) is However, due to past research efforts, it is now possible to
At 0.3mm, B 10 : 1.90T or more, W 17/50 : 1.05W/Kg, and at plate thickness 0.23mm, B 10 : 1.89T or more, W 17/50 :
It has become possible to manufacture unidirectional silicon steel sheets with ultra-low core loss of 0.90W/Kg or less.
しかるに省エネの見地で電力損失のより厳しい
低減要求は、とくに欧米にて鉄損の減少分を換価
して変圧器価格に上積みする、ロスエバリユエー
シヨン（鉄損評価）制度にまで発展し、それも定
着するに至つている。 However, from the standpoint of energy conservation, demands for more stringent reductions in power loss have led to the development of a loss evaluation system, in which the reduction in iron loss is converted into cash and added to the transformer price, especially in Europe and the United States. It has also become established.
このようにか酷な要請に応えるため発明者ら
は、一方向性けい素鋼板の特性改善それも極限的
な鉄損低減を目指して研究活動を続けて来たが、
方向性けい素鋼板の最終焼鈍、つまり仕上焼鈍後
の操作、とくに被膜処理についての革新的な手法
を試み、顕著な鉄損低減の成果を得、引続く検討
と研鑽を加えて、以下に述べる一方向性けい素鋼
板の鉄損低減連続処理設備の適合を解明した。 In order to meet these severe demands, the inventors have continued their research activities with the aim of improving the properties of unidirectional silicon steel sheets and also reducing iron loss to the utmost.
We tried an innovative method for the final annealing of grain-oriented silicon steel sheets, that is, the operations after finish annealing, especially the coating treatment, and achieved remarkable results in reducing iron loss.After further examination and improvement, we will describe the following. We have clarified the suitability of continuous processing equipment for iron loss reduction of unidirectional silicon steel sheets.
（従来の技術）
特開昭57−2252号、同57−53419号、同58−
26405号及び同58−26406号各公報には、仕上焼鈍
後の一方向性けい素鋼板の表面に、圧延方向とほ
ぼ直角な向きにレーザ照射を施すことによつて局
部的微小ひずみの導入による磁区細分化をもつ
て、鉄損の低減を図ることが開示されているが、
この場合、いわゆるひずみ取り焼鈍を加えない使
途では有効であつても、該焼鈍が施されたときは
折角導入された局部微小ひずみが加熱保持中に解
放され、磁区幅が拡大してレーザ照射による効果
が喪失してしまう不利がある。(Prior art) JP-A No. 57-2252, JP-A No. 57-53419, JP-A No. 58-
No. 26405 and No. 58-26406 disclose that the surface of a unidirectional silicon steel sheet after finish annealing is subjected to laser irradiation in a direction substantially perpendicular to the rolling direction to introduce local minute strain. Although it has been disclosed that magnetic domain refinement is used to reduce iron loss,
In this case, even though it is effective in applications where so-called strain-relief annealing is not applied, when such annealing is applied, the local microstrain that has been painstakingly introduced is released during heating and holding, and the magnetic domain width expands, causing the laser irradiation. There is a disadvantage that the effect is lost.
これに対して発明者らはさきに、上記のような
高温処理にも拘らず特性劣化を伴うことない超低
鉄損一方向性けい素鋼板の製造に成功した。 On the other hand, the inventors have previously succeeded in manufacturing an ultra-low iron loss unidirectional silicon steel sheet that does not suffer from characteristic deterioration despite the above-mentioned high-temperature treatment.
