JPH03104874A - Method for constituting electroless nickel plating layer on metallic mold surface and metallic mold for resin sealing of electronic parts - Google Patents

Method for constituting electroless nickel plating layer on metallic mold surface and metallic mold for resin sealing of electronic parts

Info

Publication number
JPH03104874A
JPH03104874A JP1239785A JP23978589A JPH03104874A JP H03104874 A JPH03104874 A JP H03104874A JP 1239785 A JP1239785 A JP 1239785A JP 23978589 A JP23978589 A JP 23978589A JP H03104874 A JPH03104874 A JP H03104874A
Authority
JP
Japan
Prior art keywords
mold
plating layer
electroless nickel
nickel plating
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1239785A
Other languages
Japanese (ja)
Inventor
Michio Osada
道男 長田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOOWA KK
Towa Corp
Original Assignee
TOOWA KK
Towa Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOOWA KK, Towa Corp filed Critical TOOWA KK
Priority to JP1239785A priority Critical patent/JPH03104874A/en
Publication of JPH03104874A publication Critical patent/JPH03104874A/en
Pending legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/17Component parts, details or accessories; Auxiliary operations
    • B29C45/26Moulds
    • B29C45/37Mould cavity walls, i.e. the inner surface forming the mould cavity, e.g. linings

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Chemically Coating (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】[Detailed description of the invention]

