JPH0249721Y2 - - Google Patents
Info
- Publication number
- JPH0249721Y2 JPH0249721Y2 JP5442785U JP5442785U JPH0249721Y2 JP H0249721 Y2 JPH0249721 Y2 JP H0249721Y2 JP 5442785 U JP5442785 U JP 5442785U JP 5442785 U JP5442785 U JP 5442785U JP H0249721 Y2 JPH0249721 Y2 JP H0249721Y2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- storage container
- wafer storage
- filtration filter
- container body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 42
- 238000001914 filtration Methods 0.000 claims description 22
- 239000000463 material Substances 0.000 claims description 10
- 230000006355 external stress Effects 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 230000014759 maintenance of location Effects 0.000 claims description 5
- 230000007246 mechanism Effects 0.000 claims description 4
- 239000000835 fiber Substances 0.000 claims description 3
- 229920006254 polymer film Polymers 0.000 claims description 3
- 238000007789 sealing Methods 0.000 claims description 3
- 239000007787 solid Substances 0.000 claims description 3
- 229920003002 synthetic resin Polymers 0.000 claims description 3
- 239000000057 synthetic resin Substances 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 43
- 239000003570 air Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- -1 polypropylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Landscapes
- Packaging Frangible Articles (AREA)
Description
【考案の詳細な説明】
〔産業上の利用分野〕
本考案はIC用のシリコンウエハー等の半導体
ウエハーを特に空路輸送する際に使用する半導体
ウエハー収納容器に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a semiconductor wafer storage container used especially when semiconductor wafers such as silicon wafers for IC are transported by air.
従来の、主にシリコン等のIC用の半導体ウエ
ハーその中でも特にIC回路を既に形成処理され
た後の半導体ウエハーの移送に用いることを目的
とする半導体ウエハー収納容器は、収納物と併せ
て小型軽量でもあり又極めて付加価値の高い内容
物を収納しているため輸送経費は少なくて済むが
輸送時間の多くかかる陸路や海路を利用するより
も、輸送時間が極めめて短くて済み且つ輸送に要
する経費も収納品の単位重量当たりに換算すれば
製造コストには殆ど負担とならない高付加価値製
品の特性を最大限に生かすべく一般に航空貨物と
して扱うことが多く、そのため、この種の半導体
ウエハー収納容器は一般常識的な必要条件として
航空機の離陸から着陸までの間にさらされる周囲
の気圧変化にも十分に耐えられるように高気密構
造を備えていることが最低限要求されてきた。そ
の理由は、航空機が陸上(常圧)〜高空(低圧)
〜陸上(常圧)の径路を通過する際に外部気圧の
変化に応じて即ち外部気圧と容器内気圧との間に
生じる気圧差によつて容器が呼吸をし大気中の微
細な塵を取り込んでしまうと、それらの塵により
半導体ウエハーの清浄な表面が汚染され、表面処
理により形成された回路が正常に動作しなくなる
不良発生の大きな原因となるからであつた。尚、
航空機による輸送であつても気圧調節の施された
客室を利用する場合は地上と同様の条件で管理し
ても問題ないことは勿論である。
Conventional semiconductor wafer storage containers, which are mainly used to transport semiconductor wafers made of silicon and other ICs, especially semiconductor wafers that have already been processed to form IC circuits, are small and lightweight together with the stored items. However, since it contains extremely high value-added contents, transportation costs are low, but compared to using land or sea routes, which take a long time to transport, the transportation time is extremely short and the transportation time is extremely short. This type of semiconductor wafer storage container is generally handled as air cargo in order to take full advantage of the characteristics of high value-added products, which have almost no burden on manufacturing costs when calculated per unit weight of the stored items. As a common sense requirement, the minimum requirement for aircraft is to have a highly airtight structure that can sufficiently withstand the changes in ambient air pressure that the aircraft is exposed to from takeoff to landing. The reason is that aircraft fly from land (normal pressure) to high altitude (low pressure).
~When passing through a route on land (at normal pressure), the container breathes in response to changes in external pressure, that is, due to the pressure difference between the external pressure and the pressure inside the container, and takes in fine dust from the atmosphere. If this happens, the clean surface of the semiconductor wafer will be contaminated by these dusts, and this will be a major cause of defects in which circuits formed by surface treatment will not function properly. still,
Of course, even when transporting by aircraft, if a cabin with air pressure regulation is used, it is no problem to maintain the same conditions as on the ground.
