JPH0254230U - - Google Patents
Info
- Publication number
- JPH0254230U JPH0254230U JP13327588U JP13327588U JPH0254230U JP H0254230 U JPH0254230 U JP H0254230U JP 13327588 U JP13327588 U JP 13327588U JP 13327588 U JP13327588 U JP 13327588U JP H0254230 U JPH0254230 U JP H0254230U
- Authority
- JP
- Japan
- Prior art keywords
- tank body
- vortex flow
- tank
- vortex
- treatment liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims description 5
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Description
第１図は、この考案の一実施例による湿式処理
槽を示す縦断面図、第２図は、第１図の処理槽の
横断面図、第３図は、第１図のＸ部の拡大図、第
４図は、第２図のＹ部の拡大図、第５図は、従来
の湿式処理槽を示す縦断面図である。
１０……槽本体、１２……底部容器、１６……
液導入管、１６ａ……放出孔、１８……保持具、
２０……渦流制御板。
Fig. 1 is a vertical cross-sectional view showing a wet treatment tank according to an embodiment of this invention, Fig. 2 is a cross-sectional view of the processing tank shown in Fig. 1, and Fig. 3 is an enlarged view of section X in Fig. 1. FIG. 4 is an enlarged view of section Y in FIG. 2, and FIG. 5 is a vertical sectional view showing a conventional wet treatment tank. 10...Tank body, 12...Bottom container, 16...
Liquid introduction pipe, 16a... discharge hole, 18... holder,
20... Eddy current control board.
Claims (1)
能な槽本体と、 (b) この槽本体の底部から槽内に前記処理液を
供給すべく設けられた処理液供給手段であつて、
槽内では前記処理液を一定方向に旋回しつつ上昇
する渦流が形成されるように放出する構成になつ
ているものと、 (c) 前記槽本体の内壁面に上下方向に延長する
ように設けられた少なくとも１つの渦流制御板で
あつて、その一方の板面で前記渦流の一部を前記
一定方向と交叉する方向に受け流すと共に該一方
の板面とは反対側の板面と前記槽本体の内壁面と
の間に前記一定方向とは逆方向に旋回する逆渦流
を形成するように配置されたものとをそなえ、 前記槽本体の上端又はその近傍には、前記渦流
制御板に対応して前記渦流及び前記逆渦流をオー
バーフローさせるための流出口を設けたことを特
徴とする湿式処理槽。[Claims for Utility Model Registration] (a) A tank body capable of accommodating items to be treated immersed in a treatment liquid; (b) A tank body provided to supply the treatment liquid into the tank from the bottom of the tank body. a processing liquid supply means,
In the tank, the treatment liquid is swirled in a certain direction and discharged so as to form an upward vortex; (c) provided on the inner wall surface of the tank body so as to extend vertically at least one eddy current control plate having one plate surface that deflects a portion of the vortex flow in a direction intersecting the certain direction, and a plate surface opposite to the one plate surface and the tank body. and an inner wall surface of the vessel arranged to form a reverse vortex swirling in a direction opposite to the fixed direction, and at or near the upper end of the tank body, a vortex flow control plate corresponding to the vortex flow control plate is provided. A wet processing tank characterized in that an outlet is provided for overflowing the vortex flow and the reverse vortex flow.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13327588U JPH0254230U (en) | 1988-10-12 | 1988-10-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13327588U JPH0254230U (en) | 1988-10-12 | 1988-10-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0254230U true JPH0254230U (en) | 1990-04-19 |
Family
ID=31390987
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13327588U Pending JPH0254230U (en) | 1988-10-12 | 1988-10-12 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0254230U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2023079400A (en) * | 2021-11-29 | 2023-06-08 | 株式会社ダルトン | Cleaning tank and cleaning system |
-
1988
- 1988-10-12 JP JP13327588U patent/JPH0254230U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2023079400A (en) * | 2021-11-29 | 2023-06-08 | 株式会社ダルトン | Cleaning tank and cleaning system |