〔産業上の利用分野〕 この発明は、例えば、樹脂成形用金型面に無電解ニッケ
ルメッキ層を構成する方法の改良と、例えば、IC・ダ
イオード・コンデンサー等の電子部品を樹脂材料にて封
止成形するための金型の改良に係り、特に、金型面に対
する無電解ニッケルメッキ層の密着性の向上と、金型面
に対する樹脂成形体の離型性の向上、及び、全体的な樹
脂成形サイクルタイムの短縮化を図るものに関する。 〔従来の技術〕 雷子部品を熱硬化性樹脂等の樹脂材料にて封止成形する
ための樹脂封止成形装置としては、例えば、第4図及び
第5図に示すようなトランスファ樹脂封止成形用金型が
知られている。 上記金型には、固定上型1と、該固定上型1に対向配設
した可動下型2と、該両型(1・2)のP.L(パーテ
ィングライン)面に対設した電子部品3の樹脂封止成形
用キャビティ (it・2■)と、下型?側に配置した
樹脂材料4の供給用ボット5と、該ボット5内に嵌装さ
せた樹脂材料加圧用ブランジャ6と、上記ボット5と上
型キャビティ1■側とを連通させた溶融樹脂材料の移送
用通路7と、上下両型(1・2)に夫々配設した加熱用
ヒータ8等が備えられており、この金型による電子部品
3の樹脂封止成形は次のようにして行なわれる。 まず、第4図に示す両型(1・2)の型開時において、
電子部品3を装着したリードフレーム9を下型2のP.
L面に形成したセット用溝部22の所定位置に嵌合セッ
トすると共に、ポット5内に樹脂材料4を供給する。 次に、第5図に示すように、下型2を上動させて上下両
型(1・2)の型締めを行ない、この状態でブランジャ
6によりポット5内の樹脂材料4を加圧すると、該樹脂
材料4はヒータ8にて加熱溶融化されながらプランジャ
6にて加圧されるため、該ボット5から通路7を通して
上下両キャビティ(Il・21〉内に注入充填されるこ
とになる。 従って、所要のキュアタイム後に両型(1・2)を?び
型開きすると共に、両キャビティ (1■・2l)内及
び通路7内の硬化樹脂を上下両エジェクター機横10・
10にて同時的に離型させることにより、該両キャビテ
ィ (11・2+)内の電子部品3を該両キャビティの
形状に対応して成形される樹脂成形体内に封止成形する
ことができるものである。 〔発明が解決しようとする問題点〕 ところで、上記した樹脂材料4には熱硬化性のものを用
いるのが通例であり、従って、上記樹脂成形後において
、更にキュアリングを行ない、その硬化促進を図るよう
にしている。 上記したキュアリングの目的は、電子部品3の気密性を
保持し且つその機械的安定性を向上させることと共に、
上下両型く1・2)のP.L面から樹脂成形体を効率良
く離型させることをもその目的としている。 即ち、樹脂成形体が未硬化状態にあるときは、型開後に
おける樹脂成形体の離型(突き出し)作用が阻害されて
、次のような問題が生じる。 例えば、該樹脂成形体の表面に傷痕や欠損部が?成され
て電子部品の気密性・機械的安定性を損なうといった製
品の品質保証上の問題があり、或は、樹脂材料の一部が
両型のP.L面に残存付着するためその除去に手数を要
するといった樹脂成形効率上の問題等がある。 また、成形後に樹脂材料の一部が、上記通路7における
カル(71〉・ゲート(7■)や、両キャビティ(L+
・21)或は上型キャビティ1lに連通形威したエアベ
ント12内に残存付着した場合において、仮に、これら
を除去しない状態で次の樹脂成形を行なうと、上記両キ
ャビティ内での樹脂材科未充填が発生したり、樹脂成形
体にボイドが形成される等の弊害が発生する. 従って、上記溶融樹脂材料の硬化促進のためのキュアリ
ングタイムは、硬化時間を最も必要とする上記通路内カ
ル(7I〉部の樹脂硬化時間を見込んで、例えば、金型
温度が165゜Cの場合、約70 secに設定されて
いる。このため、上記キュアリングタイムの設定が全体
的な樹脂成形サイクルタイムを長くしなければならない
要因とされていた。 そこで、本発明は、樹脂封止成形用金型に対する樹脂成
形体の離型性の向上を図ると共に、該樹脂成形体のキエ
アリングタイムを短縮して、全体的な樹脂成形サイクル
タイムの短縮化を図ることができる電子部品の樹脂封止
成形用金型を提供することを目的とするものである. また、この種の金型面には、通常、HAλB,Crによ
るメッキ処理が施されているが、成形後の金型面に樹脂
が残存付着するのを確実に防止できないのが実情である
。これは、HARDCrメッキが大気中において容易に
酸化され易いため、その酸化物であるCr203中の酸
素原子と熱硬化性樹脂(例えば、エボキシレジン)中の
水素原子との、所謂、水素結合に起因するものと考えら
れている.そこで、本発明は、金型面に大気中において
酸化されない無電解ニッケルメッキ層を構成して、金型
面に対する樹脂成形体の離型性を向上させると共に、該
金型素材面と無電解ニッケルメッキ層との密着性を向上
させることができる方法を提供することを目的とするも
のである。 〔問題点を解決するための手段〕 上述した従来の問題点に対処するための本発明に係る金
型面に無電解ニッケルメッキ層を構成する方法は、次の
特徴を備えている。 即ち、金型面に無電解ニッケルメッキ層を構成する方法
において、該金型の素材面と無電解ニッケルメッキ層と
の両者間に、該両者に対して拡敗係数の高い元素を含む
メッキ層を介在させることを特徴とするものである。 また、上記した両者間に介在させるメッキ層として、C
uメッキを用いることを特徴とするものである. また、上記した両者間に介在させるメッキ層として、電
解ニッケルメッキを用いることを特徴とするものである
. また、上記した両者間に介在させるメッキ層を0.lμ
乃至5μの薄膜状に構成することを特徴とするものであ
る。 また、上記した両者間に介在させるメッキ層として、H
ARDCrメッキを用いることを特徴とするものである
。 また、本発明に係る他の方法は、次の特徴を備えている
。 即ち、金型面に無電解ニッケルメッキ層を構成する方法
において、該金型の素材面と無電解ニッケルメッキ層と
の両者間に窒化層を介在させることを特徴とするもので
ある。 更に、本発明に係る電子部品の樹脂封止成形用金型は、
次の特徴を備えている. 即ち、金型面に無電解ニッケルメッキ層を構成した電子
部品の樹脂封止成形用金型であって、該金型の素材面と
無電解ニッケ、ルメッキ層との両者間に、該両者に対し
て拡散係数の高い元素を含むメッキ層を介在させて構成
したことを特徴とするものである。 また、金型面に無電解ニッケルメッキ層を構成した電子
部品の樹脂封止成形用金型であって、該金型の素材面と
無電解ニッケルメッキ層との両者間に窒化層を介在させ
て構成したことを特徴とするものである。 〔作用〕 本発明によれば、金型面に対する樹脂成形体の離型性を
大幅に向上することができる。 即ち、金型面に無電解ニッケルメッキ層をI威したこと
によって、該金型面と熱硬化性樹脂との間に水素結合に
よる接着作用が起こるのを確実に阻止できるので、金型
面に対する樹脂成形体の離型性を大幅に向上するここと
ができ、従って、金型面に樹脂が残存付着するのを効率
良く且つ確実に防止することができるものである。 また、樹脂材料硬化促進のためのキュアリングタイムを
、従来の約70虹から約30secにまで短縮すること
ができる. 即ち、樹脂成形体の離型性の向上と相俟て、上記したキ
ュアリングタイム(約30FM:)後に、該樹脂成形体
の離型作用を効率良く且つ確実に行なうことができるた
め、全体的な樹脂成形サイクルタイムを短縮することが
できるものである。 また、本発明においては、金型素材面と無電解ニッケル
メッキ層との密着性が向上されるので、無電解ニッケル
メッキ層が金型素材面から剥離するのを確実に防止する
ことができるものである。 〔実施例〕 以下、本発明を第1図乃至第3図に示す実施例図に基づ
いて説明する。 第1図には、電子部品を熱硬化性樹脂材料にて封止成形
するためのトランスファ樹脂封止戊形用金型の概略が示
されており、また、第2図及び第3図には、その要部が
拡大図示されている.該金型には、固定上型11と、該
固定上型11に対向配設した可動下型12と、該上下両
型(11−12)のP.L面に対設した電子部品13の
樹脂封止成形用キャビテイ(11l・121)と、下型
12側に配置した樹脂材料14の供給用ボットl5と、
該ボット15内に嵌装させた樹脂材料加圧用のプランジ
ャ16と、上記ボット15と上型キャビテイ111側と
を連通させた溶融樹脂材料の移送用通路17と、上下両
型(11・12)に夫々配設した加熱用ヒータ18等が
備えられている. また、上記金型の素材面(金型のP.L面におけ?溶融
樹脂材料との接触面)、例えば、ボット15位置と対応
する上型カル(17■)及び該カルと上型キャビティ1
11とを連通させた上型ゲート(172)から戒る溶融
樹脂材料の移送用通路l7・上下の両キャビティ(11
■・l21)・上型キャビティ11■と外部とを連通さ
せたエアベント11■等には、無電解ニッケルメッキ層
Aが構成されている.これらの金型素材面に無電解ニッ
ケルメッキ層Aを構成するには、次の方法が適している
。 即ち、第3図に示すように、該金型の素材面Bと無電解
ニッケルメッキ層Aとの両者間に、該両者に対して拡散
係数の高い元素を含むメッキ層Cを介在させればよい。 この両者間に介在させるメッキ層としては、例えば、C
uメッキ・電解ニッケルメッキを用いればよく、また、
該メッキ層は0.1μ乃至5μの薄膜状に構或すること
が好ましいが、それは次の理由によるものである。即ち
、 ■Ni元素のFe元素に対する拡散係数は 2.0cn
(/s、■Ni元素のCu元素に対する拡散係数は 2
.7cnf/s、■Cu元素のFe元素に対する拡散係
数は25.0cnt/s、であるから、例えば、まず、
金型の素材面BにCu元素から成るメッキ層Cを施し、
次に、該メッキ層CにNi元素から成る無電解ニッケル
メッキ層Aを施せばよい。この方法によるときは、金型
素材面Bに無電解ニッケルメッキ層Aを直接的に施す場
合よりも、該メッキ被膜が効率良く拡散されるので、金
型の素材面Bに、Cu元素から戒る薄膜のメッキ層Cを
介して、無電解ニッケルメッキ層Aを施すことにより、
結果的に、金型の素材面Bに対する無電解ニッケルメッ
