JPH031141A - Photosensitive coating liquid containing fluorine surfactant - Google Patents
Photosensitive coating liquid containing fluorine surfactantInfo
- Publication number
- JPH031141A JPH031141A JP9078489A JP9078489A JPH031141A JP H031141 A JPH031141 A JP H031141A JP 9078489 A JP9078489 A JP 9078489A JP 9078489 A JP9078489 A JP 9078489A JP H031141 A JPH031141 A JP H031141A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive
- coating
- coating liquid
- diethylene glycol
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 72
- 239000011248 coating agent Substances 0.000 title claims abstract description 70
- 239000007788 liquid Substances 0.000 title claims abstract description 29
- 239000004094 surface-active agent Substances 0.000 title abstract description 18
- 229910052731 fluorine Inorganic materials 0.000 title abstract description 17
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title abstract description 14
- 239000011737 fluorine Substances 0.000 title abstract description 14
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims abstract description 12
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 claims abstract description 12
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N Methyl ethyl ketone Natural products CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims abstract description 11
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 claims abstract description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 206010034972 Photosensitivity reaction Diseases 0.000 claims 1
- 230000036211 photosensitivity Effects 0.000 claims 1
- 239000002904 solvent Substances 0.000 abstract description 29
- 238000004519 manufacturing process Methods 0.000 abstract description 10
- 231100000419 toxicity Toxicity 0.000 abstract description 8
- 230000001988 toxicity Effects 0.000 abstract description 8
- 230000035943 smell Effects 0.000 abstract 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical group OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 abstract 1
- 229920005989 resin Polymers 0.000 description 33
- 239000011347 resin Substances 0.000 description 33
- 150000001875 compounds Chemical class 0.000 description 26
- 239000000203 mixture Substances 0.000 description 26
- 229920000642 polymer Polymers 0.000 description 24
- -1 glycol ethers Chemical class 0.000 description 23
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 20
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 17
- 239000000243 solution Substances 0.000 description 17
- 238000003860 storage Methods 0.000 description 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 12
- 125000000217 alkyl group Chemical group 0.000 description 11
- 239000000975 dye Substances 0.000 description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 10
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 9
- 239000000178 monomer Substances 0.000 description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 8
- 150000002989 phenols Chemical group 0.000 description 8
- 239000000049 pigment Substances 0.000 description 8
- 229920002554 vinyl polymer Polymers 0.000 description 8
- 239000003960 organic solvent Substances 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 229920003986 novolac Polymers 0.000 description 6
- 239000004014 plasticizer Substances 0.000 description 6
- 229920000058 polyacrylate Polymers 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 150000001299 aldehydes Chemical class 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 5
- 238000009833 condensation Methods 0.000 description 5
- 230000005494 condensation Effects 0.000 description 5
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 150000002576 ketones Chemical class 0.000 description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 5
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 4
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 3
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- HRBFQSUTUDRTSV-UHFFFAOYSA-N benzene-1,2,3-triol;propan-2-one Chemical compound CC(C)=O.OC1=CC=CC(O)=C1O HRBFQSUTUDRTSV-UHFFFAOYSA-N 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 229930003836 cresol Natural products 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 235000019441 ethanol Nutrition 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- 230000001235 sensitizing effect Effects 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- IVRMZWNICZWHMI-UHFFFAOYSA-N azide group Chemical group [N-]=[N+]=[N-] IVRMZWNICZWHMI-UHFFFAOYSA-N 0.000 description 2
- 239000000981 basic dye Substances 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 235000010980 cellulose Nutrition 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 2
- VOOLKNUJNPZAHE-UHFFFAOYSA-N formaldehyde;2-methylphenol Chemical compound O=C.CC1=CC=CC=C1O VOOLKNUJNPZAHE-UHFFFAOYSA-N 0.000 description 2
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 231100000053 low toxicity Toxicity 0.000 description 2
- XZSZONUJSGDIFI-UHFFFAOYSA-N n-(4-hydroxyphenyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC1=CC=C(O)C=C1 XZSZONUJSGDIFI-UHFFFAOYSA-N 0.000 description 2
- 239000000025 natural resin Substances 0.000 description 2
- 235000005985 organic acids Nutrition 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 229920006122 polyamide resin Polymers 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 238000010186 staining Methods 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 238000012719 thermal polymerization Methods 0.000 description 2
- MGSRCZKZVOBKFT-UHFFFAOYSA-N thymol Chemical compound CC(C)C1=CC=C(C)C=C1O MGSRCZKZVOBKFT-UHFFFAOYSA-N 0.000 description 2
- LLWJPGAKXJBKKA-UHFFFAOYSA-N victoria blue B Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)=C(C=C1)C2=CC=CC=C2C1=[NH+]C1=CC=CC=C1 LLWJPGAKXJBKKA-UHFFFAOYSA-N 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- PJMXUSNWBKGQEZ-UHFFFAOYSA-N (4-hydroxyphenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(O)C=C1 PJMXUSNWBKGQEZ-UHFFFAOYSA-N 0.000 description 1
- QPVRKFOKCKORDP-UHFFFAOYSA-N 1,3-dimethylcyclohexa-2,4-dien-1-ol Chemical compound CC1=CC(C)(O)CC=C1 QPVRKFOKCKORDP-UHFFFAOYSA-N 0.000 description 1
- DNJRKFKAFWSXSE-UHFFFAOYSA-N 1-chloro-2-ethenoxyethane Chemical compound ClCCOC=C DNJRKFKAFWSXSE-UHFFFAOYSA-N 0.000 description 1
- KTZVZZJJVJQZHV-UHFFFAOYSA-N 1-chloro-4-ethenylbenzene Chemical compound ClC1=CC=C(C=C)C=C1 KTZVZZJJVJQZHV-UHFFFAOYSA-N 0.000 description 1
- OZCMOJQQLBXBKI-UHFFFAOYSA-N 1-ethenoxy-2-methylpropane Chemical compound CC(C)COC=C OZCMOJQQLBXBKI-UHFFFAOYSA-N 0.000 description 1
- RCSKFKICHQAKEZ-UHFFFAOYSA-N 1-ethenylindole Chemical compound C1=CC=C2N(C=C)C=CC2=C1 RCSKFKICHQAKEZ-UHFFFAOYSA-N 0.000 description 1
- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 description 1
- HTQNYBBTZSBWKL-UHFFFAOYSA-N 2,3,4-trihydroxbenzophenone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1 HTQNYBBTZSBWKL-UHFFFAOYSA-N 0.000 description 1
- VZQBDGHUOBRFAA-UHFFFAOYSA-N 2-(2,6-dihydroxyphenyl)benzaldehyde Chemical compound C1(O)=C(C(O)=CC=C1)C1=CC=CC=C1C=O VZQBDGHUOBRFAA-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 1
- BLPUXJIIRIWMSQ-QPJJXVBHSA-N 2-[(e)-3-phenylprop-2-enylidene]propanedioic acid Chemical compound OC(=O)C(C(O)=O)=C\C=C\C1=CC=CC=C1 BLPUXJIIRIWMSQ-QPJJXVBHSA-N 0.000 description 1
- MZNSQRLUUXWLSB-UHFFFAOYSA-N 2-ethenyl-1h-pyrrole Chemical compound C=CC1=CC=CN1 MZNSQRLUUXWLSB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical group OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- FCYVWWWTHPPJII-UHFFFAOYSA-N 2-methylidenepropanedinitrile Chemical compound N#CC(=C)C#N FCYVWWWTHPPJII-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- KSOWMDCLEHRQPH-UHFFFAOYSA-N 4-diazocyclohexa-1,5-dien-1-amine Chemical compound NC1=CCC(=[N+]=[N-])C=C1 KSOWMDCLEHRQPH-UHFFFAOYSA-N 0.000 description 1
- NTDQQZYCCIDJRK-UHFFFAOYSA-N 4-octylphenol Chemical compound CCCCCCCCC1=CC=C(O)C=C1 NTDQQZYCCIDJRK-UHFFFAOYSA-N 0.000 description 1
- JDKKCKKFTIMFFD-UHFFFAOYSA-N 5-amino-3-[[4-[4-[(7-amino-1-hydroxy-3-sulfonaphthalen-2-yl)diazenyl]phenyl]phenyl]diazenyl]-4-hydroxynaphthalene-2,7-disulfonic acid Chemical compound NC1=CC=C2C=C(C(N=NC3=CC=C(C=C3)C3=CC=C(C=C3)N=NC3=C(C=C4C=C(C=C(N)C4=C3O)S(O)(=O)=O)S(O)(=O)=O)=C(O)C2=C1)S(O)(=O)=O JDKKCKKFTIMFFD-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- BLSFXPRLOXPPIO-UHFFFAOYSA-N C(C(=C)C)(=O)OCCN(C(=O)OCC)C1=C(C)C=CC(=C1)N(C(=O)OCC)CCOC(C(=C)C)=O Chemical compound C(C(=C)C)(=O)OCCN(C(=O)OCC)C1=C(C)C=CC(=C1)N(C(=O)OCC)CCOC(C(=C)C)=O BLSFXPRLOXPPIO-UHFFFAOYSA-N 0.000 description 1
- 229920000623 Cellulose acetate phthalate Polymers 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- XPJJFQSEAPSFKO-UHFFFAOYSA-N S(=O)(=O)(Cl)Cl.[N-]=[N+]=[N-].[N-]=[N+]=[N-].C1(C(C=CC=C1)=O)=O Chemical compound S(=O)(=O)(Cl)Cl.[N-]=[N+]=[N-].[N-]=[N+]=[N-].C1(C(C=CC=C1)=O)=O XPJJFQSEAPSFKO-UHFFFAOYSA-N 0.000 description 1
- 229920001800 Shellac Polymers 0.000 description 1
- 241000519995 Stachys sylvatica Species 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000005844 Thymol Substances 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 150000001253 acrylic acids Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- VQXINLNPICQTLR-UHFFFAOYSA-N carbonyl diazide Chemical compound [N-]=[N+]=NC(=O)N=[N+]=[N-] VQXINLNPICQTLR-UHFFFAOYSA-N 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- RECUKUPTGUEGMW-UHFFFAOYSA-N carvacrol Chemical compound CC(C)C1=CC=C(C)C(O)=C1 RECUKUPTGUEGMW-UHFFFAOYSA-N 0.000 description 1
- HHTWOMMSBMNRKP-UHFFFAOYSA-N carvacrol Natural products CC(=C)C1=CC=C(C)C(O)=C1 HHTWOMMSBMNRKP-UHFFFAOYSA-N 0.000 description 1
