JPH0288741A - Stock for high recording density disk and its manufacture - Google Patents
Stock for high recording density disk and its manufactureInfo
- Publication number
- JPH0288741A JPH0288741A JP24306488A JP24306488A JPH0288741A JP H0288741 A JPH0288741 A JP H0288741A JP 24306488 A JP24306488 A JP 24306488A JP 24306488 A JP24306488 A JP 24306488A JP H0288741 A JPH0288741 A JP H0288741A
- Authority
- JP
- Japan
- Prior art keywords
- ingot
- stock
- rolling
- hot rolling
- crystallized substances
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 9
- 239000000463 material Substances 0.000 claims abstract description 27
- 238000005098 hot rolling Methods 0.000 claims abstract description 20
- 229910019064 Mg-Si Inorganic materials 0.000 claims abstract description 16
- 229910019406 Mg—Si Inorganic materials 0.000 claims abstract description 16
- 238000002791 soaking Methods 0.000 claims abstract description 15
- 229910018134 Al-Mg Inorganic materials 0.000 claims abstract description 12
- 229910018467 Al—Mg Inorganic materials 0.000 claims abstract description 12
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 12
- 239000000956 alloy Substances 0.000 claims abstract description 12
- 239000000126 substance Substances 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 7
- 238000005096 rolling process Methods 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 abstract description 5
- 239000002184 metal Substances 0.000 abstract description 5
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 description 12
- 238000000265 homogenisation Methods 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- 238000009826 distribution Methods 0.000 description 10
- 238000001816 cooling Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 7
- 229910000765 intermetallic Inorganic materials 0.000 description 7
- 239000000758 substrate Substances 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 229910000838 Al alloy Inorganic materials 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 238000005336 cracking Methods 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000005266 casting Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910019094 Mg-S Inorganic materials 0.000 description 2
- 229910019397 Mg—S Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229910018085 Al-F Inorganic materials 0.000 description 1
- 229910018131 Al-Mn Inorganic materials 0.000 description 1
- 229910018179 Al—F Inorganic materials 0.000 description 1
- 229910018461 Al—Mn Inorganic materials 0.000 description 1
- 229910000861 Mg alloy Inorganic materials 0.000 description 1
- 229910017639 MgSi Inorganic materials 0.000 description 1
- QQHSIRTYSFLSRM-UHFFFAOYSA-N alumanylidynechromium Chemical compound [Al].[Cr] QQHSIRTYSFLSRM-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 238000005097 cold rolling Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は高密度磁気ディスク用アルミニウム合金板及び
その製造法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an aluminum alloy plate for high-density magnetic disks and a method for manufacturing the same.
(従来の技術)
磁気ディスク材料としては、軽量、非磁性、高速回転に
耐える剛性などの点から、アルミニウム合金が用いられ
ている。磁気ディスク用アルミニウム合金板(ブランク
材)は、精密切削若しくは精密研磨などの精密表面仕上
げを行ってディスク用基板(サブストレート材)とし、
脱脂等の前処理を行った後、磁性膜を形成する。(Prior Art) Aluminum alloy is used as a magnetic disk material because of its light weight, non-magnetic properties, and rigidity that can withstand high-speed rotation. The aluminum alloy plate (blank material) for magnetic disks is processed into a substrate for disks (substrate material) by precision surface finishing such as precision cutting or precision polishing.
After performing pretreatment such as degreasing, a magnetic film is formed.
近年の磁気記録密度の向上に伴い、磁気ヘッド浮上高さ
はますます低くなると共に、記録の単位面積は小さくな
ってきている。このため、サブストレーl−材のフラッ
トネスに対する要求及びサブストレート材表面の微少な
凹凸の現象に対する要求はますます厳しくなっている。As magnetic recording density has improved in recent years, the flying height of the magnetic head has become lower and lower, and the recording unit area has become smaller. For this reason, requirements for the flatness of the substrate l-material and requirements for the phenomenon of minute irregularities on the surface of the substrate material are becoming increasingly strict.
また、電子産業分野での競争の激化のため、磁気ディス
クに関しても低コスト化が指向されてきている。このた
め、ブランク材及びサブストレート材についても低価格
な高品質材が要求されている。Furthermore, due to intensifying competition in the electronics industry, there has been a trend toward lower costs for magnetic disks. For this reason, low-cost, high-quality materials are also required for blank materials and substrate materials.
(発明が解決しようとする課題)
従来、ブランク材の内部品質としては、全ての金属間化
合物が小さいことが必要と考えられてきた。これは、金
属間化合物はアルミニウム合金マトリックスよりも高硬
度であるため、切削若しくは研磨仕上げにおいて突起と
して残るか又は脱落して穴となり、結果として磁性膜の
厚みが局部的に変り、記録エラーとなり易いためである
。(Problems to be Solved by the Invention) Conventionally, it has been thought that the internal quality of a blank material requires that all intermetallic compounds be small. This is because intermetallic compounds have higher hardness than the aluminum alloy matrix, so during cutting or polishing, they remain as protrusions or fall off to form holes, resulting in local changes in the thickness of the magnetic film, which can easily cause recording errors. It's for a reason.
