JPH0256604B2 - - Google Patents

Info

Publication number
JPH0256604B2
JPH0256604B2 JP18976182A JP18976182A JPH0256604B2 JP H0256604 B2 JPH0256604 B2 JP H0256604B2 JP 18976182 A JP18976182 A JP 18976182A JP 18976182 A JP18976182 A JP 18976182A JP H0256604 B2 JPH0256604 B2 JP H0256604B2
Authority
JP
Japan
Prior art keywords
light
objective lens
irradiated
optical device
photodetector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP18976182A
Other languages
Japanese (ja)
Other versions
JPS5979104A (en
Inventor
Keiichi Yoshizumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP57189761A priority Critical patent/JPS5979104A/en
Publication of JPS5979104A publication Critical patent/JPS5979104A/en
Publication of JPH0256604B2 publication Critical patent/JPH0256604B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、マイケルソン干渉計型のレーザ干渉
測長器あるいは光ヘテロダイン法を利用したレー
ザ干渉測長器を利用して面形状を測定する装置
や、面に記録された情報あるいは欠陥を検出する
装置等に使用される光学装置であつて、レーザ光
を対物レンズで被照射面上に絞り込み、その反射
光から、被照射面の何らかの情報、例えば表面の
凹凸、反射率、欠陥などを検出したり、反射光の
波面のずれあるいは周波数のドプラーシフトか
ら、面形状や面の動き等を測定したりする光学装
置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a device for measuring a surface shape using a Michelson interferometer type laser interferometric length measuring device or a laser interferometric length measuring device using an optical heterodyne method. is an optical device used in devices that detect information recorded on a surface or defects, etc., which focuses a laser beam onto the irradiated surface using an objective lens, and from the reflected light, detects some information about the irradiated surface, e.g. It relates to an optical device that detects surface irregularities, reflectance, defects, etc., and measures surface shape, surface movement, etc. from the shift in the wavefront of reflected light or the Doppler shift in frequency.

従来例の構成とその問題点 従来のこの種光学装置においては、第1図に示
すように、被照射面3は、対物レンズ2の焦点位
置にあるが、この場合、反射光が対物レンズ2を
再び通り過ぎると、入射光と同一の方向に戻ると
いう性質がある。従つて、反射光を再びレンズを
使用して結像すると、被照射面3に少し傾きがあ
つても、同一の点に結像される。従つて、この結
像点は不動点となり、この結像点か、あるいはそ
の近くに光検出器を置いて情報の検出を行なつて
いた。ところが実際は、このような従来装置にお
いても、被照射面3の傾きに対する許容度はきわ
めてきびしい。なぜならば、第1図に示すよう
に、被照射面3がθ1傾くと、反射光は2θ1傾くの
で、入射光が平行光の場合、対物レンズ2透過後
の反射光の中心位置は、F1sin2θ1だけ変化する。
なおF1は対物レンズ2の焦点距離である。この
現象は光学システムに悪影響を及ぼすので、従来
の装置における被照射面の傾きの許容度はきわめ
てきびしい。一例として、レーザ干渉測定器では
0.005゜以内、光デイスクでは0.2゜以内である。光
デイスクでは、この精度内に入るようシステムが
設計されているが、干渉測長器では普通被測定物
にコーナキユーブを取付け、コーナキユーブの動
きで被測定物の動きを測定する等の方法がとられ
ている。
Configuration of conventional example and its problems In this type of conventional optical device, as shown in FIG. 1, the irradiated surface 3 is located at the focal point of the objective lens 2. When it passes through again, it has the property of returning in the same direction as the incident light. Therefore, when the reflected light is imaged again using a lens, even if the irradiated surface 3 is slightly tilted, the image will be formed at the same point. Therefore, this image forming point becomes a fixed point, and a photodetector is placed at or near this image forming point to detect information. However, in reality, even in such a conventional apparatus, the tolerance for the inclination of the irradiated surface 3 is extremely strict. This is because, as shown in FIG. 1, when the irradiated surface 3 is tilted by θ 1 , the reflected light is tilted by 2θ 1. Therefore, when the incident light is parallel light, the center position of the reflected light after passing through the objective lens 2 is F 1 sin2θ changes by 1 .
Note that F 1 is the focal length of the objective lens 2. Since this phenomenon has a negative effect on the optical system, the tolerance of the tilt of the irradiated surface in conventional devices is extremely strict. As an example, in a laser interferometer,
Within 0.005°, and within 0.2° for optical discs. For optical disks, the system is designed to fall within this accuracy range, but for interferometric length measuring instruments, a method is usually used in which a corner cube is attached to the object to be measured and the movement of the object is measured by the movement of the corner cube. ing.

発明の目的 本発明は上記従来の欠点を解消するもので、被
照射面が傾いていても、傾きが対物レンズの開口
角以内であれば、反射光が入射光と同一の経路を
たどり、したがつて被照射面の傾きに対する許容
度が非常に大きい光学装置を得ることを目的とす
る。
Purpose of the Invention The present invention solves the above-mentioned conventional drawbacks. Even if the irradiated surface is tilted, as long as the tilt is within the aperture angle of the objective lens, the reflected light will follow the same path as the incident light. Therefore, it is an object of the present invention to obtain an optical device that has a very large tolerance for the inclination of the irradiated surface.

発明の構成 上記目的を達するため、本発明の光学装置は、
光放射手段からの放射光を被照射物体面上に集光
する対物レンズと、前記被照射物体面からの反射
光の一部を受光して前記被照射物体面の傾きによ
つて生ずる前記反射光の位置や分布のずれを検出
する第1の光検出器と、この第1の光検出器の出
力から得られる誤差信号に応じて前記対物レンズ
または光放射手段を光軸に対して垂直な方向に移
動させる駆動手段とを有し、前記被照射物体面か
らの反射光が入射光とほぼ同一光路をとる構成と
したものである。
Configuration of the Invention In order to achieve the above object, an optical device of the present invention comprises:
an objective lens for condensing the emitted light from the light emitting means onto the surface of the object to be irradiated; and the reflection caused by the inclination of the surface of the object to be irradiated by receiving a part of the reflected light from the surface of the object to be irradiated. A first photodetector detects a shift in the position or distribution of light, and the objective lens or light emitting means is aligned perpendicularly to the optical axis in accordance with an error signal obtained from the output of the first photodetector. The light reflected from the surface of the irradiated object takes substantially the same optical path as the incident light.

実施例の説明 以下、本発明の一実施例について、図面に基づ
いて説明する。
DESCRIPTION OF EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.

先ず、基本的な原理について第2図及び第3図
により説明する。被照射面4がθ2傾くと、反射光
は2θ2傾き、対物レンズ5透過後の反射光の中心
位置はF2sin2θ2だけ変化する。なおF2は対物レン
ズ5の焦点距離である。ところが、対物レンズ5
か、あるいは入射光の中心をF2sinθ2だけ平行移
動させれば反射光は入射光と同一の光路を戻る。
すなわち第2図のように、反射光の位置ずれがあ
れば、例えば反射光の一部を、四分割されている
光検出器6で受け、位置ずれに応じて発生する誤
差信号によつて、対物レンズ5を光軸に対して垂
直な方向に動かし、第3図のように、反射光位置
が一定になるようサーボをかける。光検出器の形
状や誤差信号のとり方は種々考えられる。例え
ば、反射光をビームスプリツタ7で分離しなくて
も、第4図のごとく入射光の大きさの穴8aのあ
いた四分割の光検出器8を使用すれば、誤差信号
が得られる。また、受光位置によつて両側の端子
に発生する電圧が変わる、市販の光位置検出器を
使用しても良い。
First, the basic principle will be explained with reference to FIGS. 2 and 3. When the irradiated surface 4 is tilted by θ2 , the reflected light is tilted by 2θ2 , and the center position of the reflected light after passing through the objective lens 5 changes by F2 sin2θ2 . Note that F 2 is the focal length of the objective lens 5. However, objective lens 5
Alternatively, if the center of the incident light is translated in parallel by F 2 sin θ 2 , the reflected light returns along the same optical path as the incident light.
That is, as shown in FIG. 2, if there is a positional shift in the reflected light, for example, a part of the reflected light is received by the photodetector 6 which is divided into four parts, and an error signal generated in accordance with the positional shift is used to detect a part of the reflected light. The objective lens 5 is moved in a direction perpendicular to the optical axis, and servo is applied so that the position of the reflected light is constant, as shown in FIG. Various shapes of the photodetector and methods of obtaining error signals can be considered. For example, even if the reflected light is not separated by the beam splitter 7, an error signal can be obtained by using a quadrant photodetector 8 having a hole 8a the size of the incident light as shown in FIG. Alternatively, a commercially available optical position detector may be used, in which the voltage generated at both terminals changes depending on the light receiving position.

被照射面4が焦点位置からずれた場合、反射光
の光路は一定でなくなるので良くない。そこで例
えば、反射光をレンズと円柱レンズとで絞り込
み、生じた非点収差から誤差信号を取り出し、対
物レンズ5あるいは被照射物体を光軸方向に動か
し、フオーカスサーボをかける。非点収差からフ
オーカス誤差信号を取り出す方法は、最も一般的
な方法であるが、他にナイフエツジ法等種々の方
式が知られており、本発明にかかる光学装置にも
使用可能である。
If the irradiated surface 4 deviates from the focal position, the optical path of the reflected light will no longer be constant, which is not good. Therefore, for example, the reflected light is narrowed down by a lens and a cylindrical lens, an error signal is extracted from the generated astigmatism, and the objective lens 5 or the object to be irradiated is moved in the optical axis direction to apply focus servo. The method of extracting a focus error signal from astigmatism is the most common method, but various other methods such as the knife edge method are also known and can be used in the optical device according to the present invention.

対物レンズ5あるいは被照射物体を上記の誤差
信号によつて動かす駆動機構は、送りネジをモー
タで動かす方法や、リニアモータを使用する等の
方法が可能である。
The drive mechanism for moving the objective lens 5 or the object to be irradiated using the above-mentioned error signal can be a method of moving a feed screw with a motor, a method of using a linear motor, or the like.

レーザ干渉測長器に本発明にかかる光学装置を
適用すると、傾きを持つた曲面の厚さを直接精密
に測定することなども可能である。被照射面4の
傾きは対物レンズ5の開口角度まで許容されるの
で、例えば、NA(開口数)=0.6の対物レンズ5を
使用した場合、開口角は光軸から36゜であるので、
±30゜程度の傾きを持つた被照射面4まで十分測
定可能である。但し、こうした使い方では、対物
レンズ5に入射する入射光の光束径は、対物レン
ズ5の入射瞳径より十分小さくしなければならな
い。例えば、NAが0.6の対物レンズ5で、±30゜の
傾きを持つた被照射面4まで光束がけられること
なく測定可能である為には、入射光の光束径は対
物レンズ5の入射瞳径の1/6以下である必要があ
る。
When the optical device according to the present invention is applied to a laser interferometer, it is also possible to directly and precisely measure the thickness of an inclined curved surface. The inclination of the irradiated surface 4 is allowed up to the aperture angle of the objective lens 5. For example, when using the objective lens 5 with NA (numerical aperture) = 0.6, the aperture angle is 36 degrees from the optical axis.
It is possible to sufficiently measure up to the irradiated surface 4 which has an inclination of approximately ±30°. However, in such usage, the beam diameter of the incident light entering the objective lens 5 must be made sufficiently smaller than the entrance pupil diameter of the objective lens 5. For example, in order to be able to measure the irradiated surface 4 with an inclination of ±30° without eclipsing the beam with the objective lens 5 with NA of 0.6, the beam diameter of the incident light should be the entrance pupil diameter of the objective lens 5. It must be less than 1/6 of

また、入射光が発散光や集束光であつた場合
で、対物レンズ5を光軸方向に動かすと、焦点位
置がずれ、誤差発生の原因となる。従つてこの場
合は入射光が平行光である方が良い。
Further, when the incident light is diverging light or converging light, if the objective lens 5 is moved in the optical axis direction, the focal position shifts, causing an error. Therefore, in this case, it is better that the incident light be parallel light.

被照射面4の傾きに応じて対物レンズ5を移動
させた場合、集光点の位置は対物レンズ5の移動
量だけ移動する。これは入射光が平行光であれば
厳密に成り立つ。上記のレーザ干渉測長器を利用
した曲面厚さの測定器や欠陥検査装置等において
は、測定点の位置をX−Y座標で知る必要があ
る。この場合、測定点の位置は、被測定物の移動
量(X1、Y1)から対物レンズ5の移動量(X2
Y2)を引いた(X1−X2、Y1−Y2)になる。対物
レンズ5を移動させずに入射光を移動させた場合
は、測定点位置は動かない。
When the objective lens 5 is moved according to the inclination of the irradiated surface 4, the position of the condensing point moves by the amount of movement of the objective lens 5. This strictly holds true if the incident light is parallel light. In curved surface thickness measuring devices, defect inspection devices, and the like that utilize the laser interferometric length measuring device described above, it is necessary to know the position of a measurement point in terms of X-Y coordinates. In this case, the position of the measurement point is determined from the amount of movement of the object to be measured (X 1 , Y 1 ) to the amount of movement of the objective lens 5 (X 2 , Y 1 ).
Y 2 ) minus (X 1 − X 2 , Y 1Y 2 ). If the incident light is moved without moving the objective lens 5, the measurement point position does not move.

レーザ干渉測長器は測定精度が0.01μmまでと
極めて高いが、これに本発明にかかる光学装置を
組合せると効果は非常に大きい。例えば、非球面
レンズ面の精密な形状測定は、従来技術的に極め
て困難であるとされていた。非球面レンズ面は、
X−Y座標に対する関数型によつて厚さZの値が
きめられ、形状が決定される。本発明にかかる光
学装置を利用すれば、レンズ面の任意のX−Y座
標位置に対する厚さZの値をレーザ干渉測長器の
精度で測定できるので、実測寸法の、与えられた
関数により導出された数値とのずれを実時間で自
動的に測定可能なシステムとなる。
The laser interferometric length measuring device has an extremely high measurement accuracy of up to 0.01 μm, but when it is combined with the optical device according to the present invention, the effect is very large. For example, it has been considered extremely difficult to precisely measure the shape of an aspherical lens surface in the prior art. The aspheric lens surface is
The value of the thickness Z is determined by the function type for the X-Y coordinates, and the shape is determined. By using the optical device according to the present invention, the value of the thickness Z for any X-Y coordinate position of the lens surface can be measured with the precision of a laser interferometer, so the thickness can be derived from a given function of the actual measurement dimension. This is a system that can automatically measure the deviation from the calculated value in real time.

