JPH03182697A - Vacuum pump - Google Patents
Vacuum pumpInfo
- Publication number
- JPH03182697A JPH03182697A JP1320678A JP32067889A JPH03182697A JP H03182697 A JPH03182697 A JP H03182697A JP 1320678 A JP1320678 A JP 1320678A JP 32067889 A JP32067889 A JP 32067889A JP H03182697 A JPH03182697 A JP H03182697A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- pressure side
- spiral
- vortex
- pump
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003068 static effect Effects 0.000 abstract 4
- 230000002093 peripheral effect Effects 0.000 abstract 2
- 238000004519 manufacturing process Methods 0.000 description 14
- 238000005086 pumping Methods 0.000 description 11
- 239000003921 oil Substances 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 7
- 230000007423 decrease Effects 0.000 description 5
- 239000000565 sealant Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 239000011120 plywood Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D17/00—Radial-flow pumps, e.g. centrifugal pumps; Helico-centrifugal pumps
- F04D17/08—Centrifugal pumps
- F04D17/16—Centrifugal pumps for displacing without appreciable compression
- F04D17/168—Pumps specially adapted to produce a vacuum
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D23/00—Other rotary non-positive-displacement pumps
- F04D23/008—Regenerative pumps
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Non-Positive Displacement Air Blowers (AREA)
- Structures Of Non-Positive Displacement Pumps (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、半導体製造装置や食品製造装置の真空排気部
に設置する真空ポンプ(油等のシーラントを使用しない
でクリーンな真空を作る真空ポンプ)に関するものであ
る。Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a vacuum pump installed in the vacuum exhaust section of semiconductor manufacturing equipment or food manufacturing equipment (a vacuum pump that creates a clean vacuum without using sealants such as oil). ).
(従来の技術)
油回転ポンプ等では、ポンプ内のシーラントとしての油
のベーパが真空排気すべき装置1例えば半導体製造装置
や食品製造装置へ逆拡散すると。(Prior Art) In an oil rotary pump or the like, when oil vapor as a sealant inside the pump diffuses back into the equipment 1 to be evacuated, such as semiconductor manufacturing equipment or food manufacturing equipment.
これらの半導体製造装置や食品製造装置で作る製品に悪
影響を与えるので、これら装置の真空排気部に油等のシ
ーラントを使用しないでクリーンな真空を作る真空ポン
プを設置している。Since this adversely affects the products made with these semiconductor manufacturing equipment and food manufacturing equipment, vacuum pumps are installed in the vacuum exhaust parts of these equipment to create a clean vacuum without using sealants such as oil.
この真空ポンプでは、真空排気すべき半導体製造装置や
食品製造装置の圧力が大気圧から10〜10−7まで一
台で排気できるように、狭い間隙を置いて対向する回転
円板と静止円板とを複数段に組み合わせている。しかも
広範囲の真空領域を扱う必要があり、乱流域から分子流
域までの全てにおいて、良好な排気性能を得るため、大
気圧に近い段では5回転円板と静止円板との対向面のそ
れぞれにスパイラル状溝を設けて1両面スパイラル溝の
摩擦ポンプを構成し、高真空側では1回転円板と静止円
板との対向面の何れか一方だけにスパイラル状溝を設け
て9片面スパイラル溝の摩擦ポンプを構成している。そ
して回転円板を高速回転させることにより、−台の真空
ポンプで大気圧から高真空までの排気を可能にしており
、この真空ポンプを使用すると、油のベーパが真空排気
すべき装置1例えば半導体製造装置や食品製造装置へ逆
拡散しないという利点がある。This vacuum pump consists of a rotating disk and a stationary disk that face each other with a narrow gap so that the pressure of semiconductor manufacturing equipment or food manufacturing equipment to be evacuated can be evacuated from atmospheric pressure to 10 to 10-7. are combined in multiple stages. Moreover, it is necessary to handle a wide range of vacuum regions, and in order to obtain good exhaust performance in everything from the turbulent region to the molecular region, in the stage near atmospheric pressure, the A spiral groove is provided to configure a friction pump with a spiral groove on one side, and on the high vacuum side, a spiral groove is provided only on one of the facing surfaces of the one-rotation disk and the stationary disk to form a friction pump with a spiral groove on one side. It constitutes a friction pump. By rotating the rotary disk at high speed, it is possible to evacuate from atmospheric pressure to high vacuum with a single vacuum pump. When this vacuum pump is used, oil vapor can be evacuated from devices such as semiconductors. It has the advantage of not back diffusing into manufacturing equipment or food manufacturing equipment.
