JPH0260231U - - Google Patents
Info
- Publication number
- JPH0260231U JPH0260231U JP13970288U JP13970288U JPH0260231U JP H0260231 U JPH0260231 U JP H0260231U JP 13970288 U JP13970288 U JP 13970288U JP 13970288 U JP13970288 U JP 13970288U JP H0260231 U JPH0260231 U JP H0260231U
- Authority
- JP
- Japan
- Prior art keywords
- needle valve
- flow rate
- bubbler
- raw material
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 claims 3
- 239000012159 carrier gas Substances 0.000 claims 2
- 239000002994 raw material Substances 0.000 claims 2
- 238000011144 upstream manufacturing Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
- 230000001105 regulatory effect Effects 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Description
第１図は本考案の実施例１を示す構成図、第２
図は従来の減圧ＭＯＶＰＥ装置の構成図、第３図
は本考案の説明図、第４図は本考案の実施例２を
示す構成図である。
１，２１，３１，１０，２４，４０……流量制
御装置、２，２２，３２……バブラー、３，３３
……第１のニードル弁、４，３４……第２のニー
ドル弁、５，２５，３５……反応管、６，２６，
３６……ウエハー、７，２７，３７……サセプタ
、８，２８，３８……圧力調整弁、９，２９，３
９……ロータリーポンプ、２３……ニードル弁、
Ａ……第２のニードル弁を全開したときの第１の
ニードル弁の特性、Ｂ……第１のニードル弁を目
標とするＣｖ値に合せたときの第２のニードル弁
の特性、Ｃ……従来のニードル弁の特性、Ｄ……
目標とするＣｖ値、Ｅ……本考案の調整エリア、
Ｆ……従来の調整エリア。
Fig. 1 is a configuration diagram showing the first embodiment of the present invention;
The figure is a block diagram of a conventional reduced pressure MOVPE apparatus, FIG. 3 is an explanatory diagram of the present invention, and FIG. 4 is a block diagram showing a second embodiment of the present invention. 1,21,31,10,24,40...flow control device, 2,22,32...bubbler, 3,33
...First needle valve, 4,34...Second needle valve, 5,25,35...Reaction tube, 6,26,
36... Wafer, 7, 27, 37... Susceptor, 8, 28, 38... Pressure regulating valve, 9, 29, 3
9... Rotary pump, 23... Needle valve,
A...Characteristics of the first needle valve when the second needle valve is fully opened, B...Characteristics of the second needle valve when the first needle valve is adjusted to the target Cv value, C ...Characteristics of conventional needle valves, D...
Target Cv value, E...adjustment area of the present invention,
F... Conventional adjustment area.
Claims (1)
Ｏ原料供給系におけるキヤリヤガスの流量を制御
する流量制御装置と、流量制御されたキヤリヤガ
スによつてＭＯ原料を気化させるバブラーと、該
バブラーと反応管との間のガスラインの上流側に
設けられた第１のニードル弁と、該第１のニード
ル弁の下流側に設けられた第２のニードル弁とを
含むことを特徴とする減圧ＭＯＶＰＥ装置。 one or more M supplying a reactive gas onto the wafer
A flow rate control device that controls the flow rate of carrier gas in the O raw material supply system, a bubbler that vaporizes the MO raw material with the carrier gas whose flow rate is controlled, and a gas line provided on the upstream side of the gas line between the bubbler and the reaction tube. A reduced pressure MOVPE device comprising a first needle valve and a second needle valve provided downstream of the first needle valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13970288U JPH0260231U (en) | 1988-10-26 | 1988-10-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13970288U JPH0260231U (en) | 1988-10-26 | 1988-10-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0260231U true JPH0260231U (en) | 1990-05-02 |
Family
ID=31403207
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13970288U Pending JPH0260231U (en) | 1988-10-26 | 1988-10-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0260231U (en) |
-
1988
- 1988-10-26 JP JP13970288U patent/JPH0260231U/ja active Pending