すなわち方向性けい素鋼板の常法に従う最終焼
鈍工程を経て鋼板の外面に生成した酸化物を除去
した後、表裏両面に研磨処理を施して鏡面状態に
し、ついでイオンプレーテイングよりTi、Zr、
Ｖ、Nb、Ta、Cr、Mo、Ｗ、Mn、Co、Ni、
Al、Ｂ及びSiの窒化物及び又は炭化物ならびに
Al、Ni、Cu、Ｗ、Si及びZnの酸化物
のうちから選んだ少なくとも１種からなる極薄張
力被膜を形成させることである。 That is, after removing the oxides generated on the outer surface of the steel sheet through the final annealing process according to the conventional method for grain-oriented silicon steel sheets, both the front and back surfaces are polished to a mirror-like state, and then ion plating is performed to remove Ti, Zr,
V, Nb, Ta, Cr, Mo, W, Mn, Co, Ni,
The object of the present invention is to form an ultra-thin tensile coating made of at least one selected from nitrides and/or carbides of Al, B, and Si, and oxides of Al, Ni, Cu, W, Si, and Zn.
（発明が解決しようとする問題点）
上記の成功を導いた実験的成果を基盤として、
工業的規模における、その有利な適合を成就すべ
き、一方向性けい素鋼板の鉄損低減連続処理設備
を与えることがこの発明の目的である。(Problem to be solved by the invention) Based on the experimental results that led to the above success,
It is an object of the present invention to provide a continuous iron-loss-reducing treatment facility for unidirectional silicon steel sheets, which is to be advantageously adapted on an industrial scale.
（問題点を解決するための手段）
この発明は方向性けい素鋼板の常法に従う最終
焼鈍工程を経た鋼板の表裏両面の鏡面化処理に供
する電解研磨用処理槽列と、この電解研磨により
鏡面化した鋼板の表裏両面の連続的なイオンプレ
ーテイング処理に供する、２組の蒸発源及びイオ
ン化電極を有する高真空処理槽及びこの高真空処
理槽の入側と出側にて、該処理槽に向けて漸次に
高真空度に調圧したそれぞれ複数の予備排気槽列
とからなることを特徴とする一方向性けい素鋼板
の鉄損低減連続処理設備である。(Means for Solving the Problems) The present invention provides an array of electrolytic polishing tanks for mirror-finishing both the front and back surfaces of a steel plate that has undergone a final annealing process according to a conventional method for grain-oriented silicon steel sheets, and a process for mirror-finishing the front and back surfaces of a steel plate by the electrolytic polishing. A high-vacuum treatment tank with two sets of evaporation sources and ionization electrodes is used for continuous ion plating treatment on both the front and back surfaces of the treated steel plate, and a This is a continuous treatment facility for reducing iron loss of grain-oriented silicon steel sheets, which is characterized by consisting of a plurality of preliminary exhaust tank rows, each of which has a pressure gradually regulated to a high degree of vacuum.
さて第１図に最終焼鈍を経た方向性けい素鋼板
の表裏両面上の酸化物を除去した後の鏡面研磨処
理と、ひきつづくイオンプレーテイング処理とを
行う連続処理設備の１例を模式図をもつて示す。 Now, Figure 1 is a schematic diagram of an example of continuous processing equipment that performs mirror polishing treatment after removing oxides on both the front and back surfaces of a grain-oriented silicon steel sheet that has undergone final annealing, followed by ion plating treatment. I will also show you.
図中１は外面上の酸化物を除去した後の方向性
けい素鋼板コイル、２は以下の各槽を含む電解研
磨用処理槽列で、３は酸洗槽、４は洗浄槽、５は
No.１電解槽、６はNo.２電解槽、７は洗浄槽そして
８は乾燥槽であり、９は電解研磨処理槽列２の入
側と出側に設けたルーパーである。 In the figure, 1 is a grain-oriented silicon steel sheet coil after removing oxides on the outer surface, 2 is an electrolytic polishing tank array including the following tanks, 3 is a pickling tank, 4 is a cleaning tank, and 5 is a cleaning tank.
No. 1 electrolytic tank, 6 a No. 2 electrolytic tank, 7 a cleaning tank, 8 a drying tank, and 9 loopers provided at the inlet and outlet sides of the electropolishing tank row 2.