この真空ポンプの従来例を第4.5図により説明すると
、 (01)がロータ、 (Ola)が同ロータ(10
)の外周面に多段に設けた回転円板、 (02)がケー
シング、 (02a)が同ケーシング(02)の内周面
に多段に設けた静止円板、(02a、)が同各静止円板
(02a)の回転円板対向面に設けたスパイラル状溝で
、同各静止円板(02a) と上記各回転円板(Ola
)とが狭い間隙を置いて対向している。また(03)が
上記ロータ(Ol)を支持した主軸、 (010)がモ
ータケーシング。A conventional example of this vacuum pump is explained with reference to Fig. 4.5. (01) is the rotor, (Ola) is the same rotor (10).
), (02) is a casing, (02a) is a stationary disk provided in multiple stages on the inner circumferential surface of the casing (02), (02a,) is each stationary circle of the same A spiral groove provided on the surface of the plate (02a) facing the rotating disk allows each of the stationary disks (02a) and each of the rotating disks (Ola
) are facing each other with a narrow gap. Also, (03) is the main shaft that supported the rotor (Ol), and (010) is the motor casing.
(04)が上記主軸(03)に取付けたモータ回転子。(04) is the motor rotor attached to the main shaft (03).
(05)が上記モータケーシング(010)に取付けた
モータステータ、 (06)が上記主軸(03)の上部
軸受。(05) is the motor stator attached to the motor casing (010), and (06) is the upper bearing of the main shaft (03).
(07)が上記主軸(03)の下部軸受、 (08)が
上記ケーシング(02)の上部に設けた吸入口、 (0
9)が上記ケーシング(02)の下部に設けた排気口、
(011,)が上記モータケーシング(010)の周り
に設けた冷却用ジャケット、 (012)が同冷却用ジ
ャケット(011)の冷却水排出口、 (015)が上
記モータケーシング(010)の下部に取付けた油タン
ク兼下部ケーシング。(07) is the lower bearing of the main shaft (03), (08) is the suction port provided in the upper part of the casing (02), (0
9) is an exhaust port provided at the bottom of the casing (02);
(011,) is the cooling jacket provided around the motor casing (010), (012) is the cooling water outlet of the cooling jacket (011), and (015) is the bottom of the motor casing (010). Installed oil tank/lower casing.
(016)が同下部ケーシング(015)の下部に取付
けた合板、 (014)が上記油タンク兼下部ケーシン
グ(015)内の潤滑油で、モータ回転子(04)とモ
ータステータ(05)とにより、主軸(03)とロータ
(01)と各回転円板(Ola)とを回転させて、大気
圧状態の半導体製造装置や食品製造装置から吸入口(0
8)を経て吸入したガスをガスの粘性により加速させ。(016) is the plywood attached to the lower part of the lower casing (015), (014) is the lubricating oil in the oil tank and lower casing (015), which is connected to the motor rotor (04) and motor stator (05). , the main shaft (03), the rotor (01), and each rotating disk (Ola) are rotated to remove the suction port (0) from the semiconductor manufacturing equipment or food manufacturing equipment at atmospheric pressure.
8) The gas inhaled is accelerated by the viscosity of the gas.
