JPH0315544Y2 - - Google Patents
Info
- Publication number
- JPH0315544Y2 JPH0315544Y2 JP7812084U JP7812084U JPH0315544Y2 JP H0315544 Y2 JPH0315544 Y2 JP H0315544Y2 JP 7812084 U JP7812084 U JP 7812084U JP 7812084 U JP7812084 U JP 7812084U JP H0315544 Y2 JPH0315544 Y2 JP H0315544Y2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- electrode
- processing chamber
- permanent magnet
- high voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- BGPVFRJUHWVFKM-UHFFFAOYSA-N N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] Chemical compound N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] BGPVFRJUHWVFKM-UHFFFAOYSA-N 0.000 claims description 10
- 238000004544 sputter deposition Methods 0.000 claims description 3
- 229910000640 Fe alloy Inorganic materials 0.000 claims 1
- 229910019589 Cr—Fe Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000009489 vacuum treatment Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
【考案の詳細な説明】
本考案はスパツタリング、イオンプレーテイン
グ等の真空処理を行なう真空処理装置に於いて、
真空処理室内に放電を開始すべく作用するトリガ
電極装置に関する。[Detailed description of the invention] This invention is a vacuum processing apparatus that performs vacuum processing such as sputtering and ion plating.
The present invention relates to a trigger electrode device that operates to initiate a discharge within a vacuum processing chamber.
出願人は先にこの種の電極として、第３図示の
ように、真空処理室ａ内に外部の高圧電源に連な
る針状高圧電極ｂを突設すると共に該電極ｂの外
周に永久磁石ｃを配設し、該処理室ａ内が例えば
10-4トール以下の高真空或は10-10トール以下の
超高真空であつても放電を開始出来るようにした
ものを提案した（実公昭58−35649）が、該永久
磁石ｃを真空処理室ａ内に露出して設けると該真
空処理室ａ内が高真空或は超高真空になつた場合
永久磁石ｃから放出されるガスにより該室ａ内が
汚染される欠点がある。 As an electrode of this kind, the applicant previously installed a needle-shaped high-voltage electrode b connected to an external high-voltage power source in a vacuum processing chamber a and attached a permanent magnet c around the outer periphery of the electrode b, as shown in Figure 3. For example, if the inside of the processing chamber a is
They proposed a device that could start a discharge even in a high vacuum of 10 -4 Torr or less or an ultra-high vacuum of 10 -10 Torr or less (Utility Model Publication No. 58-35649), but the permanent magnet c was not subjected to vacuum treatment. If it is provided exposed in the chamber a, there is a drawback that the interior of the vacuum processing chamber a will be contaminated by the gas emitted from the permanent magnet c when the interior of the vacuum processing chamber a becomes high vacuum or ultra-high vacuum.
本考案はこうした欠点を解決することを目的と
したもので、スパツタリング用その他の真空処理
室１内に、外部の高圧電源２に連なる針状高圧電
極３を突設すると共に該電極３の外周に永久磁石
４を配設してこれを放電開始用のトリガ電極とし
て作用させる式のものに於いて、該永久磁石４を
真空中で放出ガスの少ないSUSやAl又はTa或は
Ni−Cr−Fe合金からなるカバー５で覆うことを
特徴とする。 The present invention aims to solve these drawbacks, and includes a needle-shaped high-voltage electrode 3 connected to an external high-voltage power source 2 protruding inside a vacuum processing chamber 1 for sputtering and other purposes, and a In a type in which a permanent magnet 4 is provided and acts as a trigger electrode for starting discharge, the permanent magnet 4 is made of SUS, Al, Ta, or other materials that emit less gas in a vacuum.
It is characterized by being covered with a cover 5 made of Ni-Cr-Fe alloy.
第１図はその１例を示すもので、これに於いて
は碍子６，６及び高圧端子７に針状高圧電極３を
挿通させてその先端を真空処理室１内に臨ませ、
該高圧端子７を取付部材８により該処理室１の側
壁９に気密に取付けした。またカバー５はSUS
やAl、Ta、Ni−Cr−Fe合金（例えば商品名イ
ンコネル）からなる真空中への放出ガスの少ない
材料を使用して第２図示のように内外２重の円筒
１０，１１の両端に環状端板１２，１３を溶接す
る等で閉塞して構成され、その内部の空間１４に
棒状の複数本の永久磁石４が収められる。尚該永
久磁石４はそのカバー５の内周を前記碍子６，６
に保持して取付けるようにした。 FIG. 1 shows one example of this, in which a needle-like high-voltage electrode 3 is inserted through the insulators 6, 6 and the high-voltage terminal 7, and its tip is exposed into the vacuum processing chamber 1.