上述の如き構成に係る従来の半導体ウエハー収
納容器は、高気密構造を達成すべく容器本体部分
と蓋部分との嵌合部は十分な強度を確保するため
に特に肉厚としたり金属枠等の補強部材を組み合
わせたりすることも必要となり、この種の半導体
ウエハー収納容器は一般に高価なものとならざる
を得なかつた。そして前記の容器本体部分と蓋部
分との嵌合部は必ず某かのパツキング材料等の高
気密維持用の補助部材を装着しており、仮にそれ
ら補助部材が経時変化によつて品質劣化を起こし
た場合には折角の高気密構造も全く無意味となる
ため定期的な機能検査あるいは定期的な補助部材
の交換を施すことが必要であつた。即ち従来の半
導体ウエハー収納容器は、導入(購入)費用の他
に機能維持のために要する費用や手間も決して馬
鹿にならなかつたし、また高価な品物であるにも
かかわらず利用できる用途は輸送あるいは保管等
に限られていためにあまり広く汎用されるには至
つていなかつた。即ち実際に半導体ウエハーの処
理プロセス上で使用されるウエハートレイと輸送
を目的とした半導体ウエハー収納容器とは全く別
のもの即ち全く異なる使用目的を有し且つ夫々の
使用主目的のみを達成すべく作られたものであつ
たために前記ウエハートレイから半導体ウエハー
収納容器へ或いはその逆に半導体ウエハーの移し
替えという煩雑な作業が常に付随していたことも
本来効率的であるはずの半導体生産工程に於いて
生産性を妨げる一つの大きな問題であつたのであ
る。
In conventional semiconductor wafer storage containers having the above-mentioned configuration, in order to achieve a highly airtight structure, the fitting portion between the container body and the lid is made particularly thick or made of a metal frame or the like to ensure sufficient strength. It is also necessary to combine reinforcing members, and this type of semiconductor wafer storage container generally has to be expensive. The fitting part between the container body and the lid is always equipped with auxiliary members such as a certain packing material to maintain a high airtightness, and even if these auxiliary members deteriorate in quality due to changes over time, In such a case, the highly airtight structure that has been painstakingly constructed becomes completely meaningless, so it is necessary to carry out periodic functional inspections or periodic replacement of auxiliary members. In other words, in addition to the introduction (purchase) cost, the conventional semiconductor wafer storage container does not require much cost or effort to maintain its functionality, and even though it is an expensive item, it can only be used for transportation. In addition, because it was limited to storage, etc., it was not widely used. In other words, the wafer tray actually used in the semiconductor wafer processing process and the semiconductor wafer storage container intended for transportation are completely different things, that is, they have completely different purposes of use, and are designed to achieve only the main purpose of each use. Because the semiconductor wafers were manufactured in such a way that they were always accompanied by the complicated work of transferring semiconductor wafers from the wafer tray to the semiconductor wafer storage container or vice versa, the semiconductor production process, which was originally supposed to be efficient, was This was a major problem that hindered productivity.
本考案は上述の如き従来の半導体ウエハー収納
容器が有していた種々の問題点に鑑みて案出され
たもので、維持費用や手間をあまりかけることな
く簡便に管理利用できる即ち高い生産性を有する
半導体の生産プロセスにあつても何等その生産性
維持の妨げとならない半導体ウエハー収納容器を
提供することを目的としている。 The present invention was devised in view of the various problems that conventional semiconductor wafer storage containers had as mentioned above, and it can be easily managed and used without much maintenance cost or effort, that is, high productivity. It is an object of the present invention to provide a semiconductor wafer storage container that does not interfere in any way with maintaining productivity even during the production process of semiconductors.
以上に示した如き種々の問題は、外部応力に対
して剛性による形状保持力を有する合成樹脂材料
より成り半導体ウエハーを保持収納するウエハー
保持用枠体と、微細構造による分子濾過フイルタ
ーを備えて成り前記ウエハー保持用枠体を収容す
る外囲容器体とにより成ることを特徴とする半導
体ウエハー収納容器によつて解決することができ
る。
The various problems described above can be solved by using a wafer holding frame made of a synthetic resin material that retains its shape due to its rigidity against external stress, and a wafer holding frame that holds and houses the semiconductor wafer, and a molecular filtration filter with a fine structure. The problem can be solved by a semiconductor wafer storage container characterized by comprising an outer container body that houses the wafer holding frame.