キ層Aの密着を確実に行なうことができるものである。 このため、金型素材面Bに対して確実に密着された無電
解ニッケルメッキ層Aは、樹脂成形時等における剥離・
欠損が防止される.金型面にこのような欠損部〈ピンホ
ールやマイクロクラック)が存在するときは、溶融樹脂
材料が該欠損部内に浸入して硬化し、このため樹脂成形
体の離型時にその部分が恰もアンダーカットと同様に作
用して離型不良の要因になる。しかしながら、金型の素
材面Bに対する無電解ニッゲルメッキ層Aの密着が確実
に行なわれているため、例えば、金型面に生じた欠損部
分の修復を目的とする再メッキ処理等が不要となる利点
がある。 なお、母材にCr元素や炭素が多く含まれている場合は
炭化物が形或されてメッキ被膜の拡敗を妨げる現象がみ
られる。従って、このことから、母材(金型素材)自体
にCr元素や炭素を多く含まない炭素工具鋼等を選定す
ることが好ましい。 また、上記した両者間に介在させるメッキ層として、I
LRoCrメッキを用いてもよい。 また、上記した金型面に無電解ニッケルメッキ層をn4
戒する場合においては、該金型の素材面と無電解ニッケ
ルメッキ層との両者間に窒化層を介在させてもよい。即
ち、このときは、両者の密着性の向上と、金型面の硬度
を高めることができると云った相乗効果が期待できるも
のである。 更に、上記金型のP.L面における溶融樹脂材料との接
触面に配設される樹脂成形用の各部材、即ち、プランジ
ャ16・ボット15・上下両キャビティ及びカル部に嵌
装されたエジエクタービン(201)の所要個所にも、
上記した無電解ニッケルメツキNAが夫々同様に施され
ており、従って、加熱溶融化され且つ加圧移送される溶
融樹脂材料が接触する金型P.L面の全面に無電解ニッ
ケルメッキ層Aが横或されていることになる. なお、金型面に無電解ニッケルメッキ層Aが構成された
電子部品の樹脂封止成形用金型は、従来のものと同様に
使用することができる.まず、第1図に示す両型〈11
・12〉の型開時において、電子部品13を装着したリ
ードフレーム19を下型12のP.L面に形成したセッ
ト用溝部122の所定位置に嵌合セッ卜すると共に、ボ
ット15内に樹脂材料14を供給する. 次に、下型12を上動させて両型(11・12)の型締
め(第5図参照)を行なうと共に、プランジャ16にて
ポット15内の樹脂材料14を加圧すればよい.このと
き、上記樹脂材料14はヒータ18によって加熱溶融化
され且つプランジャ16によって加圧されて、ボットl
5から移送用通路17を通して上下の?キャビティ(1
11・12!〉内に注入充填されることになる.従って
、所要のキュアタイム後に該両型〈1・2)を再び型開
きすると共に、該両キャビテイ(11■・12+)内及
び通路17内の硬化樹脂を上下の両エジェクター機構2
0・20にて同時的に離型させることにより、該両キャ
ビティ(11l・12、〉内の電子部品13を該両キャ
ビテイの形状に対応して成形される樹脂成形体内に封止
成形することができるものである. 次の実験結果表には、次記の樹脂成形条件下で樹脂成形
を行なった場合に得られた該樹脂成形体の離型性に関す
る結果及び判断が示されている。 なお、該実験結果表中の×印は、樹脂成形体の離型性が
不良若しくは不充分で、その離型時に樹脂の残存付着等
に起因した前記ボイド或は欠損部の発生が認められたも
のであり、同○印は、その離型性が良好であって上記し
た弊害が認められないものを示している. また、該実験結果表中の総合判断におけるΔ印は不可を
、同◎印は可を示している.
[Industrial Field of Application] This invention is aimed at, for example, improving the method of forming an electroless nickel plating layer on the surface of a mold for resin molding, and sealing electronic components such as ICs, diodes, and capacitors with resin materials. The improvement of molds for permanent molding is particularly concerned with improving the adhesion of the electroless nickel plating layer to the mold surface, improving the releasability of the resin molded product from the mold surface, and improving the overall resin. Related to shortening molding cycle time. [Prior Art] As a resin sealing molding apparatus for sealing and molding thunderbolt parts with a resin material such as a thermosetting resin, for example, a transfer resin sealing apparatus as shown in FIGS. 4 and 5 is used. Molding molds are known. The mold includes a fixed upper mold 1, a movable lower mold 2 disposed opposite to the fixed upper mold 1, and P. The cavity (it・2■) for resin sealing molding of electronic component 3 placed opposite to the L (parting line) surface and the lower mold? A bot 5 for supplying the resin material 4 disposed on the side, a plunger 6 for pressurizing the resin material fitted in the bot 5, and a bot 5 for supplying the molten resin material placed in communication with the bot 5 and the upper mold cavity 1 side. A transfer passage 7 and heating heaters 8 disposed in both the upper and lower molds (1 and 2) are provided, and resin sealing molding of the electronic component 3 using this mold is carried out as follows. . First, when opening both molds (1 and 2) shown in Fig. 4,
The lead frame 9 with the electronic component 3 mounted thereon is placed in the P. of the lower mold 2.
The resin material 4 is fitted and set in a predetermined position of the setting groove 22 formed on the L surface, and the resin material 4 is supplied into the pot 5. Next, as shown in FIG. 5, the lower mold 2 is moved upward to clamp both the upper and lower molds (1 and 2), and in this state, the plunger 6 pressurizes the resin material 4 in the pot 5. Since the resin material 4 is heated and melted by the heater 8 and pressurized by the plunger 6, it is injected and filled from the bot 5 through the passage 7 into both the upper and lower cavities (Il.21). Therefore, after the required curing time, both molds (1 and 2) are opened, and the cured resin in both cavities (1 and 2 l) and in the passage 7 is removed by the upper and lower ejector machines.
By simultaneously releasing the molds at step 10, the electronic components 3 in both cavities (11, 2+) can be sealed and molded into a resin molded body molded to correspond to the shapes of both cavities. It is. [Problems to be Solved by the Invention] By the way, it is customary to use a thermosetting material for the resin material 4 described above, and therefore, after the resin molding, curing is further performed to accelerate the curing. I'm trying to figure it out. The purpose of the curing described above is to maintain the airtightness of the electronic component 3 and improve its mechanical stability.