- 235000007746 carvacrol Nutrition 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229940081734 cellulose acetate phthalate Drugs 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 125000002603 chloroethyl group Chemical group [H]C([*])([H])C([H])([H])Cl 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229940118056 cresol / formaldehyde Drugs 0.000 description 1
- MLUCVPSAIODCQM-NSCUHMNNSA-N crotonaldehyde Chemical compound C\C=C\C=O MLUCVPSAIODCQM-NSCUHMNNSA-N 0.000 description 1
- MLUCVPSAIODCQM-UHFFFAOYSA-N crotonaldehyde Natural products CC=CC=O MLUCVPSAIODCQM-UHFFFAOYSA-N 0.000 description 1
- ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- MIHINWMALJZIBX-UHFFFAOYSA-N cyclohexa-2,4-dien-1-ol Chemical class OC1CC=CC=C1 MIHINWMALJZIBX-UHFFFAOYSA-N 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000000866 electrolytic etching Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- OUGJKAQEYOUGKG-UHFFFAOYSA-N ethyl 2-methylidenebutanoate Chemical compound CCOC(=O)C(=C)CC OUGJKAQEYOUGKG-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- IRCAZSRWCCDLJN-UHFFFAOYSA-N ethyl prop-2-enoate;prop-2-enenitrile Chemical compound C=CC#N.CCOC(=O)C=C IRCAZSRWCCDLJN-UHFFFAOYSA-N 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- WYXXLXHHWYNKJF-UHFFFAOYSA-N isocarvacrol Natural products CC(C)C1=CC=C(O)C(C)=C1 WYXXLXHHWYNKJF-UHFFFAOYSA-N 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- AWJZTPWDQYFQPQ-UHFFFAOYSA-N methyl 2-chloroprop-2-enoate Chemical compound COC(=O)C(Cl)=C AWJZTPWDQYFQPQ-UHFFFAOYSA-N 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- CXKWCBBOMKCUKX-UHFFFAOYSA-M methylene blue Chemical compound [Cl-].C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 CXKWCBBOMKCUKX-UHFFFAOYSA-M 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 229960000907 methylthioninium chloride Drugs 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- YDKJSAXEBRKYLM-UHFFFAOYSA-N n-(3-methoxyphenyl)prop-2-enamide Chemical compound COC1=CC=CC(NC(=O)C=C)=C1 YDKJSAXEBRKYLM-UHFFFAOYSA-N 0.000 description 1
- PJASPDPXLKIZHB-UHFFFAOYSA-N n-(3-nitrophenyl)prop-2-enamide Chemical compound [O-][N+](=O)C1=CC=CC(NC(=O)C=C)=C1 PJASPDPXLKIZHB-UHFFFAOYSA-N 0.000 description 1
- JEPAGMKWFWQECH-UHFFFAOYSA-N n-(4-chlorophenyl)prop-2-enamide Chemical compound ClC1=CC=C(NC(=O)C=C)C=C1 JEPAGMKWFWQECH-UHFFFAOYSA-N 0.000 description 1
- POVITWJTUUJBNK-UHFFFAOYSA-N n-(4-hydroxyphenyl)prop-2-enamide Chemical compound OC1=CC=C(NC(=O)C=C)C=C1 POVITWJTUUJBNK-UHFFFAOYSA-N 0.000 description 1
- BPCNEKWROYSOLT-UHFFFAOYSA-N n-phenylprop-2-enamide Chemical compound C=CC(=O)NC1=CC=CC=C1 BPCNEKWROYSOLT-UHFFFAOYSA-N 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- VQVIZUZWMMBRRP-UHFFFAOYSA-N naphthalene-1,2-dione sulfuryl dichloride diazide Chemical compound S(=O)(=O)(Cl)Cl.[N-]=[N+]=[N-].[N-]=[N+]=[N-].C1(C(C=CC2=CC=CC=C12)=O)=O VQVIZUZWMMBRRP-UHFFFAOYSA-N 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 150000002826 nitrites Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 150000002898 organic sulfur compounds Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 229960001553 phloroglucinol Drugs 0.000 description 1
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- 238000007763 reverse roll coating Methods 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 229940043267 rhodamine b Drugs 0.000 description 1
- 210000003296 saliva Anatomy 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 1
- 239000004208 shellac Substances 0.000 description 1
- 229940113147 shellac Drugs 0.000 description 1
- 235000013874 shellac Nutrition 0.000 description 1
- 229940077386 sodium benzenesulfonate Drugs 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- MZSDGDXXBZSFTG-UHFFFAOYSA-M sodium;benzenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=CC=C1 MZSDGDXXBZSFTG-UHFFFAOYSA-M 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- HSVFKFNNMLUVEY-UHFFFAOYSA-N sulfuryl diazide Chemical compound [N-]=[N+]=NS(=O)(=O)N=[N+]=[N-] HSVFKFNNMLUVEY-UHFFFAOYSA-N 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 229960000790 thymol Drugs 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical class [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- AODQPPLFAXTBJS-UHFFFAOYSA-M victoria blue 4R Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)=C(C=C1)C2=CC=CC=C2C1=[N+](C)C1=CC=CC=C1 AODQPPLFAXTBJS-UHFFFAOYSA-M 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、感光性塗布液に関し、更に詳しくは臭気が改
善され、毒性が低く、塗布性が改善され、更に感光液の
保存性に優れた感光性塗布液、特に感光性平版印刷版の
製造に通した感光性塗布液に関する。Detailed Description of the Invention [Industrial Application Field] The present invention relates to a photosensitive coating solution, and more specifically, a photosensitive coating solution that has improved odor, low toxicity, improved coating properties, and has excellent storage stability. The present invention relates to a photosensitive coating liquid, particularly a photosensitive coating liquid used in the production of a photosensitive lithographic printing plate.
[発明の背景]
感光性印刷版は、感光性組成物を適当な溶媒に溶解し、
これを支持体に塗布し乾燥することにより製造されるが
、従来、このような感光性印刷版の製造の際、感光性組
成物を溶解する溶媒として、種々のものが用いられ、例
えばメチルセロソルブ(エチレングリコールモノメチル
エーテル)、エチルセロソルブ等のグリコールエーテル
類、メチルセロソルブアセテート、エチルセロソルブア
セテート等のセロソルブエステル類が主として用いられ
ている。[Background of the invention] A photosensitive printing plate is produced by dissolving a photosensitive composition in a suitable solvent,
It is manufactured by coating this on a support and drying it. Conventionally, when manufacturing such photosensitive printing plates, various solvents have been used to dissolve the photosensitive composition, such as methyl cellosolve. (ethylene glycol monomethyl ether), glycol ethers such as ethyl cellosolve, and cellosolve esters such as methyl cellosolve acetate and ethyl cellosolve acetate are mainly used.
しかしながら、これらの塗布溶媒は、感光性印刷版の製
造時、毒性が強いという問題があり、また臭気が強く、
不快感があり作業環境上好ましくない、更に感光性組成
物を前記の溶媒を用いて支持体上に塗布すると、塗布性
が悪く、例えば筋ムラやピンホール等の塗布ムラがしば
しば発生し、商品としての価値を損なうことがあり問題
となっている。However, these coating solvents have the problem of being highly toxic during the production of photosensitive printing plates, as well as having a strong odor.
It is uncomfortable and unfavorable in terms of the working environment.Furthermore, when a photosensitive composition is coated onto a support using the above-mentioned solvent, coating properties are poor, and coating irregularities such as streaks and pinholes often occur, resulting in poor product quality. This has become a problem as it may damage its value.
また感光性塗布液の溶剤として、プロピレン系化合物を
用いることが特開昭62−14652号公報に記載され
ているが、このプロピレン系化合物を用いて得られた感
光性印刷版は保存性が悪くこの点の改良が望まれている
。Furthermore, JP-A-62-14652 describes the use of a propylene compound as a solvent for a photosensitive coating solution, but photosensitive printing plates obtained using this propylene compound have poor storage stability. Improvement in this point is desired.
更に塗布溶剤として、ジエチレングリコールのエーテル
及び/又はそのエステルを使用したものは、従来のメチ
ルセロソルブ、エチルセロソルブ等の溶剤と比べて臭気
、毒性並びに塗布性の改善が見られるが、まだ十分とは
言えず更に改良が望まれている。Furthermore, when using diethylene glycol ether and/or its ester as a coating solvent, improvements in odor, toxicity, and coating properties can be seen compared to conventional solvents such as methyl cellosolve and ethyl cellosolve, but the results are still insufficient. Further improvements are desired.
一方、感光性印刷版の製造方法においては、近年の生産
量増大に対処するため、一種類の製品を長時間連続して
製造することが行われ、感光液の製造単位の大量化が進
んでいる、
しかして、このような感光性印刷版を長時間連続して製
造する場合においては、感光液の保存性が問題となると
ころ、塗布溶剤として、従来から用いられている前述の
溶剤またはジオキサン、テトラヒドロフランあるいはシ
クロヘキサノン等の有機溶剤を主としパシ含む溶剤を用
いた場合には、塗布性を改善するために添加されるフッ
素系界面活性剤や感脂化剤であるオクヂルフェノール、
ドブチルフェノール等のアルキル基で置)奏されたフェ
ノール性化合物からなる化合物を用いると親和性が劣る
という欠点があった。即ちこれらの塗布溶剤を用いた感
光性塗布液は、フッ素系界面活性剤や感脂化剤が早くて
1時間以内、遅くとも1日以内には分離してしまう。そ
のため、このような感光性塗布液を塗布しで得られた感
光性印刷版には、これらの物質の凝集による縦スジやは
じきによりて生じるピンホール等が生じ感光性印刷版の
商品価値を著しく低下させる。また、これらの物質が分
離した感光液から製造された感光性印刷版は、現像に際
し、未露光部の感光層が現像によフて完全に除去されず
、印刷時の汚れとなり印刷版の性能を損ねていた。On the other hand, in the manufacturing method of photosensitive printing plates, in order to cope with the increase in production volume in recent years, one type of product is manufactured continuously for a long time, and the number of units for manufacturing photosensitive liquid is increasing. However, when such photosensitive printing plates are manufactured continuously for a long period of time, the storage stability of the photosensitive liquid becomes a problem, and the conventionally used solvents or dioxane are used as coating solvents. When using a solvent that mainly contains organic solvents such as , tetrahydrofuran or cyclohexanone, fluorine-based surfactants and oil sensitizers such as ocdylphenol, which are added to improve coating properties, are used.
When a compound consisting of a phenolic compound substituted with an alkyl group such as dobutylphenol is used, there is a drawback that the affinity is poor. That is, in the photosensitive coating liquid using these coating solvents, the fluorine-based surfactant and the oil-sensitizing agent separate within one hour at the earliest, and within one day at the latest. Therefore, photosensitive printing plates obtained by applying such photosensitive coating liquids have vertical streaks caused by agglomeration of these substances and pinholes caused by repelling, which significantly reduces the commercial value of the photosensitive printing plates. lower. In addition, when developing a photosensitive printing plate manufactured from a photosensitive liquid in which these substances are separated, the unexposed areas of the photosensitive layer are not completely removed by development, resulting in stains during printing and impairing the performance of the printing plate. was damaging.
そこで、本発明者等は、これらの問題点について種々検
討した結果、少なくともジエチレングリコールジメチル
エーテルにフッ素系界面活性剤を加えることにより臭気
、毒性、特に塗布性が顕著に改善されることを見出した
ばかりでなく、ある種の溶剤と併用することによりフッ
素系界面活性剤や感脂化剤との親和性が良好となり、し
たがって感光液の保存性に優れ、長時間連続する製造工
程においても良好な性能を有する感光性印刷版を安定し
て製造することができることを見出し、ここに本発明を
完成するに至った。As a result of various studies on these problems, the present inventors not only found that adding a fluorine-containing surfactant to at least diethylene glycol dimethyl ether significantly improves odor, toxicity, and especially applicability. When used in combination with certain solvents, it has good affinity with fluorosurfactants and fat-sensitizing agents, and therefore has excellent storage stability of photosensitive solutions and good performance even in long-term continuous manufacturing processes. It was discovered that photosensitive printing plates can be stably produced, and the present invention has now been completed.
[発明の目的]
本発明の目的は、感光性印刷版の製造時における毒性が
低く、臭気が緩和されると共に塗布性が改婢され、更に
保存性の優れた感光性塗布液を提供することにある。[Object of the Invention] The object of the present invention is to provide a photosensitive coating liquid that has low toxicity during the production of photosensitive printing plates, alleviates odor, improves coating properties, and has excellent storage stability. It is in.
[発明の構成]
本発明の目的は、
1)30重量%〜80重量%のジエチレングリコールジ
メチルエーテル及びフッ素系界面活性剤を含有する感光
性塗布液。[Structure of the Invention] The objects of the present invention are as follows: 1) A photosensitive coating liquid containing 30% to 80% by weight of diethylene glycol dimethyl ether and a fluorosurfactant.
2)請求項1記載の感光性塗布液に炭素数1〜5のアル
コール、メチルエチルケ1−ン、酢酸エチル又はジエチ
レングリコール七ツメチルエーテルの群の中から選ばれ
た少なくとも一種を含有していることを特徴とする感光
性塗布液によって達成される。2) The photosensitive coating liquid according to claim 1 contains at least one selected from the group consisting of an alcohol having 1 to 5 carbon atoms, methyl ethyl kene, ethyl acetate, and diethylene glycol methyl ether. This is achieved using a photosensitive coating solution.
以下、本発明を更に具体的に説明する、本発明に用いら
れる感光性塗布液を形成するためのジエチレングリコー
ルジメチルエーテルを含んだ溶剤は、感光性塗布液の塗
布工程において、毒性、臭気の改善並びに塗布性が向上
する。The present invention will be explained in more detail below. The solvent containing diethylene glycol dimethyl ether for forming the photosensitive coating liquid used in the present invention is used in the coating process of the photosensitive coating liquid to improve toxicity and odor, and to Improves sex.
本発明に用いられる塗布溶剤の残余の溶剤としては、炭
素数1〜5のアルコール、メチルエヂルケトン、酢酸エ
チル又はジエチレングリコールモノメチルエーテルの群
の中から選ばれた少なくとも一種を含有していることが
好ましく、これにより感光性塗布液の保存性が良好とな
る。The remaining solvent in the coating solvent used in the present invention may contain at least one selected from the group consisting of alcohols having 1 to 5 carbon atoms, methyl edyl ketone, ethyl acetate, and diethylene glycol monomethyl ether. Preferably, this improves the storage stability of the photosensitive coating solution.
前記溶剤に含まれるジエチレングリコールジメチルエー
テルと前記残余の溶剤との割合は、前者が30重量%〜
80重量%の範囲が好ましく、30重量%より少ないと
きは、本発明の効果が十分得られない。また80重量%
を越えると経済的に好ましくない。したがって経済性を
考慮して3゜重量%〜80重量%の範囲、更に好ましく
は、50重量%〜70重量%の範囲の場合に、保存性の
良好な感光性塗布液が得られる。The ratio of diethylene glycol dimethyl ether contained in the solvent to the remaining solvent is such that the former is 30% by weight to 30% by weight.
A range of 80% by weight is preferable, and when it is less than 30% by weight, the effects of the present invention cannot be sufficiently obtained. Also 80% by weight
Exceeding this is economically unfavorable. Therefore, in consideration of economic efficiency, a photosensitive coating liquid with good storage stability can be obtained when the amount is in the range of 3% to 80% by weight, more preferably in the range of 50% to 70% by weight.
この混合溶剤には更に他の溶剤を組合せて用いることが
でき、更に2種以上の他の溶剤と適宜混合することもで
きる。This mixed solvent can further be used in combination with other solvents, and can also be appropriately mixed with two or more other solvents.
他の溶剤としては、ジメチルホルムアミド、ジメチルス
ルホキシド、アセトン、ジオキサン、テトラヒドロフラ
ン、シクロヘキサン、塩化メチレン、メチルプロピルケ
トン、メチルブチルケトン及びジエチルケトン、更に水
等が挙げられる。Other solvents include dimethylformamide, dimethyl sulfoxide, acetone, dioxane, tetrahydrofuran, cyclohexane, methylene chloride, methyl propyl ketone, methyl butyl ketone, diethyl ketone, and water.
本発明に用いられるフッ素系界面活性剤は、前記ジエチ
レングリコールジメチルエーテルを含む感光性塗布液に
添加することにより、この感光性塗布液から感光性平版
印刷版を製造する際、塗布性、例えばマランゴニ−1縦
すじ、ピンホール等を改良すると共に臭気及び毒性も改
善される。The fluorine-based surfactant used in the present invention can be added to the photosensitive coating solution containing diethylene glycol dimethyl ether to improve coating properties, such as Marangoni-1 Vertical streaks, pinholes, etc. are improved, and odor and toxicity are also improved.
本発明に好ましく用いられるフッ素系界面活性剤として
は、例えば側鎖にフッ化アルキル基を有する(メタ)ア
クリレート重合体を挙げることができ、この際標準ポリ
スチレン換算数平均分子量は:IO,000以下のもの
が好ましく、より好ましくは2.000 N10,00
0の範囲にあるものである。As the fluorine-based surfactant preferably used in the present invention, for example, a (meth)acrylate polymer having a fluorinated alkyl group in the side chain can be mentioned, and in this case, the number average molecular weight in terms of standard polystyrene is: IO,000 or less preferably 2.000 N10,00
It is in the range of 0.
(メタ)アクリレート重合体の数平均分子量が30.0
f)Qを越えると、塗布性改良の効果が十分でなくなる
。The number average molecular weight of the (meth)acrylate polymer is 30.0
f) If Q is exceeded, the effect of improving coating properties will not be sufficient.
前記(メタ)アクリレート重合体における側鎖にフッ化
アルキル基を有する部分のアクリレート構造単位または
メタクリレート構造単位としては、例えば下記−数式[
11または下記−数式[II ]で表すことができる。The acrylate structural unit or methacrylate structural unit of the moiety having a fluorinated alkyl group in the side chain in the (meth)acrylate polymer is, for example, the following formula [
11 or the following formula [II].
−数式[11
%式%
(式中、Rは水素原子またはメチル基であり、nはO〜
20、aは0〜2、bは0〜Lの整数を示す。)
一般式[11]
%式%
(式中、Rは水素原子またはメチル基であり、nは0〜
10、mは(1〜20.aはO〜2の整数を示す。)
一般式[1]または下記−数式[I!]で表される構造
単位は、具体的には以下に示される。-Formula [11%Formula% (In the formula, R is a hydrogen atom or a methyl group, and n is O~
20, a represents an integer of 0 to 2, and b represents an integer of 0 to L. ) General formula [11] %Formula% (In the formula, R is a hydrogen atom or a methyl group, and n is 0-
10, m is (1 to 20.a represents an integer of O to 2) General formula [1] or the following formula [I! ] The structural unit represented by is specifically shown below.
本発明に好ましく用いられるフッ素系界面活性剤として
は、例えば側鎖にフッ化アルキル基を有する(メタ)ア
クリレート重合体を挙げることができ、この際標準ポリ
スチレン換算数平均分子量は30.(100以下のもの
が好ましく、より好ましくは2.000〜io、ooo
の範囲にあるものである。As the fluorine-based surfactant preferably used in the present invention, for example, a (meth)acrylate polymer having a fluorinated alkyl group in the side chain can be mentioned, and in this case, the number average molecular weight in terms of standard polystyrene is 30. (Preferably 100 or less, more preferably 2.000 to io, ooo
It is within the range of
(メタ)アクリレート重合体の数平均分子量が30.0
00を越えると、塗布性改良の効果が十分でなくなる。The number average molecular weight of the (meth)acrylate polymer is 30.0
If it exceeds 00, the effect of improving coating properties will not be sufficient.
前記(メタ)アクリレート重合体における側鎖にフッ化
アルキル基を有する部分のアクリレート構造単位または
メタクリレート構造単位としては、例えば下記−数式U
N]または下記−数式[If ]で表すことができる。As the acrylate structural unit or methacrylate structural unit of the portion having a fluorinated alkyl group in the side chain in the (meth)acrylate polymer, for example, the following - formula U
N] or the following formula [If].
以下余白 一般式[1] %式% (式中、 Rは水素原子またはメチル基であり、 ■ ■ nはO〜20、 aはO〜2、 bはO〜1の整数を 示す。Margin below General formula [1] %formula% (In the formula, R is a hydrogen atom or a methyl group, ■ ■ n is O~20, a is O~2, b is an integer between O and 1 show.
一般式[H] −CH□−〇− ! ■ (式中、 Rは水素原子またはメチル基であり、 nはO〜10、 mはO〜2、 aはO〜2の整数を 示す。General formula [H] -CH□-〇- ! ■ (In the formula, R is a hydrogen atom or a methyl group, n is O~10, m is O~2, a is an integer between O and 2 show.
■ 一般式 [ ] または下記−数式[!■] で表され る構造単位は、 具体的には以下に示される。■ general formula [ ] or below - formula [! ■] represented by The structural unit is Specifically, it is shown below.
!−9 1−1゜ 以下余白 !−11 ! −12 ■ ! −14 ■ −25 ■ ■ ■ ■ −27 ■ −28 ■ −17 ■ !−29 ■ ■ ■ =21 ■ ! −31 ■ −32 ■ ■ U−1;?21;ト3 υ−(しF2)2しF3 ! ■ −36 ■ −37 −C11、−CII − 0−(CF2)+aCFs ■ ■ −39 ■ −40 ■ −41 1!−1 −CH,−CH− ■!−7 −CH、−C11− υ l!−8 −C11□−CH− !!−9 −C112−C11− +1−10 − CII 2− CII − −CH2−C)l− υ !■−3 −CH2−CH− −C1h−CH− ■!−5 −(:)I、−CH− 唾 !■−6 −C)1!−CH− l−11 −CH2−CH− CH3 −CH2−C− 」 l−13 CB。! -9 1-1゜ Margin below ! -11 ! -12 ■ ! -14 ■-25 ■ ■ ■ ■-27 ■-28 ■-17 ■ ! -29 ■ ■ ■ =21 ■ ! -31 ■-32 ■ ■ U-1;? 21; 3 υ−(shiF2)2shiF3 ! ■-36 ■-37 -C11, -CII- 0-(CF2)+aCFs ■ ■-39 ■ -40 ■ -41 1! -1 -CH, -CH- ■! -7 -CH, -C11- υ l! -8 -C11□-CH- ! ! -9 -C112-C11- +1-10 - CII 2- CII - -CH2-C)l- υ ! ■-3 -CH2-CH- -C1h-CH- ■! -5 -(:)I, -CH- saliva ! ■-6 -C)1! -CH- l-11 -CH2-CH- CH3 -CH2-C- ” l-13 C.B.
−CI+、−C− ++−14 C)1゜ −C112−C− CI1゜ CI+2−C− 1−11i CI+3 − C112−C ++−17 −CI+2−C− ++−18 CI(3 CI2−C− +1−23 C)13 −CI+2−C− υ C11゜ −CH2−C− 一1投式[II+ ] −(:1I2−C− 0−(Cn112no) −11 !1l−1 CII 2− CII +1!−2 −C112−CI − C−〇 C胃0 OC2II 、 OII 0 C31! a OII ++−19 −CI+2−C− ++−20 C11゜ −CI+、−C− ++−21 −CI 2− C− ++−22 H3 −CH2−C− +11−3 +11−4 1i6 +11−7 1i8 !1l−9 II+−10 II+ −11 1I+−12 II+−13 II+ −14 C1(。-CI+, -C- ++-14 C) 1° -C112-C- CI1゜ CI+2-C- 1-11i CI+3 - C112-C ++-17 -CI+2-C- ++-18 CI(3 CI2-C- +1-23 C) 13 -CI+2-C- υ C11゜ -CH2-C- 11th throw type [II+] -(:1I2-C- 0-(Cn112no)-11 ! 1l-1 CII 2- CII +1! -2 -C112-CI- C-〇 C stomach 0 OC2II, OII 0 C31! a OII ++-19 -CI+2-C- ++-20 C11゜ -CI+, -C- ++-21 -CI 2- C- ++-22 H3 -CH2-C- +11-3 +11-4 1i6 +11-7 1i8 ! 1l-9 II+-10 II+ -11 1I+-12 II+-13 II+ -14 C1(.
番
−CI+ 、 −C−
0−Cntb。−+
IV−1
IV−2
!■−3
IV−4
IV−5
IV−6
u−+;s■、t
u−t;6HI3
IV−17
IV−18
IV−19
IV−20
IV−2+
IV−22
IV−23
IV−24
IV−7
IV−8
v−9
IV−10
IV−11
IV−12
IV−13
IV−14
IV−15
IV−16
(メタ)
アクリ
レート単位
前記以外の構造単位
CaF+y502NIICzt+aN責CII 3)
2 C2tl s OS −0202II 5CyF+
5CONHC3HaN”(CH3) 3cIL −−C
Il −CH−
0“cVc−。No. -CI+, -C- 0-Cntb. -+ IV-1 IV-2! ■-3 IV-4 IV-5 IV-6 u-+;s■,t ut;6HI3 IV-17 IV-18 IV-19 IV-20 IV-2+ IV-22 IV-23 IV-24 IV -7 IV-8 v-9 IV-10 IV-11 IV-12 IV-13 IV-14 IV-15 IV-16 (Meta) Acrylate unit Structural unit other than the above CaF+y502NIICzt+aN CII 3)
2 C2tl s OS-0202II 5CyF+
5CONHC3HaN”(CH3) 3cIL --C
Il -CH- 0"cVc-.
弗素系界面活性剤
c、F、5COJH4
C,F、、50□N (C21(5) C1l、Coo
にCaF I 7S02NIIC3)16N” (CH
s) 2Cfl −CアF ls C0NII (CI
l2) 3N” (CHs) zCJ4COO−CaF
l 7SO2N (C2H8) C2H4(OCsH
a) 50)ICt F 1scONHc311aN”
(CH3) 2 (Ctl□) 2COO−CaF1
7SO2N(CH3)CH2CH202CCH−CH2
これらの弗素系界面活性剤は、感光性塗布液に含まれる
感光性組成物に対して0.011i量%〜11量%、好
ましくは0.05皿量%〜0.75重量%、特に好まし
くは0.08重量%〜0.5重量%である。Fluorine surfactant c, F, 5COJH4 C, F,, 50□N (C21(5) C1l, Coo
CaF I 7S02NIIC3)16N” (CH
s) 2Cfl -CaF ls C0NII (CI
l2) 3N” (CHs) zCJ4COO-CaF
l 7SO2N (C2H8) C2H4(OCsH
a) 50) ICt F 1scONHc311aN”
(CH3) 2 (Ctl□) 2COO-CaF1
7SO2N(CH3)CH2CH202CCH-CH2
These fluorine-based surfactants are used in an amount of 0.011% to 11% by weight, preferably 0.05% to 0.75% by weight, particularly preferably 0.05% to 0.75% by weight, based on the photosensitive composition contained in the photosensitive coating liquid. is 0.08% to 0.5% by weight.
以下余白
CaF17S02N−(CH2)sN”(CHs)zC
LCOO−本発明に用いられる溶剤に溶解することによ
り得られる塗布液は、ポジ型感光性組成物またはネガ型
感光性組成物のいづれをも含有することができるが、こ
のポジ型感光性組成物としては、オルトキノンジアジド
基を含む高分子化合物が主として用いられ、ここでオル
トキノンジアジド基を含む高分子化合物とは、オルトキ
ノンジアジド基を含む化合物とアルカリ可溶性樹脂との
反応生成物の場合又はオルトキノンジアジド基を含む化
合物とアルカリ可溶性樹脂との混合物である場合のいづ
れか又は両方からなる意味に用いられる。Margin below CaF17S02N-(CH2)sN”(CHs)zC
LCOO - The coating solution obtained by dissolving in the solvent used in the present invention can contain either a positive-working photosensitive composition or a negative-working photosensitive composition, but this positive-working photosensitive composition As such, a polymer compound containing an orthoquinonediazide group is mainly used, and the polymer compound containing an orthoquinonediazide group is a reaction product of a compound containing an orthoquinonediazide group and an alkali-soluble resin, or a polymer compound containing an orthoquinonediazide group. It is used to mean either or both of the cases where it is a mixture of a compound containing the above and an alkali-soluble resin.
以下にその代表的なものについて説明する。Typical examples will be explained below.
オルトキノンジアジド基を含む高分子化合物としては、
例えば0−ナフトキノンジアジドスルホン酸と、フェノ
ール類及びアルデヒド又はケトンの重縮合樹脂とのエス
テル化合物が挙げられる。As a polymer compound containing an orthoquinonediazide group,
For example, ester compounds of 0-naphthoquinonediazide sulfonic acid and polycondensation resins of phenols and aldehydes or ketones may be mentioned.
前記のフェノール類としては、例えば、フェノール、0
−クレゾール、l−クレゾール、p−クレゾール、3.
5−キシレノール、カルバクロール、チモール等の一価
フエノール、カテコール、レゾルシン、ヒドロキノン等
の二価フェノール、ピロガロール、フロログルシン等の
三価フェノール等が挙げられる。Examples of the phenols include phenol, 0
-cresol, l-cresol, p-cresol, 3.
Examples include monohydric phenols such as 5-xylenol, carvacrol, and thymol, dihydric phenols such as catechol, resorcinol, and hydroquinone, and trihydric phenols such as pyrogallol and phloroglucin.
前記のアルデヒドとしては、ホルムアルデヒド、ベンズ
アルデヒド、アセトアルデヒド、クロトンアルデヒド、
フルフラール等が挙げられる。Examples of the aldehyde include formaldehyde, benzaldehyde, acetaldehyde, crotonaldehyde,
Examples include furfural.
これらのアルデヒドのうち好ましいものは、ホルムアル
デヒド及びベンズアルデヒドである。Preferred among these aldehydes are formaldehyde and benzaldehyde.
更に前記のケトンとしては、アセトン、メチルエチルケ
トン等が挙げられる。Furthermore, examples of the above-mentioned ketones include acetone, methyl ethyl ketone, and the like.
前記重縮合樹脂の具体的な例としては、フェノール・ホ
ルムアルデヒド樹脂、層−クレゾール・ホルムアルデヒ
ド樹脂、 −、O−混合クレゾール・ホルムアルデヒド
樹脂、レゾルシン・ベンズアルデヒド樹脂、ピロガロー
ル・アセトン樹脂等が挙げられる。Specific examples of the polycondensation resin include phenol-formaldehyde resin, layer-cresol-formaldehyde resin, -, O-mixed cresol-formaldehyde resin, resorcinol-benzaldehyde resin, pyrogallol-acetone resin, and the like.
前記O−ナフトキノンジアジド化合物のフェノール類の
OH基に対する0−ナフトキノンジアジドスルホン酸の
縮合率(0)1基1個に対する反応率)は、15〜80
%が好ましく、より好ましくは20〜45%である。The condensation rate (0) of the O-naphthoquinonediazide sulfonic acid with respect to the OH group of the phenol in the O-naphthoquinonediazide compound (reaction rate per group per unit) is 15 to 80.
%, more preferably 20 to 45%.
更に本発明に用いられる0−キノンジアジド化合物とし
ては、特開昭58−43451号公報に記載された化合
物も使用することができる。Further, as the O-quinonediazide compound used in the present invention, compounds described in JP-A-58-43451 can also be used.
上記0−キノンジアジド化合物のうち、1.2−ベンゾ
キノンジアジドスルホニルクロリド又は1,2−ナフト
キノンジアジドスルホニルクロリドとピロガロール・ア
セトン縮合樹脂又は2,3.4−トリヒドロキシベンゾ
フェノンを反応させて得られる0−キノンジアジドエス
テル化合物が最も好ましい。Among the above 0-quinonediazide compounds, 0-quinonediazide is obtained by reacting 1,2-benzoquinonediazide sulfonyl chloride or 1,2-naphthoquinonediazide sulfonyl chloride with pyrogallol acetone condensation resin or 2,3,4-trihydroxybenzophenone. Ester compounds are most preferred.
本発明に用いられるO−キノンジアジド化合物としては
、上記化合物を各々単独で用いてもよいし、2種以上の
化合物を組合せて用いてもよい。As the O-quinonediazide compound used in the present invention, each of the above compounds may be used alone, or two or more kinds of compounds may be used in combination.
本発明に用いられる0−キノンジアジドを含む高分子化
合物は、塗布性を考慮すると、分子量が1500以上有
するものが好ましく、更に好ましくは、2000以上の
分子量を有するものがよい。The polymer compound containing 0-quinonediazide used in the present invention preferably has a molecular weight of 1,500 or more, more preferably 2,000 or more, in view of coating properties.
前記の0−キノンジアジド化合物は、アルカリ可溶性樹
脂と混合して用いた方がよい、アルカリ可溶性樹脂とし
ては、ノボラック樹脂、フェノール性水酸基を有するビ
ニル系重合体、特開昭55−57841号公報に記載さ
れている多価フェノールとアルデヒド又はケトンとの縮
合樹脂等が挙げられる。ノボラック樹脂としては、例え
ばフェノール・ホルムアルデヒド樹脂、クレゾール・ホ
ルムアルデヒド樹脂、特開昭55−57841号公報に
記載されているようなフェノール・クレゾール・ホルム
アルデヒド共重縮合樹脂、特開昭55−127553号
公報に記載されているようなp−置換フェノールとフェ
ノールもしくは、クレゾールとホルムアルデヒドとの共
重縮合樹脂等が挙げられる。The above-mentioned 0-quinonediazide compound is preferably used in combination with an alkali-soluble resin. Examples of the alkali-soluble resin include novolak resin, a vinyl polymer having a phenolic hydroxyl group, and those described in JP-A-55-57841. Examples include condensation resins of polyhydric phenols and aldehydes or ketones. Examples of the novolac resin include phenol-formaldehyde resin, cresol-formaldehyde resin, phenol-cresol-formaldehyde copolycondensation resin as described in JP-A-55-57841, and phenol-cresol-formaldehyde copolycondensation resin as described in JP-A-55-127553. Examples include copolycondensation resins of p-substituted phenol and phenol or cresol and formaldehyde as described above.
また、フェノール性水酸基を有するビニル系重合体とし
ては、該フェノール性水酸基を有する単位を分子構造中
に有する重合体であり、下記の一般式[11〜−数式[
V]の少なくとも1つの構造単位を含む重合体が好まし
い。In addition, the vinyl polymer having a phenolic hydroxyl group is a polymer having a unit having the phenolic hydroxyl group in its molecular structure, and is represented by the following general formula [11 to - Formula [
Polymers containing at least one structural unit of V] are preferred.
−数式[I]
一般式[!!]
一般式[III ]
一般式[IV]
一般式[V]
[式中R1およびR7はそれぞれ水素原子、アルキル基
又はカルボキシル基、好ましくは水素原子を表わす。R
3は水素原子、ハロゲン原子又はアルキル基を表わし、
好ましくは水素原子又はメチル基、エチル基等のアルキ
ル基を表わす、R4は水素原子、アルキル基、アリール
基又はアラルキル基を表わし、好ましくは水素原子を表
わす。Aは窒素原子又は酸素原子と芳香族炭素原子とを
連結する、置換基を有していてもよいアルキレン基を表
わし、騰はO〜10の整数を表わし、Bは置換基を有し
ていてもよいフェニレン基又は置換基を有してもよいナ
フチレン基を表わす。]本発明の感光性組成物に用いら
れる重合体としては共重合体型の構造を有するものが好
ましく、前記−数式[1]〜−数式[V]でそれぞれ示
される構造単位と組合せて用いることができる単量体単
位としては、例えばエチレン、プロピレン、イソブチレ
ン、ブタジェン、イソプレン等のエチレン系不飽和オレ
フィン類、例えばスチレン、α−メチルスチレン、p−
メチルスチレン、p−クロロスチレン等のスチレン類、
例えばアクリル酸、メタクリル酸等のアクリル酸類、
例えばイタコン酸、マレイン酸、無水マレイン酸等の不
飽和脂肪族ジカルボン酸類、例えばアクリル酸メチル、
アクリル酸エチル、アクリル酸−ローブチル、アクリル
酸イソブチル、アクリル酸ドデシル、アクリル酸−2−
クロロエチル、アクリル酸フェニル、α−クロロアクリ
ル酸メチル、メタクリル酸メチル、メタクリル酸エチル
、エタクリル酸エチル等のα−メチレン脂肪族モノカル
ボン酸のエステル類、例えばアクリロニトリル、メタア
クリロニトリル等のニトリル類、例えばアクリルアミド
等のアミド類、例えばアクリルアニリド、p−クロロア
クリルアニリド、m−ニトロアクリルアニリド、m−メ
トキシアクリルアニリド等のアニリド類、例えば酢酸ビ
ニル、プロピオン酸ビニル、ベンジェ酸ビニル、酪酸ビ
ニル等のビニルエステル類、例えばメチルビニルエーテ
ル、エチルビニルエーテル、イソブチルビニルエーテル
、β−クロロエチルビニルエーテル等のビニルエーテル
類、塩化ビニル、ビニリデンクロライド、ビニリデンシ
アナイド、例えば1−メチル−1−メトキシエチレン、
14−ジメトキシエチレン、1.2−ジメトキシエチレ
ン、1.1−ジメトキシカルボニルエチレン、1−メチ
ル刊−二トロエチレン等のエチレン誘導体類、例えばN
−ビニルビロール、N−ビニルカルバゾール、N−ビニ
ルインドール、N−ビニルビロールン、N−ビニルピロ
リドン等のN−ビニル系単量体がある。これらのビニル
系単量体は、不飽和二重結合が開裂した構造で高分子化
合物中に存在する。-Math [I] General formula [! ! ] General formula [III] General formula [IV] General formula [V] [In the formula, R1 and R7 each represent a hydrogen atom, an alkyl group or a carboxyl group, preferably a hydrogen atom. R
3 represents a hydrogen atom, a halogen atom or an alkyl group,
R4 preferably represents a hydrogen atom or an alkyl group such as a methyl group or an ethyl group. R4 represents a hydrogen atom, an alkyl group, an aryl group or an aralkyl group, and preferably represents a hydrogen atom. A represents an alkylene group which may have a substituent and which connects a nitrogen atom or an oxygen atom and an aromatic carbon atom, T represents an integer from O to 10, and B has a substituent. represents a phenylene group that may have a substituent or a naphthylene group that may have a substituent. ] The polymer used in the photosensitive composition of the present invention preferably has a copolymer-type structure, and can be used in combination with the structural units represented by formulas [1] to [V] above. Examples of monomer units that can be used include ethylenically unsaturated olefins such as ethylene, propylene, isobutylene, butadiene, and isoprene, such as styrene, α-methylstyrene, p-
Styrenes such as methylstyrene and p-chlorostyrene,
For example, acrylic acids such as acrylic acid and methacrylic acid,
For example, unsaturated aliphatic dicarboxylic acids such as itaconic acid, maleic acid, maleic anhydride, etc., such as methyl acrylate,
Ethyl acrylate, loobyl acrylate, isobutyl acrylate, dodecyl acrylate, 2-acrylic acid
Esters of α-methylene aliphatic monocarboxylic acids such as chloroethyl, phenyl acrylate, methyl α-chloroacrylate, methyl methacrylate, ethyl methacrylate, and ethyl ethacrylate; nitrites such as acrylonitrile and methacrylonitrile; e.g. acrylamide; Amides such as acrylanilide, p-chloroacrylanilide, m-nitroacrylanilide, m-methoxyacrylanilide, etc., vinyl esters such as vinyl acetate, vinyl propionate, vinyl benzoate, vinyl butyrate, etc. , vinyl ethers such as methyl vinyl ether, ethyl vinyl ether, isobutyl vinyl ether, β-chloroethyl vinyl ether, vinyl chloride, vinylidene chloride, vinylidene cyanide, such as 1-methyl-1-methoxyethylene,
Ethylene derivatives such as 14-dimethoxyethylene, 1,2-dimethoxyethylene, 1,1-dimethoxycarbonylethylene, 1-methyl-ditroethylene, such as N
- N-vinyl monomers such as vinylpyrrole, N-vinylcarbazole, N-vinylindole, N-vinylvirolone, and N-vinylpyrrolidone. These vinyl monomers exist in polymer compounds with a structure in which unsaturated double bonds are cleaved.
上記の単量体のうち脂肪族モノカルボン酸のエステル類
、ニトリル類が本発明の目的に対して優れた性能を示し
、好ましい。Among the above monomers, aliphatic monocarboxylic acid esters and nitriles exhibit excellent performance for the purpose of the present invention and are therefore preferred.
これらのアルカリ可溶性樹脂は、塗布性を考慮すると、
分子量が1500以上有するものが好ましく、更に好ま
しくは、2000以上の分子量を有するものがよい。Considering the applicability of these alkali-soluble resins,
Those having a molecular weight of 1,500 or more are preferable, and those having a molecular weight of 2,000 or more are more preferable.
またこれらの感光性組成物には、上記の素材の他、必要
に応じて染料、顔料等の色素、感脂化剤、可塑剤、界面
活性剤、有機酸、酸無水物、露光により酸を発生し得る
化合物等を添加することができる。In addition to the above-mentioned materials, these photosensitive compositions may also contain colorants such as dyes and pigments, sensitizing agents, plasticizers, surfactants, organic acids, acid anhydrides, and acids that can be removed by exposure to light. Compounds that may be generated can be added.
本発明に用いられるネガ型感光性物質は、種々のものが
あるが、以下に記載されるように、その代表的なものに
ついて説明する。There are various types of negative photosensitive materials used in the present invention, and representative ones will be described below.
(1)ジアゾ樹脂を含む感光性組成物
p−ジアゾジフェニルアミンとホルムアルデヒドとの縮
合物で代表されるジアゾ樹脂は、水溶性のものでも水不
溶性のものでもよいが、好ましくは特公昭47−116
7号及び同57−43890号公報等に記載されている
ような水不溶性かつ通常の有機溶媒可溶性のものが使用
される。特に好ましくは下記の一般式[11で示される
ジアゾ樹脂である。(1) Photosensitive composition containing diazo resin The diazo resin represented by the condensate of p-diazodiphenylamine and formaldehyde may be water-soluble or water-insoluble, but is preferably
7 and No. 57-43890, etc., which are water-insoluble and soluble in ordinary organic solvents are used. Particularly preferred is a diazo resin represented by the following general formula [11].
一般式[11
[式中、R1、R2およびR3は、水素原子、アルキル
基又はアルコキシ基を示し、R4は水素原子、アルキル
基又はフェニル基を示す。General formula [11] [In the formula, R1, R2 and R3 represent a hydrogen atom, an alkyl group or an alkoxy group, and R4 represents a hydrogen atom, an alkyl group or a phenyl group.
