JPH03196101A - Antireflection film - Google Patents

Antireflection film

Info

Publication number
JPH03196101A
JPH03196101A JP1337299A JP33729989A JPH03196101A JP H03196101 A JPH03196101 A JP H03196101A JP 1337299 A JP1337299 A JP 1337299A JP 33729989 A JP33729989 A JP 33729989A JP H03196101 A JPH03196101 A JP H03196101A
Authority
JP
Japan
Prior art keywords
layer
antireflection film
refractive index
denotes
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1337299A
Other languages
Japanese (ja)
Other versions
JP2815949B2 (en
Inventor
Koji Sato
弘次 佐藤
Osamu Akabayashi
修 赤林
Kenichi Niide
謙一 新出
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP1337299A priority Critical patent/JP2815949B2/en
Publication of JPH03196101A publication Critical patent/JPH03196101A/en
Application granted granted Critical
Publication of JP2815949B2 publication Critical patent/JP2815949B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0018Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for preventing ghost images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Glass (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)

Abstract

PURPOSE:To prevent ghosts and flares when this antireflection film is applied on a glass lens by forming the antireflection film into the 7-layered constitution provided on a glass substrate having from 1.5 to 1.8 refractive index, forming this constitution of the 1st layer and the 2nd layers, successively counted from the substrate, in such a manner as to satisfy specific conditions and further forming the 6th layer of a mixture contg. ZrO2 and TiO2. CONSTITUTION:The antireflection film has the 7-layered constitution provided on the glass substrate having from 1.5 to 1.8 refractive index and is constituted to satisfy the conditions expressed by equations I to VII when the layers are designated as the 1st layer and the 2nd layer successively counted from the substrate. Further, the 6th layer is formed of the mixture composed of the ZrO2 and TiO2. If the equations I to VII, lambda0 denotes the design wavelength selected in a 450 to 550nm range; ni denotes a refractive index; nidi denotes an optical film thickness; (i) denotes an integer from 1 to 7. The surface reflectivity in the wavelength range of a visible ray region is lowered in this way when the antireflection film is provided on the glass lens. An excellent antireflection effect is thus obtd. The ghosts and flares are eliminated and the lens is particularly adequately usable as a spectacle lens.

Description

【発明の詳細な説明】 [産業上の利用分野J 本発明は光学ガラスにコーティングされた反射防止膜に
関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application J] The present invention relates to an antireflection film coated on optical glass.

[従来の技術] 従来、光学ガラス表面の反射特性を改善するために、こ
の光学ガラス基板上に反射防止膜を設けることは良く知
られている。このような反射防止膜として、例えば米国
特許用It書3,185.020号公報には、基板のガ
ラス上に、第1層目を膜厚λ/4、第2層目をλ/2、
第311目をλ/4(λは反射防止波長域の基準波長で
ある。)よりなる3層型反射防止膜が開示されている。
[Prior Art] Conventionally, it is well known to provide an antireflection film on an optical glass substrate in order to improve the reflection characteristics of the surface of the optical glass. As such an antireflection film, for example, U.S. Patent No. 3,185.020 discloses that the first layer has a thickness of λ/4, the second layer has a thickness of λ/2, and
A three-layer antireflection film is disclosed in which the 311th layer is λ/4 (λ is the reference wavelength of the antireflection wavelength range).

しかしながら前記米国特許公報に開示されている反射防
止膜をガラスレンズに施した場合、可視波長域全域(3
80〜780n+s)に対する反rJ4防1F効果が不
十分であり、眼鏡レンズとして使用すると、ゴースト現
象、フレア現象などの反射のちらつきを感じる問題点を
有している。上記問題を解決するために、例えば、特公
昭57−25801号公報には、7層型反射防止膜が、
また特公昭64−8801号公報には、4層以上の多層
反射防止膜が開示されている。
However, when the antireflection coating disclosed in the above-mentioned US patent publication is applied to a glass lens, the entire visible wavelength range (3
80 to 780n+s) is insufficient, and when used as an eyeglass lens, there is a problem in that reflection flickering such as a ghost phenomenon or a flare phenomenon is perceived. In order to solve the above problem, for example, Japanese Patent Publication No. 57-25801 discloses a seven-layer antireflection film.
Furthermore, Japanese Patent Publication No. 8801/1983 discloses a multilayer antireflection film having four or more layers.