Both upper and lower types 1 and 2) P. Another purpose is to efficiently release the resin molded body from the L-plane. That is, when the resin molded body is in an uncured state, the releasing (ejecting) action of the resin molded body after the mold is opened is inhibited, causing the following problem. For example, are there any scratches or defects on the surface of the resin molded product? There is a problem with product quality assurance, such as impairing the airtightness and mechanical stability of electronic parts, or if a part of the resin material is mixed with both types of P. There are problems in terms of resin molding efficiency, such as the fact that residual adhesion on the L side requires time and effort to remove. In addition, after molding, a part of the resin material is deposited in the cull (71> and gate (7■) in the passage 7, as well as in both cavities (L+
・21) Or, if there is residual adhesion in the air vent 12 that communicates with the upper mold cavity 1l, if the next resin molding is performed without removing it, the resin material in both cavities will be damaged. Problems such as filling and voids forming in the resin molding occur. Therefore, the curing time for accelerating the curing of the molten resin material is determined by taking into account the curing time of the resin in the channel (7I), which requires the most curing time, for example, when the mold temperature is 165°C. In this case, the curing time is set to about 70 sec.For this reason, the setting of the curing time described above has been considered to be a factor in lengthening the overall resin molding cycle time. A resin for electronic parts that can improve the releasability of a resin molded body from a mold, shorten the key ring time of the resin molded body, and shorten the overall resin molding cycle time. The purpose of this is to provide a mold for sealing molding.Also, the surface of this type of mold is usually plated with HAλB, Cr, but the surface of the mold after molding is The reality is that it is not possible to reliably prevent residual resin from adhering to the thermosetting resin ( For example, it is thought that this is caused by so-called hydrogen bonds with hydrogen atoms in epoxy resin.Therefore, the present invention provides an electroless nickel plating layer that does not oxidize in the atmosphere on the mold surface. The object of the present invention is to provide a method capable of improving the releasability of a resin molded body from a mold surface and improving the adhesion between the mold material surface and an electroless nickel plating layer. [Means for Solving the Problems] The method of forming an electroless nickel plating layer on a mold surface according to the present invention, which addresses the above-mentioned conventional problems, has the following features: In the method of configuring an electroless nickel plating layer on a mold surface, a plating layer containing an element having a high spread coefficient with respect to both the material surface of the mold and the electroless nickel plating layer is provided between the material surface of the mold and the electroless nickel plating layer. In addition, as the plating layer interposed between the above-mentioned two, C
It is characterized by the use of U plating. Further, the present invention is characterized in that electrolytic nickel plating is used as the plating layer interposed between the above-mentioned two. Further, the plating layer interposed between the above-described two is 0. lμ
It is characterized by being constructed in the form of a thin film with a thickness of 5 μm to 5 μm. Moreover, as a plating layer interposed between the above-mentioned two, H
It is characterized by using ARDCr plating. Further, another method according to the present invention has the following features. That is, the method of forming an electroless nickel plating layer on a mold surface is characterized by interposing a nitride layer between both the material surface of the mold and the electroless nickel plating layer. Furthermore, the mold for resin sealing molding of electronic components according to the present invention includes:
It has the following features. That is, it is a mold for resin-sealing electronic components having an electroless nickel plating layer on the mold surface, and there is a layer between the material surface of the mold and the electroless nickel plating layer. In contrast, it is characterized in that it is constructed by interposing a plating layer containing an element with a high diffusion coefficient. The present invention also provides a mold for resin-sealing electronic components having an electroless nickel plating layer on the mold surface, wherein a nitride layer is interposed between the material surface of the mold and the electroless nickel plating layer. It is characterized by being configured with the following features. [Function] According to the present invention, the releasability of the resin molded article from the mold surface can be significantly improved. That is, by applying an electroless nickel plating layer to the mold surface, it is possible to reliably prevent adhesion between the mold surface and the thermosetting resin due to hydrogen bonding. The mold releasability of the resin molded article can be greatly improved, and therefore, it is possible to efficiently and reliably prevent residual resin from adhering to the mold surface. Furthermore, the curing time for accelerating the hardening of the resin material can be shortened from the conventional approximately 70 seconds to approximately 30 seconds. In other words, in addition to improving the mold releasability of the resin molded product, it is possible to efficiently and reliably release the resin molded product after the curing time (approximately 30 FM), which improves the overall This makes it possible to shorten the resin molding cycle time. Furthermore, in the present invention, since the adhesion between the mold material surface and the electroless nickel plating layer is improved, it is possible to reliably prevent the electroless nickel plating layer from peeling off from the mold material surface. It is. [Example] Hereinafter, the present invention will be explained based on the example diagrams shown in FIGS. 1 to 3. FIG. 1 shows an outline of a transfer resin sealing mold for sealing and molding electronic components with thermosetting resin material, and FIGS. 2 and 3 show , the main parts are shown enlarged. The mold includes a fixed upper mold 11, a movable lower mold 12 disposed opposite to the fixed upper mold 11, and P. A cavity (11l, 121) for resin sealing molding of the electronic component 13 placed opposite to the L side, and a feeding bot 15 for the resin material 14 placed on the lower mold 12 side,
A plunger 16 for pressurizing the resin material fitted in the bot 15, a passage 17 for transferring molten resin material that communicates the bot 15 with the upper mold cavity 111 side, and both upper and lower molds (11 and 12). A heating heater 18, etc., is provided at each of the two. In addition, the material surface of the mold (the contact surface with the molten resin material on the P.L surface of the mold), for example, the upper mold cull (17) corresponding to the bot 15 position and the upper mold cavity between the mold 1
Passage l7 for transferring molten resin material from the upper mold gate (172) communicating with 11 and both upper and lower cavities (11
■・l21)・An electroless nickel plating layer A is formed on the air vent 11■, which communicates the upper mold cavity 11■ with the outside. The following method is suitable for forming the electroless nickel plating layer A on these mold material surfaces. That is, as shown in FIG. 3, if a plating layer C containing an element having a high diffusion coefficient is interposed between the material surface B of the mold and the electroless nickel plating layer A, good. The plating layer interposed between the two may be, for example, C
U plating or electrolytic nickel plating may be used, and
The plating layer is preferably formed into a thin film with a thickness of 0.1 μm to 5 μm for the following reason. That is, ■The diffusion coefficient of Ni element to Fe element is 2.0cn
(/s, ■The diffusion coefficient of Ni element to Cu element is 2
.. 7 cnt/s, ■The diffusion coefficient of Cu element to Fe element is 25.0 cnt/s, so for example, first,
A plating layer C made of Cu element is applied to the material side B of the mold,