Xはppa又は BF4を示し、Yは−N!1−−3−
又は−O−を示す、]
ジアゾ樹脂は皮膜形成性樹脂、特に水酸基を有する親油
性高分子化合物と混合して使用するのが好ましい。この
ような親油性高分子化合物としては、前記に掲げたもの
の他、側鎖に脂肪族水酸基を有する千ツマ−1例えば2
−ヒドロキシエチルアクリレート又は2−ヒドロキシエ
チルメタクリレートと他の共重合し得る千ツマ−との共
重合体が挙げられる。これら以外にも、必要に応じてポ
リビニルブチラール樹脂、ポリウレタン樹脂、ポリアミ
ド樹脂、エポキシ樹脂、ノボラック樹脂、天然樹脂等を
添加してもよい。X represents ppa or BF4, and Y represents -N! 1--3-
or -O-] The diazo resin is preferably used in combination with a film-forming resin, particularly a lipophilic polymer compound having a hydroxyl group. In addition to the above-mentioned lipophilic polymer compounds, examples of such lipophilic polymer compounds include those having an aliphatic hydroxyl group in the side chain, for example, 2
Examples include copolymers of -hydroxyethyl acrylate or 2-hydroxyethyl methacrylate and other copolymerizable polymers. In addition to these, polyvinyl butyral resins, polyurethane resins, polyamide resins, epoxy resins, novolak resins, natural resins, etc. may be added as necessary.
ジアゾニウム塩と併用される結合剤としては種々の高分
子化合物が使用され得るが、好ましくは特開昭54−9
8613号公報に記載されているような芳香族性水酸基
を有する単量体、例えばN−(4−ヒドロキシフェニル
)アクリルアミド、N−(4−ヒドロキシフェニル)メ
タクリルアミド、o−、m+、またはp−ヒドロキシス
チレン、o+、m+、またはp−ヒドロキシフェニルメ
タクリレート等と他の単量体との共重合体、米国特許第
4,123,276号明細書に記載されているようなヒ
ドロキシエチルアクリレート単位またはヒドロキシエチ
ルメタクリレート単位を主なる繰り返し単位として含む
ポリマー シェラツク、ロジン等の天然樹脂、ポリビニ
ルアルコール、米国特許第3,751,257号明細書
に記載されているポリアミド樹脂、米国特許第3,66
0.097号明細書に記載されている線状ポリウレタン
樹脂、ポリビニルアルコールのフタレート化樹脂、ビス
フェノールAとエピクロルヒドリンから縮合されたエポ
キシ樹脂、酢酸セルロース、セルロースアセテートフタ
レート等のセルロース類が含有される。Various polymeric compounds can be used as the binder used in combination with the diazonium salt, but preferably, JP-A-54-9
Monomers having an aromatic hydroxyl group as described in Japanese Patent No. 8613, such as N-(4-hydroxyphenyl)acrylamide, N-(4-hydroxyphenyl)methacrylamide, o-, m+, or p- Copolymers of hydroxystyrene, o+, m+, or p-hydroxyphenyl methacrylate, etc., with other monomers, hydroxyethyl acrylate units or hydroxy as described in U.S. Pat. No. 4,123,276. Polymers containing ethyl methacrylate units as the main repeating unit Natural resins such as shellac and rosin, polyvinyl alcohol, polyamide resins described in U.S. Pat. No. 3,751,257, U.S. Pat. No. 3,66
0.097, a phthalated polyvinyl alcohol resin, an epoxy resin condensed from bisphenol A and epichlorohydrin, and celluloses such as cellulose acetate and cellulose acetate phthalate.
アルカリ可溶性樹脂としては、ノボラック樹脂、フェノ
ール性水酸基を有するビニル系重合体、特開昭55−5
7841号公報に記載されている多価フェノールとアル
デヒド又はケトンとの縮合樹脂等が挙げられる。ノボラ
ック樹脂としては、例えばフェノール・ホルムアルデヒ
ド樹脂、クレゾール・ホルムアルデヒド樹脂、特開昭5
5−57841号公報に記載されているようなフェノー
ル・クレゾール・ホルムアルデヒド共重縮合樹脂、特開
昭55−127553号公報に記載されているよりなp
−置換フェノールとフェノールもしくは、クレゾールと
ホルムアルデヒドとの共重縮合樹脂等が挙げられる。Examples of the alkali-soluble resin include novolac resin, vinyl polymer having a phenolic hydroxyl group, and JP-A-55-5
Examples include condensation resins of polyhydric phenols and aldehydes or ketones described in Japanese Patent No. 7841. Examples of novolac resins include phenol/formaldehyde resin, cresol/formaldehyde resin, and JP-A-5
Phenol-cresol-formaldehyde copolycondensation resin as described in Japanese Patent Application Laid-Open No. 55-127553,
Examples include copolycondensation resins of -substituted phenol and phenol or cresol and formaldehyde.
またこれらの感光性組成物には、上記の素材の他、必要
に応じて染料、顔料等の色素、感脂化剤、可塑剤、界面
活性剤、有機酸、酸無水物、露光により酸を発生し得る
化合物等を添加することができる。In addition to the above-mentioned materials, these photosensitive compositions may also contain colorants such as dyes and pigments, sensitizing agents, plasticizers, surfactants, organic acids, acid anhydrides, and acids that can be removed by exposure to light. Compounds that may be generated can be added.
これらの結合剤は感光性組成物の固形分中に40〜99
ii量%、好ましくは50〜95重量%含有される。ま
たジアゾ樹脂は1〜60重量%、好ましくは3〜301
i量%含有される。These binders are present in the solid content of the photosensitive composition in an amount of 40 to 99%.
ii% by weight, preferably 50 to 95% by weight. The diazo resin is 1 to 60% by weight, preferably 3 to 30% by weight.
Contains i amount%.
これらの感光性組成物には、その他の染料、顔料等の色
素、感脂化剤、可塑剤、界面活性剤などを添加すること
ができる。Other dyes, pigments such as pigments, fat-sensitizing agents, plasticizers, surfactants, etc. can be added to these photosensitive compositions.
(2)11合体の主鎖又は側鎖に−C−C)I−C−基
を有する高分子化合物を含む感光性組成物
このような高分子化合物としては、重合体の主娘又は側
鎖に感光性基として−C−CH−C−を含むポリエステ
ル類、ポリアミド類、ポリカーボネート類のような感光
性重合体を主成分とするもの(例えば米国特許第3,0
30,208号、同第3.707.373号及び同第3
,453,237号に記載されているような化合物)
;シンナミリデンマロン酸等の(2−プロベリデン)マ
ロン酸化合物及び二官能性グリコール類から誘導される
感光性ポリエステル類を主成分としたもの(例えば米国
特許第2,956,878号及び同第3.173.78
7号に記載されているような感光性重合体);ポリビニ
ールアルコール、澱粉、セルロース及びその類似物のよ
うな水酸基含有重合体のケイ皮酸エステル類(例えば米
国特許第2.690.966号、同第2,752,37
2号、同第2.732,301号等に記載されているよ
うな感光性重合体)等が挙げられる。(2) A photosensitive composition containing a polymer compound having -C-C)I-C- group in the main chain or side chain of the 11-merged such a polymer compound includes the main daughter or side chain of the polymer The main component is a photosensitive polymer such as polyesters, polyamides, and polycarbonates containing -C-CH-C- as a photosensitive group (for example, U.S. Patent No. 3,0
No. 30,208, No. 3.707.373 and No. 3
, 453, 237)
; Those whose main components are photosensitive polyesters derived from (2-probeliden) malonic acid compounds such as cinnamylidene malonic acid and difunctional glycols (for example, U.S. Pat. No. 2,956,878 and U.S. Pat. 3.173.78
7); cinnamate esters of hydroxyl-containing polymers such as polyvinyl alcohol, starch, cellulose, and the like (e.g., U.S. Pat. No. 2,690,966); , same No. 2,752,37
2, No. 2,732,301, etc.).
これらの感光性組成物には、他の増感剤、安定化剤、可
塑剤、顔料や染料等を含有させることができる。These photosensitive compositions may contain other sensitizers, stabilizers, plasticizers, pigments, dyes, and the like.
(3)付加重合性不飽和化合物からなる光重合性組成物
この組成物は、好ましくは、(a)少なくとも2個の末
端ビニル基を有するビニル単量体、(b)光重合開始剤
及び(C)バインダーとしての高分子化合物からなる。(3) Photopolymerizable composition comprising an addition polymerizable unsaturated compound This composition preferably comprises (a) a vinyl monomer having at least two terminal vinyl groups, (b) a photopolymerization initiator, and ( C) Consists of a polymer compound as a binder.
この成分(a)のビニル単量体としては、特公昭35−
5093号、同35−14719号、同44−2872
7号の各公報に記載されている。The vinyl monomer of this component (a) is
No. 5093, No. 35-14719, No. 44-2872
It is described in each publication No. 7.
ポリオールのアクリル酸又はメタクリル酸エステル、即
ちジエチレングリコールジ(メタ)アクリレート、トリ
エチレングリコールジ(メタ)アクリレート、ペンタエ
リスリトールトリ(メタ)アクリレート、トリメチロー
ルプロパントリ(メタ)アクリレート等、あるいはメチ
レンビス(メタ)アクリルアミド、エチレンビス(メタ
)アクリルアミドのようなビス(メタ)アクリルアミド
類、あるいはウレタン基を含有する不飽和東量体、例え
ばジー(2′−メタクリロキシエチル)−2,4−トリ
レンジウレタン、ジー(2−アクリロキシエチル)トリ
メチレンジウレタン等のようなジオールモノ(メタ)ア
クリレートとジイソシアネートとの反応生成物等が挙げ
られる。Acrylic or methacrylic acid esters of polyols, such as diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, pentaerythritol tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, or methylene bis(meth)acrylamide , bis(meth)acrylamides such as ethylene bis(meth)acrylamide, or unsaturated eastomers containing urethane groups, such as di(2'-methacryloxyethyl)-2,4-tolylene diurethane, di( Examples include reaction products of diol mono(meth)acrylate and diisocyanate such as 2-acryloxethyl)trimethylene diurethane.
前記成分(b)の光重合開始剤としては、前記の一般式
[I]で示される化合物が使用し得るが、他の種類のも
のも使用できる。例えば、前記のJ、Kosar著「ラ
イト・センシシティブ・システムズ」第5章に記載され
ているようなカルボニル化合物、有機硫黄化合物、過流
化物、レドックス系化合物、アゾ並びにジアゾ化合物、
ハロゲン化合物、光還元性色素などがある。更に具体的
には英国特許第1,459,563号に開示されている
。As the photopolymerization initiator of component (b), the compound represented by the general formula [I] can be used, but other types can also be used. For example, carbonyl compounds, organic sulfur compounds, perfusates, redox compounds, azo and diazo compounds, as described in Chapter 5 of "Light Sensitive Systems" by J. Kosar, mentioned above;
These include halogen compounds and photoreducible dyes. More specifically, it is disclosed in British Patent No. 1,459,563.
