JPH03148191A - Variable wavelength semiconductor laser - Google Patents
Variable wavelength semiconductor laserInfo
- Publication number
- JPH03148191A JPH03148191A JP28691589A JP28691589A JPH03148191A JP H03148191 A JPH03148191 A JP H03148191A JP 28691589 A JP28691589 A JP 28691589A JP 28691589 A JP28691589 A JP 28691589A JP H03148191 A JPH03148191 A JP H03148191A
- Authority
- JP
- Japan
- Prior art keywords
- wavelength
- transmission factor
- diffraction grating
- alone
- lambdaa
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08059—Constructional details of the reflector, e.g. shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/14—External cavity lasers
- H01S5/141—External cavity lasers using a wavelength selective device, e.g. a grating or etalon
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
乙の発明は、電気的に高速に波長を変化させることがで
きる波長可変半導体レーザに関するものである。[Detailed Description of the Invention] [Industrial Application Field] The invention of Part B relates to a wavelength tunable semiconductor laser whose wavelength can be electrically changed at high speed.
第5図は、例えばMatthews (M、R,Mat
thews etal、Electronics Le
tters、Vol、21.No、3.pp、113−
115、1985)らにより示された従来の波長可変半
導体(1)
レーザを示す模式図である。この図において、1は半導
体レーザを利用した半導体利得媒質、2はレンズ、3ば
回折格子、6は無反射コートを施した半導体レーザへき
開面である。FIG. 5 shows, for example, Matthews (M, R, Mat
thews etal, Electronics Le
tters, Vol, 21. No, 3. pp, 113-
115, 1985) et al. is a schematic diagram showing a conventional wavelength tunable semiconductor (1) laser. In this figure, 1 is a semiconductor gain medium using a semiconductor laser, 2 is a lens, 3 is a diffraction grating, and 6 is a cleavage plane of the semiconductor laser coated with an anti-reflection coating.
次に動作について説明する。Next, the operation will be explained.
回折格子3は、波長分散特性があり、特定の波長、例え
ば(λ、)の光のみを半導体利得媒質1にもどすことが
できる。この波長λ1が半導体利得媒質1の利得を持つ
波長範囲にあり、また、その利得が乙のレーザ共振器の
損失を上回ると、波長λ、でレーザ発振が始まる。The diffraction grating 3 has wavelength dispersion characteristics and can return only light of a specific wavelength, for example (λ,), to the semiconductor gain medium 1. When this wavelength λ1 is within the wavelength range in which the semiconductor gain medium 1 has a gain, and the gain exceeds the loss of the laser resonator B, laser oscillation starts at the wavelength λ.
この回折格子3を機械的に回転させれば、外部共振器型
半導体レーザの発振波長を変化させることができる。By mechanically rotating this diffraction grating 3, the oscillation wavelength of the external cavity semiconductor laser can be changed.
従来の波長可変半導体レーザは以上のように構成されて
いるので、機械的に回折格子3を回転する必要があり、
そのための動作が低速であり、かつ、バックラッシュ等
により再現性が悪い等の問題点があった。Since the conventional wavelength tunable semiconductor laser is configured as described above, it is necessary to mechanically rotate the diffraction grating 3.
There were problems such as slow operation and poor reproducibility due to backlash and the like.
(2)
この発明は、上記のような問題点を解消するためになさ
れたもので、高速に、また、再現性良く波長を変化させ
ることのできる波長可変半導体レザを得ることを目的と
する。(2) The present invention was made to solve the above-mentioned problems, and an object of the present invention is to obtain a wavelength tunable semiconductor laser that can change the wavelength at high speed and with good reproducibility.
この発明に係る波長可変半導体レーザは、電流注入によ
り利得を生ずる半導体利得媒質と、この半導体利得媒質
からの波長の分散特性を有する少なくとも1個の回折格
子あるいはプリズム、電気的に透過率を変えられる透過
率可変素子2反射率を変えられる反射率可変素子、から
なる波長制御部と、を備えたものである。A wavelength tunable semiconductor laser according to the present invention includes a semiconductor gain medium that generates gain by current injection, at least one diffraction grating or prism having wavelength dispersion characteristics from the semiconductor gain medium, and a transmittance that can be electrically changed. Transmittance Variable Element 2 A wavelength control section comprising a reflectance variable element capable of changing the reflectance.
この発明におけろ波長制御部(才、回折格子と、電気的
に反射率あるいは透過率を変えられる素子により構成さ
れ、これにより特定の波長のみをフィードバックさせて
発振波長を制御する。In this invention, the wavelength control section is composed of a diffraction grating and an element that can electrically change the reflectance or transmittance, and thereby controls the oscillation wavelength by feeding back only a specific wavelength.
以下、この発明の一実施例を図面について説明する。 An embodiment of the present invention will be described below with reference to the drawings.
(3)
第1図はこの発明の波長可変半導体レーザの一実施例を
示す構成図である。この図において、1ば半導体利得媒
質、2はレンズ、3は回折格子、4は、例えば、厚さ1
0nm程度のGaAs井戸層と厚さ5nm程度のAlG
aAsバリア層がそれぞれ10層以上対になった多重量
子井戸構造を、p型およびn型電極によりはさみこんで
逆バイアスを加えられるようにした多重量子井戸構造の
ように電気的に透過率を変えられる透過率可変素子、5
は前記回折格子3で回折された光を反射する反射鏡で、
例えば凹面鏡が用いられる。6は前記半導体利得媒質1
に無反射コートを施した半導体レザへき開面である。(3) FIG. 1 is a configuration diagram showing an embodiment of the wavelength tunable semiconductor laser of the present invention. In this figure, 1 is a semiconductor gain medium, 2 is a lens, 3 is a diffraction grating, and 4 is, for example, a thickness of 1
GaAs well layer about 0 nm thick and AlG about 5 nm thick
A multi-quantum well structure in which a pair of 10 or more aAs barrier layers is sandwiched between p-type and n-type electrodes to electrically change the transmittance, like a multi-quantum well structure that can be reverse biased. transmittance variable element, 5
is a reflecting mirror that reflects the light diffracted by the diffraction grating 3,
For example, a concave mirror is used. 6 is the semiconductor gain medium 1
This is a cleavage surface of a semiconductor laser coated with an anti-reflection coating.
次(こ動作を第2図を用いて説明する。Next, this operation will be explained using FIG.
第2図において、ここで、例えば波長λ。λb。In FIG. 2, here, for example, the wavelength λ. λb.
λ0(こ対応する波長の光は回折格子3により別々の方
向に回折され、それぞれ透過率可変素子4a。λ0 (lights with corresponding wavelengths are diffracted in different directions by the diffraction grating 3, and transmitted through variable transmittance elements 4a.
4b、4cに入射するものとする。この時、もし透過率
可変素子4aのみが透過率が高く、透過率可変素子4b
、4cの透過率が低いならば、凹面(4)
鏡5により、波長λ、の光のみが選択的に反射される。4b and 4c. At this time, if only the variable transmittance element 4a has high transmittance, and the variable transmittance element 4b
, 4c, only the light of wavelength λ is selectively reflected by the concave (4) mirror 5.
したがって、半導体レーザ共振器としては、波長λ1の
みに対して高い反射率を持ち、この波長で発振する。次
に、もし透過率可変素子4bのみを透過率が高い状態に
すれば、発振波長はλb(ζスイッチする乙と(どなる
。Therefore, the semiconductor laser resonator has a high reflectance only for the wavelength λ1 and oscillates at this wavelength. Next, if only the variable transmittance element 4b is set to have a high transmittance, the oscillation wavelength becomes λb(ζ).
なお、上記実施例では多重量子井戸構造を透過率可変素
子4として用いているが、代わりに液晶を用いてもよい
。Note that in the above embodiment, a multi-quantum well structure is used as the variable transmittance element 4, but a liquid crystal may be used instead.
また、上記実施例では回折格子3を1個用いたものを示
したが、第3図に示すように、回折格子3を2個用いて
もよい。この場合に(よ波長が異なっても光路が平行に
移動するだけなので、反射鏡として平面鏡7を用いるこ
とができるという利点がある。Further, although the above embodiment uses one diffraction grating 3, two diffraction gratings 3 may be used as shown in FIG. In this case, there is an advantage that the plane mirror 7 can be used as a reflecting mirror because the optical path only moves in parallel even if the wavelengths are different.
また、上記実施例では、半導体レーザへき開面6に無反
射コーティングを施しているが、任意の反射率に設定す
る乙とが可能である。Further, in the above embodiment, the semiconductor laser cleavage plane 6 is coated with an anti-reflection coating, but it is possible to set the reflectance to an arbitrary value.
さらに、上記実施例では、凹面鏡5には全反射のものを
用いているが、半透過型の凹面鏡を用い(5)
てもよい。この場合、出射光の角度は電気的に制御され
ることになる。また、第3図1とおいて、平面鏡7を半
透過型にすると、出射光の角度は変えずに出射光の位置
のみを電気的1こ制御することができる。Further, in the above embodiment, a total reflection type concave mirror is used as the concave mirror 5, but a semi-transmission type concave mirror may be used (5). In this case, the angle of the emitted light will be electrically controlled. Furthermore, in FIG. 3, if the plane mirror 7 is of a semi-transmissive type, only the position of the emitted light can be electrically controlled without changing the angle of the emitted light.