また１０は高真空処理槽、１１，１１′，１
１″は高真空処理槽１０の入側に配列した予備排
気槽列、１２は高真空排気系統、１３はガス導入
口、そして１４，１４′，１４″は高真空処理槽１
０の出側に配列した予備排気槽列であり、１５は
高真空処理槽１０内で上下２段に配設した蒸発
源、１６は各蒸発源１５に対設したイオン化電極
をあらわし、１７は通板用ガイドロール群、１
８、はイオンプレーテイング処理を経て巻取つた
コイルを示し、なお９′は高真空処理槽１０の入
側と出側に設けたルーパーである。 Also, 10 is a high vacuum processing tank, 11, 11', 1
1" is a pre-evacuation tank row arranged on the inlet side of the high vacuum processing tank 10, 12 is a high vacuum exhaust system, 13 is a gas inlet, and 14, 14', 14" is a high vacuum processing tank 1.
15 is an evaporation source arranged in upper and lower stages in the high vacuum processing tank 10, 16 is an ionization electrode arranged opposite to each evaporation source 15, and 17 is a preliminary evacuation tank array arranged on the outlet side of the Guide roll group for sheet threading, 1
Reference numeral 8 indicates a coil wound up after undergoing ion plating treatment, and reference numeral 9' designates loopers provided on the inlet and outlet sides of the high vacuum processing tank 10.
なお図中２１は、通板経路の要所に配置したシ
ヤーである。 In addition, 21 in the figure is a shear arranged at important points on the sheet passing route.
（作用）
鋼板表裏面に対する電解研磨処理およびそれに
ひきつづくイオンプレーテイング処理は次の順序
で行われる。(Operation) The electrolytic polishing treatment and the subsequent ion plating treatment on the front and back surfaces of the steel plate are performed in the following order.
焼鈍分離剤を鋼板両面に塗布し、仕上げ焼鈍を
施した後鋼板上の焼鈍分離剤を除去して巻取つた
一方向性けい素鋼板のコイル１は電解研磨用処理
槽列２の入側ルーパー９を通して、まず酸洗槽３
に導き、鋼板表面の酸化物を除去し、次に洗浄槽
４に通して表面を洗浄し、その後No.１およびNo.２
の電解槽５，６により電解研磨を施して鋼板表面
を鏡面状態に仕上げた後、洗浄槽７で表面を洗浄
し、乾燥槽８を通して乾燥させる。 A coil 1 of a unidirectional silicon steel sheet is coated with an annealing separator on both sides of the steel sheet, subjected to finish annealing, the annealing separator on the steel sheet is removed, and then wound up. 9, first pickling tank 3.
to remove oxides on the surface of the steel plate, then pass it through cleaning tank 4 to clean the surface, and then No. 1 and No. 2
After the surface of the steel plate is finished to a mirror finish by electrolytic polishing in the electrolytic baths 5 and 6, the surface is washed in a cleaning bath 7 and dried in a drying bath 8.
次に鋼板は電解研磨用処理槽列２の出側のルー
パー９、さらに高真空処理槽１０の入側ルーパー
９′を通し高真空処理槽１０へ導入する。 Next, the steel plate is introduced into the high vacuum processing tank 10 through the exit side looper 9 of the electrolytic polishing processing tank row 2 and further through the inlet side looper 9' of the high vacuum processing tank 10.
この際高真空処理槽１０の入側でこの処理槽１
０に向けて漸次に高真空度に調圧区分した予備排
気槽１１，１１′及び１１〃により、高真空処理
槽１０の真空封止を確保するようにし、高真空処
理槽１０の内部で通板ガイドロール群１７により
形成される迂曲した通板経路に沿つて連続的に通
板して、該槽内で上、下２段に配設した蒸発源１
５、イオン化電極１６に沿う通板移動中に、イオ
ンプレーテイング処理が施される。イオンプレー
テイング処理は蒸発源１５中で溶融金属の蒸発を
生じさせつつガス導入口１３から微量のガスを導
入しこのガス雰囲気中でイオン化電極１６を通し
てはじめに掲げた窒化物及び／又は炭化物並び酸
化物からなる張力薄膜の鋼板表面への被着を連続
的に行う。 At this time, this processing tank 1 is placed on the inlet side of the high vacuum processing tank 10.
Vacuum sealing of the high vacuum processing tank 10 is ensured by the pre-evacuation tanks 11, 11' and 11 whose pressures are gradually regulated to a high degree of vacuum toward 0. The evaporation sources 1 are arranged in two stages, upper and lower, in the tank by continuously passing the plates along a curved passage path formed by a group of plate guide rolls 17.
5. Ion plating treatment is performed while the plate is moving along the ionization electrode 16. In the ion plating process, a trace amount of gas is introduced from the gas inlet 13 while evaporating the molten metal in the evaporation source 15, and in this gas atmosphere, the nitrides and/or carbides and oxides listed above are passed through the ionization electrode 16. A tensile thin film consisting of the above is continuously applied to the surface of the steel plate.
この場合第１図から明らかなように鋼板表裏両
面に対して薄膜コーテイング処理を行い得る。 In this case, as is clear from FIG. 1, thin film coating can be applied to both the front and back surfaces of the steel plate.
蒸発源１５として役立たせるための金属の溶解
には図示を略したが、電子ビーム、ホーローカン
ード、電極加熱装置など従来公知のいずれの装置
を用いてもよく、また短時間に有効に被膜形成さ
せるため通板中の鋼板面直下に磁界をかけてイオ
ンを加速させるマグネトロン装置を使用しても良
い。 Although not shown in the figure, any conventionally known device such as an electron beam, a hollow cand, or an electrode heating device may be used to melt the metal to serve as the evaporation source 15, and in order to effectively form a film in a short time. A magnetron device may be used that accelerates ions by applying a magnetic field just below the surface of the steel sheet being passed.
なお、第１図は上、下２段の蒸発源およびイオ
ン化電極による鋼板表裏両面の薄膜コーテイング
の場合を示したが、２組の蒸発源およびイオン化
電極は上、下２段に限定されるものではない。 Note that although Figure 1 shows the case of thin film coating on both the front and back of the steel plate using the upper and lower two stages of evaporation sources and ionization electrodes, the two sets of evaporation sources and ionization electrodes are limited to the upper and lower two stages. isn't it.
上記のようにして通板中の連続的なイオンプレ
ーテイング処理を施した鋼板は高真空処理槽１０
の出側でやはりこの処理槽に近い程高真空度に調
圧区分した予備排気槽列１４，１４′，１４″を経
由する差動排気システムの採用により順次真空度
を低くして大気中に導出し、ルーパー９′を通じ
てコイル１８に巻取られる。 The steel sheet that has been subjected to continuous ion plating treatment during sheet passing as described above is placed in a high vacuum treatment tank 10.
On the outlet side of the processing tank, a differential exhaust system is used which passes through pre-exhaust tank rows 14, 14', and 14'', which are divided so that the vacuum level is higher the closer to the processing tank. It is led out and wound into a coil 18 through a looper 9'.
（発明の効果）
一方向性けい素鋼板の鏡面研磨処理とイオンプ
レーテイング処理が単一ラインで連続的に、とく
に鏡面研磨処理直後に引続きイオンプレーテイン
グ処理が、表面の鏡面化の良好な表面性状で劣化
を来す前に、いち早く行なわれ得るので鋼板表面
の張力被膜が効果的に被着形成され鉄損を効果的
に低下させることができる。(Effect of the invention) Mirror polishing and ion plating treatment of a grain-oriented silicon steel sheet are performed continuously in a single line, especially when the ion plating treatment is performed immediately after the mirror polishing treatment, resulting in a well-mirrored surface. Since this can be done quickly before the properties deteriorate, a tension coating can be effectively formed on the surface of the steel sheet, and iron loss can be effectively reduced.
なおこの装置は低炭素冷延鋼板や、ステンレス
鋼板などの一般鋼板についての鏡面研磨処理・セ
ラミツクコーテイング処理の連続ラインにも利用
可能である。 This equipment can also be used in a continuous line for mirror polishing and ceramic coating of low-carbon cold-rolled steel sheets and general steel sheets such as stainless steel sheets.