更に、成分(C)のバインダーとしては、公知の種々の
ポリマーを使用することができる。具体的なバインダー
の詳細は、米国特許第4,072.527号に記載され
ている。Furthermore, various known polymers can be used as the binder for component (C). Specific binder details are described in US Pat. No. 4,072.527.
これらの光重合性組成物には、熱重合禁止剤、可塑剤、
染料や顔料等を含有させることができる。These photopolymerizable compositions contain thermal polymerization inhibitors, plasticizers,
It can contain dyes, pigments, etc.
(4)アジド基を含む感光性組成物
感光性アジド化合物としては、アジド基が直接又はカル
ボニル基又はスルホニル基を介して芳香環に結合してい
る芳香族アジド化合物が好ましく使用される。(4) Photosensitive composition containing an azide group As the photosensitive azide compound, an aromatic azide compound in which the azide group is bonded to an aromatic ring directly or via a carbonyl group or a sulfonyl group is preferably used.
例えば、米国特許第3,098,311号明細書に記載
されているようなポリアジドスチレン、ポリビニル−P
−アジドベンゾアート、ポリビニル−p−アジドベンザ
ール、特公昭45−9613号公報に記載のアジドアリ
ールスルフォニルクロリドと不飽和炭化水素系ポリマー
との反応生成物、又特公昭43−21017号、同44
−22.9号、同44−22954号、同45−249
15号の各公報に記載されているような、スルホニルア
ジドやカルボニルアジドを持つポリマー等が挙げられる
。For example, polyazidostyrene, polyvinyl-P as described in U.S. Pat. No. 3,098,311.
-Azidobenzoate, polyvinyl-p-azidobenzal, reaction product of azidoarylsulfonyl chloride and unsaturated hydrocarbon polymer described in Japanese Patent Publication No. 45-9613, and Japanese Patent Publication No. 43-21017, 44
-22.9, 44-22954, 45-249
Examples include polymers containing sulfonyl azide and carbonyl azide, as described in each publication of No. 15.
前記感光性組成物に添加される感脂化剤、弗素界面活性
剤以外の一般的な界面活性剤、増感剤、安定化剤、熱重
合禁止剤、可塑剤、染料や顔料等の色素などの添加剤類
は、その種類によって添加量は異るが、概して感光性塗
布液に含まれる感光性組成物に対して、0.01〜20
重量%、好ましくは0.05〜lO重量%が適当である
。Sensitizing agents, general surfactants other than fluorine surfactants, sensitizers, stabilizers, thermal polymerization inhibitors, plasticizers, pigments such as dyes and pigments, etc. added to the photosensitive composition. The amount of additives added differs depending on the type, but in general, it is added in an amount of 0.01 to 20
% by weight, preferably from 0.05 to 10% by weight, is suitable.
本発明において好ましく用いられる染料は、塩基性染料
及び油溶性染料がある。具体的には、ビクトリア・ピュ
ア・ブルー・BOH,ビクトリア・ブルー・BH,メチ
ル・バイオレット、アイゼン・マラカイトグリーン(以
上、保土谷化学工業製)、パテント・ピュア・ブルー・
vx、ローダミン・B、メチレン・ブルー(以上、住友
化学工業製)等の塩基性染料、並びにスーダン・ブルー
・II、ビクトリア・ブルー・F4R(以上、B。Dyes preferably used in the present invention include basic dyes and oil-soluble dyes. Specifically, Victoria Pure Blue BOH, Victoria Blue BH, Methyl Violet, Eisen Malachite Green (manufactured by Hodogaya Chemical Industry), Patent Pure Blue
Basic dyes such as vx, Rhodamine B, and Methylene Blue (manufactured by Sumitomo Chemical), as well as Sudan Blue II, Victoria Blue F4R (B.
A、S、F製)、オイル・ブルー・#603、オイル・
ブルー・BOS、オイル・ブルー・II N(以上、オ
リエント化学工業類)等の油溶性染料が挙げられる。A, S, F), oil blue #603, oil
Oil-soluble dyes such as Blue BOS and Oil Blue II N (all manufactured by Orient Kagaku Kogyo) may be used.
本発明の感光性塗布液を塗布して感光性印刷版を製造す
るのに通した支持体は、種々のものが用いられるが、例
えば、アルミニウム、亜鉛、銅、。Various types of supports can be used for producing photosensitive printing plates by applying the photosensitive coating solution of the present invention, such as aluminum, zinc, copper, etc.
鋼等の金属板、及びクロム、亜鉛、銅、ニッケル及びア
ルミニウム等がメツキまたは蒸着された金属板、親水化
処理された紙及びプラスチック、また金属が蒸着された
紙及びプラスチックフィルム、ガラス板、樹脂コート紙
、アルミニウム等の金属箔が張られた紙等が挙げられる
。Metal plates such as steel, metal plates plated or vapor-deposited with chromium, zinc, copper, nickel, aluminum, etc., paper and plastics treated to make them hydrophilic, paper and plastic films coated with metals, glass plates, resins. Examples include coated paper and paper covered with metal foil such as aluminum.
これらのうち好ましいものはアルミニウム板である。Among these, aluminum plates are preferred.
特にアルミニウム板の支持体の場合には、砂目立て処理
、陽極酸化処理及び必要に応じて封孔処理等の表面処理
が施されていることが好ましい。In particular, in the case of an aluminum plate support, it is preferable that the support be subjected to surface treatments such as graining, anodizing, and, if necessary, sealing.
上記砂目立て処理処理する方法としては、アルミニウム
板等の表面を脱脂した後、ブラシ研磨法、ボール研磨法
、化学研磨法、電解エツチング法等を通用する技術が採
用される。As a method for carrying out the above-mentioned graining treatment, commonly used techniques such as brush polishing, ball polishing, chemical polishing, electrolytic etching, etc. are employed after degreasing the surface of the aluminum plate or the like.
上記陽極酸化処理は、例えば燐酸、クロム酸、ホウ酸、
硫酸等の無機塩、又はシュウ酸、スルファミン酸等の有
機酸の単独又はこれらの2種以上の酸を混合した水溶液
又は非水溶液中において、アルミニウム板等を陽極とし
て電流を通じることによって行われる。The above anodic oxidation treatment is performed using, for example, phosphoric acid, chromic acid, boric acid,
This is carried out by passing an electric current through an aluminum plate or the like as an anode in an aqueous or non-aqueous solution of an inorganic salt such as sulfuric acid, or an organic acid such as oxalic acid or sulfamic acid, or a mixture of two or more of these acids.
更に封孔処理は、珪酸ナトリウム水溶液、熱水及び若干
の無機塩又は有機塩の熱水溶液に浸漬するか、又は水蒸
気浴によって行われる。Furthermore, the sealing treatment is carried out by immersion in a hot aqueous solution of a sodium silicate solution, hot water, and some inorganic or organic salts, or by a steam bath.
本発明において、感光性塗布液の支持体への塗布量は、
用途によって異るが、−数的に固形分として0.5〜3
.5g/s”が適当である。In the present invention, the amount of photosensitive coating liquid applied to the support is as follows:
Depending on the use, - numerically 0.5 to 3 as solid content
.. 5 g/s" is appropriate.
本発明の塗布液の塗布方法としては、デイツプコーティ
ング、ロールコーティング、リバースロールコーティン
グ、エアドクターコーティング、ブレードコーティング
、ロッドコーティング、ナイフコーティング、スクイズ
コーティング、グラビアコーティング、キャストコーテ
ィング、カーテンコーティング、押出しコーティング、
等の方法が用いられ、塗布膜厚は、0.1〜5g/m’
が好ましい。また乾燥温度は20〜150℃、好ましく
は30〜100℃の範囲である。The coating method of the present invention includes dip coating, roll coating, reverse roll coating, air doctor coating, blade coating, rod coating, knife coating, squeeze coating, gravure coating, cast coating, curtain coating, extrusion coating,
The coating film thickness is 0.1 to 5 g/m'.
is preferred. Further, the drying temperature is in the range of 20 to 150°C, preferably 30 to 100°C.
[実施例]
以下、本発明を実施例により説明するが、本発明は、こ
れらに限定されるものではない。[Examples] The present invention will be described below with reference to Examples, but the present invention is not limited thereto.
実施例1
下記の組成を有する感光液を調整し、これを砂目立てし
たアルミニウム板にロールコータを用いて固形分1.I
1g/s2の塗布量となるように塗布した後、乾燥して
感光性平版印刷版の試料1を得た。Example 1 A photosensitive solution having the following composition was prepared and coated on a grained aluminum plate using a roll coater to reduce the solid content to 1. I
After coating to a coating weight of 1 g/s2, it was dried to obtain Sample 1 of a photosensitive planographic printing plate.
[感光液]
ピロガロール・アセトン樹脂とナフトキノン−(1,2
)−ジアジド−4−スルホン酸クロリドとのエステル化
合物(Mw=2500)2.3重量部
フェノール及びm+、p−混合クレゾール(各モル比4
8 : 32 : 20)とホルムアルデヒドとの共重
縮合樹脂(Mw−10000)
6.71量部
パラオクチルフェノールとホルマリンとから合成された
ノボラック樹I11(Mw−1800)0.9重量部
2−トリクロルメチル−5−(β−ベンゾフリルビニル
)−1,3,4−オキサジアゾール0.05重量部
ビクトリアピュアブルーB OH0,07重量部フッ素
系界面活性剤rFC−430J (3M社製)0.03
重量部
ジエチレングリコールジメチルエーテル27重量部
エチルアルコール 18重量部上記感光
液中の有機溶剤組成を第1表に示す化合物に代える以外
は、試料1と同様にして感光性平版印刷版の試料2〜1
2を作製した。[Photosensitive liquid] Pyrogallol acetone resin and naphthoquinone (1,2
)-Diazide-4-sulfonic acid chloride ester compound (Mw=2500) 2.3 parts by weight phenol and m+, p- mixed cresol (each molar ratio 4
8:32:20) and formaldehyde (Mw-10000) 6.71 parts by weight Novolac tree I11 synthesized from para-octylphenol and formalin (Mw-1800) 0.9 parts by weight 2-trichloromethyl -5-(β-Benzofuryl vinyl)-1,3,4-oxadiazole 0.05 parts by weight Victoria Pure Blue B OH 0.07 parts by weight Fluorine surfactant rFC-430J (manufactured by 3M) 0.03
Parts by weight Diethylene glycol dimethyl ether 27 parts Ethyl alcohol 18 parts by weight Samples 2 to 1 of photosensitive lithographic printing plates were prepared in the same manner as Sample 1 except that the organic solvent composition in the photosensitive solution was replaced with the compound shown in Table 1.