[発明が解決しようとする課題] しかしながら、特公昭57−25801号公報、特公昭
64−8801号公報に開示されている反射防止膜は、
TiO2に代表されるような、膜厚の厚さ方向に屈折率
が異なる性質を有する不均質膜が施こされている。前記
不拘′M膜の屈折率は真空度に大きく依存するため、所
望の反射特性を再現良く得ることが困難である問題を有
している。
[Problems to be Solved by the Invention] However, the antireflection films disclosed in Japanese Patent Publication No. 57-25801 and Japanese Patent Publication No. 64-8801,
A non-uniform film, such as TiO2, which has a property of having a refractive index different in the thickness direction, is formed. Since the refractive index of the unconstrained M film largely depends on the degree of vacuum, there is a problem in that it is difficult to obtain desired reflection characteristics with good reproducibility.

従って本発明の目的は、可視光線域の波長範囲において
、反射防止効果に優れ、ガラスレンズに施した場合にで
もゴースト現象、フレア現象が起こりにくく、さらに所
望の反射特性を再現良く得ることができる反射防止膜を
提供することにある。
Therefore, the object of the present invention is to have an excellent antireflection effect in the wavelength range of visible light, to prevent ghosting and flare phenomena from occurring even when applied to a glass lens, and to be able to obtain desired reflection characteristics with good reproducibility. An object of the present invention is to provide an antireflection film.

[課題を解決するための手段J 本発明は、上述の目的を達成するために鋭意研究した結
果、ほぼ、1.5から1.8の屈折率を有するガラス基
板上に設けられる7層構成の反射防止膜であって基材よ
り数えて順に第1it、第2層とした時に以下の条件を
満足し、ざらに第6層がZrO2とTiO2とを含む混
合物からなることを特徴とする反射防止膜を見い出し本
発明に至つた。
[Means for Solving the Problems J] As a result of intensive research to achieve the above-mentioned object, the present invention is based on a seven-layer structure provided on a glass substrate having a refractive index of approximately 1.5 to 1.8. An anti-reflection film, which satisfies the following conditions when the first layer and the second layer are counted from the base material, and the sixth layer is made of a mixture containing ZrO2 and TiO2. They discovered a membrane and led to the present invention.

第1層  1.38 ≦ ni ≦1.390.07λ
0 ≦ni  dl  ≦0.14λ0第2層  1.
62 ≦ 02 ≦2.050.02λ0 ≦n2  
d2  ≦0.07λ0第311     ns ≧1
.90 0.06λ0 ≦n3  d3  ≦0.10λ0第4
1!1  1.38  ≦ n4 ≦1.390、10
λ0 ≦n4  d4  ≦0.13λ0fR5FII
       ns   ≧1,900.05λ0 ≦
n5  d5  ≦0.10λ0第6層  2.05 
≦ 06 ≦2.150.48λ0 ≦n6  d6 
 ≦0.52λ0第7層   1.38≦ 07 ≦1
.390、23λ0 ≦n7  d7  ≦O627λ
0但し、λ0は450〜550nrnの範囲において選
択された設計波長、niは屈折率、n1diは光学的膜
厚、1は1〜7の整数を示す。
1st layer 1.38 ≦ ni ≦1.390.07λ
0 ≦ni dl ≦0.14λ0 2nd layer 1.
62 ≦ 02 ≦2.050.02λ0 ≦n2
d2 ≦0.07λ0 311th ns ≧1
.. 90 0.06λ0 ≦n3 d3 ≦0.10λ0 4th
1!1 1.38 ≦ n4 ≦1.390, 10
λ0 ≦n4 d4 ≦0.13λ0fR5FII
ns ≧1,900.05λ0 ≦
n5 d5 ≦0.10λ0 6th layer 2.05
≦06 ≦2.150.48λ0 ≦n6 d6
≦0.52λ0 7th layer 1.38≦07≦1
.. 390, 23λ0 ≦n7 d7 ≦O627λ
0, where λ0 is a design wavelength selected in the range of 450 to 550 nrn, ni is the refractive index, n1di is the optical thickness, and 1 is an integer from 1 to 7.

以下、本発明の詳細な説明する。The present invention will be explained in detail below.

本発明の反射防止膜の第6層は、ZrO2とTlO2と
を含む混合熱看護から構成されることを必須条件として
いる。その理由は、Ti0zにZrO2を混合すること
によって、膜厚の厚さ方向に屈折率が異なる性質を有す
る不均質膜の不均質性を調整することが可能であり、ま
た吸収を示さず、屈折率が2.05〜2.15と高い屈
折率を有するからである。尚、ZrO2とTiO2との
モル組成比は、ZrO2が1に対して、TiO2が0.
15〜0.20が好ましく用いられる。
It is essential that the sixth layer of the antireflection film of the present invention is composed of a mixed thermal layer containing ZrO2 and TlO2. The reason for this is that by mixing ZrO2 with TiOz, it is possible to adjust the heterogeneity of a heterogeneous film that has a property that the refractive index differs in the thickness direction, and it also shows no absorption and no refraction. This is because it has a high refractive index of 2.05 to 2.15. The molar composition ratio of ZrO2 and TiO2 is 1 for ZrO2 and 0.0 for TiO2.
15 to 0.20 is preferably used.