尚、前記の外囲容器体は、外部応力対してある
程度の形状保持力を有する材料より成る枠体部分
と、この枠体部分に保持される如く覆い状に取付
けられたシート状に形成された分子濾過フイルタ
ーとにより構成したり、外部応力対してある程度
の形状保持力を有する材料より成る容器体部分
と、この容器体部分に窓状に設けられた一個又は
複数個の分子濾過フイルターとにより構成した
り、あるいは開口部に気密フアスナー等の気密封
止機構を有し一部又は全体が分子濾過フイルター
により袋状に構成することもできる。そして、前
記の分子濾過フイルターとしては多孔質の高分子
フイルムや不織布状の超高密度繊維構造、あるい
は多孔質の活性炭の如き固体構造等を利用するこ
とができる。 The above-mentioned outer container body is formed in the form of a frame portion made of a material that has a certain degree of shape retention force against external stress, and a sheet attached in the form of a cover so as to be held by the frame portion. A container body made of a material that has a certain degree of shape retention ability against external stress, and one or more molecular filtration filters provided in the shape of a window in this container body part. Alternatively, the opening may be provided with an airtight sealing mechanism such as an airtight fastener, and a part or the whole may be configured in a bag-like manner using a molecular filtration filter. As the molecular filtration filter, a porous polymer film, an ultra-high-density fiber structure in the form of a nonwoven fabric, or a solid structure such as porous activated carbon can be used.
以下、図面に基づいて本考案の一実施例を説明
する。
Hereinafter, one embodiment of the present invention will be described based on the drawings.
第1図及び第2図に於いて1は本考案による半
導体ウエハー収納容器であり、例えばテフロンや
ポリプロピレン等の外部応力に対して剛性による
形状保持力を有する合成樹脂材料より成りシリコ
ン等の主にIC用の半導体ウエハー2を保持収納
するウエハー保持用枠体3と、例えば多孔質の高
分子フイルムや不織布状の超高密度繊維構造、あ
るいは活性炭状の多孔質な固体構造あるいはそれ
らの組合せ構造等の分子サイズレベルでの濾過作
用を有する微細構造による分子濾過フイルター4
を備えた容器本体部分5と蓋部分6とにより成り
前記ウエハー保持用枠体3を収容する外囲容器体
7とにより成るものである。 In FIGS. 1 and 2, reference numeral 1 indicates a semiconductor wafer storage container according to the present invention, which is made of a synthetic resin material, such as Teflon or polypropylene, which has the ability to retain its shape due to its rigidity against external stress. A wafer holding frame 3 that holds and houses a semiconductor wafer 2 for IC, and a structure made of, for example, a porous polymer film, an ultra-high density fiber structure such as a nonwoven fabric, a porous solid structure such as activated carbon, or a combination thereof. Molecular filtration filter 4 with a microstructure that has a filtration action at the molecular size level of
The wafer holding frame 3 is made up of a container main body portion 5 and a lid portion 6, and an outer container body 7 that accommodates the wafer holding frame 3.
尚、前記のウエハー保持用枠体3は収納する半
導体ウエハー2の処理状態例えばC−MOS技術
等により形成された回路を有している場合には適
宜の導電処理を施された或いは導電性を有する素
材により形成することも可能である。また同図中
に於いて8は前記外囲容器体7の容器本体部分5
に蓋部分6を気密固定するためのロツク機構、9
は前記のウエハー保持用枠体3が外囲容器体7の
中での移動を防ぐ固定突起、10も前記の固定突
起9と同様の目的で蓋部分6に設けられた固定突
起である。そして前記分子濾過フイルター4は複
数個であつてもよいし容器本体部分5にのみでな
く蓋部分6に設けても何等差支えないことも勿論
である。 Note that the wafer holding frame 3 has been subjected to an appropriate conductive treatment or has been made conductive depending on the processing state of the semiconductor wafer 2 to be accommodated, for example, if the semiconductor wafer 2 has a circuit formed by C-MOS technology or the like. It is also possible to form it from the material which has. Further, in the figure, 8 is a container body portion 5 of the outer container body 7.
a locking mechanism for airtightly fixing the lid portion 6 to the
10 is a fixing protrusion that prevents the wafer holding frame 3 from moving within the outer container body 7, and 10 is a fixing protrusion provided on the lid portion 6 for the same purpose as the fixing protrusion 9 described above. It goes without saying that there may be a plurality of molecular filtration filters 4, and that there is no problem even if the molecular filtration filters 4 are provided not only in the container main body part 5 but also in the lid part 6.