このため、従来は、例えば特公昭62−32260号の
如く超高純度地金、すなわち、純度99゜99%のAl
地金の使用による金属間化合物の微細化の提案などがな
されていた。For this reason, in the past, ultra-high purity aluminum, that is, 99°99% pure aluminum, as disclosed in Japanese Patent Publication No. 62-32260
Proposals were made to make intermetallic compounds finer by using bare metals.
しかし乍ら、超高純度Al地金使用によるブランク材は
、高品質ではあっても非常に高価であり、実質上電算機
業界での量産採用はなされなかった。However, blank materials using ultra-high-purity Al ingots are very expensive, even if they are of high quality, and have not been mass-produced in the computer industry.
また、特にコストを重視する塗布型ディスク向けの使用
は、検討の対象にもなり得なかった。In addition, use for coated discs, where cost is particularly important, could not be considered.
もっとも、最近、特開昭63−96254号に示される
ように低純度のAl地金を使用する試みがなされており
、金属間化合物の微細化の点では超高純度Al地金を使
用したに比べて満足できるものではない。However, recently, as shown in JP-A-63-96254, attempts have been made to use low-purity Al ingots, and in terms of finer intermetallic compounds, ultra-high-purity Al ingots have been used. It's not a satisfying comparison.
本発明は、か)る事情に鑑みてなされたものであって、
従来主たる方法として提案されてきた高純度Al地金の
使用による高密度化対応ブランク材の製造の方法を採ら
ず、比較的低い純度のAP地金を使用して低コストの高
記録密度化対応材を提供すること、並びにそれを製造し
得る方法を提供することを目的とするものである。The present invention has been made in view of the above circumstances, and
Instead of using high-purity Al ingots to produce high-density blanks, which has been proposed as the main method in the past, we now use relatively low-purity AP ingots to support high-density recording at low cost. The purpose is to provide a material and a method by which it can be manufactured.
(課題を解決するための手段)
前記目的を達成するため、本発明の高記録密度ディスク
用素材は、Mg:3〜5%及びsi:o、。(Means for Solving the Problems) In order to achieve the above object, the high recording density disk material of the present invention contains Mg: 3 to 5% and Si: o.
15%〜0.030%を含有するAl−Mg合金におい
て、Mg−Si系晶出物が4μm以下であることを特徴
とするものである。The Al-Mg alloy containing 15% to 0.030% is characterized in that the size of Mg-Si crystallized substances is 4 μm or less.
また、その製造方法は、Mg:3〜5%及びSj:0.
15〜0.030%を含有するAl−Mg合金の鋳塊に
、均熱温度が500℃〜560℃、保持時間が111r
以上の均熱処理を施し、次いで圧延量始温度500℃以
上で熱間圧延を行うことを特徴とするものである。Moreover, the manufacturing method includes Mg: 3 to 5% and Sj: 0.
The ingot of Al-Mg alloy containing 15% to 0.030% was heated at a soaking temperature of 500°C to 560°C and a holding time of 111 r.
It is characterized in that the above-described soaking treatment is performed, and then hot rolling is performed at a rolling amount starting temperature of 500° C. or higher.
以下に本発明を更に詳細に説明する。The present invention will be explained in more detail below.
まず、Al地金純度に関連する究明点、すなわち、高純
度Al地金の使用を回避可能とした幾つかの究明点を示
す。First, we will show some findings related to Al ingot purity, that is, some investigative points that made it possible to avoid the use of high-purity Al ingots.
前述の如く、磁気ディスクに記録エラーをもたらす素材
側の原因は、サブストレート材の表面の突起及びピット
が主と考えられていた。このため、粗大な金属間化合物
の存在は許されないとされていた。As mentioned above, it has been thought that the main cause of recording errors on magnetic disks on the material side is protrusions and pits on the surface of the substrate material. For this reason, the presence of coarse intermetallic compounds was considered unacceptable.
しかし乍ら、磁気ディスクの記録エラーについて多数調
査分析したところ、記録エラーの素材側原因の殆どがピ
ットであり、突起に起因する記録エラーは非常に少ない
ことが判明した。すなわち、記録エラーをなくすために
はピットをなくせばよいことを究明したのである。However, after numerous studies and analyzes of recording errors on magnetic disks, it has been found that most recording errors are caused by pits on the material side, and that recording errors caused by protrusions are extremely rare. In other words, they discovered that in order to eliminate recording errors, it is sufficient to eliminate pits.
