JPH031420A - Electron cathode tube - Google Patents
Electron cathode tubeInfo
- Publication number
- JPH031420A JPH031420A JP1136313A JP13631389A JPH031420A JP H031420 A JPH031420 A JP H031420A JP 1136313 A JP1136313 A JP 1136313A JP 13631389 A JP13631389 A JP 13631389A JP H031420 A JPH031420 A JP H031420A
- Authority
- JP
- Japan
- Prior art keywords
- electron
- base metal
- nickel powder
- layer
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Solid Thermionic Cathode (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
[産業上の利用分野]
この発明は、受像管などに用いられる電子管陰極に関し
、詳しくは、電子放出特性の向上を図った電子管陰極に
関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an electron tube cathode used in a picture tube or the like, and more particularly to an electron tube cathode with improved electron emission characteristics.
[従来の技術]
従来、受像管等に用いられている電子管陰極にはニッケ
ル(Ni)を主成分としてシリコン(Si)等を還元剤
として微量含ませた基体金属上に、バリウム(Ba)を
含むアルカリ土類金属の酸化物層を形成したいわゆる酸
化物陰極が多用されている。[Prior Art] Conventionally, electron tube cathodes used in picture tubes and the like are made by coating barium (Ba) on a base metal consisting mainly of nickel (Ni) and containing a small amount of silicon (Si) as a reducing agent. A so-called oxide cathode in which an oxide layer of an alkaline earth metal containing an alkali earth metal is formed is often used.
この酸化物陰極は、還元剤と酸化物とを反応させて酸化
物から遊離原子を生成させ、この遊離原子を電子放射の
ドナー(源)として電子を放射せしめるようにしたもの
である。This oxide cathode is made to react with a reducing agent and an oxide to generate free atoms from the oxide, and to emit electrons using the free atoms as donors (sources) of electron emission.
第2図は従来の電子管陰極の一例を示す概略断面図であ
って、帽状の基体金属(1)、円筒状のスリーブ(2)
、基体金属(1)上に被覆形成された酸化バリウムから
なる電子放射物質層(5)から構成されている。(3)
は陰極加熱用のヒータである。FIG. 2 is a schematic cross-sectional view showing an example of a conventional electron tube cathode, in which a cap-shaped base metal (1), a cylindrical sleeve (2)
It consists of an electron emitting material layer (5) made of barium oxide coated on a base metal (1). (3)
is a heater for heating the cathode.
この電子放射物質層(5)は、次のような工程によって
形成される。すなわち、ニトロセルロース等を溶解した
有機溶剤に炭酸バリウムを混合したあと、吹き付け、電
着等の方法により基体金属(1)上に被着形成される。This electron emitting material layer (5) is formed by the following steps. That is, after barium carbonate is mixed with an organic solvent in which nitrocellulose or the like is dissolved, it is deposited on the base metal (1) by a method such as spraying or electrodeposition.
このような陰極は、ついで電子管内に組み込まれ、電子
管内を真空にするための排気工程でヒータ(3)によっ
て約1000℃に加熱昇温され、炭酸バリウムは次式で
示されるように熱分解によって酸化バリウムに変換され
る。Such a cathode is then incorporated into an electron tube, and heated to approximately 1000°C by a heater (3) during the evacuation process to create a vacuum inside the electron tube, and the barium carbonate is thermally decomposed as shown in the following equation. It is converted to barium oxide by
BaCO54BaO+GO□・・・−・(A)この酸化
バリウムは、陰極の動作中、基体金属(1)と接する境
界(11)において、基体金属(1)の中の還元剤であ
るシリコンと次式のような還元反応を起こす。BaCO54BaO+GO A reduction reaction occurs.
2BaO+Si−+ 2Ba+SiO2・・・++ (
B)この反応で生成された遊離バリウムが、電子放射の
ドナーとして作用する。また、この時に次式に示す反応
も同時に起きる。2BaO+Si-+ 2Ba+SiO2...++ (
B) The free barium produced in this reaction acts as a donor for electron emission. Moreover, at this time, the reaction shown in the following formula also occurs simultaneously.