The high voltage terminal 7 was airtightly attached to the side wall 9 of the processing chamber 1 using a mounting member 8. Also, cover 5 is SUS
Using materials such as Al, Ta, and Ni-Cr-Fe alloys (for example, Inconel) that emit less gas into vacuum, an annular structure is formed at both ends of the double inner and outer cylinders 10 and 11 as shown in the second figure. The end plates 12 and 13 are closed by welding or the like, and a plurality of rod-shaped permanent magnets 4 are housed in the space 14 inside. The permanent magnet 4 has the inner circumference of the cover 5 connected to the insulators 6, 6.
so that it can be held and installed.
その作動を説明するに、針状高圧電極３に高圧
電源２から高電圧を通電すると該電極３の周囲の
永久磁石４の作用でマグネトロン放電が生じ、高
真空或は超高真空の処理室１内でのグロー放電を
開始が可能となるが、該磁石４にはカバー５が設
けられているので該磁石４から処理室１内にガス
が放出されることがなく、処理室１内が放出ガス
で汚染されることがない。 To explain its operation, when a high voltage is applied to the needle-shaped high-voltage electrode 3 from the high-voltage power supply 2, a magnetron discharge is generated by the action of the permanent magnet 4 around the electrode 3, and the processing chamber 1 in a high vacuum or ultra-high vacuum is generated. However, since the magnet 4 is provided with a cover 5, gas is not released from the magnet 4 into the processing chamber 1, and the gas inside the processing chamber 1 is not released. No gas contamination.
このように本考案によるときは、針状高圧電極
３の周囲に設けられる永久磁石４をカバー５で覆
うようにしたので、処理室１内が該磁石４から放
出されるガスにより汚染されることを防止出来る
効果がある。 In this way, according to the present invention, since the permanent magnet 4 provided around the needle-like high voltage electrode 3 is covered with the cover 5, the inside of the processing chamber 1 is prevented from being contaminated by the gas emitted from the magnet 4. It has the effect of preventing
第１図は本考案の実施例の截断側面図、第２図
はその−線截断面図、第３図は従来例の説明
線図である。
１……真空処理室、２……高圧電源、３……針
状高圧電極、４……永久磁石、５……カバー。
FIG. 1 is a cross-sectional side view of an embodiment of the present invention, FIG. 2 is a cross-sectional view taken along the - line, and FIG. 3 is an explanatory diagram of a conventional example. 1... Vacuum processing chamber, 2... High voltage power source, 3... Acicular high voltage electrode, 4... Permanent magnet, 5... Cover.
Claims (1)
外部の高圧電源２に連なる針状高圧電極３を突設
すると共に該電極３の外周に永久磁石４を配設し
てこれを放電開始用のトリガ電極として作用させ
る式のものに於いて、該永久磁石４を真空中で放
出ガスの少ないSUSやAl又はTa或はNi−Cr−
Fe合金から成るカバー５で覆うことを特徴とす
るトリガー電極装置。 In the other vacuum processing chamber 1 for sputtering,
In a type in which a needle-like high voltage electrode 3 connected to an external high voltage power source 2 is provided protrudingly, a permanent magnet 4 is arranged around the outer periphery of the electrode 3, and this acts as a trigger electrode for starting discharge. The permanent magnet 4 is made of SUS, Al, Ta, or Ni-Cr-, which releases less gas in a vacuum.
A trigger electrode device characterized by being covered with a cover 5 made of Fe alloy.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7812084U JPS60189558U (en) | 1984-05-29 | 1984-05-29 | trigger electrode device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7812084U JPS60189558U (en) | 1984-05-29 | 1984-05-29 | trigger electrode device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60189558U JPS60189558U (en) | 1985-12-16 |
| JPH0315544Y2 true JPH0315544Y2 (en) | 1991-04-04 |
Family
ID=30621810
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7812084U Granted JPS60189558U (en) | 1984-05-29 | 1984-05-29 | trigger electrode device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60189558U (en) |
-
1984
- 1984-05-29 JP JP7812084U patent/JPS60189558U/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60189558U (en) | 1985-12-16 |
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