次に、このピットの形成原因であるが、従来は精密切削
時に金属間化合物が脱落することにより形成されるもの
と考えられていた。この点につい一
ても表面の詳細f7R察を行ったところ、切削等におい
て脱落により形成される場合よりも、磁性膜形成のため
の前処理、すなわち、脱脂及びクロメート処理により特
定の金属間化合物(Mg−Si系晶出物)が溶解してピ
ットを形成する頻度が非常に多いことを究明したのであ
る。Next, regarding the cause of the formation of these pits, it was conventionally thought that they were formed by intermetallic compounds falling off during precision cutting. Regarding this point, a detailed f7R observation of the surface revealed that specific intermetallic compounds ( It was discovered that Mg-Si crystallized substances dissolve and form pits very frequently.
すなわち、従来は、A Q −Fe、 A Q −Mn
Fe、Al−Mn、Al−Cr、Mg−8i、Al−F
e−8i系などの全ての晶出物につき、その大きさ数を
減少させるべく高純度地金化が図られてきたが、上記の
究明点に基づき、Mg−8i系晶出物を厳しくコントロ
ールすれば、その他の系の晶出物は、高純度地金を使用
するほどには厳しくする必要がないことが判明した。ま
た、Mg−8i品出物の大きさは4μm以下であれば、
塗布型ディスクとしては充分なる高密度化が可能である
ことを究明した。That is, conventionally, A Q -Fe, A Q -Mn
Fe, Al-Mn, Al-Cr, Mg-8i, Al-F
Efforts have been made to make high-purity ingots to reduce the size and number of all crystallized substances such as e-8i series, but based on the above findings, strict control of Mg-8i series crystallized substances is required. Therefore, it was found that there is no need to treat other types of crystallized substances as harshly as when using high-purity metals. In addition, if the size of the Mg-8i item is 4 μm or less,
We have found that it is possible to achieve a sufficiently high density for a coated disc.
次に、Mg−8i晶出物の微細化との関連で組成との関
係を示す。Next, the relationship with the composition will be shown in connection with the refinement of Mg-8i crystallized substances.
まず、Mg−3i品出物はMg及びSiにより形成され
るのであるから、当然、両元素とも含有量が少ない方が
晶出物の形成も少ない。しかし、Mgは磁気ディスク用
素材として充分な強度を得るのに必須な元素であり、こ
のため、Mgは3%以上の添加が必要である。First, since the Mg-3i product is formed of Mg and Si, naturally, the smaller the content of both elements, the less the formation of crystallized substances. However, Mg is an essential element in order to obtain sufficient strength as a material for magnetic disks, and therefore Mg must be added in an amount of 3% or more.
また、Siはどのような純度のAl地金を使用しても不
可避に混入する元素である。そして、高純度地金である
9 9.99%(例、99.992%)Al地金を用い
ると、通常、0.008%程度以下のSiを含有したブ
ランク材が得られる。この場合はMg−8i晶出物は4
μl以下となるが、価格的に非常に高価となる。この非
常に高価な地金に比較して廉価な地金である99゜90
〜99.97%/l地金を使用した場合は0.02〜0
.03%のSi含有量のブランク材が得られるが、この
程度のSiを含有する場合、Mg−8i品出物が多量に
形成され、記録のエラーとなる場合が多かった。Further, Si is an element that is inevitably mixed in, no matter what purity of Al metal is used. When a high-purity aluminum base metal of 99.99% (eg, 99.992%) is used, a blank containing approximately 0.008% or less of Si is usually obtained. In this case, the Mg-8i crystallized product is 4
Although it is less than μl, it is very expensive. 99°90 is a cheaper metal compared to this very expensive bullion.
~99.97%/l 0.02~0 when using bullion
.. A blank material with a Si content of 0.3% is obtained, but when this amount of Si is contained, a large amount of Mg-8i products are formed, which often causes recording errors.
しかし乍ら、以下に説明する如く、本発明では。However, as explained below, in the present invention.
このような低価格のAl地金を用い、Si含有量が0.
015〜0.030%であっても、高密度用ディスク材
として使用可能なブランク材を得ることを可能にしたの
である。Using such a low-priced Al ingot, the Si content is 0.
Even if the content is 0.015 to 0.030%, it is possible to obtain a blank material that can be used as a high-density disk material.
まず、本発明における化学成分の限定理由を説明する。First, the reason for limiting the chemical components in the present invention will be explained.
Si:01015〜0.030%
前述のように、Siについては、使用地金の点より、0
.015%以上0.030%以下とする。Si: 01015~0.030% As mentioned above, from the point of view of the ingot used, Si is 0.
.. 0.015% or more and 0.030% or less.