SiO2+2BaO−+Ba、SiO4・・・・” (
C)以上のように、ドナーとして作用する遊離バリウム
は電子放射の役を担なうが、(B) 、 (C)式に示
すようにSin、、Ba2Sin4なども反応生成物が
電子放射物質層(5)と基体金属(1)との境界(11
)で生成される。この反応生成物は境界付近にどんどん
蓄積して中間層と呼ばれる障壁となり、シリコンの拡散
が妨たげられ、ドナーである遊離バリウムの生成が困難
となる。また、この中間層は高抵抗を有し、電子放射電
流の流れを妨げるという問題点もある。SiO2+2BaO-+Ba, SiO4...” (
C) As mentioned above, free barium that acts as a donor plays a role in electron emission, but as shown in equations (B) and (C), reaction products such as Sin, Ba2Sin4, etc. (5) and the boundary (11) of the base metal (1)
) is generated. This reaction product accumulates rapidly near the boundary and forms a barrier called an intermediate layer, which prevents silicon from diffusing and makes it difficult to generate free barium, which is a donor. Another problem is that this intermediate layer has high resistance and obstructs the flow of electron emission current.
このような問題点に対して、第3図に示すように基体金
属(1)の表面にスカンジエウム(Sc)または酸化ス
カンジユウム(SC203)の皮膜(4)を、真空蒸着
、メツキ法あるいは吹き付は法等で0.1〜10μmの
厚さに被着形成させ、Ba2SiO4等の反応生成物を
解離させることが特願昭62−122659号に開示さ
れている。To solve this problem, as shown in Figure 3, a scandium (Sc) or scandium oxide (SC203) film (4) is applied to the surface of the base metal (1) by vacuum evaporation, plating, or spraying. It is disclosed in Japanese Patent Application No. 122659/1983 that a reaction product such as Ba2SiO4 is dissociated by depositing the material to a thickness of 0.1 to 10 .mu.m by a method or the like.
しかしながら、この発明では、真空蒸着やメツキ法で皮
膜を形成する場合に成膜時間に長時間を要したり、高価
な設備を必要とする。また、吹き付は法の場合でも、0
.1〜10μmの非常に薄い膜を均一に成膜することは
困難であり、歩止まりも悪かった。また、真空蒸着やメ
ツキ法の場合には、基体金R(1)から電子放射物質層
(5)への還元性金属が拡散しにくくなり、電子放射特
性が安定しないという問題点があった。さらに、長時間
の動作中に電子放射物質層(5)が皮膜(4)上から剥
離してしまうという問題点もあった。However, in this invention, when a film is formed by vacuum evaporation or plating, it takes a long time to form the film and requires expensive equipment. In addition, even if spraying is legal,
.. It was difficult to uniformly form a very thin film of 1 to 10 μm, and the yield was poor. Further, in the case of vacuum evaporation or plating methods, there is a problem that the reducing metal becomes difficult to diffuse from the base gold R (1) to the electron emitting material layer (5), and the electron emission characteristics are unstable. Furthermore, there was also the problem that the electron emitting material layer (5) peeled off from the coating (4) during long-term operation.
[発明が解決しようとする課題]
従来の電子管陰極は以上のように構成されているので、
量産性、および品質の安定性に欠けるという問題点があ
った。[Problem to be solved by the invention] Since the conventional electron tube cathode is configured as described above,
There were problems in that mass production and quality stability were lacking.
この発明は、上記のような問題点を解消するためになさ
れたもので、量産性に優れ、かつ電子放射特性等の品質
の安定した電子管陰極を得ることを目的とする。This invention was made to solve the above-mentioned problems, and aims to provide an electron tube cathode that is excellent in mass productivity and has stable quality such as electron emission characteristics.
[課題を解決するための手段]
この発明にかかる電子管陰極は、基体金属上に酸化スカ
ンジユウムを含むニッケル粉末の焼結層を設け、この焼
結層の上に電子放射物質層を被着形成した点を特徴とす
る。[Means for Solving the Problems] The electron tube cathode according to the present invention has a sintered layer of nickel powder containing scandium oxide provided on a base metal, and an electron emitting material layer deposited on the sintered layer. Characterized by points.
[作用]
この発明におけるニッケル粉末焼結層は、基体金属に強
固に固着すると共に焼結層の中に酸化スカンジュムを適
度に分散させて保有しており、さらに、この焼結層は適
度な表面荒さと空孔があるため、電子放射物質を強固に
被着することができると共に、還元性金属の拡散を容易
にすることができる。このため、中間層が形成されるの
を防止できるとともに、製作が容易で、剥離することが
なく、電子放射特性も安定する。[Function] The nickel powder sintered layer of the present invention firmly adheres to the base metal and has scandium oxide dispersed in the sintered layer in an appropriate manner.Furthermore, this sintered layer has an appropriate surface Due to the roughness and pores, it is possible to firmly adhere the electron-emitting substance, and it is also possible to facilitate the diffusion of the reducing metal. Therefore, it is possible to prevent the formation of an intermediate layer, and it is easy to manufacture, does not peel off, and has stable electron emission characteristics.