第5図は、光ヘテロダイン法を利用したレーザ
干渉測長器に、本発明にかかる光学装置を適用し
た表面形状の測定装置であり、以下これについて
説明する。発振周波数f1、f2のゼーマンレーザ9
から出た光は、λ/4板10で、2つの偏光方
向、つまり、電場が紙面に垂直な方向に偏波した
f2の光と、紙面に平行な方向に偏波したf1の光に
分けられる。そして、ビームスプリツタ11で一
部の光が分離され、ビート周波数(f1−f2)が光
検出器12により検出される。ビームスプリツタ
11を通過した光のうちf2の光は偏光プリズム1
3によつて上方に反射し、固定ミラー14で反射
して光検出器15上に達する。一方、f1の被測定
物16の表面で反射するが、被測定物16が移動
すると、移動速度のZ成分vZによつて、反射光の
周波数はドプラーシフトし、f1からf1(1−2vZ/c) となる。反射光は一部が偏光プリズム17によつ
て分けられ、上記の位置サーボとフオーカスサー
ボの誤差信号を発生させる為、光検出器18,1
9上に達する。前記偏光プリズム17はP偏波が
全透過し、S偏波が一部反射し、残りが透過する
性質を持つ。偏光プリズム17を透過した反射光
は、偏光プリズム13で全反射し、光検出器15
上に達する。光検出器15上でf2とf1+Δfとのビ
ート周波数f1+Δf−f2が得られ、光検出器12上
で得られたビート周波数f1−f2との差からΔfが求
まり、これを積分して変位Zが求まる。こうして
求めたZの測定精度は、0.1〜0.01μm程度であ
る。対物レンズ20のZ方向の動きを測定して被
照射面の変位を測定することができるが、この場
合の測定精度は数μmである。なお、21はビー
ムスプリツタ、22はλ/4板、24〜26はレ
ンズ、27は円柱レンズ、28は測定値表示部、
29は被測定物測定位置表示部、30は対物レン
ズ駆動装置、31は被測定物駆動装置である。
FIG. 5 shows a surface shape measuring device in which the optical device according to the present invention is applied to a laser interferometric length measuring device using an optical heterodyne method, and this will be explained below. Zeeman laser 9 with oscillation frequencies f 1 and f 2
The light emitted from the
It is divided into f 2 light and f 1 light polarized in a direction parallel to the plane of the paper. Then, a part of the light is separated by the beam splitter 11, and the beat frequency (f 1 -f 2 ) is detected by the photodetector 12. Of the light that has passed through the beam splitter 11, the light at f2 is sent to the polarizing prism 1.
3 and reflected upward by the fixed mirror 14 to reach the photodetector 15. On the other hand, it is reflected by the surface of the object to be measured 16 at f 1 , but when the object to be measured 16 moves, the frequency of the reflected light undergoes a Doppler shift depending on the Z component v Z of the moving speed, and the frequency of the reflected light changes from f 1 to f 1 ( 1-2v Z /c). A part of the reflected light is separated by the polarizing prism 17, and in order to generate the error signals of the position servo and focus servo, the photodetectors 18 and 1
Reach above 9. The polarizing prism 17 has the property of completely transmitting P polarized waves, partially reflecting S polarized waves, and transmitting the rest. The reflected light that has passed through the polarizing prism 17 is totally reflected by the polarizing prism 13 and is sent to the photodetector 15.
reach the top. A beat frequency f 1 +Δf−f 2 between f 2 and f 1 +Δf is obtained on the photodetector 15, and Δf is determined from the difference between the beat frequency f 1 −f 2 obtained on the photodetector 12, Displacement Z is found by integrating this. The measurement accuracy of Z thus obtained is about 0.1 to 0.01 μm. The displacement of the irradiated surface can be measured by measuring the movement of the objective lens 20 in the Z direction, but the measurement accuracy in this case is several μm. In addition, 21 is a beam splitter, 22 is a λ/4 plate, 24 to 26 are lenses, 27 is a cylindrical lens, 28 is a measured value display section,
Reference numeral 29 denotes an object measurement position display section, 30 an objective lens driving device, and 31 an object driving device.