2 was produced.
このようにして得られた試料1〜12について、前記印
刷版の塗布性(マランゴニ−5縦スジおよびピンホール
)ならびに前記感光液の保存性を比較し、その結果を第
1表に示した。For Samples 1 to 12 thus obtained, the coating properties of the printing plates (Marangoni-5 vertical streaks and pinholes) and the storage stability of the photosensitive solutions were compared, and the results are shown in Table 1.
また保存性について、第1表では前述のように調製した
感光液を密閉容器に入れ、30℃、7日間保存した後、
沈殿の有無及び塗布した際に生じる縦スジ、マランゴニ
−およびピンホールの評価をした。更に保存後の感光液
を塗布して得られた印刷版を全面露光した後に、現像し
て得られた印刷版の非画線部の汚れを評価した。その条
件は下記のとおりである。Regarding storage stability, Table 1 shows that after storing the photosensitive solution prepared as described above in a sealed container at 30°C for 7 days,
The presence or absence of precipitation and vertical streaks, marangoni, and pinholes that occur during coating were evaluated. Further, after the entire surface of the printing plate obtained by applying the photosensitive liquid after storage was exposed, the staining of the non-image area of the printing plate obtained by development was evaluated. The conditions are as follows.
現像液:メタケイ酸ナトリウム4%水溶液にベンゼンス
ルホン酸ナトリウムを0.1%添加したもの(有機溶剤
は含有せず)
自現機:コニカルs版自現機rPSQ−860」 (コ
ニカ社製)
現像温度:25℃
現像時間:20秒
ここにマランゴニ−とは、塗布乾燥後の塗布面に生じる
もやもやとした渦状の塗布むらを指す。Developer: 4% sodium metasilicate aqueous solution with 0.1% sodium benzenesulfonate added (does not contain organic solvent) Automatic developer: Conical S plate automatic processor rPSQ-860 (manufactured by Konica) Development Temperature: 25° C. Development time: 20 seconds The term “marangoni” here refers to hazy, swirl-like coating unevenness that occurs on the coated surface after coating and drying.
この種の塗布むらは溶剤の揮発に伴なう温度低下で、湿
潤した状態の感光層の表面張力が局所的に異なることに
起因するマランゴニ−効果がその要因である。The cause of this type of coating unevenness is the Marangoni effect, which is caused by local differences in surface tension of the wet photosensitive layer due to a temperature drop accompanying the volatilization of the solvent.
ピンホールとは、塗布面に現れる円形の感光層の白抜け
を指す、また縦スジは塗布液の平滑化が進まないために
、支持体の走行方向に現れる感光層膜厚の不均一状態で
ある。Pinholes refer to circular white spots in the photosensitive layer that appear on the coating surface, and vertical streaks are unevenness in the thickness of the photosensitive layer that appears in the running direction of the support because the coating solution is not smoothed. be.
その結果を第1表に示す。The results are shown in Table 1.
後述の第1表から明らかなように、本発明外である試料
7〜10はマランゴニ−1縦スジおよびピンホールの観
察結果は、劣るものであった。As is clear from Table 1 below, samples 7 to 10, which are outside the scope of the present invention, had poor observation results for Marangoni-1 vertical streaks and pinholes.
これに対して、本発明に用いられる有機溶剤を塗布溶剤
として用いた場合は、Aの評価が得られ、好ましいもの
であった。On the other hand, when the organic solvent used in the present invention was used as a coating solvent, a rating of A was obtained, which was preferable.
以下余白
実施例2
下記の組成を有する感光液を調整し、これを砂目量てし
たアルミニウム板にロールコータを用いて固形分1.8
g/m2の塗布量となるように塗布した後、乾燥して感
光性平版印刷版の試料13を得た。Margin Example 2 A photosensitive liquid having the following composition was prepared and coated onto a grained aluminum plate using a roll coater to give a solid content of 1.8.
After coating to a coating amount of g/m 2 , it was dried to obtain Sample 13 of a photosensitive planographic printing plate.
[感光液]
仕込みモノマーモル比、N−(4−ヒドロキシフェニル
)メタクリルアミド:アクリロニトリルエチルアクリレ
ート:メタクリル酸:n−ブチルアクリレート=8:3
2:40:10:10なる原料より特開昭62−704
5号公報合成例1に示した方法によって得られた共重合
体(Mww55000 ) 8.
Q It量部p−ジアゾフェニルアミンとバラホルムア
ルデヒド(モル比1 : 0.9 )との縮合樹脂のへ
キサフルオロリン酸塩(Mw−2400) 0.48
重量部ジュリマーAC−1OL[日本純薬(株)製]0
.36重量部
ビクトリアピュアブルーB OHO,09重量部フッ素
系界面活性剤rFC−430J (3M社製)0.03
重量部
ジエチレングリコールジメチルエーテル27重量部
メチルエチルケトン 18重量部上記感光
液組成において、有機溶剤を第2表に示す化合物に代え
る以外は、試料13と同様にして感光性平版印刷版の試
料14〜22を作製した。[Photosensitive liquid] Charged monomer molar ratio, N-(4-hydroxyphenyl) methacrylamide: acrylonitrile ethyl acrylate: methacrylic acid: n-butyl acrylate = 8:3
From the raw material 2:40:10:10, JP-A-62-704
Copolymer obtained by the method shown in Synthesis Example 1 of Publication No. 5 (Mww 55000) 8.
Q It Hexafluorophosphate (Mw-2400) of condensation resin of p-diazophenylamine and paraformaldehyde (molar ratio 1:0.9) 0.48
Part by weight Jurimer AC-1OL [manufactured by Nippon Pure Chemical Industries, Ltd.] 0
.. 36 parts by weight Victoria Pure Blue B OHO, 09 parts by weight Fluorine surfactant rFC-430J (manufactured by 3M) 0.03
Parts by weight Diethylene glycol dimethyl ether 27 parts Methyl ethyl ketone 18 parts by weight Samples 14 to 22 of photosensitive lithographic printing plates were prepared in the same manner as Sample 13 except that the organic solvent in the above photosensitive liquid composition was replaced with the compound shown in Table 2. .
このようにして得られた試料13〜22について、前記
感光液の塗布性(マランゴニ−1縦スジおよびピンホー
ル)ならびに保存性を比較した。Samples 13 to 22 thus obtained were compared in terms of coating properties (Marangoni-1 vertical streaks and pinholes) and storage stability of the photosensitive solution.
また保存性について、第2表では前述のように調製した
感光液を密閉容器に入れ、30℃、5日間保存した後、
沈殿の有無及び塗布した際に生じる縦スジ、マランゴニ
−およびピンホールの評価をした。更に保存後の感光液
を塗布して得られた印刷版を未露光のまま現像して得ら
れた印刷版の非画線部の汚れを評価した。その条件は下
記のとおりである。Regarding storage stability, Table 2 shows that after putting the photosensitive solution prepared as described above in a sealed container and storing it at 30°C for 5 days,
The presence or absence of precipitation and vertical streaks, marangoni, and pinholes that occur during coating were evaluated. Furthermore, the printing plate obtained by coating the photosensitive liquid after storage was developed without being exposed to light, and the staining of the non-image area of the obtained printing plate was evaluated. The conditions are as follows.
現イ象ン夜:フェニルセロソルブ 480gジェ
タノールアミン(80%)159gバイオニンA441
3
(行末油脂(株)製) taog水
1242自現機:コニカ
ps版自現機rPSQ−860J (コニカ社製)
現像温度:25℃
現像時間=20秒
その結果を第2表に示す。Current situation: Phenyl cellosolve 480g Jetanolamine (80%) 159g Bionin A441
3 (manufactured by Gyousaku Yushi Co., Ltd.) TAOG water
1242 automatic processor: Konica PS plate automatic processor rPSQ-860J (manufactured by Konica) Development temperature: 25°C Development time = 20 seconds The results are shown in Table 2.
後述の第2表から明らかなように、本発明外である試料
16〜19はマランゴニ−1縦スジおよびピンホールの
観察結果は、劣るものであった。As is clear from Table 2 below, samples 16 to 19, which are outside the scope of the present invention, had poor observation results for Marangoni-1 vertical streaks and pinholes.
これに対して、本発明に用いられる有機溶剤を塗布溶剤
として用いた場合は、Aの評価が得られ、好ましいもの
であった。On the other hand, when the organic solvent used in the present invention was used as a coating solvent, a rating of A was obtained, which was preferable.
[発明の効果]
ジエチレングリコールジメチルエーテルは、塗布溶剤と
して臭気、毒性が少なく極めて好ましいものであるが、
塗布性が今一つであるが、これにフッ素系界面活性剤を
添加することにより、マランゴニ−1縦すじ、ピンホー
ル等が改良され、しかも臭気、毒性も改善される。[Effect of the invention] Diethylene glycol dimethyl ether is extremely preferable as a coating solvent because it has little odor and toxicity.
The coating properties are not good, but by adding a fluorosurfactant to it, Marangoni-1 vertical streaks, pinholes, etc. are improved, and odor and toxicity are also improved.
また本発明は、請求項2に記載される如く構成すること
により長時間連続する製造工程においても良好な性能を
有する感光性印刷版を安定して製造することができる感
光性塗布液が得られる。Further, the present invention provides a photosensitive coating liquid that can stably produce a photosensitive printing plate having good performance even in a continuous manufacturing process for a long time by having the structure as described in claim 2. .
Claims (1)
メチルエーテル及びフッ素系界面活性剤を含有する感光
性塗布液。 2)請求項1記載の感光性塗布液に炭素数1〜5のアル
コール、メチルエチルケトン、酢酸エチル又はジエチレ
ングリコールモノメチルエーテルの群の中から選ばれた
少なくとも一種を含有していることを特徴とする感光性
塗布液。[Scope of Claims] 1) A photosensitive coating liquid containing 30% to 80% by weight of diethylene glycol dimethyl ether and a fluorosurfactant. 2) Photosensitivity characterized in that the photosensitive coating liquid according to claim 1 contains at least one member selected from the group consisting of alcohol having 1 to 5 carbon atoms, methyl ethyl ketone, ethyl acetate, and diethylene glycol monomethyl ether. Coating liquid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9078489A JPH031141A (en) | 1989-04-12 | 1989-04-12 | Photosensitive coating liquid containing fluorine surfactant |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9078489A JPH031141A (en) | 1989-04-12 | 1989-04-12 | Photosensitive coating liquid containing fluorine surfactant |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH031141A true JPH031141A (en) | 1991-01-07 |
Family
ID=14008225
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9078489A Pending JPH031141A (en) | 1989-04-12 | 1989-04-12 | Photosensitive coating liquid containing fluorine surfactant |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH031141A (en) |
-
1989
- 1989-04-12 JP JP9078489A patent/JPH031141A/en active Pending
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