[発明の実施例]
以下、この発明の一実施例を図によって説明する。第1
図は、この実施例を示す概略構造断面図で、第2図およ
び第3図の従来例と同一構成部分には、同一符号を付し
て説明を省略する。[Embodiment of the Invention] Hereinafter, an embodiment of the present invention will be described with reference to the drawings. 1st
The figure is a schematic structural sectional view showing this embodiment, and the same components as those of the conventional example shown in FIGS. 2 and 3 are given the same reference numerals, and the explanation thereof will be omitted.
図において、(6)はニッケル粉末焼結層で、基体金属
(1)上に、酸化スカンジユウム(6b)が分散して含
まれたニッケル粉末(6a)の焼結層である。In the figure, (6) is a nickel powder sintered layer, which is a sintered layer of nickel powder (6a) containing scandium oxide (6b) dispersed on the base metal (1).
このニッケル粉末焼結層(6)は、次のように形成され
る。平均粒径が10〜30μmのニッケル粉末(6a)
に、重量比で1〜10%の酸化スカンジエウム粉末(6
b)を加え、この混合粉末をニトロセルロースを溶解し
た有機溶媒に加えて懸濁液とし、スプレー等の方法で基
体金属(1)上に20〜30μmの厚さで塗布する。次
いで、水素雰囲気あるいは真空雰囲気中で、約1000
℃で10分間の熱処理を施すことにより基体金属(1)
上に酸化スカンジュウム(6b)を含んだニッケル粉末
(6a)が溶着したニッケル粉末焼結層(6)が形成さ
れる。This nickel powder sintered layer (6) is formed as follows. Nickel powder (6a) with an average particle size of 10 to 30 μm
1 to 10% by weight of scandieum oxide powder (6
b), and this mixed powder is added to an organic solvent in which nitrocellulose is dissolved to form a suspension, and the suspension is applied onto the base metal (1) to a thickness of 20 to 30 μm by a method such as spraying. Next, in a hydrogen atmosphere or a vacuum atmosphere, about 1000
Base metal (1) by heat treatment at ℃ for 10 minutes
A sintered nickel powder layer (6) is formed on which nickel powder (6a) containing scandium oxide (6b) is welded.
このニッケル粉末焼結層(6)の上に、従来例と同様に
、電子放射物質を例えば、スプレーにより50〜100
μmの厚さになるように塗布する。この電子放射物質層
(5)は少なくともバリウム(Ba)を含有し、他にス
トロンチウム(Sr)あるいはカルシウム(Ca)を含
むアルカリ土類金属酸化物を主成分とする。On this nickel powder sintered layer (6), as in the conventional example, an electron emitting material is applied, for example, by spraying at a concentration of 50 to 100.
Apply to a thickness of μm. The electron emitting material layer (5) contains at least barium (Ba) and also contains an alkaline earth metal oxide containing strontium (Sr) or calcium (Ca) as a main component.
このように、この実施例によれば、酸化スカンジユウム
粉末(6b)をニッケル粉末(6a)に分散混合させ、
スプレー等の簡単な方法により基体金属(1)上に被着
した後、非酸化性雰囲気中で熱処理を行うという簡単な
プロセスであるため全生産が向上した。また、焼結層で
あるため、その層内が適度の空孔を備えている。したが
って、基体金属(1)からの還元性金属が電子放射物質
層(5)へ拡散しやすく、従来問題となっていた初期の
電子放射特性のバラツキを低減できた。In this way, according to this example, scandium oxide powder (6b) is dispersed and mixed in nickel powder (6a),
Overall production was improved due to the simple process of depositing on the base metal (1) by a simple method such as spraying and then heat-treating in a non-oxidizing atmosphere. Furthermore, since it is a sintered layer, the layer has a moderate amount of pores. Therefore, the reducing metal from the base metal (1) easily diffuses into the electron emitting material layer (5), and it is possible to reduce the variation in initial electron emission characteristics that has been a problem in the past.
また、ニッケル粉末焼結層(6)と電子放射物質層(5
)との界面は、適度な凹凸があるため電子放射物質層(
5)の被着力が向上し、電子放射物質の剥離が低減でき
た。In addition, a nickel powder sintered layer (6) and an electron emitting material layer (5)
The interface with the electron-emitting material layer (
The adhesion of 5) was improved, and the peeling of the electron emitting material was reduced.