Siを0.015%以上とするのは、0.015%未満
であると、Mg−8i品出物は微細化されても高価格高
純度地金を使用せざるを得す、経済的でなくなるからで
ある。一方、0.030%を超えると、本発明法に係る
工程においてもMg−Si系晶出物の微細化が困難とな
る。Setting the Si content to 0.015% or more is not economical, since if it is less than 0.015%, Mg-8i products have no choice but to use expensive high-purity ingots even if they are miniaturized. Because it will disappear. On the other hand, if it exceeds 0.030%, it becomes difficult to refine Mg-Si crystallized substances even in the process according to the present invention.
Mg:3〜5%
Mgは強度付与のために必須な元素であり、3%以上の
添加を行う必要がある。しかし、5%を超えると鋳造時
にMgO等の介在物が形成され易く、かつ、Mg−8i
系晶出物も粗大化し易くなるので、5%以下に規制する
必要がある。Mg: 3-5% Mg is an essential element for imparting strength, and it is necessary to add 3% or more. However, if it exceeds 5%, inclusions such as MgO are likely to be formed during casting, and Mg-8i
Since system crystallized substances also tend to become coarse, they need to be controlled to 5% or less.
なお、FeはAl−Fe系などの晶出物を形成し易くす
るので、少ないことが望ましい。通常の低純度Al地金
を使用した場合、上記Si量の規制からFeは0.07
0%以下となる。このように品出物の点からはFeは少
ないことが望ましいが、後述の熱間割れの防止のために
は添加されていることが望ましく、0.025%以上含
有していることが好ましい。Note that since Fe facilitates the formation of crystallized substances such as Al--Fe, it is desirable that the amount of Fe be small. When using ordinary low-purity Al ingot, Fe is 0.07 due to the Si content regulation mentioned above.
It becomes 0% or less. As described above, from the viewpoint of products, it is desirable to have a small amount of Fe, but in order to prevent hot cracking, which will be described later, it is desirable that Fe be added, and it is preferably contained in an amount of 0.025% or more.
MnはMg−Si系晶出物の分布とは直接関係ないが、
A Q −Mn −Fe、 A Q−Mn等の品出物の
粗大化を防止するため、0.3%以下とすることが望ま
しい。Although Mn is not directly related to the distribution of Mg-Si crystallized substances,
In order to prevent coarsening of products such as AQ-Mn-Fe and AQ-Mn, it is desirable to keep the content to 0.3% or less.
その他の元素は、不純物である限り、本発明の効果に影
響を与えない。Other elements do not affect the effects of the present invention as long as they are impurities.
次に、本発明における製造工程について、その条件の限
定理由を説明する。Next, the reason for limiting the conditions for the manufacturing process in the present invention will be explained.
上記組成、表面性状のディスク用素材を得るため、種々
の実験を行った。Various experiments were conducted to obtain a disc material with the above composition and surface properties.
失腹貫よ
第1表に示す化学成分を有するAl−Mg合金No 1
の鋳塊につき、均質化加熱温度のMg−Si系晶出物に
及ぼす影響を調査した。その結果を第1図に示す。なお
、第1図の結果を得るに際しては、各熱処理後の鋳塊に
つき鏡面切削を行い、その後走査型電子顕微鏡にて50
0倍の倍率で面積10ml112を測定し、1μm以上
2μm未満の晶出物を2μmとして、2μm以上3μm
未満の晶出物を3μm(以下、同様)とする要領にて表
示した。Al-Mg alloy No. 1 with the chemical composition shown in Table 1
The influence of the homogenization heating temperature on the Mg-Si crystallized products was investigated for the ingots. The results are shown in FIG. In order to obtain the results shown in Figure 1, the ingots after each heat treatment were mirror-cut, and then 50 mm were cut using a scanning electron microscope.
Measure an area of 10 ml112 at 0x magnification, define crystallized matter of 1 μm or more and less than 2 μm as 2 μm, and measure 2 μm or more and 3 μm.
Crystallized substances with a diameter of less than 3 μm are expressed as 3 μm (the same applies hereinafter).
第1図において明らかな如く、従来は、Mg−8L系晶
出物(Mg、Siの形態)の数、大きさは温度を上げる
と単調に減少するというのが常識であったが、この常識
とは異なり、Mg−Si系晶出物は均熱温度が400〜
450℃で鋳造ままの状態より成長し、それより更に高
温にすると、再び小さくなる。As is clear from Figure 1, it was conventionally common knowledge that the number and size of Mg-8L crystallized substances (in the form of Mg and Si) decrease monotonically as the temperature increases; Unlike, Mg-Si crystallized products have a soaking temperature of 400~
At 450°C, it grows from the as-cast state, and when raised to a higher temperature, it becomes smaller again.
この結果より、均熱温度は500℃以上とする必要があ
ることが判明した。From this result, it was found that the soaking temperature needed to be 500°C or higher.
