JPH03112929U - - Google Patents
Info
- Publication number
- JPH03112929U JPH03112929U JP2098890U JP2098890U JPH03112929U JP H03112929 U JPH03112929 U JP H03112929U JP 2098890 U JP2098890 U JP 2098890U JP 2098890 U JP2098890 U JP 2098890U JP H03112929 U JPH03112929 U JP H03112929U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- developer tank
- developer
- liquid supply
- developing device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 10
- 239000007788 liquid Substances 0.000 claims description 5
- 230000002093 peripheral effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Description
第１図は本考案によるウエーハの現像装置の一
実施例を示し、ａはその平面図、ｂは現像槽のみ
断面を取つた正面図、ｃは現像工程を示す図、ｄ
はリンス工程を示す図、第２図はレジストパター
ン形成の工程を説明する図、台３図は従来の現像
装置を示し、ａは第１図ａ図に対応する図、ｂは
第１図ｂに対応する図である。
１……現像装置、２……現像槽、３……基板保
持台、４……レジスト膜、４ａ……変質したレジ
スト、５……（ＧａＡｓ）基板、６……現像液、
７……給液管、８……電子線、９……スプレーノ
ズル、１０……リンク液。
Fig. 1 shows an embodiment of a wafer developing apparatus according to the present invention, a is a plan view thereof, b is a front view with only the developing tank taken in cross section, c is a view showing the developing process, and d
is a diagram showing the rinsing process, FIG. 2 is a diagram explaining the resist pattern forming process, and the third figure shows a conventional developing device, a is a diagram corresponding to FIG. FIG. 1... Development device, 2... Developer tank, 3... Substrate holding stand, 4... Resist film, 4a... Altered resist, 5... (GaAs) substrate, 6... Developer,
7...Liquid supply pipe, 8...Electron beam, 9...Spray nozzle, 10...Link liquid.
補正 平２．５．２４
図面の簡単な説明を次のように補正する。
明細書第１０頁第１９〜２０行目の「台３図は
」を、「第３図は」と補正する。Amendment 2.5.24. The brief description of the drawing is amended as follows. In the 10th page of the specification, lines 19 and 20, "Figure 3 is" is corrected to "Figure 3 is".
Claims (1)
る給液管と、基板を保持する基板保持台とを少な
くとも備え、前記現像槽内の現像液中に前記基板
保持台に保持された基板を浸漬させることにより
、その基板上にレジストパターンを現像するよう
になつているウエーハの現像装置において、 前記給液管は、その先端部が前記基板保持台の
基板保持部よりも下方位置となるように前記現像
槽内に配設されているとともに、前記現像槽の周
壁に沿つて湾曲されていることを特徴とするウエ
ーハの現像装置。 (2) 前記給液管が複数本設けられていることを
特徴とする請求項１記載のウエーハの現像装置。[Claims for Utility Model Registration] (1) At least a developer tank, a liquid supply pipe for supplying a developer into the developer tank, and a substrate holder for holding a substrate, and the developer in the developer tank. In a wafer developing apparatus, the substrate held by the substrate holding table is immersed in the substrate to develop a resist pattern on the substrate, wherein the liquid supply pipe has a distal end connected to the substrate holding table. A wafer developing device, wherein the wafer developing device is disposed in the developer tank so as to be located below a substrate holding portion of the developer tank, and is curved along a peripheral wall of the developer tank. (2) The wafer developing device according to claim 1, wherein a plurality of the liquid supply pipes are provided.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2098890U JPH03112929U (en) | 1990-03-01 | 1990-03-01 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2098890U JPH03112929U (en) | 1990-03-01 | 1990-03-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03112929U true JPH03112929U (en) | 1991-11-19 |
Family
ID=31524067
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2098890U Pending JPH03112929U (en) | 1990-03-01 | 1990-03-01 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03112929U (en) |
-
1990
- 1990-03-01 JP JP2098890U patent/JPH03112929U/ja active Pending
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