JPH0287066U - - Google Patents

Info

Publication number
JPH0287066U
JPH0287066U JP16684188U JP16684188U JPH0287066U JP H0287066 U JPH0287066 U JP H0287066U JP 16684188 U JP16684188 U JP 16684188U JP 16684188 U JP16684188 U JP 16684188U JP H0287066 U JPH0287066 U JP H0287066U
Authority
JP
Japan
Prior art keywords
sputtering device
ion sputtering
sample chamber
ions
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16684188U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16684188U priority Critical patent/JPH0287066U/ja
Publication of JPH0287066U publication Critical patent/JPH0287066U/ja
Pending legal-status Critical Current

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Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本案を採用した時のイオンスパツタ装
置の試料室内を真空排気している状態を示す図、
第2図は本案を採用して試料室を押し上げた状態
を示す図である。 1……蓋、2……ターゲツト、3……試料室、
6……ベース、7……バネ併用ベローズ、8……
バルブ、9……連結ベルト、10……リークバル
ブ、11……油回転ポンプ。
Figure 1 is a diagram showing the state in which the sample chamber of the ion sputtering device is evacuated when this proposal is adopted;
FIG. 2 is a diagram showing a state in which the sample chamber is pushed up using the present invention. 1...Lid, 2...Target, 3...Sample chamber,
6...Base, 7...Bellows with spring, 8...
Valve, 9...Connection belt, 10...Leak valve, 11...Oil rotary pump.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 主として走査形電子顕微鏡にて観察しようとす
る非導電性試料に対してイオンによりはじき出さ
れた金属を試料の表面に薄くコーテイングするイ
オンスパツタ装置において、真空排気を利用した
試料室の自動開閉機構を設けたことを特徴とする
イオンスパツタ装置。
In an ion sputtering device that thinly coats the surface of a non-conductive sample to be observed with a scanning electron microscope with metal ejected by ions, an automatic opening/closing mechanism for the sample chamber using vacuum evacuation was installed. An ion sputtering device characterized by:
JP16684188U 1988-12-26 1988-12-26 Pending JPH0287066U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16684188U JPH0287066U (en) 1988-12-26 1988-12-26

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16684188U JPH0287066U (en) 1988-12-26 1988-12-26

Publications (1)

Publication Number Publication Date
JPH0287066U true JPH0287066U (en) 1990-07-10

Family

ID=31454589

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16684188U Pending JPH0287066U (en) 1988-12-26 1988-12-26

Country Status (1)

Country Link
JP (1) JPH0287066U (en)

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