本発明の反射防止膜の各層の膜材料は、各層の屈折率と
光学的膜厚の範囲をみたすものであれば特に限定はない
が、第1層、第4層及び第7層は、低屈折率の物質、た
とえば、屈折率1.38〜1゜3977)MgF2、第
2層は、A I 203 *りG1ZrO2、第3層、
第5層は、ZrO2またはZrO2とTiO2との混合
物によって構成することが好ましい。その理由は、吸収
を示さず、所望の屈折率と強い膜強度を得ることができ
るからである。
The film material for each layer of the antireflection film of the present invention is not particularly limited as long as it satisfies the range of refractive index and optical thickness of each layer, but the first, fourth, and seventh layers are A material with a refractive index, for example, a refractive index of 1.38 to 1°3977) MgF2, the second layer is A I 203 *G1ZrO2, the third layer,
The fifth layer is preferably composed of ZrO2 or a mixture of ZrO2 and TiO2. The reason is that it exhibits no absorption and can provide a desired refractive index and strong film strength.

尚、本発明におけるガラス基材の屈折率は、1゜5から
1.8の範囲のものを用いる。その理由は、ガラス基材
の屈折率が1.5から1.8の範囲であれば、本発明の
反射防止膜の各層の蒸着物質、蒸着物質の積層順を変え
ることなく前記ガラス基材に適用することが可能だから
である。
Incidentally, the refractive index of the glass substrate used in the present invention is in the range of 1.5 to 1.8. The reason is that if the refractive index of the glass substrate is in the range of 1.5 to 1.8, the vapor deposition material of each layer of the antireflection film of the present invention and the lamination order of the vapor deposition material can be applied to the glass substrate without changing the layering order. This is because it can be applied.

本発明において前記第1〜7層は、真空蒸着、スパッタ
リングによって設けることができる。より、好ましくは
真空蒸着である。イオンビームアシストなどの方法も適
宜応用してもよい。
In the present invention, the first to seventh layers can be provided by vacuum deposition or sputtering. Vacuum deposition is more preferred. Methods such as ion beam assist may also be applied as appropriate.

〔実施例1 以下、実施例により本発明を更に詳細に説明するが、本
発明は、これら実施例に限定されるものでない。
[Example 1] Hereinafter, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited to these Examples.

第1図は、本発明にかかる反射防止膜を示す断面図であ
る。第1図において、反射防止RQ CG、t I板A
側から空気B側へ順に、第1111、第21FIJ2、
第3層3、第4II14、第5115、第6116、第
7層7構成からなる。
FIG. 1 is a sectional view showing an antireflection film according to the present invention. In Figure 1, anti-reflection RQ CG, t I plate A
From the side to the air B side, the 1111th, 21st FIJ2,
It consists of 3rd layer 3, 4th layer 14, 5115th layer, 6116th layer, and 7th layer 7 configuration.

次に、本発明実施例1〜4の具体的構成を表1に、実施
例5〜8の具体的構成を表2に、実施例9〜12の具体
的構成を表3に示し、実施例1〜3の分光反射率曲線を
第2図に、実施例5〜7の分光反射率曲線を第3図に、
実施例9〜11の分光反射率曲線を第4図に、また、実
施例4.8゜12の分光反射率曲線を第5図に示す。但
し、表1〜表3において各層の光学的膜厚は設計波長λ
0を500nmとして計算した場合の値である。
Next, the specific structures of Examples 1 to 4 of the present invention are shown in Table 1, the specific structures of Examples 5 to 8 are shown in Table 2, the specific structures of Examples 9 to 12 are shown in Table 3, and The spectral reflectance curves of Examples 1 to 3 are shown in Figure 2, and the spectral reflectance curves of Examples 5 to 7 are shown in Figure 3.
The spectral reflectance curves of Examples 9 to 11 are shown in FIG. 4, and the spectral reflectance curve of Example 4.8°12 is shown in FIG. However, in Tables 1 to 3, the optical thickness of each layer is based on the design wavelength λ.
This value is calculated assuming that 0 is 500 nm.

尚、蒸着法は真空蒸着法を用い、基板温度300℃、真
空度3X 10−5To r rの条件で行なった。屈
折率1.6のガラスレンズとしてLHI−■(ホーヤ(
株)製)、屈折率1.7のガラスレンズとしてLHI(
ホーヤ(株)製)、屈折率1゜8のガラスレンズとして
THI−II(ホーヤ(株)製)を用い、7rO2とT
iO2とのモル組成比はZrO2が1に対して、TlO
2が0.18F行なった。第2図〜第5図から明らかな
ようにいずれの実施例においても、片面の視感反射率は
、約0.15%以下と極めて優れた反射防止性を有して
いた。
Incidentally, the vapor deposition method was performed using a vacuum vapor deposition method under conditions of a substrate temperature of 300° C. and a degree of vacuum of 3×10 −5 Torr. LHI-■ (Hoya) is a glass lens with a refractive index of 1.6.
LHI (manufactured by Co., Ltd.), as a glass lens with a refractive index of 1.7
7rO2 and THI-II (manufactured by Hoya Co., Ltd.) was used as a glass lens with a refractive index of 1°8.
The molar composition ratio with iO2 is 1 for ZrO2 and 1 for TlO2.
2 went 0.18F. As is clear from FIGS. 2 to 5, in all Examples, the luminous reflectance on one side was approximately 0.15% or less, and had extremely excellent antireflection properties.

また、第6図は、単色測光法(λO=550nm)にて
制御を行ない、第6層0.50λOを5回繰り返して形
成したときの第6層の蒸着時間(膜厚変化)に対する反
射率変化を示す図である。第6図に示すように、いづれ
の場合にも蒸着開始点aと0.50λOの最小極値点す
の反射率値がほぼ同一であり、第6層のZrO2と1−
i02からなる膜は均質なものであった。
In addition, Figure 6 shows the reflectance as a function of the deposition time (film thickness change) of the sixth layer when the sixth layer of 0.50λO was repeatedly formed five times using monochromatic photometry (λO = 550nm). It is a figure showing a change. As shown in FIG. 6, the reflectance values at the deposition start point a and the minimum extreme value point of 0.50λO are almost the same in all cases, and the ZrO2 and 1-
The film made of i02 was homogeneous.

さらに、実施例1〜12に示す反射防止膜を施したガラ
スレンズをそれぞれ繰り返し製作したところ、すべての
ガラスレンズにおいて片面視感反射率が約0.15%以
下と反射特性を再現良く得ることができた。
Furthermore, when glass lenses coated with anti-reflection films shown in Examples 1 to 12 were repeatedly produced, it was possible to obtain good reproducibility of reflection characteristics with single-sided luminous reflectance of approximately 0.15% or less for all glass lenses. did it.

(以下余白) [発明の効果] 取上詳述したように、本発明の反射防止膜は、ガラスレ
ンズ上に設けたときに、可視光線域の波長W!囲におい
て表面反射率が極めて低く、優れた反射防止効果を有し
ていることから、ゴースト現象、フレア現象が解消され
wIIltレンズとして特に好適に用いることができる
。また第6層に不均質の問題を解消できる物質を用いて
いることから、反射特性を再現良く得ることができる。
(The following is a blank space) [Effects of the Invention] As described in detail above, when the antireflection film of the present invention is provided on a glass lens, the wavelength W! Since the surface reflectance is extremely low in the surrounding area and has an excellent antireflection effect, ghost phenomena and flare phenomena are eliminated, and it can be particularly suitably used as a wIIlt lens. Furthermore, since a material that can solve the problem of non-uniformity is used in the sixth layer, reflection characteristics can be obtained with good reproducibility.

さらに、本発明の反射防止膜は、屈折率1.5〜1.8
のガラスレンズにおいて蒸着物質、蒸着物質の積層順を
変えずにほぼ同一の反射特性を得ることが可能になった
Furthermore, the antireflection film of the present invention has a refractive index of 1.5 to 1.8.
It has become possible to obtain almost the same reflection characteristics in glass lenses without changing the layering order of the vapor-deposited materials.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明にかかる反射防止膜の構成を示す断面図
、第2図は本実施例1〜3の分光反射率曲線図、第3図
は、本実施例5〜7の分光反射率曲線図、第4図は、実
施例9〜11の分光反射率曲線図、第5図は、本実施例
4,8.12の分光反射率曲線図、第6図は、第681
!11色測光法にて制御した第6層の反射率変化図であ
る。 A°ガラス基材、B:空気 C:反射防止膜 1:第1層、2:第2層 3:第3層、4:第4層 5゛第5.6:第6層 7°第7層
FIG. 1 is a sectional view showing the structure of the antireflection film according to the present invention, FIG. 2 is a spectral reflectance curve diagram of Examples 1 to 3, and FIG. 3 is a spectral reflectance curve of Examples 5 to 7. 4 is a spectral reflectance curve diagram of Examples 9 to 11, FIG. 5 is a spectral reflectance curve diagram of Examples 4, 8.12, and FIG. 6 is a spectral reflectance curve diagram of Examples 9-11.
! It is a reflectance change diagram of the 6th layer controlled by 11-color photometry. A° Glass substrate, B: Air C: Antireflection film 1: First layer, 2: Second layer 3: Third layer, 4: Fourth layer 5゛ 5.6: Sixth layer 7° 7th layer