失1性裟
第1表に示す化学成分を有するAl−Mg合金Nα2の
鋳塊につき、均質化加熱温度のMg−3i系晶出物分布
に及ぼす影響を調べた。その結果を第2図に示す。The effect of the homogenization heating temperature on the distribution of Mg-3i crystallized substances was investigated for an ingot of Al-Mg alloy Nα2 having the chemical components shown in Table 1. The results are shown in FIG.
この結果から、均熱温度が560℃まではMg−8i系
晶出物は単調に減少することがわかる。This result shows that the Mg-8i crystallized product decreases monotonically until the soaking temperature reaches 560°C.
しかし、560℃を超えるとバーニング等の問題が発生
し易いため、560℃以下とする必要があることが判明
した。However, since problems such as burning tend to occur when the temperature exceeds 560°C, it has been found that the temperature needs to be lower than 560°C.
失1貫主
第1表に示す化学成分を有するAl−Mg合金&3の鋳
塊につき、均質化加熱時の昇温速度、冷却速度及び保持
時間のMg−Si系晶出物分布に及ぼす影響を調べた。The influence of the temperature increase rate, cooling rate, and holding time during homogenization heating on the distribution of Mg-Si crystallized substances was investigated for the ingot of Al-Mg alloy &3 having the chemical composition shown in Table 1. Ta.
その結果をそれぞれ第3図、第4図及び第5図に示す。The results are shown in FIGS. 3, 4, and 5, respectively.
第3図及び第4図から、昇温速度はMg−Si系晶出物
の分布に影響を及ぼさないことがわかるが、冷却速度は
分布に大きく影響を与え、徐冷するほどMg−Si系晶
出物が多くなる(大きくなる)ことが認められる。また
第5図から、保持時間は長いほど、Mg−8L系晶出物
は小さくなることがわかり、保持時間は少なくとも1h
r以上が必要であることが判明した。From FIGS. 3 and 4, it can be seen that the temperature increase rate does not affect the distribution of Mg-Si crystallized substances, but the cooling rate has a large effect on the distribution, and the slower the cooling, the more Mg-Si It is observed that the number of crystallized substances increases (becomes larger). Furthermore, from Fig. 5, it can be seen that the longer the holding time is, the smaller the Mg-8L crystallized substances are, and the holding time is at least 1 h.
It turns out that more than r is required.
失腹災±
実験例3の場合と同じ組成の鋳塊につき、第6図中に示
す条件の均質化加熱を施し、均質化加熱条件のMg−8
i品出物分布に及ぼす影響を調べた。An ingot with the same composition as in Experimental Example 3 was subjected to homogenization heating under the conditions shown in Figure 6, and Mg-8 under the homogenization heating conditions was applied.
We investigated the effect on the i-item product distribution.
その結果は、第6図に示すように、40℃の徐冷を含む
加熱条件では、たとえ組成が同一であってもMg−Si
系晶出物が非常に多いことが認められる。As shown in Figure 6, the results show that under heating conditions including slow cooling at 40°C, even if the composition is the same, Mg-Si
It is recognized that there are a large number of system crystallized substances.
更に、上記組成の鋳塊から15mm厚の小型鋳塊を切り
出し、上記の均質化熱処理後、空冷せずに2mm厚まで
熱間圧延を行い、Mg−Si系晶出物を測定した結果を
第7図に示す。この結果から、均質化熱処理後の鋳塊で
のMg−Si系晶出物分布は、熱間圧延後においてもそ
の傾向は維持されることがわかる。Furthermore, a small ingot with a thickness of 15 mm was cut out from the ingot with the above composition, and after the above homogenization heat treatment, it was hot rolled to a thickness of 2 mm without air cooling, and the results of measuring Mg-Si crystallized substances were reported. It is shown in Figure 7. From this result, it can be seen that the distribution of Mg-Si crystallized substances in the ingot after homogenization heat treatment maintains its tendency even after hot rolling.
大負潰j−
第1表に示す化学成分を有するAl−Mg合金Nα4の
鋳塊を開削後、540℃X10hr加熱し、熱間圧延を
530,500,470℃で開始し、6III11厚で
終了した。この後、更に4■厚まで冷間圧延し、片側約
0.11I11を切削し、鏡面仕上げを行い、Mg−S
i系晶出物につき評価した。その結果を第2表に示す。Major failure j - After cutting an ingot of Al-Mg alloy Nα4 having the chemical composition shown in Table 1, it was heated at 540℃ for 10 hours, hot rolling was started at 530, 500, and 470℃, and it was finished with a thickness of 6III11. did. After this, the Mg-S
The i-series crystallized product was evaluated. The results are shown in Table 2.
なお1本例での冷間圧延板は倍率1000倍で評価した
。また第2表における圧延順1.2.3は、熱間圧延を
行なった順序である。通常、バッチ炉で均熱する場合は
特定本数をひとまとめに均熱し、その後1本づつ取り出
して熱間圧延をする。Note that the cold rolled plate in this example was evaluated at a magnification of 1000 times. Further, rolling order 1.2.3 in Table 2 is the order in which hot rolling was performed. Normally, when soaking in a batch furnace, a specific number of pieces are soaked all at once, and then they are taken out one by one and hot rolled.
