JPH03106730U - - Google Patents
Info
- Publication number
- JPH03106730U JPH03106730U JP1558590U JP1558590U JPH03106730U JP H03106730 U JPH03106730 U JP H03106730U JP 1558590 U JP1558590 U JP 1558590U JP 1558590 U JP1558590 U JP 1558590U JP H03106730 U JPH03106730 U JP H03106730U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- optical fiber
- periphery
- rotating
- output end
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Description
第１図はこの考案の一実施例を示す移動方向で
の側面図であり、第２図は第１図の実施例の移動
方向に直角な方向での側面図である。
図中、１……ウエハ、２……回転ステージ、３
……駆動機構、４……制御回路、５……レンズユ
ニツト、６……ランプ、９……照射用光フアイバ
、１０……照度モニタ用光フアイバ、１１……基
台、１２，１９……モータ、１３，２１……プー
リ、１５，１８……ガイド、１６，２２……移動
台、１７，２４……ワイヤ、２３……ワイヤ引吊
りアーム、２６……原点センサ、２８、３４……
検出器、３０……回転角読取り機構、３１……フ
オトセンサ用光源、３２，３３……光フアイバ、
３６，３７……フアイバ保持アーム。
FIG. 1 is a side view of an embodiment of this invention in the direction of movement, and FIG. 2 is a side view of the embodiment of FIG. 1 in a direction perpendicular to the direction of movement. In the figure, 1... wafer, 2... rotary stage, 3
... Drive mechanism, 4 ... Control circuit, 5 ... Lens unit, 6 ... Lamp, 9 ... Optical fiber for irradiation, 10 ... Optical fiber for illumination monitor, 11 ... Base, 12, 19 ... Motor, 13, 21... Pulley, 15, 18... Guide, 16, 22... Moving table, 17, 24... Wire, 23... Wire suspension arm, 26... Origin sensor, 28, 34...
Detector, 30... Rotation angle reading mechanism, 31... Light source for photo sensor, 32, 33... Optical fiber,
36, 37...Fiber holding arm.
Claims (1)
からの光を受ける位置に配置され、 出射端が回転するウエハの周辺部の表面を光照
射する位置に配置された照射用光フアイバと、 この照射用光フアイバの出射端をウエハの周辺
部に投影するレンズと、 照射用光フアイバの出射端をウエハの回転中心
に向けて移動させる少なくとも１つの移動機構と
、 出射端が検出器につながる照度モニタ用光フア
イバとを具備し、 前記照度モニタ用光フアイバの入射端を露光さ
れるウエハの周辺部の表面に同一または近傍の平
面上に配置し、前記照射光フアイバの出射端が前
記移動機構の移動により露光されるウエハの周辺
部の表面に同一または近傍の位置関係を保つた状
態で測定可能であることを特徴とするウエハ周辺
露光装置。[Scope of Claim for Utility Model Registration] A rotating mechanism for rotating a wafer, an input end located at a position to receive light from a light source, and an output end located at a position to irradiate the peripheral surface of the rotating wafer. an irradiation optical fiber; a lens for projecting an output end of the irradiation optical fiber onto the periphery of the wafer; at least one movement mechanism for moving the output end of the irradiation optical fiber toward a rotational center of the wafer; an illuminance monitoring optical fiber whose end is connected to a detector; the incident end of the illuminance monitoring optical fiber is disposed on the same plane as or in the vicinity of the peripheral surface of the wafer to be exposed; A wafer periphery exposure apparatus, characterized in that measurement can be carried out in a state in which the emission end of the wafer is kept in the same or close positional relationship with the surface of the periphery of the wafer to be exposed by the movement of the moving mechanism.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990015585U JPH085546Y2 (en) | 1990-02-21 | 1990-02-21 | Wafer periphery exposure system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990015585U JPH085546Y2 (en) | 1990-02-21 | 1990-02-21 | Wafer periphery exposure system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03106730U true JPH03106730U (en) | 1991-11-05 |
| JPH085546Y2 JPH085546Y2 (en) | 1996-02-14 |
Family
ID=31518884
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990015585U Expired - Lifetime JPH085546Y2 (en) | 1990-02-21 | 1990-02-21 | Wafer periphery exposure system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH085546Y2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006314264A (en) * | 2005-05-13 | 2006-11-24 | Dai-Dan Co Ltd | Rack equipment for breeding laboratory animals |
| JP2009095261A (en) * | 2007-10-15 | 2009-05-07 | Hamurii Kk | Laboratory animal breeding equipment |
| WO2016121023A1 (en) * | 2015-01-28 | 2016-08-04 | 三菱電機株式会社 | Peripheral exposure device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61117552A (en) * | 1984-11-13 | 1986-06-04 | Ushio Inc | Exposing device |
| JPH01243427A (en) * | 1988-03-24 | 1989-09-28 | Tokyo Electron Ltd | Aligner for semiconductor wafer |
-
1990
- 1990-02-21 JP JP1990015585U patent/JPH085546Y2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61117552A (en) * | 1984-11-13 | 1986-06-04 | Ushio Inc | Exposing device |
| JPH01243427A (en) * | 1988-03-24 | 1989-09-28 | Tokyo Electron Ltd | Aligner for semiconductor wafer |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006314264A (en) * | 2005-05-13 | 2006-11-24 | Dai-Dan Co Ltd | Rack equipment for breeding laboratory animals |
| JP2009095261A (en) * | 2007-10-15 | 2009-05-07 | Hamurii Kk | Laboratory animal breeding equipment |
| WO2016121023A1 (en) * | 2015-01-28 | 2016-08-04 | 三菱電機株式会社 | Peripheral exposure device |
| JPWO2016121023A1 (en) * | 2015-01-28 | 2017-11-16 | 三菱電機株式会社 | Peripheral exposure equipment |
| US10073360B2 (en) | 2015-01-28 | 2018-09-11 | Mitsubishi Electric Corporation | Edge exposure apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH085546Y2 (en) | 1996-02-14 |
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