発明の効果 以上説明したように本発明によれば、被照射面
が傾いていても、傾きが対物レンズの開口角以内
であれば、反射光が入射光と同一の経路をたどる
ので、被照射面の傾きに対する許容度が非常に大
きな光学装置を得ることができ、その工業的利用
価値は極めて大である。
Effects of the Invention As explained above, according to the present invention, even if the irradiated surface is tilted, as long as the inclination is within the aperture angle of the objective lens, the reflected light will follow the same path as the incident light. It is possible to obtain an optical device with a very large tolerance to the inclination of the surface, and its industrial utility value is extremely large.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来装置の光学系における光路の説明
図、第2図及び第3図は本発明の実施例の原理説
明図、第4図は本発明の一実施例における光学装
置に使用される光検出器の説明図、第5図は本発
明の一実施例における光学装置の概略構成図であ
る。 8,12,15,18,19……光検出器、9
……ゼーマンレーザ、10,22,23……λ/
4板、11,21……ビームスプリツタ、13,
17……偏光プリズム、14……固定ミラー、1
6……被測定物、20……対物レンズ、24〜2
6……レンズ、27……円柱レンズ、28……測
定値表示部、29……被測定物測定位置表示部、
30……対物レンズ駆動装置、31……被測定物
駆動装置。
Fig. 1 is an explanatory diagram of the optical path in the optical system of a conventional device, Figs. 2 and 3 are explanatory diagrams of the principle of an embodiment of the present invention, and Fig. 4 is an explanatory diagram of the optical path in an optical system of an embodiment of the present invention. FIG. 5, which is an explanatory diagram of a photodetector, is a schematic configuration diagram of an optical device in an embodiment of the present invention. 8, 12, 15, 18, 19...photodetector, 9
...Zeeman laser, 10, 22, 23...λ/
4 plates, 11, 21...beam splitter, 13,
17...Polarizing prism, 14...Fixed mirror, 1
6...Object to be measured, 20...Objective lens, 24-2
6... Lens, 27... Cylindrical lens, 28... Measured value display section, 29... Measured object measurement position display section,
30... Objective lens drive device, 31... Measured object drive device.

Claims (1)

【特許請求の範囲】 1 光放射手段からの反射光を被照射物体面上に
集光する対物レンズと、前記被照射物体面からの
反射光の一部を受光して前記被照射物体面の傾き
によつて生ずる前記反射光の位置や分布のずれを
検出する第1の光検出器と、この第1の光検出器
の出力から得られる誤差信号に応じて前記対物レ
ンズまたは放射光を光軸に対して垂直な方向に移
動させる駆動手段とを有し、前記被照射物体面か
らの反射光が入射光とほぼ同一光路をとる構成と
した光学装置。 2 被照射物体面からの反射光の一部を受光し、
被照射物体面の対物レンズによる放射光の集光位
置からのずれによつて生ずる前記反射光の光路の
変化を検出する第2の光検出器と、前記対物レン
ズと前記第2の光検出器との間に位置し、前記反
射光の光路を前記第2の光検出器上で好適な焦点
誤差信号を得ることのできる形に変換する為の、
光透過性あるいは反射性または遮光性の光学手段
とを備え、焦点誤差信号によつて前記対物レンズ
または前記被照射物を光軸方向に移動させ、常に
前記被照射物体面上に焦光位置を位置させる構成
とした特許請求の範囲第1項記載の光学装置。 3 放射光の対物レンズに入射する直前における
光束径を対物レンズの入射瞳より小さくした特許
請求の範囲第1項または第2項記載の光学装置。 4 放射光を、略平行光とした特許請求の範囲第
1項ないし第3項のいずれかに記載の光学装置。 5 対物レンズの、放射光の光軸に対して垂直な
方向の移動量を測定する手段を備えた特許請求の
範囲第1項ないし第4項のいずれかに記載の光学
装置。 6 放射光の光軸に対して垂直な方向への対物レ
ンズの移動量の測定値を、被照射物体の光軸に対
して垂直な方向への動き量の測定値から減算する
手段を備えた特許請求の範囲第1項ないし第5項
のいずれかに記載の光学装置。 7 放射光の被照射物体面からの反射光と、前記
放射光の対物レンズに到達する前で一部分離され
た第2の放射光、あるいは前記放射光とは別の第
3の放射光を、同一の受光面または光検出器上で
干渉させる光学系と、前記反射光と前記第2又は
第3の放射光との干渉によつて、前記受光面又は
前記光検出器上で生ずる干渉縞の変化またはビー
ト周波数の変化から、前記被照射物体面の変位等
の情報を検出する検出手段とを備えた特許請求の
範囲第1項ないし第6項のいずれかに記載の光学
装置。
[Scope of Claims] 1. An objective lens that focuses the reflected light from the light emitting means onto the surface of the object to be irradiated, and a lens that receives part of the light reflected from the surface of the object to be irradiated to a first photodetector that detects a shift in the position or distribution of the reflected light caused by the tilt; and a driving means for moving in a direction perpendicular to the axis, the optical device having a configuration in which the light reflected from the surface of the irradiated object follows substantially the same optical path as the incident light. 2. Receive part of the reflected light from the surface of the irradiated object,
a second photodetector for detecting a change in the optical path of the reflected light caused by a deviation from a condensing position of the emitted light by the objective lens on the surface of the irradiated object; and the objective lens and the second photodetector. and for converting the optical path of the reflected light into a form capable of obtaining a suitable focus error signal on the second photodetector;
The objective lens or the object to be irradiated is moved in the optical axis direction according to a focus error signal, and the focused position is always maintained on the surface of the object to be irradiated. The optical device according to claim 1, wherein the optical device is configured to be positioned. 3. The optical device according to claim 1 or 2, wherein the beam diameter of the emitted light just before it enters the objective lens is smaller than the entrance pupil of the objective lens. 4. The optical device according to any one of claims 1 to 3, wherein the emitted light is substantially parallel light. 5. The optical device according to any one of claims 1 to 4, comprising means for measuring the amount of movement of the objective lens in a direction perpendicular to the optical axis of the emitted light. 6. Equipped with means for subtracting the measured value of the amount of movement of the objective lens in the direction perpendicular to the optical axis of the synchrotron radiation from the measured value of the amount of movement of the irradiated object in the direction perpendicular to the optical axis. An optical device according to any one of claims 1 to 5. 7. The reflected light from the surface of the object to be irradiated with the synchrotron radiation, and the second synchrotron radiation that is partially separated before the synchrotron radiation reaches the objective lens, or the third synchrotron radiation that is different from the synchrotron radiation, An optical system that causes interference on the same light-receiving surface or photodetector, and interference fringes that occur on the light-receiving surface or the photodetector due to interference between the reflected light and the second or third emitted light. 7. The optical device according to claim 1, further comprising a detection means for detecting information such as displacement of the surface of the irradiated object from a change in beat frequency or a change in beat frequency.
JP57189761A 1982-10-27 1982-10-27 optical equipment Granted JPS5979104A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57189761A JPS5979104A (en) 1982-10-27 1982-10-27 optical equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57189761A JPS5979104A (en) 1982-10-27 1982-10-27 optical equipment

Publications (2)

Publication Number Publication Date
JPS5979104A JPS5979104A (en) 1984-05-08
JPH0256604B2 true JPH0256604B2 (en) 1990-11-30

Family

ID=16246731

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57189761A Granted JPS5979104A (en) 1982-10-27 1982-10-27 optical equipment

Country Status (1)

Country Link
JP (1) JPS5979104A (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60169706A (en) * 1984-02-14 1985-09-03 Olympus Optical Co Ltd Surface-state measuring device
JPH044166Y2 (en) * 1984-11-06 1992-02-07
JPS629211A (en) * 1985-07-05 1987-01-17 Matsushita Electric Ind Co Ltd Optical measuring instrument
JPS62172208A (en) * 1986-01-27 1987-07-29 Osaka Seimitsu Kikai Kk Method for optically measuring shape
JPS62238403A (en) * 1986-04-09 1987-10-19 Mitsubishi Electric Corp Apparatus for measuring surface shape
JPS63275323A (en) * 1987-05-08 1988-11-14 Hamamatsu Photonics Kk Diagnostic apparatus
JP2748702B2 (en) * 1991-02-04 1998-05-13 松下電器産業株式会社 Error correction method for CMM
JPH05172738A (en) * 1991-12-24 1993-07-09 Jasco Corp Acoustic cell
DE69324532T2 (en) * 1992-07-15 1999-09-23 Nikon Corp., Tokio/Tokyo Light source for a heterodyne interferometer
WO2016050453A1 (en) 2014-10-03 2016-04-07 Asml Netherlands B.V. Focus monitoring arrangement and inspection apparatus including such an arragnement

Also Published As

Publication number Publication date
JPS5979104A (en) 1984-05-08

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