また各静止円板(02a)の回転円板対向面に設けたス
パイラル状溝(02a1)により旋回させながら、排気
口(09)を経て排気するようにしている。なおこの真
空ポンプ(ジーグハーン真空ポンプ)は、油回転ポンプ
のように油等の液体を使用しないので。Moreover, the air is exhausted through the exhaust port (09) while being rotated by a spiral groove (02a1) provided on the surface of each stationary disk (02a) facing the rotating disk. This vacuum pump (Sieghahn vacuum pump) does not use liquids such as oil like oil rotary pumps.
前述のように油のベーパを真空排気すべき装置。Equipment that should evacuate oil vapor as mentioned above.
例えば半導体製造装置や食品製造装置へ逆拡散させるこ
とがない。For example, it will not be diffused back into semiconductor manufacturing equipment or food manufacturing equipment.
(発明が解決しようとする課題) 前記第4,5図に示す従来の真空ポンプでは。(Problem to be solved by the invention) In the conventional vacuum pump shown in FIGS. 4 and 5 above.
両面スパイラル溝の摩擦ポンプと片面スパイラル溝の摩
擦ポンプとを組み合わせている。これら摩擦ポンプのう
ち、大気圧に近い乱流域では1両面スパイラル溝の摩擦
ポンプをもつ段が大きな排気仕事をし1層流域及び分子
流域では1片面スパイラル溝の摩擦ポンプをもつ段が大
きな仕事をするが、スリップ流域では1片面スパイラル
溝の摩擦ポンプの排気速度が低下する。このため、多く
の段数を必要として、真空ポンプが大型化する。また大
気圧から高真空までの排気過度時には、 10〜0
、 I TorrO間の排気速度が小さくなり、この
間の排気に多くの時間を必要とするという問題があった
。参考までに排気速度と真空度との関係を第6図に示し
た。It combines a friction pump with spiral grooves on both sides and a friction pump with spiral grooves on one side. Among these friction pumps, in a turbulent region near atmospheric pressure, the stage with a friction pump with spiral grooves on one side performs a large exhaust work, and in the single-layer region and molecular region, the stage with a friction pump with a spiral groove on one side performs a large work. However, in the slip region, the pumping speed of the friction pump with the one-sided spiral groove decreases. For this reason, a large number of stages is required, making the vacuum pump larger. In addition, during excessive pumping from atmospheric pressure to high vacuum, 10 to 0
, I TorrO becomes small, and there is a problem in that a large amount of time is required for evacuation during this period. For reference, the relationship between pumping speed and degree of vacuum is shown in Figure 6.
本考案は前記の問題点に鑑み提案するものであり、その
目的とする処は、 10=0. ITorrの範囲で
も排気速度を低下させない。また定格真空条件で運転す
るときの中間段の効率を向上でき9段数を減らすことが
できて、小型化できる真空ポンプを提供しようとする点
にある。The present invention is proposed in view of the above-mentioned problems, and its objectives are as follows: 10=0. The pumping speed does not decrease even in the ITorr range. Another object of the present invention is to provide a vacuum pump that can improve the efficiency of the intermediate stage when operating under rated vacuum conditions, reduce the number of stages, and reduce the size of the vacuum pump.
(課題を解決するための手段)
上記の目的を達成するために1本発明は、狭い間隙を置
いて対向する回転円板と静止円板とを複数段に組み合わ
せ、同各回転円板と同各静止円板との少なくとも一方に
スパイラル状溝を設けて。(Means for Solving the Problems) In order to achieve the above object, the present invention combines a plurality of rotating disks and stationary disks facing each other with a narrow gap, and A spiral groove is provided on at least one side of each stationary disk.
スパイラル溝の摩擦ポンプを構成し、同各回転円板を高
速回転させたときの気体の粘性摩擦により気体を吸気口
から排気口へ排気する真空ポンプにおいて、前記各回転
円板のうち、中間段の回転円板に断面が半円形または弓
形の凹みを複数個円周方向に沿って設けて、隣接する凹
みの間に半径方向の羽根を形威し、同中間段の静止円板
に断面が円弧状の渦巻室を複数個円周方向に沿って設け
。In a vacuum pump that constitutes a spiral groove friction pump and exhausts gas from an intake port to an exhaust port by the viscous friction of the gas when each of the rotating disks is rotated at high speed, an intermediate stage of each of the rotating disks is used. A plurality of recesses with semicircular or arcuate cross sections are provided along the circumferential direction in the rotating disk of Multiple arc-shaped spiral chambers are provided along the circumference.