次に、動作中の中間層生成の抑制作用について説明する
。その要旨とするところは、特願昭82−122(15
9号に開示されているとおりであり、ここでは簡単に述
べる。ニッケル粉末焼結層(6)内の酸化スカンジユウ
ム(6b)は、ニッケル粉末(ea)あるいは、基体金
属(1)のニッケルと次のような反応を起こす。Next, the effect of suppressing the generation of the intermediate layer during operation will be explained. The gist of the patent application is 1982-122 (15
9, and will be briefly described here. The scandium oxide (6b) in the nickel powder sintered layer (6) causes the following reaction with the nickel powder (ea) or the nickel of the base metal (1).
Sc、03+1ONi→2ScNis+30・・・・・
・(DJこの反応での生成物5CNtsは、中間層の成
分であるBa2SiO4と次の様な反応をおこす。Sc, 03+1ONi→2ScNis+30...
・(DJ) The product 5CNts in this reaction causes the following reaction with Ba2SiO4, which is a component of the intermediate layer.
16ScNi、+9Ba2SiO4−+ 4Ba3Sc
40.+6Ba+9Si+8ONi・・・・・・(E)
このように3a2Si04は解離され、蓄積されないの
で、中間層の生成が抑制される。16ScNi, +9Ba2SiO4-+ 4Ba3Sc
40. +6Ba+9Si+8ONi (E) Since 3a2Si04 is thus dissociated and not accumulated, the generation of an intermediate layer is suppressed.
[発明の効果]
この発明によれば、酸化スカンジユウムを含んだニッケ
ル粉末の焼結層を基体金属上に形成し、その層上に電子
放射物質を被覆形成したものであるから効率よく安価に
製作できるとともに、電子放射特性の安定した信頼性の
高い電子管陰極が得られる効果がある。[Effects of the Invention] According to this invention, a sintered layer of nickel powder containing scandium oxide is formed on a base metal, and the layer is coated with an electron emitting substance, so it can be manufactured efficiently and at low cost. In addition, it is possible to obtain a highly reliable electron tube cathode with stable electron emission characteristics.
【図面の簡単な説明】
第1図は、この発明の一実施例の概略拡大断面図、第2
図は従来の電子管陰極の概略拡大断面図、第3図は改良
された従来の電子管陰極の拡大概略断面図である。
(1)・・・基体金属、(5)・・・電子放射物質層、
(6)・・・ニッケル粉末焼結層、(6a)・・・ニッ
ケル粉末、(6b)・・・酸化スカンジユウム。
なお、各図中、同一符号は同一 または相当部分を示す
。
第1図[BRIEF DESCRIPTION OF THE DRAWINGS] FIG. 1 is a schematic enlarged sectional view of one embodiment of the present invention, and FIG.
The figure is a schematic enlarged sectional view of a conventional electron tube cathode, and FIG. 3 is an enlarged schematic sectional view of an improved conventional electron tube cathode. (1)...Base metal, (5)...Electron emitting material layer,
(6)...nickel powder sintered layer, (6a)...nickel powder, (6b)...scandium oxide. In each figure, the same reference numerals indicate the same or equivalent parts. Figure 1
Claims (1)
有している陰極基体金属と、この基体金属の面上に形成
された酸化スカンジユウムが分散されているニッケル粉
末焼結層と、この焼結層の面上に形成された少なくとも
バリウムを含むアルカリ土類金属酸化物からなる電子放
射物質層とを備えた電子管陰極。(1) A cathode base metal mainly composed of nickel and containing at least silicon, a sintered nickel powder layer formed on the surface of the base metal in which scandium oxide is dispersed, and a sintered layer of nickel powder in which scandium oxide is dispersed. An electron tube cathode comprising an electron emitting material layer formed on a surface of an alkaline earth metal oxide containing at least barium.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13631389A JPH0760633B2 (en) | 1989-05-30 | 1989-05-30 | Electron tube cathode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13631389A JPH0760633B2 (en) | 1989-05-30 | 1989-05-30 | Electron tube cathode |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH031420A true JPH031420A (en) | 1991-01-08 |
| JPH0760633B2 JPH0760633B2 (en) | 1995-06-28 |
Family
ID=15172284
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13631389A Expired - Lifetime JPH0760633B2 (en) | 1989-05-30 | 1989-05-30 | Electron tube cathode |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0760633B2 (en) |
-
1989
- 1989-05-30 JP JP13631389A patent/JPH0760633B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0760633B2 (en) | 1995-06-28 |
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