また、第4図に示すように、波長制御部と反対側に回折
格子3を置いても、同様に出射角の制御ができる。Further, as shown in FIG. 4, even if the diffraction grating 3 is placed on the side opposite to the wavelength control section, the output angle can be controlled in the same way.
また、上記実施例では、波長分散を有するものとして回
折格子3を用いたが、プリズムを用いても同様の効果が
得られる。Further, in the above embodiment, the diffraction grating 3 is used as having wavelength dispersion, but the same effect can be obtained by using a prism.
以上説明したように、この発明は、電流注入により利得
を生ずる半導体利得媒質と、この半導体利得媒質からの
波長の分散特性を有する少なくとも1個の回折格子ある
いはプリズム、電気的に透過率を変えられる透過率可変
素子2反射率を変えられる反射率可変素子とからなる波
長制御部と、を備えたので、装置が小型になり、また、
高速で再現性の良い波長可変が可能であり、スペクトル
(6)
線幅も狭いものが得られる。さらに、ビームの出射角あ
るいは位置も電気的に制御する乙とが可能になる。As explained above, the present invention includes a semiconductor gain medium that generates gain by current injection, at least one diffraction grating or prism that has wavelength dispersion characteristics from the semiconductor gain medium, and that can electrically change transmittance. Variable Transmittance Element 2 A wavelength control section consisting of a variable reflectance element that can change the reflectance allows the device to be made smaller, and
It is possible to tune the wavelength at high speed and with good reproducibility, and a spectrum (6) with a narrow linewidth can be obtained. Furthermore, it becomes possible to electrically control the emission angle or position of the beam.
第1図は乙の発明の一実施例による波長可変半導体レー
ザを模式的に示した構成図、第2図はこの発明の波長選
択部の拡大図、第3図はこの発明の他の実施例を模式的
に示した構成図、第4図はビーム偏向特性を有するこの
発明の他の実施例を模式的に示した構成図、第5図は従
来の波長可変半導体レーザを模式的に示した構成図であ
る。
図において、1は半導体利得媒質、2はレンズ、3は回
折格子、4は透過率可変素子、5は凹曲鏡、6は半導体
レーザへき開面、7は平面鏡、λ1゜λb、λ。は波長
である。
なお、各図中の同一符号は同一または相当部分を示す。Fig. 1 is a schematic configuration diagram of a wavelength tunable semiconductor laser according to an embodiment of the invention of B, Fig. 2 is an enlarged view of the wavelength selection section of the invention, and Fig. 3 is another embodiment of the invention. FIG. 4 is a schematic diagram of another embodiment of the present invention having beam deflection characteristics. FIG. 5 is a schematic diagram of a conventional wavelength tunable semiconductor laser. FIG. In the figure, 1 is a semiconductor gain medium, 2 is a lens, 3 is a diffraction grating, 4 is a transmittance variable element, 5 is a concave mirror, 6 is a semiconductor laser cleavage plane, and 7 is a plane mirror, λ1°λb, λ. is the wavelength. Note that the same reference numerals in each figure indicate the same or corresponding parts.
Claims (1)
導体利得媒質からのレーザ光を波長分散させる回折格子
あるいはプリズム、電気的に反射率あるいは透過率を変
えることにより分散させた上に波長の1つを選択して前
記半導体利得媒質に入射させる波長制御部と、を備えた
ことを特徴とする波長可変半導体レーザ。A semiconductor gain medium that generates gain by current injection, a diffraction grating or prism that wavelength-disperses the laser light from this semiconductor gain medium, and a diffraction grating or prism that wavelength-disperses laser light from this semiconductor gain medium. A wavelength tunable semiconductor laser comprising: a wavelength control unit that selectively causes the wavelength to be incident on the semiconductor gain medium.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28691589A JPH03148191A (en) | 1989-11-02 | 1989-11-02 | Variable wavelength semiconductor laser |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28691589A JPH03148191A (en) | 1989-11-02 | 1989-11-02 | Variable wavelength semiconductor laser |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03148191A true JPH03148191A (en) | 1991-06-24 |
Family
ID=17710626
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28691589A Pending JPH03148191A (en) | 1989-11-02 | 1989-11-02 | Variable wavelength semiconductor laser |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03148191A (en) |
-
1989
- 1989-11-02 JP JP28691589A patent/JPH03148191A/en active Pending
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