JPH0295148U - - Google Patents
Info
- Publication number
- JPH0295148U JPH0295148U JP284389U JP284389U JPH0295148U JP H0295148 U JPH0295148 U JP H0295148U JP 284389 U JP284389 U JP 284389U JP 284389 U JP284389 U JP 284389U JP H0295148 U JPH0295148 U JP H0295148U
- Authority
- JP
- Japan
- Prior art keywords
- anode
- plate
- electrode facing
- facing wall
- bias voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010891 electric arc Methods 0.000 claims 2
- 239000004020 conductor Substances 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
- 239000012212 insulator Substances 0.000 description 2
- 238000000605 extraction Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
第１図は本考案の一例を示すイオン源の概略縦
断面図。第２図はマルチアレイプレートの斜視図
。第３図はマルチアレイプレートの部分断面図。
第４図は本考案のイオン源に於けるプラズマの径
方向密度分布図。第５図はバイアス電圧・電流図
。第６図は従来例に係るイオン源の概略縦断面図
。第７図は従来のイオン源に於けるプラズマの径
方向密度分布図。第８図はマルチアレイプレート
の他の例を示す正面図。第９図は抵抗分割式のバ
イアス電源図。
１……イオンビーム引き出し電極、２……アノ
ード、３……磁場コイル、４……絶縁物、５……
カソードフイラメント、６……電極対向壁、９…
…マルチアレイプレート、１０……絶縁物、１１
……絶縁板、１２……プレート、１３……バイア
ス電源、１４……ガス導入口、１５……アノード
電源、１６……フイラメント電源、１７……開口
、１８……リード線。
FIG. 1 is a schematic vertical cross-sectional view of an ion source showing an example of the present invention. FIG. 2 is a perspective view of the multi-array plate. FIG. 3 is a partial cross-sectional view of the multi-array plate.
FIG. 4 is a radial density distribution diagram of plasma in the ion source of the present invention. Figure 5 is a bias voltage/current diagram. FIG. 6 is a schematic vertical cross-sectional view of a conventional ion source. FIG. 7 is a radial density distribution diagram of plasma in a conventional ion source. FIG. 8 is a front view showing another example of the multi-array plate. Figure 9 is a resistor-divided bias power supply diagram. 1... Ion beam extraction electrode, 2... Anode, 3... Magnetic field coil, 4... Insulator, 5...
Cathode filament, 6... Electrode facing wall, 9...
...Multi-array plate, 10...Insulator, 11
... Insulating plate, 12 ... Plate, 13 ... Bias power supply, 14 ... Gas inlet, 15 ... Anode power supply, 16 ... Filament power supply, 17 ... Opening, 18 ... Lead wire.
Claims (1)
しアーク放電を起こさせる事によりガスをプラズ
マにするイオン源であつて、容器の側壁をなすア
ノード２と、アノード２の端面と絶縁物４を介し
て連結される電極対向壁６と、電極対向壁６によ
つて支持されるカソードフイラメント５と、カソ
ードフイラメント５に電流を流すフイラメント電
源１６と、アノード２とカソード５の間にアーク
放電を起こさせるためのアノード電源１５と、ア
ノードである容器側周の外側に設けられ軸方向の
磁場又はカスプ磁場を生ずる磁石と、カソードフ
イラメント５と電極対向壁６の間に設けられ互い
に独立な複数の導体であるプレート１２を有する
マルチアレイプレート９と、複数のプレート１２
にバイアス電圧Ｖｂを与えるバイアス電源１３，
……とよりなり、中央部のプレート１２のバイア
ス電圧をより高く、周縁部のプレート１２のバイ
アス電圧をより低くした事を特徴とするイオン源
。 This is an ion source that converts gas into plasma by introducing gas into a container that can be evacuated and causing an arc discharge. An arc discharge is caused between the electrode facing wall 6 connected through the electrode facing wall 6, the cathode filament 5 supported by the electrode facing wall 6, the filament power supply 16 that supplies current to the cathode filament 5, and the anode 2 and cathode 5. an anode power source 15 for generating an anode, a magnet provided on the outside of the side circumference of the container serving as an anode to generate an axial magnetic field or a cusp magnetic field, and a plurality of mutually independent conductors provided between the cathode filament 5 and the electrode facing wall 6. A multi-array plate 9 having a plate 12 and a plurality of plates 12
a bias power supply 13 that provides a bias voltage Vb to
...and the ion source is characterized in that the bias voltage of the plate 12 in the central part is higher and the bias voltage of the plate 12 in the peripheral part is lower.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP284389U JPH0295148U (en) | 1989-01-13 | 1989-01-13 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP284389U JPH0295148U (en) | 1989-01-13 | 1989-01-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0295148U true JPH0295148U (en) | 1990-07-30 |
Family
ID=31203970
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP284389U Pending JPH0295148U (en) | 1989-01-13 | 1989-01-13 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0295148U (en) |
-
1989
- 1989-01-13 JP JP284389U patent/JPH0295148U/ja active Pending
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