Next, an electroless nickel plating layer A made of Ni element may be applied to the plating layer C. When this method is used, the plating film is more efficiently diffused than when the electroless nickel plating layer A is applied directly to the mold material surface B, so that the Cu element is removed from the mold material surface B. By applying electroless nickel plating layer A through thin film plating layer C,
As a result, the electroless nickel plating layer A can be reliably adhered to the material surface B of the mold. Therefore, the electroless nickel plating layer A, which is firmly adhered to the mold material surface B, can be easily peeled off during resin molding, etc.
Defects are prevented. When such defects (pinholes or microcracks) exist on the mold surface, the molten resin material infiltrates into the defects and hardens, resulting in the area being undercut when the resin molded product is released from the mold. It acts in the same way as cutting and becomes a cause of poor mold release. However, since the electroless Nigel plating layer A is firmly adhered to the material surface B of the mold, there is an advantage that, for example, there is no need for re-plating treatment for the purpose of repairing a defective part that has occurred on the mold surface. There is. Note that when the base material contains a large amount of Cr element or carbon, a phenomenon is observed in which carbides are formed and prevent the plating film from spreading. Therefore, from this point of view, it is preferable to select carbon tool steel or the like that does not contain a large amount of Cr element or carbon in the base material (mold material) itself. In addition, as a plating layer interposed between the above-mentioned two, I
LRoCr plating may also be used. In addition, an electroless nickel plating layer is applied to the above mold surface.
If this is prohibited, a nitride layer may be interposed between the material surface of the mold and the electroless nickel plating layer. That is, in this case, a synergistic effect can be expected, such as improving the adhesion between the two and increasing the hardness of the mold surface. Furthermore, the P. of the above mold. Required parts of the resin molding parts arranged on the contact surface with the molten resin material on the L surface, that is, the plunger 16, the bot 15, both the upper and lower cavities, and the extractor turbine (201) fitted in the cull part Also,
The above-mentioned electroless nickel plating NA is applied in the same manner to each mold P. The electroless nickel plating layer A is spread across the entire surface of the L surface. Note that the mold for resin-sealing electronic components having the electroless nickel plating layer A formed on the mold surface can be used in the same way as conventional molds. First, both types shown in Figure 1 <11
- When the mold is opened in step 12>, the lead frame 19 with the electronic component 13 mounted thereon is placed in the P. of the lower mold 12. At the same time, the resin material 14 is supplied into the bot 15 by fitting it into the predetermined position of the setting groove 122 formed on the L surface. Next, the lower mold 12 is moved upward to clamp both molds (11 and 12) (see FIG. 5), and the resin material 14 in the pot 15 is pressurized by the plunger 16. At this time, the resin material 14 is heated and melted by the heater 18 and pressurized by the plunger 16, so that the bot l
5 through the transfer passage 17 to the upper and lower parts. Cavity (1
11/12! 〉 will be injected and filled. Therefore, after the required curing time, both the molds (1 and 2) are opened again, and the cured resin in the cavities (11 and 12+) and the passage 17 is removed from the upper and lower ejector mechanisms.
By simultaneously releasing the molds at 0 and 20, the electronic components 13 in both cavities (11l and 12, The following table of experimental results shows the results and judgments regarding the mold releasability of the resin moldings obtained when resin molding was carried out under the following resin molding conditions. Note that the x mark in the experimental results table indicates that the resin molded product had poor or insufficient mold releasability, and that voids or missing portions were observed to occur due to residual adhesion of the resin during mold release. The same ○ mark indicates that the mold releasability is good and the above-mentioned adverse effects are not observed.In addition, the Δ mark in the overall judgment in the test result table indicates that it is not acceptable, and the same ◎ The mark indicates OK.