また、前記外囲容器体7は本実施形状の他に第
3図に示す如くに外部応力対してある程度の形状
保持力を有する材料より成る枠体部分11と、こ
の枠体部分11に保持される如く覆い状に取付け
られたシート状に形成された分子濾過フイルター
4′により構成したり、あるいは第4図に示す如
く開口部に気密フアスナー等の気密封止機構12
を有し一部又は全体を分子濾過フイルター4″に
より袋状に構成することもできる。 In addition to this embodiment shape, the outer container body 7 also includes a frame portion 11 made of a material that has a certain degree of shape retention force against external stress, as shown in FIG. 3, and is held by this frame portion 11. It may be constructed by a molecular filtration filter 4' formed in a sheet shape attached in a cover-like manner, or an airtight sealing mechanism 12 such as an airtight fastener may be provided at the opening as shown in FIG.
It is also possible to have a bag-like configuration, in part or in whole, with a molecular filtration filter 4''.
前述の如き本考案の構成に係る半導体ウエハー
収納容器は、外囲容器体に分子サイズレベルの濾
過作用を有する分子濾過フイルターを設けたた
め、航空貨物輸送に供しても容器の外部気圧の変
化は分子濾過フイルターを通して清浄な空気のみ
が自由に移動することにより容器の内部に伝達さ
れ、容器内と容器外とに於ける気圧は同一となり
即ち容器本体部分と蓋部分との気密接触部には気
圧差による負荷が殆ど加わらないため簡易的な気
密構造であつても十分に収納物即ち半導体ウエハ
ーを清浄な状態に維持することが可能となつた。
つまりこの半導体ウエハー収納容器の維持管理に
かける手間は半導体を扱う上での最低限の清浄度
を維持することにのみかかるだけで、非常に取扱
が楽なものとなる。そして、二重構造のうちのウ
エハー保持用枠体は外囲容器体より取り出してそ
のまま半導体の処理プロセス中に使用することも
できるため、容器からトレイへまたはその逆の移
し替えの作業が全く不用となり、また移し替えの
ための余分なトレイを確保しておく必要も無くな
る等本来の効率的な半導体生産工程を実現するこ
とを可能とする極めて利用価値、応用価値の高い
考案である。
The semiconductor wafer storage container according to the present invention as described above is provided with a molecular filtration filter having a filtration action at the molecular size level in the outer container body, so even if the container is used for air cargo transportation, changes in the external pressure of the container will not be affected by molecular filtration. Only clean air moves freely through the filtration filter and is transmitted to the inside of the container, and the air pressure inside the container and outside the container is the same, that is, there is no pressure difference at the airtight contact area between the container body and the lid. Since almost no load is applied, it has become possible to sufficiently maintain stored items, ie, semiconductor wafers, in a clean state even with a simple airtight structure.
In other words, the effort required to maintain and manage this semiconductor wafer storage container is only required to maintain the minimum level of cleanliness required for handling semiconductors, making it extremely easy to handle. Furthermore, the wafer holding frame of the double structure can be taken out of the outer container and used as is during the semiconductor processing process, so there is no need to transfer the wafer from the container to the tray or vice versa. This is a device with extremely high utility and application value, as it eliminates the need to reserve extra trays for transfer, making it possible to realize an originally efficient semiconductor production process.
第1図は本考案の一実施例に係る半導体ウエハ
ー収納容器の概略斜視図、第2図は第1図の半導
体ウエハー収納容器の断面図、第3図及び第4図
は本考案の他の実施例に係る半導体ウエハー収納
容器の概略斜視図である。
3……ウエハー保持用枠体、4……分子濾過フ
イルター、5……容器本体部分、6……蓋部分、
7……外囲容器体。
FIG. 1 is a schematic perspective view of a semiconductor wafer storage container according to an embodiment of the present invention, FIG. 2 is a sectional view of the semiconductor wafer storage container of FIG. 1, and FIGS. 3 and 4 are other embodiments of the present invention. FIG. 1 is a schematic perspective view of a semiconductor wafer storage container according to an example. 3...Wafer holding frame, 4...Molecular filtration filter, 5...Container body part, 6...Lid part,
7...Outer container body.
