JPH0257699A - partial plating equipment - Google Patents
partial plating equipmentInfo
- Publication number
- JPH0257699A JPH0257699A JP63207652A JP20765288A JPH0257699A JP H0257699 A JPH0257699 A JP H0257699A JP 63207652 A JP63207652 A JP 63207652A JP 20765288 A JP20765288 A JP 20765288A JP H0257699 A JPH0257699 A JP H0257699A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- tank
- plating solution
- liquid
- circulation path
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、例えばICリードフレーム等のめっ必要部分
に、部分的にめっきする部分めっき装置に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a partial plating apparatus for partially plating parts that require plating, such as IC lead frames.
従来の技術
近年、ICリードフレーム等の電子部品用フレームに銀
等の貴金属めっきを行なうのに、特に必要なリード線接
続部にのみめっきを施す部分めっきが行なわれている。BACKGROUND OF THE INVENTION In recent years, when plating frames for electronic components such as IC lead frames with precious metals such as silver, partial plating has been carried out in which plating is applied only to particularly necessary lead wire connection portions.
このための部分めっき装置についての従来例として例え
ば特開昭58−161790号公報に開示されているも
のがある。第3図は同公報に開示されている部分めっき
装置の構成を示すものである。第3図において、40は
上面にめっき用開口41が設けられためっき渋川タンク
、42はタンク40内に配置され、先端が開口41の方
へ向けられためっき液噴出のためのノズルである。43
は被めっき物として置かれたリードフレームであり、リ
ードフレーム43のめっきを施す部分には打ち抜き加工
によって加工穴44が形成されている。45は上方より
リードフレーム43を押えつける上部であり、上M45
の下方には下から噴き上げるめっき液を納める凹部が形
成されている。46は上記凹部に溜まったままとなった
めっき波をタンク40内に戻すためのバイパス管である
。47はタンク40より吸い込んだめっき液をノズル4
2より噴出させるためのポンプである。リードフレーム
43は、タンク40上面に設けられた挟持部と上蓋45
との間に挟まれるとともに、リードフレーム43のめっ
き不必要部分は隠されてめっき必要部分のみが下方より
噴き付けられるめっき液にさらされる。A conventional example of a partial plating apparatus for this purpose is disclosed in, for example, Japanese Unexamined Patent Publication No. 161790/1983. FIG. 3 shows the configuration of the partial plating apparatus disclosed in the publication. In FIG. 3, 40 is a plating Shibukawa tank having a plating opening 41 on its upper surface, and 42 is a nozzle disposed within the tank 40 with its tip directed toward the opening 41 for spouting a plating solution. 43
A lead frame is placed as an object to be plated, and a hole 44 is punched out in a portion of the lead frame 43 to be plated. 45 is an upper part that presses down the lead frame 43 from above, and upper M45
A recess is formed below the plate to accommodate the plating solution that is sprayed from below. Reference numeral 46 designates a bypass pipe for returning the plating waves remaining in the recess into the tank 40. 47 is the nozzle 4 that sucks the plating solution from the tank 40.
This is a pump for ejecting water from 2. The lead frame 43 has a clamping portion provided on the top surface of the tank 40 and an upper lid 45.
At the same time, the parts of the lead frame 43 that do not require plating are hidden, and only the parts that require plating are exposed to the plating solution sprayed from below.
以上のように構成された部分めっき装置におけるめっき
は、ノズル42からめっき液を勢いよく噴出させ、めっ
き液を介して電極(ノズル42と上M45に仕組まれて
いる)とリードフレーム43との間に電流を流すことに
よって行なわれる。Plating in the partial plating apparatus configured as described above is performed by jetting the plating solution vigorously from the nozzle 42 and passing the plating solution between the electrode (organized in the nozzle 42 and the upper M45) and the lead frame 43. This is done by passing a current through.
この際ノズル42より噴出しためっき液は、一部はその
ままノズル42の側を通ってタンク40に戻り、またそ
の他の上蓋45内に形成された凹部に流れ込んで、バイ
パス管46を通ってタンク40に戻る。At this time, a part of the plating solution spouted from the nozzle 42 returns to the tank 40 through the nozzle 42 side, and also flows into the other recess formed in the upper lid 45 and passes through the bypass pipe 46 to the tank 40. Return to
発明が解決しようとする課題
しかしながら、以上のような構成では、リードフレーム
43の両面に均一な厚さのめっき層を素早く形成するこ
とはできるものの、タンク40へのめっき液の循環が直
下的に循環させるという方法をとっているので循環の際
にめっき液は空気と激しく混ざり合うこととなり、めっ
き液が多量の空気をかみこんでしまってめっき液の発泡
によりタンク40よりあふれてめっき液を損失させると
いう問題点があった。Problems to be Solved by the Invention However, with the above configuration, although it is possible to quickly form a plating layer with a uniform thickness on both sides of the lead frame 43, the plating solution cannot be circulated directly to the tank 40. Since the method of circulating the plating solution is used, the plating solution mixes violently with air during circulation, and a large amount of air is trapped in the plating solution, which causes the plating solution to overflow from the tank 40 and cause loss of plating solution. There was a problem with letting it work.
