JPH0249150U - - Google Patents
Info
- Publication number
- JPH0249150U JPH0249150U JP12630788U JP12630788U JPH0249150U JP H0249150 U JPH0249150 U JP H0249150U JP 12630788 U JP12630788 U JP 12630788U JP 12630788 U JP12630788 U JP 12630788U JP H0249150 U JPH0249150 U JP H0249150U
- Authority
- JP
- Japan
- Prior art keywords
- high frequency
- heat exchanger
- laser
- discharge section
- circulated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims 1
- 230000010355 oscillation Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Lasers (AREA)
Description
第1図は、本考案の一実施例を示す高周波励起
ガスレーザ装置の模式図、第2図は、従来の高周
波励起ガスレーザ装置の模式図である。
1……放電部、5……出力鏡、6……後部鏡、
7……レーザ媒質ガス、8……風洞、11……熱
交換器。
FIG. 1 is a schematic diagram of a high-frequency excited gas laser device showing an embodiment of the present invention, and FIG. 2 is a schematic diagram of a conventional high-frequency excited gas laser device. 1...discharge part, 5...output mirror, 6...rear mirror,
7... Laser medium gas, 8... Wind tunnel, 11... Heat exchanger.
Claims (1)
源の印加される放電部に熱交換器を介して循環供
給し、そこに設けられる光共振器内でレーザ発振
を起こさせ、レーザ光線を放出させる高周波励起
ガスレーザ装置において、前記熱交換器を前記放
電部の出口部に配置するようにしたことを特徴と
する高周波励起ガスレーザ装置。 A high frequency laser medium gas sealed in a wind tunnel is circulated through a heat exchanger to a discharge section to which a high frequency power source is applied, causing laser oscillation in an optical resonator provided there, and emitting a laser beam. A high frequency excited gas laser device, characterized in that the heat exchanger is disposed at an outlet of the discharge section.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988126307U JPH0744034Y2 (en) | 1988-09-29 | 1988-09-29 | High frequency excitation gas laser device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988126307U JPH0744034Y2 (en) | 1988-09-29 | 1988-09-29 | High frequency excitation gas laser device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0249150U true JPH0249150U (en) | 1990-04-05 |
| JPH0744034Y2 JPH0744034Y2 (en) | 1995-10-09 |
Family
ID=31377716
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988126307U Expired - Lifetime JPH0744034Y2 (en) | 1988-09-29 | 1988-09-29 | High frequency excitation gas laser device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0744034Y2 (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59124784A (en) * | 1982-12-30 | 1984-07-18 | Fujitsu Ltd | Gas laser device |
| JPS59182957U (en) * | 1983-05-23 | 1984-12-06 | 株式会社 アマダ | Gas laser oscillation device |
| JPS63269589A (en) * | 1987-04-28 | 1988-11-07 | Mitsubishi Electric Corp | Laser oscillator |
-
1988
- 1988-09-29 JP JP1988126307U patent/JPH0744034Y2/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59124784A (en) * | 1982-12-30 | 1984-07-18 | Fujitsu Ltd | Gas laser device |
| JPS59182957U (en) * | 1983-05-23 | 1984-12-06 | 株式会社 アマダ | Gas laser oscillation device |
| JPS63269589A (en) * | 1987-04-28 | 1988-11-07 | Mitsubishi Electric Corp | Laser oscillator |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0744034Y2 (en) | 1995-10-09 |
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