【樹脂成形条件】[Resin molding conditions] 【検討】【Consider】

1..  HARoCr(八−ドクロム)、 及び、 
Tic(チタニュウムカーバイド)にて表面処理したも
のには表面に多数のビンホールやマイクロクラックが形
戒されている. 本発明(無電解ニッケルメッキ)により表面処理を施し
たものにはこれらの形戒がなく、該処理表面は極めて良
好な平滑面を構成している.2,溶融樹脂材料がビンホ
ールやマイクロクラツク内に浸入して硬化すると、樹脂
成形体の離型時にその部分が恰もアンダーカットと同様
に作用することになる。従って、これが離型不良の要因
になるものと考えられるが、本発明による表面処理の場
合はこのようなアンダーカット作用が発生しないので、
極めて良好な樹脂成形体の離型作用・効果が得られる. 3 本発明による表面処理の場合は、金型面の無電解ニ
ッケルメッキ層と熱硬化性樹脂との間に水素結合による
接着作用が起きないので、キュアリングタイムを30 
secに設定したときでも樹脂成形後の金型面に樹脂が
残存付着していない.また、効率の良い離型作用が得ら
れるので、専用のエジェクター機構を用いることなく、
樹脂成形体を離型することができる。 4.本発明による表面処理の場合は、金型素材面に対す
る無電解ニッケルメッキ層の密着が確実であるので、該
無電解ニッケルメッキ層が金型面から剥離されるのを確
実に防止できる. なお、本発明は、上記各実施例の構成に限定されるもの
ではなく、本発明の趣旨を逸脱しない範囲内で、その他
の方法及び楕戒を任意に選択して採用することができる
ものである. 〔発明の効果〕 本発明によれば、金型の素材面に対して無電解ニッケル
メッキ層を効率良く且つ確実に密着させることができる
効果を奏するものである.また、この金型素材面と無電
解ニッケルメッキ層とを確実に密着させることができる
ので、無電解ニッケルメッキ層が金型素材面から剥離す
るのを確実に防止できる効果を奏するものである.また
、本発明によれば、金型面に対する樹脂成形体の離型性
を向上することができるので、金型面に樹脂が残存付着
するのを効率良く且つ確実に防止することができ、また
、樹脂材料硬化促進のためのキュアリングタイムを短縮
し得て全体的な樹脂或形サイクルタイムの短縮化を図る
ことができる効果を奏するものである. また、このような樹脂成形体の離型性向上は、樹脂封止
成形用金型に対する樹脂の残存付着と、それに基づく前
述したような、樹脂成形上の弊害を確実に解消すること
ができるので、高品質性と高信頼性が強く要請されてい
るこの種製品の成形技術分野に大きく貢献することがで
きる等の優れた実用的な効果を奏するものである.
1. .. HARoCr (octa-dochrome), and
Products that have been surface treated with Tic (titanium carbide) have many holes and microcracks on the surface. The surface treated according to the present invention (electroless nickel plating) does not have these limitations, and the treated surface forms an extremely smooth surface. 2. If the molten resin material penetrates into the via holes or microcracks and hardens, those areas will act like an undercut when the resin molded product is released from the mold. Therefore, this is thought to be a cause of poor mold release, but in the case of the surface treatment according to the present invention, such an undercut effect does not occur.
Extremely good mold release action and effect on resin molded products can be obtained. 3 In the case of the surface treatment according to the present invention, no adhesion effect due to hydrogen bonding occurs between the electroless nickel plating layer on the mold surface and the thermosetting resin, so the curing time can be reduced by 30 minutes.
Even when set to sec, there is no residual resin adhering to the mold surface after resin molding. In addition, since an efficient mold release action can be obtained, there is no need to use a dedicated ejector mechanism.
The resin molded body can be released from the mold. 4. In the case of the surface treatment according to the present invention, the adhesion of the electroless nickel plating layer to the surface of the mold material is ensured, so it is possible to reliably prevent the electroless nickel plating layer from peeling off from the mold surface. Note that the present invention is not limited to the configurations of the above embodiments, and other methods and ellipses may be arbitrarily selected and adopted without departing from the spirit of the present invention. be. [Effects of the Invention] According to the present invention, the electroless nickel plating layer can be efficiently and reliably adhered to the material surface of the mold. Furthermore, since the mold material surface and the electroless nickel plating layer can be brought into close contact with each other, it is possible to reliably prevent the electroless nickel plating layer from peeling off from the mold material surface. Furthermore, according to the present invention, the releasability of the resin molded article from the mold surface can be improved, so that it is possible to efficiently and reliably prevent residual adhesion of the resin to the mold surface, and This has the effect of shortening the curing time for accelerating the hardening of the resin material, thereby shortening the overall resin molding cycle time. In addition, this improvement in the releasability of resin molded products can reliably eliminate the residual adhesion of resin to the mold for resin sealing molding and the aforementioned adverse effects on resin molding due to this. This product has excellent practical effects and can greatly contribute to the field of molding technology for this type of product, where high quality and high reliability are strongly required.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明に係る樹脂封止或形用金型の要部を示
す一部切欠縦断正面図であり、該金型の型開状態を示し
ている. 第2図及び第3図は、本発明に係る樹脂封止成形用金型
要部の拡大縦断面図である。 第4図は、電子部品のトランスファ樹脂封止成形用金型
例の一部切欠縦断正面図であり、該金型の型開状態を示
している. 第5図は、第4図に対応した金型の型締状態を示す一部
切欠縦断正面図である。 〔符号の説明〕 A ・・・無電解ニッケルメッキ層 ・・・固定上型 ・・・キャビテイ ・・・エアベント ・・・可動下型 ・・・キャビテイ ・・・セット用講部 ・・・電子部品 ・・・樹脂材料 ・・・ポット ・・・ブランジャ ・・移送用通路 ・・・カ ル ・・・ゲート ・・・ヒータ ・・リードフレーム ・・エジェクター機構 ・・・エジェクタービン 第2図
FIG. 1 is a partially cutaway longitudinal sectional front view showing the main parts of a mold for resin sealing or shaping according to the present invention, and shows the mold in an open state. FIGS. 2 and 3 are enlarged vertical cross-sectional views of the main parts of the mold for resin sealing according to the present invention. FIG. 4 is a partially cutaway longitudinal sectional front view of an example of a mold for sealing and molding electronic components with a transfer resin, showing the mold in an open state. FIG. 5 is a partially cutaway longitudinal sectional front view showing the mold in a clamped state corresponding to FIG. 4. FIG. [Explanation of symbols] A...Electroless nickel plating layer...Fixed upper mold...Cavity...Air vent...Movable lower mold...Cavity...Set part...Electronic parts ... Resin material ... Pot ... Blunger ... Transfer passage ... Cal ... Gate ... Heater ... Lead frame ... Ejector mechanism ... Eject turbine Fig. 2

Claims (8)

【特許請求の範囲】[Claims] (1)金型面に無電解ニッケルメッキ層を構成する方法
において、該金型の素材面と無電解ニッケルメッキ層と
の両者間に、該両者に対して拡散係数の高い元素を含む
メッキ層を介在させることを特徴とする金型面に無電解
ニッケルメッキ層を構成する方法。
(1) In a method of configuring an electroless nickel plating layer on a mold surface, a plating layer containing an element having a high diffusion coefficient with respect to both the material surface of the mold and the electroless nickel plating layer is provided between the material surface of the mold and the electroless nickel plating layer. A method for configuring an electroless nickel plating layer on a mold surface, characterized by interposing a layer of electroless nickel on a mold surface.
(2)金型素材面と無電解ニッケルメッキ層との両者間
に介在させるメッキ層として、Cuメッキを用いること
を特徴とする請求項(1)に記載の方法。
(2) The method according to claim (1), characterized in that Cu plating is used as the plating layer interposed between the mold material surface and the electroless nickel plating layer.
(3)金型素材面と無電解ニッケルメッキ層との両者間
に介在させるメッキ層として、電解ニッケルメッキを用
いることを特徴とする請求項(1)に記載の方法。
(3) The method according to claim (1), characterized in that electrolytic nickel plating is used as the plating layer interposed between the mold material surface and the electroless nickel plating layer.
(4)金型素材面と無電解ニッケルメッキ層との両者間
に介在させるメッキ層を0.1μ乃至5μの薄膜状に構
成することを特徴とする請求項(2)又は請求項(3)
に記載の方法。
(4) Claim (2) or (3) characterized in that the plating layer interposed between the mold material surface and the electroless nickel plating layer is formed into a thin film of 0.1 μ to 5 μ.
The method described in.
(5)金型素材面と無電解ニッケルメッキ層との両者間
に介在させるメッキ層として、HARDCrメッキを用
いることを特徴とする請求項(1)に記載の方法。
(5) The method according to claim (1), characterized in that HARD Cr plating is used as the plating layer interposed between the mold material surface and the electroless nickel plating layer.
(6)金型面に無電解ニッケルメッキ層を構成する方法
において、該金型の素材面と無電解ニッケルメッキ層と
の両者間に窒化層を介在させることを特徴とする金型面
に無電解ニッケルメッキ層を構成する方法。
(6) A method for forming an electroless nickel plating layer on a mold surface, characterized in that a nitride layer is interposed between both the material surface of the mold and the electroless nickel plating layer. Method of constructing electrolytic nickel plating layer.
(7)金型面に無電解ニッケルメッキ層を構成した電子
部品の樹脂封止成形用金型であって、該金型の素材面と
無電解ニッケルメッキ層との両者間に、該両者に対して
拡散係数の高い元素を含むメッキ層を介在させて構成し
たことを特徴とする電子部品の樹脂封止成形用金型。
(7) A mold for resin-sealing electronic components having an electroless nickel plating layer formed on the mold surface, wherein the material surface of the mold and the electroless nickel plating layer have a gap between the two. 1. A mold for resin-sealing electronic components, characterized in that the mold is constructed by interposing a plating layer containing an element with a high diffusion coefficient.
(8)金型面に無電解ニッケルメッキ層を構成した電子
部品の樹脂封止成形用金型であって、該金型の素材面と
無電解ニッケルメッキ層との両者間に窒化層を介在させ
て構成したことを特徴とする電子部品の樹脂封止成形用
金型。
(8) A mold for resin-sealing electronic components having an electroless nickel plating layer on the mold surface, with a nitride layer interposed between the material surface of the mold and the electroless nickel plating layer. A mold for resin-sealing molding of electronic components, characterized in that the mold is configured by:
JP1239785A 1989-09-14 1989-09-14 Method for constituting electroless nickel plating layer on metallic mold surface and metallic mold for resin sealing of electronic parts Pending JPH03104874A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1239785A JPH03104874A (en) 1989-09-14 1989-09-14 Method for constituting electroless nickel plating layer on metallic mold surface and metallic mold for resin sealing of electronic parts

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1239785A JPH03104874A (en) 1989-09-14 1989-09-14 Method for constituting electroless nickel plating layer on metallic mold surface and metallic mold for resin sealing of electronic parts

Publications (1)

Publication Number Publication Date
JPH03104874A true JPH03104874A (en) 1991-05-01

Family

ID=17049849

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH03104874A (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1100122A3 (en) * 1999-11-09 2004-01-21 Towa Corporation Die used for resin-sealing and molding an electronic component
JP2012077141A (en) * 2010-09-30 2012-04-19 Lintec Corp Hard coat layer surface-forming film, process for producing optical member with hard coat layer and optical member with hard coat layer
JP2012219370A (en) * 2011-04-14 2012-11-12 Maruyasu Industries Co Ltd Surface treatment structure of piping for vehicle
JP2022524479A (en) * 2019-03-22 2022-05-06 フェイスブック・テクノロジーズ・リミテッド・ライアビリティ・カンパニー Mold pair with matching surface

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JPS5013290A (en) * 1973-06-08 1975-02-12
JPS6270564A (en) * 1985-09-24 1987-04-01 Yoshinobu Sugie Surface treatment of metallic mold

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Publication number Priority date Publication date Assignee Title
JPS5013290A (en) * 1973-06-08 1975-02-12
JPS6270564A (en) * 1985-09-24 1987-04-01 Yoshinobu Sugie Surface treatment of metallic mold

Cited By (5)

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