JPH0274363U - - Google Patents

Info

Publication number
JPH0274363U
JPH0274363U JP1988150602U JP15060288U JPH0274363U JP H0274363 U JPH0274363 U JP H0274363U JP 1988150602 U JP1988150602 U JP 1988150602U JP 15060288 U JP15060288 U JP 15060288U JP H0274363 U JPH0274363 U JP H0274363U
Authority
JP
Japan
Prior art keywords
substrate holder
rotating substrate
sputtering apparatus
vacuum chamber
processing container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1988150602U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1988150602U priority Critical patent/JPH0274363U/ja
Publication of JPH0274363U publication Critical patent/JPH0274363U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP1988150602U 1988-11-18 1988-11-18 Pending JPH0274363U (sr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988150602U JPH0274363U (sr) 1988-11-18 1988-11-18

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988150602U JPH0274363U (sr) 1988-11-18 1988-11-18

Publications (1)

Publication Number Publication Date
JPH0274363U true JPH0274363U (sr) 1990-06-06

Family

ID=31423895

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988150602U Pending JPH0274363U (sr) 1988-11-18 1988-11-18

Country Status (1)

Country Link
JP (1) JPH0274363U (sr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022166690A (ja) * 2021-04-21 2022-11-02 東京エレクトロン株式会社 真空処理装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022166690A (ja) * 2021-04-21 2022-11-02 東京エレクトロン株式会社 真空処理装置

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