Claims (1)
する合成樹脂材料より成り半導体ウエハーを保
持収納するウエハー保持用枠体と、微細構造に
よる分子濾過フイルターを備えて成り前記ウエ
ハー保持用枠体を収容する外囲容器体とにより
成ることを特徴とする半導体ウエハー収納容
器。 (2) 外囲容器体が、外部応力対してある程度の形
状保持力を有する材料より成る枠体部分と、こ
の枠体部分に保持される如く覆い状に取付けら
れたシート状に形成された分子濾過フイルター
とにより成ることを特徴とする実用新案登録請
求の範囲第1項に記載の半導体ウエハー収納容
器。 (3) 外囲容器体が、外部応力対してある程度の形
状保持力を有する材料より成る容器体部分と、
この容器体部分に窓状に設けられた一個又は複
数個の分子濾過フイルターとにより成ることを
特徴とする実用新案登録請求の範囲第1項に記
載の半導体ウエハー収納容器。 (4) 外囲容器体が、開口部に気密フアスナー等の
気密封止機構を有し一部又は全体が分子濾過フ
イルターにより袋状に形成したことを特徴とす
る実用新案登録請求の範囲第1項に記載の半導
体ウエハー収納容器。 (5) 分子濾過フイルターが、多孔質の高分子フイ
ルムであることを特徴とする実用新案登録請求
の範囲第1項乃至第4項の何れかに記載の半導
体ウエハー収納容器。 (6) 分子濾過フイルターが、不織布状の超高密度
繊維構造により成ることを特徴とする実用新案
登録請求の範囲第1項乃至第4項の何れかに記
載の半導体ウエハー収納容器。 (7) 分子濾過フイルターが、活性炭状の多孔質な
固体構造により成ることを特徴とする実用新案
登録請求の範囲第1項乃至第4項の何れかに記
載の半導体ウエハー収納容器。[Claims for Utility Model Registration] (1) A wafer holding frame made of a synthetic resin material that retains its shape due to its rigidity against external stress, and equipped with a wafer holding frame for holding and storing a semiconductor wafer, and a molecular filtration filter with a fine structure. 1. A semiconductor wafer storage container comprising: an outer container body for accommodating the wafer holding frame; (2) The outer container body has a frame portion made of a material that has a certain degree of shape retention ability against external stress, and molecules formed in a sheet shape attached in a cover shape so as to be held by this frame portion. The semiconductor wafer storage container according to claim 1, characterized in that it comprises a filtration filter. (3) a container portion in which the outer container body is made of a material that has a certain degree of shape retention ability against external stress;
The semiconductor wafer storage container according to claim 1, which has been registered as a utility model, and further comprises one or more molecular filtration filters provided in the shape of a window in the container body portion. (4) Utility model registration claim 1, characterized in that the outer container body has an airtight sealing mechanism such as an airtight fastener at the opening and is partially or entirely formed into a bag shape using a molecular filtration filter. The semiconductor wafer storage container described in . (5) The semiconductor wafer storage container according to any one of claims 1 to 4, wherein the molecular filtration filter is a porous polymer film. (6) The semiconductor wafer storage container according to any one of claims 1 to 4, wherein the molecular filtration filter is made of a non-woven ultra-high density fiber structure. (7) The semiconductor wafer storage container according to any one of claims 1 to 4, wherein the molecular filtration filter has a porous solid structure like activated carbon.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5442785U JPH0249721Y2 (en) | 1985-04-12 | 1985-04-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5442785U JPH0249721Y2 (en) | 1985-04-12 | 1985-04-12 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61172086U JPS61172086U (en) | 1986-10-25 |
| JPH0249721Y2 true JPH0249721Y2 (en) | 1990-12-27 |
Family
ID=30576176
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5442785U Expired JPH0249721Y2 (en) | 1985-04-12 | 1985-04-12 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0249721Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6032802A (en) * | 1995-11-16 | 2000-03-07 | Sumitomo Metal Industries, Ltd. | Thin-plate supporting container with filter means |
-
1985
- 1985-04-12 JP JP5442785U patent/JPH0249721Y2/ja not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6032802A (en) * | 1995-11-16 | 2000-03-07 | Sumitomo Metal Industries, Ltd. | Thin-plate supporting container with filter means |
| US6105781A (en) * | 1995-11-16 | 2000-08-22 | Sumitomo Metal Industries, Ltd. | Thin-plate supporting container with unitary porous gasket |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61172086U (en) | 1986-10-25 |
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