同各渦巻室に吸入室と吐出室とを設けて、これら中間段
の回転円板と静止円板とにより低圧側渦巻室の吐出口と
高圧側吸入口とを共通とする渦巻摩擦ポンプを形成して
いる。Each of the volute chambers is provided with a suction chamber and a discharge chamber, and the rotating disk and stationary disk at the intermediate stage form a vortex friction pump in which the discharge port of the low-pressure side volute chamber and the high-pressure side suction port are common. are doing.
(作用)
本発明の真空ポンプは前記のよう乙こ構成されており1
層流域、スリップ流域9介子流域を分担する片面スパイ
ラル溝の摩擦ポンプは、その最適排気性能により1回転
円板と静止円板との隙間の数倍以下のスパイラル溝深さ
を選定する必要があり。(Function) The vacuum pump of the present invention is constructed as described above.
For a friction pump with a single-sided spiral groove that serves a laminar region, a slip region, and a nine-layer region, it is necessary to select a spiral groove depth that is several times the gap between the one-rotation disk and the stationary disk, depending on its optimum pumping performance. .
溝深さが比較的浅くなり、流れを支配するレイノズル数
R@やクタードセン数にわが小さくなる傾向があるが、
中間段の渦巻摩擦ポンプは、渦巻室の溝深さをスパイラ
ル溝深さの数倍から十数倍にできる。しかも回転円板が
作り出す半径方向の流れ一二次流れにより、渦巻室内の
流れを乱して。As the groove depth becomes relatively shallow, there is a tendency for the Raynozzle number R@ and Kutdsen number that govern the flow to become smaller.
The intermediate stage volute friction pump can increase the groove depth of the volute chamber from several times to more than ten times the spiral groove depth. Furthermore, the radial primary and secondary flows created by the rotating disk disturb the flow within the vortex chamber.
渦巻室の隙間が大きくても、旋回方向の速度を大きくす
ることができる。この結果1片面スパイラル溝の摩擦ポ
ンプで排気性能を得にくい10〜0゜l Torrの範
囲でも排気速度が低下しない。Even if the gap in the swirl chamber is large, the speed in the swirling direction can be increased. As a result, the pumping speed does not decrease even in the range of 10 to 0 Torr, where pumping performance is difficult to obtain with a friction pump with a spiral groove on one side.
(実施例)
次に本発明の真空ポンプを第1.2.3図に示す一実施
例により説明すると、第1図の(IA) (IB)(I
C)が回転円板、 (4B) (4C)が同回転円板C
IA) (IB)(1C)に狭い間隙を置いて対向した
静止円板で9回転円板(IA)と静止円板(4B)との
対向面には1片面スパイラルをもつ摩擦ポンプが構成さ
れ、静止円板(4B)と回転円板(IB〉との対向面、
及び回転円板(1B)と静止円板(4C〉との対向面に
は9本考案の渦巻摩擦ポンプが構成され、静止円板(4
C)と回転円板(IC)との対向面には1片面スパイラ
ルをもつ摩擦ポンプが構成されている。また上記中間段
の回転円板(IB)には、第2図に示すように断面が半
円形または弓形の凹み(X) (Y)を複数個円周方向
に沿って設けて、隣接する凹み(X) (Y)の間に半
径方向の羽根(Z)を形成する。また第1.3図に示す
ように中間段の静止円板(4B)には、断面が円弧状の
低圧側渦巻室(R)及び高圧側渦巻室(S)を円周方向
に沿って設け、同低圧側渦巻室(R)に吸入口(U)と
吐出口(V)とを設け、上記高圧側渦巻室(S)に吐出
口(V″)を設け、上記低圧側渦巻室(R)の吐出口(
V)を上記高圧側渦巻室(S)の吸入口に兼用しており
、静止円板(4B)と回転円板(IB)との対向面には
、半径方向に2段の渦巻摩擦ポンプが構成され1回転円
板(IB)と静止円板(4C)との対向面には、半径方
向に3段の渦巻摩擦ポンプが構成されている。なお上記
各渦巻室(R) (S)は、吸入口から吐出口に向かい
浅くなっている。また上記吐出口(V゛)が次の段の摩
擦ポンプに開口している。(Example) Next, the vacuum pump of the present invention will be explained using an example shown in Fig. 1.2.3.
C) is a rotating disk, (4B) (4C) is the same rotating disk C
IA) (IB) (1C) are stationary disks facing each other with a narrow gap, and a friction pump with one single-sided spiral is constructed on the opposing surfaces of the 9-rotating disk (IA) and the stationary disk (4B). , the opposing surface between the stationary disk (4B) and the rotating disk (IB>,
Nine spiral friction pumps of the present invention are constructed on the opposing surfaces of the rotating disk (1B) and the stationary disk (4C).
A friction pump having one spiral on one side is constructed on the opposing surface of C) and the rotating disk (IC). In addition, as shown in FIG. 2, the intermediate rotating disk (IB) is provided with a plurality of recesses (X) and (Y) having semicircular or arcuate cross sections along the circumferential direction, and adjacent recesses Form a radial vane (Z) between (X) and (Y). In addition, as shown in Figure 1.3, the intermediate stage stationary disk (4B) is provided with a low-pressure side spiral chamber (R) and a high-pressure side spiral chamber (S) having an arc-shaped cross section along the circumferential direction. , the low pressure side spiral chamber (R) is provided with an inlet (U) and a discharge port (V), the high pressure side spiral chamber (S) is provided with a discharge port (V''), and the low pressure side spiral chamber (R) is provided with a discharge port (V''). ) outlet (
V) is also used as the suction port of the high-pressure side volute chamber (S), and a two-stage volute friction pump is installed in the radial direction on the opposing surface of the stationary disk (4B) and the rotating disk (IB). Three stages of volute friction pumps are arranged in the radial direction on the opposing surfaces of the one-rotation disk (IB) and the stationary disk (4C). Note that each of the swirl chambers (R) (S) becomes shallower from the suction port toward the discharge port. Further, the discharge port (V') opens to the next stage friction pump.
また上記渦巻摩擦ポンプでは、渦巻室(R)から渦巻室
(S)に向かい圧力が高くなって、気体の密度が大きく
なるので、渦巻室(R)の流路面積〉渦巻室(S)の流
路面積にして、気体の旋回方向の流速を略一定にするよ
うにしている。また渦巻室(R)(S)は、軸線を中心
とした対称位置に大きさ、形状の同じものを2個ずつ配
設している。また−段の渦巻摩擦ポンプの圧力比は、小
さくて、直列に複数段組み合わせる必要がある。本実施
例では。In addition, in the above-mentioned spiral friction pump, the pressure increases from the spiral chamber (R) to the spiral chamber (S), and the density of the gas increases. The flow rate in the swirling direction of the gas is kept approximately constant based on the flow path area. Two spiral chambers (R) and two spiral chambers (S) having the same size and shape are arranged at symmetrical positions with respect to the axis. In addition, the pressure ratio of the -stage centrifugal friction pump is small, so it is necessary to combine multiple stages in series. In this example.
1枚の回転円板(IB)の上下面で合計5段になってい
るが9片面で少なくとも2段にすることにより。There are a total of 5 stages on the top and bottom surfaces of one rotating disk (IB), but by making it at least 2 stages on one side of 9.
吸入口及び吐出口を合理的に、コンパクトに纏めること
かできる。The suction port and discharge port can be rationally and compactly arranged.
次に前記第1.2.3図に示す真空ポンプの作用を具体
的に説明する。層流域、スリップ流域。Next, the operation of the vacuum pump shown in FIG. 1.2.3 will be explained in detail. Laminar basin, slip basin.
分子流域を分担する片面スパイラル溝の摩擦ポンプ(回
転円板(IA)と静止円板(4B)との対向面に構成し
た摩擦ポンプと9回転円板(1B)と静止円板(4C)
との対向面に構成した摩擦ポンプ〉は、その最適排気性
能により1回転円板(IA)と静止円板(4B)との隙
間、及び回転円板(IB)と静止円板(4C)との隙間
の数倍以下のスパイラル溝深さを選定する必要があり、
比較的溝深さが浅くなり、流れを支配するレイノズル数
R3やクタードセン数に7が小さくなる傾向がある。A friction pump with a spiral groove on one side that shares the molecular flow area (friction pump configured on the opposing surfaces of a rotating disk (IA) and a stationary disk (4B), a 9-rotation disk (1B), and a stationary disk (4C))
Due to its optimum pumping performance, the friction pump configured on the opposing surface of It is necessary to select a spiral groove depth that is several times the gap or less.
The groove depth becomes relatively shallow, and the Raynozzle number R3 and Kutdsen number, which govern the flow, tend to be smaller than 7.
h
R,−
り
ここでV:周速度、h:隙間+スパイラル溝深さ、D:
気体の動粘性係数
に、=h/λ
ここでλ:気体分子の平均自由行程
渦巻摩擦ポンプは、渦巻室(R) (S)の溝深さをス
パイラル溝深さの数倍から十数倍にできる。しかも回転
円板(1B)が作り出す半径方向の流れ一二次流れによ
り、渦巻室(R) (S)内の流れを乱して、渦巻室(
R) (S)の隙間が大きくても、旋回方向の速度を大
きくすることができる。この結果1片面スパイラル溝の
摩擦ポンプで排気性能を得にくい10〜0 、 I
Torrの範囲でも排気速度が低下しない。h R, - where V: circumferential speed, h: gap + spiral groove depth, D:
The kinematic viscosity coefficient of gas is = h/λ, where λ: Mean free path of gas molecules In a volute friction pump, the groove depth of the volute chamber (R) (S) is several times to ten times the spiral groove depth. Can be done. Moreover, the radial primary and secondary flows created by the rotating disk (1B) disturb the flow in the swirl chamber (R) (S),
Even if the gap between R) and (S) is large, the speed in the turning direction can be increased. As a result, it is difficult to obtain exhaust performance with a friction pump with a spiral groove on one side.
The pumping speed does not decrease even in the Torr range.
(発明の効果)
本発明の真空ポンプは前記のように各回転円板のうち、
中間段の回転円板に断面が半円形または弓形の凹みを複
数個円周方向に沿って設けて、lIj!!接する凹みの
間に半径方向の羽根を形成し、同中間段の静止円板に断
面が円弧状の渦巻室を複数個円周方向に沿って設け、同
各渦巻室に吸入室と吐出室とを設けて、これら中間段の
回転円板と静止円板とにより低圧側渦巻室の吐出口と高
圧側吸入口とを共通とする渦巻摩擦ポンプを形成してい
るが、この中間段の渦巻摩擦ポンプは、渦巻室の溝深さ
をスパイラル溝深さの数倍から十数倍にできる。しかも
回転円板が作り出す半径方向の流れ一二次流れにより、
渦巻室内の流れを乱して、渦巻室の隙間が大きくても、
旋回方向の速度を大きくすることができる。この結果1
片面スパイラル溝の摩擦ポンプで排気性能を得にくい1
0〜0.ITorrの範囲でも排気速度を低下させない
。また上記のように中間段に渦巻摩擦ポンプを構成して
おり、定格真空条件で運転するときの中間段の効率を向
上でき1段数を減らすことができて、真空ポンプを小型
化できる効果がある。(Effects of the Invention) As described above, in the vacuum pump of the present invention, among the rotating disks,