（実施例）
一方向性けい素鋼板（0.23mm厚）の仕上焼鈍後
鋼板表面上の焼鈍分離剤を除去して巻取つたコイ
ル（約7.5トン）を第１図に示した連続処理設備
に通しラインスピード30cm／minにて鋼板の表裏
両面に0.6μｍ厚のTiN張力被膜を形成させた。製
品の磁気特性は次のようであつた。(Example) After final annealing of a unidirectional silicon steel plate (0.23 mm thick), the annealing separator on the surface of the steel plate was removed, and a coil (approximately 7.5 tons) was placed in the continuous processing equipment shown in Figure 1. A 0.6 μm thick TiN tension coating was formed on both the front and back surfaces of the steel plate at a through line speed of 30 cm/min. The magnetic properties of the product were as follows.
B10＝1.92T、W17/50＝0.70W／Kg B 10 = 1.92T, W 17/50 = 0.70W/Kg
第１図はこの発明による一方向性けい素鋼板の
鉄損低減連続処理設備の模式図である。
２……電解研磨用処理槽列、１０……高真空処
理槽、１５……蒸発源、１６……イオン化電極、
１１，１１′，１１″，１４，１４′，１４″……予
備排気槽列。
FIG. 1 is a schematic diagram of a continuous treatment facility for reducing iron loss of unidirectional silicon steel sheets according to the present invention. 2... Electrolytic polishing treatment tank row, 10... High vacuum processing tank, 15... Evaporation source, 16... Ionization electrode,
11, 11', 11'', 14, 14', 14''...Preliminary exhaust tank row.
Claims (1)
を経た鋼板の表裏両面の鏡面化処理に供する電解
研磨用処理槽列と、 この電解研磨により鏡面化した鋼板の表裏両面
の連続的なイオンプレーテイング処理に供する、
２組の蒸発源及びイオン化電極を有する高真空処
理槽及び この高真空処理槽の入側と出側にて、該処理槽
に向けて漸次に高真空度に調圧したそれぞれ複数
の予備排気槽列 とからなることを特徴とする一方向性けい素鋼板
の鉄損低減連続処理設備。[Scope of Claims] 1. An array of electrolytic polishing baths for mirror-finishing both the front and back surfaces of a steel plate that has undergone a final annealing process according to a conventional method for grain-oriented silicon steel sheets; and both front and back surfaces of the steel plate that have been mirror-finished by this electropolishing. subjected to continuous ion plating treatment,
A high vacuum processing tank having two sets of evaporation sources and ionization electrodes, and a plurality of preliminary evacuation tanks each having a pressure gradually regulated to a high degree of vacuum toward the processing tank at the inlet and outlet sides of the high vacuum processing tank. Continuous processing equipment for reducing iron loss of unidirectional silicon steel sheets, characterized by comprising a row and a row.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60176818A JPS6240367A (en) | 1985-08-13 | 1985-08-13 | Continuous treatment installation for decreasing iron loss of grain oriented silicons steel sheet |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60176818A JPS6240367A (en) | 1985-08-13 | 1985-08-13 | Continuous treatment installation for decreasing iron loss of grain oriented silicons steel sheet |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6240367A JPS6240367A (en) | 1987-02-21 |
| JPH0248621B2 true JPH0248621B2 (en) | 1990-10-25 |
Family
ID=16020379
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60176818A Granted JPS6240367A (en) | 1985-08-13 | 1985-08-13 | Continuous treatment installation for decreasing iron loss of grain oriented silicons steel sheet |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6240367A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20210040606A1 (en) * | 2018-03-30 | 2021-02-11 | Jfe Steel Corporation | Equipment for manufacturing grain-oriented electromagnetic steel sheet |
-
1985
- 1985-08-13 JP JP60176818A patent/JPS6240367A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6240367A (en) | 1987-02-21 |
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