課題を解決するための手段
本発明は、この疎開を解決するために、治具から流出し
てタンクに戻るめっき液の循環路の傾斜からタンクの液
面に至る部分に発泡樹脂板を設けてなる。Means for Solving the Problems In order to solve this evacuation problem, the present invention provides a foamed resin plate in the part from the slope of the circulation path of the plating solution flowing out from the jig and returning to the tank to the liquid level of the tank. Become.
作用
この構成によりめっき液はタンク液面が上下しても滑か
に流入するのでめっき液の発泡が抑制される。Function: With this configuration, the plating solution flows smoothly even when the tank liquid level rises and falls, so that foaming of the plating solution is suppressed.
実施例
以下、本発明の一実施例を図面を参照して詳細に説明す
る。なお本実施例は特に大量生産工程向のものであり、
コイル上に連結されている状態のリードフレームの複数
のめっき必要部分に同時にめっきを施すようにしたもの
で、連結されたリードフレームを数個づつめっきを行う
。このためにリードフレームを部分めっき装置にセット
してからめっき液を流し、めっきが終了するとめっき液
の流れを小さくしてリードフレームを移動する。EXAMPLE Hereinafter, an example of the present invention will be described in detail with reference to the drawings. Note that this example is particularly suitable for mass production processes,
Plating is performed simultaneously on a plurality of parts of the lead frame connected to the coil that require plating, and the connected lead frames are plated several at a time. For this purpose, the lead frame is set in a partial plating device, and then the plating solution is allowed to flow. When plating is completed, the flow of the plating solution is reduced and the lead frame is moved.
先ず第1図は本発明の一実施例における部分めっき装置
の構成を示す概略図である。ここで、1は受液槽で底部
にめっき液の噴出口1aを有し、ポンプ2より圧送され
ためっき液は、上記噴出口1aを通過し、噴出口1a上
に位置するめっき治具3の内部を通過し受液4f!1に
流入する。4は液循環路で、受液槽1の底面に対し30
度の傾斜角で固定され、液循環路4の先端はめっき液を
貯蔵するメインタンク5の液面近くに達する。6は発泡
樹脂板で、メインタンク5の液面上に浮かびかつ液循環
路4の先端に固定されている。この発泡樹脂板6はその
先端が常にめっき液の液面に平行になるような長さを有
し、その適度の堅さのためにめっき液の液面の上下に伴
って、緩やかに湾曲する。First, FIG. 1 is a schematic diagram showing the configuration of a partial plating apparatus in an embodiment of the present invention. Here, 1 is a liquid receiving tank having a plating solution spout 1a at the bottom, the plating solution pumped by a pump 2 passes through the spout 1a, and is applied to a plating jig 3 located above the spout 1a. Passes through the inside of and receives liquid 4f! 1. 4 is a liquid circulation path, which is located at a distance of 30 mm from the bottom of the liquid receiving tank 1.
The tip of the liquid circulation path 4 reaches near the liquid level of the main tank 5 that stores the plating solution. A foamed resin plate 6 floats on the liquid surface of the main tank 5 and is fixed to the tip of the liquid circulation path 4. This foamed resin board 6 has a length such that its tip is always parallel to the surface of the plating solution, and due to its moderate hardness, it curves gently as the surface of the plating solution rises and falls. .
以上の構成においてリードフレームをめっき治具3にセ
ットしてから、ポンプ2を起動してめっき液を循環させ
る。そしてめっきが終了すると治具3からリードフレー
ムを外すがその古きポンプ2の運転を止める。そして次
にめっきを行いたいリードフレームをセットシ、次のめ
っきを行う。After setting the lead frame in the plating jig 3 in the above configuration, the pump 2 is started to circulate the plating solution. When the plating is completed, the lead frame is removed from the jig 3, but the operation of the old pump 2 is stopped. Next, set the lead frame to be plated and perform the next plating.