A plurality of recesses each having a semicircular or arcuate cross section are provided along the circumferential direction on the rotating disk of the intermediate stage, and lIj! ! A radial blade is formed between the adjacent recesses, and a plurality of spiral chambers each having an arc-shaped cross section are provided along the circumferential direction on the stationary disk at the intermediate stage, and each spiral chamber has a suction chamber and a discharge chamber. The rotating disk and stationary disk at the intermediate stage form a volute friction pump in which the discharge port of the low-pressure side volute chamber and the high-pressure side suction port are common. In the pump, the groove depth of the vortex chamber can be made several times to more than ten times the spiral groove depth. Moreover, due to the radial flow created by the rotating disk,
Even if the flow in the vortex chamber is disturbed and the gap in the vortex chamber is large,
The speed in the turning direction can be increased. This result 1
Difficult to obtain exhaust performance with a friction pump with a spiral groove on one side 1
0~0. The pumping speed does not decrease even in the ITorr range. In addition, as mentioned above, a vortex friction pump is configured in the intermediate stage, which improves the efficiency of the intermediate stage when operating under rated vacuum conditions, reduces the number of stages, and has the effect of downsizing the vacuum pump. .
第1図は本発明に係わる真空ポンプの一実施例を示す縦
断側面図、第2図は第1図の矢視■−■線に沿う横断平
面図、第3図は第1図の矢視■−■線に沿う横断底面図
、第4.5図は従来の真空ポンプを示す縦断側面図、第
6図は同真空ポンプの排気速度と真空度との関係を示す
説明図である。
(LA) (1B) (IC)・・・回転円板、 (4
B) (4C) ・・・静止円板、 (X) (Y)
・・・半円形または弓形の凹み。
(Z)・
・羽根、 (R) (S)
・渦巻室、(U)・
渦巻室(R)
の吸入口、(V)・
・渦巻室(R)
の吐出
口兼渦巻室(S)
の吸入口、(V’)
・渦巻室(S)
の吐出口。FIG. 1 is a longitudinal sectional side view showing one embodiment of a vacuum pump according to the present invention, FIG. 2 is a cross-sectional plan view taken along the line ■-■ in FIG. 1, and FIG. FIG. 4.5 is a vertical cross-sectional side view showing a conventional vacuum pump, and FIG. 6 is an explanatory diagram showing the relationship between pumping speed and degree of vacuum of the same vacuum pump. (LA) (1B) (IC)...Rotating disk, (4
B) (4C) ...stationary disk, (X) (Y)
...A semicircular or arcuate depression. (Z) - Vane, (R) (S) - Swirl chamber, (U) - Suction port of swirl chamber (R), (V) - Discharge port of swirl chamber (R) and spiral chamber (S) Suction port, (V') ・Discharge port of swirl chamber (S).
Claims (1)
段に組み合わせ、同各回転円板と同各静止円板との少な
くとも一方にスパイラル状溝を設けて、スパイラル溝の
摩擦ポンプを構成し、同各回転円板を高速回転させたと
きの気体の粘性摩擦により、気体を吸気口から排気口へ
排気する真空ポンプにおいて、前記各回転円板のうち、
中間段の回転円板に断面が半円形または弓形の凹みを複
数個円周方向に沿って設けて、隣接する凹みの間に半径
方向の羽根を形成し、同中間段の静止円板に断面が円弧
状の渦巻室を複数個円周方向に沿って設け、同各渦巻室
に吸入室と吐出室とを設けて、これら中間段の回転円板
と静止円板とにより低圧側渦巻室の吐出口と高圧側吸入
口とを共通とする渦巻摩擦ポンプを形成したことを特徴
とする真空ポンプ。Rotating disks and stationary disks facing each other with a narrow gap are combined in multiple stages, and a spiral groove is provided in at least one of the rotating disks and the stationary disk, thereby creating a spiral groove friction pump. In the vacuum pump, which exhausts gas from the intake port to the exhaust port by the viscous friction of the gas when the respective rotating disks are rotated at high speed,
A plurality of recesses with semicircular or arcuate cross sections are provided along the circumferential direction in the rotating disk of the intermediate stage, and radial blades are formed between adjacent recesses. A plurality of arc-shaped spiral chambers are provided along the circumferential direction, and each spiral chamber is provided with a suction chamber and a discharge chamber, and the low-pressure side spiral chamber is A vacuum pump characterized by forming a spiral friction pump having a common discharge port and high-pressure side suction port.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32067889A JP2587506B2 (en) | 1989-12-12 | 1989-12-12 | Vacuum pump |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32067889A JP2587506B2 (en) | 1989-12-12 | 1989-12-12 | Vacuum pump |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03182697A true JPH03182697A (en) | 1991-08-08 |
| JP2587506B2 JP2587506B2 (en) | 1997-03-05 |
Family
ID=18124111
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32067889A Expired - Fee Related JP2587506B2 (en) | 1989-12-12 | 1989-12-12 | Vacuum pump |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2587506B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5482430A (en) * | 1992-04-29 | 1996-01-09 | Varian Associates, Inc. | High performance turbomolecular vacuum pumps |
| EP2433009A1 (en) * | 2009-05-20 | 2012-03-28 | Edwards Limited | Side-channel compressor with symmetric rotor disc which pumps in parallel |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50133510A (en) * | 1974-04-10 | 1975-10-22 | ||
| JPS5347552A (en) * | 1976-10-08 | 1978-04-28 | Yotsuchiyan Shiyokuhin Kougiyo | Production of puffsnack food having multiple taste |
| JPS6361798A (en) * | 1986-09-01 | 1988-03-17 | Hitachi Ltd | multi-stage integral impeller |
| JPS63266191A (en) * | 1987-04-24 | 1988-11-02 | Osaka Shinku Kiki Seisakusho:Kk | Vacuum pump |
-
1989
- 1989-12-12 JP JP32067889A patent/JP2587506B2/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50133510A (en) * | 1974-04-10 | 1975-10-22 | ||
| JPS5347552A (en) * | 1976-10-08 | 1978-04-28 | Yotsuchiyan Shiyokuhin Kougiyo | Production of puffsnack food having multiple taste |
| JPS6361798A (en) * | 1986-09-01 | 1988-03-17 | Hitachi Ltd | multi-stage integral impeller |
| JPS63266191A (en) * | 1987-04-24 | 1988-11-02 | Osaka Shinku Kiki Seisakusho:Kk | Vacuum pump |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5482430A (en) * | 1992-04-29 | 1996-01-09 | Varian Associates, Inc. | High performance turbomolecular vacuum pumps |
| US5577881A (en) * | 1992-04-29 | 1996-11-26 | Varian Associates, Inc. | High performance turbomolecular vacuum pumps |
| EP2433009A1 (en) * | 2009-05-20 | 2012-03-28 | Edwards Limited | Side-channel compressor with symmetric rotor disc which pumps in parallel |
| EP2433011A1 (en) * | 2009-05-20 | 2012-03-28 | Edwards Limited | Regenerative vacuum pump with axial thrust balancing means |
| JP2012527569A (en) * | 2009-05-20 | 2012-11-08 | エドワーズ リミテッド | Side channel pump with symmetrical rotor disk that pumps in parallel |
| JP2012527570A (en) * | 2009-05-20 | 2012-11-08 | エドワーズ リミテッド | Regenerative vacuum pump with axial force balancing means |
| US9127685B2 (en) | 2009-05-20 | 2015-09-08 | Edwards Limited | Regenerative vacuum pump with axial thrust balancing means |
| US9334873B2 (en) | 2009-05-20 | 2016-05-10 | Edwards Limited | Side-channel compressor with symmetric rotor disc which pumps in parallel |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2587506B2 (en) | 1997-03-05 |
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