Claims (4)

【特許請求の範囲】[Claims] (1)ほぼ、1.5から1.8の屈折率を有するガラス
基板上に設けられる7層構成の反射防止膜であって基材
より数えて順に第1層、第2層とした時に以下の条件を
満足し、さらに第6層がZrO_2とTiO_2とを含
む混合物からなることを特徴とする反射防止膜; 第1層1.38≦n_1≦1.39 0.07λ_0≦n_1d_1≦0.14λ_0第2層
1.62≦n_2≦2.05 0.02λ_0≦n_2d_2≦0.07λ_0第3層
n_3≧1.90 0.06λ_0≦n_3d_3≦0.10λ_0第4層
1.38≦n_4≦1.39 0.10λ_0≦n_4d_4≦0.13λ_0第5層
n_5≧1.90 0.05λ_0≦n_5d_5≦0.10λ_0第6層
2.05≦n_6≦2.15 0.48λ_0≦n_6d_6≦0.52λ_0第7層
1.38≦n_7≦1.39 0.23λ_0≦n_7d_7≦0.27λ_0但し、
λ_0は450〜550nmの範囲において選択された
設計波長、niは屈折率、nidiは光学的膜厚、iは
1〜7の整数を示す。
(1) It is an antireflection film with a seven-layer structure provided on a glass substrate with a refractive index of approximately 1.5 to 1.8, and when the first and second layers are counted from the base material, the following is shown. An antireflection film that satisfies the following conditions and further comprises a sixth layer made of a mixture containing ZrO_2 and TiO_2; first layer 1.38≦n_1≦1.39 0.07λ_0≦n_1d_1≦0.14λ_0 2nd layer 1.62≦n_2≦2.05 0.02λ_0≦n_2d_2≦0.07λ_0 3rd layer n_3≧1.90 0.06λ_0≦n_3d_3≦0.10λ_0 4th layer 1.38≦n_4≦1.39 0.10λ_0≦n_4d_4≦0.13λ_0 5th layer n_5≧1.90 0.05λ_0≦n_5d_5≦0.10λ_0 6th layer 2.05≦n_6≦2.15 0.48λ_0≦n_6d_6≦0.52λ_0 7th layer 1.38≦n_7≦1.39 0.23λ_0≦n_7d_7≦0.27λ_0However,
λ_0 is a design wavelength selected in the range of 450 to 550 nm, ni is a refractive index, nidi is an optical film thickness, and i is an integer of 1 to 7.
(2)第1層、第4層、第7層がMgF_2からなるこ
とを特徴とする請求項1記載の反射防止膜。
(2) The antireflection film according to claim 1, wherein the first layer, the fourth layer, and the seventh layer are made of MgF_2.
(3)第2層がAl_2O_3またはZrO_2からな
ることを特徴とする請求項1または請求項2記載の反射
防止膜。
(3) The antireflection film according to claim 1 or 2, wherein the second layer is made of Al_2O_3 or ZrO_2.
(4)第3層、第5層がZrO_2またはZrO_2と
TiO_2との混合物からなることを特徴とする請求項
1または請求項2または請求項3記載の反射防止膜。
(4) The antireflection film according to claim 1, 2, or 3, wherein the third layer and the fifth layer are made of ZrO_2 or a mixture of ZrO_2 and TiO_2.
JP1337299A 1989-12-26 1989-12-26 Anti-reflective coating Expired - Lifetime JP2815949B2 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010079013A (en) * 2008-09-26 2010-04-08 Nittoh Kogaku Kk Manufacturing process of optical member, and optical member
CN108761792A (en) * 2018-06-19 2018-11-06 惠州市华阳多媒体电子有限公司 A kind of light path system of miniaturization HUD

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010079013A (en) * 2008-09-26 2010-04-08 Nittoh Kogaku Kk Manufacturing process of optical member, and optical member
CN108761792A (en) * 2018-06-19 2018-11-06 惠州市华阳多媒体电子有限公司 A kind of light path system of miniaturization HUD

Also Published As

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