ここでポンプ2は、運転、停止を繰り返すがポンプ2が
運転し瞬間的にメインタンク5の液面水位が低下したと
き、発泡樹脂板6が液面に従って下降し、液循環路5の
先端と液面とに発生する落差を吸収し、滑かな傾斜を維
持する。受液槽1に流入しためっき液は落差によって液
循環路4の沿って流出し、発泡樹脂板6をガイドにして
メインタンク5の液面に滑かに流入する。またメインタ
ンク5に流入し貯蔵されためっき液はポンプ2によって
再び受液槽lの噴出口1aに圧送され循環を繰返す。Here, the pump 2 repeatedly starts and stops, but when the pump 2 starts operating and the liquid level in the main tank 5 momentarily drops, the foamed resin plate 6 descends according to the liquid level and connects with the tip of the liquid circulation path 5. It absorbs the drop that occurs between the liquid level and maintains a smooth slope. The plating solution flowing into the liquid receiving tank 1 flows out along the liquid circulation path 4 due to the head difference, and smoothly flows into the liquid level of the main tank 5 using the foamed resin plate 6 as a guide. Further, the plating solution that has flowed into the main tank 5 and is stored is again forcedly fed to the spout 1a of the liquid receiving tank 1 by the pump 2, and the circulation is repeated.
発明の効果
以上のように本発明はめっき治具から流れ出ためっき液
を一旦溜める上方開口型受液槽を設け、受液槽からタン
クまでの落差に傾斜面を有した循環路のめっき液面まで
の部分に発泡樹脂板を形成したことにより、大量のめっ
き液を流出させてもメインタンクめっき液面を叩くこと
がなくなり、流入スピードは非常に遅くなり、発泡が極
僅かとなる。そのためメインタンクからこぼれめっき液
を損失することが無くなり高速めっきが可能になる。ま
たポンプ運転時の液面低下を発泡樹脂板が上下動し傾斜
面を維持するため、液面水位の調整が簡素化できる。Effects of the Invention As described above, the present invention provides an upward-opening type liquid receiving tank for temporarily collecting the plating solution flowing out from the plating jig, and improves the plating liquid level in the circulation path having an inclined surface in the drop from the liquid receiving tank to the tank. By forming a foamed resin plate in the area up to this point, even if a large amount of plating solution flows out, it will not hit the plating solution surface in the main tank, the inflow speed will be extremely slow, and foaming will be minimal. Therefore, there is no loss of plating solution spilled from the main tank, making high-speed plating possible. Additionally, since the foamed resin plate moves up and down to maintain the slope when the liquid level drops during pump operation, adjustment of the liquid level can be simplified.
第1図は本発明の一実施例における部分めっき装置の構
成を示す概略図、第2図は第1図に示す部分めっき装置
の循環路の先端部の拡大図、第3図は従来の部分めっき
装置の構成を示す概略図である。
3・・・めっき治具、4・・・液循環路、5・・・メイ
ンタンク、6・・・発泡樹脂板Fig. 1 is a schematic diagram showing the configuration of a partial plating apparatus according to an embodiment of the present invention, Fig. 2 is an enlarged view of the tip of the circulation path of the partial plating apparatus shown in Fig. 1, and Fig. 3 is a conventional part. FIG. 1 is a schematic diagram showing the configuration of a plating apparatus. 3... Plating jig, 4... Liquid circulation path, 5... Main tank, 6... Foamed resin board
Claims (1)
めの傾斜面を有した液循環路と、前記タンクからめっき
液を吸い込み、加圧して受液槽へ供給する加圧ポンプと
、 前記液循環路から前記タンクの液面に至る部分に設けら
れる発泡樹脂板と、 を有することを特徴とする部分めっき装置。[Scope of Claims] An upward-opening liquid receiving tank having a plating solution spout, a plating jig provided above the liquid receiving tank spout, a tank for storing the plating solution, and the plating solution. a liquid circulation path having an inclined surface through which the plating solution flows from the plating jig to the tank; a pressurizing pump that sucks the plating solution from the tank, pressurizes it, and supplies it to the liquid receiving tank; and the liquid circulation path. A partial plating apparatus comprising: a foamed resin plate provided in a portion extending from the tank to the liquid level of the tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20765288A JP2615475B2 (en) | 1988-08-22 | 1988-08-22 | Partial plating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20765288A JP2615475B2 (en) | 1988-08-22 | 1988-08-22 | Partial plating equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0257699A true JPH0257699A (en) | 1990-02-27 |
| JP2615475B2 JP2615475B2 (en) | 1997-05-28 |
Family
ID=16543321
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20765288A Expired - Fee Related JP2615475B2 (en) | 1988-08-22 | 1988-08-22 | Partial plating equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2615475B2 (en) |
-
1988
- 1988-08-22 JP JP20765288A patent/JP2615475B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2615475B2 (en) | 1997-05-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |