JPH03187935A - Manufacturing method of quartz glass body - Google Patents

Manufacturing method of quartz glass body

Info

Publication number
JPH03187935A
JPH03187935A JP32437489A JP32437489A JPH03187935A JP H03187935 A JPH03187935 A JP H03187935A JP 32437489 A JP32437489 A JP 32437489A JP 32437489 A JP32437489 A JP 32437489A JP H03187935 A JPH03187935 A JP H03187935A
Authority
JP
Japan
Prior art keywords
gel
glass body
glass
quartz
cracks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32437489A
Other languages
Japanese (ja)
Inventor
Shiro Konishi
小西 史郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Cable Ltd
Original Assignee
Hitachi Cable Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Cable Ltd filed Critical Hitachi Cable Ltd
Priority to JP32437489A priority Critical patent/JPH03187935A/en
Publication of JPH03187935A publication Critical patent/JPH03187935A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/12Other methods of shaping glass by liquid-phase reaction processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は屈折率分布を有する石英系ガラス体の製法に関
する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for producing a quartz-based glass body having a refractive index distribution.

[従来の技術] 従来ロッドレンズ等に用いられる屈折率分布を有する石
英系ガラスの製法としては、金属アルコシトを用いるゾ
ルゲル法が知られている。
[Prior Art] A sol-gel method using a metal alkoxide is known as a method for producing quartz glass having a refractive index distribution that is conventionally used for rod lenses and the like.

この方法は、まず、ガラスの主成分である石英成分とな
るシリコンアルコキシドと、屈折率分布を形成するため
の成分となるシリコン以外の金属アルコキシドを用い、
これら金属アルコキシドのアルコール溶液に水を添加し
て該アルコキシドの加水分解と縮合によるゾルゲル反応
を行い、多孔質で内部に水やアルコールを含むゼリー状
のウェットゲルを作成する。
This method first uses silicon alkoxide, which is the quartz component that is the main component of glass, and a metal alkoxide other than silicon, which is the component for forming the refractive index distribution.
Water is added to an alcohol solution of these metal alkoxides to perform a sol-gel reaction by hydrolysis and condensation of the alkoxides, thereby creating a jelly-like wet gel that is porous and contains water and alcohol inside.

次いで、前記ウェットゲルを塩酸等の酸の水溶液に浸漬
すると屈折率分布を形成する金属成分の一部は、拡散機
構に基づきゲル外に溶出され、該ウェットゲル内には濃
度勾配が形成される。該ウェットゲルを乾燥してドライ
ゲルとし、これを1200℃以上で焼結することにより
屈折率分布を有するドープド石英系ガラスが得られる。
Next, when the wet gel is immersed in an aqueous solution of an acid such as hydrochloric acid, a part of the metal component forming the refractive index distribution is eluted out of the gel based on a diffusion mechanism, and a concentration gradient is formed within the wet gel. . By drying the wet gel to obtain a dry gel and sintering this at 1200° C. or higher, a doped quartz glass having a refractive index distribution can be obtained.

[発明が解決しようとする課題] 前記従来技術には、ゲルの乾燥、焼結時において、クラ
ックが発生し易いこと\、焼結後のガラスが微細な気泡
撃合んでいると云う問題があった。
[Problems to be Solved by the Invention] The above-mentioned conventional technology has the problems that cracks are likely to occur during gel drying and sintering, and that fine bubbles are bombarded with each other in the glass after sintering. Ta.

近年、良好な光学特性を有するガラスの要求が高くなり
、前記クラックや気泡の無いガラスの要望が強くなり、
こうしたクラックや気泡の発生の防止が極めて重要とな
ってきた。
In recent years, the demand for glass with good optical properties has increased, and the demand for glass that is free of cracks and bubbles has become stronger.
Preventing the occurrence of such cracks and bubbles has become extremely important.

上記クラックや気泡の発生は、多孔質体であるゲルの微
細構造の不均一性に起因するものと考えられる。
The occurrence of the cracks and bubbles described above is considered to be due to the non-uniformity of the microstructure of the gel, which is a porous body.

本発明の目的は、前記したクラックや気泡の発生がない
屈折率分布を有する石英系ガラス体の製法を提供するこ
とにある。
An object of the present invention is to provide a method for producing a quartz-based glass body having a refractive index distribution free from the above-mentioned cracks and bubbles.

[課題を解決するための手段] 本発明は前記目的を達成するためになされたもので、そ
の要旨は下記のとおりである。
[Means for Solving the Problems] The present invention has been made to achieve the above object, and the gist thereof is as follows.

シリコンアルコキシドと、シリコン以外の金属アルコキ
シドとを含む溶液を用いて、ゾルゲル反応により生成さ
れるゲルを酸処理することにより前記シリコンアルコシ
ド以外の金属アルコキシドを部分溶出し、得られたゲル
を乾燥、焼結する工程を含む石英系ガラス体の製法にお
いて、前記工程で使用される水が比抵抗16MΩam以
上の超純水であることを特徴とする石英系ガラス体の製
法。
A gel produced by a sol-gel reaction is treated with an acid using a solution containing silicon alkoxide and a metal alkoxide other than silicon to partially elute the metal alkoxide other than the silicon alkoxide, and the resulting gel is dried. A method for producing a quartz-based glass body including a sintering step, wherein the water used in the step is ultrapure water with a specific resistance of 16 MΩam or more.

本発明において、使用される水の比抵抗が16MΩcm
より低いものでは、無機あるいは有機の不純物を多く含
み、ゾルゲル反応で形成されるゲルの微細構造が不均一
となり、乾燥、焼結時にクラックや気泡の発生が起り易
くなるので好ましくない。
In the present invention, the specific resistance of the water used is 16 MΩcm.
If it is lower than this, it is not preferable because it contains a large amount of inorganic or organic impurities and the fine structure of the gel formed by the sol-gel reaction becomes non-uniform, making cracks and bubbles more likely to occur during drying and sintering.

[作用] 上記ゾルゲル法による石英系ガラスのクラックや気泡の
発生は、多孔質体であるゲルの微細構造の不均一性に起
因するものと考えられる。
[Operation] The occurrence of cracks and bubbles in quartz glass by the above-mentioned sol-gel method is thought to be due to the non-uniformity of the microstructure of the gel, which is a porous body.

本発明者の検討結果によれば、こうしたゲルの微細構造
の不均一性に、製造工程で使用される純水中の無機また
は有機の不純物が影響を与えるものと考える。本発明に
おいては、該不純物量を比抵抗の値で規制したもので、
前記の比抵抗を有する水を用いることにより本発明の目
的を達成することができる。
According to the study results of the present inventors, it is considered that inorganic or organic impurities in the pure water used in the manufacturing process affect the non-uniformity of the microstructure of the gel. In the present invention, the amount of impurities is regulated by the value of specific resistance,
The object of the present invention can be achieved by using water having the above specific resistance.

3− [実施例] 本発明を実施例により具体的に説明する。3- [Example] The present invention will be specifically explained with reference to Examples.

Ti(0−n−C,H,)4: 5i(QC)(、)、
:H,O: n−C3H7011の比が、モル比で0.
2=0.8 : 4 : 4となるように混合したシリ
カゾル分散液を調製する。
Ti(0-n-C,H,)4: 5i(QC)(, ),
:H,O: n-C3H7011 ratio is 0.0 in molar ratio.
A silica sol dispersion is prepared by mixing 2=0.8:4:4.

次いで、前記シリカゾル分散液を内径15mmφのガラ
ス管に入れ、密封して室温で3日放置しゲル体を得る。
Next, the silica sol dispersion was put into a glass tube with an inner diameter of 15 mm, and the tube was sealed and left at room temperature for 3 days to obtain a gel body.

上記ゲル体は金属アルコキシドS i (OCH,)4
とT i (0−n−C4IL)4の不十分な加水分解
および縮合反応により生じたガラス網目の不完全構造体
で、水やn −C3H70Hを含んでいるものである。
The above gel body is metal alkoxide S i (OCH,)4
It is an incomplete structure with a glass network produced by insufficient hydrolysis and condensation reaction of and T i (0-n-C4IL)4, and contains water and n-C3H70H.

上記ゲル体をガラス管から取り出し、5%塩酸水溶液中
に20時間浸漬し、Si成分とTi成分からなる不完全
網目構造体よりSi以外の金属成分、即ちTi成分の一
部を溶出させて、ゲル体内部のTi成分に濃度勾配を与
える9次いで、水に浸漬して洗浄し塩酸成分を取り除く
The gel body is taken out from the glass tube and immersed in a 5% hydrochloric acid aqueous solution for 20 hours to elute metal components other than Si, that is, part of the Ti component, from the incomplete network structure consisting of Si components and Ti components. Provide a concentration gradient to the Ti component inside the gel body 9 Next, the gel body is immersed in water to be washed to remove the hydrochloric acid component.

上記で得たゲル体を、乾燥後1200℃以上で焼結し直
径5mmφ×長さ800mmの透明ガラス体を作成した
The gel body obtained above was dried and sintered at 1200° C. or higher to produce a transparent glass body with a diameter of 5 mmφ and a length of 800 mm.

前記の全工程において、シリカゾル分散液、5%塩酸水
溶液および脱塩酸並びに洗浄等に用いた全ての水は、比
抵抗16MΩcmの超純水を用いた。
In all of the above steps, ultrapure water with a specific resistance of 16 MΩcm was used as the silica sol dispersion, 5% aqueous hydrochloric acid solution, dehydrochloric acid removal, washing, etc.

比較のため前記超純水を用いた場合と、比抵抗8 M 
Q c mの純水を用いた場合とについて、それぞれ1
0本の透明ガラス体を同様にして作成し、クランクおよ
び気泡の発生状況について調べた。
For comparison, the case where the ultrapure water was used and the specific resistance of 8 M
1 for each case using pure water of Q cm
0 transparent glass bodies were prepared in the same manner, and the occurrence of cranks and bubbles was examined.

その結果、比抵抗16MΩcmの超純水を用いた場合は
、クラックの発生は全く見られず、また、気泡が発生し
たものは1本だけであった。これに対して、比抵抗8M
Ωemの純水を用いた場合には、クラックの発生したも
の3本、気泡が発生していたもの8本であり、クランク
と気泡のいずれも発生しなかったものは、僅かに1本だ
けであった。
As a result, when ultrapure water with a specific resistance of 16 MΩcm was used, no cracks were observed and only one bubble was observed. On the other hand, resistivity 8M
When using Ωem pure water, 3 had cracks and 8 had bubbles, and only 1 had neither cracks nor bubbles. there were.

なお、透明ガラス体の半径方向の屈折率分布は前記水の
比抵抗の違いによる影響はなく、グラフ−1−に外側か
ら中心に向う距離を横軸に、その各部分の屈折率を縦軸
にプロットしたところ洗物線状の濃度分布を示した。
Note that the refractive index distribution in the radial direction of the transparent glass body is not affected by the above-mentioned difference in resistivity of water, and in graph 1, the distance from the outside to the center is plotted on the horizontal axis, and the refractive index of each part is plotted on the vertical axis. When plotted, it showed a linear concentration distribution.

本実施例においては、金属アルコキシドとしてメトキシ
ドを用いた場合を示したが、エトキシ、プロポキシ、ブ
トキシ等の金属アルコキシドも用いることができる。
In this example, a case was shown in which methoxide was used as the metal alkoxide, but metal alkoxides such as ethoxy, propoxy, butoxy, etc. can also be used.

また、アルコキシシラン以外の金属アルコキシドとして
は、チタンの他にゲルマニウム、ジルコニウム、タンタ
ル等の金属アルコキシドを用いてもよい。
Further, as metal alkoxides other than alkoxysilane, metal alkoxides such as germanium, zirconium, tantalum, etc. may be used in addition to titanium.

更にまた、焼結ガラス体に屈折率分布を形成するための
溶出酸水溶液としては、塩酸以外に硫酸、硝酸、フッ酸
等の水溶液を用いることができる。
Furthermore, as the eluting acid aqueous solution for forming a refractive index distribution in the sintered glass body, an aqueous solution of sulfuric acid, nitric acid, hydrofluoric acid, etc. can be used in addition to hydrochloric acid.

[発明の効果] 本発明の、比抵抗16MΩcm以上の超純水を用いた金
属アルコキシドのゾルゲル法による石英系ガラス体の製
法によれば、乾燥、焼結によるクラックおよび気泡発生
のないガラス体を得ることができるので、光学特性の優
れた石英系ガラス体を提供することができる。
[Effects of the Invention] According to the method of the present invention for manufacturing a quartz-based glass body by a metal alkoxide sol-gel method using ultrapure water with a specific resistance of 16 MΩcm or more, a glass body without cracks or bubbles caused by drying and sintering can be produced. Therefore, it is possible to provide a quartz-based glass body with excellent optical properties.

Claims (1)

【特許請求の範囲】 1、シリコンアルコキシドと、シリコン以外の金属アル
コキシドとを含む溶液を用いて、ゾルゲル反応により生
成されるゲルを酸処理することにより前記シリコンアル
コシド以外の金属アルコキシドを部分溶出し、得られた
ゲルを乾燥、焼結する工程を含む石英系ガラス体の製法
において、 前記工程で使用される水が、比抵抗16MΩcm以上の
超純水であることを特徴とする石英系ガラス体の製法。
[Claims] 1. Partial elution of metal alkoxides other than silicon alkoxides by acid-treating a gel produced by a sol-gel reaction using a solution containing silicon alkoxides and metal alkoxides other than silicon alkoxides. , a method for producing a quartz-based glass body including a step of drying and sintering the obtained gel, wherein the water used in the step is ultrapure water with a specific resistance of 16 MΩcm or more. manufacturing method.
JP32437489A 1989-12-14 1989-12-14 Manufacturing method of quartz glass body Pending JPH03187935A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32437489A JPH03187935A (en) 1989-12-14 1989-12-14 Manufacturing method of quartz glass body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32437489A JPH03187935A (en) 1989-12-14 1989-12-14 Manufacturing method of quartz glass body

Publications (1)

Publication Number Publication Date
JPH03187935A true JPH03187935A (en) 1991-08-15

Family

ID=18165080

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32437489A Pending JPH03187935A (en) 1989-12-14 1989-12-14 Manufacturing method of quartz glass body

Country Status (1)

Country Link
JP (1) JPH03187935A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07507033A (en) * 1991-12-12 1995-08-03 矢崎総業株式会社 Sol-gel method for producing germania-doped silica glass rods

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07507033A (en) * 1991-12-12 1995-08-03 矢崎総業株式会社 Sol-gel method for producing germania-doped silica glass rods

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