この際、炉の最後の方の取り出しとなってくると、鋳塊
の温度は自然に低下してきて徐冷したと同じ状況となる
。このため熱間圧延温度は第2表に示す如く低下するこ
とが多い。At this time, when the ingot is removed from the furnace at the end, the temperature of the ingot naturally decreases, resulting in the same situation as if it had been slowly cooled. For this reason, the hot rolling temperature often decreases as shown in Table 2.
第2表の結果より、冷延板のMg−Si系晶出物は熱間
圧延開始温度が500℃未満になると急激に増加するた
め、熱間圧延開始温度は500℃以上にする必要がある
ことがわかる。この理由は実験例1及び3に示したとお
りである。従来は、熱間圧延開始温度を470℃程度以
下にすることが熱間割れ防止等のため常識とされていた
が、これでは低純度Al地金を使用した場合にMg−S
i系晶出物の大きさがせいぜい5μm以上のものを低減
するに止まっていたのに対し、熱間圧延開始温度を高め
る効果は顕著である。From the results in Table 2, the Mg-Si crystallized substances in cold-rolled sheets increase rapidly when the hot rolling start temperature is less than 500°C, so the hot rolling start temperature needs to be 500°C or higher. I understand that. The reason for this is as shown in Experimental Examples 1 and 3. Conventionally, it was common sense to set the hot rolling start temperature to about 470°C or less to prevent hot cracking, etc., but this did not allow Mg-S
Whereas the size of i-type crystallized substances was only reduced at most 5 μm or more, the effect of increasing the hot rolling start temperature is significant.
なお、熱間圧延開始温度が530℃と高い場合、Mg−
Si系晶出物は微細化されるが、熱間圧延の初期に表面
割れが発生し易い。これは、高温における急激な歪の導
入に伴い、圧延板表面に巨大な結晶粒が形成されるため
と考えられるため、歪速度の低下が必要とされる。この
点、表面割れの防止のためには、粗大結晶粒の形成を少
しでも抑制するため、Feを0.025%以上含有する
ようにコントロールすることが好ましいことが別途確認
された。In addition, when the hot rolling start temperature is as high as 530°C, Mg-
Although Si-based crystallized substances are made finer, surface cracks are likely to occur in the initial stage of hot rolling. This is thought to be due to the formation of huge crystal grains on the surface of the rolled plate due to the introduction of rapid strain at high temperatures, and therefore, it is necessary to reduce the strain rate. In this regard, it has been separately confirmed that in order to prevent surface cracking, it is preferable to control the Fe content to 0.025% or more in order to suppress the formation of coarse crystal grains as much as possible.
したがって、熱間圧延開始温度は500℃以上とするが
、Fe含有量を0.025%以上、好ましくは0.04
0%以上の如く高めて熱間割れの防止を図り、しかしF
e含有量の増加に伴うAuFe系品出物の増加を防止す
ることを考慮すると、500〜560℃が望ましく、更
には510〜530℃が好ましい。Therefore, the hot rolling start temperature is set at 500°C or higher, and the Fe content is set at 0.025% or higher, preferably 0.04%.
In order to prevent hot cracking, F
In consideration of preventing an increase in AuFe-based products due to an increase in e content, the temperature is preferably 500 to 560°C, more preferably 510 to 530°C.
【以下余白1
以上の実験で得た知見に基づき1本発明による製造工程
条件としては、既述の組成を有するAl−Mg合金の鋳
塊に、まず、均熱温度500〜560℃、保持時間1h
r以上の均熱処理を施すことが必要である。次いで行う
熱間圧延では、圧延開始温度を500℃以上にする必要
がある。[Margin below 1 Based on the knowledge obtained from the above experiments, 1. The manufacturing process conditions according to the present invention are as follows: First, an ingot of Al-Mg alloy having the composition described above is heated at a soaking temperature of 500 to 560°C and a holding time. 1h
It is necessary to perform a soaking treatment of r or more. In the subsequent hot rolling, it is necessary to set the rolling start temperature to 500° C. or higher.
なお、均熱処理における他の条件は特に制限しないが、
昇温速度は40℃/hrを超える加熱速度が好ましく、
空冷、水冷等の冷却が望ましい。また熱間圧延では、歪
速度はFe量との関連で決めるのが好ましく、15 (
1/sec)以下の如く低いのが望ましい。Note that other conditions in the soaking treatment are not particularly limited, but
The heating rate is preferably higher than 40°C/hr,
Cooling such as air cooling or water cooling is preferable. In addition, in hot rolling, the strain rate is preferably determined in relation to the amount of Fe, and 15 (
It is desirable that it be as low as 1/sec) or less.
次に、本発明の実施例を示す。なお、前述の実験例も本
発明の実施例たる得ることは云うまでもない。Next, examples of the present invention will be shown. It goes without saying that the above-mentioned experimental examples can also be considered as examples of the present invention.
(実施例)
低純度Al地金(99,92〜99.94%)を使用し
て常法により溶解、鋳造して得られた第3表に示す化学
成分を有するAg−Mg合金Nα1の鋳塊に540℃X
20hrの均熱処理を施した後、第4表に示す条件で熱
間圧延を行い、冷間圧延により2mm厚にした。なお、
平均歪速度は板厚15n+m以上においてのもので、歪
速度ε(1/sec)は、ここで、n:ロール回転数(
rpm)
r:加工率=(出側厚)/(入側厚)
Ho:入り側板厚(、m)
Ro=ロール半径(IIIIll)
の式により求めた。(Example) Casting of Ag-Mg alloy Nα1 having the chemical composition shown in Table 3 obtained by melting and casting low-purity Al ingot (99.92 to 99.94%) by a conventional method. 540℃X for the lump
After performing soaking treatment for 20 hours, hot rolling was performed under the conditions shown in Table 4, and cold rolling was performed to obtain a thickness of 2 mm. In addition,
The average strain rate is for a plate thickness of 15n+m or more, and the strain rate ε (1/sec) is where n: Roll rotation speed (
rpm) r: Machining rate = (Output side thickness) / (Inlet side thickness) Ho: Inlet side plate thickness (, m) Ro = Roll radius (IIIll) It was determined by the following formula.
熱間粗圧延の表面状況を調べると共に、冷延板について
Mg−8i系晶出物の評価を行った。その結果を第4表
に示す。なお、晶出物は走査型電子顕微鏡にて1000
倍の倍率で面積10mm2を測定した。In addition to examining the surface condition of the hot rough rolled sheets, the cold rolled sheets were evaluated for Mg-8i crystallized substances. The results are shown in Table 4. In addition, the crystallized material was measured with a scanning electron microscope at 1000
An area of 10 mm2 was measured at double magnification.
第4表より、熱延条件が適切な工程によれば、全く不具
合がなく、かつ高密度ディスク材としての特性も満たし
ていることが認められる。なお、第4表の歪速度20
(1/sec)は従来圧延条件である。From Table 4, it can be seen that if the hot rolling conditions were appropriate, there would be no defects at all, and the properties as a high-density disk material would be satisfied. In addition, the strain rate 20 in Table 4
(1/sec) is the conventional rolling condition.
(比較例)
第3表に示す化学成分を有するAl−Mg合金Nα2(
Siが多い)の鋳塊を550℃X6hrで均熱処理した
後、530℃で熱間圧延を開始し、鋳塊厚(360mm
)から15mm厚での熱間粗圧延の平均歪速度を10
(1/sec)にコントロールし、その後4.5mm厚
まで熱間圧延し、更に2mm厚まで冷間圧延した。(Comparative example) Al-Mg alloy Nα2 (
After soaking the ingot with a high Si content at 550°C for 6 hours, hot rolling was started at 530°C to reduce the ingot thickness (360mm
) to the average strain rate of hot rough rolling with a thickness of 15 mm to 10
(1/sec), then hot rolled to a thickness of 4.5 mm, and further cold rolled to a thickness of 2 mm.
その後、表面から0.11IIl切削した鏡面について
Mg−8i系晶出物の評価を行った。この結果、Si量
が多く本発明範囲外の組成では、5μm以上の大きさの
Mg−8i系晶出物が8個/mm2存在し、高密度ディ
スク用素材としては適さないことがわかった。Thereafter, Mg-8i crystallized substances were evaluated on the mirror surface cut by 0.11IIl from the surface. As a result, it was found that in a composition with a large amount of Si and outside the range of the present invention, there were 8 Mg-8i crystallized substances/mm2 with a size of 5 μm or more, making it unsuitable as a material for a high-density disk.
【以下余白]
(発明の効果)
以上詳述した如く、本発明に係る工程によれば、比較的
低純度のアルミニウム地金を用いても、塗布型ディスク
用として充分なる高密度ディスク用素材を得ることがで
きる。したがって、製造コストは高純度地金である9
9.99%アルミニウム地金の使用の場合に比較して半
分以下で済み、工業製品の製造という点において非常に
大きい効果である。[Blank below] (Effects of the Invention) As detailed above, according to the process of the present invention, even if relatively low-purity aluminum metal is used, a high-density disk material sufficient for coated disks can be produced. Obtainable. Therefore, the manufacturing cost is high purity metal9
Compared to the case of using 9.99% aluminum ingot, the amount is less than half, which is a very large effect in terms of manufacturing industrial products.
第1図及び第2図はそれぞれMg−8i系晶出物分布に
及ぼす均質化加熱温度の影響を示す図、第3図乃至第5
図はMg−Si系晶出物分布に及ぼす均質化処理の昇温
速度、冷却速度及び保持時間の影響を示す図であって、
第3図は昇温速度の場合、第4図は冷却速度の場合、第
5図は保持時間の場合を示し、
第6図は各種の熱履歴の均質化処理条件のMgSi系品
出物品出物分布す影響を示す図、第7図は均質化処理時
のMg−Si系晶出物分布を熱延板で評価した結果を示
す図である。Figures 1 and 2 are diagrams showing the influence of homogenization heating temperature on the distribution of Mg-8i crystallized substances, and Figures 3 to 5 respectively.
The figure is a diagram showing the influence of the temperature increase rate, cooling rate, and holding time of homogenization treatment on the distribution of Mg-Si crystallized substances,
Figure 3 shows the case of heating rate, Figure 4 shows the case of cooling rate, Figure 5 shows the case of holding time, and Figure 6 shows the case of MgSi-based products under various heat history homogenization treatment conditions. FIG. 7 is a diagram showing the results of evaluating the distribution of Mg--Si crystallized substances in a hot rolled sheet during homogenization treatment.
Claims (4)
i:0.015〜0.030%を含有するAl−Mg合
金において、Mg−Si系晶出物が4μm以下であるこ
とを特徴とする高記録密度磁気ディスク用素材。(1) In weight% (the same applies hereinafter), Mg: 3 to 5% and S
A material for a high recording density magnetic disk, characterized in that an Al-Mg alloy containing i:0.015 to 0.030% has a Mg-Si crystallized substance of 4 μm or less.
0%を含有するAl−Mg合金の鋳塊に、均熱温度が5
00〜560℃、保持時間が1hr以上の均熱処理を施
し、次いで圧延開始温度500℃以上で熱間圧延を行う
ことを特徴とする高記録密度ディスク用素材の製造方法
。(2) Mg: 3-5% and Si: 0.015-0.03
The ingot of Al-Mg alloy containing 0%
1. A method for producing a material for a high recording density disk, which comprises performing soaking treatment at 00 to 560°C for a holding time of 1 hr or more, and then hot rolling at a rolling start temperature of 500°C or more.
ec)以下である請求項2記載の方法。(3) The strain rate of rough rolling in hot rolling is 15 (1/s
ec) The method according to claim 2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24306488A JPH0288741A (en) | 1988-09-27 | 1988-09-27 | Stock for high recording density disk and its manufacture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24306488A JPH0288741A (en) | 1988-09-27 | 1988-09-27 | Stock for high recording density disk and its manufacture |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0288741A true JPH0288741A (en) | 1990-03-28 |
Family
ID=17098259
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24306488A Pending JPH0288741A (en) | 1988-09-27 | 1988-09-27 | Stock for high recording density disk and its manufacture |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0288741A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04341535A (en) * | 1991-05-20 | 1992-11-27 | Sumitomo Light Metal Ind Ltd | Aluminum alloy substrate for high density coating type magnetic disk |
| JP2006161153A (en) * | 2004-11-09 | 2006-06-22 | Sumitomo Light Metal Ind Ltd | Aluminum alloy sheet having excellent drawability and method for producing the same |
| JP2006316332A (en) * | 2005-05-16 | 2006-11-24 | Sumitomo Light Metal Ind Ltd | Aluminum alloy sheet having excellent drawability and method for producing the same |
| JP2011102415A (en) * | 2009-11-10 | 2011-05-26 | Kobe Steel Ltd | Aluminum alloy sheet for magnetic disk, and method for producing the same |
| JP2024035895A (en) * | 2022-09-05 | 2024-03-15 | 株式会社Uacj | Aluminum alloy substrate for magnetic disks |
-
1988
- 1988-09-27 JP JP24306488A patent/JPH0288741A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04341535A (en) * | 1991-05-20 | 1992-11-27 | Sumitomo Light Metal Ind Ltd | Aluminum alloy substrate for high density coating type magnetic disk |
| JP2006161153A (en) * | 2004-11-09 | 2006-06-22 | Sumitomo Light Metal Ind Ltd | Aluminum alloy sheet having excellent drawability and method for producing the same |
| JP2006316332A (en) * | 2005-05-16 | 2006-11-24 | Sumitomo Light Metal Ind Ltd | Aluminum alloy sheet having excellent drawability and method for producing the same |
| JP2011102415A (en) * | 2009-11-10 | 2011-05-26 | Kobe Steel Ltd | Aluminum alloy sheet for magnetic disk, and method for producing the same |
| JP2024035895A (en) * | 2022-09-05 | 2024-03-15 | 株式会社Uacj | Aluminum alloy substrate for magnetic disks |
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